KR101350003B1 - 유기규소 화합물, 그의 제법 및 용도 - Google Patents
유기규소 화합물, 그의 제법 및 용도 Download PDFInfo
- Publication number
- KR101350003B1 KR101350003B1 KR1020060077249A KR20060077249A KR101350003B1 KR 101350003 B1 KR101350003 B1 KR 101350003B1 KR 1020060077249 A KR1020060077249 A KR 1020060077249A KR 20060077249 A KR20060077249 A KR 20060077249A KR 101350003 B1 KR101350003 B1 KR 101350003B1
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- South Korea
- Prior art keywords
- formula
- alkoxy
- substituted
- halogen
- unsubstituted
- Prior art date
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- 150000003961 organosilicon compounds Chemical class 0.000 title claims abstract description 58
- 238000002360 preparation method Methods 0.000 title claims description 27
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- 150000001875 compounds Chemical class 0.000 claims abstract description 35
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 33
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 7
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- 238000007259 addition reaction Methods 0.000 claims abstract description 6
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- 238000006243 chemical reaction Methods 0.000 claims description 24
- 229910052736 halogen Inorganic materials 0.000 claims description 24
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- 238000000034 method Methods 0.000 claims description 19
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- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
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- 238000004519 manufacturing process Methods 0.000 claims description 8
- 125000001424 substituent group Chemical group 0.000 claims description 7
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- 150000002431 hydrogen Chemical class 0.000 claims description 5
- 150000001340 alkali metals Chemical class 0.000 claims description 4
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- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 3
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- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 229930195735 unsaturated hydrocarbon Chemical group 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
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- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 6
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
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- 239000000377 silicon dioxide Substances 0.000 description 6
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
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- 229910052801 chlorine Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
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- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
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- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 4
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 4
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
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- 150000004760 silicates Chemical class 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
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- 239000001993 wax Substances 0.000 description 4
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 229910003691 SiBr Inorganic materials 0.000 description 3
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- 101100243399 Caenorhabditis elegans pept-2 gene Proteins 0.000 description 2
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- CHJJGSNFBQVOTG-UHFFFAOYSA-N N-methyl-guanidine Natural products CNC(N)=N CHJJGSNFBQVOTG-UHFFFAOYSA-N 0.000 description 2
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 2
- 239000013543 active substance Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000000010 aprotic solvent Substances 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- UIJGNTRUPZPVNG-UHFFFAOYSA-N benzenecarbothioic s-acid Chemical compound SC(=O)C1=CC=CC=C1 UIJGNTRUPZPVNG-UHFFFAOYSA-N 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 description 2
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- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
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- 239000011164 primary particle Substances 0.000 description 2
- JPPLPDOXWBVPCW-UHFFFAOYSA-N s-(3-triethoxysilylpropyl) octanethioate Chemical compound CCCCCCCC(=O)SCCC[Si](OCC)(OCC)OCC JPPLPDOXWBVPCW-UHFFFAOYSA-N 0.000 description 2
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- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 238000005809 transesterification reaction Methods 0.000 description 2
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- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 1
- OWRCNXZUPFZXOS-UHFFFAOYSA-N 1,3-diphenylguanidine Chemical compound C=1C=CC=CC=1NC(=N)NC1=CC=CC=C1 OWRCNXZUPFZXOS-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
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- PNOXNTGLSKTMQO-UHFFFAOYSA-L diacetyloxytin Chemical compound CC(=O)O[Sn]OC(C)=O PNOXNTGLSKTMQO-UHFFFAOYSA-L 0.000 description 1
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- PYBNTRWJKQJDRE-UHFFFAOYSA-L dodecanoate;tin(2+) Chemical compound [Sn+2].CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O PYBNTRWJKQJDRE-UHFFFAOYSA-L 0.000 description 1
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- TZMQHOJDDMFGQX-UHFFFAOYSA-N hexane-1,1,1-triol Chemical compound CCCCCC(O)(O)O TZMQHOJDDMFGQX-UHFFFAOYSA-N 0.000 description 1
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
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- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
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- 125000003107 substituted aryl group Chemical group 0.000 description 1
- QAZLUNIWYYOJPC-UHFFFAOYSA-M sulfenamide Chemical compound [Cl-].COC1=C(C)C=[N+]2C3=NC4=CC=C(OC)C=C4N3SCC2=C1C QAZLUNIWYYOJPC-UHFFFAOYSA-M 0.000 description 1
- 125000004354 sulfur functional group Chemical group 0.000 description 1
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical class OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 229960002447 thiram Drugs 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/549—Silicon-containing compounds containing silicon in a ring
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/548—Silicon-containing compounds containing sulfur
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/12—Adsorbed ingredients, e.g. ingredients on carriers
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- Chemical Kinetics & Catalysis (AREA)
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- Polymers & Plastics (AREA)
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Abstract
Description
Claims (10)
- 하기 화학식 1의 유기규소 화합물:< 화학식 1 >Q-[S-G-Si(-O-CX1X2-CX1X3-)3N]상기 식 중,Q는 SiX4 3-tX5 t-(t는 0, 1 또는 2), Y-C(=O)-Z-C(=O)-, X8-C(=O)-, (X8)HN-C(=O)-, 또는 (X8)NH-C(=S)- 이고,Y는 동일하거나 상이하며, [-S-G-Si(-O-CX1X2-CX1X3-)3N]이고,G는 동일하거나 상이하며,Q가 C6H5-C(=O)- 인 경우,G는 직쇄, 시클릭 또는 분지형, 할로겐, -COOR 또는 HS로 치환되거나 비치환된, 포화 또는 불포화 2가 (C3-C30)-탄화수소 쇄이고(탄화수소 쇄는 불포화 잔기를 함유하거나, 이들에 의해 치환될 수 있음);다른 모든 Q의 경우,G는 직쇄, 시클릭 또는 분지형, 할로겐, -COOR 또는 HS로 치환되거나 비치환된, 포화 또는 불포화 2가 (C3-C20)-탄화수소 쇄이고(탄화수소 쇄는 불포화 잔기를 함유하거나, 이들에 의해 치환될 수 있음);Z는 직쇄, 시클릭 또는 분지형, 할로겐, -COOR 또는 HS로 치환되거나 비치환된, 포화 또는 불포화 2가 (C1-C24)-탄화수소 쇄(탄화수소 쇄는 불포화 잔기를 함유하거나, 이들에 의해 치환될 수 있음), 또는 2 이상의 NH 기로 관능화된, 2가의, 지방족 또는 방향족, 포화 또는 불포화 탄화수소 쇄이고,X1, X2 및 X3은 각각의 경우 서로 독립적으로, 수소(-H) 또는 (C1-C16)-알킬을 나타내고,X4 및 X5는 각각의 경우 서로 독립적으로, 수소(-H), 직쇄, 시클릭 또는 분지형, 할로겐, -COOR 또는 HS로 치환되거나 비치환된, 포화 또는 불포화 1가 (C1-C24)-탄화수소 쇄, (C1-C18)-알콕시 기, 아릴 기, 알킬에테르 기 O-(CRI 2-CRI 2)-O-알크 또는 알킬폴리에테르 기 O-(CRI 2-CRI 2O)y-알크(여기서, y는 2-25이고, RI은 서로 독립적으로, H 또는 알킬 기이고, 알크는 1-30개의 탄소 원자(C1-C30)를 갖는 선형 또는 분지형, 포화 또는 불포화 알킬 쇄임),아르알킬 기,할로겐,라디칼 알크-(COO),또는 Y를 나타내고,X8은 동일하거나 상이하며, 수소(H), 직쇄, 시클릭 또는 분지형, 할로겐, -COOR 또는 HS로 치환되거나 비치환된, 포화 또는 불포화 1가 (C2-C24)-탄화수소 쇄,-NH2, HS-, Cl-, Br-치환된, (C6-C24)-아릴 기,비치환된 (C6-C24)-아릴 기 또는비치환 또는 -NH2, HS-, Cl- 또는 Br-치환된 (C7-C24)-아르알킬 기를 나타내고,R은 동일하거나 상이하며, 수소(H), 직쇄, 시클릭 또는 분지형, 비치환된, 포화 또는 불포화 1가 (C1-C24)-탄화수소 쇄,비치환 또는 -NH2, HS-, Cl- 또는 Br-치환된 (C6-C24)-아릴기 또는비치환된 또는 -NH2, HS-, Cl- 또는 Br-치환된 (C7-C24)-아르알킬기를 나타낸다.
- 제1항에 있어서, 불활성 유기 또는 무기 지지체에 적용 또는 혼합되거나, 유기 또는 무기 지지체와의 예비 반응에 적용되는 것을 특징으로 하는, 유기규소 화합물.
- 하나 이상의 하기 화학식 2의 유기규소 화합물이,Y-C(=O)-O-C(=O)-Y, X8-C(=O)-O-C(=O)-X8, SiX4 3-tX5 t-할로겐, Y-C(=O)-Z-C(=O)-할로겐, Y-C(=O)-할로겐, X8-C(=O)-할로겐, (X9)2N-C(=O)-할로겐, (X9)2N-C(=S)-할로겐(상기 식 중, Y, Z, X4, X5, X8 및 t는 화학식 1에서와 같은 의미를 가지고, X9는 동일하거나 상이하며, 수소(H), 직쇄, 시클릭 또는 분지형, 할로겐, -COOR 또는 HS로 치환되거나 비치환된, 포화 또는 불포화 1가 (C4-C24)-탄화수소 쇄; -NH2, HS-, Cl- 또는 Br-치환된, (C6-C24)-아릴 기; 비치환된 (C7-C24)-아릴 기; 또는 비치환 또는 -NH2, HS-, Cl- 또는 Br-치환된, (C7-C24)-아르알킬 기를 나타낸다)으로 이루어진 군으로부터 선택되는 하나 이상의 화합물과 반응하는 것을 특징으로 하는, 제1항 기재 유기규소 화합물의 제조 방법.< 화학식 2 >X10[S-G-Si(-O-CX1X2-CX1X3-)3N](상기 식 중, G, X1, X2 및 X3는 화학식 1에서와 같은 의미를 갖고, X10은 H, 알칼리 금속, 알칼리 토금속 또는 암모늄 양이온임)
- 하나 이상의 이중 결합(=)을 함유하는 하기 화학식 5의 유기규소 화합물과의 첨가 반응에 하기 화학식 4의 화합물을 적용하는 것을 특징으로 하는, 제1항 기재 유기규소 화합물의 제조 방법.< 화학식 4 >Q(-SH)(상기 식 중, Q는 화학식 1에서와 같은 의미를 가짐)< 화학식 5 >CX1X2=CX2-G1-Si(O-CX1X2-CX1X3)3N(상기 식 중, X1, X2 및 X3은 화학식 1에서와 같은 의미를 갖고, G1은 -CX1X2-CHX2-G1 또는 HCX1X2-CX2(-)-G1가 화학식 1에서 정의된 G가 되는 치환기를 나타낸다)
- 하기 화학식 6의 화합물이 하기 화학식 7의 화합물과 반응하는 것을 특징으로 하는, 제1항 기재 유기규소 화합물의 제조 방법.< 화학식 6 >Q(-S-X10)(상기 식 중, Q는 화학식 1에서와 같은 의미를 갖고, X10은 H, 알칼리 금속, 알칼리 토금속 또는 암모늄 양이온임)< 화학식 7 >할로겐-G-Si(O-CX1X2-CX1X3)3N(상기 식 중, X1, X2 및 X3 및 G는 화학식 1에서와 같은 의미를 가짐)
- 하나 이상의 하기 화학식 8 내지 11의 실란이 하기 화학식 12의 화합물과 반응하고, (알콕시)-H가 제거되며, (알콕시)-H가 반응 혼합물로부터 분리되는 것을 특징으로 하는, 제1항 기재 유기규소 화합물의 제조 방법.< 화학식 8 >Q-[S-G-Si(알콕시)3]< 화학식 9 >(알콕시)3Si-G-S-C(=O)-Z-C(=O)-S-G-Si(알콕시)3< 화학식 10 >(알콕시)3Si-G-S-C(=S)-Z-C(=S)-S-G-Si(알콕시)3< 화학식 11 >(알콕시)3Si-G-S-C(=NR)-Z-C(=NR)-S-G-Si(알콕시)3(상기 식 중, G, Q 및 Z는 화학식 1에서와 같은 의미를 가지며, 알콕시는 서 로 독립적으로, (C1-C24)-알콕시임)< 화학식 12 >(HO-CX1X2-CX1X3-)3N(상기 식 중, X1, X2, 및 X3은 화학식 1에서와 같은 의미를 가짐)
- 고무, 충전제, 및 하나 이상의 제1항 또는 제2항 기재 유기규소 화합물을 함유하는 것을 특징으로 하는 고무 혼합물.
- 제7항에 있어서, 성형물을 제조하기 위해 사용되는 것을 특징으로 하는 고무 혼합물.
- 제7항에 있어서, 공기 타이어, 타이어 트레드, 고무-함유 타이어 구성성분, 케이블 피복, 호스, 구동 벨트, 컨베이어 벨트, 롤 커버, 타이어, 신발창, 밀봉 링 및 감쇠 부재를 제조하기 위해 사용되는 것을 특징으로 하는 고무 혼합물.
- 제7항에 있어서, 추가적인 고무 보조제를 더 함유하는 것을 특징으로 하는 고무 혼합물.
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DE102005020536A1 (de) * | 2004-09-07 | 2006-03-23 | Degussa Ag | Verfahren zur Herstellung von Mercaptoorganyl(alkoxysilan) |
DE102005020534B4 (de) * | 2004-09-07 | 2006-07-06 | Degussa Ag | Verfahren zur Herstellung von Mercaptoorganyl(alkoxysilanen) |
DE102004061014A1 (de) * | 2004-12-18 | 2006-06-29 | Degussa Ag | Kautschukmischungen |
DE102005057801A1 (de) | 2005-01-20 | 2006-08-03 | Degussa Ag | Mercaptosilane |
DE102005052233A1 (de) * | 2005-03-07 | 2006-09-21 | Degussa Ag | Verfahren zur Herstellung von Organosilanen |
DE102005038794A1 (de) * | 2005-08-17 | 2007-02-22 | Degussa Ag | Kautschukmischungen |
DE102006004062A1 (de) | 2006-01-28 | 2007-08-09 | Degussa Gmbh | Kautschukmischungen |
DE102006008670A1 (de) * | 2006-02-24 | 2007-08-30 | Degussa Gmbh | Kautschukmischungen |
DE102006027235A1 (de) | 2006-06-09 | 2008-01-17 | Evonik Degussa Gmbh | Kautschukmischungen |
-
2005
- 2005-08-17 DE DE102005038791A patent/DE102005038791A1/de not_active Withdrawn
-
2006
- 2006-07-24 DE DE502006006388T patent/DE502006006388D1/de active Active
- 2006-07-24 PL PL06117703T patent/PL1795534T3/pl unknown
- 2006-07-24 ES ES06117703T patent/ES2342315T3/es active Active
- 2006-07-24 EP EP06117703A patent/EP1795534B1/de not_active Not-in-force
- 2006-07-24 AT AT06117703T patent/ATE460419T1/de active
- 2006-07-24 PT PT06117703T patent/PT1795534E/pt unknown
- 2006-08-14 TW TW095129797A patent/TWI383991B/zh not_active IP Right Cessation
- 2006-08-15 CA CA2556156A patent/CA2556156C/en not_active Expired - Fee Related
- 2006-08-15 MY MYPI20063943A patent/MY141304A/en unknown
- 2006-08-15 US US11/503,932 patent/US7777063B2/en not_active Expired - Fee Related
- 2006-08-16 UA UAA200609096A patent/UA91971C2/ru unknown
- 2006-08-16 KR KR1020060077249A patent/KR101350003B1/ko not_active IP Right Cessation
- 2006-08-16 RU RU2006129695/04A patent/RU2417998C2/ru not_active IP Right Cessation
- 2006-08-17 JP JP2006222536A patent/JP5237537B2/ja not_active Expired - Fee Related
- 2006-08-17 CN CN2006101150478A patent/CN1916002B/zh not_active Expired - Fee Related
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JP2003201295A (ja) * | 2001-09-26 | 2003-07-18 | Degussa Ag | ブロック化されたメルカプトシラン、その製造方法、該化合物を含有するゴム混合物、ゴム混合物の製造方法およびブロック化されたメルカプトシランの使用 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200080835A (ko) * | 2018-12-27 | 2020-07-07 | 에스케이이노베이션 주식회사 | 식각 조성물, 이를 이용한 절연막의 식각방법 및 반도체 소자의 제조방법 |
KR102576575B1 (ko) | 2018-12-27 | 2023-09-08 | 에스케이이노베이션 주식회사 | 식각 조성물, 이를 이용한 절연막의 식각방법 및 반도체 소자의 제조방법 |
Also Published As
Publication number | Publication date |
---|---|
ATE460419T1 (de) | 2010-03-15 |
RU2006129695A (ru) | 2008-02-27 |
US20070066760A1 (en) | 2007-03-22 |
MY141304A (en) | 2010-04-16 |
CN1916002B (zh) | 2012-06-20 |
BRPI0603370A (pt) | 2007-05-15 |
JP2007051146A (ja) | 2007-03-01 |
DE102005038791A1 (de) | 2007-02-22 |
PT1795534E (pt) | 2010-05-28 |
CA2556156A1 (en) | 2007-02-17 |
EP1795534B1 (de) | 2010-03-10 |
TW200712057A (en) | 2007-04-01 |
PL1795534T3 (pl) | 2010-08-31 |
KR20070021075A (ko) | 2007-02-22 |
EP1795534A3 (de) | 2007-07-18 |
TWI383991B (zh) | 2013-02-01 |
ES2342315T3 (es) | 2010-07-05 |
JP5237537B2 (ja) | 2013-07-17 |
RU2417998C2 (ru) | 2011-05-10 |
US7777063B2 (en) | 2010-08-17 |
CA2556156C (en) | 2014-09-30 |
EP1795534A2 (de) | 2007-06-13 |
UA91971C2 (ru) | 2010-09-27 |
CN1916002A (zh) | 2007-02-21 |
DE502006006388D1 (de) | 2010-04-22 |
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