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SK287455B6 - Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2 - Google Patents

Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2 Download PDF

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Publication number
SK287455B6
SK287455B6 SK5052-2006A SK50522006A SK287455B6 SK 287455 B6 SK287455 B6 SK 287455B6 SK 50522006 A SK50522006 A SK 50522006A SK 287455 B6 SK287455 B6 SK 287455B6
Authority
SK
Slovakia
Prior art keywords
layer
glass
coated
plasma
sio
Prior art date
Application number
SK5052-2006A
Other languages
English (en)
Slovak (sk)
Other versions
SK50522006A3 (sk
Inventor
Mirko �Ern�K
Original Assignee
Fakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Ho
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Ho filed Critical Fakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Ho
Priority to SK5052-2006A priority Critical patent/SK287455B6/sk
Priority to PCT/SK2007/050013 priority patent/WO2007142612A1/en
Priority to EP07748765.0A priority patent/EP2033207B1/en
Priority to CN2007800211547A priority patent/CN101473404B/zh
Priority to US12/303,482 priority patent/US20090194507A1/en
Publication of SK50522006A3 publication Critical patent/SK50522006A3/sk
Publication of SK287455B6 publication Critical patent/SK287455B6/sk

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816Pressure
    • H01J37/32825Working under atmospheric pressure or higher
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348Dielectric barrier discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32559Protection means, e.g. coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67069Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Cleaning In General (AREA)
  • Laminated Bodies (AREA)
SK5052-2006A 2006-06-08 2006-06-08 Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2 SK287455B6 (sk)

Priority Applications (5)

Application Number Priority Date Filing Date Title
SK5052-2006A SK287455B6 (sk) 2006-06-08 2006-06-08 Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2
PCT/SK2007/050013 WO2007142612A1 (en) 2006-06-08 2007-06-07 Apparatus and method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other sio2-coated materials
EP07748765.0A EP2033207B1 (en) 2006-06-08 2007-06-07 Method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other sio2-coated materials
CN2007800211547A CN101473404B (zh) 2006-06-08 2007-06-07 对玻璃表面,涂有金属氧化物的玻璃表面,和其他SiO2涂覆材料的表面进行清洗、蚀刻、活化和后续处理的装置和方法
US12/303,482 US20090194507A1 (en) 2006-06-08 2007-06-07 Apparatus and method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other si02-coated materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SK5052-2006A SK287455B6 (sk) 2006-06-08 2006-06-08 Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2

Publications (2)

Publication Number Publication Date
SK50522006A3 SK50522006A3 (sk) 2008-02-05
SK287455B6 true SK287455B6 (sk) 2010-10-07

Family

ID=38519777

Family Applications (1)

Application Number Title Priority Date Filing Date
SK5052-2006A SK287455B6 (sk) 2006-06-08 2006-06-08 Zariadenie a spôsob čistenia, leptania, aktivácie a následné úpravy povrchu skla, povrchu skla pokrytého kysličníkmi kovov a povrchu iných materiálov pokrytých SiO2

Country Status (5)

Country Link
US (1) US20090194507A1 (zh)
EP (1) EP2033207B1 (zh)
CN (1) CN101473404B (zh)
SK (1) SK287455B6 (zh)
WO (1) WO2007142612A1 (zh)

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* Cited by examiner, † Cited by third party
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SK51082006A3 (sk) * 2006-12-05 2008-07-07 Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov
TW201109285A (en) * 2009-09-10 2011-03-16 Applied Vacuum Coating Technologies Co Ltd Method of strengthening glass plate
JP2012033689A (ja) * 2010-07-30 2012-02-16 Sumitomo Electric Device Innovations Inc 半導体装置の製造方法
US10161934B2 (en) 2011-08-26 2018-12-25 Aviana Molecular Technologies, Llc Biocoated piezoelectric biosensor platform for point-of-care diagnostic use
GB201202307D0 (en) * 2012-02-10 2012-03-28 Univ Bangor Low temperture sintering of dye-sensitised solar cells using metal peroxide
CN103500804B (zh) * 2013-08-28 2016-03-16 京东方科技集团股份有限公司 一种薄膜及其制备方法、发光显示器件
US10703653B2 (en) * 2016-02-17 2020-07-07 Panasonic Intellectual Property Management Co., Ltd. Liquid treatment device utilizing plasma
TWI620228B (zh) 2016-12-29 2018-04-01 財團法人工業技術研究院 電漿處理裝置與電漿處理方法
EP3585136A1 (en) * 2018-06-20 2019-12-25 Masarykova Univerzita A method and device for generating low-temperature electrical water-based plasma at near-atmospheric pressures and its use
EP3831792A4 (en) * 2018-08-02 2022-05-11 BYD Company Limited GLASS COMPOSITE, HOUSING, DISPLAY DEVICE AND TERMINAL DEVICE
CN112758887B (zh) * 2021-01-05 2024-09-13 墨光新能科技(苏州)有限公司 一种掩膜刻蚀制备亚波长周期性阵列的方法
CN117510097A (zh) * 2023-12-29 2024-02-06 核工业西南物理研究院 一种硅基陶瓷表面金属化方法及应用

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US265505A (en) * 1882-10-03 Eaphael josia
US8229A (en) * 1851-07-15 Improvement in
US45103A (en) * 1864-11-15 Morris wells
US248A (en) * 1837-06-30 Lamps and lamp-torches
US161433A (en) * 1875-03-30 Improvement in coal-hods
US145174A (en) * 1873-12-02 Improvement in drawing-board trestles
US76394A (en) * 1868-04-07 brock
GB8909685D0 (en) * 1989-04-27 1989-06-14 British Petroleum Co Plc Method for reducing fouling
US5792517A (en) * 1996-04-25 1998-08-11 Japan Vilene Company Process for treating the outer-inner surfaces of a porous non-conductor
US6441553B1 (en) 1999-02-01 2002-08-27 Sigma Technologies International, Inc. Electrode for glow-discharge atmospheric-pressure plasma treatment
EP1073091A3 (en) * 1999-07-27 2004-10-06 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
SK6292001A3 (en) * 2001-05-04 2002-11-06 Mirko Cernak Method and device for the treatment of textile materials
FR2836157B1 (fr) * 2002-02-19 2004-04-09 Usinor Procede de nettoyage de la surface d'un materiau enduit d'une susbstance organique, generateur et dispositif de mise en oeuvre
FR2836158B1 (fr) * 2002-02-19 2005-01-07 Usinor Procede de nettoyage par plasma de la surface d'un materiau enduit d'une substance organique, et installation de mise en oeuvre
WO2005062338A1 (en) * 2003-12-22 2005-07-07 Fuji Photo Film B. V. Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma
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Also Published As

Publication number Publication date
EP2033207B1 (en) 2017-11-01
CN101473404B (zh) 2012-06-20
CN101473404A (zh) 2009-07-01
WO2007142612A1 (en) 2007-12-13
US20090194507A1 (en) 2009-08-06
WO2007142612B1 (en) 2008-01-31
EP2033207A1 (en) 2009-03-11
SK50522006A3 (sk) 2008-02-05

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MM4A Patent lapsed due to non-payment of maintenance fees

Effective date: 20230608