DE602004031510D1 - Silikonharzzusammensetzung und formkörper daraus - Google Patents
Silikonharzzusammensetzung und formkörper darausInfo
- Publication number
- DE602004031510D1 DE602004031510D1 DE602004031510T DE602004031510T DE602004031510D1 DE 602004031510 D1 DE602004031510 D1 DE 602004031510D1 DE 602004031510 T DE602004031510 T DE 602004031510T DE 602004031510 T DE602004031510 T DE 602004031510T DE 602004031510 D1 DE602004031510 D1 DE 602004031510D1
- Authority
- DE
- Germany
- Prior art keywords
- resin composition
- silicone resin
- form body
- silicone
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011342 resin composition Substances 0.000 title 1
- 229920002050 silicone resin Polymers 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
- C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/068—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003088739 | 2003-03-27 | ||
| PCT/JP2004/003828 WO2004085501A1 (ja) | 2003-03-27 | 2004-03-22 | シリコーン樹脂組成物及びその成形体 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE602004031510D1 true DE602004031510D1 (de) | 2011-04-07 |
Family
ID=33095127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602004031510T Expired - Lifetime DE602004031510D1 (de) | 2003-03-27 | 2004-03-22 | Silikonharzzusammensetzung und formkörper daraus |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7385017B2 (de) |
| EP (1) | EP1607419B1 (de) |
| JP (1) | JP4558643B2 (de) |
| KR (1) | KR101067011B1 (de) |
| CN (1) | CN100339408C (de) |
| DE (1) | DE602004031510D1 (de) |
| TW (1) | TW200427782A (de) |
| WO (1) | WO2004085501A1 (de) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004034362A1 (de) * | 2004-07-16 | 2006-02-09 | Kodak Polychrome Graphics Gmbh | Lithographie-Druckplatten mit hoher Auflagenbeständigkeit |
| CN100545184C (zh) * | 2004-09-27 | 2009-09-30 | 新日铁化学株式会社 | 含有二氧化硅的有机硅树脂组合物及其成型体 |
| JP4906289B2 (ja) * | 2005-08-26 | 2012-03-28 | 日本合成化学工業株式会社 | 樹脂成形体、及びその用途 |
| US20070260008A1 (en) * | 2005-09-21 | 2007-11-08 | Takashi Saito | Silica-Containing Silicone Resin Composition and Its Molded Product |
| JP4400751B2 (ja) * | 2006-10-24 | 2010-01-20 | 信越化学工業株式会社 | 光及び熱硬化性コーティング剤組成物及びその硬化皮膜を有する物品 |
| CN101542332A (zh) * | 2006-11-30 | 2009-09-23 | 新日铁化学株式会社 | 偏振片保护膜、偏振片及电阻膜式触摸面板 |
| JP5221122B2 (ja) * | 2007-12-28 | 2013-06-26 | 株式会社朝日ラバー | シリコーン樹脂基材 |
| EP2103642B1 (de) * | 2008-03-20 | 2018-03-07 | Koito Manufacturing Co., Ltd. | Leichtgewichtige optische Linsen auf Grundlage einer Siloxanzusammensetzung |
| JP5688973B2 (ja) * | 2008-08-26 | 2015-03-25 | 関西ペイント株式会社 | 重合性官能基を有するシルセスキオキサン化合物 |
| US8575383B2 (en) * | 2008-10-15 | 2013-11-05 | Kansai Paint Co., Ltd. | Silsesquioxane compound having polymerizable functional group |
| TW201038681A (en) * | 2009-02-17 | 2010-11-01 | Nippon Steel Chemical Co | Polarizing plate having a silicone coated hardened film and a liquid crystal display device |
| JP5457051B2 (ja) * | 2009-03-05 | 2014-04-02 | 新日鉄住金化学株式会社 | 位相差フィルム及びその製造方法 |
| JP5688014B2 (ja) * | 2009-05-29 | 2015-03-25 | 新日鉄住金化学株式会社 | シリコーン系保護膜を有する偏光板及び画像表示装置 |
| JPWO2011105401A1 (ja) * | 2010-02-26 | 2013-06-20 | 新日鉄住金化学株式会社 | コーティング剤組成物 |
| KR101911421B1 (ko) | 2011-06-30 | 2018-10-25 | 삼성디스플레이 주식회사 | 보호용 윈도우 및 보호용 윈도우를 포함하는 표시 장치 |
| JP5841835B2 (ja) | 2011-12-26 | 2016-01-13 | 新日鉄住金化学株式会社 | 硬化性樹脂組成物、硬化物および光学物品 |
| US9428605B2 (en) * | 2012-11-08 | 2016-08-30 | Neo Sitech Llc | Organic-inorganic hybrid material compositions and polymer composites |
| JP6338327B2 (ja) * | 2013-06-27 | 2018-06-06 | 株式会社カネカ | 硬化性樹脂組成物、該組成物を硬化させてなる硬化物 |
| KR102170818B1 (ko) * | 2013-12-26 | 2020-10-28 | 주식회사 동진쎄미켐 | 열 용융-압출 성형이 가능한 실세스퀴옥산, 이를 이용한 고투명 및 고내열 플라스틱 투명기판 및 이의 제조방법 |
| JP6439277B2 (ja) * | 2014-05-28 | 2018-12-19 | 三菱ケミカル株式会社 | 硬化性樹脂組成物、その硬化物、光学部材及びコーティング物 |
| US10655034B2 (en) * | 2014-07-29 | 2020-05-19 | Ofs Fitel, Llc | UV-curable silsesquioxane-containing write-through optical fiber coatings for fabrication of optical fiber Bragg gratings, and fibers made therefrom |
| JP2016038578A (ja) * | 2014-08-08 | 2016-03-22 | キヤノン株式会社 | 帯電部材、プロセスカートリッジ及び電子写真画像形成装置 |
| WO2018212063A1 (ja) * | 2017-05-19 | 2018-11-22 | 東レ株式会社 | コンタクトレンズ用組成物、およびコンタクトレンズとその製造方法 |
| WO2020162615A1 (ja) | 2019-02-08 | 2020-08-13 | 日鉄ケミカル＆マテリアル株式会社 | 光硬化性シリコーン樹脂組成物及びそれを硬化させたシリコーン樹脂成形体、並びに当該成形体の製造方法 |
| JP2022098954A (ja) | 2020-12-22 | 2022-07-04 | 日鉄ケミカル＆マテリアル株式会社 | 光硬化性シリコーン樹脂組成物及びそれを硬化させたシリコーン樹脂成形体、並びに当該成形体の製造方法 |
| CN113354817B (zh) * | 2021-06-10 | 2023-10-03 | 山东硅科新材料有限公司 | 一种溶剂热法制备双笼型poss的方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS531000B2 (de) | 1974-04-22 | 1978-01-13 | ||
| JPS6151774A (ja) | 1984-08-22 | 1986-03-14 | Hitachi Ltd | ナトリウム−硫黄電池 |
| CN1031237A (zh) * | 1987-03-17 | 1989-02-22 | 张信雄 | 具湿润性、亲水性、柔软性及氧穿透性的共聚物 |
| US4889901A (en) | 1988-11-16 | 1989-12-26 | Desoto, Inc. | Ultraviolet-curable blends of acrylated polyurethanes and silsesquioxane oligomers having improved adhesion to glass |
| JPH0656948A (ja) * | 1992-08-13 | 1994-03-01 | Showa Denko Kk | 機能性有機分子が封入された透明固体樹脂およびその製造方法 |
| JPH0848734A (ja) | 1994-08-09 | 1996-02-20 | Showa Denko Kk | 耐汚染性の改良された被膜 |
| US6107427A (en) * | 1995-09-15 | 2000-08-22 | Rolic Ag | Cross-linkable, photoactive polymer materials |
| JP4118973B2 (ja) | 1997-03-14 | 2008-07-16 | 新日鐵化学株式会社 | シリコーン化合物及びその製造方法 |
| CN1068885C (zh) * | 1998-02-20 | 2001-07-25 | 华南理工大学 | 聚合物纳米复合材料的制备方法 |
| US6972312B1 (en) * | 1999-08-04 | 2005-12-06 | Hybrid Plastics Llc | Process for the formation of polyhedral oligomeric silsesquioxanes |
| DE60118790T2 (de) | 2000-12-19 | 2006-08-31 | Bausch & Lomb Incorporated | Polymere biomaterialien, die silsesquioxan-monomere enthalten |
| JP3874070B2 (ja) | 2001-03-01 | 2007-01-31 | 信越化学工業株式会社 | 珪素含有高分子化合物、レジスト材料及びパターン形成方法 |
| JP2002363414A (ja) * | 2001-06-12 | 2002-12-18 | Asahi Kasei Corp | 籠状シルセスキオキサン含有組成物 |
| DE60233058D1 (de) * | 2001-09-18 | 2009-09-03 | Chisso Corp | Silsesquioxanderivate und verfahren zu ihrer herstellung |
| JP4381636B2 (ja) | 2001-11-05 | 2009-12-09 | 新日鐵化学株式会社 | シリコーン樹脂組成物及びシリコーン樹脂成形体 |
| JP2003315959A (ja) * | 2002-04-25 | 2003-11-06 | Konica Minolta Holdings Inc | 熱現像材料 |
| US7198639B2 (en) * | 2002-09-13 | 2007-04-03 | Bausch & Lomb Incorporated | Polysilsesquioxane containing polymeric compositions |
| JP4256756B2 (ja) | 2002-09-30 | 2009-04-22 | 新日鐵化学株式会社 | 官能基を有するかご型シルセスキオキサン樹脂の製造方法 |
| JP4142385B2 (ja) * | 2002-10-03 | 2008-09-03 | 新日鐵化学株式会社 | シリコーン樹脂組成物及びシリコーン樹脂成形体 |
| US7297460B2 (en) * | 2003-02-26 | 2007-11-20 | Agfa-Gevaert | Radiation curable ink compositions suitable for ink-jet printing |
-
2004
- 2004-03-22 EP EP04722461A patent/EP1607419B1/de not_active Expired - Lifetime
- 2004-03-22 WO PCT/JP2004/003828 patent/WO2004085501A1/ja active Search and Examination
- 2004-03-22 DE DE602004031510T patent/DE602004031510D1/de not_active Expired - Lifetime
- 2004-03-22 CN CNB2004800056389A patent/CN100339408C/zh not_active Expired - Lifetime
- 2004-03-22 JP JP2005504036A patent/JP4558643B2/ja not_active Expired - Fee Related
- 2004-03-22 KR KR1020057016107A patent/KR101067011B1/ko active IP Right Grant
- 2004-03-22 US US10/544,391 patent/US7385017B2/en not_active Expired - Fee Related
- 2004-03-25 TW TW093108170A patent/TW200427782A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP4558643B2 (ja) | 2010-10-06 |
| EP1607419A4 (de) | 2007-08-22 |
| EP1607419A1 (de) | 2005-12-21 |
| TW200427782A (en) | 2004-12-16 |
| US7385017B2 (en) | 2008-06-10 |
| KR101067011B1 (ko) | 2011-09-22 |
| WO2004085501A1 (ja) | 2004-10-07 |
| TWI331620B (de) | 2010-10-11 |
| EP1607419B1 (de) | 2011-02-23 |
| CN100339408C (zh) | 2007-09-26 |
| CN1756779A (zh) | 2006-04-05 |
| KR20050109515A (ko) | 2005-11-21 |
| US20060052567A1 (en) | 2006-03-09 |
| JPWO2004085501A1 (ja) | 2006-06-29 |
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