DE69727016D1 - Belichtungsapparat - Google Patents
BelichtungsapparatInfo
- Publication number
- DE69727016D1 DE69727016D1 DE69727016T DE69727016T DE69727016D1 DE 69727016 D1 DE69727016 D1 DE 69727016D1 DE 69727016 T DE69727016 T DE 69727016T DE 69727016 T DE69727016 T DE 69727016T DE 69727016 D1 DE69727016 D1 DE 69727016D1
- Authority
- DE
- Germany
- Prior art keywords
- exposure apparatus
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27985496 | 1996-10-02 | ||
JP27985496A JP3283767B2 (ja) | 1996-10-02 | 1996-10-02 | 露光装置およびデバイス製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69727016D1 true DE69727016D1 (de) | 2004-02-05 |
DE69727016T2 DE69727016T2 (de) | 2004-11-25 |
Family
ID=17616876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69727016T Expired - Lifetime DE69727016T2 (de) | 1996-10-02 | 1997-10-01 | Belichtungsapparat |
Country Status (6)
Country | Link |
---|---|
US (1) | US6008885A (de) |
EP (1) | EP0834772B1 (de) |
JP (1) | JP3283767B2 (de) |
KR (1) | KR100276796B1 (de) |
DE (1) | DE69727016T2 (de) |
TW (1) | TW420842B (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU1260099A (en) * | 1997-11-25 | 1999-06-15 | Nikon Corporation | Projection exposure system |
AU4057999A (en) * | 1998-06-02 | 1999-12-20 | Nikon Corporation | Scanning aligner, method of manufacture thereof, and method of manufacturing device |
CN1309017C (zh) * | 1998-11-18 | 2007-04-04 | 株式会社尼康 | 曝光方法和装置 |
US6727981B2 (en) | 1999-07-19 | 2004-04-27 | Nikon Corporation | Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method |
JP2001148341A (ja) * | 1999-11-19 | 2001-05-29 | Nikon Corp | 露光装置 |
TW538256B (en) | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
WO2002044786A2 (en) * | 2000-11-28 | 2002-06-06 | Carl Zeiss Smt Ag | Catadioptric projection system for 157 nm lithography |
JP3728180B2 (ja) | 2000-06-01 | 2005-12-21 | キヤノン株式会社 | 干渉計搭載ステージ |
US6774981B1 (en) * | 2000-09-08 | 2004-08-10 | Nikon Corporation | Modular exposure apparatus with removable optical device and improved isolation of the optical device |
JP2002289515A (ja) | 2000-12-28 | 2002-10-04 | Nikon Corp | 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法 |
JP3495992B2 (ja) * | 2001-01-26 | 2004-02-09 | キヤノン株式会社 | 補正装置、露光装置、デバイス製造方法及びデバイス |
KR20030036254A (ko) * | 2001-06-13 | 2003-05-09 | 가부시키가이샤 니콘 | 주사노광방법 및 주사형 노광장치 그리고 디바이스 제조방법 |
WO2004053956A1 (ja) * | 2002-12-10 | 2004-06-24 | Nikon Corporation | 露光装置及び露光方法、デバイス製造方法 |
JP4595320B2 (ja) * | 2002-12-10 | 2010-12-08 | 株式会社ニコン | 露光装置、及びデバイス製造方法 |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
KR20140138350A (ko) | 2004-05-17 | 2014-12-03 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
KR102015401B1 (ko) * | 2012-12-21 | 2019-08-29 | 삼성디스플레이 주식회사 | 광학계 및 기판 밀봉 방법 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5999722A (ja) * | 1982-11-29 | 1984-06-08 | Canon Inc | 半導体焼付露光制御方法 |
DE3588012T2 (de) * | 1984-06-21 | 1995-09-14 | At & T Corp., New York, N.Y. | Lithographie im fernen UV-Gebiet. |
US4724466A (en) * | 1986-01-17 | 1988-02-09 | Matsushita Electric Industrial Co., Ltd. | Exposure apparatus |
JP2728898B2 (ja) * | 1988-10-05 | 1998-03-18 | キヤノン株式会社 | 露光装置 |
US5204711A (en) * | 1990-06-08 | 1993-04-20 | Nippon Seiko Kabushiki Kaisha | Projection exposure device |
JP3182158B2 (ja) * | 1991-02-25 | 2001-07-03 | キヤノン株式会社 | 露光装置用のステージ支持装置 |
JP2830492B2 (ja) * | 1991-03-06 | 1998-12-02 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
US5281996A (en) * | 1992-09-04 | 1994-01-25 | General Signal Corporation | Photolithographic reduction imaging of extended field |
JPH06302491A (ja) * | 1993-04-15 | 1994-10-28 | Nikon Corp | 露光量制御装置 |
JP3255312B2 (ja) * | 1993-04-28 | 2002-02-12 | 株式会社ニコン | 投影露光装置 |
JPH07211620A (ja) * | 1994-01-25 | 1995-08-11 | Sony Corp | 半導体露光装置 |
JP3506158B2 (ja) * | 1995-04-14 | 2004-03-15 | 株式会社ニコン | 露光装置及び走査型露光装置、並びに走査露光方法 |
US5508518A (en) * | 1995-05-03 | 1996-04-16 | International Business Machines Corporation | Lithography tool with vibration isolation |
KR960042227A (ko) * | 1995-05-19 | 1996-12-21 | 오노 시게오 | 투영노광장치 |
US5721606A (en) * | 1995-09-07 | 1998-02-24 | Jain; Kanti | Large-area, high-throughput, high-resolution, scan-and-repeat, projection patterning system employing sub-full mask |
US5798838A (en) * | 1996-02-28 | 1998-08-25 | Nikon Corporation | Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same |
-
1996
- 1996-10-02 JP JP27985496A patent/JP3283767B2/ja not_active Expired - Fee Related
-
1997
- 1997-09-29 US US08/941,629 patent/US6008885A/en not_active Expired - Lifetime
- 1997-10-01 DE DE69727016T patent/DE69727016T2/de not_active Expired - Lifetime
- 1997-10-01 TW TW086114308A patent/TW420842B/zh not_active IP Right Cessation
- 1997-10-01 KR KR1019970050764A patent/KR100276796B1/ko not_active IP Right Cessation
- 1997-10-01 EP EP97307732A patent/EP0834772B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
TW420842B (en) | 2001-02-01 |
EP0834772A3 (de) | 1998-12-23 |
JPH10106940A (ja) | 1998-04-24 |
KR19980032469A (ko) | 1998-07-25 |
EP0834772A2 (de) | 1998-04-08 |
KR100276796B1 (ko) | 2001-01-15 |
JP3283767B2 (ja) | 2002-05-20 |
US6008885A (en) | 1999-12-28 |
EP0834772B1 (de) | 2004-01-02 |
DE69727016T2 (de) | 2004-11-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |