KR102279411B1 - Vapor deposition apparatus and evaporation source - Google Patents

Abstract

[Problem] It is possible to prevent reflection or re-evaporation of the film-forming material to the evaporation source and deposition on the members surrounding the evaporation source even in a configuration in which the cross section of the opening of the evaporator located at the outermost part is inclined toward the outside in the longitudinal direction of the evaporation source Provision of deposition apparatus and evaporation source.
[Solution Means] A container 1 in which a film-forming material is accommodated, a plurality of evaporation ports 2a and 2b provided along the longitudinal direction of the container 1, and an evaporation source peripheral member provided around the container 1 A vapor deposition apparatus having an evaporation source including (3), wherein a pair of outer evaporation ports (2a) provided at the outermost among the plurality of evaporation ports (2a, 2b) each face the outside in the longitudinal direction of the container (1). It has an opening cross-section that is inclined so as to allow the vessel 1 and the evaporation source peripheral member 3 to enter inside the imaginary plane without protruding outward than the imaginary plane including the opening cross-section.

Description

Evaporation apparatus and evaporation source {VAPOR DEPOSITION APPARATUS AND EVAPORATION SOURCE}

The present invention relates to a deposition apparatus and an evaporation source.

In Japanese Patent Application No. 2014-265981, which is an earlier application of the applicant, the applicant inclines the opening cross-section of the evaporating port located on the outside of the plurality of evaporating ports installed in the evaporation source toward the outside in the longitudinal direction of the evaporation source. Thus, a vacuum vapor deposition apparatus is proposed in which a vapor deposition film having a uniform film thickness distribution and suppressed shadow in a formed pattern can be obtained even if the evaporation port is not widely arranged and installed outwardly in the longitudinal direction.

However, as described above, when the opening end face of the evaporation port B of the evaporation source A is inclined to face outward in the longitudinal direction of the evaporation source, the scattering range of the evaporated film-forming material discharged from the inclined opening end face is the evaporation source. As shown in FIG. 1 , there is a problem in that the evaporation source A extends over both ends (the range indicated by C in FIG. 1 ) (generally, the emission angle distribution of the film forming material discharged from the evaporation port is the opening It scatters forward from the imaginary plane including the opening section according to the cosmic law with the direction of the normal to 0°).

When the scattering range of the film-forming material directly spans the evaporation source, since the evaporation source is being heated, the scattered film-forming material is reflected or re-evaporated from the evaporation source and reaches the substrate, possibly affecting the film thickness distribution.

Further, when the evaporation source is covered by the cooling member, the film-forming material is deposited on the cooling member spanning the scattering range of the film-forming material. The deposits on the cooling member are difficult to re-evaporate, grow slowly, and there is a possibility that the opening of the evaporator portion will be blocked at some point.

The present invention has been made in view of the above-described phenomenon, and even in a configuration in which the cross section of the opening of the evaporator located at the outermost portion is inclined toward the outside in the longitudinal direction of the evaporator, reflection or re-evaporation of the film-forming material to the evaporator and to provide a vapor deposition apparatus and an evaporation source capable of preventing deposition on members around the evaporation source.

An evaporation source comprising a container in which a film-forming material is accommodated, a plurality of evaporation ports provided along the longitudinal direction of the container, and an evaporation source peripheral member provided around the container, wherein the film-forming material is removed from the evaporation port A vapor deposition apparatus configured to form a vapor deposition film on a substrate by discharging, wherein a pair of outer evaporator portions provided at the outermost among the plurality of evaporator portions each have an opening cross-section that is inclined to face outward in the longitudinal direction of the container, and the vessel and the evaporation source peripheral member are configured to enter inside the imaginary plane without protruding outward than the imaginary plane including the opening cross-section.

According to the present invention, by configuring as described above, even in a configuration in which the cross section of the opening of the evaporator located at the outermost portion is inclined to face outward in the long longitudinal direction of the evaporation source, the film-forming material is reflected or re-evaporated to the evaporation source and as a member around the evaporation source. It becomes a deposition device and evaporation source that can prevent the deposition of

BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic explanatory drawing of a background art.
Fig. 2 is an enlarged schematic explanatory cross-sectional view of the present embodiment.
3 is a schematic explanatory cross-sectional view of the present embodiment.
4 is a schematic diagram of the main part of the present embodiment.
5 is an enlarged schematic explanatory cross-sectional view of another example 1. FIG.
6 is a schematic explanatory cross-sectional view of another example 2. FIG.
7 is an enlarged schematic explanatory cross-sectional view of another example 3;
Fig. 8 is a schematic explanatory front view of another example 4;
9 is a schematic explanatory side view of another example 4;
It is a schematic explanatory front view of a vapor deposition apparatus.
11 is a schematic explanatory side view of the vapor deposition apparatus.

The preferred embodiment of the present invention will be briefly described with reference to the drawings, showing the action of the present invention.

A vapor deposition film is formed on the substrate by discharging the vaporized film forming material from the evaporation ports 2a and 2b of the container 1 .

At this time, the container 1 and the evaporation source peripheral members 3 such as the heating member and the cooling member do not protrude outward from the imaginary plane including the open cross-section of the outer evaporation port portion 2a, that is, the outer evaporation port portion ( Since the container 1 and the evaporation source peripheral member 3 do not exist in the region where the film forming material discharged from the opening end face of 2a) is caught, the container 1 of the film forming material discharged from the open end face of the outer evaporator portion 2a. It is possible to prevent reflection or flashback of the furnace and deposition on the member 3 around the evaporation source.

[Example]

Specific embodiments of the present invention will be described with reference to the drawings.

This embodiment is an example in which the present invention is applied to the deposition apparatus as shown in FIGS. 10 and 11 . In this vapor deposition apparatus, in order to form a thin film on the substrate 21 in a vacuum chamber 20 maintaining a reduced pressure atmosphere, an evaporation source 25 for emitting a film forming material is disposed and installed at a position opposite to the substrate 21 . and a film thickness monitor 22 for monitoring the evaporation rate of the vaporized particles emitted from the evaporation source 25, and a film thickness meter 23 installed outside the vacuum chamber 20 to convert the monitored amount of vaporized particles into a film thickness ) and a heater power supply 24 for heating the evaporation source 25 in order to control the evaporation rate of the film forming material so that the converted film thickness becomes a desired film thickness. In addition, a relative movement mechanism for relatively moving the substrate 21 and the evaporation source 25 is provided, and by forming the film while relatively moving, a vapor deposition film having a uniform film thickness can be formed over the entire surface of the substrate.

In addition, the vessel 1 and the substrate disposed at a position opposite to the vessel 1 move relatively in a direction orthogonal to the longitudinal direction of the vessel 1 , and form the film from the evaporation port 2 . and discharging the material to form a vapor deposition film on the substrate.

In the present embodiment, an evaporation source 25 including a container 1 in which a film-forming material is accommodated, and evaporation ports 2a and 2b provided in the container 1 in a plurality along the longitudinal direction of the container 1 . is hiring

The vessel 1 of this embodiment and the evaporation source peripheral member 3 provided around the vessel 1 are configured to enter inside the imaginary plane without protruding outward from the imaginary plane including the opening cross-section. has been

Further, the container 1 is provided with a diffusion portion 4 through which the vaporized film-forming material diffuses, and the width W1 of the diffusion portion 4 in the longitudinal direction of the container 1 is the evaporation port portions 2a and 2b. It is set to a width narrower than the arrangement width W2. In the present embodiment, an integrated container 1 is employed in which the lower portion of the container 1 serves as the material accommodating portion 5 and the upper portion serves as the diffusion portion 4 .

Each of the pair of outer evaporator portions 2a provided at the outermost side among the plurality of evaporator portions 2 has an opening cross-section that inclines toward the outside of the container 1 in the longitudinal direction.

In addition, the evaporator portion 2b other than the outer evaporator portion 2a may be configured to have an opening cross-section inclined so as to face outward in the longitudinal direction of the container 1, similarly to the outer evaporator portion 2a, It is good also as a structure which has an opening cross-section which inclines so that it may become long longitudinal direction inner side, and may be set as the structure provided vertically to the container 1 .

In the present embodiment, the other evaporation ports 2b except for the innermost set have the same configuration as the outer evaporation port portions 2a, and the innermost set of evaporation ports 2b is perpendicular to the container 1 . It is configured to be erected and installed.

The evaporation source peripheral member 3 of this embodiment is a rectangular ring-shaped member provided so as to surround the periphery of the rectangular container 1 in plan view, and specifically, the heating of the container 1 . member and cooling member.

In this embodiment, as shown in Figs. 2 and 3, a heater 6 for heating the vessel 1 in order from the inside as the evaporation source peripheral member 3, and the vessel 1 and the heater 6 A reflector 7 for reflecting the heat from the vessel 1, the heater 6, and a water cooling plate 8 for not diffusing the heat from the reflector 7 to the surroundings, the vessel 1, the heater (6), a reflector (7) and a vapor deposition prevention plate (9) surrounding the water cooling plate (8) is provided. Further, in the present embodiment, the deposition prevention plate 9 has a shape that also covers the upper surfaces of the heater 6 , the reflector 7 , and the water cooling plate 8 . Further, the deposition prevention plate 9 has a shape that covers the entire upper surface of the container 1 except for the area where the evaporation ports 2a and 2b are disposed.

The vessel 1 has a distance from the long longitudinal section of the vessel 1 to the outer evaporation port 2a, so that both ends of the vessel 1 and the evaporation source peripheral member 3 are located outside the imaginary plane. It is configured to be of a length that does not

Specifically, by appropriately setting the length from the longitudinal section of the container 1 to the outer evaporation port portion 2a, the inclination angle of the opening cross section of the outer evaporation port portion 2a, and the thickness of the evaporation source peripheral member 3, The vessel 1 and the evaporation source peripheral member 3 are configured to fit inside the imaginary plane. Here, it is preferable to set the inclination angle of the cross section of the opening of the outer side evaporation port part 2a to 30 degree - 45 degree.

For example, as shown in FIG. 4 , the length M1 from the long longitudinal section of the container 1 to the outer evaporation port portion 2a, and from the end surface of the evaporation source peripheral member 3 to the outer evaporation port portion 2a The length M2 and the thickness M3 of the evaporation source peripheral member 3 are the inclination angle θ of the opening cross section of the outer evaporation port portion 2a, and the tip length L2 of the outer evaporation port portion 2a (projecting from the upper surface of the container 1). Using it, it can be determined as follows. In addition, L1 in the figure is the total length of the outer side evaporation port part 2a.

M1=L2×sinθ

M2=L2÷sinθ

M3=M2-M1

For example, when L2 is 40 mm and θ is 40°, M1 is 25.7 mm, M2 is 62.2 mm, and M3 is 36.5 mm.

In addition, although the evaporation source peripheral member 3 is set as the structure surrounding the side surface and the end surface of the end of the container 1 in FIG. 2, it is good also as a structure surrounding the upper surface of the edge part of the container 1. As shown in FIG. For example, as in the other example 1 shown in FIG. 5 , the heater 6 , the reflector 7 , and the deposition prevention plate 9 may also cover the upper surface of the end of the container 1 .

In addition, the structure of the container 1 is not limited to the one-piece type as described above, and for example, like the evaporation source 25 of the second example shown in FIG. 6 , the material accommodating part 5 and the diffusion part 4 are It is also provided via the communication part 12, and it is good also as a detachable type which puts two of the said material accommodating part 5 and the said diffusion part 4 together to make the container (1). In this case, if the width W1 of the diffusion part 4 is narrowed so that the container 1 or the like does not protrude outward from the imaginary plane, the width W3 of the material accommodating part 5 is shortened to fit inside the imaginary plane. Since there is no need, it is possible to realize a configuration capable of accommodating more material by making it wider than the width W1 of the diffusion portion 4, and furthermore, it is possible to suppress the influence of the material storage portion 5 on the substrate temperature, etc. , it has a configuration in which film formation can be performed even more favorably.

In addition, in the present embodiment, although the inclination angle of the opening cross section of the evaporating port parts 2a and 2b inclined toward the outer side in the longitudinal direction of the container 1 is made the same, the opening cross section of the outer evaporating port part 2a is the same. The inclination angle of each opening section may be set to a different angle so that the inclination angle of is the largest. In addition, at this time, the inclination angle of the opening end faces of the evaporating ports 2a and 2b may be set to be equal to or greater than the inclination angle of the opening end surfaces of the evaporating port 2b on the inner side.

In this case, it can be set as the structure in which the vaporized particle discharged|emitted from the inner evaporation port part 2b adheres to the outer evaporation port parts 2a, 2b, and does not re-evaporate. In addition, since the distance to the substrate end is longer on the side of the outer evaporation ports 2a and 2b, it is necessary to reach the evaporation particles further away. However, by increasing the inclination angle toward the outside, the outer evaporation ports 2a, 2b It becomes possible to reach further evaporation particles emitted from the

In addition, as in the other example 3 shown in Fig. 7, not only the outer evaporation port portion 2a, but also the other evaporation port portions 2b having an opening cross-section inclined toward the outside in the longitudinal direction of the container 1, respectively, The container 1 and the evaporation source peripheral member 3 provided around the container 1 do not protrude outward from an imaginary plane including the opening cross-sections of the respective evaporating port portions 2a and 2b, but are inside the imaginary plane. If you configure it to enter the , the effect is even greater.

In addition, the upper part of the integrated container 1 or the detachable container 1 is set to the upper left and right ends, the front and rear upper portions, or the left and right both ends and the front and rear both ends, as in the other example 4 shown in FIGS. 8 and 9 . You may set it as the structure which chamfered at an angle. In the case of Fig. 8, material adhesion to the evaporation source peripheral member 3 in the long longitudinal direction of the container 1, and in Fig. 9, material adhesion to the evaporation source peripheral member 3 before and after the evaporation source short longitudinal direction can be further prevented. becomes

In addition, this invention is not limited to this Example, The specific structure of each structural element can be designed suitably.

1: Courage
2a·2b: evaporation port
3: Member around evaporation source
4: diffuser
5: material receiving part
6: Heater
7: Reflector
8: water cooling plate
9: Deposition prevention plate

Claims (31)

A container in which a film-forming material is accommodated, a plurality of tubular portions arranged along the longitudinal direction of the container, each projecting from the container and having an opening at the tip, and provided around the container to heat the container Equipped with an evaporation source including a heater,
A deposition apparatus configured to form a deposition film on a substrate by discharging the deposition material from the plurality of cylindrical portions,
Among the plurality of tubular parts, the first tubular part positioned at the end in the longitudinal direction is inclined in a direction the tip of which is away from the other tubular part,
An opening surface formed by the opening of the first tubular portion is inclined so that the opening faces a side opposite to the side where the other tubular portion is located,
The vapor deposition apparatus according to claim 1, wherein the heater is provided on a side of the container rather than an imaginary plane including the opening surface. A container in which a film-forming material is accommodated, a plurality of tubular portions arranged along the longitudinal direction of the container, each of which protrudes from the container and has an opening at the tip, and a plurality of tubular portions provided around the container to receive heat from the container. Equipped with an evaporation source comprising a reflector to reflect,
A deposition apparatus configured to form a deposition film on a substrate by discharging the deposition material from the cylindrical portion,
Among the plurality of tubular parts, the first tubular part positioned at the end in the longitudinal direction is inclined in a direction the tip of which is away from the other tubular part,
An opening surface formed by the opening of the first tubular portion is inclined so that the opening faces a side opposite to the side where the other tubular portion is located,
The said reflector is provided in the said container side rather than the imaginary plane containing the said opening surface, The vapor deposition apparatus characterized by the above-mentioned. an evaporation source including a container in which a film-forming material is accommodated, and a plurality of tubular portions arranged along the longitudinal direction of the container, each of which protrudes from the container and has an opening at the tip;
and a deposition prevention plate installed around the container,
A deposition apparatus configured to form a deposition film on a substrate by discharging the deposition material from the cylindrical portion,
Among the plurality of tubular parts, the first tubular part positioned at the end in the longitudinal direction is inclined in a direction the tip of which is away from the other tubular part,
An opening surface formed by the opening of the first tubular portion is inclined so that the opening faces a side opposite to the side where the other tubular portion is located,
The deposition prevention plate is a deposition apparatus, characterized in that it is installed on the side of the container rather than the virtual plane including the opening surface. An evaporation source comprising: a container in which a film-forming material is accommodated; a plurality of tubular portions arranged along the longitudinal direction of the container, each projecting from the container and having an opening at the tip, and a water cooling plate provided around the container; to provide
A deposition apparatus configured to form a deposition film on a substrate by discharging the deposition material from the cylindrical portion,
Among the plurality of tubular parts, the first tubular part positioned at the end in the longitudinal direction is inclined in a direction the tip of which is away from the other tubular part,
An opening surface formed by the opening of the first tubular portion is inclined so that the opening faces a side opposite to the side where the other tubular portion is located,
The vapor deposition apparatus according to claim 1, wherein the water cooling plate is provided on a side of the container rather than an imaginary plane including the opening surface. 5. The method according to any one of claims 1 to 4,
A vapor deposition apparatus according to claim 1, wherein a diffusion portion through which the evaporated film-forming material diffuses is provided in the container, and the width of the diffusion portion in the longitudinal direction of the container is set to be narrower than the arrangement width of the cylindrical portion. 5. The method according to any one of claims 1 to 4,
A second cylindrical portion different from the first cylindrical portion among the plurality of cylindrical portions is inclined in a direction in which the tip approaches the first cylindrical portion,
The inclination angle of the said 1st cylindrical part is larger than the inclination angle of the said 2nd cylindrical part, The vapor deposition apparatus characterized by the above-mentioned. 5. The method according to any one of claims 1 to 4,
Each inclination angle of the plurality of cylindrical portions is equal to or greater than the inclination angle of the cylindrical portion located between itself and the center in the longitudinal direction of the region where the plurality of cylindrical portions are arranged. Device. 5. The method according to any one of claims 1 to 4,
The deposition apparatus, characterized in that the inclination angle of the first cylindrical portion is set to 30° to 45°. 5. The method according to any one of claims 1 to 4,
The vapor deposition apparatus, characterized in that the container is composed of a material receiving portion and a diffusion portion. 10. The method of claim 9,
The deposition apparatus according to claim 1, wherein the width of the material receiving portion is set to be wider than the width of the diffusion portion. A container in which the film-forming material is accommodated;
a plurality of tubular portions arranged along the longitudinal direction of the container, each of which protrudes from the container and has an opening at the tip;
As an evaporation source including a heater installed around the container to heat the container,
Among the plurality of tubular parts, the first tubular part positioned at the end in the longitudinal direction is inclined in a direction the tip of which is away from the other tubular part,
An opening surface formed by the opening of the first tubular portion is inclined so that the opening faces a side opposite to the side where the other tubular portion is located,
The said heater is provided in the said container side rather than the virtual plane containing the said opening surface, The evaporation source characterized by the above-mentioned. A container in which the film-forming material is accommodated;
a plurality of tubular portions arranged along the longitudinal direction of the container, each of which protrudes from the container and has an opening at the tip;
An evaporation source including a reflector installed around the container to reflect heat from the container,
Among the plurality of tubular parts, the first tubular part positioned at the end in the longitudinal direction is inclined in a direction the tip of which is away from the other tubular part,
An opening surface formed by the opening of the first tubular portion is inclined so that the opening faces a side opposite to the side where the other tubular portion is located,
The said reflector is provided in the said container side rather than the virtual plane containing the said opening surface, The evaporation source characterized by the above-mentioned. A container in which the film-forming material is accommodated;
a plurality of tubular portions arranged along the longitudinal direction of the container, each of which protrudes from the container and has an opening at the tip;
As an evaporation source comprising a deposition prevention plate installed around the vessel,
Among the plurality of tubular parts, the first tubular part positioned at the end in the longitudinal direction is inclined in a direction the tip of which is away from the other tubular part,
An opening surface formed by the opening of the first tubular portion is inclined so that the opening faces a side opposite to the side where the other tubular portion is located,
The deposition prevention plate is an evaporation source, characterized in that installed on the side of the container than the virtual plane including the opening surface. A container in which the film-forming material is accommodated;
a plurality of tubular portions arranged along the longitudinal direction of the container, each of which protrudes from the container and has an opening at the tip;
As an evaporation source comprising a water cooling plate installed around the container,
Among the plurality of tubular parts, the first tubular part positioned at the end in the longitudinal direction is inclined in a direction the tip of which is away from the other tubular part,
An opening surface formed by the opening of the first tubular portion is inclined so that the opening faces a side opposite to the side where the other tubular portion is located,
The evaporation source, characterized in that the water cooling plate is provided on the side of the container rather than the virtual plane including the opening surface. 15. The method according to any one of claims 11 to 14,
An evaporation source, characterized in that the container is provided with a diffusion portion through which the evaporated film-forming material diffuses, and the width of the diffusion portion in the longitudinal direction of the container is set to be narrower than the arrangement width of the cylindrical portion. 15. The method according to any one of claims 11 to 14,
A second cylindrical portion different from the first cylindrical portion among the plurality of cylindrical portions is inclined in a direction in which the tip approaches the first cylindrical portion,
The inclination angle of the said 1st cylindrical part is larger than the inclination angle of the said 2nd cylindrical part, The evaporation source characterized by the above-mentioned. 15. The method according to any one of claims 11 to 14,
Each of the inclination angles of the plurality of cylindrical portions is equal to or greater than the inclination angle of the cylindrical portion located between itself and the center in the longitudinal direction of the region where the plurality of cylindrical portions are arranged. . 15. The method according to any one of claims 11 to 14,
The evaporation source, characterized in that the inclination angle of the first cylindrical portion is set to 30 ° ~ 45 °. 15. The method according to any one of claims 11 to 14,
The vessel is an evaporation source, characterized in that composed of a material receiving portion and a diffusion portion. 20. The method of claim 19,
The evaporation source, characterized in that the width of the material receiving portion is set to be wider than the width of the diffusion portion. delete delete delete delete A container in which the film-forming material is accommodated;
An evaporation source arranged along the longitudinal direction of the vessel, each comprising a plurality of tubular portions protruding from the vessel,
The container includes a material accommodating part for accommodating the film-forming material, a diffusion part for diffusing the film-forming material evaporated in the material accommodating part, and a communication part for communicating the material accommodating part and the diffusion part,
In the longitudinal direction, a length of the communication part is shorter than a length of the material receiving part and a length of the diffusion part,
The plurality of tubular portions are installed in the diffusion portion,
An evaporation source, wherein a first cylindrical portion positioned at an end in the longitudinal direction among the plurality of cylindrical portions is inclined. 26. The method of claim 25,
An evaporation source, characterized in that the container is provided with a diffusion portion through which the evaporated film-forming material diffuses, and the width of the diffusion portion in the longitudinal direction of the container is set to be narrower than the arrangement width of the cylindrical portion. 26. The method of claim 25,
A second tubular portion different from the first tubular portion among the plurality of tubular portions is inclined so that the tip faces the same direction as the first tubular portion in the longitudinal direction,
The evaporation source, characterized in that the inclination angle of the first cylindrical portion and the inclination angle of the second cylindrical portion are different. 28. The method of claim 27,
The inclination angle of the said 1st cylindrical part is larger than the inclination angle of the said 2nd cylindrical part, The evaporation source characterized by the above-mentioned. 26. The method of claim 25,
Each of the inclination angles of the plurality of cylindrical portions is equal to or greater than the inclination angle of the cylindrical portion located between itself and the center in the longitudinal direction of the region where the plurality of cylindrical portions are arranged. . 26. The method of claim 25,
The evaporation source, characterized in that the inclination angle of the first cylindrical portion is set to 30 ° ~ 45 °. 29. The method of claim 27 or 28,
and a heater installed around the container to heat the container,
The first cylindrical portion is inclined in a direction away from the second cylindrical portion,
The opening surface formed by the opening provided at the tip of the first cylindrical portion is inclined so that the opening faces the side opposite to the side where the second cylindrical portion is located,
The said heater is provided in the said container side rather than the virtual plane containing the said opening surface, The evaporation source characterized by the above-mentioned.

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