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DE69820327D1 - Negativ arbeitendes Bildaufzeichnungsmaterial - Google Patents

Negativ arbeitendes Bildaufzeichnungsmaterial

Info

Publication number
DE69820327D1
DE69820327D1 DE69820327T DE69820327T DE69820327D1 DE 69820327 D1 DE69820327 D1 DE 69820327D1 DE 69820327 T DE69820327 T DE 69820327T DE 69820327 T DE69820327 T DE 69820327T DE 69820327 D1 DE69820327 D1 DE 69820327D1
Authority
DE
Germany
Prior art keywords
recording material
image recording
negative working
working image
negative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69820327T
Other languages
English (en)
Other versions
DE69820327T2 (de
Inventor
Kazuto Kunita
Keitaro Aoshima
Ippei Nakamura
Tatsuo Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69820327D1 publication Critical patent/DE69820327D1/de
Application granted granted Critical
Publication of DE69820327T2 publication Critical patent/DE69820327T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69820327T 1997-04-21 1998-04-21 Negativ arbeitendes Bildaufzeichnungsmaterial Expired - Lifetime DE69820327T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10364797A JP3798504B2 (ja) 1997-04-21 1997-04-21 ネガ型画像記録材料

Publications (2)

Publication Number Publication Date
DE69820327D1 true DE69820327D1 (de) 2004-01-22
DE69820327T2 DE69820327T2 (de) 2004-10-07

Family

ID=14359576

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69820327T Expired - Lifetime DE69820327T2 (de) 1997-04-21 1998-04-21 Negativ arbeitendes Bildaufzeichnungsmaterial

Country Status (4)

Country Link
US (1) US6083658A (de)
EP (1) EP0874282B1 (de)
JP (1) JP3798504B2 (de)
DE (1) DE69820327T2 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6489078B1 (en) * 1996-07-19 2002-12-03 Agfa-Gevaert IR radiation-sensitive imaging element and a method for producing lithographic plates therewith
US6174646B1 (en) * 1997-10-21 2001-01-16 Konica Corporation Image forming method
JP2000035669A (ja) * 1998-07-17 2000-02-02 Fuji Photo Film Co Ltd ネガ型画像記録材料
DE69930019T2 (de) * 1998-08-24 2006-10-12 Fuji Photo Film Co., Ltd., Minami-Ashigara Lichtempfindliche Harzzusammensetzung und Flachdruckplatte
JP3917318B2 (ja) * 1999-02-24 2007-05-23 富士フイルム株式会社 ポジ型平版印刷用材料
JP2000309174A (ja) * 1999-04-26 2000-11-07 Fuji Photo Film Co Ltd 平版印刷版用原版
EP1059164B1 (de) * 1999-05-31 2006-04-19 Fuji Photo Film Co., Ltd. Bildaufzeichnungsmaterial und Flachdruckplatte mit diesem Bildaufzeichnungsmaterial
JP3761359B2 (ja) * 1999-07-08 2006-03-29 東京応化工業株式会社 グラビア印刷版材の製造方法
JP3929653B2 (ja) * 1999-08-11 2007-06-13 富士フイルム株式会社 ネガ型レジスト組成物
KR100474544B1 (ko) * 1999-11-12 2005-03-08 주식회사 하이닉스반도체 Ｔｉｐｓ 공정용 포토레지스트 조성물
JP3989149B2 (ja) * 1999-12-16 2007-10-10 富士フイルム株式会社 電子線またはｘ線用化学増幅系ネガ型レジスト組成物
JP2002006483A (ja) * 2000-06-20 2002-01-09 Sumitomo Chem Co Ltd フォトレジスト組成物
GB0019251D0 (en) * 2000-08-04 2000-09-27 Lintfield Limited Photoinitiated reactions
EP1182033B1 (de) * 2000-08-21 2006-11-22 Fuji Photo Film Co., Ltd. Bildaufzeichnungsmaterial
JP2002072462A (ja) * 2000-08-25 2002-03-12 Fuji Photo Film Co Ltd 平版印刷版原版及びその製版方法
US6451502B1 (en) 2000-10-10 2002-09-17 Kodak Polychrome Graphics Llc manufacture of electronic parts
US6451510B1 (en) 2001-02-21 2002-09-17 International Business Machines Corporation Developer/rinse formulation to prevent image collapse in resist
US6599676B2 (en) * 2002-01-03 2003-07-29 Kodak Polychrome Graphics Llc Process for making thermal negative printing plate
US6677106B2 (en) * 2002-01-03 2004-01-13 Kodak Polychrome Graphics Llc Method and equipment for using photo- or thermally imagable, negatively working patterning compositions
US6723495B2 (en) 2002-01-24 2004-04-20 Kodak Polychrome Graphics Llc Water-developable negative-working ultraviolet and infrared imageable element
US6787281B2 (en) 2002-05-24 2004-09-07 Kodak Polychrome Graphics Llc Selected acid generating agents and their use in processes for imaging radiation-sensitive elements
EP1369231A3 (de) * 2002-06-05 2009-07-08 FUJIFILM Corporation Infrarotempfindliche Zusammensetzung und Bildaufzeichnungsmaterial für IR-Strahlung
JP2004012706A (ja) * 2002-06-05 2004-01-15 Fuji Photo Film Co Ltd 平版印刷版原版
JP3850767B2 (ja) * 2002-07-25 2006-11-29 富士通株式会社 レジストパターン厚肉化材料、レジストパターン及びその製造方法、並びに、半導体装置及びその製造方法
US20080299363A1 (en) * 2003-02-03 2008-12-04 Jivan Gulabrai Bhatt Method for Preparation of a Lithographic Printing Plate and to a Lithographic Printing Plate Produced by the Method
US7399507B2 (en) * 2003-02-03 2008-07-15 Jivan Gulabrai Bhatt Method for preparation of a lithographic printing plate and to a lithographic printing plate produced by the method
AU2003286758A1 (en) 2003-07-17 2005-03-07 Honeywell International Inc Planarization films for advanced microelectronic applications and devices and methods of production thereof
JP4699053B2 (ja) * 2005-03-10 2011-06-08 東京応化工業株式会社 カラーフィルタ用感光性樹脂組成物およびカラーフィルタ
GB2476976A (en) 2010-01-18 2011-07-20 Lintfield Ltd Protected aryl ketones and their use as photoinitiators
JP5919122B2 (ja) * 2012-07-27 2016-05-18 富士フイルム株式会社 樹脂組成物及びそれを用いたパターン形成方法
JP5927095B2 (ja) * 2012-09-28 2016-05-25 富士フイルム株式会社 感活性光線性又は感放射線性組成物、並びに、それを用いたレジスト膜、マスクブランクス、及びレジストパターン形成方法
US9890130B2 (en) * 2013-02-15 2018-02-13 Empire Technology Development Llc Phenolic epoxy compounds
JP6064666B2 (ja) * 2013-02-20 2017-01-25 Jsr株式会社 硬化性組成物、着色画素及びその形成方法、並びにカラーフィルタ
KR101806862B1 (ko) 2013-06-13 2017-12-08 엠파이어 테크놀로지 디벨롭먼트 엘엘씨 다작용 페놀 수지
WO2014208542A1 (ja) * 2013-06-26 2014-12-31 日産化学工業株式会社 置換された架橋性化合物を含むレジスト下層膜形成組成物
EP3077364A4 (de) 2013-12-02 2017-11-08 Empire Technology Development LLC Neuartige geminitenside und deren verwendung
JP6482611B2 (ja) * 2017-07-18 2019-03-13 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
DE3943413A1 (de) * 1989-12-30 1991-07-04 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefstrukturen
DE4111444A1 (de) * 1991-04-09 1992-10-15 Hoechst Ag Naphthochinondiazid-sulfonsaeure-mischester enthaltendes gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5340699A (en) * 1993-05-19 1994-08-23 Eastman Kodak Company Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
JP3515846B2 (ja) * 1995-02-06 2004-04-05 富士写真フイルム株式会社 ネガ型画像記録材料
US5648196A (en) * 1995-07-14 1997-07-15 Cornell Research Foundation, Inc. Water-soluble photoinitiators
US6132935A (en) * 1995-12-19 2000-10-17 Fuji Photo Film Co., Ltd. Negative-working image recording material

Also Published As

Publication number Publication date
US6083658A (en) 2000-07-04
JPH10293401A (ja) 1998-11-04
JP3798504B2 (ja) 2006-07-19
DE69820327T2 (de) 2004-10-07
EP0874282A1 (de) 1998-10-28
EP0874282B1 (de) 2003-12-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP