NO20076104L - Fremgangsmate for produksjon av solcelle og solcelle, og fremgangsmate for produksjon av halvlederinnretning - Google Patents
Fremgangsmate for produksjon av solcelle og solcelle, og fremgangsmate for produksjon av halvlederinnretningInfo
- Publication number
- NO20076104L NO20076104L NO20076104A NO20076104A NO20076104L NO 20076104 L NO20076104 L NO 20076104L NO 20076104 A NO20076104 A NO 20076104A NO 20076104 A NO20076104 A NO 20076104A NO 20076104 L NO20076104 L NO 20076104L
- Authority
- NO
- Norway
- Prior art keywords
- solar cell
- producing
- coating material
- diffusion layer
- semiconductor device
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 4
- 238000009792 diffusion process Methods 0.000 abstract 5
- 239000011248 coating agent Substances 0.000 abstract 4
- 238000000576 coating method Methods 0.000 abstract 4
- 239000000463 material Substances 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 239000002019 doping agent Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 238000005215 recombination Methods 0.000 abstract 1
- 230000006798 recombination Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells back-junction, i.e. rearside emitter, solar cells, e.g. interdigitated base-emitter regions back-junction cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005127950A JP4481869B2 (ja) | 2005-04-26 | 2005-04-26 | 太陽電池の製造方法及び太陽電池並びに半導体装置の製造方法 |
PCT/JP2006/307595 WO2006117980A1 (ja) | 2005-04-26 | 2006-04-11 | 太陽電池の製造方法及び太陽電池並びに半導体装置の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
NO20076104L true NO20076104L (no) | 2008-01-25 |
Family
ID=37307783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20076104A NO20076104L (no) | 2005-04-26 | 2007-11-26 | Fremgangsmate for produksjon av solcelle og solcelle, og fremgangsmate for produksjon av halvlederinnretning |
Country Status (11)
Country | Link |
---|---|
US (1) | US20090020158A1 (de) |
EP (1) | EP1876651B1 (de) |
JP (1) | JP4481869B2 (de) |
KR (1) | KR101216996B1 (de) |
CN (1) | CN101167191B (de) |
AU (1) | AU2006242030B2 (de) |
ES (1) | ES2764073T3 (de) |
NO (1) | NO20076104L (de) |
RU (1) | RU2007139437A (de) |
TW (1) | TWI408816B (de) |
WO (1) | WO2006117980A1 (de) |
Families Citing this family (111)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6262229A (ja) * | 1985-09-13 | 1987-03-18 | Minolta Camera Co Ltd | 多分割測光装置を有するカメラ |
EP1964165B1 (de) * | 2005-12-21 | 2018-03-14 | Sunpower Corporation | Verfahren zur herstellung von solarzellen mit rückseitigem kontakt |
KR101223018B1 (ko) * | 2006-12-28 | 2013-01-17 | 엘지전자 주식회사 | 태양전지의 선택적 에미터 형성방법 및 선택적 에미터형성장치 |
KR101173625B1 (ko) | 2006-12-29 | 2012-08-13 | 엘지전자 주식회사 | 태양전지의 선택적 에미터 형성방법 및 선택적 에미터형성장치 |
JP2008186927A (ja) * | 2007-01-29 | 2008-08-14 | Sharp Corp | 裏面接合型太陽電池とその製造方法 |
KR101382098B1 (ko) * | 2007-05-02 | 2014-04-04 | 엘지전자 주식회사 | 태양전지의 선택적 에미터 형성방법 및 태양전지의제조방법 |
RU2369941C2 (ru) | 2007-08-01 | 2009-10-10 | Броня Цой | Преобразователь электромагнитного излучения (варианты) |
JP5236914B2 (ja) * | 2007-09-19 | 2013-07-17 | シャープ株式会社 | 太陽電池の製造方法 |
JP4650842B2 (ja) * | 2007-12-18 | 2011-03-16 | 三菱電機株式会社 | 太陽電池の製造方法 |
JP5329107B2 (ja) * | 2008-02-28 | 2013-10-30 | 三洋電機株式会社 | 太陽電池及びその製造方法 |
US8461032B2 (en) * | 2008-03-05 | 2013-06-11 | Varian Semiconductor Equipment Associates, Inc. | Use of dopants with different diffusivities for solar cell manufacture |
CN101552295A (zh) | 2008-04-03 | 2009-10-07 | 清华大学 | 太阳能电池 |
CN101562204B (zh) | 2008-04-18 | 2011-03-23 | 鸿富锦精密工业(深圳)有限公司 | 太阳能电池 |
CN101527327B (zh) | 2008-03-07 | 2012-09-19 | 清华大学 | 太阳能电池 |
US8361834B2 (en) * | 2008-03-18 | 2013-01-29 | Innovalight, Inc. | Methods of forming a low resistance silicon-metal contact |
KR101631711B1 (ko) | 2008-03-21 | 2016-06-17 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 확산용 인 페이스트 및 그것을 이용한 태양 전지의 제조 방법 |
TWI459568B (zh) * | 2008-03-21 | 2014-11-01 | Hon Hai Prec Ind Co Ltd | 太陽能電池 |
DE102008019402A1 (de) * | 2008-04-14 | 2009-10-15 | Gebr. Schmid Gmbh & Co. | Verfahren zur selektiven Dotierung von Silizium sowie damit behandeltes Silizium-Substrat |
EP2279526A4 (de) * | 2008-04-18 | 2015-11-04 | 1366 Tech Inc | Verfahren zur strukturierung von diffusionsschichten bei solarzellen und auf diese weise hergestellte solarzellen |
CN102187469B (zh) * | 2008-05-20 | 2015-03-25 | 布罗尼亚·措伊 | 电磁辐射转换器和电池 |
JP4712073B2 (ja) * | 2008-07-11 | 2011-06-29 | 三菱電機株式会社 | 太陽電池用拡散層の製造方法および太陽電池セルの製造方法 |
US8053867B2 (en) | 2008-08-20 | 2011-11-08 | Honeywell International Inc. | Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants |
JP2010056465A (ja) * | 2008-08-29 | 2010-03-11 | Shin-Etsu Chemical Co Ltd | 拡散用ボロンペースト及びそれを用いた太陽電池の製造方法 |
US7951696B2 (en) | 2008-09-30 | 2011-05-31 | Honeywell International Inc. | Methods for simultaneously forming N-type and P-type doped regions using non-contact printing processes |
CN102246275B (zh) * | 2008-10-29 | 2014-04-30 | 英诺瓦莱特公司 | 在基片上形成多掺杂结的方法 |
JP2010118473A (ja) * | 2008-11-12 | 2010-05-27 | PVG Solutions株式会社 | 太陽電池セルおよびその製造方法 |
GB0820684D0 (en) * | 2008-11-12 | 2008-12-17 | Silicon Cpv Plc | Photovoltaic solar cells |
US8518170B2 (en) | 2008-12-29 | 2013-08-27 | Honeywell International Inc. | Boron-comprising inks for forming boron-doped regions in semiconductor substrates using non-contact printing processes and methods for fabricating such boron-comprising inks |
US7820532B2 (en) * | 2008-12-29 | 2010-10-26 | Honeywell International Inc. | Methods for simultaneously forming doped regions having different conductivity-determining type element profiles |
JP2010157654A (ja) * | 2009-01-05 | 2010-07-15 | Sharp Corp | 半導体装置の製造方法 |
JP2010161317A (ja) * | 2009-01-09 | 2010-07-22 | Tokyo Ohka Kogyo Co Ltd | 拡散剤組成物、不純物拡散層の形成方法、および太陽電池 |
KR101145928B1 (ko) * | 2009-03-11 | 2012-05-15 | 엘지전자 주식회사 | 태양 전지 및 태양 전지의 제조 방법 |
JP2010251667A (ja) * | 2009-04-20 | 2010-11-04 | Sanyo Electric Co Ltd | 太陽電池 |
JPWO2010122935A1 (ja) * | 2009-04-23 | 2012-10-25 | シャープ株式会社 | 配線シート、配線シート付き太陽電池セルおよび太陽電池モジュール |
US8749053B2 (en) | 2009-06-23 | 2014-06-10 | Intevac, Inc. | Plasma grid implant system for use in solar cell fabrications |
US20110183504A1 (en) * | 2010-01-25 | 2011-07-28 | Innovalight, Inc. | Methods of forming a dual-doped emitter on a substrate with an inline diffusion apparatus |
US20110003466A1 (en) * | 2009-07-02 | 2011-01-06 | Innovalight, Inc. | Methods of forming a multi-doped junction with porous silicon |
US8163587B2 (en) | 2009-07-02 | 2012-04-24 | Innovalight, Inc. | Methods of using a silicon nanoparticle fluid to control in situ a set of dopant diffusion profiles |
US8138070B2 (en) * | 2009-07-02 | 2012-03-20 | Innovalight, Inc. | Methods of using a set of silicon nanoparticle fluids to control in situ a set of dopant diffusion profiles |
US8420517B2 (en) * | 2009-07-02 | 2013-04-16 | Innovalight, Inc. | Methods of forming a multi-doped junction with silicon-containing particles |
TW201104822A (en) * | 2009-07-20 | 2011-02-01 | E Ton Solar Tech Co Ltd | Aligning method of patterned electrode in a selective emitter structure |
US8324089B2 (en) | 2009-07-23 | 2012-12-04 | Honeywell International Inc. | Compositions for forming doped regions in semiconductor substrates, methods for fabricating such compositions, and methods for forming doped regions using such compositions |
NL2003324C2 (en) * | 2009-07-31 | 2011-02-02 | Otb Solar Bv | Photovoltaic cell with a selective emitter and method for making the same. |
JP5815215B2 (ja) * | 2009-08-27 | 2015-11-17 | 東京応化工業株式会社 | 拡散剤組成物、および不純物拡散層の形成方法 |
NL2003511C2 (en) * | 2009-09-18 | 2011-03-22 | Solar Cell Company Holding B V | Method for fabricating a photovoltaic cell and a photovoltaic cell obtained using such a method. |
JP5495777B2 (ja) * | 2009-12-25 | 2014-05-21 | 京セラ株式会社 | 太陽電池モジュール |
JP5626339B2 (ja) * | 2010-04-23 | 2014-11-19 | 日立化成株式会社 | n型拡散層形成組成物、n型拡散層の製造方法、及び太陽電池素子の製造方法 |
FR2959870B1 (fr) * | 2010-05-06 | 2012-05-18 | Commissariat Energie Atomique | Cellule photovoltaique comportant une zone suspendue par un motif conducteur et procede de realisation. |
JP4831709B2 (ja) * | 2010-05-21 | 2011-12-07 | シャープ株式会社 | 半導体装置および半導体装置の製造方法 |
JP5434792B2 (ja) * | 2010-05-21 | 2014-03-05 | 信越化学工業株式会社 | 太陽電池の製造方法及び太陽電池 |
DE102010024309A1 (de) * | 2010-06-18 | 2011-12-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer photovoltaischen Solarzelle |
DE102010024308A1 (de) * | 2010-06-18 | 2011-12-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung einer selektiven Dotierstruktur in einem Halbleitersubstrat zur Herstellung einer photovoltaischen Solarzelle |
WO2011160272A1 (zh) * | 2010-06-21 | 2011-12-29 | 常州天合光能有限公司 | 一种高方阻太阳电池制作方法 |
WO2012012167A1 (en) | 2010-06-30 | 2012-01-26 | Innovalight, Inc | Methods of forming a floating junction on a solar cell with a particle masking layer |
JP2012049424A (ja) * | 2010-08-30 | 2012-03-08 | Shin Etsu Chem Co Ltd | 太陽電池及びその製造方法 |
JP5379767B2 (ja) * | 2010-09-02 | 2013-12-25 | PVG Solutions株式会社 | 太陽電池セルおよびその製造方法 |
JP2012069881A (ja) * | 2010-09-27 | 2012-04-05 | Sanyo Electric Co Ltd | 太陽電池及びその製造方法 |
CN102185005A (zh) * | 2010-10-18 | 2011-09-14 | 江阴浚鑫科技有限公司 | 一种选择性发射极电池的制作方法 |
JP5666254B2 (ja) * | 2010-11-11 | 2015-02-12 | 東京応化工業株式会社 | 拡散剤組成物および不純物拡散層の形成方法 |
KR20140009984A (ko) * | 2010-11-17 | 2014-01-23 | 히타치가세이가부시끼가이샤 | 태양 전지의 제조 방법 |
JP5139502B2 (ja) * | 2010-11-17 | 2013-02-06 | シャープ株式会社 | 裏面電極型太陽電池 |
CN103155164B (zh) * | 2010-11-17 | 2016-08-10 | 日立化成株式会社 | 太阳能电池的制造方法 |
JP4978759B1 (ja) * | 2010-11-17 | 2012-07-18 | 日立化成工業株式会社 | 太陽電池の製造方法 |
KR101114198B1 (ko) | 2010-12-31 | 2012-03-13 | 현대중공업 주식회사 | 국부화 에미터 태양전지 및 그 제조 방법 |
KR101198430B1 (ko) * | 2010-12-31 | 2012-11-06 | 현대중공업 주식회사 | 양면 수광형 국부화 에미터 태양전지 및 그 제조 방법 |
KR101199213B1 (ko) | 2010-12-31 | 2012-11-07 | 현대중공업 주식회사 | 양면 수광형 국부화 에미터 태양전지 및 그 제조 방법 |
WO2012096018A1 (ja) * | 2011-01-13 | 2012-07-19 | 日立化成工業株式会社 | p型拡散層形成組成物、p型拡散層の製造方法及び太陽電池素子の製造方法 |
CN103283001A (zh) * | 2011-03-08 | 2013-09-04 | 可持续能源联盟有限责任公司 | 蓝光响应增强的高效黑硅光伏器件 |
WO2012132758A1 (ja) * | 2011-03-28 | 2012-10-04 | 三洋電機株式会社 | 光電変換装置及び光電変換装置の製造方法 |
JP5978564B2 (ja) * | 2011-05-26 | 2016-08-24 | 日立化成株式会社 | 半導体基板用パッシベーション膜形成用材料、半導体基板用パッシベーション膜及びその製造方法、並びに太陽電池素子及びその製造方法 |
WO2012161135A1 (ja) | 2011-05-26 | 2012-11-29 | 日立化成工業株式会社 | 半導体基板用パッシベーション膜形成用材料、半導体基板用パッシベーション膜及びその製造方法、並びに太陽電池素子及びその製造方法 |
EP2743967A4 (de) * | 2011-07-19 | 2015-06-03 | Hitachi Chemical Co Ltd | Zusammensetzung zur formung einer n-leitenden diffusionsschicht, herstellungsverfahren für eine n-leitende diffusionsschicht und herstellungsverfahren für ein solarzellenelement |
EP2728624A4 (de) * | 2011-07-25 | 2015-05-27 | Hitachi Chemical Co Ltd | Halbleitersubstrat, herstellungsverfahren dafür, solarzellenelement und solarzelle |
KR101541657B1 (ko) * | 2011-07-25 | 2015-08-03 | 히타치가세이가부시끼가이샤 | 태양 전지 기판, 태양 전지 기판의 제조 방법, 태양 전지 소자 및 태양 전지 |
US8629294B2 (en) | 2011-08-25 | 2014-01-14 | Honeywell International Inc. | Borate esters, boron-comprising dopants, and methods of fabricating boron-comprising dopants |
KR101969032B1 (ko) * | 2011-09-07 | 2019-04-15 | 엘지전자 주식회사 | 태양전지 및 이의 제조방법 |
US8975170B2 (en) | 2011-10-24 | 2015-03-10 | Honeywell International Inc. | Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions |
US9324598B2 (en) | 2011-11-08 | 2016-04-26 | Intevac, Inc. | Substrate processing system and method |
TWI424584B (zh) | 2011-11-30 | 2014-01-21 | Au Optronics Corp | 製作太陽能電池之方法 |
KR101860919B1 (ko) * | 2011-12-16 | 2018-06-29 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
JP5892178B2 (ja) * | 2012-01-10 | 2016-03-23 | 日立化成株式会社 | n型拡散層形成組成物セット、n型拡散層付き半導体基板の製造方法、及び太陽電池素子の製造方法 |
KR101894585B1 (ko) | 2012-02-13 | 2018-09-04 | 엘지전자 주식회사 | 태양전지 |
TWI584486B (zh) * | 2012-02-24 | 2017-05-21 | Pvg Solutions Inc | Solar cell and manufacturing method thereof |
KR102039611B1 (ko) * | 2012-05-22 | 2019-11-01 | 주성엔지니어링(주) | 기판형 태양 전지 및 그의 제조 방법, 기판형 태양 전지의 도핑 방법 및 장치 |
US9812590B2 (en) | 2012-10-25 | 2017-11-07 | Sunpower Corporation | Bifacial solar cell module with backside reflector |
JPWO2014098016A1 (ja) * | 2012-12-18 | 2017-01-12 | PVG Solutions株式会社 | 太陽電池セル及びその製造方法 |
MY178951A (en) | 2012-12-19 | 2020-10-23 | Intevac Inc | Grid for plasma ion implant |
US9755095B2 (en) * | 2013-03-15 | 2017-09-05 | Mtpv Power Corporation | Method and structure for multicell devices without physical isolation |
KR20140126819A (ko) * | 2013-04-22 | 2014-11-03 | 엘지전자 주식회사 | 태양 전지 |
CN103489934B (zh) * | 2013-09-25 | 2016-03-02 | 晶澳(扬州)太阳能科技有限公司 | 一种双面透光的局部铝背场太阳能电池及其制备方法 |
CN104638058A (zh) * | 2013-11-15 | 2015-05-20 | 江苏天宇光伏科技有限公司 | 一种降低成本提高转换效率的高方阻扩散工艺方法 |
JP6144778B2 (ja) * | 2013-12-13 | 2017-06-07 | 信越化学工業株式会社 | 太陽電池の製造方法 |
KR101861172B1 (ko) * | 2014-07-09 | 2018-05-28 | 엘지전자 주식회사 | 태양 전지 |
JP5830143B1 (ja) * | 2014-08-25 | 2015-12-09 | 信越化学工業株式会社 | 太陽電池セルの製造方法 |
JP2016066771A (ja) * | 2014-09-17 | 2016-04-28 | 日立化成株式会社 | 太陽電池素子の製造方法 |
JP6502651B2 (ja) * | 2014-11-13 | 2019-04-17 | 信越化学工業株式会社 | 太陽電池の製造方法及び太陽電池モジュールの製造方法 |
JP5938113B1 (ja) * | 2015-01-05 | 2016-06-22 | 信越化学工業株式会社 | 太陽電池用基板の製造方法 |
JP6805155B2 (ja) * | 2015-01-26 | 2020-12-23 | 1366 テクノロジーズ インク. | プロファイルされたドーピングを有する半導体ウェハを生成する方法、ならびに、ドリフト電場および裏面電界などのプロファイル場を有するウェハおよびソーラセルコンポーネント |
WO2016143025A1 (ja) * | 2015-03-09 | 2016-09-15 | 東芝三菱電機産業システム株式会社 | 太陽電池の製造方法 |
JP6401094B2 (ja) * | 2015-03-27 | 2018-10-03 | 信越化学工業株式会社 | 太陽電池の製造方法 |
JP2015213177A (ja) * | 2015-06-15 | 2015-11-26 | 日立化成株式会社 | n型拡散層形成組成物、n型拡散層の製造方法、太陽電池素子の製造方法、及び太陽電池 |
JP1546719S (de) * | 2015-08-19 | 2019-03-18 | ||
CN107980181A (zh) * | 2015-08-28 | 2018-05-01 | 三菱电机株式会社 | 太阳能电池单元以及太阳能电池单元的制造方法 |
TW201740574A (zh) * | 2016-05-13 | 2017-11-16 | 昱晶能源科技股份有限公司 | 太陽能電池及其製造方法 |
CN109844960B (zh) * | 2016-10-05 | 2022-11-29 | 信越化学工业株式会社 | 高光电变换效率太阳能电池的制造方法及高光电变换效率太阳能电池 |
US20190348548A1 (en) | 2018-05-09 | 2019-11-14 | International Business Machines Corporation | Solar cell with reduced surface recombination |
JP6619483B2 (ja) * | 2018-07-24 | 2019-12-11 | 信越化学工業株式会社 | 太陽電池の製造方法 |
CN114342101A (zh) * | 2019-09-26 | 2022-04-12 | 东丽株式会社 | 杂质扩散组合物、使用了该杂质扩散组合物的半导体元件的制造方法及太阳能电池的制造方法 |
CN111952417A (zh) * | 2020-08-24 | 2020-11-17 | 晶科绿能(上海)管理有限公司 | 一种太阳能电池及其制备方法 |
CN113644152B (zh) * | 2021-07-23 | 2024-10-18 | 杭州电子科技大学 | 一种薄化晶硅电池组件 |
CN118431312A (zh) * | 2024-04-16 | 2024-08-02 | 隆基绿能科技股份有限公司 | 一种太阳能电池及光伏组件 |
Family Cites Families (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US616258A (en) * | 1898-12-20 | Door-hinge | ||
US4131488A (en) * | 1975-12-31 | 1978-12-26 | Motorola, Inc. | Method of semiconductor solar energy device fabrication |
US4104091A (en) * | 1977-05-20 | 1978-08-01 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Application of semiconductor diffusants to solar cells by screen printing |
US4152824A (en) | 1977-12-30 | 1979-05-08 | Mobil Tyco Solar Energy Corporation | Manufacture of solar cells |
JPS5963741A (ja) * | 1982-10-04 | 1984-04-11 | Matsushita Electronics Corp | 半導体装置の製造方法 |
JPS6366929A (ja) * | 1986-09-08 | 1988-03-25 | Tokyo Ohka Kogyo Co Ltd | アンチモン拡散用シリカ系被膜形成組成物 |
JPS63260126A (ja) * | 1987-04-17 | 1988-10-27 | Sony Corp | 半導体装置の製造方法 |
JPS647518A (en) * | 1987-06-30 | 1989-01-11 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS6417425A (en) * | 1987-07-13 | 1989-01-20 | Matsushita Electronics Corp | Manufacture of semiconductor device |
JPH06105694B2 (ja) * | 1987-08-13 | 1994-12-21 | 富士電機株式会社 | ボロンの固相拡散方法 |
JPH01205417A (ja) * | 1988-02-12 | 1989-08-17 | Hitachi Ltd | 半導体装置の製造方法 |
JPH05283352A (ja) * | 1992-04-03 | 1993-10-29 | Rohm Co Ltd | 半導体装置の製造法 |
JP2647304B2 (ja) * | 1992-05-22 | 1997-08-27 | 東京応化工業株式会社 | ドーパント拡散被膜形成用塗布液 |
JP2928433B2 (ja) * | 1993-02-23 | 1999-08-03 | シャープ株式会社 | 光電変換素子の製造方法 |
JP3032422B2 (ja) * | 1994-04-28 | 2000-04-17 | シャープ株式会社 | 太陽電池セルとその製造方法 |
DE19508712C2 (de) | 1995-03-10 | 1997-08-07 | Siemens Solar Gmbh | Solarzelle mit Back-Surface-Field und Verfahren zur Herstellung |
JPH08283100A (ja) * | 1995-04-07 | 1996-10-29 | Mitsubishi Materials Corp | リン拡散用組成物 |
US5641362A (en) * | 1995-11-22 | 1997-06-24 | Ebara Solar, Inc. | Structure and fabrication process for an aluminum alloy junction self-aligned back contact silicon solar cell |
JPH09283458A (ja) * | 1996-04-12 | 1997-10-31 | Toshiba Corp | 半導体用塗布拡散剤 |
JPH1070296A (ja) * | 1996-08-27 | 1998-03-10 | Sharp Corp | 太陽電池及びその製造方法 |
US6162658A (en) * | 1996-10-14 | 2000-12-19 | Unisearch Limited | Metallization of buried contact solar cells |
JP3326343B2 (ja) * | 1996-12-10 | 2002-09-24 | シャープ株式会社 | 太陽電池セルを製造するための方法と治具 |
US6552414B1 (en) * | 1996-12-24 | 2003-04-22 | Imec Vzw | Semiconductor device with selectively diffused regions |
JPH11220153A (ja) * | 1998-01-29 | 1999-08-10 | Nippon Telegr & Teleph Corp <Ntt> | 太陽電池の作製方法 |
JP2000091254A (ja) * | 1998-09-11 | 2000-03-31 | Oki Electric Ind Co Ltd | Zn固相拡散方法およびこれを用いた発光素子 |
JP2000183379A (ja) * | 1998-12-11 | 2000-06-30 | Sanyo Electric Co Ltd | 太陽電池の製造方法 |
DE19910816A1 (de) * | 1999-03-11 | 2000-10-05 | Merck Patent Gmbh | Dotierpasten zur Erzeugung von p,p+ und n,n+ Bereichen in Halbleitern |
JP2002124692A (ja) * | 2000-10-13 | 2002-04-26 | Hitachi Ltd | 太陽電池およびその製造方法 |
DE10150040A1 (de) * | 2001-10-10 | 2003-04-17 | Merck Patent Gmbh | Kombinierte Ätz- und Dotiermedien |
US7141644B2 (en) * | 2002-01-11 | 2006-11-28 | Xerox Corporation | Polthiophenes and devices thereof |
JP2003224285A (ja) * | 2002-01-31 | 2003-08-08 | Sharp Corp | 太陽電池の製造方法および製造装置 |
US6777729B1 (en) | 2002-09-25 | 2004-08-17 | International Radiation Detectors, Inc. | Semiconductor photodiode with back contacts |
JP2004193350A (ja) * | 2002-12-11 | 2004-07-08 | Sharp Corp | 太陽電池セルおよびその製造方法 |
JP2004221149A (ja) * | 2003-01-10 | 2004-08-05 | Hitachi Ltd | 太陽電池の製造方法 |
JP2004273826A (ja) * | 2003-03-10 | 2004-09-30 | Sharp Corp | 光電変換装置及びその製造方法 |
JP2004281569A (ja) | 2003-03-13 | 2004-10-07 | Kyocera Corp | 太陽電池素子の製造方法 |
JP2005072120A (ja) * | 2003-08-21 | 2005-03-17 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
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KR20080003840A (ko) | 2008-01-08 |
TWI408816B (zh) | 2013-09-11 |
EP1876651B1 (de) | 2019-11-13 |
AU2006242030B2 (en) | 2011-06-23 |
KR101216996B1 (ko) | 2013-01-02 |
US20090020158A1 (en) | 2009-01-22 |
EP1876651A1 (de) | 2008-01-09 |
CN101167191B (zh) | 2010-12-08 |
ES2764073T3 (es) | 2020-06-02 |
CN101167191A (zh) | 2008-04-23 |
JP4481869B2 (ja) | 2010-06-16 |
JP2006310373A (ja) | 2006-11-09 |
WO2006117980A1 (ja) | 2006-11-09 |
TW200703698A (en) | 2007-01-16 |
EP1876651A4 (de) | 2013-09-11 |
RU2007139437A (ru) | 2009-06-10 |
AU2006242030A1 (en) | 2006-11-09 |
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