KR20130073407A - High temperature evaporation having outer heating container - Google Patents
High temperature evaporation having outer heating container Download PDFInfo
- Publication number
- KR20130073407A KR20130073407A KR1020110141236A KR20110141236A KR20130073407A KR 20130073407 A KR20130073407 A KR 20130073407A KR 1020110141236 A KR1020110141236 A KR 1020110141236A KR 20110141236 A KR20110141236 A KR 20110141236A KR 20130073407 A KR20130073407 A KR 20130073407A
- Authority
- KR
- South Korea
- Prior art keywords
- evaporation
- support member
- high temperature
- vessel
- evaporation source
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/14—Arrangements of heating devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B2014/0837—Cooling arrangements
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B2014/0843—Lining or casing
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
The present invention relates to a thin film deposition apparatus, and more particularly, to a high temperature evaporation source capable of evaporating a high temperature material in the thin film deposition apparatus.
Thin film deposition apparatus mainly used in the manufacture of semiconductor devices or flat panel display devices by installing a crucible containing a deposition material in the lower portion of the container, and heating the crucible to evaporate the deposition material inside to deposit the thin film on the substrate located above It is a device for manufacturing.
In general, a thin film is manufactured by a vacuum heating deposition method in a thin film deposition apparatus. In vacuum heating deposition, a crucible containing an evaporation material is placed under a substrate in a vacuum vessel, and the crucible is heated to evaporate the evaporation material to coat the thin film on the substrate. Say how.
In such vacuum heating deposition, a method of heating the evaporation material of the evaporation vessel is used, such as indirect heating using a hot wire, direct heating to directly flow the evaporation vessel, or electron beam (E-beam) heating using an electron beam. Among them, the indirect heating method using a hot wire is widely used because the deposition control is stable.
The indirect heating deposition apparatus requires an evaporation vessel and a heating unit capable of heating it, and generally uses a cylindrical evaporation vessel and a filament-type heating unit surrounding the evaporation vessel. Although there is no great difficulty in heating the evaporation vessel to a temperature of about 800 ° C. by indirect heating using the filament as described above, an evaporation source when more heating is required may be referred to as a high temperature evaporation source. This high temperature evaporation source is mainly used when depositing a metal or inorganic material such as aluminum.
Such a high temperature evaporation source further increases the need for heating efficiency and protection of external devices by heat as compared to a low temperature evaporation source. In general, since the evaporation container receives high temperature heat, there is a risk of cracking or damage due to temperature change or impact, and thus, evaporation material may be introduced into the evaporation source and contaminate the peripheral device.
If such contamination occurs, there is a problem of non-economical cost and time to replace the entire configuration of the evaporation container as well as the high temperature evaporation source, even if the evaporation container is damaged in the high temperature evaporation source of the thin film deposition apparatus, contamination of peripheral devices A request is made for a structure that can prevent this.
An object of the present invention is devised to solve the above problems, including an external heating vessel having a structure that can prevent contamination by evaporation material of the peripheral device even if cracks or breakage of the evaporation vessel in the high temperature evaporation source. It is to provide a high temperature evaporation source.
The present invention is an evaporation vessel; An evaporation heater disposed at an outer circumferential side of the evaporation vessel; In the high temperature evaporation source comprising a support member for supporting the evaporation vessel, the evaporation vessel has a space for storing the evaporation material therein, the inner side of the inner heating vessel, the inner heating vessel is interpolated and the internal heating vessel Disclosed is a high temperature evaporation source comprising an external heating vessel which prevents the evaporation material from leaking out when it breaks.
The internal heating vessel may be spaced apart from each other so as to form a space between the external heating vessel.
The inner heating container includes a body portion in which evaporation material is accommodated in an inner space and a flange portion protruding outward from the upper end of the body portion, and the outer heating container includes an accommodating portion in which the inner heating container is accommodated in the inner space. It may be made of a support portion protruding from the upper end of the portion to the outer peripheral side.
The support part may be disposed in close contact with the lower side of the flange part and supported by the support member.
The support member may be disposed on an outer circumferential side of the evaporation heater, and a coolant flow path may be formed to prevent heat from being evaporated by the evaporation heater.
The support member includes an external support member disposed on an outer circumferential side of the evaporator heater, and an internal support member disposed between the external support member and the evaporator heater, wherein the support portion is supported by the external support member, and the flange portion It may be supported by the inner support member.
The inner support member may prevent heat from being emitted by the evaporator heater to the outside.
The external support member may have a refrigerant passage formed therein to prevent heat from being emitted by the evaporation heater to the outside.
The high temperature evaporation source including the external heating vessel according to the present invention is maintained because an external container is disposed as a protective device on the evaporation vessel, so that even if the evaporation vessel is damaged, contamination due to evaporation materials for the components forming the evaporation source can be prevented. It is effective in improving water retention.
1 is a side cross-sectional view showing a high temperature evaporation source including an external heating vessel according to an embodiment of the present invention.
Figure 2 is a side cross-sectional view showing a high temperature evaporation source including an external heating vessel according to another embodiment of the present invention.
Hereinafter, a high temperature evaporation source including an external heating container according to the present invention will be described in detail with reference to the accompanying drawings.
The high temperature evaporation source including the external heating vessel according to the present invention includes an
The high
In the high
In the high
The
The
The
Since the
In order to improve the thermal conductivity, the inner circumferential surface of the
In addition, the bottom of the
The
2 shows an example in which such a spare space is provided, as shown by the arrow, even if the
When the free space is formed as described above, when the bottom of the
The spaced distance may be selectively made in consideration of the thermal expansion coefficient and the spatial arrangement relationship.
In addition, the
The
The
In the embodiment of FIG. 1, an example in which the lower side of the
However, in such an embodiment, undesirable heat transfer may occur on the upper side of the
2 is a side cross-sectional view showing a high temperature evaporation source including an external heating vessel according to another embodiment of the present invention, wherein the
With such a structure has the advantage of minimizing heat transferred from the
The support portion at the high
The
The support member described in FIG. 1 may include an
Preferably, the
However, the
The
The
In addition, the
It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined in the appended claims. It is to be understood that both the technical idea and the technical spirit of the invention are included in the scope of the present invention.
10.High temperature evaporation source 100.Support member
200 ...
400.External heating vessel
Claims (8)
An evaporation heater disposed at an outer circumferential side of the evaporation vessel;
In the high temperature evaporation source comprising a support member for supporting the evaporation vessel,
The evaporation vessel has a space for storing evaporation material therein and the upper side is an internal heating vessel,
High temperature evaporation source characterized in that the internal heating container is interpolated and comprises an external heating container to prevent the evaporation material to flow out when the internal heating container is broken.
The internal heating container is a high temperature evaporation source, characterized in that spaced apart so as to form a space between the external heating container.
The inner heating container is composed of a body portion for receiving evaporation material in the inner space and a flange portion protruding to the outer peripheral side from the upper end of the body portion,
The external heating vessel is a high temperature evaporation source, characterized in that consisting of a receiving portion for receiving the inner heating container in the inner space and a support portion protruding from the upper end of the receiving portion to the outer peripheral side.
The support portion is disposed in close contact with the lower side of the flange portion is a high temperature evaporation source, characterized in that supported by the support member.
The support member is disposed on the outer circumferential side of the evaporator heater, the coolant flow path is formed, characterized in that the heat by the evaporator heater to prevent the heat dissipation to the outside.
The support member is composed of an outer support member disposed on the outer circumferential side of the evaporator heater, and an inner support member disposed between the outer support member and the evaporator heater,
The support portion is supported by the outer support member, the high temperature evaporation source, characterized in that the flange is supported by the inner support member.
The internal support member is a high temperature evaporation source, characterized in that to prevent the heat by the evaporation heater is dissipated to the outside.
The external support member is a high temperature evaporation source, characterized in that the refrigerant flow path is formed to prevent the heat by the evaporation heater is dissipated to the outside.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020110141236A KR20130073407A (en) | 2011-12-23 | 2011-12-23 | High temperature evaporation having outer heating container |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110141236A KR20130073407A (en) | 2011-12-23 | 2011-12-23 | High temperature evaporation having outer heating container |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020170129771A Division KR101868463B1 (en) | 2017-10-11 | 2017-10-11 | High temperature evaporation having outer heating container |
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KR20130073407A true KR20130073407A (en) | 2013-07-03 |
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KR1020110141236A KR20130073407A (en) | 2011-12-23 | 2011-12-23 | High temperature evaporation having outer heating container |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104018123A (en) * | 2014-06-16 | 2014-09-03 | 深圳市华星光电技术有限公司 | Heater capable of detecting and preventing leakage of high-temperature metal material |
CN104018121A (en) * | 2014-05-14 | 2014-09-03 | 深圳市华星光电技术有限公司 | Heating container for preventing leakage of high-temperature metal material and manufacturing method thereof |
KR20150029147A (en) * | 2013-09-09 | 2015-03-18 | 주식회사 원익아이피에스 | evaporation source and thin flim deposition apparatus having the same |
WO2017104885A1 (en) * | 2015-12-18 | 2017-06-22 | 주식회사 선익시스템 | Crucible for metal thin film deposition and evaporation source for metal thin film deposition |
KR20180005129A (en) * | 2016-07-05 | 2018-01-15 | 캐논 톡키 가부시키가이샤 | Vapor deposition apparatus and evaporation source |
KR20180078486A (en) * | 2016-12-30 | 2018-07-10 | 주식회사 에스에프에이 | Heating unit, evaporation source having the same and method for assembling the same |
-
2011
- 2011-12-23 KR KR1020110141236A patent/KR20130073407A/en active Search and Examination
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150029147A (en) * | 2013-09-09 | 2015-03-18 | 주식회사 원익아이피에스 | evaporation source and thin flim deposition apparatus having the same |
CN104018121A (en) * | 2014-05-14 | 2014-09-03 | 深圳市华星光电技术有限公司 | Heating container for preventing leakage of high-temperature metal material and manufacturing method thereof |
CN104018123A (en) * | 2014-06-16 | 2014-09-03 | 深圳市华星光电技术有限公司 | Heater capable of detecting and preventing leakage of high-temperature metal material |
WO2017104885A1 (en) * | 2015-12-18 | 2017-06-22 | 주식회사 선익시스템 | Crucible for metal thin film deposition and evaporation source for metal thin film deposition |
CN108713262A (en) * | 2015-12-18 | 2018-10-26 | 铣益系统有限责任公司 | Crucible for deposit metal films and the evaporation source for deposit metal films |
CN108713262B (en) * | 2015-12-18 | 2021-02-26 | 铣益系统有限责任公司 | Crucible for metal film deposition and evaporation source for metal film deposition |
KR20180005129A (en) * | 2016-07-05 | 2018-01-15 | 캐논 톡키 가부시키가이샤 | Vapor deposition apparatus and evaporation source |
KR20200132814A (en) * | 2016-07-05 | 2020-11-25 | 캐논 톡키 가부시키가이샤 | Vapor deposition apparatus and evaporation source |
KR20180078486A (en) * | 2016-12-30 | 2018-07-10 | 주식회사 에스에프에이 | Heating unit, evaporation source having the same and method for assembling the same |
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