KR19990088461A - 촉매제조방법 - Google Patents
촉매제조방법 Download PDFInfo
- Publication number
- KR19990088461A KR19990088461A KR1019990018390A KR19990018390A KR19990088461A KR 19990088461 A KR19990088461 A KR 19990088461A KR 1019990018390 A KR1019990018390 A KR 1019990018390A KR 19990018390 A KR19990018390 A KR 19990018390A KR 19990088461 A KR19990088461 A KR 19990088461A
- Authority
- KR
- South Korea
- Prior art keywords
- catalyst
- mixtures
- propane
- oxidation
- analyzed
- Prior art date
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- 239000003054 catalyst Substances 0.000 title claims abstract description 109
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 230000003647 oxidation Effects 0.000 claims abstract description 55
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 55
- 150000001335 aliphatic alkanes Chemical class 0.000 claims abstract description 34
- 150000001299 aldehydes Chemical class 0.000 claims abstract description 17
- 150000001735 carboxylic acids Chemical class 0.000 claims abstract description 16
- 239000012018 catalyst precursor Substances 0.000 claims description 52
- 239000000203 mixture Substances 0.000 claims description 48
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 44
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 44
- 239000000243 solution Substances 0.000 claims description 41
- 239000012298 atmosphere Substances 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 28
- 229910052757 nitrogen Inorganic materials 0.000 claims description 25
- 238000002390 rotary evaporation Methods 0.000 claims description 25
- 229910052786 argon Inorganic materials 0.000 claims description 22
- 229910052758 niobium Inorganic materials 0.000 claims description 20
- 238000001354 calcination Methods 0.000 claims description 17
- 229910052787 antimony Inorganic materials 0.000 claims description 14
- 229910052715 tantalum Inorganic materials 0.000 claims description 14
- 229910052721 tungsten Inorganic materials 0.000 claims description 14
- 229910052720 vanadium Inorganic materials 0.000 claims description 14
- 229910052726 zirconium Inorganic materials 0.000 claims description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 13
- 239000001301 oxygen Substances 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- 238000004108 freeze drying Methods 0.000 claims description 10
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims description 10
- 229910052707 ruthenium Inorganic materials 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 7
- 230000003197 catalytic effect Effects 0.000 claims description 6
- 230000001419 dependent effect Effects 0.000 claims description 6
- 150000002736 metal compounds Chemical class 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- 229910052684 Cerium Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 229910052738 indium Inorganic materials 0.000 claims description 5
- 229910052748 manganese Inorganic materials 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052763 palladium Inorganic materials 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 229910052711 selenium Inorganic materials 0.000 claims description 5
- 238000007605 air drying Methods 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 238000001291 vacuum drying Methods 0.000 claims description 3
- 238000004438 BET method Methods 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 abstract description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 132
- 239000007789 gas Substances 0.000 description 70
- 239000001294 propane Substances 0.000 description 66
- 239000012071 phase Substances 0.000 description 54
- 239000002002 slurry Substances 0.000 description 43
- 239000008187 granular material Substances 0.000 description 32
- 239000007787 solid Substances 0.000 description 30
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 29
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 29
- 239000003570 air Substances 0.000 description 29
- 238000006243 chemical reaction Methods 0.000 description 28
- 239000007791 liquid phase Substances 0.000 description 19
- 239000007788 liquid Substances 0.000 description 18
- 239000010955 niobium Substances 0.000 description 18
- 239000010935 stainless steel Substances 0.000 description 16
- 229910001220 stainless steel Inorganic materials 0.000 description 16
- 239000000463 material Substances 0.000 description 11
- 239000002243 precursor Substances 0.000 description 11
- 238000002441 X-ray diffraction Methods 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 239000002184 metal Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 5
- 239000012452 mother liquor Substances 0.000 description 5
- FXADMRZICBQPQY-UHFFFAOYSA-N orthotelluric acid Chemical compound O[Te](O)(O)(O)(O)O FXADMRZICBQPQY-UHFFFAOYSA-N 0.000 description 5
- 238000001694 spray drying Methods 0.000 description 5
- -1 ammonium heptamolybdate tetrahydrate Chemical class 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 4
- 238000005191 phase separation Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000002207 thermal evaporation Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 239000001282 iso-butane Substances 0.000 description 3
- XNHGKSMNCCTMFO-UHFFFAOYSA-D niobium(5+);oxalate Chemical compound [Nb+5].[Nb+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O XNHGKSMNCCTMFO-UHFFFAOYSA-D 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000011949 solid catalyst Substances 0.000 description 3
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- XFHGGMBZPXFEOU-UHFFFAOYSA-I azanium;niobium(5+);oxalate Chemical compound [NH4+].[Nb+5].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O XFHGGMBZPXFEOU-UHFFFAOYSA-I 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- STNJBCKSHOAVAJ-UHFFFAOYSA-N Methacrolein Chemical compound CC(=C)C=O STNJBCKSHOAVAJ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/21—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen
- C07C51/215—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of saturated hydrocarbyl groups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/002—Mixed oxides other than spinels, e.g. perovskite
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/20—Vanadium, niobium or tantalum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/24—Chromium, molybdenum or tungsten
- B01J23/28—Molybdenum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0236—Drying, e.g. preparing a suspension, adding a soluble salt and drying
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/27—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation
- C07C45/32—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with molecular oxygen
- C07C45/33—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation with molecular oxygen of CHx-moieties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2523/00—Constitutive chemical elements of heterogeneous catalysts
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Catalysts (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
실시예 | 예비-건조 | 건 조 | 하 소 | 전환율(%) | 선택율(%) | 수율(%) |
1 | 용액 | 회전식 증발 | Ar 비-유동 | 69 | 55 | 38 |
2 | 용액 | 회전식 증발 | N2비-유동 | 49 | 57 | 28 |
3 | 용액 | 회전식 증발 | 공기 | 0 | - | 0 |
4 | 용액 | 공기 | Ar 비-유동 | 49 | 53 | 26 |
5 | 슬러리 | 회전실 증발 | Ar 비-유동 | 43 | 53 | 23 |
6 | 슬러리 | 회전식 증발 | N2유동 | 68 | 17 | 12 |
7 | 슬러리 | 냉동 건조 | Ar 비-유동 | 19 | 49 | 9 |
8 | 슬러리의침전물 | 공기 | Ar 비-유동 | 4 | 75 | 3 |
9 | 슬러리의 모액 | 회전식 증발 | Ar 비-유동 | 3 | 33 | 1 |
10 | 용액 | 회전식 증발 | Ar 비-유동 | 59 | 48 | 28 |
11 | 용액 | 회전식 증발 | Ar 유동 | 57 | 23 | 13 |
12 | 용액 | 회전식 증발 | Ar 비-유동 | 71 | 59 | 42 |
비 교 | 제조 변수 | 수율비 |
실시예 1/3 | 비활성 비-유동 / 공기 | 38 / 0 = 무한대 |
실시예 1/5 | 용액 / 슬러리 | 38 / 23 = 165% |
실시예 10/11 | 비-유동 / 유동 | 28/13 = 215% |
실시예 5/7 | 회전식 증발 / 냉동-건조 | 23 / 9 = 256% |
실시예 | 촉매내의 Te중량% |
5 | 13 |
6 | 9.8(이론값의 75%) |
Mo1Va0.3Te0.23Nb0.11O4.5 | 13 |
10 | 13 |
11 | 10 |
전구체내의 금속 중량% | ||||
실시예 | Mo | V | Te | Nb |
5 | 43.3 | 6.9 | 11.3 | 4.0 |
8 | 36.8 | 5.2 | 12.2 | 13.4 |
9 | 46.1 | 7.5 | 11.1 | 0.3 |
실시예 | 예비-건조 | 건 조 | 하 소 | 전환율(%) | 선택율(%) | 수율(%) |
13 | 슬러리 | 냉동-건조 | N2-유동 | 13 | 25 | 3.3 |
14 | 슬러리 | 열 증발 | N2-유동 | 1 | - | 0 |
15 | 슬러리 | 분사-건조 | N2-유동 | 51 | 1.6 | 0.8 |
16 | 슬러리 | 냉동-건조 | N2-유동 | 8 | 27 | 2.1 |
비 교 | 제조 변수 | 수율비 |
실시예 13 / 14 | 냉동-건조 / 열 증발 | 3.3/0 -> 무한대 |
실시예 16 / 15 | 냉동-건조 / 분사-건조 | 2.1 / 0.8 = 263% |
실시예 1 | 22.1° | 28.2° | 36.2° | 45.2° | 50.0° |
1 | X | X | X | X | X |
3 | O | O | O | O | O |
5 | X | X | X | X | X |
7 | X | X | X | X | X |
8 | X | X | O | X | O |
9 | X | X | O | O | X |
13 | X | X | X | X | X |
14 | X | X | X | O | X |
15 | X | O | O | X | O |
Claims (16)
- (A) 금속 화합물(이중 최소 하나는 산소 함유 화합물이다)과 최소 하나의 용 매를 혼합하여 용액을 형성하는 단계;(B) 상기 용액으로부터 용매를 제거하여 촉매 전구체를 얻는 단계; 및(C) 비활성 분위기하에 350 ~ 850℃의 온도에서 상기 촉매 전구체를 하소하 여 하기식AaMmNnXxOo을 갖는 촉매를 형성하는 단계;를 포함하는 촉매 제조 방법.(단, 상기식에서 0.25<a<0.98, 0.003<m<0.5, 0.003<n<0.5, 0.003<x<0.5이며, o는 다른 요소들의 산화 상태에 따라 다르며, A는 Mo, W, Fe, Nb, Ta, Zr, Ru 및 이들의 혼합물로부터 선택되며; M은 V, Ce, Cr 및 이들의 혼합물들로부터 선택되며; N은 Te, Bi, Sb, Se 및 이들의 혼합물로부터 선택되며; X는 Nb, Ta, W, Ti, Al,Zr, Cr, Mn, Fe, Ru, Co, Rh, Ni, Pd, Pt, Sb, Bi, B, In, Ce 및 이들의 혼합물로부터 선택된다.)
- 제1항에 있어서, 상기 촉매는 0.35<a<0.87, 0.045<m<0.37, 0.020<n<0.27, 및 0.005<x<0.35를 포함함을 특징으로 하는 방법.
- 제1항에 있어서, 상기 촉매는 400 ~ 800℃의 온도에서 하소됨을 특징으로 하는 방법.
- 제1항에 있어서, 상기 A는 Mo, W, 및 이들의 혼합물로부터 선택되며; M은 V, Ce, Cr 및 이들의 혼합물들로부터 선택되며; N은 Te, Bi, Sb, 및 이들의 혼합물로부터 선택되며; X는 Nb, Ta, Zr 및 이들의 혼합물로부터 선택됨을 특징으로 하는 방법.
- 제1항에 있어서, 상기 A는 Mo이며, M은 V이며, N은 Te이며, X는 Nb임을 특징으로 하는 방법.
- 제1항에 있어서, 상기 비활성 분위기는 아르곤과 질소중 최소 하나를 포함함을 특징으로 하는 방법.
- 제1항에 있어서, 상기 비활성 분위기는 상기 촉매 전구체의 표면상에서 흐르지 않음을 특징으로 하는 방법.
- 제1항에 있어서, 상기 용매는 회전식 증발, 진공 건조, 공기 건조 및 냉동-건조로부터 선택되는 방법에 의해 제거됨을 특징으로 하는 방법.
- (A) 금속 화합물(이중 최소 하나는 산소 함유 화합물이다)과 물을 혼합하여 수용액을 형성하는 단계;(B) 상기 수용액으로부터 물을 제거하여 촉매 전구체를 얻는 단계; 및(C) 비활성 분위기(상기 비활성 분위기는 상기 촉매 전구체 상에서 흐르지 않는다)하에 400 ~ 800℃의 온도에서 촉매 전구체를 하소하여 하기식AaMmNnXxOo을 갖는 촉매를 형성하는 단계;를 포함하는 촉매 제조 방법.(단, 상기식에서 0.35<a<0.87, 0.045<m<0.37, 0.020<n<0.27, 0.005<x<0.35이며, o는 다른 요소들의 산화 상태에 따라 다르며, A는 Mo, W 및 이들의 혼합물로부터 선택되며; M은 V, Ce, Cr 및 이들의 혼합물들로부터 선택되며; N은 Te, Bi, Sb, 및 이들의 혼합물로부터 선택되며; X는 Nb, Ta, Zr 및 이들의 혼합물로부터 선택된다.)
- 제1항의 방법에 따라 제조된 촉매.
- 제9항에 있어서, 상기 촉매는 0.35<a<0.87, 0.045<m<0.37, 0.020<n<0.27 및 0.005<x<0.35를 포함함을 특징으로 하는 촉매.
- 제9항에 있어서, 상기 A는 Mo이며, M은 V이며, N은 Te이며 X는 Nb임을 특징으로 하는 촉매.
- 제9항의 방법에 따라 제조된 촉매.
- 제1항의 방법에 의해 제조된 촉매 존재하에 알칸을 촉매 산화시키는 단계를 포함하는 불포화 알데히드 또는 카르복시산 제조 방법.
- 제9항의 방법에 의해 제조된 촉매 존재하에 알칸을 촉매 산화시키는 단계를 포함하는 불포화 알데히드 또는 카르복시산 제조 방법.
- 하기식을 갖는 화합물을 포함하는 촉매.AaMmNnXxOo(단, 상기식에서 0.25<a<0.98, 0.003<m<0.5, 0.003<n<0.5, 0.003<x<0.5이며, o는 다른 요소들의 산화 상태에 따라 다르며, A는 Mo, W, Fe, Nb, Ta, Zr, Ru 및 이들의 혼합물로부터 선택되며; M은 V, Ce, Cr 및 이들의 혼합물들로부터 선택되며; N은 Te, Bi, Sb, Se 및 이들의 혼합물로부터 선택되며; X는 Nb, Ta, W, Ti, Al, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ni, Pd, Pt, Sb, Bi, B, In, Ce 및 이들의 혼합물로부터 선택되며, 상기 촉매는 표면적이 BET 법에 의해 측정되어 2 ~ 10m2/g이다.)
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JP3393763B2 (ja) | 1996-08-28 | 2003-04-07 | 本田技研工業株式会社 | 燃料タンクのノズルブラケット構造 |
JPH10128112A (ja) | 1996-10-31 | 1998-05-19 | Sumitomo Chem Co Ltd | イソブタンの気相接触酸化反応用触媒およびその製造方法 |
ID20670A (id) * | 1997-08-05 | 1999-02-11 | Asahi Chemical Ind | Katalis amoksidasi untuk digunakan dalam memproduksi akrilonitril atau metakrilonitril dari propana atau isobutana dengan amoksidasi |
ID20720A (id) * | 1997-08-05 | 1999-02-18 | Asahi Chemical Ind | Larutan berair yang mengandung niobium untuk digunakan dalam pembuatan katalis oksida yang mengandung niobium |
US6013597A (en) * | 1997-09-17 | 2000-01-11 | Saudi Basic Industries Corporation | Catalysts for the oxidation of ethane to acetic acid processes of making same and, processes of using same |
UA51701C2 (uk) * | 1997-10-15 | 2002-12-16 | Асахі Касеі Когіо Кабусікі Кайся | Каталізатор амоксидування та спосіб одержання акрилонітрилу або метакрилонітрилу |
-
1999
- 1999-05-07 CA CA002271397A patent/CA2271397A1/en not_active Abandoned
- 1999-05-11 DE DE69919416T patent/DE69919416T2/de not_active Expired - Lifetime
- 1999-05-11 EP EP99303655A patent/EP0962253B1/en not_active Expired - Lifetime
- 1999-05-11 ES ES99303655T patent/ES2327475T3/es not_active Expired - Lifetime
- 1999-05-11 DE DE69941141T patent/DE69941141D1/de not_active Expired - Lifetime
- 1999-05-12 CN CNB991064674A patent/CN1153624C/zh not_active Expired - Lifetime
- 1999-05-20 BR BR9901568-4A patent/BR9901568A/pt not_active Application Discontinuation
- 1999-05-21 KR KR1019990018390A patent/KR100613240B1/ko not_active IP Right Cessation
- 1999-05-21 TW TW088108383A patent/TW486383B/zh not_active IP Right Cessation
- 1999-05-21 US US09/316,007 patent/US6180825B1/en not_active Expired - Lifetime
- 1999-05-21 JP JP14180299A patent/JP4390906B2/ja not_active Expired - Lifetime
- 1999-10-22 US US09/425,671 patent/US6514903B2/en not_active Expired - Lifetime
- 1999-10-22 US US09/425,670 patent/US6514901B1/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100809484B1 (ko) * | 2000-09-28 | 2008-03-03 | 롬 앤드 하스 캄파니 | Ir 및/또는 sm증진된 멀티-금속산화물 촉매 |
KR100809460B1 (ko) * | 2000-09-28 | 2008-03-06 | 롬 앤드 하스 캄파니 | Zn 및/또는 ga 증진된 멀티-금속산화물 촉매 |
KR101038424B1 (ko) * | 2002-05-01 | 2011-06-01 | 롬 앤드 하스 캄파니 | 지지된 혼합 금속 산화물 촉매 |
Also Published As
Publication number | Publication date |
---|---|
EP0962253A2 (en) | 1999-12-08 |
CN1236672A (zh) | 1999-12-01 |
US20010049336A1 (en) | 2001-12-06 |
EP0962253B1 (en) | 2009-07-22 |
ES2327475T3 (es) | 2009-10-29 |
JP2000024501A (ja) | 2000-01-25 |
US6180825B1 (en) | 2001-01-30 |
CA2271397A1 (en) | 1999-11-21 |
JP4390906B2 (ja) | 2009-12-24 |
DE69919416D1 (de) | 2004-09-16 |
EP0962253A3 (en) | 2000-03-08 |
TW486383B (en) | 2002-05-11 |
DE69941141D1 (de) | 2009-09-03 |
US6514901B1 (en) | 2003-02-04 |
CN1153624C (zh) | 2004-06-16 |
US6514903B2 (en) | 2003-02-04 |
DE69919416T2 (de) | 2005-08-11 |
KR100613240B1 (ko) | 2006-08-18 |
BR9901568A (pt) | 1999-12-21 |
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