JP6300930B2 - グラフェンの製造方法 - Google Patents
グラフェンの製造方法 Download PDFInfo
- Publication number
- JP6300930B2 JP6300930B2 JP2016538052A JP2016538052A JP6300930B2 JP 6300930 B2 JP6300930 B2 JP 6300930B2 JP 2016538052 A JP2016538052 A JP 2016538052A JP 2016538052 A JP2016538052 A JP 2016538052A JP 6300930 B2 JP6300930 B2 JP 6300930B2
- Authority
- JP
- Japan
- Prior art keywords
- graphene
- dispersant
- dispersion
- graphite
- flakes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 279
- 229910021389 graphene Inorganic materials 0.000 title claims description 189
- 238000004519 manufacturing process Methods 0.000 title claims description 98
- 239000002270 dispersing agent Substances 0.000 claims description 81
- 229910002804 graphite Inorganic materials 0.000 claims description 78
- 239000010439 graphite Substances 0.000 claims description 76
- 125000005575 polycyclic aromatic hydrocarbon group Chemical group 0.000 claims description 59
- 239000000203 mixture Substances 0.000 claims description 57
- 239000006185 dispersion Substances 0.000 claims description 53
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 36
- 229910052760 oxygen Inorganic materials 0.000 claims description 36
- 239000001301 oxygen Substances 0.000 claims description 36
- 239000003575 carbonaceous material Substances 0.000 claims description 24
- 238000004458 analytical method Methods 0.000 claims description 20
- 229910052799 carbon Inorganic materials 0.000 claims description 19
- 125000000524 functional group Chemical group 0.000 claims description 19
- 238000000921 elemental analysis Methods 0.000 claims description 11
- 239000003125 aqueous solvent Substances 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 7
- 239000003495 polar organic solvent Substances 0.000 claims description 7
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 claims description 5
- 238000002485 combustion reaction Methods 0.000 claims description 4
- 238000010008 shearing Methods 0.000 claims description 4
- 238000011085 pressure filtration Methods 0.000 claims description 3
- 238000011084 recovery Methods 0.000 claims description 3
- 238000001291 vacuum drying Methods 0.000 claims description 3
- 238000003828 vacuum filtration Methods 0.000 claims description 3
- 238000005119 centrifugation Methods 0.000 claims description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 description 98
- 238000007254 oxidation reaction Methods 0.000 description 29
- 206010040844 Skin exfoliation Diseases 0.000 description 26
- 230000003647 oxidation Effects 0.000 description 25
- 230000007547 defect Effects 0.000 description 24
- 239000002994 raw material Substances 0.000 description 24
- 238000009826 distribution Methods 0.000 description 16
- 238000000635 electron micrograph Methods 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 10
- 239000007800 oxidant agent Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000001254 matrix assisted laser desorption--ionisation time-of-flight mass spectrum Methods 0.000 description 8
- 150000001721 carbon Chemical group 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000002798 polar solvent Substances 0.000 description 6
- 238000001237 Raman spectrum Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 5
- -1 plate-like graphite Chemical compound 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000004299 exfoliation Methods 0.000 description 3
- 239000002803 fossil fuel Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000003208 petroleum Substances 0.000 description 3
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 2
- 238000004482 13C cross polarization magic angle spinning Methods 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- 229940093475 2-ethoxyethanol Drugs 0.000 description 2
- YTTFFPATQICAQN-UHFFFAOYSA-N 2-methoxypropan-1-ol Chemical compound COC(C)CO YTTFFPATQICAQN-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229920004890 Triton X-100 Polymers 0.000 description 2
- 239000013504 Triton X-100 Substances 0.000 description 2
- NPYWBTRFOVOZNK-UHFFFAOYSA-L [O-]S([O-])(=O)=O.N.[Ce+4] Chemical compound [O-]S([O-])(=O)=O.N.[Ce+4] NPYWBTRFOVOZNK-UHFFFAOYSA-L 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 2
- 229940088601 alpha-terpineol Drugs 0.000 description 2
- 229910021383 artificial graphite Inorganic materials 0.000 description 2
- PCCNIENXBRUYFK-UHFFFAOYSA-O azanium;cerium(4+);pentanitrate Chemical compound [NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PCCNIENXBRUYFK-UHFFFAOYSA-O 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 239000003245 coal Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 229910003472 fullerene Inorganic materials 0.000 description 2
- 239000007770 graphite material Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 230000002687 intercalation Effects 0.000 description 2
- 238000009830 intercalation Methods 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920001983 poloxamer Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000001132 ultrasonic dispersion Methods 0.000 description 2
- 229910000667 (NH4)2Ce(NO3)6 Inorganic materials 0.000 description 1
- 229910019617 (NH4)4Ce(SO4)4 Inorganic materials 0.000 description 1
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 1
- 239000001263 FEMA 3042 Substances 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 239000010426 asphalt Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000000371 solid-state nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
- C01B32/19—Preparation by exfoliation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2204/00—Structure or properties of graphene
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2204/00—Structure or properties of graphene
- C01B2204/20—Graphene characterized by its properties
- C01B2204/22—Electronic properties
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/85—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by XPS, EDX or EDAX data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/86—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/89—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by mass-spectroscopy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/20—Particle morphology extending in two dimensions, e.g. plate-like
- C01P2004/24—Nanoplates, i.e. plate-like particles with a thickness from 1-100 nanometer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Conductive Materials (AREA)
Description
るようになる。
ポスコから入手した石油副産物であるピッチ(pitch)に対して次のような酸化工程および精製工程を行って製造例1の分散剤を製造した。
ポスコから入手した石油副産物であるピッチ(pitch;ただし、製造例1とは異なるサンプルのピッチを使用)を使用し、酸化反応時間をそれぞれ1時間(製造例2)、3.5時間(製造例3)および7時間(製造例4)で異にしたことを除いては、製造例1と同様な方法で行って製造例2乃至4の分散剤をそれぞれ製造した。
製造例3および4で得られた分散剤試料薬1mgを薄い箔の上で約900℃内外の高温で加熱した。この時、箔が瞬間的に溶けながらその温度が約1500乃至1800℃まで上昇し、このような高温により前記試料から気体が発生した。このような気体を捕集および元素分析して炭素、酸素、水素および窒素の各元素含有量を測定および分析した。このような分析結果は、各分散剤の製造のために使用されたピッチに対する分析結果と比較して下記表1に示した。
製造例1の分散剤0.1gが分散されている水分散液500mlに板状黒鉛2.5gを添加して分散液を形成した。このような分散液を約1,600barの高圧で高圧均質器の流入部に流入させて微細流路を通過させ、このような過程を10回繰り返した。これによって、前記板状黒鉛を剥離して実施例1のグラフェンフレークを製造した。
製造例1の分散剤の代わりに、製造例2の分散剤を使用したことを除いては、実施例1と同様な方法で実施例2のグラフェンフレークを製造した。
製造例1の分散剤の代わりに、商品名Triton X−100分散剤を使用したことを除いては、実施例1と同様な方法で実施例3のグラフェンフレークを製造した。
製造例1の分散剤の代わりに、商品名Pluronics F−127分散剤を使用したことを除いては、実施例1と同様な方法で実施例4のグラフェンフレークを製造した。
製造例1の分散剤など分散剤を使用せず、韓国公開特許公報第2013−0004638号の実施例に記載された方法で高圧均質器を使用して比較例1のグラフェンフレークを製造した。
まず、非酸化グラファイト2.5gを硫酸:硝酸=3:1(体積比)の混合酸溶液262.5mlに入れて85℃で20時間反応させた後、ice−cooled D.I.water 1Lで希釈し、反応溶液をvacuum filtrationして酸化グラファイトwet−cakeを製造した。
Claims (11)
- 非酸化グラファイトを含む炭素系素材および分散剤を含む分散液を形成する段階と、
前記分散液を連続的に、流入部と、流出部と、流入部と流出部間を連結し、10乃至800μmの直径を有する微細流路を含む高圧均質器(High Pressure Homogenizer)に通過させる段階と、を含み、
前記炭素系素材は、せん断力の印加下に前記微細流路を通過しながら剥離されてナノスケールの厚さを有するグラフェン(graphene)を生じるグラフェンの製造方法であって、
前記非酸化グラファイトは、燃焼による元素分析法(elemental analysis measurement by combustion)またはXPS分析法(X−ray photoelectron spectrometry analysis)で測定された酸素対炭素の元素比(O/C atomic ratio)が5%以下であり、
前記グラフェンは、0.3乃至50nmの厚さを有するグラフェンフレークを含み、
前記分散剤は、複数種のポリ芳香族炭化水素酸化物の混合物であって、分子量300乃至1000のポリ芳香族炭化水素酸化物を60重量%以上の含有量で含む混合物を含むグラフェンの製造方法。 - 前記非酸化グラファイトは、板状黒鉛を含む、請求項1に記載のグラフェンの製造方法。
- 前記分散液は、水溶媒または極性有機溶媒内に前記炭素系素材と分散剤が溶解または分散した分散液である、請求項1または2に記載のグラフェンの製造方法。
- 前記分散剤に含まれている複数種のポリ芳香族炭化水素酸化物を元素分析した時、酸素含有量が全体元素含有量の12乃至50重量%である、請求項1〜3のいずれか一項に記載のグラフェンの製造方法。
- 前記分散剤に含まれているポリ芳香族炭化水素酸化物は、5乃至30個のベンゼン環が含まれている芳香族炭化水素に酸素含有作用基が一つ以上結合された構造を有する、請求項1〜4のいずれか一項に記載のグラフェンの製造方法。
- 芳香族炭化水素は、7乃至20個のベンゼン環を構造内に有する、請求項5に記載のグラフェンの製造方法。
- 前記分散液は、100乃至3000barの圧力印加下に前記高圧均質器の流入部に流入して微細流路を通過する、請求項1〜6のいずれか一項に記載のグラフェンの製造方法。
- 前記グラフェンフレークは、0.1乃至10μmの直径を有し、50乃至6000の直径/厚さ比を有する、請求項1〜7のいずれか一項に記載のグラフェンの製造方法。
- 前記グラフェンフレークの分散液からグラフェンフレークを回収および乾燥する段階をさらに含む、請求項1〜8のいずれか一項に記載のグラフェンの製造方法。
- 前記回収段階は、遠心分離、減圧濾過または加圧濾過で行われる、請求項9に記載のグラフェンの製造方法。
- 前記乾燥段階は、30乃至200℃の温度下に真空乾燥して行われる、請求項9または10に記載のグラフェンの製造方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20130164672 | 2013-12-26 | ||
KR10-2013-0164672 | 2013-12-26 | ||
KR1020140187595A KR101682007B1 (ko) | 2013-12-26 | 2014-12-23 | 그래핀의 제조 방법 |
KR10-2014-0187595 | 2014-12-23 | ||
PCT/KR2014/012829 WO2015099457A1 (ko) | 2013-12-26 | 2014-12-24 | 그래핀의 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017502900A JP2017502900A (ja) | 2017-01-26 |
JP6300930B2 true JP6300930B2 (ja) | 2018-03-28 |
Family
ID=53789078
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016538052A Active JP6300930B2 (ja) | 2013-12-26 | 2014-12-24 | グラフェンの製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9950930B2 (ja) |
EP (1) | EP3056469B1 (ja) |
JP (1) | JP6300930B2 (ja) |
KR (1) | KR101682007B1 (ja) |
CN (1) | CN105849040B (ja) |
TW (1) | TWI543932B (ja) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10569243B2 (en) * | 2013-08-01 | 2020-02-25 | Lg Chem, Ltd. | Dispersing agent, its preparation method and dispersed composition of carbon-based material comprising the same |
KR101750935B1 (ko) | 2014-12-12 | 2017-06-27 | 주식회사 엘지화학 | 블록 공중합체, 및 이를 이용한 그래핀의 제조 방법 |
JP2018528917A (ja) * | 2015-09-25 | 2018-10-04 | エルジー・ケム・リミテッド | 最適化された流出部を含む板状物質の剥離装置 |
JP6674531B2 (ja) * | 2015-09-25 | 2020-04-01 | エルジー・ケム・リミテッド | マイクロチャンネルを含む板状物質の剥離装置 |
GB201517737D0 (en) | 2015-10-07 | 2015-11-18 | Cambridge Entpr Ltd | Layered materials and methods for their processing |
KR102049574B1 (ko) | 2015-10-30 | 2019-11-27 | 주식회사 엘지화학 | 자성 산화철-그래핀 복합체의 제조 방법 |
CN105540575A (zh) * | 2016-01-28 | 2016-05-04 | 成都新柯力化工科技有限公司 | 一种利用高压均质机剥离制备石墨烯的方法 |
KR102074545B1 (ko) | 2016-04-12 | 2020-02-06 | 주식회사 엘지화학 | 산화 그래핀-카본 복합체 및 그 제조방법 |
KR102086764B1 (ko) * | 2016-05-04 | 2020-03-09 | 주식회사 엘지화학 | 그래핀의 제조 방법 |
CN105819438B (zh) * | 2016-05-06 | 2018-04-17 | 成都新柯力化工科技有限公司 | 一种利用液力剪切规模化制备纳米石墨烯材料的方法 |
KR102079141B1 (ko) * | 2016-05-11 | 2020-02-19 | 주식회사 엘지화학 | 고압 균질화 장치 및 이를 이용한 그래핀의 제조방법 |
FR3051376B1 (fr) * | 2016-05-18 | 2021-02-12 | Univ Grenoble Alpes | Procede d'exfoliation de particules |
CA2972284C (en) * | 2016-07-05 | 2019-05-14 | Vln Advanced Technologies Inc. | Apparatus and method for preparing graphene by exfoliation of graphite using a pulsed or cavitating waterjet |
CN107840326A (zh) * | 2016-09-21 | 2018-03-27 | 比亚迪股份有限公司 | 一种制备石墨烯的方法 |
CN107879331A (zh) * | 2016-09-29 | 2018-04-06 | 河南烯碳合成材料有限公司 | 制造基面侧向尺寸大于50纳米的石墨烯的方法 |
KR102097814B1 (ko) * | 2016-10-18 | 2020-05-29 | 주식회사 엘지화학 | 고압 균질화 장치 및 이를 이용한 그래핀의 제조방법 |
KR102140262B1 (ko) * | 2017-01-20 | 2020-07-31 | 주식회사 엘지화학 | 질화붕소 나노플레이트의 제조 방법 및 질화붕소 나노플레이트-고분자 복합체의 제조방법 |
KR102176629B1 (ko) | 2017-04-28 | 2020-11-09 | 주식회사 엘지화학 | 그래핀 제조방법 |
TWI650287B (zh) * | 2017-05-04 | 2019-02-11 | 中原大學 | 散熱漿料及散熱結構的製造方法 |
CN107601479A (zh) * | 2017-10-16 | 2018-01-19 | 合肥工业大学 | 一种石墨烯的制备方法及该方法制备的石墨烯 |
CN108355807B (zh) * | 2018-01-12 | 2019-12-10 | 南阳师范学院 | 一种研磨剥离制备水性石墨的装置及方法 |
TWI692441B (zh) * | 2018-01-17 | 2020-05-01 | 中原大學 | 石墨烯結構、製備石墨烯的方法及包括石墨烯的鋰離子電池電極 |
EP3636592A1 (en) * | 2018-10-12 | 2020-04-15 | Advanced Material Development Limited | Liquid-exfoliated nanomaterials |
BR112021012136B1 (pt) * | 2018-12-21 | 2023-10-31 | Performance Nanocarbon,Inc. | Método para produzir um grafeno ou material semelhante ao grafeno |
KR102208807B1 (ko) | 2019-01-08 | 2021-01-28 | 주식회사 아이피씨 | 그래핀 스펀지 시트 및 이의 제조방법 |
CN109776984A (zh) * | 2019-02-18 | 2019-05-21 | 江苏杰辉新材料有限公司 | 一种石墨烯xps及其制备方法 |
CN111484006A (zh) * | 2020-01-17 | 2020-08-04 | 北京清烯科技有限公司 | 一种大面积石墨烯的制备方法 |
US11512265B1 (en) * | 2021-07-23 | 2022-11-29 | Turtle Wax, Inc. | Water-based graphene dispersion made by shear stabilization |
CN114890411B (zh) * | 2022-06-06 | 2024-02-02 | 深圳材启新材料有限公司 | 一种石墨烯水溶液的制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2176163B1 (en) * | 2007-08-01 | 2017-10-25 | Dow Global Technologies LLC | Highly efficient process for manufacture of exfoliated graphene |
US8501318B2 (en) | 2008-09-03 | 2013-08-06 | Nanotek Instruments, Inc. | Dispersible and conductive nano graphene platelets |
US8968695B2 (en) * | 2009-08-10 | 2015-03-03 | Idt International Co., Ltd. | Method of producing nano-size graphene-based material and an equipment for producing the same |
KR20120039799A (ko) * | 2010-10-18 | 2012-04-26 | 한국전기연구원 | 환원그래핀의 안정적 분산용액 제조방법 및 이에 의해 제조된 환원그래핀 분산용액 |
KR101264316B1 (ko) | 2010-11-09 | 2013-05-22 | 한국전기연구원 | 전단응력을 이용한 단일층 산화 그래핀 환원물 분산용액의 제조방법 및 이에 의해 제조된 단일층 산화 그래핀 환원물 분산용액 |
JP2012166989A (ja) | 2011-02-15 | 2012-09-06 | Vision Development Co Ltd | グラフェン積層ナノカーボン、その製造方法及びグラフェン積層ナノカーボン製造用触媒 |
EP2724347B1 (en) * | 2011-06-24 | 2017-12-06 | Brewer Science, Inc. | Highly soluble carbon nanotubes with enhanced conductivity |
KR101274441B1 (ko) * | 2011-07-04 | 2013-06-18 | (주)월드튜브 | 그래핀, 흑연 나노 플레이트의 혼합 분산액 및 그의 분말의 제조 방법 |
CN102249222B (zh) | 2011-07-08 | 2013-01-02 | 北京航空航天大学 | 一种射流空化技术制备石墨烯的装置及方法 |
US8734683B2 (en) | 2011-11-29 | 2014-05-27 | Xerox Corporation | Graphene nano-sheets and methods for making the same |
KR101297423B1 (ko) | 2011-11-30 | 2013-08-14 | 한국전기연구원 | 양이온-파이 상호작용에 의해 고농도 분산된 산화 그래핀 환원물 및 그 제조방법 |
KR101382016B1 (ko) | 2012-03-28 | 2014-04-04 | 주식회사 어플라이드카본나노 | 그래핀의 제조 방법 |
EP2851364A4 (en) | 2012-05-14 | 2015-12-30 | Univ Tokyo | NOVEL GRAPHENEANODISPERSION AND PROCESS FOR THE PREPARATION THEREOF |
KR101387007B1 (ko) | 2012-06-08 | 2014-04-18 | (주) 시온텍 | 그래핀의 제조방법 |
US10569243B2 (en) | 2013-08-01 | 2020-02-25 | Lg Chem, Ltd. | Dispersing agent, its preparation method and dispersed composition of carbon-based material comprising the same |
KR101666478B1 (ko) | 2013-12-26 | 2016-10-14 | 주식회사 엘지화학 | 그래핀의 제조 방법과, 그래핀의 분산 조성물 |
-
2014
- 2014-12-23 KR KR1020140187595A patent/KR101682007B1/ko active IP Right Grant
- 2014-12-24 US US15/039,655 patent/US9950930B2/en active Active
- 2014-12-24 JP JP2016538052A patent/JP6300930B2/ja active Active
- 2014-12-24 EP EP14875212.4A patent/EP3056469B1/en active Active
- 2014-12-24 CN CN201480071372.1A patent/CN105849040B/zh active Active
- 2014-12-25 TW TW103145519A patent/TWI543932B/zh active
Also Published As
Publication number | Publication date |
---|---|
TWI543932B (zh) | 2016-08-01 |
KR20150076105A (ko) | 2015-07-06 |
TW201538422A (zh) | 2015-10-16 |
US9950930B2 (en) | 2018-04-24 |
EP3056469A4 (en) | 2017-06-28 |
EP3056469B1 (en) | 2022-08-17 |
CN105849040B (zh) | 2018-01-02 |
US20170166449A1 (en) | 2017-06-15 |
CN105849040A (zh) | 2016-08-10 |
EP3056469A1 (en) | 2016-08-17 |
KR101682007B1 (ko) | 2016-12-02 |
JP2017502900A (ja) | 2017-01-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6300930B2 (ja) | グラフェンの製造方法 | |
JP6208364B2 (ja) | グラフェンの製造方法と、グラフェンの分散組成物 | |
Le Ba et al. | Review on the recent progress in the preparation and stability of graphene-based nanofluids | |
WO2015099457A1 (ko) | 그래핀의 제조 방법 | |
Dao et al. | Graphene prepared by thermal reduction–exfoliation of graphite oxide: Effect of raw graphite particle size on the properties of graphite oxide and graphene | |
Low et al. | Easy preparation of ultrathin reduced graphene oxide sheets at a high stirring speed | |
Asiya et al. | Graphene functionalized hybrid nanomaterials for industrial-scale applications: A systematic review | |
JP6106339B2 (ja) | 分散剤、その製造方法およびこれを含む炭素系素材の分散組成物 | |
KR101700355B1 (ko) | 탄소 나노 튜브의 제조 방법과, 탄소 나노 튜브의 분산 조성물 | |
US10472242B2 (en) | Method for preparing graphene by using high speed homogenization pretreatment and high pressure homogenation | |
WO2015099378A1 (ko) | 그래핀의 제조 방법과, 그래핀의 분산 조성물 | |
KR101103672B1 (ko) | 대량생산용 산화 그래핀의 원심분리형 연속 합성 정제 장치, 및 이를 이용한 산화 그래핀의 합성 정제 방법 | |
Ji et al. | High-yield production of highly conductive graphene via reversible covalent chemistry | |
KR20110101668A (ko) | 유기 용매에서의 분산성이 우수한 그라핀 화합물의 제조방법 | |
Kumanek et al. | Multi-layered graphenic structures as the effect of chemical modification of thermally treated anthracite | |
JP5447049B2 (ja) | グラフェン膜の製造方法 | |
KR20160131454A (ko) | 염료를 이용한 그래핀의 제조 방법 | |
Rahayu et al. | Reduction of Graphene Oxide: Controlled Synthesis by Microwave Irradiation | |
Tiwari | Innovative Graphene Technologies: Developments & Characterisation, Volume 1 | |
WO2015178631A1 (ko) | 탄소 나노 튜브의 제조 방법과, 탄소 나노 튜브의 분산 조성물 | |
KR20170067475A (ko) | 그래핀 분산액의 제조 방법 | |
JP6805440B2 (ja) | 層状物質を改質する方法およびそのための装置、ならびに改質されたグラファイトおよびそれを用いた二次電池用電極材料 | |
Verma et al. | Recent Advances in the Synthesis of Graphene and Its Derivative Materials | |
Al-Timimi et al. | Preparation of graphene with few layers and large scalability | |
Yao | Synthesis, processing and applications of carbonaceous nanomaterials |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170711 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170908 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171205 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180125 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180222 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180227 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6300930 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |