KR19980064555A - 린싱 액 - Google Patents
린싱 액 Download PDFInfo
- Publication number
- KR19980064555A KR19980064555A KR1019970073112A KR19970073112A KR19980064555A KR 19980064555 A KR19980064555 A KR 19980064555A KR 1019970073112 A KR1019970073112 A KR 1019970073112A KR 19970073112 A KR19970073112 A KR 19970073112A KR 19980064555 A KR19980064555 A KR 19980064555A
- Authority
- KR
- South Korea
- Prior art keywords
- propylene glycol
- water
- resist
- organic solvent
- soluble organic
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 48
- 239000000203 mixture Substances 0.000 claims abstract description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 31
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000003960 organic solvent Substances 0.000 claims abstract description 21
- 239000002904 solvent Substances 0.000 claims abstract description 19
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229940116333 ethyl lactate Drugs 0.000 claims abstract description 11
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 claims abstract description 9
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000006117 anti-reflective coating Substances 0.000 claims abstract description 6
- 239000012456 homogeneous solution Substances 0.000 claims abstract description 3
- 238000001459 lithography Methods 0.000 claims abstract 2
- 239000012487 rinsing solution Substances 0.000 claims abstract 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 30
- -1 propylene glycol alkyl ether Chemical class 0.000 claims description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- 150000005215 alkyl ethers Chemical class 0.000 claims description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 4
- 230000003667 anti-reflective effect Effects 0.000 abstract description 12
- 238000000576 coating method Methods 0.000 abstract description 9
- 239000011248 coating agent Substances 0.000 abstract description 6
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 28
- 239000000243 solution Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 17
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- 238000004090 dissolution Methods 0.000 description 9
- 238000004528 spin coating Methods 0.000 description 8
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011324 bead Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 2
- 229940105324 1,2-naphthoquinone Drugs 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 125000005376 alkyl siloxane group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000007761 roller coating Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- ZRDYULMDEGRWRC-UHFFFAOYSA-N (4-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O ZRDYULMDEGRWRC-UHFFFAOYSA-N 0.000 description 1
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical group 0.000 description 1
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical class OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N cinnamic acid Chemical class OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 235000013601 eggs Nutrition 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Detergent Compositions (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
Abstract
Description
린싱 액의 번호 | 린싱 액의 제제 | 용해 속도(Å/초) | |
용매 A(중량부) | 물(중량부) | ||
1-(1)1-(2)1-(3)1-(4)1-(5)1-(6)1-(7)1-(8)1-(9) | 100100100100100100100100100 | 2.553.51015203050100 | 74008800950010000101009800940081006800 |
비교 실시예 1 | 100 | 0 | 5300 |
린싱 액 번호 | 린싱 액의 제제 | 용해 속도(Å/초) | |
용매 B(중량부) | 물(중량부) | ||
2-(1)2-(2)2-(3)2-(4)비교 실시예 2 | 100100100100100 | 51015200 | 1310013600130001200011200 |
린싱 액 번호 | 린싱 액의 제제 | 용해 속도(Å/초) | |
EL(중량부) | 물(중량부) | ||
3-(1)3-(2)3-(3)비교 실시예 3 | 100100100100 | 1020400 | 6100580039002800 |
Claims (7)
- 수용성 유기 용매와 물의 균질 용액을 포함하는 평판인쇄(lithography)용 린싱 액(rinsing solution).
- 제1항에 있어서, 수용성 유기 용매가 프로필렌 글리콜 알킬 에테르, 프로필렌 글리콜 알킬 에테르 아세테이트, 에틸 락테이트, 메틸 에틸 케톤, 메틸 이소부틸 케톤 및 아세톤으로부터 선택된 하나 이상의 용매인 평판인쇄용 린싱 액.
- 제2항에 있어서, 수용성 유기 용매가 프로필렌 글리콜 알킬 에테르와 프로필렌 글리콜 알킬 에테르 아세테이트와의 혼합물인 평판인쇄용 린싱 액.
- 제3항에 있어서, 프로필렌 글리콜 알킬 에테르가 프로필렌 글리콜 모노메틸 에테르이고, 프로필렌 글리콜 알킬 에테르 아세테이트가 프로필렌 글리콜 모노메틸 에테르 아세테이트인 평판인쇄용 린싱 액.
- 제3항에 있어서, 프로필렌 글리콜 알킬 에테르가 프로필렌 글리콜 모노에틸 에테르이고, 프로필렌 글리콜 알킬 에테르 아세테이트가 프로필렌 글리콜 모노메틸 에테르 아세테이트인 평판인쇄용 린싱 액.
- 제2항에 있어서, 수용성 유기 용매가 에틸 락테이트인 평판인쇄용 린싱 액.
- 제1항에 있어서, 내식막 층(resist layer) 또는 반사방지막(anti-reflective coating)을 용해시키거나 스트리핑(stripping)하는 데 사용되는 평판인쇄용 린싱 액.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8347576A JPH10186680A (ja) | 1996-12-26 | 1996-12-26 | リンス液 |
JP96-347576 | 1996-12-26 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050109065A Division KR100593280B1 (ko) | 1996-12-26 | 2005-11-15 | 평판인쇄용 린싱 및 스트리핑 방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR19980064555A true KR19980064555A (ko) | 1998-10-07 |
Family
ID=18391158
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970073112A KR19980064555A (ko) | 1996-12-26 | 1997-12-24 | 린싱 액 |
KR1020050109065A KR100593280B1 (ko) | 1996-12-26 | 2005-11-15 | 평판인쇄용 린싱 및 스트리핑 방법 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050109065A KR100593280B1 (ko) | 1996-12-26 | 2005-11-15 | 평판인쇄용 린싱 및 스트리핑 방법 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5964951A (ko) |
EP (1) | EP0851305B1 (ko) |
JP (1) | JPH10186680A (ko) |
KR (2) | KR19980064555A (ko) |
CN (1) | CN1191891A (ko) |
DE (1) | DE69728634T2 (ko) |
SG (1) | SG55429A1 (ko) |
TW (1) | TW393592B (ko) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6815151B2 (en) | 1997-09-05 | 2004-11-09 | Tokyo Ohika Kogyo Co., Ltd. | Rinsing solution for lithography and method for processing substrate with the use of the same |
KR100594815B1 (ko) * | 1999-12-24 | 2006-07-03 | 삼성전자주식회사 | 포토레지스트 린스용 씬너 및 이를 이용한 포토레지스트막의 처리 방법 |
US6274296B1 (en) | 2000-06-08 | 2001-08-14 | Shipley Company, L.L.C. | Stripper pretreatment |
US6350560B1 (en) | 2000-08-07 | 2002-02-26 | Shipley Company, L.L.C. | Rinse composition |
KR100638243B1 (ko) * | 2000-11-20 | 2006-10-24 | 주식회사 동진쎄미켐 | 액정 디스플레이 디바이스용 레지스트 세정액 조성물 |
KR20040029977A (ko) | 2001-05-11 | 2004-04-08 | 쉬플리 캄파니, 엘.엘.씨. | 후막 포토레지스트 및 그의 사용방법 |
US6682876B2 (en) * | 2001-12-14 | 2004-01-27 | Samsung Electronics Co., Ltd. | Thinner composition and method of stripping a photoresist using the same |
KR100483846B1 (ko) * | 2002-10-15 | 2005-04-19 | 삼성전자주식회사 | 신너 조성물 및 이를 사용한 포토레지스트의 스트립핑 방법 |
JP4146198B2 (ja) * | 2002-09-11 | 2008-09-03 | 富士通株式会社 | マグネシウム合金材リサイクル用の被塗装マグネシウム合金材塗膜除去方法 |
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DE102010041528A1 (de) | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit |
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-
1996
- 1996-12-26 JP JP8347576A patent/JPH10186680A/ja active Pending
-
1997
- 1997-12-04 SG SG1997004309A patent/SG55429A1/en unknown
- 1997-12-18 EP EP97122381A patent/EP0851305B1/en not_active Expired - Lifetime
- 1997-12-18 DE DE69728634T patent/DE69728634T2/de not_active Expired - Fee Related
- 1997-12-19 TW TW086119348A patent/TW393592B/zh not_active IP Right Cessation
- 1997-12-23 US US08/996,510 patent/US5964951A/en not_active Expired - Fee Related
- 1997-12-24 KR KR1019970073112A patent/KR19980064555A/ko active Application Filing
- 1997-12-26 CN CN97125720A patent/CN1191891A/zh active Pending
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2005
- 2005-11-15 KR KR1020050109065A patent/KR100593280B1/ko not_active IP Right Cessation
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EP0851305B1 (en) | 2004-04-14 |
SG55429A1 (en) | 1998-12-21 |
TW393592B (en) | 2000-06-11 |
KR100593280B1 (ko) | 2006-06-28 |
JPH10186680A (ja) | 1998-07-14 |
CN1191891A (zh) | 1998-09-02 |
DE69728634T2 (de) | 2005-04-21 |
US5964951A (en) | 1999-10-12 |
EP0851305A1 (en) | 1998-07-01 |
DE69728634D1 (de) | 2004-05-19 |
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