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TW200848828A - Optical element holding apparatus - Google Patents

Optical element holding apparatus Download PDF

Info

Publication number
TW200848828A
TW200848828A TW097106842A TW97106842A TW200848828A TW 200848828 A TW200848828 A TW 200848828A TW 097106842 A TW097106842 A TW 097106842A TW 97106842 A TW97106842 A TW 97106842A TW 200848828 A TW200848828 A TW 200848828A
Authority
TW
Taiwan
Prior art keywords
optical
optical element
optical component
holding device
axis
Prior art date
Application number
TW097106842A
Other languages
English (en)
Chinese (zh)
Inventor
Makoto Mizuno
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200848828A publication Critical patent/TW200848828A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW097106842A 2007-02-28 2008-02-27 Optical element holding apparatus TW200848828A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007049367 2007-02-28
JP2008043071A JP2008242448A (ja) 2007-02-28 2008-02-25 光学要素保持装置

Publications (1)

Publication Number Publication Date
TW200848828A true TW200848828A (en) 2008-12-16

Family

ID=39913802

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097106842A TW200848828A (en) 2007-02-28 2008-02-27 Optical element holding apparatus

Country Status (3)

Country Link
JP (1) JP2008242448A (ja)
KR (1) KR100916250B1 (ja)
TW (1) TW200848828A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5317624B2 (ja) * 2008-10-17 2013-10-16 キヤノン株式会社 保持装置、望遠鏡および光学装置
WO2010098474A1 (ja) * 2009-02-27 2010-09-02 株式会社 ニコン 光学素子保持装置、光学系、露光装置、デバイスの製造方法及び光学素子の交換方法
JP2010271457A (ja) 2009-05-20 2010-12-02 Canon Inc 光学素子位置調整機構、光学素子位置調整機構を備えた露光装置及び光学素子位置調整方法
JP5556155B2 (ja) * 2009-12-04 2014-07-23 株式会社ニコン 光学部材変形装置、光学系、露光装置、デバイスの製造方法
JP2011119551A (ja) * 2009-12-04 2011-06-16 Nikon Corp 光学部材変形装置、光学系、露光装置、デバイスの製造方法
WO2011122357A1 (ja) * 2010-03-29 2011-10-06 コニカミノルタオプト株式会社 撮像光学系及び光学調整方法
KR101728464B1 (ko) 2010-05-11 2017-04-19 에스프린팅솔루션 주식회사 렌즈 어레이, 선형 노광 장치 및 선형 노광 장치를 채용한 광학 장치

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4809987B2 (ja) 2000-03-30 2011-11-09 キヤノン株式会社 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法
JP4945845B2 (ja) 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
ATE449978T1 (de) * 2003-06-06 2009-12-15 Nikon Corp Halteeinrichtung für optische elemente, objektivtubus, belichtungseinrichtung und herstellungsverfahren für bauelemente
JP2006113414A (ja) 2004-10-18 2006-04-27 Canon Inc 光学素子保持装置、鏡筒、露光装置及びマイクロデバイスの製造方法

Also Published As

Publication number Publication date
KR100916250B1 (ko) 2009-09-10
JP2008242448A (ja) 2008-10-09
KR20080080046A (ko) 2008-09-02

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