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DE69700864D1 - Negativ arbeitendes Bildaufzeichnungsmaterial - Google Patents

Negativ arbeitendes Bildaufzeichnungsmaterial

Info

Publication number
DE69700864D1
DE69700864D1 DE69700864T DE69700864T DE69700864D1 DE 69700864 D1 DE69700864 D1 DE 69700864D1 DE 69700864 T DE69700864 T DE 69700864T DE 69700864 T DE69700864 T DE 69700864T DE 69700864 D1 DE69700864 D1 DE 69700864D1
Authority
DE
Germany
Prior art keywords
imaging material
negative imaging
negative
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69700864T
Other languages
English (en)
Other versions
DE69700864T2 (de
Inventor
Keitaro Aoshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69700864D1 publication Critical patent/DE69700864D1/de
Publication of DE69700864T2 publication Critical patent/DE69700864T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
DE69700864T 1996-08-09 1997-08-05 Negativ arbeitendes Bildaufzeichnungsmaterial Expired - Lifetime DE69700864T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21173196A JP3725624B2 (ja) 1996-08-09 1996-08-09 ネガ型平版印刷用版材及び製版方法

Publications (2)

Publication Number Publication Date
DE69700864D1 true DE69700864D1 (de) 2000-01-05
DE69700864T2 DE69700864T2 (de) 2000-04-13

Family

ID=16610668

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69700864T Expired - Lifetime DE69700864T2 (de) 1996-08-09 1997-08-05 Negativ arbeitendes Bildaufzeichnungsmaterial

Country Status (4)

Country Link
US (1) US5948590A (de)
EP (1) EP0823659B1 (de)
JP (1) JP3725624B2 (de)
DE (1) DE69700864T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5919601A (en) * 1996-11-12 1999-07-06 Kodak Polychrome Graphics, Llc Radiation-sensitive compositions and printing plates
US6068963A (en) * 1997-01-20 2000-05-30 Fuji Photo Film Co., Ltd. Negative-type image recording materials
JP4159058B2 (ja) * 1997-06-13 2008-10-01 コニカミノルタホールディングス株式会社 画像形成材料及び画像形成方法
JP3858374B2 (ja) * 1997-09-18 2006-12-13 コニカミノルタホールディングス株式会社 感光性組成物及び画像形成材料
DE19803564A1 (de) * 1998-01-30 1999-08-05 Agfa Gevaert Ag Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen
JP2000035669A (ja) * 1998-07-17 2000-02-02 Fuji Photo Film Co Ltd ネガ型画像記録材料
JP3989149B2 (ja) * 1999-12-16 2007-10-10 富士フイルム株式会社 電子線またはｘ線用化学増幅系ネガ型レジスト組成物
JP2002072462A (ja) * 2000-08-25 2002-03-12 Fuji Photo Film Co Ltd 平版印刷版原版及びその製版方法
US6790590B2 (en) 2003-01-27 2004-09-14 Kodak Polychrome Graphics, Llp Infrared absorbing compounds and their use in imageable elements
WO2005101126A1 (ja) * 2004-04-13 2005-10-27 Kodak Polychrome Graphics Japan Ltd. ネガ型感光性組成物およびネガ型感光性平版印刷版
WO2007054558A2 (en) * 2005-11-14 2007-05-18 Basf Se Resorcine derivatives and their use as pesticides
US11525024B2 (en) 2015-07-13 2022-12-13 University Of Delaware Bio-based polymers from raw lignocellulosic biomass
US10253131B2 (en) * 2015-07-13 2019-04-09 University Of Delaware Polymers prepared from functionalized dimethoxyphenol monomers
TWI679207B (zh) * 2018-05-07 2019-12-11 達興材料股份有限公司 含矽化合物、使用此含矽化合物的液晶組成物及液晶顯示裝置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4708925A (en) * 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
JPS62207309A (ja) * 1986-03-07 1987-09-11 Tatatomi Nishikubo 光硬化性組成物
JPH05341522A (ja) * 1992-06-09 1993-12-24 Fuji Photo Film Co Ltd ネガ型フオトレジスト組成物
US5340699A (en) * 1993-05-19 1994-08-23 Eastman Kodak Company Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
JP3004583U (ja) * 1994-02-15 1994-11-22 相云 李 石材研磨機
JP3330254B2 (ja) * 1995-04-19 2002-09-30 東京応化工業株式会社 ネガ型レジスト組成物
EP0795789B1 (de) * 1996-03-11 2000-02-09 Fuji Photo Film Co., Ltd. Negativarbeitendes Bildaufzeichnungsmaterial

Also Published As

Publication number Publication date
JPH1055066A (ja) 1998-02-24
DE69700864T2 (de) 2000-04-13
EP0823659B1 (de) 1999-12-01
EP0823659A1 (de) 1998-02-11
JP3725624B2 (ja) 2005-12-14
US5948590A (en) 1999-09-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP