JP7028020B2 - 誘電体組成物および電子部品 - Google Patents
誘電体組成物および電子部品 Download PDFInfo
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- JP7028020B2 JP7028020B2 JP2018062930A JP2018062930A JP7028020B2 JP 7028020 B2 JP7028020 B2 JP 7028020B2 JP 2018062930 A JP2018062930 A JP 2018062930A JP 2018062930 A JP2018062930 A JP 2018062930A JP 7028020 B2 JP7028020 B2 JP 7028020B2
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- 239000000203 mixture Substances 0.000 title claims description 54
- 239000010955 niobium Substances 0.000 claims description 22
- 239000011701 zinc Substances 0.000 claims description 22
- 239000002131 composite material Substances 0.000 claims description 21
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 229910052797 bismuth Inorganic materials 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 239000000843 powder Substances 0.000 description 21
- 239000013078 crystal Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 16
- 239000003990 capacitor Substances 0.000 description 16
- 229910052760 oxygen Inorganic materials 0.000 description 16
- 239000001301 oxygen Substances 0.000 description 16
- 239000002356 single layer Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 238000002156 mixing Methods 0.000 description 8
- 239000003989 dielectric material Substances 0.000 description 7
- 238000010304 firing Methods 0.000 description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 238000010295 mobile communication Methods 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 238000001354 calcination Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 229910007541 Zn O Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 238000007580 dry-mixing Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G33/00—Compounds of niobium
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/12—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances ceramics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/33—Thin- or thick-film capacitors
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Inorganic Insulating Materials (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Compositions Of Oxide Ceramics (AREA)
Description
[1]ビスマスと亜鉛とニオブとを含む複合酸化物を有する誘電体組成物であって、
複合酸化物を、組成式BixZnyNbzO1.75+δで表した場合、x、yおよびzは、x+y+z=1.00、0.31≦y≦0.50、2/3≦x/z≦3/2である関係を満足することを特徴とする誘電体組成物である。
1.電子部品
1.1.単層キャパシタの全体構成
1.2.誘電体層
1.2.1.誘電体組成物
2.電子部品の製造方法
3.本実施形態における効果
4.変形例
まず、本実施形態に係る電子部品の一例として、単層キャパシタについて説明する。
図1に示すように、本実施形態に係る単層キャパシタ100は、円柱状の誘電体層11と、誘電体層11の両主面である一対の対向面に形成された一対の電極10A、10Bとを備えている。誘電体層11と、一対の電極10A、10Bとは、キャパシタ部を形成しており、一対の電極10A、10Bが外部回路に接続されて電圧が印加されると、誘電体層11が所定の静電容量を示し、キャパシタとしての機能を発揮することができる。
本実施形態では、誘電体層11は、以下に示す誘電体組成物から構成されている。
本実施形態に係る誘電体組成物は、ビスマス(Bi)、亜鉛(Zn)およびニオブ(Nb)を含む複合酸化物を主成分として含有している。本実施形態では、主成分とは、誘電体組成物100質量%に対して、90質量%以上を占める成分である。
次に、電子部品の製造方法の一例として、図1に示す単層キャパシタ100の製造方法の一例について以下に説明する。
本実施形態では、パイロクロア型結晶構造を有する複合酸化物として、Bi-Zn-Nb-O系酸化物に着目している。この複合酸化物においては、Znは、AサイトおよびBサイトのどちらも占めることができ、2種類の多面体を形成する。本発明者らは、この2種類の多面体の割合を増やすことにより、パイロクロア型結晶構造が安定化し、温度変化による構造変化が生じにくくなることを見出した。そこで、本実施形態では、パイロクロア型結晶構造中のZnの含有割合を上記の範囲内とすることにより、共振周波数温度係数τfを良好にしている。
上述した実施形態では、電子部品として、誘電体層が単層である単層キャパシタについて説明したが、電子部品は積層キャパシタであってもよい。このような積層キャパシタは、上述した誘電体組成物から構成される複数の誘電体層と内部電極層とが交互に積層された構成の積層体を有する。この積層体の両端部には、内部電極層と各々導通する一対の端子電極が形成してある。積層体の形状に特に制限はないが、通常、直方体状とされる。また、その寸法にも特に制限はなく、用途に応じて適当な寸法とすればよい。
10A、10B… 端子電極
11… 誘電体層
Claims (4)
- ビスマスと亜鉛とニオブとを含む複合酸化物を有する誘電体組成物であって、
前記複合酸化物を、組成式BixZnyNbzO1.75+δで表した場合、前記x、yおよびzは、x+y+z=1.00、0.40≦y≦0.50、2/3≦x/z≦3/2である関係を満足することを特徴とする誘電体組成物。 - 前記xおよびzが、1.20≦x/z≦1.50である関係を満足することを特徴とする請求項1に記載の誘電体組成物。
- 前記xおよびzが、0.90≦x/z≦1.10である関係を満足することを特徴とする請求項1に記載の誘電体組成物。
- 請求項1から3のいずれかに記載の誘電体組成物を含む誘電体層を備える電子部品。
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JP2018062930A JP7028020B2 (ja) | 2018-03-28 | 2018-03-28 | 誘電体組成物および電子部品 |
PCT/JP2019/011580 WO2019188617A1 (ja) | 2018-03-28 | 2019-03-19 | 誘電体組成物および電子部品 |
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JP2019175702A JP2019175702A (ja) | 2019-10-10 |
JP7028020B2 true JP7028020B2 (ja) | 2022-03-02 |
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Citations (1)
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JP2007129232A (ja) | 2005-11-03 | 2007-05-24 | Samsung Electro Mech Co Ltd | 薄膜キャパシタを内蔵した印刷回路基板の製造方法及びそれにより製造された印刷回路基板 |
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JPH04285046A (ja) * | 1991-03-12 | 1992-10-09 | Matsushita Electric Ind Co Ltd | 誘電体磁器組成物 |
JP6179544B2 (ja) * | 2015-03-23 | 2017-08-16 | Tdk株式会社 | 誘電体磁器組成物、電子部品および通信機器 |
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JP2007129232A (ja) | 2005-11-03 | 2007-05-24 | Samsung Electro Mech Co Ltd | 薄膜キャパシタを内蔵した印刷回路基板の製造方法及びそれにより製造された印刷回路基板 |
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WO2019188617A1 (ja) | 2019-10-03 |
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