KR20130067148A - Light emitting device, light emitting device package, and light unit - Google Patents

Abstract

PURPOSE: A light emitting device, a light emitting device package, and a light unit are provided to improve reliability by including electrically connected multiple light emitting cells. CONSTITUTION: A first reflective electrode(17) is formed under a first light emitting structure. A second reflective electrode(27) is formed under a second light emitting structure. An insulating metal oxide layer(65) is arranged under the second reflective electrode. The insulating metal oxide layer insulates the first reflective electrode and the second reflective electrode. A contact part is electrically connected to a first semiconductor layer and the second reflective electrode.

Description

Light-Emitting Device, Light-Emitting Package and Light Unit {LIGHT EMITTING DEVICE, LIGHT EMITTING DEVICE PACKAGE, AND LIGHT UNIT}

Embodiments relate to a light emitting device, a light emitting device package, a light unit, and a light emitting device manufacturing method.

Light emitting diodes (LEDs) are widely used as light emitting devices. Light emitting diodes convert electrical signals into light, such as infrared, visible, and ultraviolet, using the properties of compound semiconductors.

As the light efficiency of a light emitting device is increased, a light emitting device is applied to various fields including a display device and a lighting device.

The embodiment provides a light emitting device, a light emitting device package, a light unit, and a light emitting device manufacturing method including a plurality of light emitting cells electrically connected with reliability.

The light emitting device according to the embodiment includes a first semiconductor layer of a first conductivity type, a first active layer under the first semiconductor layer of the first conductivity type, and a second semiconductor layer of a second conductivity type under the first active layer. A first light emitting structure comprising; A first reflective electrode under the first light emitting structure; A second light emitting structure comprising a third semiconductor layer of a first conductivity type, a second active layer under the third conductive layer of the first conductivity type, and a fourth semiconductor layer of a second conductivity type under the second active layer; A second reflecting electrode under the second light emitting structure; An insulating metal oxide layer disposed under the second reflective electrode and insulating the first reflective electrode and the second reflective electrode; A contact unit electrically connected to the first semiconductor layer of the first conductivity type and the second reflective electrode; .

The light emitting device according to the embodiment may include a plurality of light emitting cells including a reflective electrode, a second conductive semiconductor layer on the reflective electrode, an active layer on the second conductive semiconductor layer, and a first conductive semiconductor layer on the active layer; An insulating metal oxide layer disposed under the second light emitting cell adjacent to the first light emitting cell among the plurality of light emitting cells, and electrically insulating the reflective electrode of the first light emitting cell from the reflective electrode of the second light emitting cell; A contact unit electrically connected to the first conductive semiconductor layer of the first light emitting cell and the reflective electrode of the second light emitting cell; .

The light emitting device package according to the embodiment includes a body; A light emitting element disposed on the body; A first lead electrode and a second lead electrode electrically connected to the light emitting device; The light emitting device includes a first semiconductor layer of a first conductivity type, a first active layer under the first conductive layer of the first conductivity type, and a second semiconductor layer of a second conductivity type under the first active layer. A first light emitting structure comprising a; A first reflective electrode under the first light emitting structure; A second light emitting structure comprising a third semiconductor layer of a first conductivity type, a second active layer under the third conductive layer of the first conductivity type, and a fourth semiconductor layer of a second conductivity type under the second active layer; A second reflecting electrode under the second light emitting structure; An insulating metal oxide layer disposed under the second reflective electrode and insulating the first reflective electrode and the second reflective electrode; A contact unit electrically connected to the first semiconductor layer of the first conductivity type and the second reflective electrode; .

The light emitting device package according to the embodiment includes a body; A light emitting element disposed on the body; A first lead electrode and a second lead electrode electrically connected to the light emitting device; The light emitting device includes: a plurality of light emitting cells including a reflective electrode, a second conductive semiconductor layer on the reflective electrode, an active layer on the second conductive semiconductor layer, and a first conductive semiconductor layer on the active layer, respectively. ; An insulating metal oxide layer disposed under the second light emitting cell adjacent to the first light emitting cell among the plurality of light emitting cells, and electrically insulating the reflective electrode of the first light emitting cell from the reflective electrode of the second light emitting cell; A contact unit electrically connected to the first conductive semiconductor layer of the first light emitting cell and the reflective electrode of the second light emitting cell; .

According to an embodiment, a light unit includes a substrate; A light emitting device disposed on the substrate; An optical member through which light provided from the light emitting device passes; The light emitting device includes a first semiconductor layer of a first conductivity type, a first active layer under the first semiconductor layer of the first conductivity type, and a second semiconductor layer of a second conductivity type under the first active layer. A first light emitting structure comprising a; A first reflective electrode under the first light emitting structure; A second light emitting structure comprising a third semiconductor layer of a first conductivity type, a second active layer under the third conductive layer of the first conductivity type, and a fourth semiconductor layer of a second conductivity type under the second active layer; A second reflecting electrode under the second light emitting structure; An insulating metal oxide layer disposed under the second reflective electrode and insulating the first reflective electrode and the second reflective electrode; A contact unit electrically connected to the first semiconductor layer of the first conductivity type and the second reflective electrode; .

According to an embodiment, a light unit includes a substrate; A light emitting device disposed on the substrate; An optical member through which light provided from the light emitting device passes; The light emitting device includes: a plurality of light emitting cells including a reflective electrode, a second conductive semiconductor layer on the reflective electrode, an active layer on the second conductive semiconductor layer, and a first conductive semiconductor layer on the active layer, respectively. ; An insulating metal oxide layer disposed under the second light emitting cell adjacent to the first light emitting cell among the plurality of light emitting cells, and electrically insulating the reflective electrode of the first light emitting cell from the reflective electrode of the second light emitting cell; A contact unit electrically connected to the first conductive semiconductor layer of the first light emitting cell and the reflective electrode of the second light emitting cell; .

The light emitting device, the light emitting device package, the light unit, and the manufacturing method of the light emitting device according to the embodiment may provide a plurality of light emitting cells that are secured and electrically connected.

1 is a view illustrating a light emitting device according to an embodiment.
2 to 7 illustrate a method of manufacturing a light emitting device according to the embodiment.
8 is a view showing a modification of the light emitting device according to the embodiment.
9 is a view illustrating a light emitting device package according to an embodiment.
10 is a view showing a display device according to the embodiment.
11 is a view showing another example of the display device according to the embodiment.
12 is a view showing a lighting device according to an embodiment.

In the description of the embodiments, it is to be understood that each layer (film), region, pattern or structure may be referred to as being "on" or "under" a substrate, each layer It is to be understood that the terms " on "and " under" include both " directly "or" indirectly " do. In addition, the criteria for the top / bottom or bottom / bottom of each layer are described with reference to the drawings.

The thickness and size of each layer in the drawings are exaggerated, omitted, or schematically shown for convenience and clarity of explanation. In addition, the size of each component does not necessarily reflect the actual size.

Hereinafter, a light emitting device, a light emitting device package, a light unit, and a method of manufacturing a light emitting device according to embodiments will be described in detail with reference to the accompanying drawings.

1 is a view illustrating a light emitting device according to an embodiment.

As shown in FIG. 1, the light emitting device according to the embodiment may include a first light emitting structure 10, a second light emitting structure 20, a third light emitting structure 30, a first reflective electrode 17, and a second light emitting device. The reflective electrode 27, the third reflective electrode 37, and the electrode 80 may be included. 1 illustrates a case where three light emitting structures are disposed, the light emitting device according to the embodiment may include two light emitting structures and may also include four or more light emitting structures. The plurality of light emitting structures may be electrically connected to each other. For example, the plurality of light emitting structures may be electrically connected in series. The plurality of light emitting structures may be disposed on the support substrate 70.

The first light emitting structure 10 may include a first semiconductor layer 11 of a first conductivity type, a first active layer 12, and a second semiconductor layer 13 of a second conductivity type. The first active layer 12 may be disposed between the first semiconductor layer 11 of the first conductivity type and the second semiconductor layer 13 of the second conductivity type. The first active layer 12 may be disposed under the first semiconductor layer 11 of the first conductivity type, and the second semiconductor layer 13 of the second conductivity type may be below the first active layer 12. Can be placed in.

For example, the first semiconductor layer 11 of the first conductivity type is formed of an n-type semiconductor layer to which an n-type dopant is added as the first conductivity type dopant, and the second semiconductor layer 13 of the second conductivity type. The second conductive dopant may be formed of a p-type semiconductor layer to which a p-type dopant is added. Further, the first semiconductor layer 11 of the first conductivity type may be formed of a p-type semiconductor layer, and the second semiconductor layer 13 of the second conductivity type may be formed of an n-type semiconductor layer.

The first semiconductor layer 11 of the first conductivity type may include, for example, an n-type semiconductor layer. The first semiconductor layer 11 of the first conductivity type may be implemented as a compound semiconductor. The first semiconductor layer 11 of the first conductivity type may be implemented as a group II-VI compound semiconductor or a group III-V compound semiconductor.

By way of example, the first semiconductor layer (11) of the first conductivity type _{In x Al y Ga 1 -x- y} N (0≤x≤1, 0≤y≤1, 0≤x + y≤1) It can be implemented with a semiconductor material having a compositional formula. The first semiconductor layer 11 of the first conductivity type may be selected from, for example, GaN, AlN, AlGaN, InGaN, InN, InAlGaN, AlInN, AlGaAs, GaP, GaAs, GaAsP, AlGaInP, and the like. N-type dopants such as Sn, Se, Te, and the like may be doped.

The first active layer 12 is electrons (or holes) injected through the first semiconductor layer 11 of the first conductivity type and holes injected through the second semiconductor layer 13 of the second conductivity type ( Or electrons) meet each other and emit light due to a band gap difference of an energy band according to a material of forming the first active layer 12. The first active layer 12 may be formed of any one of a single well structure, a multiple well structure, a quantum dot structure, or a quantum line structure, but is not limited thereto.

The first active layer 12 may be implemented with a compound semiconductor. The first active layer 12 is implemented as an example of a semiconductor material having a compositional formula of _{In x Al y Ga 1 -x- y} N (0≤x≤1, 0≤y≤1, 0≤x + y≤1) Can be. When the first active layer 12 is implemented as the multi-well structure, the first active layer 12 may be implemented by stacking a plurality of well layers and a plurality of barrier layers. For example, an InGaN well layer / It may be implemented in a cycle of the GaN barrier layer.

The second semiconductor layer 13 of the second conductivity type may be implemented with, for example, a p-type semiconductor layer. The second semiconductor layer 13 of the second conductivity type may be implemented as a compound semiconductor. The second semiconductor layer 13 of the second conductivity type may be implemented as a group II-VI compound semiconductor or a group III-V compound semiconductor.

By way of example, the second semiconductor layer 13 of the second conductive type _{In x Al y Ga 1 -x- y} N (0≤x≤1, 0≤y≤1, 0≤x + y≤1) It can be implemented with a semiconductor material having a compositional formula. The second conductive second semiconductor layer 13 may be selected from, for example, GaN, AlN, AlGaN, InGaN, InN, InAlGaN, AlInN, AlGaAs, GaP, GaAs, GaAsP, AlGaInP, and the like. P-type dopants such as, Ca, Sr, and Ba may be doped.

The first semiconductor layer 11 of the first conductivity type may include a p-type semiconductor layer, and the second semiconductor layer 13 of the second conductivity type may include an n-type semiconductor layer. In addition, a semiconductor layer including an n-type or p-type semiconductor layer may be further formed under the second conductive layer 13 of the second conductivity type. Accordingly, the first light emitting structure 10 may have at least one of np, pn, npn, and pnp junction structures. In addition, the doping concentrations of the impurities in the first semiconductor layer 11 of the first conductivity type and the second semiconductor layer 13 of the second conductivity type may be uniformly or nonuniformly formed. That is, the structure of the first light emitting structure 10 may be variously formed, but is not limited thereto.

In addition, a first conductive InGaN / GaN superlattice structure or an InGaN / InGaN superlattice structure may be formed between the first semiconductor layer 11 of the first conductivity type and the first active layer 12. In addition, a second conductive AlGaN layer may be formed between the second semiconductor layer 13 of the second conductivity type and the first active layer 12.

The second light emitting structure 20 may include a third semiconductor layer 21 of a first conductivity type, a second active layer 22, and a fourth semiconductor layer 23 of a second conductivity type. The second active layer 22 may be disposed between the third semiconductor layer 21 of the first conductivity type and the fourth semiconductor layer 23 of the second conductivity type. The second active layer 22 may be disposed below the third semiconductor layer 21 of the first conductivity type, and the fourth semiconductor layer 23 of the second conductivity type may be below the second active layer 22. Can be placed in. The second light emitting structure 20 may be similarly formed in accordance with the first light emitting structure 10 described above.

In addition, the third light emitting structure 30 may include a fifth semiconductor layer 31 of a first conductivity type, a third active layer 32, and a sixth semiconductor layer 33 of a second conductivity type. The third active layer 32 may be disposed between the fifth semiconductor layer 31 of the first conductivity type and the sixth semiconductor layer 33 of the second conductivity type. The third active layer 32 may be disposed under the fifth semiconductor layer 31 of the first conductivity type, and the sixth semiconductor layer 33 of the second conductivity type may be below the third active layer 32. Can be placed in. The third light emitting structure 30 may be similarly formed in accordance with the first light emitting structure 10 described above.

The first ohmic contact layer 15 and the first reflective electrode 17 may be disposed under the first light emitting structure 10. The first channel layer 16 may be disposed under the first light emitting structure 10 and around the first ohmic contact layer 15.

The first channel layer 16 may be formed of, for example, a material having electrical insulation. The first channel layer 16 may be formed of, for example, oxide or nitride. For example, the first channel layer 16 may include at least one of Si0 ₂ , Si _x O _y , Si ₃ N ₄ , Si _x N _y , SiO _x N _y , Al ₂ O ₃ , TiO ₂ , and the like. Can be selected and formed. The first channel layer 16 may also be referred to as an isolation layer.

A first current blocking layer (CBL) 18 may be disposed between the first light emitting structure 10 and the first ohmic contact layer 15. The first current blocking layer 18 may improve the luminous efficiency of the light emitting device according to the embodiment by alleviating the phenomenon that the current is concentrated in a portion of the first active layer 12.

The first current blocking layer 18 may be electrically insulating, or may be formed using a material that forms a Schottky contact with the first light emitting structure 10. The first current blocking layer 18 may be formed of an oxide, nitride, or metal. The first current blocking layer 18 may include, for example, at least one of SiO ₂ , SiO _x , SiO _x N _y , Si ₃ N ₄ , Al ₂ O _{3 ,} TiO _x , Ti, Al, Cr. Can be.

The first ohmic contact layer 15 may be formed of, for example, a transparent conductive oxide layer. The first ohmic contact layer 15 may be formed of, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum gallium zinc oxide (AGZO), indium zinc tin oxide (IZTO) or IAZO. (Indium Aluminum Zinc Oxide), IGZO (Indium Gallium Zinc Oxide), IGTO (Indium Gallium Tin Oxide), ATO (Antimony Tin Oxide), GZO (Gallium Zinc Oxide), IZON (IZO Nitride), ZnO, IrOx, RuOx, NiO It may be formed of at least one material selected from Pt, Ag.

The first reflective electrode 17 may be formed of a metal material having a high reflectance. For example, the first reflective electrode 17 may be formed of a metal or an alloy including at least one of Ag, Ni, Al, Rh, Pd, Ir, Ru, Mg, Zn, Pt, Cu, Au, and Hf. In addition, the first reflecting electrode 17 may be formed of the metal or the alloy, Indium-Tin-Oxide (ITO), Indium-Zinc-Oxide (IZO), Indium-Zinc-Tin-Oxide (IZTO), and Indium-Aluminum (AZO). Transmissive conductive materials such as -Zinc-Oxide), Indium-Gallium-Zinc-Oxide (IGZO), Indium-Gallium-Tin-Oxide (IGTO), Aluminum-Zinc-Oxide (AZO), and Antimony-Tin-Oxide (ATO) It can be formed in a multi-layer using. For example, in an embodiment, the first reflective electrode 17 may include at least one of Ag, Al, Ag-Pd-Cu alloy, or Ag-Cu alloy.

The first ohmic contact layer 15 may be formed to be in ohmic contact with the first light emitting structure 10. In addition, the first reflective electrode 17 may function to increase the amount of light extracted to the outside by reflecting light incident from the first light emitting structure 10.

In addition, a second ohmic contact layer 25 and the second reflective electrode 27 may be disposed under the second light emitting structure 20. The second channel layer 26 may be disposed under the second light emitting structure 20 and around the second ohmic contact layer 25.

The second channel layer 26 may be formed of, for example, a material having electrical insulation. The second channel layer 26 may be formed of, for example, oxide or nitride. For example, the second channel layer 26 may include at least one of Si0 ₂ , Si _x O _y , Si ₃ N ₄ , Si _x N _y , SiO _x N _y , Al ₂ O ₃ , TiO ₂ , and the like. Can be selected and formed. The second channel layer 26 may be referred to as an isolation layer.

A second current blocking layer 28 may be disposed between the second light emitting structure 20 and the second ohmic contact layer 25. The second current blocking layer 28 may improve the luminous efficiency of the light emitting device according to the embodiment by alleviating a phenomenon in which current is concentrated in a portion of the second active layer 22.

The second current blocking layer 28 may have electrical insulation or may be formed using a material for forming a schottky contact with the second light emitting structure 20. The second current blocking layer 28 may be formed of an oxide, nitride, or metal. The second current blocking layer 28 may include, for example, at least one of SiO ₂ , SiO _x , SiO _x N _y , Si ₃ N ₄ , Al ₂ O _{3 ,} TiO _x , Ti, Al, Cr. Can be.

The second ohmic contact layer 25 may be formed of, for example, a transparent conductive oxide layer. The second ohmic contact layer 25 may be formed of, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum gallium zinc oxide (AGZO), indium zinc tin oxide (IZTO), or IAZO. (Indium Aluminum Zinc Oxide), IGZO (Indium Gallium Zinc Oxide), IGTO (Indium Gallium Tin Oxide), ATO (Antimony Tin Oxide), GZO (Gallium Zinc Oxide), IZON (IZO Nitride), ZnO, IrOx, RuOx, NiO It may be formed of at least one material selected from Pt, Ag.

The second reflecting electrode 27 may be formed of a metal material having a high reflectance. For example, the second reflective electrode 27 may be formed of a metal or an alloy including at least one of Ag, Ni, Al, Rh, Pd, Ir, Ru, Mg, Zn, Pt, Cu, Au, and Hf. In addition, the third reflecting electrode 37 may be formed of the metal or the alloy, Indium-Tin-Oxide (ITO), Indium-Zinc-Oxide (IZO), Indium-Zinc-Tin-Oxide (IZTO), and Indium-Aluminum (AZO). Transmissive conductive materials such as -Zinc-Oxide), Indium-Gallium-Zinc-Oxide (IGZO), Indium-Gallium-Tin-Oxide (IGTO), Aluminum-Zinc-Oxide (AZO), and Antimony-Tin-Oxide (ATO) It can be formed in a multi-layer using. For example, in the exemplary embodiment, the second reflective electrode 27 may include at least one of Ag, Al, Ag-Pd-Cu alloy, or Ag-Cu alloy.

The second ohmic contact layer 25 may be formed in ohmic contact with the second light emitting structure 20. In addition, the second reflective electrode 27 may perform a function of increasing the amount of light extracted to the outside by reflecting light incident from the second light emitting structure 20.

In addition, a third ohmic contact layer 35 and the third reflective electrode 37 may be disposed under the third light emitting structure 30. A third channel layer 36 may be disposed under the third light emitting structure 30 and around the third ohmic contact layer 35.

The third channel layer 36 may be formed of, for example, a material having electrical insulation. The third channel layer 36 may be formed of, for example, oxide or nitride. For example, the third channel layer 36 may include at least one of Si0 ₂ , Si _x O _y , Si ₃ N ₄ , Si _x N _y , SiO _x N _y , Al ₂ O ₃ , TiO ₂ , and the like. Can be selected and formed. The third channel layer 36 may be referred to as an isolation layer.

A third current blocking layer 38 may be disposed between the third light emitting structure 30 and the third ohmic contact layer 35. The third current blocking layer 38 may improve the luminous efficiency of the light emitting device according to the embodiment by alleviating a phenomenon in which current is concentrated in a portion of the third active layer 32.

The third current blocking layer 38 may be electrically insulating, or may be formed using a material that forms a Schottky contact with the third light emitting structure 30. The third current blocking layer 38 may be formed of oxide, nitride, or metal. The third current blocking layer 38 may include, for example, at least one of SiO ₂ , SiO _x , SiO _x N _y , Si ₃ N ₄ , Al ₂ O _{3 ,} TiO _x , Ti, Al, Cr. Can be.

The third ohmic contact layer 35 may be formed of, for example, a transparent conductive oxide layer. For example, the third ohmic contact layer 35 may be formed of indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum gallium zinc oxide (AGZO), indium zinc tin oxide (IZTO) or IAZO. (Indium Aluminum Zinc Oxide), IGZO (Indium Gallium Zinc Oxide), IGTO (Indium Gallium Tin Oxide), ATO (Antimony Tin Oxide), GZO (Gallium Zinc Oxide), IZON (IZO Nitride), ZnO, IrOx, RuOx, NiO It may be formed of at least one material selected from Pt, Ag.

The third reflective electrode 37 may be formed of a metal material having a high reflectance. For example, the third reflective electrode 37 may be formed of a metal or an alloy including at least one of Ag, Ni, Al, Rh, Pd, Ir, Ru, Mg, Zn, Pt, Cu, Au, and Hf. In addition, the third reflecting electrode 37 may be formed of the metal or the alloy, Indium-Tin-Oxide (ITO), Indium-Zinc-Oxide (IZO), Indium-Zinc-Tin-Oxide (IZTO), and Indium-Aluminum (AZO). Transmissive conductive materials such as -Zinc-Oxide), Indium-Gallium-Zinc-Oxide (IGZO), Indium-Gallium-Tin-Oxide (IGTO), Aluminum-Zinc-Oxide (AZO), and Antimony-Tin-Oxide (ATO) It can be formed in a multi-layer using. For example, in an embodiment, the third reflective electrode 37 may include at least one of Ag, Al, Ag-Pd-Cu alloy, or Ag-Cu alloy.

The third ohmic contact layer 35 may be formed to be in ohmic contact with the third light emitting structure 30. In addition, the third reflective electrode 37 may perform a function of increasing the amount of light extracted to the outside by reflecting light incident from the third light emitting structure 30.

The first insulating layer 41 may be disposed on the side surface of the first light emitting structure 10. The first insulating layer 41 may be disposed on the first light emitting structure 10. The first insulating layer 41 may be formed of oxide or nitride. The first insulating layer 41 is, for example, SiO ₂ , SiO _x , SiO _x N _y , Si ₃ N ₄ , Al ₂ O ₃ It may be formed of a material having a light transmitting and insulating properties.

The second insulating layer 51 may be disposed on the side of the second light emitting structure 20. The second insulating layer 51 may be disposed on the second light emitting structure 20. The second insulating layer 51 may be formed of oxide or nitride. The second insulating layer 51 is, for example, SiO ₂ , SiO _x , SiO _x N _y , Si ₃ N ₄ , Al ₂ O ₃ It may be formed of a material having a light transmitting and insulating properties.

The third insulating layer 61 may be disposed on the side surface of the third light emitting structure 30. The third insulating layer 61 may be disposed on the third light emitting structure 30. The third insulating layer 61 may be formed of oxide or nitride. The third insulating layer 61 is, for example, SiO ₂ , SiO _x , SiO _x N _y , Si ₃ N ₄ , Al ₂ O ₃ It may be formed of a material having a light transmitting and insulating properties.

The first metal layer 19 may be disposed under the first light emitting structure 10 and around the first reflective electrode 17. The first metal layer 19 may be disposed around the first ohmic contact layer 15 and below the first reflective electrode 17. The first metal layer 19 may include at least one of Cu, Ni, Ti, Cr, W, Pt, V, Fe, and Mo materials.

The second metal layer 29 may be disposed under the second light emitting structure 20 and around the second reflective electrode 27. The second metal layer 29 may be disposed around the second ohmic contact layer 25 and below the second reflective electrode 27. The second metal layer 29 may include at least one of Cu, Ni, Ti, Cr, W, Pt, V, Fe, and Mo materials.

A third metal layer 39 may be disposed under the third light emitting structure 30 and around the third reflective electrode 37. The third metal layer 39 may be disposed around the third ohmic contact layer 35 and below the third reflective electrode 37. The third metal layer 39 may include at least one of Cu, Ni, Ti, Cr, W, Pt, V, Fe, and Mo materials.

The first contact portion 43 may be disposed between the first light emitting structure 10 and the second light emitting structure 20. The first contact portion 43 may electrically connect the first semiconductor layer 11 of the first conductivity type to the second reflective electrode 27. The first contact portion 43 may contact an upper portion of the first semiconductor layer 11 of the first conductivity type.

The first contact portion 43 may be in contact with the second metal layer 29. The first contact portion 43 may be electrically connected to the fourth semiconductor layer 23 of the second conductivity type. The first semiconductor layer 11 of the first conductivity type may be electrically connected to the fourth semiconductor layer 23 of the second conductivity type through the first contact portion 43.

The first contact portion 43 may be electrically connected to the fourth semiconductor layer 23 of the second conductivity type. The first semiconductor layer 11 of the first conductivity type may include the first contact portion 43, the second metal layer 29, the second reflective electrode 27, and the second ohmic contact layer 25. It may be electrically connected to the fourth semiconductor layer 23 of the second conductivity type through.

The first contact portion 43 may be formed of at least one material selected from, for example, Cr, Al, Ti, Ni, Pt, and V. In addition, the first contact portion 43 may be formed of, for example, a transparent conductive oxide layer. The first contact portion 43 may include, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum gallium zinc oxide (AGZO), indium zinc tin oxide (IZTO), and IAZO ( Among Indium Aluminum Zinc Oxide (IGZO), Indium Gallium Zinc Oxide (IGZO), Indium Gallium Tin Oxide (IGTO), Antimony Tin Oxide (ATO), Gallium Zinc Oxide (GZO), IZON (IZO Nitride), ZnO, IrOx, RuOx, NiO It may be formed of at least one material selected.

The first contact portion 43 may contact an upper portion of the first semiconductor layer 11 of the first conductivity type. For example, the first semiconductor layer 11 of the first conductivity type may be implemented including a GaN layer. In this case, considering the growth direction and the etching direction of the semiconductor layer, the first contact portion 43 may be in contact with the N face (N face) of the first semiconductor layer 11 of the first conductivity type.

The first insulating layer 41 may be disposed between the first contact portion 43 and the second semiconductor layer 13 of the second conductivity type. The first insulating layer 41 may be disposed between the first contact portion 43 and the first active layer 12. Some regions of the first contact portion 43 may be disposed on the first insulating layer 41. The first contact portion 43 may be in contact with the top and side surfaces of the first insulating layer 41.

A second contact portion 53 may be disposed between the second light emitting structure 20 and the third light emitting structure 30. The second contact portion 53 may electrically connect the third semiconductor layer 21 of the first conductivity type to the third reflective electrode 37. The second contact portion 53 may contact the upper portion of the third semiconductor layer 21 of the first conductivity type.

The second contact portion 53 may be in contact with the third metal layer 39. The second contact portion 53 may be electrically connected to the sixth semiconductor layer 33 of the second conductivity type. The third semiconductor layer 21 of the first conductivity type may be electrically connected to the sixth semiconductor layer 33 of the second conductivity type through the second contact portion 53.

The second contact portion 53 may be electrically connected to the sixth semiconductor layer 33 of the second conductivity type. The third semiconductor layer 21 of the first conductivity type may include the second contact portion 53, the third metal layer 39, the third reflective electrode 37, and the third ohmic contact layer 35. It may be electrically connected to the sixth semiconductor layer 33 of the second conductivity type through.

The second contact portion 53 may be formed of at least one material selected from, for example, Cr, Al, Ti, Ni, Pt, and V. In addition, the second contact portion 53 may be formed of, for example, a transparent conductive oxide layer. The second contact portion 53 may be formed of, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum gallium zinc oxide (AGZO), indium zinc tin oxide (IZTO) or IAZO Among Indium Aluminum Zinc Oxide (IGZO), Indium Gallium Zinc Oxide (IGZO), Indium Gallium Tin Oxide (IGTO), Antimony Tin Oxide (ATO), Gallium Zinc Oxide (GZO), IZON (IZO Nitride), ZnO, IrOx, RuOx, NiO It may be formed of at least one material selected.

The second contact portion 53 may contact the upper portion of the third semiconductor layer 21 of the first conductivity type. For example, the third semiconductor layer 21 of the first conductivity type may be implemented including a GaN layer. In this case, considering the growth direction and the etching direction of the semiconductor layer, the second contact portion 53 may contact the N face of the third semiconductor layer 21 of the first conductivity type.

A second insulating layer 51 may be disposed between the second contact portion 53 and the fourth semiconductor layer 23 of the second conductivity type. The second insulating layer 51 may be disposed between the second contact portion 53 and the second active layer 22. Some regions of the second contact portion 53 may be disposed on the second insulating layer 51. The second contact portion 53 may contact the top and side surfaces of the second insulating layer 51.

The fourth metal layer 55 may be disposed below the first metal layer 19. The fourth metal layer 55 may be formed of at least one material, for example, a metal including tungsten (W), titanium (Ti), or silicon (Si). For example, the fourth metal layer 55 may be formed through a sputtering method using a target made of a material selected from tungsten (W), titanium (Ti), and silicon (Si).

An insulating metal oxide layer 65 may be disposed under the second metal layer 29 and the third metal layer 39. The first region of the insulating metal oxide layer 65 may electrically insulate the first metal layer 19 from the second metal layer 29. The first region of the insulating metal oxide layer 65 may contact the second channel layer 26. The second region of the insulating metal oxide layer 65 may electrically insulate the second metal layer 29 and the third metal layer 39 from each other. The second region of the insulating metal oxide layer 65 may contact the third channel layer 36.

The insulating metal oxide layer 65 may be disposed under the second reflective electrode 27 and electrically insulate the first reflective electrode 17 and the second reflective electrode 27 from each other. The insulating metal oxide layer 65 may be disposed under the third reflective electrode 37 to electrically insulate the second reflective electrode 27 and the third reflective electrode 37 from each other.

The insulating metal oxide layer 65 may be formed of a metal layer and then oxidized. For example, the insulating metal oxide layer 65 may be formed of the same material as the fourth metal layer 55, and then implanted with oxygen ions through an implantation process to form the insulating oxide layer. According to the embodiment, after performing the implantation process, a heat treatment process may be further performed. The heat treatment process may be performed in a furnace, or may be performed using laser irradiation.

For example, the insulating metal oxide layer 65 may include at least one of tungsten (W) oxide, titanium (Ti) oxide, and silicon (Si) oxide. For example, the insulating metal oxide layer 65 may have a specific resistance of 1 × 10 ⁻² Ωcm or more.

In example embodiments, the fourth metal layer 55 is disposed under the first light emitting structure 10, and the insulating metal oxide layer is disposed under the second light emitting structure 20 and the third light emitting structure 30. 65 may be disposed. The lower surface of the fourth metal layer 55 and the lower surface of the insulating metal oxide layer 65 may be implemented at the same height. According to the embodiment, as the metal layer is formed under each of the light emitting structures, the bonding force may be improved. In addition, as the insulating metal oxide layer 65 is formed of a metal layer and then oxidized to be converted into an insulating layer, it is possible to solve a problem that may occur in the insulating layer of an oxide or a nitride of an inorganic light emitting device. That is, according to the embodiment, it is possible to prevent a decrease in adhesion strength and a problem of cracking, which may appear as a problem in the conventional insulating layer, and to ensure reliability.

A diffusion barrier layer 50 may be disposed under the fourth metal layer 55 and the insulating metal oxide layer 65. The bonding layer 60 and the support member 70 may be disposed below the diffusion barrier layer 50.

In the diffusion barrier layer 50, a material included in the bonding layer 60 may be formed in the process of providing the bonding layer 60 with the first reflecting electrode 17, the second reflecting electrode 27, and the first reflecting layer 60. A function of preventing diffusion in the direction of the three reflective electrodes 37 may be performed. In the diffusion barrier layer 50, a material such as tin (Sn) included in the bonding layer 60 may be formed of the first reflective electrode 17, the second reflective electrode 27, and the third reflective electrode 37. ), Etc. can be prevented. The diffusion barrier layer 50 may include at least one of Cu, Ni, Ti-W, W, Pt, V, Fe, and Mo materials.

The bonding layer 60 may include at least one of Ti, Au, Sn, Ni, Cr, Ga, In, Bi, Cu, Ag, Nb, Pd, . The support member 70 supports the light emitting device according to the embodiment and may be electrically connected to an external electrode to provide power to the first light emitting structure 10. The bonding layer 60 may be implemented as a seed layer.

The supporting member 70 may be a semiconductor substrate (for example, Si, Ge, GaN, GaAs, or the like) into which Ti, Cr, Ni, Al, Pt, Au, W, Cu, Mo, Cu- ZnO, SiC, SiGe, and the like). In addition, the support member 70 may be implemented with an insulating material. The support member 70 may be made of a material such as Al ₂ O ₃ , SiO ₂ .

Meanwhile, the electrode 80 may be disposed on the fifth semiconductor layer 31 of the first conductivity type. The electrode 80 may be electrically connected to the fifth semiconductor layer 31 of the first conductivity type. The electrode 80 may be in contact with an upper surface of the fifth semiconductor layer 31 of the first conductivity type.

Accordingly, power may be provided to the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30 by the electrode 80 and the first reflective electrode 17. It becomes possible. The first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30 may be electrically connected to each other. For example, the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30 may be electrically connected in series. Accordingly, when power is applied through the electrode 80 and the first reflective electrode 17, the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30 may be removed. Light can be provided.

According to an embodiment, the electrode 80 may be implemented in a multilayer structure. The electrode 80 may be implemented as an ohmic layer, an intermediate layer, and an upper layer. The ohmic layer may include a material selected from the group consisting of Cr, V, W, Ti, and Zn to realize ohmic contact. The intermediate layer may be formed of a material selected from Ni, Cu, Al, and the like. The upper layer may comprise, for example, Au.

A light extraction pattern may be provided on upper surfaces of the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30. Concave-convex patterns may be provided on upper surfaces of the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30. Accordingly, according to the embodiment, the effect of extracting external light can be increased.

The light emitting device according to the embodiment may include a plurality of light emitting cells. Each of the light emitting cells may include a reflective electrode, a second conductive semiconductor layer on the reflective electrode, an active layer on the second conductive semiconductor layer, and a first conductive semiconductor layer on the active layer. In addition, the light emitting device according to the embodiment is disposed below the second light emitting cell adjacent to the first light emitting cell among the plurality of light emitting cells, and electrically insulates the reflective electrode of the first light emitting cell and the reflective electrode of the second light emitting cell. It may comprise an insulating metal oxide layer. In example embodiments, the light emitting device may further include a contact unit electrically connected to the first conductive semiconductor layer of the first light emitting cell and the reflective electrode of the second light emitting cell.

For example, the insulating metal oxide layer may include at least one of tungsten (W) oxide, titanium (Ti) oxide, and silicon (Si) oxide. The light emitting device may further include a first metal layer disposed around and under the reflective electrode of the first light emitting cell, and a second metal layer disposed around and under the reflective electrode of the second light emitting cell. The metal oxide layer may be disposed to electrically insulate the first metal layer and the second metal layer. The contact portion may contact the second metal layer, and the contact portion may contact the first conductivity type semiconductor layer of the first light emitting cell.

The light emitting device according to the embodiment may include an electrode electrically connected to the first conductive semiconductor layer of the second light emitting cell. Accordingly, when power is supplied to the reflective electrode included in the first light emitting cell and the electrode included in the second light emitting cell, the first light emitting cell and the second light emitting cell are electrically connected in series to emit light. It can emit light.

Next, a method of manufacturing the light emitting device according to the embodiment will be described with reference to FIGS. 2 to 7.

According to the method of manufacturing the light emitting device according to the embodiment, as shown in FIG. 2, the first conductive semiconductor layer 11a, the active layer 12a, and the second conductive semiconductor layer 13a are formed on the substrate 5. do. The first conductive semiconductor layer 11a, the active layer 12a, and the second conductive semiconductor layer 13a may be defined as a light emitting structure 10a.

The substrate 5 may be formed of at least one of, for example, a sapphire substrate (Al ₂ O ₃ ), SiC, GaAs, GaN, ZnO, Si, GaP, InP and Ge. A buffer layer may be further formed between the first semiconductor layer 11 of the first conductivity type and the substrate 5.

For example, the first conductivity type semiconductor layer 11a is formed of an n type semiconductor layer to which an n type dopant is added as a first conductivity type dopant, and the second conductivity type semiconductor layer 13a is a second conductivity type dopant. As a p-type dopant may be formed as a p-type semiconductor layer. In addition, the first conductivity type semiconductor layer 11a may be formed of a p-type semiconductor layer, and the second conductivity type semiconductor layer 13a may be formed of an n-type semiconductor layer.

The first conductivity-type semiconductor layer 11a may include, for example, an n-type semiconductor layer. The first conductivity type semiconductor layer 11a may be implemented as a compound semiconductor. By way of example, having a compositional formula of the first conductive semiconductor layer (11a) is _{In x Al y Ga 1 -x- y} N (0≤x≤1, 0≤y≤1, 0≤x + y≤1) It may be formed of a semiconductor material. The first conductive semiconductor layer 11a may be selected from, for example, InAlGaN, GaN, AlGaN, AlInN, InGaN, AlN, InN, and the like, and doped with n-type dopants such as Si, Ge, Sn, Se, Te, or the like. Can be.

In the active layer 12a, electrons (or holes) injected through the first conductive semiconductor layer 11a and holes (or electrons) injected through the second conductive semiconductor layer 13a meet each other. It is a layer that emits light due to a band gap difference of an energy band according to a material forming the active layer 12a. The active layer 12a may be formed of any one of a single well structure, a multiple well structure, a quantum dot structure, or a quantum line structure, but is not limited thereto.

It said active layer (12a) may be formed of a semiconductor material having a compositional formula of _{In x Al y Ga 1 -x- y} N (0≤x≤1, 0≤y≤1, 0≤x + y≤1). When the active layer 12a is formed in the multi-well structure, the active layer 12a may be formed by stacking a plurality of well layers and a plurality of barrier layers. For example, at an interval of an InGaN well layer / GaN barrier layer, Can be formed.

The second conductivity-type semiconductor layer 13a may be implemented as, for example, a p-type semiconductor layer. The second conductive type semiconductor layer (13a) is of a semiconductor material having a compositional formula of _{In x Al y Ga 1 -x- y} N (0≤x≤1, 0≤y≤1, 0≤x + y≤1) Can be formed. The second conductive semiconductor layer 13a may be selected from, for example, InAlGaN, GaN, AlGaN, InGaN, AlInN, AlN, InN, and the like, and dopants such as Mg, Zn, Ca, Sr, and Ba may be doped. Can be.

Meanwhile, the first conductivity type semiconductor layer 11a may include a p-type semiconductor layer, and the second conductivity type semiconductor layer 13a may include an n-type semiconductor layer. In addition, a semiconductor layer including an n-type or p-type semiconductor layer may be further formed on the second conductive type semiconductor layer 13a. Thus, the light emitting structure 10a may include a np, pn, npn, Or a structure thereof. In addition, the doping concentrations of the impurities in the first conductive semiconductor layer 11a and the second conductive semiconductor layer 13a may be uniformly or non-uniformly formed. That is, the structure of the light emitting structure 10a may be variously formed, but is not limited thereto.

In addition, a first conductivity type InGaN / GaN superlattice structure or an InGaN / InGaN superlattice structure may be formed between the first conductivity type semiconductor layer 11a and the active layer 12a. In addition, a second conductive AlGaN layer may be formed between the second conductive semiconductor layer 13a and the active layer 12a.

Next, as shown in FIG. 3, the current blocking layers 18, 28, 38 and the channel layers 16, 26, 36 are formed on the second conductive semiconductor layer 13a. For example, the current blocking layers 18, 28, and 38 and the channel layers 16, 26, and 36 may be formed of a material having electrical insulation. The current blocking layers 18, 28, 38 and the channel layers 16, 26, 36 may be formed of, for example, oxides or nitrides. For example, the current blocking layers 18, 28, 38 and the channel layers 16, 26, 36 may include Si0 ₂ , Si _x O _y , Si ₃ N ₄ , Si _x N _y , SiO _x N _y , At least one selected from the group consisting of Al ₂ O ₃ , TiO ₂ , and the like may be formed. The current blocking layers 18, 28, 38 and the channel layers 16, 26, 36 may be formed of the same material or may be formed of different materials.

Subsequently, as shown in FIG. 4, the first ohmic contact layer 15 and the first reflective electrode 17 are formed on the first region of the second conductive semiconductor layer 13a. In addition, a second ohmic contact layer 25 and a second reflective electrode 27 are formed on the second region of the second conductive semiconductor layer 13a, and the third region of the second conductive semiconductor layer 13a is formed. The third ohmic contact layer 35 and the third reflective electrode 37 may be formed thereon.

The first ohmic contact layer 15, the second ohmic contact layer 25, and the third ohmic contact layer 35 may be formed of, for example, a transparent conductive oxide layer. The first ohmic contact layer 15, the second ohmic contact layer 25, and the third ohmic contact layer 35 are, for example, indium tin oxide (ITO), indium zinc oxide (IZO), and aluminum zinc (AZO). Oxide), Aluminum Gallium Zinc Oxide (AGZO), Indium Zinc Tin Oxide (IZTO), Indium Aluminum Zinc Oxide (IAZO), Indium Gallium Zinc Oxide (IGZO), Indium Gallium Tin Oxide (IGTO), Antimony Tin Oxide (ATO), It may be formed of at least one material selected from gallium zinc oxide (GZO), IZO (IZO Nitride), ZnO, IrOx, RuOx, NiO, Pt, Ag.

The first reflective electrode 17, the second reflective electrode 27, and the third reflective electrode 37 may be formed of a metal material having high reflectance. For example, the first reflection electrode 17, the second reflection electrode 27, and the third reflection electrode 37 may be formed of Ag, Ni, Al, Rh, Pd, Ir, Ru, Mg, Zn, Pt, Cu, It may be formed of a metal or an alloy containing at least one of Au and Hf. In addition, the first reflection electrode 17, the second reflection electrode 27, and the third reflection electrode 37 may be formed of the metal or the alloy, indium tin oxide (ITO), or indium zinc oxide (IZO). ), Indium-Zinc-Tin-Oxide (IZTO), Indium-Aluminum-Zinc-Oxide (IAZO), Indium-Gallium-Zinc-Oxide (IGZO), Indium-Gallium-Tin-Oxide (IGTO), Aluminum- It may be formed in multiple layers using a light transmissive conductive material such as Zinc-Oxide) or ATO (Antimony-Tin-Oxide). For example, the first reflective electrode 17, the second reflective electrode 27, and the third reflective electrode 37 may be formed of Ag, Al, Ag-Pd-Cu alloy, or Ag-Cu. It may include at least one of the alloys.

Next, as shown in FIG. 5, a first metal layer 19 may be formed on the first reflective electrode 17. In addition, a second metal layer 29 may be formed on the second reflective electrode 27, and a third metal layer 39 may be formed on the third reflective electrode 37. The first metal layer 19, the second metal layer 29, and the third metal layer 39 may include at least one of Cu, Ni, Ti, Cr, W, Pt, V, Fe, and Mo materials. .

Subsequently, a fourth metal layer 55 may be formed on the first metal layer 19, and an insulating metal oxide layer 65 may be formed on the second metal layer 29 and the third metal layer 39.

The fourth metal layer 55 may be formed of at least one material, for example, a metal including tungsten (W), titanium (Ti), or silicon (Si). The first region of the insulating metal oxide layer 65 may electrically insulate the first metal layer 19 from the second metal layer 29. The first region of the insulating metal oxide layer 65 may contact the second channel layer 26. The second region of the insulating metal oxide layer 65 may electrically insulate the second metal layer 29 and the third metal layer 39 from each other. The second region of the insulating metal oxide layer 65 may contact the third channel layer 36.

The insulating metal oxide layer 65 may be disposed on the second reflecting electrode 27 and electrically insulate the first reflecting electrode 17 and the second reflecting electrode 27 from each other. The insulating metal oxide layer 65 may be disposed on the third reflective electrode 37 to electrically insulate the second reflective electrode 27 from the third reflective electrode 37.

The insulating metal oxide layer 65 may be formed of a metal layer and then oxidized. For example, the insulating metal oxide layer 65 may be formed of the same material as the fourth metal layer 55, and then implanted with oxygen ions through an implantation process to form the insulating oxide layer. According to the embodiment, after performing the implantation process, a heat treatment process may be further performed. The heat treatment process may be performed in a furnace, or may be performed using laser irradiation.

For example, the insulating metal oxide layer 65 may include at least one of tungsten (W) oxide, titanium (Ti) oxide, and silicon (Si) oxide. For example, the insulating metal oxide layer 65 may have a specific resistance of 1 × 10 ⁻² Ωcm or more.

Meanwhile, the process of forming each layer described above is one example, and the process order may be variously modified.

Next, as shown in FIG. 5, the diffusion barrier layer 50, the bonding layer 60, and the support member 70 may be formed on the fourth metal layer 55 and the insulating metal oxide layer 65. have.

In the diffusion barrier layer 50, a material included in the bonding layer 60 may be formed in the process of providing the bonding layer 60 with the first reflecting electrode 17, the second reflecting electrode 27, and the first reflecting layer 60. A function of preventing diffusion in the direction of the three reflective electrodes 37 may be performed. The diffusion barrier layer 50 may prevent a material such as tin (Sn) included in the bonding layer 60 from affecting the first reflective electrode 17 or the like. The diffusion barrier layer 50 may include at least one of Cu, Ni, Ti-W, W, and Pt materials.

The bonding layer 60 may include a barrier metal or a bonding metal, and may include, for example, at least one of Ti, Au, Sn, Ni, Cr, Ga, In, Bi, Cu, Ag, or Ta. . The support member 70 may support the light emitting device according to the embodiment and may be electrically connected to an external electrode to provide power to the first reflective electrode 17.

The supporting member 70 may be a semiconductor substrate (for example, Si, Ge, GaN, GaAs, or the like) into which Ti, Cr, Ni, Al, Pt, Au, W, Cu, Mo, Cu- ZnO, SiC, SiGe, and the like). In addition, the support member 70 may be implemented with an insulating material. The support member 70 may be made of a material such as Al ₂ O ₃ , SiO ₂ .

Next, the substrate 5 is removed from the first conductivity type semiconductor layer 11a. As one example, the substrate 5 may be removed by a laser lift off (LLO) process. The laser lift-off process LLO is a process of irradiating a lower surface of the substrate 5 to peel the substrate 5 and the first conductive semiconductor layer 11a from each other.

As illustrated in FIG. 7, an isolation etching is performed to separate the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30. The isolation etching can be performed by, for example, dry etching such as ICP (Inductively Coupled Plasma), but is not limited thereto. Partial regions of the first channel layer 16, the second channel layer 26, and the third channel layer 36 may be exposed by the isolation etching.

In addition, a light extraction pattern may be provided on an upper surface of the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30. Concave-convex patterns may be provided on upper surfaces of the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30. Accordingly, according to the embodiment, the effect of extracting external light can be increased. According to the embodiment, the upper surface of the first light emitting structure 10, the second light emitting structure 20, the third light emitting structure 30 may be formed in the N plane, when the Ga surface Compared with the surface roughness, the light extraction efficiency can be further improved.

Next, as shown in FIG. 7, the first insulating layer 41, the second insulating layer 51, and the third insulating layer 61 may be formed. The first insulating layer 41 may be formed around the first light emitting structure 10. The first insulating layer 41 may be formed on the first light emitting structure 10. The second insulating layer 51 may be formed around the second light emitting structure 20. The second insulating layer 51 may be formed on the second light emitting structure 20. The third insulating layer 61 may be formed around the third light emitting structure 30. The third insulating layer 61 may be formed on the third light emitting structure 30.

In addition, the first contact portion 43 and the second contact portion 53 may be formed. The first contact portion 43 may be disposed between the first light emitting structure 10 and the second light emitting structure 20. A second contact portion 53 may be disposed between the second light emitting structure 20 and the third light emitting structure 30.

The first contact portion 43 may electrically connect the first semiconductor layer 11 of the first conductivity type to the second reflective electrode 27. The first contact portion 43 may contact an upper portion of the first semiconductor layer 11 of the first conductivity type.

The first contact portion 43 may be in contact with the second metal layer 29. The first contact portion 43 may be electrically connected to the fourth semiconductor layer 23 of the second conductivity type. The first semiconductor layer 11 of the first conductivity type may be electrically connected to the fourth semiconductor layer 23 of the second conductivity type through the first contact portion 43.

The first contact portion 43 may be electrically connected to the fourth semiconductor layer 23 of the second conductivity type. The first semiconductor layer 11 of the first conductivity type may include the first contact portion 43, the second metal layer 29, the second reflective electrode 27, and the second ohmic contact layer 25. It may be electrically connected to the fourth semiconductor layer 23 of the second conductivity type through.

The first contact portion 43 may be formed of at least one material selected from, for example, Cr, Al, Ti, Ni, Pt, and V. In addition, the first contact portion 43 may be formed of, for example, a transparent conductive oxide layer. The first contact portion 43 may include, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum gallium zinc oxide (AGZO), indium zinc tin oxide (IZTO), and IAZO ( Among Indium Aluminum Zinc Oxide (IGZO), Indium Gallium Zinc Oxide (IGZO), Indium Gallium Tin Oxide (IGTO), Antimony Tin Oxide (ATO), Gallium Zinc Oxide (GZO), IZON (IZO Nitride), ZnO, IrOx, RuOx, NiO It may be formed of at least one material selected.

The first contact portion 43 may contact an upper portion of the first semiconductor layer 11 of the first conductivity type. For example, the first semiconductor layer 11 of the first conductivity type may be implemented including a GaN layer. In this case, considering the growth direction and the etching direction of the semiconductor layer, the first contact portion 43 may be in contact with the N face (N face) of the first semiconductor layer 11 of the first conductivity type.

The first insulating layer 41 may be disposed between the first contact portion 43 and the second semiconductor layer 13 of the second conductivity type. The first insulating layer 41 may be disposed between the first contact portion 43 and the first active layer 12. Some regions of the first contact portion 43 may be disposed on the first insulating layer 41. The first contact portion 43 may be in contact with the top and side surfaces of the first insulating layer 41.

A second contact portion 53 may be disposed between the second light emitting structure 20 and the third light emitting structure 30. The second contact portion 53 may electrically connect the third semiconductor layer 21 of the first conductivity type to the third reflective electrode 37. The second contact portion 53 may contact the upper portion of the third semiconductor layer 21 of the first conductivity type.

The second contact portion 53 may be in contact with the third metal layer 39. The second contact portion 53 may be electrically connected to the sixth semiconductor layer 33 of the second conductivity type. The third semiconductor layer 21 of the first conductivity type may be electrically connected to the sixth semiconductor layer 33 of the second conductivity type through the second contact portion 53.

The second contact portion 53 may be electrically connected to the sixth semiconductor layer 33 of the second conductivity type. The third semiconductor layer 21 of the first conductivity type may include the second contact portion 53, the third metal layer 39, the third reflective electrode 37, and the third ohmic contact layer 35. It may be electrically connected to the sixth semiconductor layer 33 of the second conductivity type through.

The second contact portion 53 may be formed of at least one material selected from, for example, Cr, Al, Ti, Ni, Pt, and V. In addition, the second contact portion 53 may be formed of, for example, a transparent conductive oxide layer. The second contact portion 53 may be formed of, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), aluminum gallium zinc oxide (AGZO), indium zinc tin oxide (IZTO) or IAZO Among Indium Aluminum Zinc Oxide (IGZO), Indium Gallium Zinc Oxide (IGZO), Indium Gallium Tin Oxide (IGTO), Antimony Tin Oxide (ATO), Gallium Zinc Oxide (GZO), IZON (IZO Nitride), ZnO, IrOx, RuOx, NiO It may be formed of at least one material selected.

The second contact portion 53 may contact the upper portion of the third semiconductor layer 21 of the first conductivity type. For example, the third semiconductor layer 21 of the first conductivity type may be implemented including a GaN layer. In this case, considering the growth direction and the etching direction of the semiconductor layer, the second contact portion 53 may contact the N face of the third semiconductor layer 21 of the first conductivity type.

A second insulating layer 51 may be disposed between the second contact portion 53 and the fourth semiconductor layer 23 of the second conductivity type. The second insulating layer 51 may be disposed between the second contact portion 53 and the second active layer 22. Some regions of the second contact portion 53 may be disposed on the second insulating layer 51. The second contact portion 53 may contact the top and side surfaces of the second insulating layer 51.

Meanwhile, the electrode 80 may be disposed on the fifth semiconductor layer 31 of the first conductivity type. The electrode 80 may be electrically connected to the fifth semiconductor layer 31 of the first conductivity type. The electrode 80 may be in contact with an upper surface of the fifth semiconductor layer 31 of the first conductivity type.

Accordingly, power may be provided to the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30 by the electrode 80 and the first reflective electrode 17. It becomes possible. The first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30 may be electrically connected to each other. Accordingly, when power is applied through the electrode 80 and the first reflective electrode 17, the first light emitting structure 10, the second light emitting structure 20, and the third light emitting structure 30 may be removed. Light can be provided.

According to an embodiment, the electrode 80 may be implemented in a multilayer structure. The electrode 80 may be implemented as an ohmic layer, an intermediate layer, and an upper layer. The ohmic layer may include a material selected from the group consisting of Cr, V, W, Ti, and Zn to realize ohmic contact. The intermediate layer may be formed of a material selected from Ni, Cu, Al, and the like. The upper layer may comprise, for example, Au.

In example embodiments, the fourth metal layer 55 is disposed under the first light emitting structure 10, and the insulating metal oxide layer is disposed under the second light emitting structure 20 and the third light emitting structure 30. 65 may be disposed. The lower surface of the fourth metal layer 55 and the lower surface of the insulating metal oxide layer 65 may be implemented at the same height. According to the embodiment, as the metal layer is formed under each of the light emitting structures, the bonding force may be improved. In addition, as the insulating metal oxide layer 65 is formed of a metal layer and then oxidized to be converted into an insulating layer, it is possible to solve a problem that may occur in the insulating layer of an oxide or a nitride of an inorganic light emitting device. That is, according to the embodiment, it is possible to prevent a decrease in adhesion strength and a problem of cracking, which may appear as a problem in the conventional insulating layer, and to ensure reliability.

8 is a view showing another example of the light emitting device according to the embodiment. In the description of the light emitting device according to the exemplary embodiment illustrated in FIG. 8, the description of parts overlapping with those described with reference to FIG. 1 will be omitted.

According to the light emitting device according to the embodiment, the first ohmic reflective electrode 71 may be disposed under the first light emitting structure 10. The first ohmic reflective electrode 71 may be implemented to perform the functions of both the first reflective electrode 17 and the first ohmic contact layer 15 described with reference to FIG. 1. Accordingly, the first ohmic reflective electrode 71 is in ohmic contact with the second semiconductor layer 13 of the second conductivity type, and may function to reflect light incident from the first light emitting structure 10. have.

In addition, a second ohmic reflective electrode 73 may be disposed under the second light emitting structure 20. The second ohmic reflective electrode 73 may be implemented to perform both the functions of the second reflective electrode 27 and the second ohmic contact layer 25 described with reference to FIG. 1. Accordingly, the second ohmic reflective electrode 73 is in ohmic contact with the fourth semiconductor layer 23 of the second conductivity type, and may perform a function of reflecting light incident from the second light emitting structure 20. have.

In addition, a third ohmic reflective electrode 75 may be disposed under the third light emitting structure 30. The third ohmic reflective electrode 75 may be implemented to perform both the functions of the third reflective electrode 37 and the third ohmic contact layer 35 described with reference to FIG. 1. Accordingly, the third ohmic reflective electrode 75 is in ohmic contact with the sixth semiconductor layer 33 of the second conductivity type, and may perform a function of reflecting light incident from the third light emitting structure 30. have.

9 is a view illustrating a light emitting device package to which the light emitting device according to the embodiment is applied.

9, the light emitting device package according to the embodiment includes a body 120, a first lead electrode 131 and a second lead electrode 132 disposed on the body 120, and the body 120. The light emitting device 100 according to the embodiment, which is provided to and electrically connected to the first lead electrode 131 and the second lead electrode 132, and the molding member 140 surrounding the light emitting device 100. Include.

The body 120 may be formed of a silicon material, a synthetic resin material, or a metal material, and the inclined surface may be formed around the light emitting device 100.

The first lead electrode 131 and the second lead electrode 132 are electrically separated from each other to provide power to the light emitting device 100. The first lead electrode 131 and the second lead electrode 132 may increase the light efficiency by reflecting the light generated from the light emitting device 100 and the heat generated from the light emitting device 100 To the outside.

The light emitting device 100 may be disposed on the body 120 or may be disposed on the first lead electrode 131 or the second lead electrode 132.

The light emitting device 100 may be electrically connected to the first lead electrode 131 and the second lead electrode 132 by a wire, flip chip or die bonding method.

The molding member 140 may surround the light emitting device 100 to protect the light emitting device 100. In addition, the molding member 140 may include a phosphor to change the wavelength of light emitted from the light emitting device 100.

A plurality of light emitting devices or light emitting device packages according to the embodiments may be arrayed on a substrate, and a lens, a light guide plate, a prism sheet, a diffusion sheet, etc., which are optical members, may be disposed on the light path of the light emitting device package. Such a light emitting device package, a substrate, and an optical member can function as a light unit. The light unit may be implemented as a top view or a side view type and may be provided in a display device such as a portable terminal and a notebook computer, or may be variously applied to a lighting device and a pointing device. Still another embodiment may be embodied as a lighting device including the light emitting device or the light emitting device package described in the above embodiments. For example, the lighting device may include a lamp, a streetlight, an electric signboard, and a headlight.

The light emitting device according to the embodiment can be applied to a light unit. The light unit includes a structure in which a plurality of light emitting elements are arrayed, and may include the display apparatus shown in Figs. 10 and 11, and the illumination apparatus shown in Fig.

10, a display device 1000 according to an embodiment includes a light guide plate 1041, a light emitting module 1031 for providing light to the light guide plate 1041, and a reflection member 1022 An optical sheet 1051 on the light guide plate 1041, a display panel 1061 on the optical sheet 1051, a light guide plate 1041, a light emitting module 1031, and a reflection member 1022 But is not limited to, a bottom cover 1011.

The bottom cover 1011, the reflective sheet 1022, the light guide plate 1041, and the optical sheet 1051 can be defined as a light unit 1050.

The light guide plate 1041 serves to diffuse light into a surface light source. The light guide plate 1041 is made of a transparent material, for example, acrylic resin-based such as polymethyl metaacrylate (PMMA), polyethylene terephthlate (PET), polycarbonate (PC), cycloolefin copolymer (COC), and polyethylene naphthalate (PEN). It may include one of the resins.

The light emitting module 1031 provides light to at least one side of the light guide plate 1041, and ultimately acts as a light source of the display device.

At least one light emitting module 1031 may be provided, and light may be provided directly or indirectly from one side of the light guide plate 1041. The light emitting module 1031 may include a substrate 1033 and a light emitting device or a light emitting device package 200 according to the embodiment described above. The light emitting device package 200 may be arrayed on the substrate 1033 at predetermined intervals.

The substrate 1033 may be a printed circuit board (PCB) including a circuit pattern. However, the substrate 1033 may include not only a general PCB but also a metal core PCB (MCPCB, Metal Core PCB), a flexible PCB (FPCB, Flexible PCB) and the like, but is not limited thereto. When the light emitting device package 200 is provided on the side surface of the bottom cover 1011 or on the heat dissipation plate, the substrate 1033 may be removed. Here, a part of the heat radiating plate may be in contact with the upper surface of the bottom cover 1011.

The plurality of light emitting device packages 200 may be mounted such that the light emitting surface of the light emitting device package 200 is spaced apart from the light guiding plate 1041 by a predetermined distance, but the present invention is not limited thereto. The light emitting device package 200 may directly or indirectly provide light to the light-incident portion, which is one side of the light guide plate 1041, but is not limited thereto.

The reflective member 1022 may be disposed under the light guide plate 1041. The reflection member 1022 reflects the light incident on the lower surface of the light guide plate 1041 so as to face upward, thereby improving the brightness of the light unit 1050. The reflective member 1022 may be formed of, for example, PET, PC, or PVC resin, but is not limited thereto. The reflective member 1022 may be an upper surface of the bottom cover 1011, but is not limited thereto.

The bottom cover 1011 may house the light guide plate 1041, the light emitting module 1031, the reflective member 1022, and the like. To this end, the bottom cover 1011 may be provided with a housing portion 1012 having a box-like shape with an opened upper surface, but the present invention is not limited thereto. The bottom cover 1011 may be combined with the top cover, but is not limited thereto.

The bottom cover 1011 may be formed of a metal material or a resin material, and may be manufactured using a process such as press molding or extrusion molding. In addition, the bottom cover 1011 may include a metal or a non-metal material having good thermal conductivity, but the present invention is not limited thereto.

The display panel 1061 is, for example, an LCD panel, including first and second transparent substrates facing each other, and a liquid crystal layer interposed between the first and second substrates. A polarizing plate may be attached to at least one surface of the display panel 1061, but the present invention is not limited thereto. The display panel 1061 displays information by light passing through the optical sheet 1051. Such a display device 1000 can be applied to various types of portable terminals, monitors of notebook computers, monitors of laptop computers, televisions, and the like.

The optical sheet 1051 is disposed between the display panel 1061 and the light guide plate 1041 and includes at least one light-transmitting sheet. The optical sheet 1051 may include at least one of a sheet such as, for example, a diffusion sheet, a horizontal and vertical prism sheet, and a brightness enhancement sheet. The diffusion sheet diffuses the incident light, the horizontal and / or vertical prism sheet focuses the incident light into the display area, and the brightness enhancement sheet reuses the lost light to improve the brightness. A protective sheet may be disposed on the display panel 1061, but the present invention is not limited thereto.

Here, the optical path of the light emitting module 1031 may include the light guide plate 1041 and the optical sheet 1051 as an optical member, but the present invention is not limited thereto.

11 is a view showing another example of the display device according to the embodiment.

11, the display device 1100 includes a bottom cover 1152, a substrate 1020 on which the above-described light emitting device 100 is arranged, an optical member 1154, and a display panel 1155.

The substrate 1020 and the light emitting device package 200 may be defined as a light emitting module 1060. The bottom cover 1152, at least one light emitting module 1060, and the optical member 1154 may be defined as a light unit.

The bottom cover 1152 may include a receiving portion 1153, but the present invention is not limited thereto.

Here, the optical member 1154 may include at least one of a lens, a light guide plate, a diffusion sheet, a horizontal and vertical prism sheet, and a brightness enhancement sheet. The light guide plate may be made of a PC material or a PMMA (poly methy methacrylate) material, and such a light guide plate may be removed. The diffusion sheet diffuses incident light, and the horizontal and vertical prism sheets condense incident light into a display area. The brightness enhancing sheet enhances brightness by reusing the lost light.

The optical member 1154 is disposed on the light emitting module 1060, and performs surface light source, diffusion, and light condensation of the light emitted from the light emitting module 1060.

12 is a perspective view of a lighting apparatus according to an embodiment.

Referring to FIG. 12, the lighting device 1500 includes a case 1510, a light emitting module 1530 installed in the case 1510, and a connection terminal installed in the case 1510 and receiving power from an external power source. 1520).

The case 1510 may be formed of a material having good heat dissipation, and may be formed of, for example, a metal material or a resin material.

The light emitting module 1530 may include a substrate 1532 and a light emitting device or a light emitting device package 200 according to an embodiment provided on the substrate 1532. The plurality of light emitting device packages 200 may be arranged in a matrix form or spaced apart at predetermined intervals.

The substrate 1532 may be a circuit pattern printed on an insulator. For example, a general printed circuit board (PCB), a metal core PCB, a flexible PCB, a ceramic PCB, FR-4 substrates and the like.

In addition, the substrate 1532 may be formed of a material that reflects light efficiently, or a surface may be coated with a color, for example, white or silver, in which the light is efficiently reflected.

At least one light emitting device package 200 may be disposed on the substrate 1532. Each of the light emitting device packages 200 may include at least one light emitting diode (LED) chip. The LED chip may include a colored light emitting diode emitting red, green, blue or white colored light, and a UV emitting diode emitting ultraviolet (UV) light.

The light emitting module 1530 may be arranged to have a combination of various light emitting device packages 200 to obtain color and luminance. For example, a white light emitting diode, a red light emitting diode, and a green light emitting diode may be combined to secure high color rendering (CRI).

The connection terminal 1520 may be electrically connected to the light emitting module 1530 to supply power. The connection terminal 1520 is coupled to an external power source in a socket manner, but is not limited thereto. For example, the connection terminal 1520 may be formed in a pin shape and inserted into an external power source, or may be connected to the external power source by a wire.

According to the embodiment, the light emitting device may be packaged and mounted on the substrate to be implemented as a light emitting module, or may be mounted and packaged as an LED chip to be implemented as a light emitting module.

Features, structures, effects, and the like described in the above embodiments are included in at least one embodiment of the present invention, and are not necessarily limited to only one embodiment. Further, the features, structures, effects, and the like illustrated in the embodiments can be combined and modified by other persons having ordinary skill in the art to which the embodiments belong. Therefore, it should be understood that the present invention is not limited to these combinations and modifications.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of illustration, It can be seen that various modifications and applications are possible. For example, each component specifically shown in the embodiments can be modified and implemented. It is to be understood that all changes and modifications that come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.

10: first light emitting structure 11: first semiconductor layer
12: first active layer 13: second semiconductor layer
15: first ohmic contact layer 16: first channel layer
17: first reflective electrode 19: first metal layer
20: second light emitting structure 21: third semiconductor layer
22: second active layer 23: fourth semiconductor layer
25: second ohmic contact layer 26: second channel layer
27: second reflective electrode 29: second metal layer
30: third light emitting structure 31: fifth semiconductor layer
32: third active layer 33: sixth semiconductor layer
35: third ohmic contact layer 36: third channel layer
37: third reflective electrode 39: third metal layer
41: first insulating layer 43: first contact portion
50: diffusion barrier layer 51: second insulating layer
53: second contact portion 55: fourth metal layer
65: insulating metal oxide layer 60: bonding layer
61: third insulating layer 70: support member
80: electrode

Claims (15)

A first light emitting structure comprising a first semiconductor layer of a first conductivity type, a first active layer under the first conductive layer of the first conductivity type, and a second semiconductor layer of a second conductivity type under the first active layer;
A first reflective electrode under the first light emitting structure;
A second light emitting structure comprising a third semiconductor layer of a first conductivity type, a second active layer under the third conductive layer of the first conductivity type, and a fourth semiconductor layer of a second conductivity type under the second active layer;
A second reflecting electrode under the second light emitting structure;
An insulating metal oxide layer disposed under the second reflective electrode and insulating the first reflective electrode and the second reflective electrode;
A contact unit electrically connected to the first semiconductor layer of the first conductivity type and the second reflective electrode;
Light emitting device comprising a. The method of claim 1,
The insulating metal oxide layer includes at least one of tungsten (W) oxide, titanium (Ti) oxide, and silicon (Si) oxide. The method of claim 1,
And a first metal layer disposed around and under the first reflective electrode, and a second metal layer disposed around and under the second reflective electrode, wherein the insulating metal oxide layer comprises the first metal layer and the second metal layer. Light emitting device to electrically insulate. The method of claim 3,
The contact portion is in contact with the second metal layer. The method of claim 1,
And the contact portion is in contact with the first semiconductor layer of the first conductivity type. The method of claim 1,
A light emitting device comprising irregularities provided on an upper surface of the first semiconductor layer of the first conductivity type. The method of claim 1,
And the contact portion is in contact with the N surface of the first semiconductor layer when the first semiconductor layer of the first conductivity type includes a GaN layer. The method of claim 1,
The light emitting device further comprises an electrode electrically connected to the third semiconductor layer of the first conductivity type. A plurality of light emitting cells each comprising a reflective electrode, a second conductive semiconductor layer on the reflective electrode, an active layer on the second conductive semiconductor layer, and a first conductive semiconductor layer on the active layer;
An insulating metal oxide layer disposed under the second light emitting cell adjacent to the first light emitting cell among the plurality of light emitting cells, and electrically insulating the reflective electrode of the first light emitting cell from the reflective electrode of the second light emitting cell;
A contact unit electrically connected to the first conductive semiconductor layer of the first light emitting cell and the reflective electrode of the second light emitting cell;
Light emitting device comprising a. 10. The method of claim 9,
The insulating metal oxide layer includes at least one of tungsten (W) oxide, titanium (Ti) oxide, and silicon (Si) oxide. 10. The method of claim 9,
A first metal layer disposed around and under the reflective electrode of the first light emitting cell, and a second metal layer disposed around and under the reflective electrode of the second light emitting cell, wherein the insulating metal oxide layer is the first metal layer And a light emitting device electrically insulating the second metal layer. 12. The method of claim 11,
The contact portion is in contact with the second metal layer. 10. The method of claim 9,
And the contact portion is in contact with the first conductive semiconductor layer of the first light emitting cell. Body;
A light emitting element according to any one of claims 1 to 13 arranged on the body;
A first lead electrode and a second lead electrode electrically connected to the light emitting device;
Emitting device package. Board;
A light emitting element according to any one of claims 1 to 13 arranged on the substrate;
An optical member through which light provided from the light emitting device passes;
Light unit comprising a.

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