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SG11201401899YA - Ferromagnetic material sputtering target containing chrome oxide - Google Patents

Ferromagnetic material sputtering target containing chrome oxide

Info

Publication number
SG11201401899YA
SG11201401899YA SG11201401899YA SG11201401899YA SG11201401899YA SG 11201401899Y A SG11201401899Y A SG 11201401899YA SG 11201401899Y A SG11201401899Y A SG 11201401899YA SG 11201401899Y A SG11201401899Y A SG 11201401899YA SG 11201401899Y A SG11201401899Y A SG 11201401899YA
Authority
SG
Singapore
Prior art keywords
sputtering target
ferromagnetic material
target containing
chrome oxide
material sputtering
Prior art date
Application number
SG11201401899YA
Inventor
Hideo Takami
Atsutoshi Arakawa
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of SG11201401899YA publication Critical patent/SG11201401899YA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H01J37/3429—Plural materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Magnetic Record Carriers (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Thin Magnetic Films (AREA)
SG11201401899YA 2012-02-23 2013-01-28 Ferromagnetic material sputtering target containing chrome oxide SG11201401899YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012037263 2012-02-23
PCT/JP2013/051695 WO2013125296A1 (en) 2012-02-23 2013-01-28 Ferromagnetic material sputtering target containing chrome oxide

Publications (1)

Publication Number Publication Date
SG11201401899YA true SG11201401899YA (en) 2014-10-30

Family

ID=49005489

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401899YA SG11201401899YA (en) 2012-02-23 2013-01-28 Ferromagnetic material sputtering target containing chrome oxide

Country Status (7)

Country Link
US (1) US9773653B2 (en)
JP (1) JP5654121B2 (en)
CN (1) CN104126026B (en)
MY (1) MY170298A (en)
SG (1) SG11201401899YA (en)
TW (1) TWI582250B (en)
WO (1) WO2013125296A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY173543A (en) * 2012-02-23 2020-02-04 Jx Nippon Mining & Metals Corp Ferromagnetic material sputtering target containing chromium oxide
JP6005767B2 (en) * 2014-01-17 2016-10-12 Ｊｘ金属株式会社 Sputtering target for magnetic recording media
CN104060229A (en) * 2014-06-20 2014-09-24 贵研铂业股份有限公司 CoCrPt-oxide magnetic recording target, film and preparation method thereof
JP7317741B2 (en) * 2020-02-07 2023-07-31 Ｊｘ金属株式会社 Sputtering targets, magnetic films, and mixed raw material powders for making sputtering targets

Family Cites Families (36)

* Cited by examiner, † Cited by third party
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WO2005083148A1 (en) 2004-03-01 2005-09-09 Nippon Mining & Metals Co., Ltd. Sputtering target with few surface defects and method for processing surface thereof
KR20060127267A (en) 2004-03-26 2006-12-11 닛코킨조쿠 가부시키가이샤 Co-cr-pt-b based alloy sputtering target
CN1854318A (en) * 2005-04-18 2006-11-01 黑罗伊斯有限公司 Enhanced formulation of cobalt alloy matrix compositions
US7494617B2 (en) 2005-04-18 2009-02-24 Heraeus Inc. Enhanced formulation of cobalt alloy matrix compositions
US20060234091A1 (en) 2005-04-19 2006-10-19 Heraeus, Inc. Enhanced multi-component oxide-containing sputter target alloy compositions
JP4727664B2 (en) 2005-06-15 2011-07-20 Ｊｘ日鉱日石金属株式会社 Chromium oxide powder for sputtering target and sputtering target
JP4553136B2 (en) * 2005-07-29 2010-09-29 三菱マテリアル株式会社 Sputtering target for forming magnetic recording film with less generation of particles
WO2007080781A1 (en) 2006-01-13 2007-07-19 Nippon Mining & Metals Co., Ltd. Nonmagnetic material particle dispersed ferromagnetic material sputtering target
WO2007116834A1 (en) 2006-03-31 2007-10-18 Mitsubishi Materials Corporation METHOD FOR MANUFACTURING Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMATION OF MAGNETIC RECORDING FILM WHICH IS LESS LIKELY TO GENERATE PARTICLES, AND Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMATION OF MAGNETIC RECORDING FILM
JP5024661B2 (en) * 2007-03-26 2012-09-12 三菱マテリアル株式会社 Co-based sintered alloy sputtering target for magnetic recording film formation with less generation of particles
CN101405429A (en) * 2006-03-31 2009-04-08 三菱麻铁里亚尔株式会社 Method for manufacturing Co-base sintered alloy sputtering target for formation of magnetic recording film which is less likely to generate particles, and Co-base sintered alloy sputtering target ther
JP2009197310A (en) * 2008-02-25 2009-09-03 Kobe Steel Ltd Sputtering target
JP2009215617A (en) 2008-03-11 2009-09-24 Mitsui Mining & Smelting Co Ltd Sputtering target material containing cobalt, chromium, and platinum matrix phase and oxide phase and method for producing the same
US8568576B2 (en) 2008-03-28 2013-10-29 Jx Nippon Mining & Metals Corporation Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material
MY150458A (en) 2008-04-03 2014-01-30 Jx Nippon Mining & Metals Corp Sputtering target with low generation of particles
WO2010101051A1 (en) 2009-03-03 2010-09-10 日鉱金属株式会社 Sputtering target and process for producing same
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MY148731A (en) 2009-08-06 2013-05-31 Jx Nippon Mining & Metals Corp Inorganic-particle-dispersed sputtering target
US9269389B2 (en) 2009-12-11 2016-02-23 Jx Nippon Mining & Metals Corporation Sputtering target of magnetic material
MY149640A (en) 2009-12-11 2013-09-13 Jx Nippon Mining & Metals Corp Sputtering target comprising oxide phase dispersed in co or co alloy phase, magnetic thin film made of co or co alloy phase and oxide phase, and magnetic recording medium using the said thin film
WO2011077933A1 (en) 2009-12-25 2011-06-30 Jx日鉱日石金属株式会社 Sputtering target with reduced particle generation and method for producing the sputtering target
WO2011089760A1 (en) 2010-01-21 2011-07-28 Jx日鉱日石金属株式会社 Ferromagnetic-material sputtering target
MY150826A (en) 2010-07-20 2014-02-28 Jx Nippon Mining & Metals Corp Sputtering target of perromagnetic material with low generation of particles
MY157156A (en) 2010-07-20 2016-05-13 Jx Nippon Mining & Metals Corp Sputtering target of ferromagnetic material with low generation of particles
JP5032706B2 (en) 2010-07-29 2012-09-26 Ｊｘ日鉱日石金属株式会社 Sputtering target for magnetic recording film and manufacturing method thereof
JP4871406B1 (en) * 2010-08-06 2012-02-08 田中貴金属工業株式会社 Magnetron sputtering target and method for manufacturing the same
WO2012029331A1 (en) 2010-09-03 2012-03-08 Jx日鉱日石金属株式会社 Ferromagnetic material sputtering target
TWI374444B (en) * 2010-11-05 2012-10-11 Solar Applied Mat Tech Corp Sputtering targets and recording materials for hard disk formed by the sputtering target
WO2012077665A1 (en) 2010-12-09 2012-06-14 Jx日鉱日石金属株式会社 Ferromagnetic material sputtering target
SG188602A1 (en) 2010-12-15 2013-04-30 Jx Nippon Mining & Metals Corp Ferromagnetic sputtering target and method for manufacturing same
SG189257A1 (en) 2010-12-17 2013-05-31 Jx Nippon Mining & Metals Corp Sputtering target for magnetic recording film and method for producing same
CN103261469A (en) 2010-12-17 2013-08-21 吉坤日矿日石金属株式会社 Ferromagnetic material sputtering target
SG188603A1 (en) 2010-12-17 2013-04-30 Jx Nippon Mining & Metals Corp Ferromagnetic material sputtering target
CN103270190B (en) 2010-12-22 2016-01-20 吉坤日矿日石金属株式会社 Sinter sputtering target
SG189202A1 (en) 2010-12-22 2013-05-31 Jx Nippon Mining & Metals Corp Ferromagnetic sputtering target
WO2013027443A1 (en) 2011-08-23 2013-02-28 Jx日鉱日石金属株式会社 Ferromagnetic sputtering target with minimized particle generation

Also Published As

Publication number Publication date
US9773653B2 (en) 2017-09-26
WO2013125296A1 (en) 2013-08-29
JP5654121B2 (en) 2015-01-14
JPWO2013125296A1 (en) 2015-07-30
TW201335397A (en) 2013-09-01
CN104126026B (en) 2016-03-23
MY170298A (en) 2019-07-17
TWI582250B (en) 2017-05-11
CN104126026A (en) 2014-10-29
US20140360870A1 (en) 2014-12-11

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