KR20200034601A - Foreign matter checking apparatus, exposure apparatus, and article manufacturing method - Google Patents

Abstract

Provided is a foreign matter inspection apparatus, which is robust against reduction in flatness of an inspection target. The foreign matter inspection apparatus for inspecting foreign matters on an inspected surface of an object has: a light transmitting unit which transmits inspection light to the surface to be inspected; and a light receiving unit receiving scattered light from the foreign matter, which is generated when the inspection light is transmitted by the light transmitting unit. The light transmitting unit and the light receiving unit are disposed so that a point at which an optical axis of the light transmitting unit intersects the optical axis of the light receiving unit is deviated from a height range which the surface to be inspected can have.

Description

Foreign body inspection apparatus, exposure apparatus, and method for manufacturing articles {FOREIGN MATTER CHECKING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD}

The present invention relates to a foreign material inspection apparatus, an exposure apparatus, and a method for manufacturing an article.

In recent years, it has been feared that the size of the mask used in the exposure apparatus will bend to its own weight and deteriorate the image performance. Therefore, an exposure apparatus is known that corrects the warpage of a mask by covering the upper side of the mask with a flat glass to form a sealed room, detecting warpage of the lower surface of the mask and adjusting the pressure of the sealed room based on the detection result.

In addition, a foreign material inspection device for inspecting a foreign object on an object to be inspected is known (for example, Patent Document 1). When foreign matter inspection is performed with respect to the exposure apparatus having the above-described configuration, not only the mask but also the flat glass can be subjected to inspection.

Japanese Patent Publication No. 2012-032252

However, it is generally assumed that the flat glass is formed thinner than the mask, so that the amount of warping of the flat glass is larger than that of the mask. The large warpage of such an inspection object affects the determination accuracy of the presence or absence of a foreign object.

An object of the present invention is to provide a foreign material inspection device robust against, for example, a decrease in flatness of an inspection object.

According to a first aspect of the present invention, there is provided a foreign material inspection device for inspecting a foreign object on an object to be inspected, the light transmitting part transmitting the inspection light to the surface to be inspected, and the light generated by the light transmitting the inspection part. The light-transmitting portion and the light-receiving portion are arranged such that the light-receiving portion receives light scattered from a foreign object, and the point at which the optical axis of the light-transmitting portion intersects with the optical axis of the light-receiving portion is a position deviated from a height range that the test surface can take. There is provided a foreign matter inspection device, characterized in that.

ADVANTAGE OF THE INVENTION According to this invention, the foreign material inspection apparatus robust against the fall of the flatness of the inspection object can be provided, for example.

1 is a diagram showing a configuration example of an exposure apparatus according to an embodiment.
2 is a diagram showing a configuration example of a foreign material inspection device provided in an exposure apparatus.
3 is a diagram showing a configuration example of a foreign material inspection device provided outside the exposure apparatus.
4 is a diagram showing an example of the operation of the foreign material inspection device of FIG. 3.
5 is a view for explaining an example of foreign material inspection when there is no warpage of the surface to be inspected.
Fig. 6 is a diagram for explaining variation in signal strength with respect to a foreign material when there is no warpage of the surface to be inspected.
7 is a view for explaining a phenomenon in which the illumination area is shifted when warpage occurs on the surface to be inspected.
8 is a view for explaining a variation in signal strength with respect to a foreign material in the case where there is warpage of the surface to be inspected.
It is a figure explaining the example of arrangement | positioning of a light transmitting part and a light receiving part in embodiment.
10 is a view for explaining variation in signal intensity with respect to a foreign material in the arrangement of the light transmitting portion and the light receiving portion of FIG. 10;
11 is a view for explaining an example of adjusting the relative positions of the light transmitting portion and the light receiving portion.
It is a figure explaining the example which adjusts the relative position of a light transmitting part and a light receiving part.
It is a figure explaining the example which adjusts a parallel plate glass.
14 is a diagram showing an arrangement example of a light blocking member.
15 is a diagram showing an arrangement example of a light blocking member.
Fig. 16 is a view showing an arrangement example of a light blocking member.
17 is a diagram showing an arrangement example of a light blocking member.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, the following embodiment is only showing the specific example of implementation of this invention, and this invention is not limited to the following embodiment. In addition, not all combinations of features described in the following embodiments are essential for solving the problems of the present invention.

[Exposure device]

1 shows the configuration of an exposure apparatus according to the embodiment. The exposure apparatus is an apparatus that exposes a substrate by projecting a pattern of a mask onto the substrate. The mask 5 is held by the vacuum adsorption by the mask holder 6 with the pattern surface facing down. Above the mask 5, a light source 1 for emitting exposure light is provided, and an illumination optical system 2 is provided between the light source 1 and the mask 5. On the side where the exposure light of the mask 5 is transmitted, a substrate 12, which is the object of exposure, is disposed with the projection optical system 11 interposed therebetween. The exposure light emitted from the light source 1 is irradiated to the mask 5 by the illumination optical system 2. The image of the pattern formed on the mask 5 is projected on the substrate 12 through the projection optical system 11 by exposure light. Under the mask holder 6, a detection system 21 for detecting warpage of the mask 5 is provided.

The detection system 21 is provided with a structure and a function of an incidence angle type focus sensor. The detection light is transmitted obliquely to the pattern surface of the mask 5 from a light source 10 such as a light emitting diode through a projection lens (not shown). The deflection of the mask 5 is detected by detecting the reflected light with a detector 9 such as a photodiode through a light receiving lens (not shown).

The detection signal output side of the detector 9 is connected to the calculation unit 8. The air pressure control unit 7 is connected to the output side of the calculation unit 8, and the air pressure control unit 7 is connected to the hermetic chamber 13 for correcting the warpage of the mask 5 through the pipe 4. The hermetic chamber 13 has a closed box shape with a mask 5 on the lower surface and a flat glass 3 (glass plate) on the upper surface. The flat glass 3 is arranged on the mask 5 to be spaced apart from the mask 5, and is used to define the hermetic chamber 13, which is a space for correcting the warpage of the mask 5. Since the flat glass 3 is a flat plate, it does not affect the exposure light. The space placed between the flat glass 3 and the mask 5 becomes the hermetic chamber 13, and the pressure in the hermetic chamber is controlled by the air pressure control unit 7 to control the bending of the mask 5. The air pressure control unit 7 controls the air pressure in the hermetic chamber 13 based on the air pressure control amount input from the operation unit 8. In this way, the warpage of the mask 5 is detected by the detection system 21, the calculation unit 8 calculates the warpage amount and the air pressure control amount to correct the warpage amount, and the airtight control unit 7 seals the hermetic chamber 13 ) The air pressure is controlled. For this reason, lateral displacement of the pattern due to warpage caused by the self-weight of the mask 5, curvature of the upper surface, distortion caused by thermal deformation of the mask 5, curvature of the upper surface, etc. are alleviated, and the mask 5 is satisfactorily reduced. It becomes possible to perform pattern projection of).

[Foreign body inspection device]

When foreign matter adheres to the upper and lower surfaces (especially the upper surface) of the flat glass 3, the upper surface (non-patterned surface) of the mask 5, and the pellicle 27 that protects the pattern of the mask 5, the image performance during exposure deteriorates It is possible. Therefore, it is necessary to detect a foreign object from these locations using a foreign material inspection device, and to remove the foreign material when it is detected.

In this embodiment, the foreign material inspection apparatus may be provided in the exposure apparatus, or may be provided as an external apparatus of the exposure apparatus. For example, as shown in FIG. 2, the foreign material inspection of the flat glass 3 can be performed by the foreign material inspection device 50 in the exposure apparatus. The foreign material inspection device 50 inspects the foreign material attached to the surface of the light-transmitting plate-like member disposed in the exposure device. The light-transmitting plate-shaped member is, for example, flat glass 3. The foreign material inspection on the flat glass 3 is performed in the state where the mask 5 and the flat glass 3 are arrange | positioned as shown in FIG. 2 on the mask stage 14 for exposure.

The foreign material inspection device 50 includes a light transmitting unit 25 that transmits inspection light (illumination light) to a surface to be inspected of an object, and a light receiving unit that receives scattered light from a foreign material, which is generated by transmitting the inspection light by the light transmitting unit ( 26). The light-transmitting unit 25 reaches a surface to be inspected through a light source 16 such as a light emitting diode (LED), an illumination lens 17 through which the light emitted from the light source 16 passes, and an illumination lens 17. And a parallel flat plate glass 24, which is an optical path changing member for changing the optical path of the exit light. The light source 16 may be, for example, an LED emitting light having the same wavelength as the light of the light source 1 (FIG. 1) of the exposure apparatus. In recent years, the enlargement of the mask is in progress, and to cope with this, the light source 16 is a line LED in which multiple LEDs are arranged in a direction perpendicular to the inspection driving direction (Y direction in FIG. 2) (X direction) even in the inspection of foreign matter. You can open. In addition, the light transmitting portion 25 may include an adjusting portion 51 that is a mechanism for adjusting the position of the light transmitting portion 25 in the Y direction.

The light receiving unit 26 may include a light receiving lens 18 and a sensor unit 19 that converts light passing through the light receiving lens 18 into an electrical signal. When the line LED is used for the light source 16 of the light transmitting unit 25, the light receiving lens 18 may be an array lens extending in the X direction accordingly. In addition, the light receiving unit 26 may include an adjusting unit 52 that is a mechanism for adjusting the position of the light receiving unit 26 in the Y direction.

The light transmitting portion 25 transmits the inspection light at an angle on the flat glass 3, which is the object to be inspected. The light-receiving unit 26 receives scattered light from a foreign material, which is generated by transmitting inspection light. In the embodiment, the angle of incidence of the inspection light from the light source 16 is set to be inclined with respect to the normal of the surface to be inspected. Further, the optical axis of the light-receiving section 26 (the surface to be inspected the surface to be inspected → the light-receiving lens 18 to the sensor section 19) is set to be inclined with respect to the normal of the surface to be inspected.

In this way, the foreign material inspection device 50 is disposed on the upper side of the flat glass 3, and inspects the foreign material on the upper surface of the flat glass 3. As described above, since the probability of foreign matter adhering to the lower surface of the flat glass 3 is low because it is an enclosed space by the mask 5 and the flat glass 3, the lower surface of the flat glass 3 is subject to inspection. Can be excluded. The foreign material inspection device 50 can perform inspection while driving the mask stage 14 in the Y direction in order to perform foreign material inspection in all areas to be inspected of the flat glass 3.

3 is a diagram showing a configuration example of a foreign material inspection device 501 provided outside the exposure apparatus. In the example of FIG. 3, the mask 5 is held by the mask holder 28 (inspection stage), and the flat glass 3 on the mask 5 is used as a test surface. The 1st inspection part 70 has a structure similar to the foreign material inspection device 50 of FIG. In addition, the first inspection unit 70 may include an adjustment unit 53 that is a mechanism for adjusting the position of the first inspection unit 70 in the Z direction. When the surface of the mask 5 is not the flat glass 3 but the surface to be inspected, the flat glass 3 (and other members forming the enclosed space) is retracted from the mask 5, and the adjustment section 53 The inspection can be performed by adjusting the position of the first inspection section 70 in the Z direction.

In addition, the foreign material inspection device 501 has a second inspection unit 80 for inspecting foreign matters on the pellicle 27 as a light-transmitting plate-like member. The second inspection unit 80 includes a light transmitting unit 56 and a light receiving unit 57. The light-transmitting section 56 and the light-receiving section 57 may each have the same configuration as the light-transmitting section 25 and the light-receiving section 26 in the foreign material inspection device 50 shown in FIG. 2. In addition, the light transmitting section 56 includes an adjusting section 58 that is a mechanism for adjusting the position of the light transmitting section 56 in the Y direction, and the light receiving section 57 is a mechanism for adjusting the position of the light receiving section 57 in the Y direction. It includes a phosphorus adjustment unit 59. In addition, the second inspection unit 80 may include an adjustment unit 60 that is a mechanism for adjusting the position of the second inspection unit 80 in the Z direction. The control unit C controls each adjustment unit provided in the first inspection unit 70 and the second inspection unit 80. In addition, the control unit C has, for example, a processor including a CPU and a memory, and also functions as a processing unit that processes the light receiving results of the light receiving unit 26 and the light receiving unit 57 to determine the presence or absence of foreign matter (also in FIG. 2). They have such controls, but their illustration is omitted in FIG. 2).

According to the foreign material inspection apparatus 501 provided outside of such an exposure apparatus, foreign matter inspection can be performed on any of the top surface (non-patterned surface) of the flat glass 3, the mask 5, and the pellicle 27. . In FIG. 4, the drawing on the upper left side shows a scene in which the first inspection unit 70 performs foreign object inspection on the upper surface of the mask 5. The drawing on the upper right side shows a scene in which the first inspection unit 70 inspects the upper surface of the flat glass 3 for foreign matter. In this way, the control unit C controls the adjustment unit 53 of the first inspection unit 70 to adjust the position of the first inspection unit 70 in the Z direction by an amount indicated by ΔZ, to accurately detect the scattered light from the foreign material. Make it possible. Further, the mask holder 28 is configured to be movable in the Y direction by a driving mechanism (not shown). Therefore, the foreign material inspection device 501 can perform inspection while driving the mask holder 28 in the Y direction in order to perform foreign object inspection in all areas to be inspected.

[About the arrangement of the light transmitting part and the light receiving part]

Hereinafter, the relationship between the light transmitting portion 25 and the light receiving portion 26 in FIG. 2 or 3 will be described. The same discussion can be made about the relationship between the light-transmitting section 56 and the light-receiving section 57 in FIG. 3.

As described above, in the embodiment, the angle of incidence of the inspection light from the light source 16 is set to be inclined with respect to the normal of the surface to be inspected. Further, the optical axis of the light-receiving section 26 (the surface to be inspected, the surface to be inspected → the light-receiving lens 18 to the sensor 19) is set to be inclined with respect to the normal of the surface to be inspected. Regarding the arrangement of the light-transmitting portion 25 and the light-receiving portion, (1) specular light of the inspection light from the surface to be inspected should not enter the sensor portion 19, (2) stray light such as flare does not enter the sensor portion 19 It is determined according to inspection specifications such as not to be satisfied or (3) to satisfy the detection accuracy of foreign matter.

However, the emitted light of the LED has no directivity and has a distribution angle of light distribution. Therefore, even if a collimator lens is appropriately disposed between, for example, the LED light emitting surface and the surface to be inspected, the illumination area is widened on the surface to be inspected, and the intensity distribution (intensity distribution in the direction perpendicular to the direction in which the LED light emitting elements are arranged in multiple rows) is widened. Occurs. For example, as shown in Fig. 5, the intensity distribution I of the inspection light incident from the light source to the surface to be inspected tends to be maximum on the incident optical axis and small in the off-axis direction.

This means that, due to the different shape of the surface to be inspected, the relative positional relationship between the optical axis of the light-receiving portion on the surface to be inspected and the illumination area having the intensity distribution changes within the inspection area, resulting in fluctuations in inspection results of foreign matter of the same size. Means In the following, a configuration is proposed that suppresses such fluctuations in inspection results.

Usually, the thickness of the flat glass 3 is smaller than that of the mask. The reason is to suppress, even slightly, the weight and cost of the weight. In addition, it is because the adverse effect of the increase in warpage due to the smaller thickness on the exposure performance is smaller than that of the mask. 4 shows an example of bending of the mask 5 on the lower left side and an example of bending of the flat glass 3 on the lower right side. The warpage is indicated by broken lines. As described above, since the curvature of the mask is smaller than that of the flat glass 3, when the object to be inspected is a mask, it is difficult to be affected by the change in intensity of the inspected light. In the example of Fig. 5, the heights (positions in the Z direction) of the surface to be inspected at positions A, B and C in the Y direction are almost the same. In this case, at positions A, B, and C in the Y direction, the optical axis of the light receiving section 26 is near the peak position of the light intensity distribution on the surface to be inspected, and positions A, B, as shown in Fig. 6A. In C, the change in light intensity is small. Therefore, as shown in Fig. 6B, for foreign matters of the same size, the fluctuation of the received optical signal intensity is small. Therefore, the light-transmitting portion and the light-receiving portion may be arranged such that the optical axis of the light-transmitting portion and the optical axis of the light-receiving portion intersect on the surface to be inspected. In this case, the intensity of the inspection light or the light from the foreign material is increased, thereby maintaining a high signal output on the sensor.

On the other hand, in the case of the flat glass 3, since the warpage is relatively large, it is easy to be affected by the change in the intensity of the inspection light. As shown in Fig. 7, in the position A, when the height of the surface to be inspected (position in the Z direction) is Z1 relative to the position B, the illumination area is shifted by a in parallel with the surface to be inspected. Similarly, in the position C, when the height of the surface to be inspected (position in the Z direction) is Z2 relative to the position B, the illumination area is shifted by b in parallel with the surface to be inspected.

When the object to be inspected is the flat glass 3, if the arrangement is adjusted such that the optical axis of the light-transmitting portion and the optical axis of the light-receiving portion intersect on the surface to be inspected, the fluctuation of signal intensity for foreign matters of the same size becomes large. This is because the intensity change in the vicinity of the optical axis of the light-transmitting portion is large, and thus is sensitive to the change in height of the surface to be inspected. As shown in Fig. 8 (A), the illumination area is shifted in the parallel direction (a, b) from the illumination area according to the warpage (Z1, Z2) on the test surface. , The illumination intensity on the optical axis of the light-receiving portion on the test surface is sensitively changed. For this reason, as shown in Fig. 8B, the fluctuation of signal strength for foreign matters of the same size becomes large.

Therefore, in the embodiment, the light-transmitting portion 25 and the light-receiving portion 26 are arranged such that the point at which the optical axis of the light-transmitting portion 25 intersects with the optical axis of the light-receiving portion 26 is a position shifted from within a height range that can be taken by the test surface. do. For example, as shown in FIG. 9, in a region deviating from the optical axis of the light-transmitting portion 25 on the surface to be inspected, in a direction parallel to the surface to be inspected (Y-direction), the light-receiving portion 26 in a region where the change in light intensity is gentle. ), The light-transmitting portion 25 and the light-receiving portion 26 are disposed. Then, as shown in Fig. 10 (A), even if the illumination area is displaced in the parallel direction (a, b) with the inspection surface according to the warpage (Z1, Z2) on the inspection surface, the positions A and B in the Y direction Between, and C, the light intensity on the optical axis of the light-receiving portion on the surface to be inspected changes insensitively. For this reason, as shown in Fig. 10B, the fluctuation of signal strength for foreign matters of the same size is also small. At this time, the intensity of the illumination light or the light from the foreign matter is also small, so that the signal output on the sensor is lowered, but the signal intensity that does not affect the presence or absence of foreign matter may be secured. It is possible to adjust the output of the light source for a change in the amount of light due to the foreign matter detected by the sensor unit, which occurs when adjusting the relative position of the light receiving unit with respect to the illumination area.

Further, in the case of the mask 5, if the optical axis of the light-receiving portion is adjusted to come to the same illumination area as when the flat glass 3 is used, there is a possibility that diffracted light generated when the pattern on the lower surface of the mask is illuminated is incorrectly detected by the light-receiving portion. The countermeasures will be described later.

The relative positions of the light transmitting portion 25 and the light receiving portion 26 can be adjusted using the adjusting portion 51 of the light transmitting portion 25, the adjusting portion 52 of the light receiving portion 26, or both. 11 shows an example in which the light transmitting portion 25 is adjusted in the inspection driving direction (Y direction) using the adjusting portion 51 of the light transmitting portion 25. The control unit C can control the adjustment unit 51 so that the point where the optical axis of the light transmitting unit 25 and the optical axis of the light receiving unit 26 intersect is a position deviated from a height range that can be measured. 12 shows an example in which the light receiving section 26 is adjusted in the inspection driving direction (Y direction) using the adjustment section 52 of the light receiving section 26. The control unit C can control the adjustment unit 52 such that the point where the optical axis of the light transmitting unit 25 intersects with the optical axis of the light receiving unit 26 is a position deviated from a height range that can be measured. 13 shows an example in which the position of the optical axis of the light-transmitting portion 25 is adjusted using the parallel flat glass 24 of the light-transmitting portion 25. Here, as shown in FIG. 13, the light transmitting unit 25 adjusts the rotation angle of the parallel flat plate glass 24, which is an optical path changing member, to adjust the amount of change in the optical path of the emitted light reaching the surface to be inspected 24a. It includes. The control unit C can control the adjustment unit 24a such that the point where the optical axis of the light transmitting unit 25 and the optical axis of the light receiving unit 26 intersect is a position shifted from a height range that can be taken by the test surface.

In the embodiment, the control unit C controls these adjustment units according to the flatness (including warpage and irregularities) of the surface to be inspected. For example, the relationship between the flatness of the test surface calculated from the physical property value of the object to be inspected, the light intensity distribution on the test surface, and the required adjustment amount may be recorded, and the adjustment amount may be determined based on the relationship. Here, the flatness of the test surface may be a value indicating a range of heights that the test surface can take. Further, before the foreign object inspection, the adjustment amount may be determined based on the flatness of the surface to be inspected calculated or measured in advance, and the signal intensity detected for the sample foreign material. In this way, the control unit C can determine the adjustment amount based on a previously obtained relationship between the flatness of the surface to be inspected and the adjustment amount by the adjustment unit.

The above adjustment is in the range of heights (including warpage and shape) that the test surface can take within the test area on the test surface, and the change in output of the same sized foreign object within the test area is reproducible in detecting the foreign object. Level. That is, the control unit C determines the adjustment amount by the adjustment unit so that a predetermined precision of the determination of the presence or absence of foreign matter is ensured even if there is a deformation according to the assumed flatness on the surface to be inspected.

Next, countermeasures against false detection of diffracted light from the mask pattern will be described.

A process pattern to be exposed is formed on the mask for the exposure apparatus. Therefore, when the object to be inspected by the foreign material inspection device is a mask, diffracted light is generated in the pattern portion of the mask by transmitting the inspection light by the light transmitting portion. Such diffracted light may adversely affect the presence or absence of foreign matter. Since the type of the pattern is arbitrary, it is necessary to block the inspection light incident on the pattern in order to prevent false detection in the light receiving portion.

Therefore, in the embodiment, as shown in Fig. 14, a light blocking member 35 for shielding a part of the inspection light is disposed near the surface to be inspected. When inspecting the upper surface of the mask 5 by the first inspection unit 70, as shown in FIG. 15, the inspection light enters the upper surface of the mask 5 and enters the pattern portion P through refraction. Diffracted light from may be incident on the light receiving portion 26. Therefore, in the embodiment, the light blocking member 35 is disposed so that the inspection light does not reach (incident) to the position of the pattern.

When inspecting the pellicle 27 by the second inspection unit 80, as shown in FIG. 16, the inspection light is incident on the pellicle surface, enters the pattern portion P through refraction, and diffracted light from there is received. (56). Therefore, in the embodiment, the light blocking member 35 is disposed so that the inspection light does not reach (incident) to the position of the pattern.

In addition, when inspecting the top surface of the flat glass 3 by the first inspection unit 70, as shown in FIG. 17, the inspection light is incident on the top surface of the flat glass 3, is emitted through refraction, and the mask ( It is incident on the upper surface of 5) and is refracted to enter the pattern portion P. Therefore, diffracted light from the pattern portion P can be incident on the light receiving portion 26. Therefore, in the embodiment, the light blocking member 35 is disposed so that the inspection light does not reach (incident) to the position of the pattern.

In the examples of FIGS. 15 to 17 described above, the foreign material inspection device has a light blocking adjustment unit 35a for adjusting the position of the light blocking member 35. The control unit C can control the light blocking adjustment unit 35a so that the inspection light does not reach the position of the pattern unit P. At this time, the control unit C, even if a change in the surface to be inspected (flatness, posture, shape, warp, thickness) occurs, so as not to block the inspection light to foreign objects on the surface to be inspected, or conversely, to prevent the inspection light from reaching the pattern portion The light blocking adjustment unit 35a is controlled. Moreover, the control part C adjusts by the light-shielding adjustment part 35a by adjusting the relative position of a light transmitting part and a light receiving part by an adjustment part. Thereby, the light-shielding member 35 is arrange | positioned at an appropriate position whenever the relative position of a light transmitting part and a light receiving part is adjusted.

<The embodiment of the article manufacturing method>

The article manufacturing method according to the embodiment of the present invention is suitable for manufacturing articles such as, for example, microdevices such as semiconductor devices, elements having fine structures, and flat displays. The article manufacturing method of the present embodiment includes a step of forming a latent image pattern on the photosensitive agent applied to the substrate (step of exposing the substrate), and a step of developing the substrate on which the latent image pattern is formed in this step. do. In addition, these manufacturing methods include other well-known processes (oxidation, film formation, deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The article manufacturing method of the present embodiment is advantageous in at least one of performance, quality, productivity, and production cost of the article, compared to the conventional method.

3: flat glass
5: Mask
25: floodlight
26: light receiving section
27: pellicle
50: foreign body inspection device

Claims (12)

It is a foreign material inspection device that inspects foreign objects on the surface to be inspected.
A light transmitting unit that transmits inspection light to the surface to be inspected;
A light-receiving unit that receives scattered light from the foreign material, which is generated by the inspection light being transmitted by the light-transmitting unit
Including,
The foreign matter inspection device, characterized in that the light-transmitting portion and the light-receiving portion are arranged such that a point at which the optical axis of the light-transmitting portion intersects with the optical axis of the light-receiving portion is a position deviated from a height range that the test surface can take. According to claim 1,
Adjusting unit for adjusting the relative position of the light transmitting portion and the light receiving portion,
Control unit for controlling the adjustment unit so that the point where the optical axis of the light-transmitting portion intersects the optical axis of the light-receiving portion becomes a position deviated from the height range
Foreign matter inspection device comprising a. According to claim 1,
The light transmitting unit includes a light source, a lens through which the emitted light emitted from the light source passes, and an optical path changing member for changing the optical path of the emitted light through the lens to the surface to be inspected.
An adjusting unit for adjusting the amount of change of the optical path by adjusting the rotation angle of the optical path changing member;
Control unit for controlling the adjustment unit so that the point where the optical axis of the light-transmitting portion intersects the optical axis of the light-receiving portion becomes a position deviated from the height range
Foreign matter inspection device characterized in that it has a. The method of claim 2 or 3,
The control unit controls the adjusting unit according to the flatness of the surface to be inspected. According to claim 4,
Further having a processing unit for processing the light-receiving results of the light-receiving unit to determine the presence or absence of the foreign matter,
The control unit determines the amount of adjustment by the adjustment unit so that a predetermined precision of the determination is secured even if there is deformation according to the flatness on the surface to be inspected. The method of claim 5,
The control unit determines the adjustment amount based on a previously obtained relationship between the flatness of the surface to be inspected and the adjustment amount by the adjustment unit. According to claim 2,
The object is a mask for an exposure apparatus on which a pattern is formed,
A light blocking member for blocking a part of the inspection light,
Light blocking adjustment unit for adjusting the position of the light blocking member
Further comprising,
The control unit further controls the light blocking adjustment unit so that the inspection light does not reach the position of the pattern. The method of claim 7,
The control unit, the foreign matter inspection device, characterized in that for controlling the light-shielding adjustment unit in accordance with the control of the adjustment unit. An exposure apparatus that exposes the substrate by projecting a pattern of a mask onto the substrate,
An exposure apparatus comprising the foreign matter inspection apparatus according to claim 1 for inspecting a foreign substance attached to a surface of a light-transmitting plate-like member disposed in the exposure apparatus. The method of claim 9,
The plate-shaped member is disposed on the mask and spaced apart from the mask, and an exposure apparatus comprising a glass plate for correcting the warpage of the mask. The method of claim 9,
The plate-shaped member comprises an pellicle protecting the pattern of the mask. A step of exposing the substrate using the exposure apparatus according to any one of claims 9 to 11,
Process for developing the exposed substrate in the process
Including,
An article manufacturing method characterized by manufacturing an article from the developed substrate.

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