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JPS57207256A - Photomask - Google Patents

Photomask

Info

Publication number
JPS57207256A
JPS57207256A JP9340781A JP9340781A JPS57207256A JP S57207256 A JPS57207256 A JP S57207256A JP 9340781 A JP9340781 A JP 9340781A JP 9340781 A JP9340781 A JP 9340781A JP S57207256 A JPS57207256 A JP S57207256A
Authority
JP
Japan
Prior art keywords
substrate
recesses
films
metallic
chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9340781A
Other languages
Japanese (ja)
Inventor
Katsuyuki Arii
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9340781A priority Critical patent/JPS57207256A/en
Publication of JPS57207256A publication Critical patent/JPS57207256A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To permit contact exposure with good accuracy by providing recesses of a prescribed pattern on the surface of a light transmittable substrate, and burying light shieldable films in the recesses. CONSTITUTION:A glass substrate 1 is etched by as much as the depth of the size corresponding to the thickness of a metallic film 5 to be formed on the substrate 1, whereby recesses of a prescribed pattern are formed on the substrate 1. A metallic film 5 consisting of chromium is deposited by vapor-deposition or the like over the entire surface of the substrate 1. Here, the surface layer of the film 5 of chromium is formed partly of chromium oxide in order to prevent reflection. Thereafter, the photoresist films 3A, 3B, 3C, 3D, 3E patterning the substrate are removed and the metallic films thereon are removed together. The photomask having metallic films 5A, 5B, 5C, 5D in the recesses of the glass substrate is obtained.
JP9340781A 1981-06-16 1981-06-16 Photomask Pending JPS57207256A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9340781A JPS57207256A (en) 1981-06-16 1981-06-16 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9340781A JPS57207256A (en) 1981-06-16 1981-06-16 Photomask

Publications (1)

Publication Number Publication Date
JPS57207256A true JPS57207256A (en) 1982-12-18

Family

ID=14081439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9340781A Pending JPS57207256A (en) 1981-06-16 1981-06-16 Photomask

Country Status (1)

Country Link
JP (1) JPS57207256A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0234547A2 (en) * 1986-02-28 1987-09-02 Sharp Kabushiki Kaisha Method of manufacturing photomask and photo-mask manufactured thereby
JPS62201444A (en) * 1986-02-28 1987-09-05 Sharp Corp Photomask and its production
FR2641622A1 (en) * 1988-12-19 1990-07-13 Weill Andre Photolithography mask
US5079113A (en) * 1988-09-29 1992-01-07 Sharp Kabushiki Kaisha Photo-mask
US5260150A (en) * 1987-09-30 1993-11-09 Sharp Kabushiki Kaisha Photo-mask with light shielding film buried in substrate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0234547A2 (en) * 1986-02-28 1987-09-02 Sharp Kabushiki Kaisha Method of manufacturing photomask and photo-mask manufactured thereby
JPS62201444A (en) * 1986-02-28 1987-09-05 Sharp Corp Photomask and its production
US5087535A (en) * 1986-02-28 1992-02-11 Sharp Kabushiki Kaisha Method of manufacturing photo-mask and photo-mask manufactured thereby
US5457006A (en) * 1986-02-28 1995-10-10 Sharp Kabushiki Kaisha Method of manufacturing photo-mask and photo-mask manufactured thereby
US5260150A (en) * 1987-09-30 1993-11-09 Sharp Kabushiki Kaisha Photo-mask with light shielding film buried in substrate
US5079113A (en) * 1988-09-29 1992-01-07 Sharp Kabushiki Kaisha Photo-mask
FR2641622A1 (en) * 1988-12-19 1990-07-13 Weill Andre Photolithography mask

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