JP6409632B2 - 誘電体磁器組成物およびセラミック電子部品 - Google Patents
誘電体磁器組成物およびセラミック電子部品 Download PDFInfo
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- JP6409632B2 JP6409632B2 JP2015050916A JP2015050916A JP6409632B2 JP 6409632 B2 JP6409632 B2 JP 6409632B2 JP 2015050916 A JP2015050916 A JP 2015050916A JP 2015050916 A JP2015050916 A JP 2015050916A JP 6409632 B2 JP6409632 B2 JP 6409632B2
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Description
一般式ABO3で表されるペロブスカイト型結晶構造を有し、前記AはBa、CaおよびSrから選択される少なくとも1種であり、前記BはTiおよびZrから選択される少なくとも1種である主成分と、
Euを含む少なくとも3種の希土類元素の酸化物である第1の副成分と、
Siの酸化物である第2の副成分と、を含有する誘電体磁器組成物であって、
前記第1の副成分は、少なくともEuの酸化物、Raの酸化物およびRbの酸化物を含み、前記RaはSc、Er、Tm、YbおよびLuから選択される少なくとも1種であり、前記RbはY、Dy、Ho、TbおよびGdから選択される少なくとも1種であり、
前記主成分100モルに対する前記Euの酸化物の含有量をEu2O3換算でαモル、前記Raの酸化物の含有量をRa2O3換算でβモル、前記Rbの酸化物の含有量をRb2O3換算でγモル、前記第2の副成分の含有量をSiO2換算でδモルとすると、
0.075≦α≦0.5
0.5≦β≦3
1.0≦γ≦4
1.5≦δ≦5
0.030≦α/δ≦0.250
であることを特徴とする。
前記主成分100モルに対する前記第3の副成分の含有量は、BaO、CaO換算で0.5〜4モルであることが好ましい。
前記主成分100モルに対する前記第4の副成分の含有量は、MnO、Cr2O3換算で0.05〜0.3モルであることが好ましい。
前記主成分100モルに対する前記第5の副成分の含有量は、V2O5、Mo2O3、WO3換算で0.010〜0.15モルであることが好ましい。
前記主成分100モルに対しする前記第6の副成分の含有量は、MgO換算で0.5〜1.8モルであることが好ましい。
図1に示すように、積層セラミック電子部品の一例としての積層セラミックコンデンサ1は、誘電体層2と、内部電極層3と、が交互に積層された構成のコンデンサ素子本体10を有する。内部電極層3は、各端面がコンデンサ素子本体10の対向する2端部の表面に交互に露出するように積層してある。一対の外部電極4は、コンデンサ素子本体10の両端部に形成され、交互に配置された内部電極層3の露出端面に接続されて、コンデンサ回路を構成する。
誘電体層2は、本実施形態に係る誘電体磁器組成物から構成されている。本実施形態に係る誘電体磁器組成物は、一般式ABO3(AはBa、CaおよびSrから選ばれる少なくとも1つであり、BはTiおよびZrから選ばれる少なくとも1つである)で表されるペロブスカイト型結晶構造を有する化合物を主成分として有している。また、本実施形態に係る誘電体磁器組成物は、主成分がABO3である誘電体粒子を有しているともいえる。
内部電極層3に含有される導電材は特に限定されないが、誘電体層を構成する材料が耐還元性を有するため、比較的安価な卑金属を用いることができる。導電材として卑金属を用いる場合には、NiまたはNi合金が好ましい。Ni合金としては、Mn、Cr、CoおよびAlから選択される1種以上の元素とNiとの合金が好ましい。合金中のNiの含有量は95重量%以上であることが好ましい。なお、NiまたはNi合金中には、P等の各微量成分が合計0.1重量%程度以下含まれていてもよい。内部電極層3の厚さは用途に応じて適宜変更でき、特に限定されない。通常、0.1〜3.0μm、好ましくは0.5〜2.0μm程度である。
外部電極4に含有される導電材は特に限定されないが、本実施形態では、安価なNi、Cuやこれらの合金を用いることができる。外部電極4の厚さは用途等に応じて適宜決定すればよいが、通常10〜50μm程度であることが好ましい。
本実施形態の積層セラミックコンデンサ1は、従来の積層セラミックコンデンサと同様に、ペーストを用いた通常の印刷法やシート法によりグリーンチップを作製し、これを焼成した後、外部電極を印刷または転写して焼成することにより製造される。以下、製造方法について具体的に説明する。
誘電体原料の主成分原料として、まずABO3の原料を準備する。ABO3としてはBauTivO3で表されるチタン酸バリウムを用いることが好ましい。
誘電体層用ペーストは、誘電体原料と有機ビヒクルとを混練した有機系の塗料であってもよく、誘電体原料と水系ビヒクルとを混練した水系の塗料であってもよい。
内部電極層用ペーストは、導電材と、有機ビヒクルと、を混練して調整する。前記導電材は、各種導電性金属や合金からなる導電材、あるいは焼成後に導電材となる各種酸化物、有機金属化合物、レジネート等を用いることができる。前記有機ビヒクルは、誘電体層用ペーストに用いられる有機ビヒクルと同様の有機ビヒクルを選択することができる。また、内部電極層用ペーストには、共材が含まれていてもよい。共材の種類に特に制限はない。本実施形態に係る内部電極用ペーストには、チタン酸バリウムを共材として含有していることが好ましい。
外部電極用ペーストは、上記した内部電極層用ペーストと同様にして調製すればよい。
印刷法を用いる場合、誘電体層用ペーストおよび内部電極層用ペーストを、PET等の基板上に印刷、積層し、所定形状に切断した後、基板から剥離してグリーンチップとする。
脱バインダ条件は特に制限はないが、昇温速度を好ましくは5〜300℃/時間、保持温度を好ましくは180〜800℃、温度保持時間を好ましくは0.5〜48時間とする。また脱バインダの雰囲気は、空気中もしくは還元雰囲気中とすることが好ましい。
脱バインダ後、グリーンチップの焼成を行う。昇温速度は好ましくは600〜10000℃/時間、更に好ましくは2000〜10000℃である。焼成時の保持温度は、好ましくは1300℃以下、より好ましくは1180℃〜1290℃である。焼成時の保持時間は好ましくは0.05〜20時間であり、より好ましくは0.1〜4時間である。昇温速度、保持時間を上記範囲に制御することで、高温負荷寿命が向上する。なお、降温速度に特に制限はないが、好ましくは50〜1000℃/時間である。
還元性雰囲気中で焼成した後、コンデンサ素子本体にはアニール処理を施すことが好ましい。アニールは誘電体層を再酸化するための処理であり、これにより誘電体層の絶縁抵抗(IR)を著しく上げることができ、高温負荷寿命(IR寿命)も向上させることができる。
主成分であるチタン酸バリウムの原料粉体として平均粒子径が120〜170nmのBauTivO3粉末(u/v=1.004)を準備した。
前記層間厚みが2.0μmのコンデンサ試料に対し、基準温度25℃においてデジタルLCRメータにて、周波数1.0kHz、入力信号レベル(測定電圧)1.0Vrmsの条件下で静電容量Cを測定した。また、前記層間厚みが2.0μmのコンデンサ試料に対し、絶縁抵抗計を用いて、25℃において25Vの直流電圧を1分間印加した後の絶縁抵抗IRを測定した。CR積は、上記にて測定した静電容量C(単位はμF)と絶縁抵抗IR(単位はMΩ)との積を求めることにより算出した。以下に示す表1、2では、CR積が1000以上のサンプルは○、CR積が1000未満のサンプルは△と評価している。CR積は1000以上であることが好ましいが、1000未満であっても静電容量の温度特性および高温負荷寿命が良好であれば本願発明の目的を達成することができる。
前記層間厚みが2.0μmのコンデンサ試料および3.0μmのコンデンサ試料に対して、周波数1.0kHz、入力信号レベル(測定電圧)1.0Vrmsの条件下で、−55℃〜155℃における静電容量を測定した。25℃における静電容量を基準として、温度変化に対する静電容量の変化率を算出した。そして、前記静電容量の変化率が、EIA規格の温度特性であるX8R特性を満足するか否かについて評価した。X8R特性を満足しているサンプルを良好とした。以下に示す表1、表2では、X8R特性を満足しているサンプルは○、X8R特性を満足していないサンプルは×と評価している。
前記層間厚みが2.0μmのコンデンサ試料および3.0μmのコンデンサ試料に対し、175℃にて100Vの電界下で直流電圧の印加状態を保持し、コンデンサ試料の絶縁劣化時間を測定することにより、高温負荷寿命を評価した。本実施例においては、コンデンサ試料に対する電圧印加開始から、コンデンサ試料の絶縁抵抗が1桁落ちるまでの時間を寿命とした。また、本実施例では、上記の評価を20個のコンデンサ試料について行い、これをワイブル解析することにより算出した平均故障時間(MTTF)を、当該コンデンサ試料の平均寿命とした。本実施例では平均寿命5時間以上を良好とし、平均寿命10時間以上を特に良好とした。以下に示す表1、表2では、平均寿命10時間以上のサンプルは○、平均寿命5時間以上10時間未満のサンプルは△、平均寿命5時間未満のサンプルは×と評価している。
2・・・ 誘電体層
3・・・ 内部電極層
4・・・ 外部電極
10・・・ コンデンサ素子本体
Claims (7)
- 一般式ABO3で表されるペロブスカイト型結晶構造を有し、前記AはBa、CaおよびSrから選択される少なくとも1種であり、前記BはTiおよびZrから選択される少なくとも1種である主成分と、
Euを含む少なくとも3種の希土類元素の酸化物である第1の副成分と、
Siの酸化物である第2の副成分と、を含有する誘電体磁器組成物であって、
前記第1の副成分は、少なくともEuの酸化物、Raの酸化物およびRbの酸化物を含み、前記RaはSc、Er、Tm、YbおよびLuから選択される少なくとも1種であり、前記RbはY、Dy、Ho、TbおよびGdから選択される少なくとも1種であり、
前記主成分100モルに対する前記Euの酸化物の含有量をEu2O3換算でαモル、前記Raの酸化物の含有量をRa2O3換算でβモル、前記Rbの酸化物の含有量をRb2O3換算でγモル、前記第2の副成分の含有量をSiO2換算でδモルとすると、
0.075≦α≦0.5
0.5≦β≦3
1.0≦γ≦4
1.5≦δ≦5
0.030≦α/δ≦0.250
であることを特徴とする誘電体磁器組成物。 - Baの酸化物および/またはCaの酸化物である第3の副成分を含有し、
前記主成分100モルに対する前記第3の副成分の含有量は、BaO、CaO換算で0.5〜4モルである請求項1に記載の誘電体磁器組成物。 - Mnの酸化物および/またはCrの酸化物である第4の副成分を含有し、
前記主成分100モルに対する前記第4の副成分の含有量は、MnO、Cr2O3換算で0.05〜0.3モルである請求項1または2に記載の誘電体磁器組成物。 - Vの酸化物、Moの酸化物、Wの酸化物から選択される少なくとも1種である第5の副成分を含有し、
前記主成分100モルに対する前記第5の副成分の含有量は、V2O5、Mo2O3、WO3換算で0.010〜0.15モルである請求項1〜3のいずれかに記載の誘電体磁器組成物。 - Mgの酸化物である第6の副成分を含有し、
前記主成分100モルに対しする前記第6の副成分の含有量は、MgO換算で0.5〜1.8モルである請求項1〜4のいずれかに記載の誘電体磁器組成物。 - 請求項1〜5のいずれかに記載の誘電体磁器組成物から形成される誘電体層と、電極層とを有するセラミック電子部品。
- 前記誘電体層の厚さが、2μm以下である請求項6に記載のセラミック電子部品。
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