JP4994568B2 - シリカガラスルツボ - Google Patents
シリカガラスルツボ Download PDFInfo
- Publication number
- JP4994568B2 JP4994568B2 JP2003405059A JP2003405059A JP4994568B2 JP 4994568 B2 JP4994568 B2 JP 4994568B2 JP 2003405059 A JP2003405059 A JP 2003405059A JP 2003405059 A JP2003405059 A JP 2003405059A JP 4994568 B2 JP4994568 B2 JP 4994568B2
- Authority
- JP
- Japan
- Prior art keywords
- silica glass
- layer
- glass crucible
- thickness
- opaque
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 60
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 239000011148 porous material Substances 0.000 claims description 5
- 239000012535 impurity Substances 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 description 19
- 239000013078 crystal Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000465 moulding Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000001175 rotational moulding Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- -1 silicon alkoxide Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Glass Melting And Manufacturing (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
2 透明層
3 不透明層
Claims (1)
- 内表面側に透明シリカガラスからなる透明層を有し、この外周側に多数の閉気孔を含んだ不透明シリカガラスからなる不透明層を有するシリカガラスルツボにおいて、前記透明層の厚さを1としたとき、4〜6の厚さの前記不透明層を有し、前記不透明層は、不透明層の金属不純物濃度および/もしくはOH基濃度により、粘度が調整されて、1350℃における粘度が11.0ポイズ以上であり、かつ透明層のたわみ量に対し±15%以内のたわみ量を有することを特徴とするシリカガラスルツボ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003405059A JP4994568B2 (ja) | 2003-12-03 | 2003-12-03 | シリカガラスルツボ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003405059A JP4994568B2 (ja) | 2003-12-03 | 2003-12-03 | シリカガラスルツボ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005162549A JP2005162549A (ja) | 2005-06-23 |
JP4994568B2 true JP4994568B2 (ja) | 2012-08-08 |
Family
ID=34727870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003405059A Expired - Lifetime JP4994568B2 (ja) | 2003-12-03 | 2003-12-03 | シリカガラスルツボ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4994568B2 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8673163B2 (en) | 2008-06-27 | 2014-03-18 | Apple Inc. | Method for fabricating thin sheets of glass |
EP2404228B1 (en) | 2009-03-02 | 2020-01-15 | Apple Inc. | Techniques for strengthening glass covers for portable electronic devices |
JP5047227B2 (ja) * | 2009-05-27 | 2012-10-10 | ジャパンスーパークォーツ株式会社 | シリコン単結晶の製造方法及びシリコン単結晶引き上げ装置 |
US9778685B2 (en) | 2011-05-04 | 2017-10-03 | Apple Inc. | Housing for portable electronic device with reduced border region |
US9213451B2 (en) | 2010-06-04 | 2015-12-15 | Apple Inc. | Thin glass for touch panel sensors and methods therefor |
US8824140B2 (en) | 2010-09-17 | 2014-09-02 | Apple Inc. | Glass enclosure |
US9725359B2 (en) | 2011-03-16 | 2017-08-08 | Apple Inc. | Electronic device having selectively strengthened glass |
US10781135B2 (en) | 2011-03-16 | 2020-09-22 | Apple Inc. | Strengthening variable thickness glass |
US9128666B2 (en) | 2011-05-04 | 2015-09-08 | Apple Inc. | Housing for portable electronic device with reduced border region |
US10133156B2 (en) | 2012-01-10 | 2018-11-20 | Apple Inc. | Fused opaque and clear glass for camera or display window |
US8773848B2 (en) | 2012-01-25 | 2014-07-08 | Apple Inc. | Fused glass device housings |
US9946302B2 (en) * | 2012-09-19 | 2018-04-17 | Apple Inc. | Exposed glass article with inner recessed area for portable electronic device housing |
US9459661B2 (en) | 2013-06-19 | 2016-10-04 | Apple Inc. | Camouflaged openings in electronic device housings |
KR101771599B1 (ko) | 2013-12-28 | 2017-08-25 | 가부시키가이샤 섬코 | 석영 유리 도가니 및 그 제조 방법 |
US9886062B2 (en) | 2014-02-28 | 2018-02-06 | Apple Inc. | Exposed glass article with enhanced stiffness for portable electronic device housing |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6144793A (ja) * | 1984-08-09 | 1986-03-04 | Toshiba Ceramics Co Ltd | シリコン単結晶引上げ用石英ガラスルツボ |
JP2933404B2 (ja) * | 1990-06-25 | 1999-08-16 | 信越石英 株式会社 | シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 |
JPH04202086A (ja) * | 1990-11-29 | 1992-07-22 | Toshiba Ceramics Co Ltd | シリコン単結晶引上げ用石英ガラスルツボ |
-
2003
- 2003-12-03 JP JP2003405059A patent/JP4994568B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2005162549A (ja) | 2005-06-23 |
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