KR870002752A - 수평 안내회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치 - Google Patents
수평 안내회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치 Download PDFInfo
- Publication number
- KR870002752A KR870002752A KR1019860006487A KR860006487A KR870002752A KR 870002752 A KR870002752 A KR 870002752A KR 1019860006487 A KR1019860006487 A KR 1019860006487A KR 860006487 A KR860006487 A KR 860006487A KR 870002752 A KR870002752 A KR 870002752A
- Authority
- KR
- South Korea
- Prior art keywords
- nozzle
- circuit board
- activating
- cleaning
- circuit boards
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims 4
- 230000003213 activating effect Effects 0.000 title claims 2
- 238000004140 cleaning Methods 0.000 title claims 2
- 239000002184 metal Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
- H05K3/0088—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0285—Using ultrasound, e.g. for cleaning, soldering or wet treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S239/00—Fluid sprinkling, spraying, and diffusing
- Y10S239/19—Nozzle materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S239/00—Fluid sprinkling, spraying, and diffusing
- Y10S239/22—Safety air nozzles
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Electroplating Methods And Accessories (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Chemically Coating (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 장치의 단면도.
제2도는 본 발명에 의한 장치의 사시도.
제3도는 처리단계의 개략도.
*도면의 주요 부분에 대한 부호의 설명
1:노즐하우징 2: 예비실 3: 천공된 마스크
4:노즐 내부 공간 5:노즐 6:양극
7:노즐 하우징과 회로 기판 사이의 간극 8: 회로 기판
9:초음파 진동기 10:입구 노즐 11:슬라이딩 접점
12:처리용액 13:펌프 14:탱크
15:안내롤러
A:회로 기판 하방의 노즐
A+B:초음파 진동기(9)를 가진 노즐
A+C:서로 수직으로 또는 엇갈리게 배치된 두 노즐
A+B+C:초음파 진동기(9)와 서로 대향 배치된 두 노즐
A+D:전해노즐(D)(양극+음극)
A+C+D:서로 대향된 전해노즐(D)(양극+음극)
Claims (8)
- 수평으로 안내되는 회로기판에 천공된 구멍을 청소, 활성화 또는 금속 피복하는 방법에 있어서, 회로기판이 일정한 속도로 운반 방향에 수직인 콘베이어 통로 하방에 위치된 노즐로 형성되어 있는 파형성부위를 횡단하여 이동하고, 이 노즐로부터 처리 용액이 일정한 파형으로 회로 기판 하부로 흐르는 것을 특징으로 하는 수평 안내 회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법.
- 제1항에 있어서, 회로기판이 노즐 위쪽 1mm 거리에 배치되는 것을 특징으로 하는 방법.
- 제1항 또는 제2항중 어느 하나에 의한 방법을 실시하기 위한 장치에 있어서, 노즐이 입구 노즐을 가진 예비실에 의해 형성된 노즐 하우징의 상부에 배치되어 있고, 그 예비실은 천공된 마스크에 의하여 노즐 내부 공간의 상부와 분리되어 있는 것을 특징으로 하는 장치.
- 제3항에 있어서, 노즐이 홈구멍이 천공되거나, 구멍이 대칭 또는 비대칭으로 천공 또는 제공되어 있는 천공 평면의 형태로 되어 있는 것을 특징으로 하는 장치.
- 제3항에 있어서, 노즐 하우징의 상부가 노즐에 대하여 경사진 평면을 갖고 있는 것을 특징으로 하는 장치.
- 제3항에 있어서, 노즐 하우징의 내부, 특히 그 상부에 초음파 진동기가 배치되어 있을 것을 특징으로 하는 장치.
- 제3항에 있어서, 회전기판의 상, 하부측에 엇갈리게 배치된 2개의 노즐이 제공되어 있는 것을 특징으로 하는 장치.
- 제3항에 있어서, 노즐 하우징내에, 특히 그 하부에 양극이 고정되어 있는 것을 특징으로 하는 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEP3528575.3 | 1985-08-06 | ||
DE19853528575 DE3528575A1 (de) | 1985-08-06 | 1985-08-06 | Verfahren und einrichtung zur reinigung, aktivierung und/oder metallisierung von bohrloechern in horizontal gefuehrten leiterplatten |
DE3528575.3 | 1985-08-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR870002752A true KR870002752A (ko) | 1987-04-06 |
KR930010062B1 KR930010062B1 (ko) | 1993-10-14 |
Family
ID=6278093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019860006487A KR930010062B1 (ko) | 1985-08-06 | 1986-08-06 | 수평 안내 회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치 |
Country Status (11)
Country | Link |
---|---|
US (1) | US4789405A (ko) |
EP (1) | EP0212253B2 (ko) |
JP (1) | JPS6297396A (ko) |
KR (1) | KR930010062B1 (ko) |
CN (1) | CN1016483B (ko) |
AT (1) | AT397011B (ko) |
BG (1) | BG49390A3 (ko) |
CA (1) | CA1276528C (ko) |
CZ (1) | CZ278956B6 (ko) |
DE (2) | DE3528575A1 (ko) |
SK (1) | SK278074B6 (ko) |
Families Citing this family (33)
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DE3638630A1 (de) * | 1986-11-11 | 1988-05-26 | Schering Ag | Verfahren zur entfernung von harzverschmutzungen in bohrloechern von leiterplatten |
DE8703114U1 (de) * | 1987-02-25 | 1987-04-09 | Schering AG, 1000 Berlin und 4709 Bergkamen | Einrichtung zur Reinigung oder chemischen Behandlung von Werkstücken |
DE3879929D1 (de) * | 1988-02-25 | 1993-05-06 | Schmid Gmbh & Co Geb | Vorrichtung zur behandlung von elektrischen leiterplatten. |
DE3821980A1 (de) * | 1988-06-29 | 1990-01-11 | Schering Ag | Vorrichtung und verfahren zur reinigung und behandlung von horizontal bewegten leiterplatten |
DE3916694A1 (de) * | 1989-05-23 | 1990-11-29 | Schering Ag | Anordnung zur chemischen behandlung und/oder reinigung von gut, insbesondere von mit bohrungen versehenen leiterplatten, sowie dazugehoeriges verfahren |
DE3916693A1 (de) * | 1989-05-23 | 1990-11-29 | Schering Ag | Anordnung zur behandlung und/oder reinigung von gut, insbesondere von mit bohrungen versehenen leiterplatten |
DE3932779A1 (de) * | 1989-09-30 | 1991-04-11 | Schering Ag | Verfahren zum behandeln von gegenstaenden mit einer fluessigkeit, sowie vorrichtung zur durchfuehrung des verfahrens |
DE3935831A1 (de) * | 1989-10-27 | 1991-05-02 | Hoellmueller Maschbau H | Anlage zur herstellung von durchkontaktierten leiterplatten und multilayern |
DE4040119A1 (de) * | 1990-12-13 | 1992-06-17 | Schering Ag | Verfahren zum durchfluten von bohrungen in plattenfoermigen werkstuecken, insbesondere leiterplatten, und vorrichtung hierfuer |
IT1252381B (it) * | 1991-11-12 | 1995-06-12 | Occleppo Di Francesco Occleppo | Dispositivo per la formazione d'una pellicola sulle pareti dei forellini nelle piastre per circuiti stampati |
US5289639A (en) * | 1992-07-10 | 1994-03-01 | International Business Machines Corp. | Fluid treatment apparatus and method |
IT1256443B (it) * | 1992-11-23 | 1995-12-05 | Impianto galvanico a celle elettrolitiche contrapposte con alimentazione in continuo delle superfici da trattare | |
US5378307A (en) * | 1993-04-28 | 1995-01-03 | International Business Machines Corporation | Fluid treatment apparatus |
DE4402596C2 (de) * | 1994-01-28 | 1997-03-27 | Atotech Deutschland Gmbh | Elektrolytisches Verfahren in horizontalen Durchlaufanlagen und Vorrichtung zur Durchführung desselben |
EP0801883B1 (de) * | 1995-01-05 | 1999-03-03 | Hübel, Egon | Verfahren und vorrichtung zur behandlung von mit feinsten löchern versehenen plattenförmigen werkstücken |
US5720813A (en) | 1995-06-07 | 1998-02-24 | Eamon P. McDonald | Thin sheet handling system |
DE19524523A1 (de) * | 1995-07-05 | 1997-01-09 | Atotech Deutschland Gmbh | Anwendung eines Verfahrens und einer Vorrichtung zum Behandeln von Fluiden in der Leiterplattentechnik |
US5741361A (en) * | 1995-07-06 | 1998-04-21 | Allan H. McKinnon | Method for fluid transport |
US5904773A (en) | 1995-08-11 | 1999-05-18 | Atotech Usa, Inc. | Fluid delivery apparatus |
US5614264A (en) * | 1995-08-11 | 1997-03-25 | Atotech Usa, Inc. | Fluid delivery apparatus and method |
DE19530989C1 (de) * | 1995-08-23 | 1997-03-13 | Atotech Deutschland Gmbh | Verfahren zum Filmstrippen |
DE19534521C1 (de) | 1995-09-06 | 1996-11-21 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum Behandeln von sich in Werkstücke erstreckende Löcher oder Vertiefungen mit flüssigen Behandlungsmitteln und Anwendung des Verfahrens zur Behandlung von Leiterplatten |
JP3005898B2 (ja) * | 1998-04-30 | 2000-02-07 | 東京化工機株式会社 | 液体噴射装置 |
US6336976B1 (en) * | 1999-01-04 | 2002-01-08 | Kabushiki Kaisha Sankyo Seiki Seisakusho | Hole processing apparatus and method thereof and dynamic pressure bearings cleaning method |
JP3120073B2 (ja) * | 1999-02-22 | 2000-12-25 | 東京化工機株式会社 | 薬液処理装置 |
DE10015349A1 (de) | 2000-03-23 | 2001-10-25 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum Behandeln von durchgehende Löcher und/oder Vertiefungen aufweisenden Schaltungsträgern sowie Anwendung des Verfahrens und Verwendung der Vorrichtung |
DE10110823A1 (de) * | 2001-03-07 | 2002-10-02 | Bosch Gmbh Robert | Verfahren zum Abtragen von Materialablagerungen, die bei einer Laserbearbeitung entstehen |
DE10255884B4 (de) | 2002-11-29 | 2006-05-11 | Atotech Deutschland Gmbh | Düsenanordnung |
DE10323658A1 (de) * | 2003-05-15 | 2004-12-02 | Gebr. Schmid Gmbh & Co. | Verfahren und Vorrichtung zur Beschichtung eines Substrats |
DE102004002421A1 (de) * | 2004-01-16 | 2005-08-18 | Atotech Deutschland Gmbh | Düsenanordnung |
GB2459055B (en) * | 2007-01-11 | 2012-05-23 | Peter Philip Andrew Lymn | Liquid treatment apparatus |
CN102950127A (zh) * | 2012-11-12 | 2013-03-06 | 大连太平洋电子有限公司 | 一种线路板钻孔刀具的清洗方法 |
JP6160147B2 (ja) * | 2013-03-19 | 2017-07-12 | Tdk株式会社 | 電子部品モジュールの製造方法、無電解メッキ方法及び無電解メッキ装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3868272A (en) * | 1973-03-05 | 1975-02-25 | Electrovert Mfg Co Ltd | Cleaning of printed circuit boards by solid and coherent jets of cleaning liquid |
FR2301307A1 (fr) * | 1975-02-24 | 1976-09-17 | Applic Meca Pour Ind Labo | Installation pour le traitement de produits par passage dans un liquide |
DE2606984C3 (de) * | 1976-02-20 | 1978-08-24 | Siemens Ag | Verfahren und Einrichtung zum chemischen Reinigen von Kontaktierungslöchern in Leiterplatten |
US4131483A (en) * | 1976-05-28 | 1978-12-26 | Sumitomo Chemical Company, Limited | Methods for cleaning articles with upward flowing liquids |
US4076222A (en) * | 1976-07-19 | 1978-02-28 | Schaming Edward J | Runout cooling method and apparatus for metal rolling mills |
US4132567A (en) * | 1977-10-13 | 1979-01-02 | Fsi Corporation | Apparatus for and method of cleaning and removing static charges from substrates |
JPS5621147A (en) * | 1979-07-27 | 1981-02-27 | Xerox Corp | Sheet collector and sorter |
DE3006045A1 (de) * | 1980-02-18 | 1981-08-20 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und vorrichtung zur behandlung, insbesondere reinigung, von flachen objekten |
DE3011061C2 (de) * | 1980-03-21 | 1983-12-22 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Intensivierung von Spül- und Reinigungsprozessen für Perforationen in Formstücken in Spül- und Reinigungsautomaten |
JPS5858292A (ja) * | 1981-09-30 | 1983-04-06 | Electroplating Eng Of Japan Co | 微小孔を有するメツキ物のメツキ装置 |
DE3305564C1 (de) * | 1983-02-15 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum Aufbau von metallisierten Leiterbahnen und Durchkontaktierungen an gelochten Leiterplatten |
SE440719B (sv) * | 1983-06-17 | 1985-08-12 | Holmstrands Plaatindustri Ab | Sett och anordning vid rengoring av kretskort, som tidigare underkastats en lodningsoperation med flussmedel |
US4543130A (en) * | 1984-08-28 | 1985-09-24 | Rca Corporation | Megasonic cleaning apparatus and method |
-
1985
- 1985-08-06 DE DE19853528575 patent/DE3528575A1/de not_active Ceased
-
1986
- 1986-07-16 EP EP86109731A patent/EP0212253B2/de not_active Expired - Lifetime
- 1986-07-16 DE DE8686109731T patent/DE3669256D1/de not_active Expired - Lifetime
- 1986-08-01 BG BG076053A patent/BG49390A3/xx unknown
- 1986-08-04 AT AT0209586A patent/AT397011B/de not_active IP Right Cessation
- 1986-08-04 US US06/893,563 patent/US4789405A/en not_active Expired - Lifetime
- 1986-08-05 CN CN86105385A patent/CN1016483B/zh not_active Expired
- 1986-08-06 CZ CS865884A patent/CZ278956B6/cs not_active IP Right Cessation
- 1986-08-06 KR KR1019860006487A patent/KR930010062B1/ko not_active IP Right Cessation
- 1986-08-06 SK SK5884-86A patent/SK278074B6/sk unknown
- 1986-08-06 CA CA000515424A patent/CA1276528C/en not_active Expired - Lifetime
- 1986-08-06 JP JP61183566A patent/JPS6297396A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
CN86105385A (zh) | 1987-04-01 |
ATA209586A (de) | 1993-05-15 |
BG49390A3 (en) | 1991-10-15 |
AT397011B (de) | 1994-01-25 |
CZ278956B6 (en) | 1994-10-19 |
CN1016483B (zh) | 1992-04-29 |
CA1276528C (en) | 1990-11-20 |
EP0212253B1 (de) | 1990-02-28 |
EP0212253A3 (en) | 1987-08-12 |
SK278074B6 (en) | 1995-12-06 |
US4789405A (en) | 1988-12-06 |
KR930010062B1 (ko) | 1993-10-14 |
JPS6297396A (ja) | 1987-05-06 |
EP0212253B2 (de) | 1998-11-11 |
DE3528575A1 (de) | 1987-02-19 |
JPH0445996B2 (ko) | 1992-07-28 |
DE3669256D1 (de) | 1990-04-05 |
EP0212253A2 (de) | 1987-03-04 |
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