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CN100437357C - 对应于基板伸缩的印刷电路板用曝光装置 - Google Patents

对应于基板伸缩的印刷电路板用曝光装置 Download PDF

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Publication number
CN100437357C
CN100437357C CNB2004100912437A CN200410091243A CN100437357C CN 100437357 C CN100437357 C CN 100437357C CN B2004100912437 A CNB2004100912437 A CN B2004100912437A CN 200410091243 A CN200410091243 A CN 200410091243A CN 100437357 C CN100437357 C CN 100437357C
Authority
CN
China
Prior art keywords
photomask
circuit board
printed circuit
exposure
pcb
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2004100912437A
Other languages
English (en)
Chinese (zh)
Other versions
CN1619421A (zh
Inventor
井田良一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ADITECH ENGINEERING Co Ltd
Original Assignee
ADITECH ENGINEERING Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ADITECH ENGINEERING Co Ltd filed Critical ADITECH ENGINEERING Co Ltd
Publication of CN1619421A publication Critical patent/CN1619421A/zh
Application granted granted Critical
Publication of CN100437357C publication Critical patent/CN100437357C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CNB2004100912437A 2003-11-18 2004-11-17 对应于基板伸缩的印刷电路板用曝光装置 Expired - Fee Related CN100437357C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003387755 2003-11-18
JP2003387755A JP2005148531A (ja) 2003-11-18 2003-11-18 基板伸縮に対応したプリント配線基板用露光装置

Publications (2)

Publication Number Publication Date
CN1619421A CN1619421A (zh) 2005-05-25
CN100437357C true CN100437357C (zh) 2008-11-26

Family

ID=34695018

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004100912437A Expired - Fee Related CN100437357C (zh) 2003-11-18 2004-11-17 对应于基板伸缩的印刷电路板用曝光装置

Country Status (4)

Country Link
JP (1) JP2005148531A (ko)
KR (1) KR20050048466A (ko)
CN (1) CN100437357C (ko)
TW (1) TW200521637A (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100548937B1 (ko) * 2004-02-02 2006-02-02 엘지전자 주식회사 필름 마스크를 이용한 스캔 타입 노광장치
CN101523287B (zh) * 2006-09-29 2011-05-11 朗姆研究公司 用于基板定位和检测的偏移校正方法和装置
JP4937859B2 (ja) * 2007-08-16 2012-05-23 株式会社アルバック 光照射装置
JP5166916B2 (ja) * 2008-03-04 2013-03-21 キヤノン株式会社 パターンの重ね合わせを行う装置およびデバイス製造方法
JP5477862B2 (ja) * 2010-09-06 2014-04-23 株式会社ブイ・テクノロジー フィルム露光装置及びフィルム露光方法
CN103279012A (zh) * 2013-03-26 2013-09-04 宁波东盛集成电路元件有限公司 一种新型蚀刻片连续曝光机及其工艺方法
CN104425308B (zh) * 2013-09-09 2018-03-09 东京毅力科创株式会社 测定装置、基板处理系统和测定方法
CN105246258B (zh) * 2015-10-27 2018-08-07 珠海方正科技高密电子有限公司 一种电路板涨缩比例控制方法及系统
CN110632831A (zh) * 2019-11-14 2019-12-31 江苏上达电子有限公司 一种cof基板的新冲孔式样和曝光对位mark设计方法
KR20210113496A (ko) * 2020-03-06 2021-09-16 삼성디스플레이 주식회사 마스크 및 이의 제조 방법
CN111278230A (zh) * 2020-03-26 2020-06-12 定颖电子(黄石)有限公司 一种印刷线路板底片筛选方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5973766A (en) * 1996-05-16 1999-10-26 Nikon Corporation Exposure method and exposure device
US6146817A (en) * 1991-12-06 2000-11-14 Agfa-Gevaert Aktiengesellschaft Method of and apparatus for masking a master for reproduction
CN1525251A (zh) * 2003-02-26 2004-09-01 株式会社Orc制作所 曝光机构和曝光方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6146817A (en) * 1991-12-06 2000-11-14 Agfa-Gevaert Aktiengesellschaft Method of and apparatus for masking a master for reproduction
US5973766A (en) * 1996-05-16 1999-10-26 Nikon Corporation Exposure method and exposure device
CN1525251A (zh) * 2003-02-26 2004-09-01 株式会社Orc制作所 曝光机构和曝光方法

Also Published As

Publication number Publication date
CN1619421A (zh) 2005-05-25
TW200521637A (en) 2005-07-01
JP2005148531A (ja) 2005-06-09
KR20050048466A (ko) 2005-05-24

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20081126

Termination date: 20091217