JP7242626B2 - Deposition equipment - Google Patents

Description

The present invention relates to an in-line film forming apparatus.

2. Description of the Related Art In the manufacture of organic EL displays and the like, an in-line film forming apparatus is known that forms a film of vapor deposition material on a substrate using a mask. Patent Document 1 discloses a film forming apparatus that forms a film while transporting a substrate in a chamber for film formation.

JP 2015-113502 A

Here, an anti-adhesion member is provided to regulate the emission range of the vapor deposition material emitted from the vapor deposition source. Here, a line source type evaporation source or the like may require a wide discharge space to discharge the vapor deposition material. In addition, the deposition-inhibiting member is required to prevent the vapor deposition material from adhering to the conveying rollers and the walls of the chamber space.

SUMMARY OF THE INVENTION An object of the present invention is to provide an anti-adhesion member for an in-line type film forming apparatus that has high anti-adhesion performance while ensuring a space for releasing an evaporation source.

According to one aspect of the present invention, there is provided an in-line film forming apparatus for forming a film while transporting a substrate in a transport direction,
a conveying device comprising a conveying roller that conveys the mask tray by contacting both ends of the substrate in the cross direction crossing the conveying direction on the lower surface of the mask tray on which the substrate is placed;
a vapor deposition device disposed below the conveying device and having a vapor deposition source that emits a vapor deposition material onto the substrate conveyed by the conveying roller;
a deposition-inhibiting member for regulating the emission range of the deposition material from the deposition source;
The anti-adhesion member is
a first surface that is a side surface of the transport roller and faces the side surface on the center side in the cross direction of the substrate transported by the transport roller;
a second surface connected to the first surface and facing the lower peripheral surface of the conveying roller;
including
further comprising a deposition prevention plate extending upward in the vertical direction from the conveying surface of the conveying roller so as to be positioned between the first surface and the side surface of the conveying roller;
A film forming apparatus characterized by the following is provided.

According to the present invention, it is possible to provide an anti-adhesion member for an in-line type film forming apparatus that has high anti-adhesion performance while ensuring an emission space for an evaporation source.

Schematic of the film-forming apparatus which concerns on one Embodiment. FIG. 4 is a diagram showing a film forming process of a film forming apparatus; The figure which shows isolation|separation of a conveyance unit and a vapor deposition unit. Schematic diagram of a transport unit according to one embodiment. Sectional drawing of a conveyance unit. Sectional drawing of a conveyance unit and a vapor deposition unit. 7 is an enlarged view of the area of dotted line 650 in FIG. 6; FIG. The figure which shows the structure of an adhesion-inhibitory member.

Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. In addition, the following embodiments do not limit the invention according to the scope of claims. Although multiple features are described in the embodiments, not all of these multiple features are essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same or similar configurations are denoted by the same reference numerals, and redundant description is omitted.

<Overview of deposition equipment>
1A and 1B are schematic diagrams showing a film forming apparatus according to this embodiment. A film forming apparatus 1 according to the present embodiment shown in FIGS. 1A and 1B is an in-line film forming apparatus that forms a film while transporting a substrate. The film forming apparatus 1 according to the present embodiment is applied, for example, to a production line for electronic devices such as display panels of organic EL display devices for smartphones. A film forming apparatus 1 includes a transport unit 2 , a vapor deposition unit 3 and a frame 4 .

The transport unit 2 is a device for transporting a mask tray on which a substrate masked by a mask such as a metal mask having an opening pattern corresponding to a thin film pattern to be formed on the substrate is arranged from the inlet 5 to the outlet 6. be. Further, an opening is arranged on the bottom surface of the transport unit 2 so that the vapor deposition material discharged from the vapor deposition source of the vapor deposition unit 3 is vapor-deposited on the substrate arranged on the mask tray.

The vapor deposition unit 3 has a vapor deposition source, which will be described later, and has an opening on the top side of the vapor deposition unit 3 for discharging the vapor deposition material onto the substrate transported by the transport unit 2 . Separation between the transport unit 2 and the vapor deposition unit 3, which will be described later, is performed by an elevating mechanism 41 and a slide mechanism 42 arranged on the vapor deposition unit 3 or the frame 4. FIG.

The frame 4 is a structure for supporting the transport unit 2 and the vapor deposition unit 3 . In this embodiment, the frame 4 is described as having the elevating mechanism 41 and the sliding mechanism 42 , but at least one of the elevating mechanism and the sliding mechanism may be provided in the vapor deposition unit 3 .

Further, as shown in FIG. 1B, in the present embodiment, the film forming apparatus 1 includes three vapor deposition units 3A to 3C (generically referred to as vapor deposition units 3), and one or more types of substrates are transported. vapor deposition materials can be continuously vapor-deposited. In addition, in the example of FIG. 1B, the lifting mechanism 41 is omitted. The number of vapor deposition units 3 and the type of vapor deposition material emitted by each vapor deposition unit 3 can be changed arbitrarily. Also, the lifting mechanism 41 and the sliding mechanism 42 may collectively lift or slide the plurality of vapor deposition units 3, or may lift or slide them separately.

FIGS. 2A to 2D show the film forming process of the film forming apparatus 1 according to this embodiment. Here, a cross-sectional view of the film forming apparatus 1 in FIG. 1(A) taken along the plane XZ is shown. Note that the frame 4 is omitted in FIGS. 2A to 2D.

FIG. 2A shows the film forming apparatus 1 in a state in which the mask tray 201 on which the substrate is arranged is loaded from the loading port 5 . The transfer unit 2 includes openings 21A to 21C (generically referred to as openings 21) corresponding to the vapor deposition units 3, respectively. The vapor deposition unit 3 includes corresponding vapor deposition sources 31A to 31C (generically referred to as vapor deposition sources 31). In FIG. 2A, the carried-in mask tray 201 is conveyed onto the opening 21 of the conveying unit 2 by a plurality of conveying rollers 22 provided in the conveying unit 2 .

FIG. 2B shows the film forming apparatus 1 in a state in which the mask tray 201 is transported onto the opening 21A and the vapor deposition material is discharged from the vapor deposition source 31A of the vapor deposition unit 3A. In FIG. 2B, the vapor deposition material is discharged upward from the vapor deposition source 31A while the substrate is being transported. Thereby, the deposition material is deposited on the substrate according to the mask pattern. The film forming apparatus 1 according to the present embodiment will be described assuming that vapor deposition is performed while the mask tray 201 is moving. The transport speed of the mask tray 201 may be controlled. Thereby, the film forming apparatus 1 can be controlled so that the deposition material is deposited on the substrate with an appropriate thickness.

FIG. 2(C) shows a state in which the transport unit 2 transports the deposited substrate, and the mask tray 201 is transported over the opening 21B corresponding to the next vapor deposition unit 3B. Here, the vapor deposition material is discharged from the vapor deposition source 31B of the vapor deposition unit 3B. Then, the film forming apparatus 1 advances the transportation of the mask tray 201 and performs the next vapor deposition by the next vapor deposition unit 3C. As shown in FIG. be done. In this manner, vapor deposition can be performed from a plurality of vapor deposition units 3 while being transported from the inlet 5 to the outlet 6 by the transport rollers 22 of the transport unit 2 .

Next, separation of the transport unit 2 and the vapor deposition unit 3 will be described with reference to FIGS. 3(A) and 3(B). The vapor deposition material discharged from the vapor deposition source 31 of the vapor deposition unit 3 adheres to the side wall or the top surface of the transport unit 2, and then falls and adheres to the substrate being transported, which may cause the vapor deposition process to fail. In addition, deposition materials that have adhered to the sidewalls and top surface of the transport unit 2 may drop and adhere to the transport rollers 22, which may stain the substrate being transported or cause the transport rollers 22 to malfunction. For this reason, an anti-adhesion plate is provided on the side wall and top surface of the transfer unit 2, and maintenance such as periodic cleaning or replacement of the anti-adhesion plate is required.

In addition, dust generated by the contact between the transport roller 22 and the mask tray 201 is blown up by the air current generated by the rotation of the transport roller and the discharge of the vapor deposition material, and adheres to the substrate and the driving structure of the film forming apparatus 1, resulting in failure of the film forming process. and malfunction of the transport unit 2 may occur. For this reason, the conveying roller 22 is provided with a dust collection cover to prevent the generated dust from scattering, and maintenance such as replacement or cleaning of the dust collection cover may be performed periodically.

In such a case, by separating the transport unit 2 and the vapor deposition unit 3 and accessing the transport space in the transport unit 2 from the opening 21 on the bottom side of the transport unit 2, the convenience of maintenance work is improved. do. When the transport unit 2 and the vapor deposition unit 3 are separated, the vapor deposition unit 3 is moved downward relative to the transport unit 2 by the elevating mechanism 41 provided in the frame 4, as shown in FIG. 3A. As will be described later, the vapor deposition unit 3 according to the present embodiment has a portion that enters above the opening 21 along the Z axis when connected to the transport unit 2. Therefore, the vapor deposition unit 3 is lowered by the lifting mechanism 41. Is required. This allows the vapor deposition unit 3 to move horizontally with respect to the transport unit 2 .

Subsequently, as shown in FIG. 3B, the vapor deposition unit 3 is horizontally moved relative to the transport unit 2 by the slide mechanism 42 of the frame 4 . As a result, the transport space inside the transport unit 2 can be accessed from below the transport unit 2 held by the frame 4, and the convenience of maintenance can be improved. Moreover, since the inside of the vapor deposition unit 3 can be accessed from above the vapor deposition unit 3, the convenience of maintenance of the vapor deposition unit 3 can also be improved.

Next, FIG. 4 shows the structure of the transport unit 2. As shown in FIG. The conveying unit 2 includes a bottom opening 21 , a plurality of conveying rollers 22 , a top surface anti-adhesion portion 23 , a side wall anti-adhesion portion 24 , a housing 25 and a top lid 26 . 4, only a part of the side wall adhesion preventing portion 24 is illustrated.

The top surface adhesion preventing portion 23 is detachably arranged from the housing 25 so as to facilitate maintenance such as removal of deposition material deposited on the top surface side of the transport path in the transport unit 2 . In this embodiment, the top anti-adhesion part 23 is arranged on the top lid 26, and when the top lid 26 is removed from the housing 25, the top anti-adhesion part 23 is also removed from the housing 25 together with the top lid 26. . In addition, the top anti-adhesion part 23 is formed by a plurality of anti-adhesion plates (top anti-adhesion plates), and each top anti-adhesion plate can be separately removed from the housing 25 or the top lid 26 . The structure in which the top cover 26 supports the plurality of top protection plates will be described later with reference to FIGS. 5 and 6. FIG. Further, detailed structures of the housing 25, the top cover 26, and the top surface anti-adhesion portion 23 will be described later with reference to FIGS. 5 and 6. FIG.

The side wall deposition prevention part 24 includes a deposition prevention plate that can be attached and detached from the side wall of the housing 25 in the transport unit 2 and prevents the deposition material from being deposited on the side wall inside the housing 25 . During maintenance, the side wall adhesion prevention part 24 can be removed from the housing 25 and replaced or washed, thereby facilitating the maintenance work. Note that the side wall attachment-preventing portion 24 according to the present embodiment is also formed of a plurality of side wall attachment-prevention plates, and each of the side wall attachment-prevention plates can also be separately removed from the housing 25 .

The top cover 26 is arranged on the top side of the housing 25 and can be removed from the housing 25 by lifting the top cover 26 upward. Thereby, the transfer space can be accessed from the top surface side of the housing 25 . That is, the top cover 26 is a ceiling portion that forms the ceiling of the transfer space inside the transfer unit 2, and the housing 25 is a side wall portion that forms the side walls of the transfer space. Further, the top surface anti-adhesion part 23 is an anti-adhesion part that covers the ceiling part of the transfer space, and the side wall anti-adhesion part 24 is an anti-adhesion part that covers the side wall part of the transfer space.

Next, the detailed structure of the transport unit 2 will be described with reference to FIG. FIG. 5 is a cross-sectional view of the transport unit 2 taken along the plane 401 in FIG. Also shown in FIG. 5 is a vapor deposition unit 3 .

In FIG. 5, a guide roller 27 is arranged on the top cover 26 and the top anti-adhesion plates 501 to 504 are supported by the guide roller 27 . That is, the guide roller 27 and the portions of the top anti-adhesion plates 501 to 504 that contact the guide roller 27 function as a slide structure (detachable structure) that movably supports the anti-adhesion plates along the top cover 26. . In this embodiment, the direction of movement of the guide rollers 27 is the direction intersecting the transport direction of the substrate, which is the Y-axis direction in FIG. In the example of FIG. 5, the guide rollers 27 are arranged on the top cover 26, and the top anti-adhesion plates 501 to 504 include rolling surfaces on which the guide rollers 27 roll. However, in another example, rails may be arranged on the top cover 26 and rollers rolling along the rails may be arranged on the top anti-adhesion plates 501 to 504 . In addition, as the attachment/detachment structure in which the top cover 26 detachably supports the top anti-adhesion plates 501 to 504, any structure other than the slide structure, such as a hook-type fastening member, may be used.

Further, as indicated by circles 506 to 508, the top-surface anti-adhesion plates adjacent to each other in a horizontal plane intersecting with the sliding direction form a labyrinth structure. Here, the labyrinth structure means that adjoining anti-adhesion plates overlap each other in a direction perpendicular to the surface covered by the anti-adhesion plates, that is, in the vertical direction. In the top surface attachment prevention plates 501 to 504, adjacent attachment prevention plates in the board transfer direction (X direction) overlap in the vertical direction (Z axis). As a result, even if the positions of the adjacent top surface anti-adhesion plates 501 to 504 change slightly, the top surface anti-adhesion plates 501 to 504 can cover the inner surface of the ceiling of the transfer space, and the guide rollers 27 and the top cover 26 and the housing 25 can be prevented from being deposited with deposition material.

Further, as indicated by a circle 509, the side wall anti-adhesion portion 24 attached to the side surface of the housing 25 and covering the side surface of the transfer space forms a labyrinth structure with the top surface anti-adhesion plate 501 adjacent to the side wall anti-adhesion portion 24. do. As a result, deposition material can be prevented from adhering to the guide rollers 27, the top cover 26, and the housing 25 even if the position of the top plate 501 is slightly changed.

Further, the top cover 26 according to the present embodiment has an engagement structure with the housing 25, and can be removed from the housing 25 by releasing the engagement between the housing 25 and the top cover 26. . When removing the top cover 26 from the housing 25, the top cover 26 can be removed using a crane by attaching a crane hook to the hook hole 505 provided in the top cover 26. - 特許庁

Note that the adhesion-inhibiting member 32A and the adhesion-inhibiting member 33A are arranged in the internal space of the housing 25 of the conveyance unit 2 through the opening 21A of the conveyance unit 2 . The anti-adhesion member 32A and the anti-adhesion member 33A are cylindrical anti-adhesion plates having openings indicated by dotted lines upward. By arranging the deposition-inhibiting member 32A below the mask tray 201 conveyed by the conveying roller 22, it is possible to regulate the discharge range of the vapor deposition material from the vapor deposition source 31A.

Next, the detailed structure of the transport unit 2 will be described with reference to FIG. 6 is a cross-sectional view of the transport unit 2 taken along the plane 402 in FIG. FIG. 6 also shows the vapor deposition unit 3 .

In FIG. 6 , one side of the guide roller 27 in the sliding direction hits a stopper 606 provided on the housing 25 or the top cover 26 of the transport unit 2 . Also, it hits the cover 28 on the other side in the sliding direction. The cover 28 has a locking structure capable of switching whether or not the top surface anti-adhesion plates 601 to 605 are made removable by the guide rollers 27 . In the example of FIG. 6, the cover 28 is in a closed state in which the top surface anti-adhesion plates 601 to 605 cannot be individually removed from the top surface lid 26 . On the other hand, by switching the cover 28 to the open state, the top anti-adhesion plates 601 to 605 can be individually removed along the guide rollers 27 from the opening of the housing 25 covered by the cover 28 in the closed state. In addition, by attaching the top surface anti-adhesion plate individually along the guide roller 27 from the opening of the housing 25 and sliding it until it contacts the stopper 606 or another top surface anti-adhesion plate already attached, the top surface The anti-adhesion plate can be attached without alignment in the sliding direction. By adopting the slide structure as the attachment/detachment structure in this way, the efficiency of the work when attaching/detaching the top surface attachment/detachment plate is improved.

In addition, as indicated by circles 607 to 610, the anti-adhesion plates adjacent to each other in the sliding direction also form a labyrinth structure. As a result, deposition material can be prevented from adhering to the guide roller 27, the top cover 26, and the housing 25 even if the positions of the top surface adhesion prevention plates 601 to 605 that are adjacent in the sliding direction change slightly. .

Also, the top surface anti-adhesion plates 601 to 605 in the same row in the sliding direction have the same shape. As a result, there is no need to consider the order in which the anti-adhesion plates are installed, and the attachment and detachment of the top anti-adhesion plate is facilitated.

Further, as indicated by circles 611 and 612, the side wall anti-adhesion portions 24 that are attached to the side surfaces of the housing 25 and cover the side surfaces of the transfer space are separated from the top surface anti-adhesion plates 601 and 605 that are adjacent to the side wall anti-adhesion portions 24. Forms a labyrinth structure. As a result, deposition material can be prevented from adhering to the guide rollers 27, the top cover 26, and the housing 25 even if the positions of the top surface anti-adhesion plates 601 and 605 are slightly changed.

Also, the transport roller 22 is driven by a transport roller driving section 622 via a shaft 621 .

Further, on the vapor deposition unit 3 side, anti-adhesion members 32 and 33 are provided to regulate the emission range so that the vapor deposition material from the vapor deposition source 31 does not adhere to the walls of the vapor deposition unit 3 and other peripheral mechanisms. The deposition-inhibiting member 32 is positioned above the deposition-inhibiting member 33 , and the upper portion of the adhesion-inhibiting member 32 enters the transport unit 2 . In this embodiment, the deposition-inhibitory member 32 and the deposition-inhibitory member 33 are supported by the housing of the vapor deposition unit 3 .

The deposition-inhibiting member 32 and the deposition-inhibiting member 33 each have a cylindrical shape, and form a discharge space (in other words, a space above the deposition source 31) in which the deposition material discharged from the deposition source 31 is discharged toward the mask tray 201. ). For example, it is made of metal. In this embodiment, since the deposition source 31 is in the form of a line source extending in the Y direction, the deposition-inhibiting member 32 and the deposition-inhibiting member 33 have a square cylindrical shape along the shape of the deposition source 31. there is The lower end portion of the deposition-inhibitory member 32 is located inside the deposition-inhibitory member 33, and the lower end portion of the deposition-inhibitory member 32 and the upper end portion of the deposition-inhibitory member 33 overlap each other in the vertical direction. As a result, there is no gap in the Z direction between the deposition-inhibitory members 32 and 33 , and leakage of the deposition material from between the deposition-inhibitory members 32 and 33 can be prevented.

In addition, the anti-adhesion member 32 and the anti-adhesion member 33 have a mesh-structured surface on the inner side of the rectangular tube. This makes it easier for the deposition material to adhere to the surfaces of the deposition-inhibitory member 32 and the deposition-inhibitory member 33, thereby enhancing the deposition-inhibiting effect.

<Arrangement of anti-adhesion plate on vapor deposition unit side>
Next, with reference to FIG. 7, the arrangement of the anti-adhesion plates on the vapor deposition unit 3 side will be described. FIG. 7 is an enlarged view of the portion indicated by dotted line 650 in FIG.

As shown in FIG. 6, the transport roller 22 is connected to a shaft 621 and rotated by a transport roller driving section (not shown). A dust collection cover 703 for the transport roller 22 is attached to the housing 702 on the transport unit 2 side that covers the shaft 621 . Further, an attachment prevention plate 704 is arranged on the side of the substrate from the dust collection cover 703 so as to cover the side surface of the transport roller 22 . The anti-adhesion plate 704 is an anti-adhesion member on the transport unit 2 side connected to the housing 702 by a support member 705 . Further, the side wall adhesion preventing portion 24 on the transport unit 2 side that covers the side surface of the housing 702 is arranged in the housing 702 . The side of the transport space formed by the housing 702 of the transport unit 2 can be covered by the anti-adhesion plate 704 and the side wall anti-adhesion portion 24 .

As described above, the deposition-inhibiting member 32 on the vapor deposition unit 3 side is arranged such that the upper opening is close to the mask tray 201 . Here, as shown in FIG. 6 , the length of the vapor deposition source 31 in the direction (Y direction) intersecting the transport direction is wider than the interval between the pair of transport rollers 22 facing each other on the rotation shaft of the transport rollers 22 . This is for the purpose of uniformly depositing the deposition material discharged from the deposition source 31 on the substrate placed on the mask tray 201 in the Y direction. Therefore, the Y-direction length of the opening 701 of the deposition-inhibitory member 32 is shorter than the Y-direction length of the vapor deposition source 31 . As a result, it is possible to secure a wide release space for the vapor deposition source 31 while enhancing the adhesion prevention performance to the wall surface of the transport roller 22 and the transport unit 2 .

In order to prevent deposition material from adhering to the transport roller 22 and the dust collection cover 703, the deposition preventing member 32 on the deposition unit 3 side has a first surface 706 facing the side surface 709 of the transport roller 22 and a and a second surface 707 facing the lower peripheral surface of 22 . The side surface 709 of the transport roller 22 is the center side surface in the Y direction of the substrate transported by the transport roller 22 . In other words, the side surfaces 709 are surfaces of the two transport rollers 22 that face each other in the Y direction. The first surface 706 and the second surface 707 can prevent the adhesion-preventing member 32 on the vapor deposition unit side from coming into contact with the conveying roller 22 while enhancing the adhesion-preventing performance of the conveying roller 22 . In other words, the first surface 706 and the second surface 707 function as a retraction structure for the conveying rollers of the rectangular tube-shaped deposition-inhibiting member 32 that regulates the discharge direction of the vapor deposition source 31 . In addition, since this retraction structure forms a labyrinth structure together with the anti-adhesion plate 704, deposition material can be prevented from adhering to the transport roller 22, the dust collection cover 703, and the walls of the transport unit 2 in the Y direction. The anti-adhesion performance of the roller 22 can be enhanced.

In addition, as shown in FIG. 7, a concave portion (groove) 708 is arranged in the vicinity of the conveying roller 22 in parallel with the conveying direction on the lower side of the mask tray 201 according to the present embodiment, and the attachment prevention plate 704 is provided. It extends upward in the vertical direction (Z direction) from the upper end of the peripheral surface of the conveying roller 22, that is, the conveying surface. Further, the concave portion 708 of the conveying roller 22 and the anti-adhesion plate 704 form a labyrinth structure. As a result, the anti-adhesion performance of the anti-adhesion plate 704 can be enhanced, and deposition material can be prevented from adhering to the transport roller 22 , the dust collection cover 703 , and the walls of the transport unit 2 from above the anti-adhesion plate 704 . Further, even if the positions of the vapor deposition unit 3 and the transport unit 2 are slightly changed and the position of the anti-adhesion member 32 is changed relative to the transport unit 2, the transport roller 22 and the dust collection cover 703 do not move. can maintain the anti-adhesion performance of Although the attachment-preventing plate 704 is illustrated as covering only the side surface 709 of the conveying roller 22, it has an L-shaped cross section in the YZ plane so as to cover the lower peripheral surface of the conveying roller 22 as well. may

7, the first surface 706 is slanted toward the substrate with respect to the vertical direction (Z direction), and is opposed to the side surface 709 of the conveying roller 22. 706 may have a plane parallel to side 709 .

Next, structures of the deposition-inhibitory member 32 and the deposition-inhibitory member 33 will be described with reference to FIG. The upper anti-adhesion member 32 is composed of eight detachable anti-adhesion plates 801-808. The lower anti-adhesion member 33 is composed of eight detachable anti-adhesion plates 851-858. In the adhesion-inhibiting member 32 and the adhesion-inhibiting member 33, two adjacent adhesion-inhibiting plates are fixed by a locking structure (not shown) to form a rectangular cylinder. The anti-adhesion plates 801 and 805 are anti-adhesion plates having a retraction structure for the conveying roller 22 described with reference to FIG.

In this way, since the deposition-inhibiting member 32 is formed of a plurality of detachable deposition-inhibiting plates, it can be easily detached from the vapor deposition unit 3 during maintenance.

Also, the anti-adhesion plates 801 and 805, 802 and 806, 803 and 807, and 804 and 808 of the upper anti-adhesion member 32 are reversed anti-adhesion plates having the same structure. This makes it possible to reduce the number of types of anti-adhesion plates.

Similarly, the anti-adhesion plates 851 and 855, 852 and 856, 853 and 857, and 854 and 858 of the lower anti-adhesion member 33 are reversed anti-adhesion plates having the same structure. This makes it possible to reduce the number of types of anti-adhesion plates.

<Other embodiments>
The invention is not limited to the embodiments described above, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the claims are appended to make public the scope of the invention.

REFERENCE SIGNS LIST 1 film forming apparatus 2 transport unit 22 transport roller 31 vapor deposition source 32 deposition preventing member 201 mask tray 703 dust collection cover 704 deposition preventing plate

Claims (9)

An in-line film forming apparatus that forms a film while conveying a substrate in a conveying direction,
a conveying device comprising a conveying roller that conveys the mask tray by contacting both ends of the substrate in the cross direction crossing the conveying direction on the lower surface of the mask tray on which the substrate is placed;
a vapor deposition device disposed below the conveying device and having a vapor deposition source that emits a vapor deposition material onto the substrate conveyed by the conveying roller;
a deposition-inhibiting member for regulating the emission range of the deposition material from the deposition source;
The anti-adhesion member is
a first surface that is a side surface of the transport roller and faces the side surface on the center side in the cross direction of the substrate transported by the transport roller;
a second surface connected to the first surface and facing the lower peripheral surface of the conveying roller;
including
further comprising a deposition prevention plate extending upward in the vertical direction from the conveying surface of the conveying roller so as to be positioned between the first surface and the side surface of the conveying roller;
A film forming apparatus characterized by: 2. The film forming apparatus according to claim 1, wherein the length of said vapor deposition source in said cross direction is longer than the distance between said two transport rollers facing each other in said cross direction. The adhesion-preventing member has a square tubular shape, and a retraction structure for the conveying roller formed by the first surface and the second surface is provided at an end of the square tubular member. The film forming apparatus according to claim 1 or 2. 4. The film forming apparatus according to claim 3, wherein the inner surface of said rectangular cylinder has a mesh structure. 5. The film forming apparatus according to any one of claims 1 to 4, wherein the anti-adhesion plate is arranged so as to face the side surface of the conveying roller. The anti-adhesion plate and a recess provided on the lower surface of the mask tray form a labyrinth structure, and the anti- adhesion plate prevents the vapor deposition material from adhering to the dust collection cover of the transport roller and the transport roller. 6. The film forming apparatus according to claim 5, wherein the film forming apparatus is arranged so as to prevent 7. The film forming apparatus according to any one of claims 1 to 6, wherein the vapor deposition apparatus is movable relative to the conveying apparatus. 8. The film forming apparatus according to claim 1, wherein the anti-adhesion member comprises a plurality of anti-adhesion plates. 9. The film forming apparatus according to claim 8, wherein the first surface and the second surface are included in one of the plurality of anti-adhesion plates.

Images