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DE69722694D1 - Belichtungsapparat - Google Patents

Belichtungsapparat

Info

Publication number
DE69722694D1
DE69722694D1 DE69722694T DE69722694T DE69722694D1 DE 69722694 D1 DE69722694 D1 DE 69722694D1 DE 69722694 T DE69722694 T DE 69722694T DE 69722694 T DE69722694 T DE 69722694T DE 69722694 D1 DE69722694 D1 DE 69722694D1
Authority
DE
Germany
Prior art keywords
exposure apparatus
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69722694T
Other languages
English (en)
Other versions
DE69722694T2 (de
Inventor
Seiji Nishiwaki
Junichi Asada
Keiichi Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69722694D1 publication Critical patent/DE69722694D1/de
Application granted granted Critical
Publication of DE69722694T2 publication Critical patent/DE69722694T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Projection-Type Copiers In General (AREA)
DE69722694T 1996-03-18 1997-03-17 Belichtungsapparat Expired - Fee Related DE69722694T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP6052596 1996-03-18
JP26148896 1996-10-02

Publications (2)

Publication Number Publication Date
DE69722694D1 true DE69722694D1 (de) 2003-07-17
DE69722694T2 DE69722694T2 (de) 2003-12-18

Family

ID=26401603

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69722694T Expired - Fee Related DE69722694T2 (de) 1996-03-18 1997-03-17 Belichtungsapparat
DE69736022T Expired - Fee Related DE69736022T2 (de) 1996-03-18 1997-03-17 Belichtungsapparat

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69736022T Expired - Fee Related DE69736022T2 (de) 1996-03-18 1997-03-17 Belichtungsapparat

Country Status (3)

Country Link
US (1) US5745221A (de)
EP (2) EP1347338B1 (de)
DE (2) DE69722694T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3142821B2 (ja) * 1998-08-27 2001-03-07 株式会社エヌ・ティ・ティ・ドコモ 情報通信ネットワークの課金方法
US6391528B1 (en) 2000-04-03 2002-05-21 3M Innovative Properties Company Methods of making wire grid optical elements by preferential deposition of material on a substrate
FI118165B (fi) * 2002-12-23 2007-07-31 Avantone Oy Mikro-optiseen hilarakenteeseen perustuva visuaalinen efekti
KR101270408B1 (ko) * 2005-01-14 2013-06-07 가부시키가이샤 니콘 노광 방법 및 장치, 및 전자 장치 제조 방법
JP2009253209A (ja) * 2008-04-10 2009-10-29 Canon Inc 露光装置及びデバイス製造方法
US8904316B2 (en) * 2010-11-16 2014-12-02 Eulitha A.G. Method and apparatus for printing high-resolution two-dimensional periodic patterns
CN103235489B (zh) * 2013-05-15 2015-01-07 中国科学院光电技术研究所 可变周期多光束干涉光刻的方法
CN103616803B (zh) * 2013-11-25 2015-09-09 中国科学院长春光学精密机械与物理研究所 光栅尺真空复制曝光设备
CN106597471B (zh) * 2016-11-08 2019-05-24 上海禾赛光电科技有限公司 具有透明障碍物自动检测功能的车辆及方法
US11036145B2 (en) * 2018-12-21 2021-06-15 Applied Materials, Inc. Large area self imaging lithography based on broadband light source

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5638211A (en) * 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US5367588A (en) * 1992-10-29 1994-11-22 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same
JPH0536586A (ja) * 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法
JP3194155B2 (ja) * 1992-01-31 2001-07-30 キヤノン株式会社 半導体デバイスの製造方法及びそれを用いた投影露光装置
US5446587A (en) * 1992-09-03 1995-08-29 Samsung Electronics Co., Ltd. Projection method and projection system and mask therefor
US5642183A (en) * 1993-08-27 1997-06-24 Sharp Kabushiki Kaisha Spatial filter used in a reduction-type projection printing apparatus
GB2289771B (en) * 1994-05-26 1997-07-30 Northern Telecom Ltd Forming Bragg gratings in photosensitive waveguides

Also Published As

Publication number Publication date
EP0797121A3 (de) 1998-06-03
EP1347338B1 (de) 2006-05-31
EP1347338A1 (de) 2003-09-24
EP0797121B1 (de) 2003-06-11
DE69736022D1 (de) 2006-07-06
DE69722694T2 (de) 2003-12-18
EP0797121A2 (de) 1997-09-24
US5745221A (en) 1998-04-28
DE69736022T2 (de) 2006-10-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee