TWI607975B - Elastic support plate, breaking device and breaking method - Google Patents
Elastic support plate, breaking device and breaking method Download PDFInfo
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Description
本發明係關於一種於在半導體基板、陶瓷基板等脆性材料基板上塗佈樹脂層而成之複合基板之分斷時使用之彈性支撐板、斷裂裝置及分斷方法。 The present invention relates to an elastic support plate, a breaking device, and a breaking method which are used when a composite substrate obtained by coating a resin layer on a substrate such as a semiconductor substrate or a ceramic substrate is divided.
半導體晶片係藉由將形成於半導體晶圓上之元件區域於該元件區域之邊界位置分斷而製造。先前,於將晶圓分斷成晶片之情形時,藉由切割裝置使切割刀片旋轉,從而藉由切削將半導體晶圓切斷得較小。 A semiconductor wafer is manufactured by dividing an element region formed on a semiconductor wafer at a boundary position of the element region. Previously, in the case where the wafer was broken into wafers, the cutting blade was rotated by the cutting device, thereby cutting the semiconductor wafer to be small by cutting.
然而,於使用切割裝置之情形時,必需有水以排出因切削產生之排出碎屑,為了不使該水或排出碎屑對半導體晶片之性能產生不良影響,必需用以對半導體晶片實施保護且清洗掉水或排出碎屑之前後步驟。因此,有步驟變得複雜,無法削減成本或縮短加工時間之缺點。又,因使用切割刀片進行切削,故而會產生膜剝離或缺損等問題。又,於具有微小機械構造之MEMS(Micro-Electro-Mechanical Systems,微機電系統)基板中,會因水之表面張力導致構造破壞,故而不能使用水,從而產生無法藉由切割進行分斷之問題。 However, in the case of using a cutting device, it is necessary to have water to discharge the discharged debris due to the cutting, and in order not to adversely affect the performance of the semiconductor wafer by the water or the discharged debris, it is necessary to protect the semiconductor wafer and The steps before cleaning off the water or discharging the debris. Therefore, the steps become complicated, and it is impossible to reduce the cost or shorten the processing time. Moreover, since cutting is performed using a dicing blade, problems such as film peeling or chipping occur. Moreover, in a MEMS (Micro-Electro-Mechanical Systems) substrate having a micro-mechanical structure, the structure is broken due to the surface tension of water, so that water cannot be used, and there is a problem that the cutting cannot be performed by cutting. .
又,在專利文獻1、2中提出有一種基板裂斷裝置,其係藉由對形成有劃線之半導體晶圓,自形成有劃線之面之背面,沿著劃線垂直於該面按壓而將其裂斷。以下,示出利用此種裂斷裝置之裂斷之概要。於成為裂斷對象之半導體晶圓上整齊排列地形成有多個功能區 域。於進行分斷之情形時,首先,於半導體晶圓上,在功能區域之間隔開等間隔沿縱向及橫向形成劃線。繼而,沿著該劃線利用裂斷裝置進行分斷。圖1(a)表示分斷前載置於裂斷裝置之半導體晶圓之剖面圖。如本圖所示,於複合基板101上形成有功能區域101a、101b,於功能區域101a、101b之間形成有劃線S1、S2、S3…。於進行分斷之情形時,在複合基板101之背面貼附膠帶102,在其正面貼附保護膜103。繼而,於裂斷時,如圖1(b)所示,於支承刀105、106之正中間配置應裂斷之劃線,於該情形時為劃線S2,使刀片104自其上部對準劃線下降,從而按壓複合基板101。以此方式,利用一對支承刀105、106與刀片104之三點彎曲進行裂斷。 Further, in Patent Documents 1 and 2, there is proposed a substrate breaking device which is formed by pressing a semiconductor wafer on which a scribe line is formed from a back surface of a surface on which a scribe line is formed, and perpendicularly to the surface along a scribe line. And break it. The outline of the cracking by such a breaking device is shown below. Forming a plurality of functional areas neatly arranged on a semiconductor wafer to be a cracked object area. In the case of performing the breaking, first, on the semiconductor wafer, scribe lines are formed in the longitudinal direction and the lateral direction at equal intervals between the functional regions. Then, the breaking is performed along the scribe line by means of a breaking device. Fig. 1(a) is a cross-sectional view showing a semiconductor wafer placed on a cracking device before breaking. As shown in the figure, functional regions 101a and 101b are formed on the composite substrate 101, and scribe lines S1, S2, S3, ... are formed between the functional regions 101a and 101b. In the case of breaking, the tape 102 is attached to the back surface of the composite substrate 101, and the protective film 103 is attached to the front surface. Then, when the crack is broken, as shown in Fig. 1(b), a scribe line to be broken is disposed in the middle of the support knives 105, 106, in this case, a scribe line S2, so that the blade 104 is aligned from the upper portion thereof. The scribing is lowered to press the composite substrate 101. In this way, the three-point bending of the pair of support blades 105, 106 and the blade 104 is used to break.
[專利文獻1]日本專利特開2004-39931號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-39931
[專利文獻2]日本專利特開2010-149495號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2010-149495
於具有此種構成之裂斷裝置中,於在裂斷時將刀片104往下壓而進行按壓之情形時,複合基板101會稍微折曲,因此,應力會集中於複合基板101與支承刀105、106之前緣接觸之部分。因此,若裂斷裝置之支承刀105、106之部分如圖1(a)所示般接觸於功能區域101a、101b,則於裂斷時對功能區域施加力。因此,存在有可能損傷半導體晶圓上之功能區域之問題。 In the cracking device having such a configuration, when the blade 104 is pressed down and pressed at the time of cracking, the composite substrate 101 is slightly bent, and therefore stress is concentrated on the composite substrate 101 and the support blade 105. , 106 part of the front edge contact. Therefore, if the portions of the support blades 105 and 106 of the breaking device contact the functional regions 101a and 101b as shown in Fig. 1(a), a force is applied to the functional region at the time of the breakage. Therefore, there is a problem that it is possible to damage a functional area on a semiconductor wafer.
又,作為使用裂斷裝置進行分斷之基板,有於陶瓷基板上塗佈矽樹脂而成之複合基板。複合基板亦有於各功能區域具有自樹脂層突出之透鏡等功能區域之情形。於此種複合基板中,在將陶瓷基板裂斷後,直接利用裂斷棒按壓樹脂層,於此情形時,存在樹脂層變形而易 於受到損傷之問題。又,若為了解決上述問題而想要使用雷射進行分斷,則存在因雷射之熱影響而受到損傷,或在照射雷射之後,飛濺物附著於周邊之問題。又,若將自正面突出之透鏡等區域作為下方使複合基板與支承刀接觸,則存在樹脂層之斷裂時受到損傷之問題。 Moreover, as a board|substrate which isolate|separated using a cracking device, the composite substrate which apply|coated the enamel resin on the ceramic substrate is used. The composite substrate also has a functional region such as a lens protruding from the resin layer in each functional region. In such a composite substrate, after the ceramic substrate is cracked, the resin layer is directly pressed by the split rod, and in this case, the resin layer is deformed easily. The problem of being damaged. Further, if it is desired to use a laser to break in order to solve the above problem, there is a problem that the laser is damaged by the influence of the heat of the laser or the spatter is attached to the periphery after the laser is irradiated. Moreover, when the composite substrate and the support blade are brought into contact with a region such as a lens protruding from the front as a lower side, there is a problem that the resin layer is damaged when it is broken.
本發明著眼於此種問題而完成,其目的在於能夠將脆性材料基板已經被裂斷之複合基板無損傷地斷裂。 The present invention has been made in view of such a problem, and an object thereof is to enable a composite substrate in which a brittle material substrate has been broken to be broken without damage.
為了解決該問題,本發明之彈性支撐板於分斷複合基板時支撐上述複合基板,該複合基板係於一面具有在縱向及橫向上整齊排列而形成之多個功能區域之脆性材料基板上塗佈樹脂,並且於上述脆性材料基板具有形成為格子狀之條帶狀之裂斷線以分斷功能區域;上述彈性支撐板為至少包含與上述複合基板相同形狀之彈性構件之平板,且包含設置於由上述格子狀之裂斷線包圍之區域之各個中心位置之保護孔。 In order to solve the problem, the elastic supporting plate of the present invention supports the composite substrate when the composite substrate is separated, and the composite substrate is coated on a brittle material substrate having a plurality of functional regions formed in a longitudinal direction and a lateral direction. a resin having a strip-shaped fracture line formed in a lattice shape to break a functional region on the brittle material substrate; the elastic support plate being a flat plate including at least an elastic member having the same shape as the composite substrate, and comprising A protective hole at each center position of the region surrounded by the lattice-shaped crack line.
為了解決該問題,本發明之分斷方法係將複合基板分斷之分斷方法,該複合基板係於一面具有功能區域之脆性材料基板上塗佈樹脂,並且形成有裂斷線以分斷上述功能區域;並且於在由上述格子狀之裂斷線包圍之區域之各個中心位置具有保護孔之彈性支撐板上,以複合基板之各個功能區域對應於保護孔之方式進行位置對準而將上述複合基板配置於該彈性支撐板上,藉由沿著已經裂斷之線往下壓擴展棒而將樹脂層斷裂。 In order to solve the problem, the breaking method of the present invention is a method for breaking a composite substrate by coating a resin on a brittle material substrate having a functional region on one side, and forming a crack line to break the above. a functional area; and an elastic support plate having a protective hole at each central position of the area surrounded by the lattice-shaped break line, wherein the functional areas of the composite substrate are aligned corresponding to the protective hole The composite substrate is disposed on the elastic support plate, and the resin layer is broken by pressing the expansion rod down the line that has been broken.
為了解決該問題,本發明之斷裂裝置係將複合基板之樹脂層斷裂之斷裂裝置,該複合基板係於一面具有功能區域之脆性材料基板上塗佈樹脂,並且於上述脆性材料基板形成有裂斷線以分斷上述功能區域;上述斷裂裝置包括:工作台;彈性支撐板,其為至少包含具有與上述複合基板同等之平面方向之大小之彈性構件之平板,且包含設置 於由上述格子狀之裂斷線包圍之區域之各個中心位置之保護孔,其配置於上述工作台上,將形成有裂斷線之面作為上表面而保持上述複合基板;擴展器,其包含擴展棒;移動機構,其使上述工作台沿著其面移動;及升降機構,其一面平行地保持上述複合基板與擴展棒,一面使上述擴展器朝上述彈性支撐板上之複合基板之面升降。 In order to solve the problem, the breaking device of the present invention is a breaking device for breaking a resin layer of a composite substrate, the composite substrate is coated with a resin on a brittle material substrate having a functional region on one side, and a crack is formed on the brittle material substrate. a wire to break the functional area; the breaking device includes: a table; an elastic supporting plate, which is a flat plate including at least an elastic member having a size equal to a plane direction of the composite substrate, and includes a setting a protective hole at each center position of the region surrounded by the lattice-shaped crack line is disposed on the table, and the surface of the broken line is formed as an upper surface to hold the composite substrate; and the expander includes An extension rod; a moving mechanism that moves the table along the surface thereof; and a lifting mechanism that holds the composite substrate and the expansion rod in parallel while lifting the expander toward the surface of the composite substrate on the elastic support plate .
根據具有此種特徵之本發明,將複合基板配置於具有包含各功能區域之突出部分之開口之彈性支撐板上,以條帶狀之擴展棒之最下端線對應於裂斷線之方式進行位置對準,從而進行斷裂。因此,能獲得可不損傷功能區域而沿著裂斷線將樹脂層斷裂之效果。 According to the invention having such a feature, the composite substrate is disposed on the elastic support plate having the opening including the protruding portion of each functional region, and the position of the lowermost end line of the strip-shaped expansion bar corresponds to the break line Align to break. Therefore, it is possible to obtain an effect of breaking the resin layer along the fracture line without damaging the functional region.
10‧‧‧複合基板 10‧‧‧Composite substrate
11‧‧‧陶瓷基板 11‧‧‧Ceramic substrate
12‧‧‧矽樹脂 12‧‧‧矽 resin
13‧‧‧功能區域 13‧‧‧ functional area
14‧‧‧構造體 14‧‧‧Buildings
20‧‧‧斷裂裝置 20‧‧‧Fracture device
21‧‧‧工作台 21‧‧‧Workbench
22、25‧‧‧水平固定構件 22, 25‧‧‧ horizontal fixed members
23‧‧‧伺服馬達 23‧‧‧Servo motor
24‧‧‧滾珠螺桿 24‧‧‧Ball screw
26、29‧‧‧移動構件 26, 29‧‧‧ moving components
27‧‧‧母螺紋 27‧‧‧Female thread
28a‧‧‧支撐軸 28a‧‧‧Support shaft
28b‧‧‧支撐軸 28b‧‧‧Support shaft
30‧‧‧擴展器 30‧‧‧Expander
31‧‧‧基底 31‧‧‧Base
32a~32n‧‧‧擴展棒 32a~32n‧‧‧Extension stick
40‧‧‧彈性支撐板 40‧‧‧Flexible support plate
41‧‧‧保護孔 41‧‧‧Protection hole
50‧‧‧劃線輪 50‧‧‧marking wheel
51‧‧‧裂斷棒 51‧‧‧Break
101‧‧‧複合基板 101‧‧‧Composite substrate
101a‧‧‧功能區域 101a‧‧‧ functional area
101b‧‧‧功能區域 101b‧‧‧ functional area
102‧‧‧膠帶 102‧‧‧ Tape
103‧‧‧保護膜 103‧‧‧Protective film
104‧‧‧刀片 104‧‧‧blade
105‧‧‧支承刀 105‧‧‧Support knife
106‧‧‧支承刀 106‧‧‧Support knife
Bx1‧‧‧裂斷線 B x1 ‧‧‧crack line
S1‧‧‧劃線 S1‧‧‧
S2‧‧‧劃線 S2‧‧‧ scribing
S3‧‧‧劃線 S3‧‧‧
Sx1~Sxm‧‧‧刻劃預定線 S x1 ~S xm ‧‧‧Scratch line
Sy1~Syn‧‧‧刻劃預定線 S y1 ~S yn ‧‧‧Scratch line
圖1(a)、(b)係表示先前之半導體晶圓之裂斷時之狀態之剖面圖。 1(a) and 1(b) are cross-sectional views showing the state of the prior semiconductor wafer at the time of cracking.
圖2(a)、(b)係本發明之實施形態之成為分斷對象之基板之前視圖及側視圖。 2(a) and 2(b) are a front view and a side view of a substrate to be separated in accordance with an embodiment of the present invention.
圖3係表示本實施形態之用於斷裂時之樹脂層之斷裂裝置之一例之立體圖。 Fig. 3 is a perspective view showing an example of a breaking device for a resin layer at the time of breaking in the embodiment.
圖4係表示本實施形態之擴展器之一例之立體圖。 Fig. 4 is a perspective view showing an example of the expander of the embodiment.
圖5係表示本發明之實施形態之用於斷裂時之彈性支撐板之立體圖。 Fig. 5 is a perspective view showing an elastic support plate for breaking at the embodiment of the present invention.
圖6(a)~(d)係表示該實施形態之複合基板之分斷過程之概略圖。 6(a) to 6(d) are schematic views showing the breaking process of the composite substrate of the embodiment.
圖7(a)~(d)係表示該實施形態之樹脂層之分斷過程之概略圖。 Fig. 7 (a) to (d) are schematic views showing the breaking process of the resin layer of the embodiment.
繼而,對本發明之實施形態進行說明。圖2示出了作為此種基板之一例之長方形狀之形成有半導體元件之複合基板10之前視圖及側視圖。於該實施形態中,將成為分斷對象之複合基板10設為於陶瓷基板11上塗佈樹脂層、例如矽樹脂12而成之複合基板10。此處,複合基板 10之僅陶瓷基板11之分斷係使刻劃垂直地延伸至基板而一次性分斷,因此將這種分斷表述為「裂斷」,而矽樹脂層12之分斷係藉由施加力使樹脂層之龜裂逐漸擴張而裂開,因此將此種分斷表述為「斷裂」。又,將複合基板10整體之分斷表述為「分斷」。於複合基板10之製造步驟中,沿著平行於x軸、y軸之線縱橫地整齊排列地呈格子狀地形成多個功能區域13。該功能區域13例如設為LED(Light-Emitting Diode,發光二極體)。各功能區域包含透鏡等自複合基板10之面突出之構造體14。而且,為了針對各功能區域進行分斷而製成半導體晶片,如一點鏈線所示,將縱向上等間隔之線設為刻劃預定線Sy1~Syn,將橫向上等間隔之線設為刻劃預定線Sx1~Sxm,功能區域之零件位於由該等刻劃預定線包圍之正方形之中央。 Next, an embodiment of the present invention will be described. 2 is a front view and a side view showing a composite substrate 10 in which a semiconductor element is formed in a rectangular shape as an example of such a substrate. In the embodiment, the composite substrate 10 to be separated is a composite substrate 10 obtained by coating a resin layer, for example, a resin 12 on a ceramic substrate 11. Here, the division of only the ceramic substrate 11 of the composite substrate 10 causes the scribe to extend vertically to the substrate to be separated at one time, so that the division is expressed as "cracking" and the breaking of the enamel resin layer 12 is performed. Since the crack of the resin layer is gradually expanded by the application of force, the breaking is expressed as "fracture". Further, the division of the entire composite substrate 10 is expressed as "breaking". In the manufacturing step of the composite substrate 10, a plurality of functional regions 13 are formed in a lattice shape along a line parallel to the x-axis and the y-axis. This functional area 13 is, for example, an LED (Light-Emitting Diode). Each functional region includes a structure 14 such as a lens that protrudes from the surface of the composite substrate 10. Further, in order to form a semiconductor wafer for each functional region, as shown by a one-dot chain line, the longitudinally equally spaced lines are set as the scribed lines S y1 to S yn , and the horizontally equally spaced lines are set. To score the predetermined lines S x1 ~S xm , the parts of the functional area are located in the center of the square surrounded by the scribed lines.
繼而,對該實施形態之用於斷裂樹脂層12之斷裂裝置20進行說明。如圖3所示,斷裂裝置20包含能夠朝y方向移動及旋轉之工作台21。於斷裂裝置20中,在工作台21之下方設置有移動機構,上述移動機構使工作台21沿著其面於y軸方向上移動,進而使工作台21沿著其面旋轉。而且,於工作台21上隔著下述彈性支撐板40載置成為分斷對象之複合基板10。於工作台21之上部,設置有字狀之水平固定構件22,於水平固定構件22之上部保持有伺服馬達23。於伺服馬達23之旋轉軸直接連接有滾珠螺桿24,滾珠螺桿24之下端由另一水平固定構件25支撐,且使滾珠螺桿24可旋轉。上移動構件26於中央部具備與滾珠螺桿24螺合之母螺紋27,自上述上移動構件26之兩端部朝下方具備支撐軸28a、28b。支撐軸28a、28b貫通水平固定構件25之一對貫通孔而連結於下移動構件29。於下移動構件29之下表面,與工作台21之面平行地安裝有下述擴展器30。藉此,於藉由伺服馬達23使滾珠螺桿24旋轉之情形時,上移動構件26與下移動構件29成為一體而上下移動,擴展器30亦同時上下移動。此處,伺服馬達23與水平固定構件22、25、 及上下之移動構件26、29構成使擴展器30升降之升降機構。 Next, the breaking device 20 for breaking the resin layer 12 of the embodiment will be described. As shown in FIG. 3, the breaking device 20 includes a table 21 that is movable and rotatable in the y direction. In the breaking device 20, a moving mechanism is provided below the table 21, and the moving mechanism moves the table 21 along the surface thereof in the y-axis direction, thereby rotating the table 21 along the surface thereof. Further, the composite substrate 10 to be separated is placed on the table 21 via the elastic support plate 40 described below. On the top of the workbench 21, there is The horizontal fixing member 22 has a servo motor 23 held on the upper portion of the horizontal fixing member 22. A ball screw 24 is directly coupled to the rotating shaft of the servo motor 23. The lower end of the ball screw 24 is supported by another horizontal fixing member 25, and the ball screw 24 is rotatable. The upper moving member 26 includes a female screw 27 that is screwed to the ball screw 24 at the center portion, and support shafts 28a and 28b are provided downward from both end portions of the upper moving member 26. The support shafts 28a and 28b pass through one of the horizontal fixing members 25 to the through holes and are coupled to the lower moving member 29. The expander 30 described below is attached to the lower surface of the lower moving member 29 in parallel with the surface of the table 21. As a result, when the ball screw 24 is rotated by the servo motor 23, the upper moving member 26 and the lower moving member 29 are integrally moved up and down, and the expander 30 is simultaneously moved up and down. Here, the servo motor 23, the horizontal fixing members 22 and 25, and the upper and lower moving members 26 and 29 constitute an elevating mechanism for moving the expander 30 up and down.
繼而,對用於斷裂矽樹脂層時之擴展器30進行說明。例如圖4之立體圖所示,擴展器30於平面狀之基底31並排形成有多個平行之條帶狀之擴展棒32a~32n。該各擴展棒之所有脊線構成一個平面。又,擴展棒之間隔只要為固定並且為刻劃預定線之間隔之2以上之整數倍即可,於本實施形態中設為2倍。而且,各擴展棒之剖面只要為具有能夠沿著裂斷線按壓之突出部之形狀,則並無特別限定,但較佳設為如下所述般彎曲之圓弧狀。再者,於圖4中,為了明確表示擴展棒32a~32n,使擴展棒32a~32n成為上表面而表示,但於使用時係以擴展棒32a~32n成為下方之方式安裝於下移動構件29。 Next, the expander 30 for breaking the resin layer will be described. For example, as shown in the perspective view of FIG. 4, the expander 30 is formed with a plurality of parallel strip-shaped expansion bars 32a to 32n side by side in a planar base 31. All of the ridges of each of the expanders form a plane. Further, the interval between the rods may be fixed and is an integral multiple of 2 or more of the interval between the planned lines, and is doubled in the present embodiment. In addition, the cross section of each of the expanded rods is not particularly limited as long as it has a protruding portion that can be pressed along the fracture line, but is preferably curved in an arc shape as described below. In FIG. 4, in order to clearly show the extension bars 32a to 32n, the extension bars 32a to 32n are shown as the upper surface, but in the case of use, the extension bars 32a to 32n are attached to the lower movement member 29 so as to be downward. .
於本實施形態中,在斷裂複合基板10之樹脂層時使用彈性支撐板40。如圖5之立體圖所示,彈性支撐板40係長方形之平板之橡膠製等具有彈性之治具,其大小與複合基板10相同,例如厚度設為數mm左右。該彈性支撐板40於對應於複合基板10之包含各功能區域之區域之位置,具有沿x方向及y方向之線縱橫地整齊排列之多個圓形保護孔41。使該等保護孔41之間距與成為斷裂對象之複合基板10之刻劃預定線Sx1~Sxm、Sy1~Syn之間距準確地一致,上述各保護孔41以位於由刻劃預定線Sx1~Sxm、Sy1~Syn包圍之各區域之中心之方式形成。該保護孔41用於在斷裂時不對複合基板10之透鏡等構造體14施加力,此處貫通孔設為比構造體14大。 In the present embodiment, the elastic support plate 40 is used when the resin layer of the composite substrate 10 is broken. As shown in the perspective view of Fig. 5, the elastic supporting plate 40 is an elastic jig made of rubber such as a rectangular flat plate, and has the same size as the composite substrate 10, and has a thickness of, for example, about several mm. The elastic supporting plate 40 has a plurality of circular protective holes 41 aligned in the longitudinal direction of the x-direction and the y-direction in a position corresponding to a region including the functional regions of the composite substrate 10. The distance between the protective holes 41 is exactly the same as the distance between the predetermined lines S x1 to S xm and S y1 to Syn of the composite substrate 10 to be fractured, and each of the protective holes 41 is located at a predetermined line. The center of each region surrounded by S x1 ~S xm and S y1 ~S yn is formed. The protective hole 41 is for not applying a force to the structural body 14 such as a lens of the composite substrate 10 at the time of fracture, and the through hole is larger than the structural body 14 here.
繼而,對分斷複合基板10之方法進行說明。圖6係表示分斷過程之圖,圖6(a)表示複合基板10之一部分。首先,如圖6(b)所示,將陶瓷基板11之面作為上表面,藉由未圖示之劃線裝置使劃線輪50移動,沿著刻劃預定線進行刻劃。從而如圖2(a)所示,形成x方向之劃線Sx1~Sxm、y方向之劃線Sy1~Syn。 Next, a method of breaking the composite substrate 10 will be described. Fig. 6 is a view showing a breaking process, and Fig. 6(a) shows a part of the composite substrate 10. First, as shown in Fig. 6(b), the surface of the ceramic substrate 11 is used as the upper surface, and the scribing wheel 50 is moved by a scribing device (not shown) to perform scribing along the scribed line. Therefore, as shown in FIG. 2(a), the scribe lines S x1 to S xm in the x direction and the scribe lines S y1 to S yn in the y direction are formed.
繼而,於陶瓷基板11之裂斷步驟中,如圖6(c)所示,首先使複合 基板10反轉。繼而,使用未圖示之裂斷裝置,使裂斷棒51位於已經形成之劃線之正上方,藉由將裂斷棒51往下壓而僅使陶瓷基板11裂斷。 Then, in the cracking step of the ceramic substrate 11, as shown in FIG. 6(c), the composite is first made. The substrate 10 is reversed. Then, using a breaking device (not shown), the split rod 51 is positioned directly above the already formed scribe line, and only the ceramic substrate 11 is broken by pressing the split rod 51 downward.
藉此,成為僅陶瓷基板11沿著劃線Sx1~Sxm、Sy1~Syn裂斷之狀態。圖6(d)表示沿著x方向及y方向之各劃線裂斷後之複合基板10之一部分。再者,劃線Sx1~Sxm、Sy1~Syn均被裂斷,因此以下稱為裂斷線Bx1~Bxm、By1~Byn。 Thereby, only the ceramic substrate 11 is broken along the scribe lines S x1 to S xm and S y1 to S yn . Fig. 6(d) shows a portion of the composite substrate 10 after the respective scribe lines are broken along the x direction and the y direction. Further, since the scribe lines S x1 to S xm and S y1 to S yn are all broken, they are hereinafter referred to as break lines B x1 to B xm and B y1 to B yn .
繼而,如圖7所示,對使形成於陶瓷基板11之裂斷線亦延伸至矽樹脂層而結束複合基板10之分斷之方法進行說明。圖7係表示樹脂層之斷裂過程之圖,圖7(a)表示複合基板之一部分。首先,於上述斷裂裝置20之工作台21上配置彈性支撐板40,進而於彈性支撐板40之上表面配置複合基板10。此時,如圖7(a)所示,以抵接於彈性支撐板40之方式配置矽樹脂層12。此時,以複合基板10之功能區域13之構造體14完全包含於彈性支撐板40之保護孔41之方式定位而配置複合基板10。此時之剖面圖為圖7(a)所示之圖,所有構造體14成為對應於保護孔41之位置,並不與彈性支撐板40直接接觸。 Next, as shown in FIG. 7, the method of extending the fracture line formed on the ceramic substrate 11 to the resin layer and ending the division of the composite substrate 10 will be described. Fig. 7 is a view showing a fracture process of the resin layer, and Fig. 7(a) shows a part of the composite substrate. First, the elastic supporting plate 40 is placed on the table 21 of the breaking device 20, and the composite substrate 10 is placed on the upper surface of the elastic supporting plate 40. At this time, as shown in FIG. 7( a ), the resin layer 12 is placed in contact with the elastic support plate 40 . At this time, the composite substrate 10 is disposed such that the structure 14 of the functional region 13 of the composite substrate 10 is completely contained in the protective hole 41 of the elastic support plate 40. The cross-sectional view at this time is the one shown in FIG. 7(a), and all the structures 14 are positioned corresponding to the protective holes 41, and are not in direct contact with the elastic supporting plate 40.
使陶瓷基板11之裂斷線例如Sx1成為上表面。繼而,以使該擴展器30之任一個擴展棒例如32a之最下部之脊線對準裂斷線之方式進行定位。 The rupture line of the ceramic substrate 11, for example, S x1 is the upper surface. Then, positioning is performed such that the lowermost ridge line of any one of the expanders 30, for example, 32a, is aligned with the broken line.
繼而,驅動伺服馬達23,使上移動構件26與下移動構件29同時下降,而使擴展器30之擴展棒一面相對於工作台21保持平行一面逐漸下降。繼而,如圖7(b)所示,將擴展棒32a自裂斷線Bx1之正上方按壓陶瓷基板11。如此,如圖7(c)所示,陶瓷基板11被擴展棒32a按壓而變形,並且下沉而使彈性支撐板40同樣地變形為V字狀。此時如圖7(b)所示,當壓入擴展棒32a時複合基板10會稍微下沉,但由於在其左右之對應於功能區域13之部分設置有保護孔41,故而可不使功能區域13之突出之構造體14直接接觸於彈性支撐板40,而將複合基板10之樹脂 層12斷裂。此時,陶瓷基板之左右隨著擴展棒32a之壓入而均勻地變形,因此能夠使龜裂沿著裂斷線延伸至下方。此處,擴展棒之下方之剖面形狀並無特別限定,但於例如三角形狀之情形時,高精度地進行使頂點對齊裂斷線之定位之必要性相對變高。因此,為了使陶瓷基板11、矽樹脂12以此方式平衡地變形,而將各擴展棒之下方之剖面設為圓弧狀。藉此,使擴展棒之脊線對齊裂斷線之定位之精度之容許範圍相對變寬。而且,藉由使擴展棒充分下降,樹脂內之龜裂進展而對左右施加推開之力,從而結束斷裂。若斷裂結束,則使伺服馬達23反轉而使擴展器30上升。 Then, the servo motor 23 is driven to lower the upper moving member 26 and the lower moving member 29 at the same time, and the expanding rod side of the expander 30 is gradually lowered while being kept parallel with respect to the table 21. Then, as shown in FIG. 7(b), the expanded rod 32a is pressed against the ceramic substrate 11 from directly above the break line Bx1 . As described above, as shown in FIG. 7(c), the ceramic substrate 11 is pressed and deformed by the expansion bar 32a, and is sunk to deform the elastic support plate 40 into a V shape. At this time, as shown in FIG. 7(b), the composite substrate 10 is slightly sunk when the expansion rod 32a is pressed in. However, since the protective hole 41 is provided at a portion of the left and right corresponding to the functional region 13, the functional region may not be provided. The protruding structure 14 of 13 is directly in contact with the elastic supporting plate 40, and the resin layer 12 of the composite substrate 10 is broken. At this time, since the right and left sides of the ceramic substrate are uniformly deformed by the press-fitting of the expansion rod 32a, the crack can be extended downward along the fracture line. Here, the cross-sectional shape of the underside of the expansion rod is not particularly limited. However, in the case of, for example, a triangular shape, the necessity of accurately positioning the apex alignment break line is relatively high. Therefore, in order to deform the ceramic substrate 11 and the resin 12 in a balanced manner in this manner, the cross section below each of the expanded rods is formed in an arc shape. Thereby, the allowable range of the accuracy of positioning the ridge line of the expansion rod aligned with the broken line is relatively wide. Further, by sufficiently lowering the expansion rod, the crack in the resin progresses and the pushing force is applied to the right and left, thereby terminating the fracture. When the break is completed, the servo motor 23 is reversed and the expander 30 is raised.
此時,於擴展器30並排形成有多個擴展棒,且其間隔為劃線之兩倍,因此可使擴展棒每隔一條裂斷線之方式沿著複數條裂斷線同時斷裂矽樹脂12。 At this time, a plurality of expansion rods are formed side by side in the expander 30, and the interval is twice as long as the scribe line, so that the expansion rod can simultaneously break the enamel resin 12 along the plurality of rupture lines every other broken line. .
繼而,使工作台21於y軸方向上移動相當於裂斷線之間距之量,同樣地使擴展器30下降,藉此亦能針對其他鄰接之裂斷線結束樹脂層之斷裂。此處,由於擴展棒之間隔為劃線之間距之兩倍,因此藉由使工作台21偏移一次而進行斷裂便可結束複合基板10之所有x軸方向之斷裂。又,於擴展棒之間隔為劃線之間距之3倍之情形時,藉由使工作台21移動2次而進行斷裂便可結束所有x軸方向之斷裂。 Then, the table 21 is moved in the y-axis direction by an amount corresponding to the distance between the broken lines, and the expander 30 is similarly lowered, whereby the breakage of the resin layer can be ended for the other adjacent broken lines. Here, since the interval between the extension bars is twice the distance between the scribe lines, the fracture of all the x-axis directions of the composite substrate 10 can be terminated by breaking the table 21 once. Further, when the interval between the extension bars is three times the distance between the scribe lines, the fracture in the x-axis direction can be terminated by breaking the table 21 twice.
繼而,使工作台21旋轉90°,針對y軸之裂斷線亦同樣地使擴展器30下降,從而將樹脂層斷裂。繼而,使工作台21於y軸方向上移動相當於裂斷線之間距之量,同樣地使擴展器30下降。如此,結束整個面之斷裂,沿著各裂斷線撕開樹脂而分斷正方形狀之功能區域,從而可形成多個LED晶片。 Then, the table 21 is rotated by 90°, and the expander 30 is similarly lowered for the y-axis breakage line to break the resin layer. Then, the table 21 is moved in the y-axis direction by an amount corresponding to the distance between the broken lines, and the expander 30 is similarly lowered. In this way, the entire surface is broken, and the resin is broken along each fracture line to break the square functional region, thereby forming a plurality of LED wafers.
再者,於該實施形態中,為了能夠保護功能區域而將彈性支撐板40之多個保護孔41設為貫通孔,但只要在斷裂時複合基板10之構造體14不會接觸於彈性支撐板40即可,亦可不設為貫通孔,而設為深度 為構造體14不會接觸於彈性支撐板40之程度之孔。 Further, in this embodiment, in order to protect the functional region, the plurality of protective holes 41 of the elastic supporting plate 40 are formed as through holes, but the structural body 14 of the composite substrate 10 does not contact the elastic supporting plate as long as it is broken. 40 or not, but not as a through hole, but set to depth It is a hole in which the structure 14 does not contact the elastic support plate 40.
又,於該實施形態中,作為成為基底之基板,對陶瓷基板進行了說明,但本發明亦可適用於半導體基板或玻璃基板等各種脆性材料基板。 Further, in this embodiment, the ceramic substrate has been described as the substrate to be the base. However, the present invention is also applicable to various brittle material substrates such as a semiconductor substrate or a glass substrate.
再者,於該實施形態中,作為塗佈於陶瓷基板之樹脂,對矽樹脂進行了說明,但亦可為其他各種材質之層、例如對玻璃基板積層之偏光板等層。 In the embodiment, the tantalum resin is described as a resin applied to a ceramic substrate, but may be a layer of other various materials, for example, a layer such as a polarizing plate laminated on a glass substrate.
本發明於對具有應保護之區域之脆性材料基板進行刻劃而分斷時,可不損傷應保護之區域而進行斷裂,因此,可有效地適用於形成有功能區域之基板之斷裂裝置。 When the brittle material substrate having the region to be protected is cut and cut, the present invention can be broken without damaging the region to be protected. Therefore, the present invention can be effectively applied to a fracture device for forming a substrate having a functional region.
11‧‧‧陶瓷基板 11‧‧‧Ceramic substrate
12‧‧‧矽樹脂 12‧‧‧矽 resin
14‧‧‧構造體 14‧‧‧Buildings
32a‧‧‧擴展棒 32a‧‧‧Extension stick
40‧‧‧彈性支撐板 40‧‧‧Flexible support plate
41‧‧‧保護孔 41‧‧‧Protection hole
Bx1‧‧‧裂斷線 B x1 ‧‧‧crack line
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JP (1) | JP6213134B2 (en) |
KR (1) | KR20150044374A (en) |
CN (1) | CN104552630B (en) |
TW (1) | TWI607975B (en) |
Families Citing this family (5)
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JP6243699B2 (en) * | 2013-10-25 | 2017-12-06 | 三星ダイヤモンド工業株式会社 | Fragment material substrate cutting device |
JP6705129B2 (en) * | 2015-06-29 | 2020-06-03 | 三星ダイヤモンド工業株式会社 | How to break the board |
JP2017001180A (en) * | 2016-09-29 | 2017-01-05 | 三星ダイヤモンド工業株式会社 | Surface layer fracturing apparatus of brittle material substrate |
WO2019082736A1 (en) * | 2017-10-27 | 2019-05-02 | 三星ダイヤモンド工業株式会社 | Method for segmenting substrate having metal film |
JP7206829B2 (en) | 2018-11-15 | 2023-01-18 | 日本電気硝子株式会社 | METHOD FOR MANUFACTURING PLATE MEMBER AND LAMINATE |
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DE4133150A1 (en) * | 1991-09-30 | 1993-04-01 | Siemens Ag | Cross cutting semiconductor optical waveguide strip - using linear bottom support and upper pressure plate with spring loaded cutting wedge fitting into etched separating groove |
JP2001250798A (en) * | 2000-03-06 | 2001-09-14 | Sony Corp | Method and apparatus for dividing material along scribing line |
TW527328B (en) * | 2000-10-02 | 2003-04-11 | Mitsuboshi Diamond Ind Co Ltd | Method and device for manufacturing brittle substrates |
TWI299544B (en) * | 2002-07-02 | 2008-08-01 | Mitsuboshi Diamond Ind Co Ltdl | |
TW201207926A (en) * | 2010-07-05 | 2012-02-16 | Mitsuboshi Diamond Ind Co Ltd | Breaking device |
CN103203806A (en) * | 2012-01-16 | 2013-07-17 | 三星钻石工业股份有限公司 | Method for breaking brittle material substrate |
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JPH0784006B2 (en) * | 1986-07-29 | 1995-09-13 | 松下電器産業株式会社 | Substrate dividing device |
WO2003082542A1 (en) * | 2002-04-01 | 2003-10-09 | Mitsuboshi Diamond Industrial Co., Ltd. | Parting method for fragile material substrate and parting device using the method |
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2013
- 2013-10-16 JP JP2013215393A patent/JP6213134B2/en not_active Expired - Fee Related
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2014
- 2014-06-23 TW TW103121613A patent/TWI607975B/en not_active IP Right Cessation
- 2014-07-01 CN CN201410310194.5A patent/CN104552630B/en not_active Expired - Fee Related
- 2014-07-29 KR KR20140096313A patent/KR20150044374A/en not_active Application Discontinuation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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DE4133150A1 (en) * | 1991-09-30 | 1993-04-01 | Siemens Ag | Cross cutting semiconductor optical waveguide strip - using linear bottom support and upper pressure plate with spring loaded cutting wedge fitting into etched separating groove |
JP2001250798A (en) * | 2000-03-06 | 2001-09-14 | Sony Corp | Method and apparatus for dividing material along scribing line |
TW527328B (en) * | 2000-10-02 | 2003-04-11 | Mitsuboshi Diamond Ind Co Ltd | Method and device for manufacturing brittle substrates |
TWI299544B (en) * | 2002-07-02 | 2008-08-01 | Mitsuboshi Diamond Ind Co Ltdl | |
TW201207926A (en) * | 2010-07-05 | 2012-02-16 | Mitsuboshi Diamond Ind Co Ltd | Breaking device |
CN103203806A (en) * | 2012-01-16 | 2013-07-17 | 三星钻石工业股份有限公司 | Method for breaking brittle material substrate |
Also Published As
Publication number | Publication date |
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JP6213134B2 (en) | 2017-10-18 |
TW201516010A (en) | 2015-05-01 |
JP2015077711A (en) | 2015-04-23 |
CN104552630A (en) | 2015-04-29 |
CN104552630B (en) | 2017-11-03 |
KR20150044374A (en) | 2015-04-24 |
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