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HK1053152B - 在金屬表面上的無電鍍銀的鍍液及方法 - Google Patents

在金屬表面上的無電鍍銀的鍍液及方法

Info

Publication number
HK1053152B
HK1053152B HK03105382.2A HK03105382A HK1053152B HK 1053152 B HK1053152 B HK 1053152B HK 03105382 A HK03105382 A HK 03105382A HK 1053152 B HK1053152 B HK 1053152B
Authority
HK
Hong Kong
Prior art keywords
silver
metal surfaces
bath
electroless plating
copper
Prior art date
Application number
HK03105382.2A
Other languages
English (en)
Other versions
HK1053152A1 (en
Inventor
Hutchinson Carl
Mahlkow Hartmut
Sparing Christian
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of HK1053152A1 publication Critical patent/HK1053152A1/xx
Publication of HK1053152B publication Critical patent/HK1053152B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/42—Coating with noble metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
HK03105382.2A 2000-10-06 2003-07-25 在金屬表面上的無電鍍銀的鍍液及方法 HK1053152B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10050862A DE10050862C2 (de) 2000-10-06 2000-10-06 Bad und Verfahren zum stromlosen Abscheiden von Silber auf Metalloberflächen
PCT/EP2001/011020 WO2002029132A1 (en) 2000-10-06 2001-09-21 Bath and method of electroless plating of silver on metal surfaces

Publications (2)

Publication Number Publication Date
HK1053152A1 HK1053152A1 (en) 2003-10-10
HK1053152B true HK1053152B (zh) 2005-01-28

Family

ID=7659722

Family Applications (1)

Application Number Title Priority Date Filing Date
HK03105382.2A HK1053152B (zh) 2000-10-06 2003-07-25 在金屬表面上的無電鍍銀的鍍液及方法

Country Status (16)

Country Link
US (1) US6869637B2 (zh)
EP (1) EP1322798B1 (zh)
JP (1) JP2004510885A (zh)
KR (1) KR100809891B1 (zh)
CN (1) CN1276994C (zh)
AT (1) ATE275214T1 (zh)
AU (1) AU2002212274A1 (zh)
BR (1) BR0114155A (zh)
CA (1) CA2417071A1 (zh)
DE (2) DE10050862C2 (zh)
ES (1) ES2227295T3 (zh)
HK (1) HK1053152B (zh)
MX (1) MXPA03000899A (zh)
MY (1) MY137750A (zh)
TW (1) TWI242607B (zh)
WO (1) WO2002029132A1 (zh)

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DE10226328B3 (de) * 2002-06-11 2004-02-19 Atotech Deutschland Gmbh Saure Lösung zur Silberabscheidung und Verfahren zum Abscheiden von Silberschichten auf Metalloberflächen
EP1245697A3 (de) * 2002-07-17 2003-02-19 ATOTECH Deutschland GmbH Verfahren zum aussenstromlosen Abscheiden von Silber
FI20030816A (fi) * 2003-05-30 2004-12-01 Metso Corp Menetelmä metallijohtimien valmistamiseksi substraatille
AT500807B1 (de) * 2004-01-23 2006-11-15 Austria Tech & System Tech Verfahren zum herstellen eines leiterplattenelements sowie leiterplattenelement
US8349393B2 (en) * 2004-07-29 2013-01-08 Enthone Inc. Silver plating in electronics manufacture
JP4660701B2 (ja) * 2004-12-03 2011-03-30 Ｄｏｗａエレクトロニクス株式会社 銀被覆銅粉およびその製造方法並びに導電ペースト
KR100782810B1 (ko) * 2005-01-07 2007-12-06 삼성전자주식회사 확장 검색 기능을 제공하기 위한 메타데이터가 기록된 저장매체를 재생하는 방법 및 장치
DE102005038392B4 (de) * 2005-08-09 2008-07-10 Atotech Deutschland Gmbh Verfahren zum Herstellen von Muster bildenden Kupferstrukturen auf einem Trägersubstrat
US7767009B2 (en) * 2005-09-14 2010-08-03 OMG Electronic Chemicals, Inc. Solution and process for improving the solderability of a metal surface
JP5036216B2 (ja) * 2006-05-19 2012-09-26 四国化成工業株式会社 金属の表面処理剤およびその利用
KR100794804B1 (ko) * 2006-08-01 2008-01-14 주식회사 에이스테크놀로지 은도금 처리방법
US7883738B2 (en) * 2007-04-18 2011-02-08 Enthone Inc. Metallic surface enhancement
US10017863B2 (en) * 2007-06-21 2018-07-10 Joseph A. Abys Corrosion protection of bronzes
DE102007040065A1 (de) * 2007-08-24 2009-02-26 Ormecon Gmbh Artikel mit einer nanoskopischen Beschichtung aus Edel-/Halbedelmetall sowie Verfahren zu deren Herstellung
TWI453301B (zh) 2007-11-08 2014-09-21 Enthone 浸鍍銀塗層上的自組分子
US7972655B2 (en) * 2007-11-21 2011-07-05 Enthone Inc. Anti-tarnish coatings
US8869165B2 (en) * 2008-03-20 2014-10-21 International Business Machines Corporation Integrating flow orchestration and scheduling of jobs and data activities for a batch of workflows over multiple domains subject to constraints
AT11005U1 (de) * 2008-09-24 2010-02-15 Austria Tech & System Tech Verfahren zum verbessern der korrosionsbeständigkeit einer elektronischen komponente, insbesondere von leiterbahnen einer leiterplatte
RU2588605C2 (ru) 2010-02-25 2016-07-10 Мерк Патент Гмбх Способ обработки электрода для органического электронного устройства
WO2011160754A1 (en) 2010-06-24 2011-12-29 Merck Patent Gmbh Process for modifying electrodes in an organic electronic device
US9663667B2 (en) 2013-01-22 2017-05-30 Andre Reiss Electroless silvering ink
KR101536446B1 (ko) * 2013-12-06 2015-07-13 주식회사 포스코 Ｏｌｅｄ 조명용 기판 및 그 제조방법
KR101478486B1 (ko) 2014-05-12 2014-12-31 성균관대학교산학협력단 자발적 치환 반응을 이용한 은 코팅 구리 분말 제조 방법
CN104619133B (zh) * 2015-01-20 2017-12-29 江门崇达电路技术有限公司 一种全面化银线路板的制作方法
JP6666723B2 (ja) * 2015-03-31 2020-03-18 Ｄｏｗａエレクトロニクス株式会社 銀被覆テルル粉及びその製造方法、並びに導電性ペースト
US20160351522A1 (en) * 2015-05-27 2016-12-01 Freescale Semiconductor, Inc. Package-on-package device and cavity formation by solder removal for package interconnection
DE102016110377A1 (de) 2016-06-06 2017-12-07 Harting Ag & Co. Kg Verfahren zur Herstellung von elektrischen Kontakten mit einer Silber-Wolfram-Legierung und ein Elektrolyt zum stromlosen/elektrolytischen Abscheiden von einer Silber-Wolfram-Legierung
US20190029122A1 (en) * 2017-07-19 2019-01-24 Anaren, Inc. Encapsulation of circuit trace
CN109423635A (zh) * 2017-08-22 2019-03-05 深圳市虹喜科技发展有限公司 一种印制线路板表面处理用化学镀银溶液
CN110927231B (zh) * 2019-12-31 2022-08-19 嘉兴学院 一种离子色谱安培检测用银电极的处理方法
CN114959666A (zh) * 2022-05-12 2022-08-30 李正新 化学镀银液以及化学镀银新方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2602757A (en) * 1948-04-09 1952-07-08 Morris S Kantrowitz Method and composition for producing silver coatings
GB1022061A (en) * 1962-01-19 1966-03-09 Mitsubishi Electric Corp Solutions for immersion plating gold and silver
US3294578A (en) * 1963-10-22 1966-12-27 Gen Aniline & Film Corp Deposition of a metallic coat on metal surfaces
SU501116A1 (ru) 1973-05-18 1976-01-30 Предприятие П/Я А-7284 Раствор дл иммерсионного серебрени меди
DE3148330A1 (de) * 1981-12-07 1983-06-09 Max Planck Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Verfahren zur stromlosen abscheidung von edelmetallschichten auf oberflaechen von unedlen metallen
GB8703664D0 (en) 1987-02-17 1987-03-25 Green A Electroless silver plating composition
CA1326467C (en) * 1987-04-22 1994-01-25 Kouichi Iwata Process for producing a superconducting article
JPH05287542A (ja) 1992-04-08 1993-11-02 Mitsubishi Paper Mills Ltd 無電解銀メッキ方法
JPH06240463A (ja) * 1993-02-22 1994-08-30 Mitsubishi Paper Mills Ltd 金属微粉末の無電解銀鍍金方法
GB9425030D0 (en) 1994-12-09 1995-02-08 Alpha Metals Ltd Silver plating
GB9425031D0 (en) 1994-12-09 1995-02-08 Alpha Metals Ltd Printed circuit board manufacture
US5733599A (en) 1996-03-22 1998-03-31 Macdermid, Incorporated Method for enhancing the solderability of a surface
JP3419995B2 (ja) 1996-05-10 2003-06-23 株式会社大和化成研究所 無電解錫−銀合金めっき浴
JP3915850B2 (ja) * 1996-09-06 2007-05-16 ソニー株式会社 光学装置及び電解液
JP3532046B2 (ja) * 1996-10-25 2004-05-31 株式会社大和化成研究所 非シアン置換銀めっき浴
US5871896A (en) * 1997-05-30 1999-02-16 Eastman Kodak Company Preparation and use of a dimethylamine silver bromide complex as a single source precursor for nucleation of silver bromide crystals

Also Published As

Publication number Publication date
HK1053152A1 (en) 2003-10-10
KR100809891B1 (ko) 2008-03-06
ATE275214T1 (de) 2004-09-15
CN1468324A (zh) 2004-01-14
DE10050862C2 (de) 2002-08-01
US6869637B2 (en) 2005-03-22
AU2002212274A1 (en) 2002-04-15
KR20030057530A (ko) 2003-07-04
DE60105305T2 (de) 2005-09-29
BR0114155A (pt) 2003-07-29
JP2004510885A (ja) 2004-04-08
MXPA03000899A (es) 2003-06-24
CN1276994C (zh) 2006-09-27
US20030157264A1 (en) 2003-08-21
TWI242607B (en) 2005-11-01
EP1322798B1 (en) 2004-09-01
EP1322798A1 (en) 2003-07-02
CA2417071A1 (en) 2002-04-11
WO2002029132A1 (en) 2002-04-11
ES2227295T3 (es) 2005-04-01
MY137750A (en) 2009-03-31
DE10050862A1 (de) 2002-04-25
DE60105305D1 (de) 2004-10-07

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20100921