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EP1100092A2 - Dispositif de guidage de rayons-x - Google Patents

Dispositif de guidage de rayons-x Download PDF

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Publication number
EP1100092A2
EP1100092A2 EP00123501A EP00123501A EP1100092A2 EP 1100092 A2 EP1100092 A2 EP 1100092A2 EP 00123501 A EP00123501 A EP 00123501A EP 00123501 A EP00123501 A EP 00123501A EP 1100092 A2 EP1100092 A2 EP 1100092A2
Authority
EP
European Patent Office
Prior art keywords
reflection
measurement object
reflection surfaces
coating
reflection surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP00123501A
Other languages
German (de)
English (en)
Other versions
EP1100092B1 (fr
EP1100092A3 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Helmut Fischer GmbH and Co
Original Assignee
Helmut Fischer GmbH and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helmut Fischer GmbH and Co filed Critical Helmut Fischer GmbH and Co
Publication of EP1100092A2 publication Critical patent/EP1100092A2/fr
Publication of EP1100092A3 publication Critical patent/EP1100092A3/fr
Application granted granted Critical
Publication of EP1100092B1 publication Critical patent/EP1100092B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Definitions

  • the invention relates to a device for guiding X-rays from a Radiation source to a measurement object.
  • the X-ray fluorescence method is used to measure thin layers or multiple layers used.
  • the X-ray fluorescence radiation of the individual elements of a sample and verified in Layer thickness (es) and composition (s) is converted.
  • the stimulating X-rays are blocked by a collimator system as fine Beams of rays to the measuring surface. From here the X-ray fluorescence radiation emitted. In a proportional counter tube or other detector the radiation is detected in an energy-dispersive manner.
  • x-ray radiation guides which enable that the X-rays focus on these small functional areas becomes.
  • monocapillaries These are so-called monocapillaries. These monocapillaries are cylindrical designed in the form of a glass tube. By total reflection on the Walls of the glass tube allow the X-rays to be sufficient Intensity to the object to be measured.
  • the collimators designed as monocapillaries are moreover in this regard have been developed so that the inner walls of the glass tube are parabolic are formed so that a focusing of the reflected rays to the measurement object should be done.
  • So-called polycapillaries are also known.
  • it is a monolith that is a bundle of several monocapillaries has, which in turn are arranged such that the specifically guided X-rays emanate at a point outside the exit plane of the Focus on monoliths.
  • the invention is therefore based on the object of a device for guiding the x-rays from a radiation source to a measurement object, in particular for small structure sizes with a functional area under 100 ⁇ m x 100 ⁇ m create, which are inexpensive to manufacture, on the measuring surface to be measured adjustable and a sufficient transmission of the radiation intensity to the measurement object enables.
  • the inventive design of at least two forming a gap Reflective surfaces have the advantage that a simple arrangement is created which allows the x-rays to be of sufficient intensity be guided to the measurement object in order to enable the detector to achieve a sufficient level Can detect the intensity of the emitted fluorescence radiation.
  • At least two reflection surfaces forming a gap are simple to manufacture. Elaborate manufacturing processes for manufacturing the device for X-ray guidance is compared to that of the prior art known mono- and / or polycapillaries are not given.
  • the X-rays by total reflection within a gap to the measurement object formed by at least two reflection surfaces be performed.
  • the X-ray radiation emerging laterally from the column or columns is ineffective for excitation of fluorescent radiation, however by total reflection of the X-rays between the at least two ones Gap-forming reflection surfaces will have an at least sufficient intensity the test object initiated or transferred.
  • the adjustable in width by the gap formed by the at least two reflection surfaces is. This enables the size of the measuring surface to be on the measurement object is adjustable. Thus, the device can respond to different requirements Layer thickness measurement can be adjusted and adjusted.
  • two mutually opposite and parallel reflection surfaces are provided.
  • the gap width is at least close to that Size of the measuring surface of the test objects and advantageously on the outlet opening adapted to the X-ray tube so that the greatest possible radiation intensity can be transferred to the test object.
  • two a gap lying opposite one another and tapering towards the measurement object having reflection surfaces are provided.
  • This approximately wedge-shaped Arrangement of the reflection surfaces can additionally focus the X-rays be achieved.
  • the opening width of the reflection surfaces between the entrance and the exit provided at the tapered end can in Micrometer range or larger.
  • fixed at least one of the reflection surfaces and at least one further reflection surface is adjustable in distance and / or angle. This can make you dependent Depending on the application, both distance / and or angle are set with a reflection surface serving as a reference surface.
  • the reflection surfaces made of a semiconductor material, in particular a silicon wafer are manufactured.
  • the industrial production of silicon wafers is now in the meantime inexpensive.
  • the silicon wafers also have very flat design on a surface that is suitable for the total reflection of the X-rays are suitable.
  • the critical angle of total reflection is at a few mrad depending on the energy of the X-rays.
  • the reflection surfaces at least partially with a precious metal preferably copper, silver, gold, platinum, or palladium the like is steamed.
  • a precious metal preferably copper, silver, gold, platinum, or palladium the like is steamed.
  • the critical angle can be, for example, with a platinum coating be increased to 4.5 mrad, making the critical angle for total reflection can be increased. This in turn leads to the effect that a higher one The intensity of the X-rays on the measurement object is present, which makes it sufficient high intensity for emitting fluorescent beams can be given.
  • the coating at least partially on the beam exit of the X-ray tube facing end is provided. This allows a variety of X-rays are reflected by total reflection in the entrance area, causing a high intensity can be achieved.
  • the reflective surfaces near the measurement object have an area which is a Has coating which prevents total reflection or at least partially coated reflection surfaces has an area without coating or in which a coating preventing total reflection is provided. This can allow the total reflection of rays to be eliminated which is after a last reflection before exiting the reflection surfaces would be outside the measuring range. With this arrangement, a even more precise irradiation of the measuring surface can be achieved on a measuring object, which in turn increases the quality of the measurement.
  • At least a reflection surface can be set by at least one adjustment unit.
  • This Adjustment unit can advantageously as a fine mechanical adjustment electrical, hydraulic, pneumatic or piezoelectric actuator his.
  • This setting unit must have settings at least in the micrometer range allow for an exact alignment and adjustment of the least there are two mutually arranged reflection surfaces.
  • FIG 1 the essential components of a layer thickness measuring device are shown schematically 11, with the representation of an evaluation unit, one Screen for the visualization of a picture taken by a video camera DUT and input keyboard and printer was dispensed with.
  • This Layer thickness measuring device 11 is used, for example, for measuring bond pads, contacts, which are partially provided with selective coating, conductor tracks and functional coatings used on small areas.
  • Layer thicknesses determined or checked their measuring surface or the functional surfaces are smaller than 100 ⁇ m x 100 ⁇ m, in particular smaller than 50 ⁇ m x 50 ⁇ m.
  • an X-ray radiation is generated, which via an anode 14 is directed to a measurement object 16.
  • the X-rays are used in one Layer of the measurement object 16 excited fluorescence radiation.
  • the intensity this fluorescence radiation as a function of energy (spectrum) is one Function of the layer thickness. This or the parameter of the layer system is used, in which with the aid of a detector 17 the system of emitted radiation is registered.
  • Device 12 is provided, which according to the embodiment of two mutually opposite reflection surfaces 18. These reflective surfaces 18 are used for beam bundling and beam transmission, so that the X-ray radiation reaches the measuring surface of the measuring object 16.
  • the reflective surfaces 18 are preferably directly to the anode 14 or to an outlet flange 21 arranged near the anode 14.
  • a collimator 23 is also provided, whereby a measuring area 24 according to FIG. 3 is imaged on a measurement object can.
  • the collimator 23 is advantageously a slit collimator, the Gap width is adjustable.
  • the reflection surfaces 18 are designed as elongated, rectangular surfaces, as can be seen from Figure 1 and Figure 2.
  • the length of the reflection surfaces 18 is essentially determined by the structure and by the degree of total reflection. X-rays that are not parallel between an axis of the measuring range 24 and the anode 14 are at least once by a total reflection distracted.
  • the width of the reflection surfaces 18 is at least one and a half times as large as the maximum functional area to be tested.
  • Advantageously 18 silicon wafers used for the reflection surfaces.
  • This inexpensive Base material can be the appropriate size of the device according to the invention 12 can be easily adjusted.
  • the reflection surfaces 18 made from a silicon wafer are advantageously applied to holding elements 26, 27 according to FIG. 3.
  • these are glued tension-free so that the flatness of the reflective surface 18 can be maintained.
  • the reflective surfaces 18 also tension-free on the holding elements 26, 27 by clamping or the like can be fixed.
  • Figure 3 engages one of the two holding elements 27 to an adjusting unit 28 through which a holding element 27 closes the fixed element 26 is adjustable.
  • the holding element 26 advantageously takes the reflection surface 18 parallel to the central axis 29 of the device 12 on.
  • the gap width can be set by the setting unit 28.
  • the angularity of the holding element 27 to the element 26 is adjustable is.
  • a mirror-image arrangement can also be provided.
  • an adjusting unit 28 is provided on each of the holding elements 26, 27 , whereby the holding elements 26, 27 either be arranged parallel to one another and / or at an angle to one another can, so that a uniform or tapering gap to the measurement object 16th is formed.
  • the setting unit 28 is designed such that gap widths, for example can be set in a range from 10 to 100 ⁇ m can. Fine mechanical adjustment mechanisms, piezoelectric Actuators, as well as electric, hydraulic, pneumatic actuators be provided.
  • the reflection surface 18 can be vapor-coated with a noble metal, for example. This allows the critical angle for total reflection, that for silicon at 1.5 mrad is increased to 4.5 mrad by a platinum coating. This in turn has an advantageous effect on the transmission of the X-rays.
  • the base material can consist of a quartz surface or a plastic material which fulfills the requirement for flatness and has a coating.
  • the coating can advantageously be provided at least at the entrance of the reflection surfaces 18, so that the number of captured and reflected rays is as large as possible.
  • the coating can be continued completely over the course along the reflection surfaces 18 or can also be provided only partially.
  • the coating or the material of the coating can also change depending on the application.
  • the divergence at the exit of the reflection surfaces 18 can be reduced, as a result of which the radiation can be focused and thereby an increase in intensity on the measurement area 24 of the measurement object 16.
  • a coating is not provided in a region near the lower end 22 of the reflection surface 18 or that a coating preventing total reflection is provided, as a result of which the radiation emerging below the reflection surface 18 precisely matches the size of the measuring region 24 from the measurement object 16 is focused. The irradiation of edge areas outside of the measuring area 24 can thereby be considerably reduced.
  • the collimator 23 can also be adapted to this measuring range, so that by focusing the Radiation enables an increase in intensity to a predetermined measuring range is.
  • the reflection surfaces 18 at least slightly are concave.
  • the concave formation can become lower Taper end 22 out, so that a kind of mouthpiece-shaped design of the reflection surfaces 18 is given.
  • the dimensions must be taken into account which can also be in the micrometer range.
  • the opening width of the reflection surfaces 18 at the entrance to the device 12 corresponds essentially the outlet opening of those emitted via the anode X-rays.
  • a slightly larger or smaller opening width can also be used given the diameter of the primary spot of the X-rays his.
  • the device 12 can furthermore have openings and receptacles, which serve to arrange an optics to the measurement object 16 by a Visualize video camera.
  • the device 12 is according to the embodiment by two to each other arranged reflection surfaces 18 which are parallel or at an acute angle to each other are arranged, provided. It can also be provided that instead of these two reflecting surfaces 18, three or more reflecting surfaces are suitably arranged to each other to control the transmission of X-rays to the measuring area 24 of a measurement object 16, so that enables an increase in intensity by focusing the X-rays is.
  • these two reflecting surfaces 18, three or more reflecting surfaces are suitably arranged to each other to control the transmission of X-rays to the measuring area 24 of a measurement object 16, so that enables an increase in intensity by focusing the X-rays is.
  • it is not necessary that a closed, tubular arrangement is used to hold the x-rays to focus to the measuring range by total reflection. More geometrical Embodiments of the reflection surfaces 18 are also conceivable, which the Allow total reflection of the X-rays.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • X-Ray Techniques (AREA)
  • Radiation-Therapy Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP00123501A 1999-11-12 2000-10-27 Dispositif de guidage de rayons-x Expired - Lifetime EP1100092B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19954520 1999-11-12
DE19954520A DE19954520A1 (de) 1999-11-12 1999-11-12 Vorrichtung zur Führung von Röntgenstrahlen

Publications (3)

Publication Number Publication Date
EP1100092A2 true EP1100092A2 (fr) 2001-05-16
EP1100092A3 EP1100092A3 (fr) 2003-03-26
EP1100092B1 EP1100092B1 (fr) 2006-07-19

Family

ID=7928847

Family Applications (1)

Application Number Title Priority Date Filing Date
EP00123501A Expired - Lifetime EP1100092B1 (fr) 1999-11-12 2000-10-27 Dispositif de guidage de rayons-x

Country Status (7)

Country Link
US (1) US6438209B1 (fr)
EP (1) EP1100092B1 (fr)
JP (1) JP2001201599A (fr)
CN (1) CN1202416C (fr)
AT (1) ATE333702T1 (fr)
DE (2) DE19954520A1 (fr)
HK (1) HK1035400A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1193492B1 (fr) * 2000-09-27 2007-08-08 Euratom Collimateur de microfaisceau pour l'analyse en diffraction de rayons X à l'aide de diffractomètres conventionnels

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007304063A (ja) * 2006-05-15 2007-11-22 Shimadzu Corp ソーラスリット
WO2011146758A2 (fr) * 2010-05-19 2011-11-24 Silver Eric H Appareil optique à rayons x hybride et procédés
EP3115809B1 (fr) * 2015-07-06 2021-04-28 Exruptive A/S Procédé de balayage de sécurité d'articles à bagages à main et système de balayage de sécurité d'articles à bagages à main
WO2017009302A1 (fr) * 2015-07-14 2017-01-19 Koninklijke Philips N.V. Imagerie avec un rayonnement de rayons x amélioré
DE102022105838B3 (de) 2022-03-14 2023-08-17 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Justiereinheit für eine Röntgenoptik in einem Röntgenfluoreszenzgerät sowie Röntgenfluoreszenzgerät

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2217036A (en) * 1988-03-11 1989-10-18 Rosser Roy J Saddle-toriod mirrors.
US5101422A (en) * 1990-10-31 1992-03-31 Cornell Research Foundation, Inc. Mounting for X-ray capillary
JPH06283583A (ja) * 1993-03-25 1994-10-07 Towa Kagaku Kk 表面異物分析用ウエハ及びウエハ表面の金属不純物の評価方法
EP0724150A1 (fr) * 1994-07-08 1996-07-31 Muradin Abubekirovich Kumakhov Dispositif d'obtention d'une image d'un objet utilisant un courant de particules neutres ou chargees et une lentille de conversion dudit courant de particules neutres ou chargees
JPH10221500A (ja) * 1997-02-03 1998-08-21 Olympus Optical Co Ltd 軟ｘ線検査装置
EP0873565A2 (fr) * 1996-01-10 1998-10-28 Bastian Niemann Systeme de condensateur-monochromateur pour rayonnement x
JPH11132970A (ja) * 1997-11-01 1999-05-21 Horiba Ltd 螢光ｘ線分析装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4958363A (en) * 1986-08-15 1990-09-18 Nelson Robert S Apparatus for narrow bandwidth and multiple energy x-ray imaging
EP0322408B1 (fr) * 1986-08-15 1993-05-05 Commonwealth Scientific And Industrial Research Organisation Instruments de conditionnement de faisceaux a rayons x ou a neutrons
US5001737A (en) * 1988-10-24 1991-03-19 Aaron Lewis Focusing and guiding X-rays with tapered capillaries

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2217036A (en) * 1988-03-11 1989-10-18 Rosser Roy J Saddle-toriod mirrors.
US5101422A (en) * 1990-10-31 1992-03-31 Cornell Research Foundation, Inc. Mounting for X-ray capillary
JPH06283583A (ja) * 1993-03-25 1994-10-07 Towa Kagaku Kk 表面異物分析用ウエハ及びウエハ表面の金属不純物の評価方法
EP0724150A1 (fr) * 1994-07-08 1996-07-31 Muradin Abubekirovich Kumakhov Dispositif d'obtention d'une image d'un objet utilisant un courant de particules neutres ou chargees et une lentille de conversion dudit courant de particules neutres ou chargees
EP0873565A2 (fr) * 1996-01-10 1998-10-28 Bastian Niemann Systeme de condensateur-monochromateur pour rayonnement x
JPH10221500A (ja) * 1997-02-03 1998-08-21 Olympus Optical Co Ltd 軟ｘ線検査装置
JPH11132970A (ja) * 1997-11-01 1999-05-21 Horiba Ltd 螢光ｘ線分析装置

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 01, 28. Februar 1995 (1995-02-28) & JP 06 283583 A (TOWA KAGAKU KK), 7. Oktober 1994 (1994-10-07) *
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 13, 30. November 1998 (1998-11-30) & JP 10 221500 A (OLYMPUS OPTICAL CO LTD), 21. August 1998 (1998-08-21) *
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 10, 31. August 1999 (1999-08-31) & JP 11 132970 A (HORIBA LTD), 21. Mai 1999 (1999-05-21) *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1193492B1 (fr) * 2000-09-27 2007-08-08 Euratom Collimateur de microfaisceau pour l'analyse en diffraction de rayons X à l'aide de diffractomètres conventionnels
US7397900B2 (en) 2000-09-27 2008-07-08 Euratom Micro beam collimator for high resolution XRD investigations with conventional diffractometers

Also Published As

Publication number Publication date
JP2001201599A (ja) 2001-07-27
DE50013184D1 (de) 2006-08-31
HK1035400A1 (en) 2001-11-23
US6438209B1 (en) 2002-08-20
EP1100092B1 (fr) 2006-07-19
EP1100092A3 (fr) 2003-03-26
CN1296178A (zh) 2001-05-23
DE19954520A1 (de) 2001-05-17
CN1202416C (zh) 2005-05-18
ATE333702T1 (de) 2006-08-15

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