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JP2018003122A5 - - Google Patents

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Publication number
JP2018003122A5
JP2018003122A5 JP2016133685A JP2016133685A JP2018003122A5 JP 2018003122 A5 JP2018003122 A5 JP 2018003122A5 JP 2016133685 A JP2016133685 A JP 2016133685A JP 2016133685 A JP2016133685 A JP 2016133685A JP 2018003122 A5 JP2018003122 A5 JP 2018003122A5
Authority
JP
Japan
Prior art keywords
opening end
port portion
inclination angle
evaporation port
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016133685A
Other languages
Japanese (ja)
Other versions
JP6641242B2 (en
JP2018003122A (en
Filing date
Publication date
Priority claimed from JP2016133685A external-priority patent/JP6641242B2/en
Priority to JP2016133685A priority Critical patent/JP6641242B2/en
Application filed filed Critical
Priority to KR1020170084996A priority patent/KR102182869B1/en
Priority to CN202110723236.8A priority patent/CN113416930A/en
Priority to CN201710539978.9A priority patent/CN107574411B/en
Publication of JP2018003122A publication Critical patent/JP2018003122A/en
Publication of JP2018003122A5 publication Critical patent/JP2018003122A5/ja
Publication of JP6641242B2 publication Critical patent/JP6641242B2/en
Application granted granted Critical
Priority to KR1020200154533A priority patent/KR102279411B1/en
Priority to KR1020210091561A priority patent/KR102458193B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (1)

前記蒸発口部の開口端面の傾斜角度は、これより内側の蒸発口部の開口端面の傾斜角度以上の角度に設定されていることを特徴とする請求項1〜3のいずれか1項に記載の蒸着装置。 The inclination angle of the opening end surface of the evaporation port portion according to any one of claims 1 to 3, characterized in that it is set now to the inclination angle more than the angle of the opening end face of the inner evaporation port portion Vapor deposition equipment.
JP2016133685A 2016-07-05 2016-07-05 Evaporator and evaporation source Active JP6641242B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2016133685A JP6641242B2 (en) 2016-07-05 2016-07-05 Evaporator and evaporation source
KR1020170084996A KR102182869B1 (en) 2016-07-05 2017-07-04 Vapor deposition apparatus and evaporation source
CN202110723236.8A CN113416930A (en) 2016-07-05 2017-07-05 Evaporation source and film forming apparatus
CN201710539978.9A CN107574411B (en) 2016-07-05 2017-07-05 Evaporation device and evaporation source
KR1020200154533A KR102279411B1 (en) 2016-07-05 2020-11-18 Vapor deposition apparatus and evaporation source
KR1020210091561A KR102458193B1 (en) 2016-07-05 2021-07-13 Vapor deposition apparatus and evaporation source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016133685A JP6641242B2 (en) 2016-07-05 2016-07-05 Evaporator and evaporation source

Publications (3)

Publication Number Publication Date
JP2018003122A JP2018003122A (en) 2018-01-11
JP2018003122A5 true JP2018003122A5 (en) 2019-02-07
JP6641242B2 JP6641242B2 (en) 2020-02-05

Family

ID=60948366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016133685A Active JP6641242B2 (en) 2016-07-05 2016-07-05 Evaporator and evaporation source

Country Status (3)

Country Link
JP (1) JP6641242B2 (en)
KR (3) KR102182869B1 (en)
CN (2) CN113416930A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6686069B2 (en) * 2018-05-29 2020-04-22 キヤノントッキ株式会社 Evaporation source device, vapor deposition device, and vapor deposition system
JP7179635B2 (en) * 2019-02-12 2022-11-29 株式会社アルバック Evaporation source, vacuum processing apparatus, and deposition method
KR102696209B1 (en) * 2019-03-20 2024-08-20 가부시키가이샤 코쿠사이 엘렉트릭 Substrate processing apparatus, process vessel, reflector and method of manufacturing semiconductor device
KR20210061639A (en) * 2019-11-20 2021-05-28 캐논 톡키 가부시키가이샤 Film forming apparatus, film forming method and electronic device manufacturing method using the same
CN111378933B (en) * 2020-04-27 2022-04-26 京东方科技集团股份有限公司 Evaporation source, evaporation source system
JP7242626B2 (en) * 2020-12-10 2023-03-20 キヤノントッキ株式会社 Deposition equipment
JP7291197B2 (en) * 2021-07-15 2023-06-14 キヤノントッキ株式会社 Film forming apparatus, film forming method, and evaporation source unit
KR20230012415A (en) * 2021-07-15 2023-01-26 캐논 톡키 가부시키가이샤 Film forming apparatus, film forming method and evaporation source unit
JP7372288B2 (en) * 2021-07-15 2023-10-31 キヤノントッキ株式会社 Film deposition equipment, film deposition method, and evaporation source
JP7509809B2 (en) 2022-01-28 2024-07-02 キヤノントッキ株式会社 Evaporation source unit, film forming apparatus and film forming method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004169066A (en) * 2002-11-18 2004-06-17 Sony Corp Vapor deposition system
KR100687007B1 (en) * 2005-03-22 2007-02-26 세메스 주식회사 Apparatus for depositing organic film used in manufacturing organicelectro luminescence device
JP2010195034A (en) * 2009-02-02 2010-09-09 Ricoh Co Ltd Inkjet recording apparatus
KR20120061394A (en) * 2010-12-03 2012-06-13 삼성모바일디스플레이주식회사 Evaporator and method for depositing organic material
KR20130073407A (en) * 2011-12-23 2013-07-03 주식회사 원익아이피에스 High temperature evaporation having outer heating container
WO2014020914A1 (en) * 2012-08-02 2014-02-06 パナソニック株式会社 Organic el display panel and method for manufacturing same
KR102046440B1 (en) * 2012-10-09 2019-11-20 삼성디스플레이 주식회사 Depositing apparatus and method for manufacturing organic light emitting diode display using the same
KR102046441B1 (en) * 2012-10-12 2019-11-20 삼성디스플레이 주식회사 Depositing apparatus and method for manufacturing organic light emitting diode display using the same
CN104099571A (en) * 2013-04-01 2014-10-15 上海和辉光电有限公司 Evaporation source component, film deposition device and film deposition method
CN104099570B (en) * 2013-04-01 2016-10-05 上海和辉光电有限公司 Single-point linear evaporation origin system
KR101599505B1 (en) * 2014-01-07 2016-03-03 주식회사 선익시스템 Evaporation source for deposition apparatus
CN105177507B (en) * 2015-09-08 2017-08-11 京东方科技集团股份有限公司 Crucible and evaporated device is deposited

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