TW202012917A - Foreign object inspection device, exposure device, and article manufacturing method to be robust against a decrease in flatness of an inspection object - Google Patents

Abstract

The present invention provides a foreign object inspection device that is robust against a decrease in flatness of an inspection object. A foreign object inspection device for inspecting a foreign object on an inspection surface of an object includes a light projection unit that projects an inspection light onto the inspection surface; and a light receiving unit that receives the scattered light from the foreign object generated due to the inspection light projected through the light projection unit. In the foreign object inspection device, the light projection unit and the light receiving unit are configured based on an offset position on a height range with respect to the inspection surface where the optic axis of light projection unit intersects the optic axis of light receiving unit.

Description

Foreign matter inspection device, exposure device and article manufacturing method

The invention relates to a foreign object inspection device, an exposure device, and an article manufacturing method.

In recent years, there is a concern that due to the enlargement of the mask used in the exposure device, the mask will deflect due to its own weight and the image performance will deteriorate. Therefore, an exposure apparatus is known that closes the upper side of the mask by a flat glass to form a sealed chamber, detects the deflection of the lower surface of the mask, and adjusts the pressure of the sealed chamber based on the detection result to correct the deflection of the mask.

In addition, a foreign object inspection device for inspecting foreign objects on an inspection surface of an object is known (for example, Patent Document 1). When foreign object inspection is performed on an exposure apparatus having the above-described structure, not only the mask but also the above-mentioned flat glass may be the object of inspection. [Prior Technical Literature] [Patent Literature]

Patent Document 1: Japanese Patent Application Publication No. 2012-032252

[Problems to be solved by the invention]

However, the flat glass is generally formed to be thinner than the mask. In this case, the amount of deflection of the flat glass is expected to be greater than that of the mask. Such a large deflection of the inspection object affects the accuracy of determination of the presence or absence of foreign objects.

An object of the present invention is to provide, for example, a foreign object inspection apparatus that is robust against a decrease in flatness of an inspection object. [Means for solving the problem]

According to a first aspect of the present invention, there is provided a foreign object inspection device, which is a foreign object on an inspection surface of an inspection object, and has: a light projection unit that projects inspection light onto the inspection surface; and a light reception unit that accepts Scattered light from the foreign object generated by projecting the inspection light by the light projection unit; the foreign object inspection device is located at a height that can be taken from the surface to be inspected at a point where the optical axis of the light projection unit and the optical axis of the light receiving unit intersect The light projecting portion and the light receiving portion are arranged in such a manner that the range is shifted. [Effect of invention]

According to the present invention, for example, it is possible to provide a foreign object inspection apparatus that is robust against the decrease in the flatness of the inspection object.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, the following embodiments are merely specific examples showing the implementation of the present invention, and the present invention is not limited to the following embodiments. In addition, not all combinations of features described in the following embodiments are necessary for solving the problems of the present invention.

[Exposure device] FIG. 1 shows the structure of the exposure apparatus of the embodiment. The exposure device is a device that projects the pattern of the mask on the substrate and exposes the substrate. The mask 5 faces downward with the pattern and is held by the mask holder 6 by vacuum suction. A light source 1 that emits exposure light is provided above the mask 5, and an illumination optical system 2 is provided between the light source 1 and the mask 5. On the side of the mask 5 through which the exposure light is transmitted, a substrate 12 that is an object of exposure is disposed via the projection optical system 11. The exposure light emitted from the light source 1 is irradiated to the mask 5 by the illumination optical system 2. The image of the pattern formed on the mask 5 is projected onto the substrate 12 through the projection optical system 11 using the exposure light. A detection system 21 that detects the deflection of the mask 5 is provided below the mask holder 6.

The detection system 21 has a structure and function of an oblique incidence type focus sensor. The detection light is projected from an oblique direction with respect to the pattern surface of the mask 5 from a light source 10 such as a light emitting diode via a projection lens (not shown). The reflected light is detected by a detector 9 such as a photodiode through a light-receiving lens (not shown) to detect the deflection of the mask 5.

The detection signal output side of the probe 9 is connected to the calculation unit 8. An air pressure control unit 7 is connected to the output side of the computing unit 8. The air pressure control unit 7 is connected to the airtight chamber 13 that corrects the deflection of the mask 5 via the tube 4. The airtight chamber 13 has a closed box shape in which the lower surface side is closed by the cover 5 and the upper surface side is closed by the flat glass 3 (glass plate). The flat glass 3 is disposed above the cover 5 separately from the cover 5 and is used to define an airtight chamber 13 as a space for correcting the deflection of the cover 5. Since the flat glass 3 is a flat plate, it does not affect the exposure light. The space partitioned by the flat glass 3 and the cover 5 is used as an airtight chamber 13, and the pressure of the airtight chamber is controlled by the air pressure control unit 7 to control the deflection of the cover 5. The air pressure control unit 7 controls the air pressure of the airtight chamber 13 based on the air pressure control amount input from the calculation unit 8. In this way, the detection system 21 detects the deflection of the mask 5, the calculation unit 8 calculates the deflection amount and the air pressure control amount that corrects the deflection amount, and the air pressure control unit 7 controls the air pressure of the airtight chamber 13. Therefore, the lateral shift of the pattern due to the deflection due to the dead weight of the mask 5, the curvature of the image plane, the distortion due to the thermal deformation of the mask 5, the curvature of the image plane, etc. are alleviated, and the mask can be shielded well The projection of the pattern of the cover 5.

[Foreign Object Inspection Device] When foreign matter adheres to the upper and lower surfaces (especially the upper surface) of the flat glass 3, the upper surface (non-patterned surface) of the mask 5, and the protective film 27 that protects the pattern of the mask 5, image performance during exposure may deteriorate. Therefore, a foreign object inspection device is used to detect a foreign object from these parts, and when a foreign object is detected, the foreign object needs to be removed.

In this embodiment, the foreign object inspection device may be provided in the exposure device or may be provided as an external device of the exposure device. For example, as shown in FIG. 2, the foreign object inspection device of the flat glass 3 can be inspected by the foreign object inspection device 50 in the exposure device. The foreign object inspection device 50 inspects the foreign objects adhering to the surface of the light-transmitting plate-shaped member disposed in the exposure device. The light-transmitting plate-shaped member is, for example, flat glass 3. The foreign matter inspection on the flat glass 3 is performed in a state where the mask 5 and the flat glass 3 are arranged on the mask mount 14 for exposure as shown in FIG. 2.

The foreign object inspection device 50 includes a light projection unit 25 that projects inspection light (illumination light) onto the inspection surface of the object, and a light receiving unit 26 that receives scattered light from foreign objects generated by the projection light projected by the light projection unit. The light projection section 25 may include: a light source 16, which is a light emitting diode (LED), etc.; an illumination lens 17, which is a passer of outgoing light emitted from the light source 16; and a parallel flat glass 24, which passes through the illumination lens 17 for modification An optical path changing member of the optical path of the emitted light on the inspection surface. The light source 16 may be, for example, an LED that emits light of the same wavelength as the light of the light source 1 (FIG. 1) of the exposure device. In recent years, the size of the mask has been continuously developed. In order to cope with this situation, the light source 16 may be arranged in a direction (X direction) orthogonal to the inspection drive direction (Y direction in FIG. 2) during foreign object inspection. Line LEDs with multiple columns of LEDs. In addition, the light projection unit 25 may include an adjustment unit 51 as a mechanism for adjusting the position of the light projection unit 25 in the Y direction.

The light receiving unit 26 may include a light receiving lens 18 and a sensor unit 19 that converts light passing through the light receiving lens 18 into an electrical signal. When the line LED is used as the light source 16 of the light projecting section 25, the light receiving lens 18 may be an array lens extending in the X direction accordingly. In addition, the light receiving unit 26 may include an adjustment unit 52 as a mechanism for adjusting the position of the light receiving unit 26 in the Y direction.

The light projection unit 25 projects inspection light from an oblique direction onto the flat glass 3 as the inspection surface of the object. The light-receiving unit 26 receives scattered light from foreign matter generated by projecting inspection light. In the embodiment, the incident angle of the inspection light from the light source 16 is set obliquely with respect to the normal of the inspection surface. In addition, the optical axis of the light-receiving unit 26 (surface to be inspected → light-receiving lens 18 → sensor unit 19) is set obliquely to the normal to the surface to be inspected.

In this way, the foreign object inspection device 50 is arranged on the upper side of the flat glass 3 and inspects the foreign objects on the upper surface of the flat glass 3. As described above, since the sealed space formed by the mask 5 and the flat glass 3 has a low probability of adhering to the lower surface of the flat glass 3, the lower surface of the flat glass 3 can be excluded from the inspection object. The foreign object inspection device 50 can perform inspection while driving the mask stage 14 in the Y direction in order to perform foreign object inspection on the entire area of the flat glass 3 to be inspected.

FIG. 3 is a diagram showing a configuration example of a foreign object inspection device 501 provided outside the exposure device. In the example of FIG. 3, the mask 5 is held by the mask holder 28 (inspection mounting table), and the flat glass 3 above the mask 5 is used as the inspection surface. The first inspection unit 70 has the same structure as the foreign object inspection device 50 of FIG. 2. In addition, the first inspection section 70 may include an adjustment section 53 as a mechanism for adjusting the position of the first inspection section 70 in the Z direction. When the surface of the mask 5 is not the flat glass 3 but the surface to be inspected, it can be adjusted by the adjustment unit 53 by withdrawing the flat glass 3 (and other components forming a closed space) from above the mask 5 The position of the first inspection unit 70 in the Z direction is used for inspection.

In addition, the foreign object inspection device 501 includes a second inspection unit 80 for inspecting the foreign object against the protective film 27 that is a light-transmitting plate-shaped member. The second inspection unit 80 includes a light projecting unit 56 and a light receiving unit 57. The light projecting portion 56 and the light receiving portion 57 may have the same structure as the light projecting portion 25 and the light receiving portion 26 of the foreign object inspection device 50 shown in FIG. 2, respectively. In addition, the light projecting portion 56 includes an adjusting portion 58 as a mechanism for adjusting the position of the light projecting portion 56 in the Y direction, and the light receiving portion 57 includes an adjusting portion 59 as a mechanism for adjusting the position of the light receiving portion 57 in the Y direction. In addition, the second inspection section 80 may include an adjustment section 60 as a mechanism for adjusting the position of the second inspection section 80 in the Z direction. The control unit C controls each adjustment unit provided in the first inspection unit 70 and the second inspection unit 80. In addition, the control unit C includes, for example, a processor including a CPU and a memory, and also functions as a processing unit that processes the light-receiving results of the light-receiving unit 26 and the light-receiving unit 57 to determine the presence or absence of foreign matter (in addition, FIG. 2 also has Such a control unit, but these illustrations are omitted in FIG. 2 ).

According to such a foreign object inspection device 501 provided outside the exposure device, foreign objects can be inspected also on arbitrary components of the flat glass 3, the upper surface (non-patterned surface) of the mask 5, and the protective film 27. In FIG. 4, the upper left diagram shows a case where the first inspection section 70 performs foreign object inspection on the upper surface of the mask 5. The upper right diagram shows a case where the first inspection unit 70 performs foreign matter inspection on the upper surface of the flat glass 3. In this way, the control section C controls the adjustment section 53 of the first inspection section 70 to adjust the position of the first inspection section 70 in the Z direction by the amount indicated by ΔZ, so that the scattered light from the foreign matter can be accurately detected. In addition, the mask holder 28 is configured to be movable in the Y direction by a drive mechanism (not shown). Therefore, in order to perform the foreign object inspection in the entire area to be inspected, the foreign object inspection device 501 can perform the inspection while driving the mask holder 28 in the Y direction.

[About the arrangement of the light projecting part and the light receiving part] Hereinafter, the relationship between the light projecting section 25 and the light receiving section 26 of FIG. 2 or FIG. 3 will be described. The relationship between the light projecting unit 56 and the light receiving unit 57 in FIG. 3 can also be discussed in the same way.

As described above, in the embodiment, the incident angle of the inspection light from the light source 16 is set obliquely with respect to the normal line of the inspection surface. In addition, the optical axis of the light-receiving unit 26 (surface to be inspected → light-receiving lens 18 → sensor unit 19) is set obliquely to the normal to the surface to be inspected. The arrangement of the light projecting portion 25 and the light receiving portion is determined in accordance with the following inspection specifications: (1) the regular reflection light of the inspection light from the inspection surface does not enter the sensor portion 19; (2) stray light such as flash light It is not incident on the sensor part 19; (3) Satisfies the detection accuracy of foreign objects.

However, the light emitted by the LED has no directivity but has a light distribution angle distribution. Therefore, even if the collimating lens is properly arranged between the LED light emitting surface and the inspection surface, the illumination area on the inspection surface expands, and an intensity distribution is generated in this area (in the direction in which the rows of LED light emitting elements are arranged Intensity distribution in the direction of intersection). For example, as shown in FIG. 5, the intensity distribution I of the inspection light obliquely incident from the light source to the inspection surface tends to become largest on the incident optical axis and become smaller in the off-axis direction.

This means that due to the difference in the shape of the inspection surface, the relative positional relationship between the optical axis of the light-receiving portion on the inspection surface and the illumination area with intensity distribution changes within the inspection area, and as a result, the inspection results of foreign objects of the same size are deviated. In the following, a structure for suppressing such variations in the inspection results is proposed.

Generally, the thickness of the flat glass 3 is smaller than that of the mask. The reason is to suppress the utility and cost related to weight even slightly. In addition, it is because the increase in the deflection caused by the decrease in thickness has a smaller adverse effect on the exposure performance than the mask. An example of the deflection of the mask 5 is shown in the lower left of FIG. 4, and an example of the deflection of the flat glass 3 is shown in the lower right. The deflection is shown in dashed lines. In this way, the deflection of the mask is smaller than the deflection of the flat glass 3. Therefore, when the object to be inspected is the mask, it is less likely to be affected by the change in the intensity of the inspection light. In the example of FIG. 5, at positions A, B, and C in the Y direction, the height of the inspected surface (position in the Z direction) is almost the same. In this case, at positions A, B, and C in the Y direction, the optical axis of the light-receiving section 26 is respectively near the peak position of the light intensity distribution on the inspection surface, as shown in FIG. 6(A), The light intensity changes little between positions A, B, and C. Therefore, as shown in (B) of FIG. 6, the variation in the intensity of the optical signal received for foreign objects of the same size is small. Therefore, it is sufficient to arrange the light projecting part and the light receiving part on the inspection surface such that the optical axis of the light projecting part and the light receiving part intersect. In this case, the intensity of the inspection light and the light from the foreign matter also change It is large enough to maintain the signal output on the sensor high.

In contrast, in the case of the flat glass 3, since the deflection is relatively large, it is easily affected by the change in the intensity of the inspection light. As shown in FIG. 7, at the position A, when the height of the inspection surface (position in the Z direction) changes by Z1 based on the position B, the illumination area is shifted by a in parallel with the inspection surface. Similarly, at the position C, when the height of the inspection surface (position in the Z direction) changes by Z2 based on the location B, the illumination area is shifted by b in parallel to the inspection surface.

When the inspection object is the flat glass 3, when the arrangement is adjusted on the inspection surface such that the optical axis of the light-emitting portion and the optical axis of the light-receiving portion intersect, the variation in signal intensity for foreign objects of the same size becomes larger. This is because the intensity change in the vicinity of the optical axis of the light projecting portion is large, so it is sensitive to the height change of the inspection surface. Since the illumination area shifts in the direction (a, b) parallel to the inspected surface corresponding to the deflection (Z1, Z2) on the inspected surface, as shown in (A) of FIG. 8, in the Y direction The illumination intensity on the optical axis of the light receiving section on the inspection surface between the upper positions A, B, and C changes sensitively. Therefore, as shown in (B) of FIG. 8, the variation in signal intensity for foreign objects of the same size becomes larger.

Therefore, in the embodiment, the light projecting unit 25 and the light receiving unit 26 are arranged so that the point where the optical axis of the light projecting unit 25 and the optical axis of the light receiving unit 26 intersect at a position offset from the height range that can be taken by the inspection surface. For example, as shown in FIG. 9, the optical axis of the light-receiving unit 26 is located in a direction (Y direction) parallel to the surface to be inspected in a region on the inspection plane that is offset from the optical axis of the light-projecting unit 25. The light projecting portion 25 and the light receiving portion 26 are arranged in a region where the change in glazing intensity is gentle. Therefore, as shown in FIG. 10(A), even if the illumination area shifts in the direction (a, b) parallel to the inspected surface corresponding to the deflection (Z1, Z2) on the inspected surface, the The light intensity on the optical axis of the light receiving portion on the inspection surface between the positions A, B, and C in the Y direction also changes slowly (slowly). Therefore, as shown in (B) of FIG. 10, the variation in signal intensity for foreign objects of the same size is also small. At this time, the intensity of the illumination light and the light from the foreign object also become smaller, and the signal output on the sensor becomes lower. However, it suffices to ensure the signal strength that does not affect the presence or absence of the foreign object. The output of the light source can be adjusted by a change in the amount of light from the foreign object detected by the sensor unit that occurs when the relative position of the light receiving unit with respect to the illumination area is adjusted.

In addition, in the case of the mask 5, when the optical axis of the light-receiving part comes to the illumination area as when the flat glass 3 is adjusted, the diffracted light generated when the pattern on the lower surface of the mask is illuminated may be Detected by the light receiving unit by mistake. The countermeasures to this will be described later.

The adjustment of the relative position of the light projecting part 25 and the light receiving part 26 can be performed using the adjustment part 51 of the light projecting part 25, the adjustment part 52 of the light receiving part 26, or both. FIG. 11 shows an example in which the adjustment portion 51 using the light projection portion 25 adjusts the light projection portion 25 in the inspection driving direction (Y direction). The control unit C can control the adjustment unit 51 such that the point where the optical axis of the light projecting unit 25 and the optical axis of the light receiving unit 26 intersect at a position offset from the height range that can be taken by the inspection surface. FIG. 12 shows an example of adjusting the light receiving unit 26 in the inspection driving direction (Y direction) using the adjustment unit 52 of the light receiving unit 26. The control unit C can control the adjustment unit 52 such that the point where the optical axis of the light projecting unit 25 and the optical axis of the light receiving unit 26 intersect is at a position offset from the height range that can be taken by the inspection surface. FIG. 13 shows an example of adjusting the position of the optical axis of the light projecting section 25 using the parallel flat glass 24 of the light projecting section 25. Here, as shown in FIG. 13, the light projecting section 25 includes an adjusting section 24a that adjusts the amount of change in the optical path of the outgoing light reaching the inspection surface by adjusting the rotation angle of the parallel plate glass 24 as an optical path changing member . The control unit C can control the adjustment unit 24a such that the point where the optical axis of the light projecting unit 25 and the optical axis of the light receiving unit 26 intersect is at a position offset from the height range that can be taken by the inspection surface.

In the embodiment, the control section C controls these adjustment sections according to the flatness (including deflection and unevenness shape) of the surface to be inspected. For example, the relationship between the flatness of the surface to be inspected, the light intensity distribution on the surface to be inspected, and the required adjustment amount calculated from the physical characteristic values of the object to be inspected may be recorded in advance, and the adjustment amount may be determined based on the relationship. Here, the flatness of the surface to be inspected may be a value showing a range of heights that the surface to be inspected can take. In addition, before the foreign object inspection, the adjustment amount may be determined based on the pre-calculated or actually measured flatness of the inspection surface and the change in signal intensity for the sample foreign object detection. In this way, the control unit C can determine the adjustment amount based on the previously obtained relationship between the flatness of the inspection surface and the adjustment amount by the adjustment unit.

Adjust as described above so that in the inspection area on the inspection surface, in the desired height range (including deflection and shape) of the inspection surface, the output change of the same size foreign object in the inspection area reaches the foreign object inspection Detection reproducibility level. That is, the control unit C determines the adjustment amount by the adjustment unit so that the predetermined accuracy of the determination of the presence or absence of foreign matter can be ensured even if there is deformation according to the expected flatness on the inspection surface.

Next, countermeasures for erroneous detection of diffracted light from the mask pattern will be described.

In the mask for the exposure device, a processing pattern to be exposed is formed. Therefore, when the object to be inspected by the foreign object inspection apparatus is a mask, the inspection light is projected by the light projection unit to generate diffracted light in the pattern portion of the mask. Such diffracted light may adversely affect the presence or absence of foreign objects. Since the type of pattern is arbitrary, in order to prevent erroneous detection in the light-receiving portion, it is necessary to block inspection light incident on the pattern.

Therefore, in the embodiment, as shown in FIG. 14, a light blocking member 35 that blocks part of the inspection light is arranged near the inspection surface. When the upper surface of the mask 5 is inspected by the first inspection portion 70, as shown in FIG. 15, inspection light is incident on the upper surface of the shield 5, and is refracted to enter the pattern portion P, and the diffracted light from this can enter到光受部26。 The light receiving section 26. Therefore, in the embodiment, the light blocking member 35 is arranged so that the inspection light does not reach (incident) the position of the pattern.

When the protective film 27 is inspected by the second inspection part 80, as shown in FIG. 16, the inspection light enters the surface of the protective film, undergoes refraction, and enters the pattern part P, and the diffracted light from this can enter the light receiving part 56. Therefore, in the embodiment, the light blocking member 35 is arranged so that the inspection light does not reach (incident) the position of the pattern.

In addition, when inspecting the upper surface of the flat glass 3 by the first inspection section 70, as shown in FIG. 17, inspection light enters the upper surface of the flat glass 3, exits through refraction, and enters the upper surface of the mask 5, After being refracted, it enters the pattern portion P. Therefore, the diffracted light from the pattern portion P can enter the light receiving portion 26. Therefore, in the embodiment, the light blocking member 35 is arranged so that the inspection light does not reach (incident) the position of the pattern.

In the above examples of FIGS. 15 to 17, the foreign object inspection device has a light-shielding adjustment portion 35 a that adjusts the position of the light-shielding member 35. The control section C can control the light-shielding adjustment section 35a so that the inspection light does not reach the position of the pattern section P. At this time, even if a change (flatness, posture, shape, deflection, thickness) of the inspection surface occurs, the control unit C may block the inspection light toward the foreign object on the inspection surface, or may instead cause the inspection light The shading adjustment part 35a is controlled so that the pattern part cannot be reached. In addition, the control unit C and the adjustment unit adjust the relative position of the light-emitting unit and the light-receiving unit to adjust the light-shielding adjustment unit 35a. According to this, each time the relative position of the light projecting portion and the light receiving portion is adjusted, the light blocking member 35 is arranged at an appropriate position.

<Embodiment of the article manufacturing method> The article manufacturing method according to the embodiment of the present invention is suitable for manufacturing articles such as micro-devices such as semiconductor devices, devices with fine structures, and flat panel displays. The article manufacturing method of the present embodiment includes a procedure for forming a latent image pattern (a procedure for exposing the substrate) to the photosensitive agent applied to the substrate using the above-mentioned exposure device, and a procedure for developing the substrate on which the latent image pattern has been formed by the procedure. In addition, the manufacturing method includes other well-known procedures (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). Compared with the conventional method, the article manufacturing method of this embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article.

3: flat glass 5: Mask 25: Projection Department 26: Light receiving department 27: Protective film 50: Foreign body inspection device

FIG. 1 is a diagram illustrating a configuration example of an exposure apparatus of an embodiment. FIG. 2 is a diagram showing a configuration example of a foreign object inspection device provided in an exposure device. FIG. 3 is a diagram showing a configuration example of a foreign object inspection device provided outside the exposure device. FIG. 4 is a diagram illustrating an example of the operation of the foreign object inspection device of FIG. 3. 5 is a diagram illustrating an example of foreign object inspection without deflection of an inspection surface. FIG. 6 is a diagram for explaining the deviation of the signal intensity with respect to a foreign object without deflection of the inspection surface. 7 is a diagram illustrating a phenomenon in which the illumination area shifts when there is deflection on the inspection surface. FIG. 8 is a diagram for explaining the deviation of the signal intensity with respect to a foreign object when there is deflection of the inspection surface. 9 is a diagram illustrating an example of the arrangement of a light projecting section and a light receiving section according to an embodiment. FIG. 10 is a diagram illustrating the deviation of the signal intensity with respect to a foreign object in the arrangement of the light projecting portion and the light receiving portion of FIG. 10. FIG. 11 is a diagram illustrating an example of adjusting the relative positions of the light projecting portion and the light receiving portion. FIG. 12 is a diagram illustrating an example of adjusting the relative positions of the light projecting section and the light receiving section. 13 is a diagram illustrating an example of adjusting parallel flat glass. 14 is a diagram showing a configuration example of a light-shielding member. 15 is a diagram showing a configuration example of a light-shielding member. 16 is a diagram showing a configuration example of a light-shielding member. 17 is a diagram showing a configuration example of a light-shielding member.

3: flat glass

5: Mask

6: mask holder

14: Mask mounting table

16: Light source

17: Illumination lens

18: light receiving lens

19: Sensor Department

24: parallel flat glass

25: Projection Department

26: Light receiving department

27: Protective film

50: Foreign body inspection device

51: Adjustment Department

52: Adjustment Department

Claims (12)

A foreign object inspection device, which is a foreign object on an inspection surface of an inspection object, has: A light projection section which projects inspection light onto the aforementioned surface to be inspected; and A light-receiving part, which receives scattered light from the foreign matter generated by projecting the inspection light through the light-projecting part; In the foreign object inspection device, the light projection unit and the light receiving unit are arranged such that a point where the optical axis of the light projection unit and the optical axis of the light receiving unit intersect is located at a position offset from a height range that can be taken by the inspection surface. The foreign matter inspection device according to item 1 of the patent application scope has: An adjusting part that adjusts the relative position of the light projecting part and the light receiving part; and The control unit controls the adjustment unit such that the point where the optical axis of the light projecting unit and the optical axis of the light receiving unit intersect is at a position offset from the height range. The foreign object inspection device according to item 1 of the patent application scope, in which The light projecting section includes: a light source; a lens that passes outgoing light emitted from the light source; and an optical path changing member that changes the optical path of the outgoing light that reaches the inspection surface via the lens; The aforementioned foreign body inspection device has: An adjustment section that adjusts the amount of change in the optical path by adjusting the rotation angle of the optical path changing member; and The control unit controls the adjustment unit such that the point where the optical axis of the light projecting unit and the optical axis of the light receiving unit intersect is at a position offset from the height range. The foreign object inspection device according to claim 2 or 3, wherein the control unit controls the adjustment unit based on the flatness of the inspected surface. The foreign object inspection device according to item 4 of the patent application scope includes a processing unit that processes the light receiving result of the light receiving unit to determine the presence or absence of the foreign object, The control unit determines the adjustment amount based on the adjustment unit so that the predetermined accuracy of the determination can be ensured even if there is a deformation according to the flatness on the inspection surface. According to the foreign object inspection device of claim 5 of the patent application range, the control unit determines the adjustment amount based on a previously obtained relationship between the flatness of the inspected surface and the adjustment amount based on the adjustment unit. The foreign object inspection device according to item 2 of the patent application scope, in which The aforementioned object is a mask for a patterned exposure device, The aforementioned foreign object inspection device further includes: A light blocking member that blocks a part of the aforementioned inspection light; and The shading adjustment part adjusts the position of the shading member, The control section also controls the shading adjustment section so that the inspection light does not reach the position of the pattern. The foreign object inspection device according to item 7 of the patent application range, wherein the control section controls the shading adjustment section in accordance with the control performed on the adjustment section. An exposure device that projects a mask pattern on a substrate to expose the substrate, It includes a foreign object inspection device according to item 1 of the patent application scope, which inspects foreign objects adhering to the surface of a light-transmitting plate-shaped member disposed in the exposure device. The exposure apparatus according to item 9 of the patent application range, wherein the plate-shaped member includes a glass plate, and the glass plate is disposed on the mask separately from the mask to correct the deflection of the mask. The exposure apparatus according to item 9 of the patent application range, wherein the plate-shaped member includes a protective film, and the protective film protects the pattern of the mask. An article manufacturing method, including the following procedures: Expose the substrate using the exposure device according to any one of items 9 to 11 of the patent application scope; and Developing the aforementioned substrate exposed by the aforementioned procedure; The aforementioned article manufacturing method produces articles from the developed aforementioned substrate.

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