KR100397396B1 - W초미립자의 제조방법 및 w나노결정박막의 제조방법 - Google Patents
W초미립자의 제조방법 및 w나노결정박막의 제조방법 Download PDFInfo
- Publication number
- KR100397396B1 KR100397396B1 KR10-2000-7009611A KR20007009611A KR100397396B1 KR 100397396 B1 KR100397396 B1 KR 100397396B1 KR 20007009611 A KR20007009611 A KR 20007009611A KR 100397396 B1 KR100397396 B1 KR 100397396B1
- Authority
- KR
- South Korea
- Prior art keywords
- particles
- ultrafine particles
- ultrafine
- electron beam
- oxide particles
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000012528 membrane Substances 0.000 title abstract description 4
- 239000002159 nanocrystal Substances 0.000 title description 4
- 229910052721 tungsten Inorganic materials 0.000 title description 4
- 239000010419 fine particle Substances 0.000 title description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 title description 2
- 239000010937 tungsten Substances 0.000 title description 2
- 239000011882 ultra-fine particle Substances 0.000 claims abstract description 117
- 239000002245 particle Substances 0.000 claims abstract description 99
- 238000010894 electron beam technology Methods 0.000 claims abstract description 53
- 238000000034 method Methods 0.000 claims abstract description 20
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 16
- 239000010408 film Substances 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 18
- 230000001678 irradiating effect Effects 0.000 claims description 11
- 230000004927 fusion Effects 0.000 claims description 6
- 239000013078 crystal Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 239000008204 material by function Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 229910001930 tungsten oxide Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical group 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- VVRQVWSVLMGPRN-UHFFFAOYSA-N oxotungsten Chemical class [W]=O VVRQVWSVLMGPRN-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- -1 sputtering Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/20—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from solid metal compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
- B22F1/056—Submicron particles having a size above 100 nm up to 300 nm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/30—Making metallic powder or suspensions thereof using chemical processes with decomposition of metal compounds, e.g. by pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Composite Materials (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Catalysts (AREA)
Abstract
Description
Claims (12)
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 비정질 탄소막상에 WO3으로 이루어진 W산화물 입자를 배치하는 공정과,상기 W산화물 입자에 대해 10-5Pa 이하의 진공 분위기속에서 1023∼1024e/㎠·sec 범위의 강도를 갖는 전자선을 조사하여 상기 W산화물 입자로부터 W를 이탈시키고 10㎚ 이하의 입자직경을 갖는 W초미립자를 생성하는 공정을 갖는 것을 특징으로 하는 W초미립자의 제조방법.
- 삭제
- 제 7 항에 있어서,상기 W산화물 입자는 0.05~10㎛의 범위의 입자직경을 갖는 것을 특징으로 하는 W초미립자의 제조방법.
- 제 7 항에 있어서,상기 W초미립자의 생성 공정에서 복수의 상기 W초미립자를 생성하는 것을 특징으로 하는 W초미립자의 제조방법.
- 비정질 탄소막상에 WO3으로 이루어진 W산화물 입자를 배치하는 공정과,상기 W산화물 입자에 대해 10-5Pa 이하의 진공 분위기속에서 1023∼1024e/㎠·sec 범위의 강도를 갖는 전자선을 조사하여 상기 W산화물 입자로부터 W를 이탈시켜 복수의 W초미립자를 생성함과 동시에 생성한 상기 복수의 W초미립자를 상호 융합시켜 10㎚ 이하의 입자직경을 갖는 W나노결정박막을 형성하는 공정을 갖는 것을 특징으로 하는 W나노결정박막의 제조방법.
- 삭제
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP07779998A JP3411497B2 (ja) | 1998-03-25 | 1998-03-25 | W超微粒子とその製造方法、およびwナノ結晶薄膜 |
JP10-77799 | 1998-03-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010041458A KR20010041458A (ko) | 2001-05-25 |
KR100397396B1 true KR100397396B1 (ko) | 2003-09-13 |
Family
ID=13644060
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2000-7009611A KR100397396B1 (ko) | 1998-03-25 | 1999-03-19 | W초미립자의 제조방법 및 w나노결정박막의 제조방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6440562B1 (ko) |
EP (1) | EP1146138B1 (ko) |
JP (1) | JP3411497B2 (ko) |
KR (1) | KR100397396B1 (ko) |
CN (1) | CN1210436C (ko) |
DE (1) | DE69928017T2 (ko) |
WO (1) | WO1999049099A1 (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7509961B2 (en) * | 2003-10-27 | 2009-03-31 | Philip Morris Usa Inc. | Cigarettes and cigarette components containing nanostructured fibril materials |
US20070031339A1 (en) | 2003-11-28 | 2007-02-08 | Oskar Axelsson | Contrast agents |
JP6285065B1 (ja) * | 2016-08-30 | 2018-02-28 | 国立大学法人京都大学 | 金属ナノ粒子製造方法、その製造装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6024305A (ja) * | 1983-07-19 | 1985-02-07 | Daido Steel Co Ltd | 高融点物質超微粉末の製造装置 |
JPH08217419A (ja) * | 1995-02-09 | 1996-08-27 | Res Dev Corp Of Japan | 超微粒子とその製造方法、および超微粒子配向成長体とその製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2662986B2 (ja) | 1988-06-24 | 1997-10-15 | 高周波熱錬株式会社 | タングステンもしくは酸化タングステン超微粒子の製造方法 |
DE3834402C1 (ko) * | 1988-10-10 | 1989-05-03 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De | |
JP2834199B2 (ja) | 1989-07-21 | 1998-12-09 | 触媒化成工業株式会社 | タングステン超微粒子の製造方法 |
DE4214723C2 (de) * | 1992-05-04 | 1994-08-25 | Starck H C Gmbh Co Kg | Feinteilige Metallpulver |
JPH0620518A (ja) | 1992-07-04 | 1994-01-28 | Fujikura Ltd | 導電性熱硬化型塗料 |
US6017630A (en) * | 1996-05-22 | 2000-01-25 | Research Development Corporation | Ultrafine particle and production method thereof, production method of ultrafine particle bonded body, and fullerene and production method thereof |
JP3426083B2 (ja) | 1996-05-22 | 2003-07-14 | 科学技術振興事業団 | 金属超微粒子融合体の製造方法と金属超薄膜の製造方法 |
JPH09316504A (ja) | 1996-05-27 | 1997-12-09 | Res Dev Corp Of Japan | Al超微粒子 |
US5851507A (en) * | 1996-09-03 | 1998-12-22 | Nanomaterials Research Corporation | Integrated thermal process for the continuous synthesis of nanoscale powders |
US6001304A (en) * | 1998-12-31 | 1999-12-14 | Materials Modification, Inc. | Method of bonding a particle material to near theoretical density |
-
1998
- 1998-03-25 JP JP07779998A patent/JP3411497B2/ja not_active Expired - Fee Related
-
1999
- 1999-03-19 DE DE69928017T patent/DE69928017T2/de not_active Expired - Lifetime
- 1999-03-19 US US09/646,831 patent/US6440562B1/en not_active Expired - Fee Related
- 1999-03-19 EP EP99909259A patent/EP1146138B1/en not_active Expired - Lifetime
- 1999-03-19 CN CNB998044210A patent/CN1210436C/zh not_active Expired - Fee Related
- 1999-03-19 WO PCT/JP1999/001393 patent/WO1999049099A1/ja active IP Right Grant
- 1999-03-19 KR KR10-2000-7009611A patent/KR100397396B1/ko not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6024305A (ja) * | 1983-07-19 | 1985-02-07 | Daido Steel Co Ltd | 高融点物質超微粉末の製造装置 |
JPH08217419A (ja) * | 1995-02-09 | 1996-08-27 | Res Dev Corp Of Japan | 超微粒子とその製造方法、および超微粒子配向成長体とその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE69928017T2 (de) | 2006-11-30 |
JP3411497B2 (ja) | 2003-06-03 |
US6440562B1 (en) | 2002-08-27 |
DE69928017D1 (de) | 2005-12-01 |
CN1210436C (zh) | 2005-07-13 |
KR20010041458A (ko) | 2001-05-25 |
EP1146138B1 (en) | 2005-10-26 |
EP1146138A4 (en) | 2002-08-21 |
JPH11269623A (ja) | 1999-10-05 |
WO1999049099A1 (fr) | 1999-09-30 |
EP1146138A1 (en) | 2001-10-17 |
CN1294638A (zh) | 2001-05-09 |
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