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KR101899415B1 - 착색 조성물, 경화막, 컬러 필터의 제조 방법, 컬러 필터, 고체 촬상 소자 및 화상 표시 장치 - Google Patents

착색 조성물, 경화막, 컬러 필터의 제조 방법, 컬러 필터, 고체 촬상 소자 및 화상 표시 장치 Download PDF

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Publication number
KR101899415B1
KR101899415B1 KR1020167019963A KR20167019963A KR101899415B1 KR 101899415 B1 KR101899415 B1 KR 101899415B1 KR 1020167019963 A KR1020167019963 A KR 1020167019963A KR 20167019963 A KR20167019963 A KR 20167019963A KR 101899415 B1 KR101899415 B1 KR 101899415B1
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South Korea
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general formula
formula
coloring composition
compound
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KR1020167019963A
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English (en)
Korean (ko)
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KR20160102272A (ko
Inventor
준이치 이토
유우시 카네코
다이스케 사사키
카즈야 오오타
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후지필름 가부시키가이샤
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/10Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/24Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/28Pyronines ; Xanthon, thioxanthon, selenoxanthan, telluroxanthon dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/10Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/103Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing a diaryl- or triarylmethane dye
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
KR1020167019963A 2014-01-31 2015-01-27 착색 조성물, 경화막, 컬러 필터의 제조 방법, 컬러 필터, 고체 촬상 소자 및 화상 표시 장치 KR101899415B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014017700A JP6251067B2 (ja) 2014-01-31 2014-01-31 着色組成物、硬化膜、カラーフィルタの製造方法、カラーフィルタ、固体撮像素子および画像表示装置
JPJP-P-2014-017700 2014-01-31
PCT/JP2015/052169 WO2015115416A1 (ja) 2014-01-31 2015-01-27 着色組成物、硬化膜、カラーフィルタの製造方法、カラーフィルタ、固体撮像素子および画像表示装置

Publications (2)

Publication Number Publication Date
KR20160102272A KR20160102272A (ko) 2016-08-29
KR101899415B1 true KR101899415B1 (ko) 2018-10-31

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KR1020167019963A KR101899415B1 (ko) 2014-01-31 2015-01-27 착색 조성물, 경화막, 컬러 필터의 제조 방법, 컬러 필터, 고체 촬상 소자 및 화상 표시 장치

Country Status (4)

Country Link
JP (1) JP6251067B2 (ja)
KR (1) KR101899415B1 (ja)
TW (1) TWI632202B (ja)
WO (1) WO2015115416A1 (ja)

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JP6159309B2 (ja) * 2014-01-31 2017-07-05 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
TWI564658B (zh) * 2015-03-30 2017-01-01 奇美實業股份有限公司 彩色濾光片用之感光性樹脂組成物及其應用
KR102055478B1 (ko) * 2015-09-21 2019-12-12 주식회사 엘지화학 크산텐계 화합물, 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물
KR102124126B1 (ko) * 2016-09-09 2020-06-17 삼성에스디아이 주식회사 신규 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터
WO2018052022A1 (ja) * 2016-09-16 2018-03-22 三菱ケミカル株式会社 着色樹脂組成物、硬化物及び画像表示装置
JP6950070B2 (ja) * 2016-12-19 2021-10-13 株式会社Dnpファインケミカル カラーフィルタ用着色樹脂組成物、色材分散液、カラーフィルタ、及び表示装置
KR102268233B1 (ko) * 2018-10-23 2021-06-23 주식회사 엘지화학 화합물, 중합체, 색재 조성물, 수지 조성물, 감광재, 컬러필터 및 디스플레이 장치
JP7307653B2 (ja) * 2018-11-26 2023-07-12 保土谷化学工業株式会社 キサンテン系色素、該色素を含有する着色組成物、カラーフィルター用着色剤およびカラーフィルター
JP7544136B2 (ja) 2021-08-06 2024-09-03 東レ株式会社 キサンテン化合物、樹脂組成物、硬化物、硬化物の製造方法、有機el表示装置および表示装置

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JP2013209614A (ja) 2012-02-29 2013-10-10 Toyo Ink Sc Holdings Co Ltd キノフタロン色素単量体、およびそれを用いた着色性ポリマー、およびそれを用いた着色感光性組成物、およびその用途

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JP6159309B2 (ja) * 2014-01-31 2017-07-05 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置

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Publication number Priority date Publication date Assignee Title
WO2013018986A1 (ko) 2011-08-04 2013-02-07 주식회사 엘지화학 염료를 포함하는 고분자 화합물 및 이를 포함하는 경화성 수지 조성물
JP2013209614A (ja) 2012-02-29 2013-10-10 Toyo Ink Sc Holdings Co Ltd キノフタロン色素単量体、およびそれを用いた着色性ポリマー、およびそれを用いた着色感光性組成物、およびその用途
WO2013147422A1 (ko) * 2012-03-30 2013-10-03 (주)경인양행 크산텐계 자색 염료 화합물, 이를 포함하는 컬러필터용 착색 수지 조성물 및 이를 이용한 컬러필터

Also Published As

Publication number Publication date
JP6251067B2 (ja) 2017-12-20
TWI632202B (zh) 2018-08-11
WO2015115416A1 (ja) 2015-08-06
KR20160102272A (ko) 2016-08-29
TW201529746A (zh) 2015-08-01
JP2015145442A (ja) 2015-08-13

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