JPS5421272A - Metal photo mask - Google Patents
Metal photo maskInfo
- Publication number
- JPS5421272A JPS5421272A JP8683077A JP8683077A JPS5421272A JP S5421272 A JPS5421272 A JP S5421272A JP 8683077 A JP8683077 A JP 8683077A JP 8683077 A JP8683077 A JP 8683077A JP S5421272 A JPS5421272 A JP S5421272A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- metal
- metal photo
- mask
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To establish a mask not peeled off even with cleaning, by inserting a mixture layer of metal and glass between the substrate and the metallic thin film, in providing a metal mask having the pattern formed with metallic thin film on a glass substrate.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8683077A JPS5421272A (en) | 1977-07-19 | 1977-07-19 | Metal photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8683077A JPS5421272A (en) | 1977-07-19 | 1977-07-19 | Metal photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5421272A true JPS5421272A (en) | 1979-02-17 |
Family
ID=13897720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8683077A Pending JPS5421272A (en) | 1977-07-19 | 1977-07-19 | Metal photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5421272A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61173250A (en) * | 1985-01-28 | 1986-08-04 | Mitsubishi Electric Corp | Photomask material |
JPS6334549A (en) * | 1986-07-30 | 1988-02-15 | Nissin Electric Co Ltd | Exposure mask and its production |
WO2002005032A1 (en) * | 2000-07-07 | 2002-01-17 | Hitachi, Ltd. | Method of manufacturing integrated circuit |
-
1977
- 1977-07-19 JP JP8683077A patent/JPS5421272A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61173250A (en) * | 1985-01-28 | 1986-08-04 | Mitsubishi Electric Corp | Photomask material |
JPS6334549A (en) * | 1986-07-30 | 1988-02-15 | Nissin Electric Co Ltd | Exposure mask and its production |
WO2002005032A1 (en) * | 2000-07-07 | 2002-01-17 | Hitachi, Ltd. | Method of manufacturing integrated circuit |
US6794207B2 (en) | 2000-07-07 | 2004-09-21 | Renesas Technology Corp. | Method of manufacturing integrated circuit |
US6936406B2 (en) | 2000-07-07 | 2005-08-30 | Renesas Technology Corp. | Method of manufacturing integrated circuit |
US6958292B2 (en) | 2000-07-07 | 2005-10-25 | Renesas Technology Corp. | Method of manufacturing integrated circuit |
CN100334687C (en) * | 2000-07-07 | 2007-08-29 | 株式会社日立制作所 | Method of manufacturing integrated circuit |
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