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KR870002752A - 수평 안내회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치 - Google Patents

수평 안내회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치 Download PDF

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Publication number
KR870002752A
KR870002752A KR1019860006487A KR860006487A KR870002752A KR 870002752 A KR870002752 A KR 870002752A KR 1019860006487 A KR1019860006487 A KR 1019860006487A KR 860006487 A KR860006487 A KR 860006487A KR 870002752 A KR870002752 A KR 870002752A
Authority
KR
South Korea
Prior art keywords
nozzle
circuit board
activating
cleaning
circuit boards
Prior art date
Application number
KR1019860006487A
Other languages
English (en)
Other versions
KR930010062B1 (ko
Inventor
블래싱 호르스트
마이어 발터
Original Assignee
한스 뮐러, 게르하르트 리트케
쉐링 악티엔 게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6278093&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR870002752(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 한스 뮐러, 게르하르트 리트케, 쉐링 악티엔 게젤샤프트 filed Critical 한스 뮐러, 게르하르트 리트케
Publication of KR870002752A publication Critical patent/KR870002752A/ko
Application granted granted Critical
Publication of KR930010062B1 publication Critical patent/KR930010062B1/ko

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • H05K3/0088Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0285Using ultrasound, e.g. for cleaning, soldering or wet treatment
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736Methods for applying liquids, e.g. spraying
    • H05K2203/0746Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00Cleaning and liquid contact with solids
    • Y10S134/902Semiconductor wafer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S239/00Fluid sprinkling, spraying, and diffusing
    • Y10S239/19Nozzle materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S239/00Fluid sprinkling, spraying, and diffusing
    • Y10S239/22Safety air nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Chemically Coating (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

내용 없음

Description

수평 안내회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 장치의 단면도.
제2도는 본 발명에 의한 장치의 사시도.
제3도는 처리단계의 개략도.
*도면의 주요 부분에 대한 부호의 설명
1:노즐하우징 2: 예비실 3: 천공된 마스크
4:노즐 내부 공간 5:노즐 6:양극
7:노즐 하우징과 회로 기판 사이의 간극 8: 회로 기판
9:초음파 진동기 10:입구 노즐 11:슬라이딩 접점
12:처리용액 13:펌프 14:탱크
15:안내롤러
A:회로 기판 하방의 노즐
A+B:초음파 진동기(9)를 가진 노즐
A+C:서로 수직으로 또는 엇갈리게 배치된 두 노즐
A+B+C:초음파 진동기(9)와 서로 대향 배치된 두 노즐
A+D:전해노즐(D)(양극+음극)
A+C+D:서로 대향된 전해노즐(D)(양극+음극)

Claims (8)

  1. 수평으로 안내되는 회로기판에 천공된 구멍을 청소, 활성화 또는 금속 피복하는 방법에 있어서, 회로기판이 일정한 속도로 운반 방향에 수직인 콘베이어 통로 하방에 위치된 노즐로 형성되어 있는 파형성부위를 횡단하여 이동하고, 이 노즐로부터 처리 용액이 일정한 파형으로 회로 기판 하부로 흐르는 것을 특징으로 하는 수평 안내 회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법.
  2. 제1항에 있어서, 회로기판이 노즐 위쪽 1mm 거리에 배치되는 것을 특징으로 하는 방법.
  3. 제1항 또는 제2항중 어느 하나에 의한 방법을 실시하기 위한 장치에 있어서, 노즐이 입구 노즐을 가진 예비실에 의해 형성된 노즐 하우징의 상부에 배치되어 있고, 그 예비실은 천공된 마스크에 의하여 노즐 내부 공간의 상부와 분리되어 있는 것을 특징으로 하는 장치.
  4. 제3항에 있어서, 노즐이 홈구멍이 천공되거나, 구멍이 대칭 또는 비대칭으로 천공 또는 제공되어 있는 천공 평면의 형태로 되어 있는 것을 특징으로 하는 장치.
  5. 제3항에 있어서, 노즐 하우징의 상부가 노즐에 대하여 경사진 평면을 갖고 있는 것을 특징으로 하는 장치.
  6. 제3항에 있어서, 노즐 하우징의 내부, 특히 그 상부에 초음파 진동기가 배치되어 있을 것을 특징으로 하는 장치.
  7. 제3항에 있어서, 회전기판의 상, 하부측에 엇갈리게 배치된 2개의 노즐이 제공되어 있는 것을 특징으로 하는 장치.
  8. 제3항에 있어서, 노즐 하우징내에, 특히 그 하부에 양극이 고정되어 있는 것을 특징으로 하는 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019860006487A 1985-08-06 1986-08-06 수평 안내 회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치 KR930010062B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DEP3528575.3 1985-08-06
DE19853528575 DE3528575A1 (de) 1985-08-06 1985-08-06 Verfahren und einrichtung zur reinigung, aktivierung und/oder metallisierung von bohrloechern in horizontal gefuehrten leiterplatten
DE3528575.3 1985-08-06

Publications (2)

Publication Number Publication Date
KR870002752A true KR870002752A (ko) 1987-04-06
KR930010062B1 KR930010062B1 (ko) 1993-10-14

Family

ID=6278093

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019860006487A KR930010062B1 (ko) 1985-08-06 1986-08-06 수평 안내 회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치

Country Status (11)

Country Link
US (1) US4789405A (ko)
EP (1) EP0212253B2 (ko)
JP (1) JPS6297396A (ko)
KR (1) KR930010062B1 (ko)
CN (1) CN1016483B (ko)
AT (1) AT397011B (ko)
BG (1) BG49390A3 (ko)
CA (1) CA1276528C (ko)
CZ (1) CZ278956B6 (ko)
DE (2) DE3528575A1 (ko)
SK (1) SK278074B6 (ko)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3638630A1 (de) * 1986-11-11 1988-05-26 Schering Ag Verfahren zur entfernung von harzverschmutzungen in bohrloechern von leiterplatten
DE8703114U1 (de) * 1987-02-25 1987-04-09 Schering AG, 1000 Berlin und 4709 Bergkamen Einrichtung zur Reinigung oder chemischen Behandlung von Werkstücken
DE3879929D1 (de) * 1988-02-25 1993-05-06 Schmid Gmbh & Co Geb Vorrichtung zur behandlung von elektrischen leiterplatten.
DE3821980A1 (de) * 1988-06-29 1990-01-11 Schering Ag Vorrichtung und verfahren zur reinigung und behandlung von horizontal bewegten leiterplatten
DE3916694A1 (de) * 1989-05-23 1990-11-29 Schering Ag Anordnung zur chemischen behandlung und/oder reinigung von gut, insbesondere von mit bohrungen versehenen leiterplatten, sowie dazugehoeriges verfahren
DE3916693A1 (de) * 1989-05-23 1990-11-29 Schering Ag Anordnung zur behandlung und/oder reinigung von gut, insbesondere von mit bohrungen versehenen leiterplatten
DE3932779A1 (de) * 1989-09-30 1991-04-11 Schering Ag Verfahren zum behandeln von gegenstaenden mit einer fluessigkeit, sowie vorrichtung zur durchfuehrung des verfahrens
DE3935831A1 (de) * 1989-10-27 1991-05-02 Hoellmueller Maschbau H Anlage zur herstellung von durchkontaktierten leiterplatten und multilayern
DE4040119A1 (de) * 1990-12-13 1992-06-17 Schering Ag Verfahren zum durchfluten von bohrungen in plattenfoermigen werkstuecken, insbesondere leiterplatten, und vorrichtung hierfuer
IT1252381B (it) * 1991-11-12 1995-06-12 Occleppo Di Francesco Occleppo Dispositivo per la formazione d'una pellicola sulle pareti dei forellini nelle piastre per circuiti stampati
US5289639A (en) * 1992-07-10 1994-03-01 International Business Machines Corp. Fluid treatment apparatus and method
IT1256443B (it) * 1992-11-23 1995-12-05 Impianto galvanico a celle elettrolitiche contrapposte con alimentazione in continuo delle superfici da trattare
US5378307A (en) * 1993-04-28 1995-01-03 International Business Machines Corporation Fluid treatment apparatus
DE4402596C2 (de) * 1994-01-28 1997-03-27 Atotech Deutschland Gmbh Elektrolytisches Verfahren in horizontalen Durchlaufanlagen und Vorrichtung zur Durchführung desselben
EP0801883B1 (de) * 1995-01-05 1999-03-03 Hübel, Egon Verfahren und vorrichtung zur behandlung von mit feinsten löchern versehenen plattenförmigen werkstücken
US5720813A (en) 1995-06-07 1998-02-24 Eamon P. McDonald Thin sheet handling system
DE19524523A1 (de) * 1995-07-05 1997-01-09 Atotech Deutschland Gmbh Anwendung eines Verfahrens und einer Vorrichtung zum Behandeln von Fluiden in der Leiterplattentechnik
US5741361A (en) * 1995-07-06 1998-04-21 Allan H. McKinnon Method for fluid transport
US5904773A (en) 1995-08-11 1999-05-18 Atotech Usa, Inc. Fluid delivery apparatus
US5614264A (en) * 1995-08-11 1997-03-25 Atotech Usa, Inc. Fluid delivery apparatus and method
DE19530989C1 (de) * 1995-08-23 1997-03-13 Atotech Deutschland Gmbh Verfahren zum Filmstrippen
DE19534521C1 (de) 1995-09-06 1996-11-21 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum Behandeln von sich in Werkstücke erstreckende Löcher oder Vertiefungen mit flüssigen Behandlungsmitteln und Anwendung des Verfahrens zur Behandlung von Leiterplatten
JP3005898B2 (ja) * 1998-04-30 2000-02-07 東京化工機株式会社 液体噴射装置
US6336976B1 (en) * 1999-01-04 2002-01-08 Kabushiki Kaisha Sankyo Seiki Seisakusho Hole processing apparatus and method thereof and dynamic pressure bearings cleaning method
JP3120073B2 (ja) * 1999-02-22 2000-12-25 東京化工機株式会社 薬液処理装置
DE10015349A1 (de) 2000-03-23 2001-10-25 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum Behandeln von durchgehende Löcher und/oder Vertiefungen aufweisenden Schaltungsträgern sowie Anwendung des Verfahrens und Verwendung der Vorrichtung
DE10110823A1 (de) * 2001-03-07 2002-10-02 Bosch Gmbh Robert Verfahren zum Abtragen von Materialablagerungen, die bei einer Laserbearbeitung entstehen
DE10255884B4 (de) 2002-11-29 2006-05-11 Atotech Deutschland Gmbh Düsenanordnung
DE10323658A1 (de) * 2003-05-15 2004-12-02 Gebr. Schmid Gmbh & Co. Verfahren und Vorrichtung zur Beschichtung eines Substrats
DE102004002421A1 (de) * 2004-01-16 2005-08-18 Atotech Deutschland Gmbh Düsenanordnung
GB2459055B (en) * 2007-01-11 2012-05-23 Peter Philip Andrew Lymn Liquid treatment apparatus
CN102950127A (zh) * 2012-11-12 2013-03-06 大连太平洋电子有限公司 一种线路板钻孔刀具的清洗方法
JP6160147B2 (ja) * 2013-03-19 2017-07-12 Tdk株式会社 電子部品モジュールの製造方法、無電解メッキ方法及び無電解メッキ装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3868272A (en) * 1973-03-05 1975-02-25 Electrovert Mfg Co Ltd Cleaning of printed circuit boards by solid and coherent jets of cleaning liquid
FR2301307A1 (fr) * 1975-02-24 1976-09-17 Applic Meca Pour Ind Labo Installation pour le traitement de produits par passage dans un liquide
DE2606984C3 (de) * 1976-02-20 1978-08-24 Siemens Ag Verfahren und Einrichtung zum chemischen Reinigen von Kontaktierungslöchern in Leiterplatten
US4131483A (en) * 1976-05-28 1978-12-26 Sumitomo Chemical Company, Limited Methods for cleaning articles with upward flowing liquids
US4076222A (en) * 1976-07-19 1978-02-28 Schaming Edward J Runout cooling method and apparatus for metal rolling mills
US4132567A (en) * 1977-10-13 1979-01-02 Fsi Corporation Apparatus for and method of cleaning and removing static charges from substrates
JPS5621147A (en) * 1979-07-27 1981-02-27 Xerox Corp Sheet collector and sorter
DE3006045A1 (de) * 1980-02-18 1981-08-20 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zur behandlung, insbesondere reinigung, von flachen objekten
DE3011061C2 (de) * 1980-03-21 1983-12-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Intensivierung von Spül- und Reinigungsprozessen für Perforationen in Formstücken in Spül- und Reinigungsautomaten
JPS5858292A (ja) * 1981-09-30 1983-04-06 Electroplating Eng Of Japan Co 微小孔を有するメツキ物のメツキ装置
DE3305564C1 (de) * 1983-02-15 1984-03-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Aufbau von metallisierten Leiterbahnen und Durchkontaktierungen an gelochten Leiterplatten
SE440719B (sv) * 1983-06-17 1985-08-12 Holmstrands Plaatindustri Ab Sett och anordning vid rengoring av kretskort, som tidigare underkastats en lodningsoperation med flussmedel
US4543130A (en) * 1984-08-28 1985-09-24 Rca Corporation Megasonic cleaning apparatus and method

Also Published As

Publication number Publication date
CN86105385A (zh) 1987-04-01
ATA209586A (de) 1993-05-15
BG49390A3 (en) 1991-10-15
AT397011B (de) 1994-01-25
CZ278956B6 (en) 1994-10-19
CN1016483B (zh) 1992-04-29
CA1276528C (en) 1990-11-20
EP0212253B1 (de) 1990-02-28
EP0212253A3 (en) 1987-08-12
SK278074B6 (en) 1995-12-06
US4789405A (en) 1988-12-06
KR930010062B1 (ko) 1993-10-14
JPS6297396A (ja) 1987-05-06
EP0212253B2 (de) 1998-11-11
DE3528575A1 (de) 1987-02-19
JPH0445996B2 (ko) 1992-07-28
DE3669256D1 (de) 1990-04-05
EP0212253A2 (de) 1987-03-04

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