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KR100916250B1 - 광학요소 유지장치 - Google Patents

광학요소 유지장치 Download PDF

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Publication number
KR100916250B1
KR100916250B1 KR1020080018155A KR20080018155A KR100916250B1 KR 100916250 B1 KR100916250 B1 KR 100916250B1 KR 1020080018155 A KR1020080018155 A KR 1020080018155A KR 20080018155 A KR20080018155 A KR 20080018155A KR 100916250 B1 KR100916250 B1 KR 100916250B1
Authority
KR
South Korea
Prior art keywords
optical element
sensors
axis
support member
protrusions
Prior art date
Application number
KR1020080018155A
Other languages
English (en)
Korean (ko)
Other versions
KR20080080046A (ko
Inventor
마코토 미즈노
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20080080046A publication Critical patent/KR20080080046A/ko
Application granted granted Critical
Publication of KR100916250B1 publication Critical patent/KR100916250B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020080018155A 2007-02-28 2008-02-28 광학요소 유지장치 KR100916250B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007049367 2007-02-28
JPJP-P-2007-00049367 2007-02-28
JPJP-P-2008-00043071 2008-02-25
JP2008043071A JP2008242448A (ja) 2007-02-28 2008-02-25 光学要素保持装置

Publications (2)

Publication Number Publication Date
KR20080080046A KR20080080046A (ko) 2008-09-02
KR100916250B1 true KR100916250B1 (ko) 2009-09-10

Family

ID=39913802

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080018155A KR100916250B1 (ko) 2007-02-28 2008-02-28 광학요소 유지장치

Country Status (3)

Country Link
JP (1) JP2008242448A (ja)
KR (1) KR100916250B1 (ja)
TW (1) TW200848828A (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5317624B2 (ja) * 2008-10-17 2013-10-16 キヤノン株式会社 保持装置、望遠鏡および光学装置
WO2010098474A1 (ja) * 2009-02-27 2010-09-02 株式会社 ニコン 光学素子保持装置、光学系、露光装置、デバイスの製造方法及び光学素子の交換方法
JP2010271457A (ja) 2009-05-20 2010-12-02 Canon Inc 光学素子位置調整機構、光学素子位置調整機構を備えた露光装置及び光学素子位置調整方法
JP5556155B2 (ja) * 2009-12-04 2014-07-23 株式会社ニコン 光学部材変形装置、光学系、露光装置、デバイスの製造方法
JP2011119551A (ja) * 2009-12-04 2011-06-16 Nikon Corp 光学部材変形装置、光学系、露光装置、デバイスの製造方法
WO2011122357A1 (ja) * 2010-03-29 2011-10-06 コニカミノルタオプト株式会社 撮像光学系及び光学調整方法
KR101728464B1 (ko) 2010-05-11 2017-04-19 에스프린팅솔루션 주식회사 렌즈 어레이, 선형 노광 장치 및 선형 노광 장치를 채용한 광학 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050046815A1 (en) 2000-03-30 2005-03-03 Canon Kabushiki Kaisha Supporting structure of optical element, exposure apparatus having the same, and manufacturing method of semiconductor device
KR20060021339A (ko) * 2003-06-06 2006-03-07 가부시키가이샤 니콘 광학 소자 유지 장치, 경통, 노광 장치, 및 디바이스의제조방법
JP2006113414A (ja) 2004-10-18 2006-04-27 Canon Inc 光学素子保持装置、鏡筒、露光装置及びマイクロデバイスの製造方法
KR100850652B1 (ko) 2000-03-31 2008-08-07 가부시키가이샤 니콘 노광장치의 광학소자 지지장치

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050046815A1 (en) 2000-03-30 2005-03-03 Canon Kabushiki Kaisha Supporting structure of optical element, exposure apparatus having the same, and manufacturing method of semiconductor device
KR100850652B1 (ko) 2000-03-31 2008-08-07 가부시키가이샤 니콘 노광장치의 광학소자 지지장치
KR20060021339A (ko) * 2003-06-06 2006-03-07 가부시키가이샤 니콘 광학 소자 유지 장치, 경통, 노광 장치, 및 디바이스의제조방법
JP2006113414A (ja) 2004-10-18 2006-04-27 Canon Inc 光学素子保持装置、鏡筒、露光装置及びマイクロデバイスの製造方法

Also Published As

Publication number Publication date
TW200848828A (en) 2008-12-16
JP2008242448A (ja) 2008-10-09
KR20080080046A (ko) 2008-09-02

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