[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

BRPI1006965A2 - selenização de camada precursora contendo nanopartículas de cuins2 - Google Patents

selenização de camada precursora contendo nanopartículas de cuins2

Info

Publication number
BRPI1006965A2
BRPI1006965A2 BRPI1006965A BRPI1006965A BRPI1006965A2 BR PI1006965 A2 BRPI1006965 A2 BR PI1006965A2 BR PI1006965 A BRPI1006965 A BR PI1006965A BR PI1006965 A BRPI1006965 A BR PI1006965A BR PI1006965 A2 BRPI1006965 A2 BR PI1006965A2
Authority
BR
Brazil
Prior art keywords
selenization
layer containing
precursor layer
cuins2
nanoparticles
Prior art date
Application number
BRPI1006965A
Other languages
English (en)
Inventor
Hugh Hillhouse
Qijie Guo
Rakesh Agrawal
Original Assignee
Purdue Research Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Purdue Research Foundation filed Critical Purdue Research Foundation
Publication of BRPI1006965A2 publication Critical patent/BRPI1006965A2/pt

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/0445PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02491Conductive materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02568Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02587Structure
    • H01L21/0259Microstructure
    • H01L21/02601Nanoparticles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02614Transformation of metal, e.g. oxidation, nitridation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02623Liquid deposition
    • H01L21/02628Liquid deposition using solutions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/032Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • H01L31/0322Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
BRPI1006965A 2009-01-21 2010-01-21 selenização de camada precursora contendo nanopartículas de cuins2 BRPI1006965A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14608409P 2009-01-21 2009-01-21
PCT/US2010/021636 WO2010085553A1 (en) 2009-01-21 2010-01-21 Selenization of precursor layer containing culns2 nanoparticles

Publications (1)

Publication Number Publication Date
BRPI1006965A2 true BRPI1006965A2 (pt) 2016-04-12

Family

ID=42356199

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI1006965A BRPI1006965A2 (pt) 2009-01-21 2010-01-21 selenização de camada precursora contendo nanopartículas de cuins2

Country Status (10)

Country Link
US (1) US8722447B2 (pt)
EP (1) EP2379458A4 (pt)
JP (1) JP2012515708A (pt)
KR (1) KR20110108388A (pt)
CN (1) CN102361830A (pt)
AU (1) AU2010206814A1 (pt)
BR (1) BRPI1006965A2 (pt)
CL (1) CL2011001756A1 (pt)
CO (1) CO6400212A2 (pt)
WO (1) WO2010085553A1 (pt)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5782672B2 (ja) * 2009-11-06 2015-09-24 凸版印刷株式会社 化合物半導体薄膜作製用インク、そのインクを用いて得た化合物半導体薄膜、その化合物半導体薄膜を備える太陽電池、及びその太陽電池の製造方法
JP2012114250A (ja) * 2010-11-25 2012-06-14 Kyocera Corp 光電変換装置の製造方法
JP2012114251A (ja) * 2010-11-25 2012-06-14 Kyocera Corp 光電変換装置の製造方法
KR101172050B1 (ko) 2011-02-11 2012-08-07 재단법인대구경북과학기술원 박막 태양전지의 흡수층 제조방법
KR101229310B1 (ko) 2011-02-14 2013-02-04 재단법인대구경북과학기술원 박막태양전지의 광흡수층 제조방법
KR20120131535A (ko) * 2011-05-25 2012-12-05 한국에너지기술연구원 CIGS/CIS 나노입자의 셀렌화에 의한 치밀한 CIGSe/CISe 박막 제조방법
WO2012163976A1 (en) * 2011-06-03 2012-12-06 Bayer Intellectual Property Gmbh Continuous process for the synthesis of ternary or quaternary semiconducting nanoparticles based on ib, iiia, via elements of the periodic classification
US8916457B2 (en) * 2012-05-22 2014-12-23 King Abdullah University Of Science And Technology In situ synthesis of nanoparticles on substrates by inkjet printing
US8859323B2 (en) * 2012-07-31 2014-10-14 Intermolecular, Inc. Method of chalcogenization to form high quality cigs for solar cell applications
KR101389832B1 (ko) * 2012-11-09 2014-04-30 한국과학기술연구원 구리인듐셀레늄(cigs) 또는 구리아연주석황(czts)계 박막형 태양전지 및 그의 제조방법
CN103911148B (zh) * 2013-01-07 2016-11-16 中国药科大学 基于壳聚糖的氨基化碳氮量子点的制备方法
WO2014135979A1 (en) * 2013-03-04 2014-09-12 Nanoco Technologies, Ltd. Copper-indium-gallium-chalcogenide nanoparticle precursors for thin-film solar cells
CN105144402A (zh) * 2013-03-15 2015-12-09 纳米技术有限公司 具有梯度粒度和S:Se比例的光伏器件
US9105798B2 (en) 2013-05-14 2015-08-11 Sun Harmonics, Ltd Preparation of CIGS absorber layers using coated semiconductor nanoparticle and nanowire networks
CN103325886B (zh) * 2013-06-09 2017-07-18 徐东 一种具有能带梯度分布的铜铟铝硒(cias)薄膜的制备方法
JP2015020932A (ja) * 2013-07-19 2015-02-02 株式会社太陽電池総合研究所 カルコパイライトナノ粒子の製造方法
US9960314B2 (en) * 2013-09-13 2018-05-01 Nanoco Technologies Ltd. Inorganic salt-nanoparticle ink for thin film photovoltaic devices and related methods
US9893220B2 (en) * 2013-10-15 2018-02-13 Nanoco Technologies Ltd. CIGS nanoparticle ink formulation having a high crack-free limit
CN103881709B (zh) * 2014-04-10 2016-06-08 石家庄铁道大学 一种多级孔TiO2/量子点复合材料的制备方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3064701B2 (ja) * 1992-10-30 2000-07-12 松下電器産業株式会社 カルコパイライト型化合物薄膜の製造方法
JP3244408B2 (ja) 1995-09-13 2002-01-07 松下電器産業株式会社 薄膜太陽電池及びその製造方法
EP0837511B1 (en) * 1996-10-15 2005-09-14 Matsushita Electric Industrial Co., Ltd Solar cell and method for manufacturing the same
US5985691A (en) 1997-05-16 1999-11-16 International Solar Electric Technology, Inc. Method of making compound semiconductor films and making related electronic devices
US6127202A (en) 1998-07-02 2000-10-03 International Solar Electronic Technology, Inc. Oxide-based method of making compound semiconductor films and making related electronic devices
WO2001037324A1 (en) 1999-11-16 2001-05-25 Midwest Research Institute A NOVEL PROCESSING APPROACH TOWARDS THE FORMATION OF THIN-FILM Cu(In,Ga)Se¿2?
JP2002329877A (ja) 2001-04-27 2002-11-15 National Institute Of Advanced Industrial & Technology Cu(Ga及び(又は)In)Se2薄膜層、Cu(InGa)(S、Se)2薄膜層、太陽電池、Cu(Ga及び(又は)In)Se2薄膜層の形成方法
US20030106488A1 (en) 2001-12-10 2003-06-12 Wen-Chiang Huang Manufacturing method for semiconductor quantum particles
US7605328B2 (en) * 2004-02-19 2009-10-20 Nanosolar, Inc. Photovoltaic thin-film cell produced from metallic blend using high-temperature printing
US8309163B2 (en) 2004-02-19 2012-11-13 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer by use of chalcogen-containing vapor and inter-metallic material
US7306823B2 (en) 2004-09-18 2007-12-11 Nanosolar, Inc. Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells
US7700464B2 (en) 2004-02-19 2010-04-20 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from nanoflake particles
US7604843B1 (en) * 2005-03-16 2009-10-20 Nanosolar, Inc. Metallic dispersion
US8048477B2 (en) 2004-02-19 2011-11-01 Nanosolar, Inc. Chalcogenide solar cells
US7663057B2 (en) 2004-02-19 2010-02-16 Nanosolar, Inc. Solution-based fabrication of photovoltaic cell
US20070163639A1 (en) * 2004-02-19 2007-07-19 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from microflake particles
CH697007A5 (fr) 2004-05-03 2008-03-14 Solaronix Sa Procédé pour produire un composé chalcopyrite en couche mince.
JP2006186200A (ja) 2004-12-28 2006-07-13 Showa Shell Sekiyu Kk プリカーサ膜及びその製膜方法
EP1861916A4 (en) * 2005-03-16 2013-03-27 Nanosolar Inc METALLIC DISPERSION AND FORMATION OF COMPOUND FILM FOR ACTIVE LAYER OF PHOTOVOLTAIC DEVICE
US20070111367A1 (en) * 2005-10-19 2007-05-17 Basol Bulent M Method and apparatus for converting precursor layers into photovoltaic absorbers
CN101443919B (zh) * 2006-02-23 2014-03-05 耶罗恩·K·J·范杜伦 形成吸收层的方法、用于形成吸收层的前体材料以及太阳能电池
JP5054326B2 (ja) * 2006-05-01 2012-10-24 昭和シェル石油株式会社 Cis系薄膜太陽電池モジュールの改良された耐久性試験方法
WO2008021604A2 (en) 2006-05-19 2008-02-21 Purdue Research Foundation Rapid synthesis of ternary, binary and multinary chalcogenide nanoparticles
EP2336394B1 (en) 2006-05-24 2015-07-01 Atotech Deutschland GmbH Metal plating composition and method for the deposition of copper-zinc-tin suitable for manufacturing thin film solar cell
US8071419B2 (en) 2006-06-12 2011-12-06 Nanosolar, Inc. Thin-film devices formed from solid particles
WO2008057119A1 (en) 2006-11-09 2008-05-15 Midwest Research Institue Formation of copper-indium-selenide and/or copper-indium-gallium-selenide films from indium selenide and copper selenide precursors
US8563348B2 (en) * 2007-04-18 2013-10-22 Nanoco Technologies Ltd. Fabrication of electrically active films based on multiple layers
CN101681938B (zh) * 2007-04-18 2013-03-27 纳米技术有限公司 基于多层的电活性膜的制造
JP2009033071A (ja) 2007-07-31 2009-02-12 National Institute Of Advanced Industrial & Technology CIGSSe太陽電池及びその作製方法
KR101030780B1 (ko) * 2007-11-14 2011-04-27 성균관대학교산학협력단 Ⅰ-ⅲ-ⅵ2 나노입자의 제조방법 및 다결정 광흡수층박막의 제조방법
EP3379585B1 (en) * 2007-11-30 2020-05-13 Nanoco Technologies Ltd Preparation of nanoparticle material
CN101235471A (zh) * 2008-03-12 2008-08-06 安泰科技股份有限公司 高晶化温度铁基非晶态合金及其薄带
US20090260670A1 (en) * 2008-04-18 2009-10-22 Xiao-Chang Charles Li Precursor ink for producing IB-IIIA-VIA semiconductors

Also Published As

Publication number Publication date
EP2379458A4 (en) 2015-02-11
KR20110108388A (ko) 2011-10-05
JP2012515708A (ja) 2012-07-12
EP2379458A1 (en) 2011-10-26
WO2010085553A1 (en) 2010-07-29
CL2011001756A1 (es) 2012-02-10
CN102361830A (zh) 2012-02-22
US8722447B2 (en) 2014-05-13
US20120122268A1 (en) 2012-05-17
AU2010206814A1 (en) 2011-08-11
CO6400212A2 (es) 2012-03-15

Similar Documents

Publication Publication Date Title
BRPI1006965A2 (pt) selenização de camada precursora contendo nanopartículas de cuins2
EP2525638A4 (en) SUBSTRATE WITH BUILT-IN RIBS AND METHOD FOR PRODUCING THE SUBSTRATE WITH BUILT-IN RIBS
EP2656388A4 (en) POW-RICH LAYER FOR SEMICONDUCTOR DEVICES
GB2488401B (en) Method of manufacturing semiconductor device structure
HK1203244A1 (en) Method of manufacturing semiconductor device
EP2624286A4 (en) METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
GB2498879B (en) Electrodeposition methods for fabrication of photovoltaic devices
EP2657958A4 (en) METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
BR112012006813A2 (pt) substrato revestido
EP2419930A4 (en) INTERCONNECTING HOLES CROSSING A SUBSTRATE
EP2432001A4 (en) METHOD FOR PRODUCING A SEMICONDUCTOR SUBSTRATE
GB0901226D0 (en) Fabrication of nitride nanoparticles
EP2402985A4 (en) METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
GB2498675B (en) Semiconductor structure and methods of manufacture
EP2525637A4 (en) LIQUID-COOLED INTEGRATED SUBSTRATE AND METHOD FOR PRODUCING THE LIQUID-COOLED INTEGRATED SUBSTRATE
EP2525634A4 (en) SUBSTRATE AND METHOD FOR MANUFACTURING THE SUBSTRATE
EP2413348A4 (en) SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING THE SEMICONDUCTOR SUBSTRATE
EP2645572A4 (en) ADJUSTABLE SLIDING CIRCUIT, USING THE RESISTANCE OF A SEMICONDUCTOR SUBSTRATE
EP2617062A4 (en) MANUFACTURE OF SOLAR CELLS USING SILICON NANOPARTICLES
EP2530728A4 (en) METHOD FOR PRODUCING A SEMICONDUCTOR LAYER, METHOD FOR PRODUCING A PHOTOELECTRIC CONVERSION DEVICE AND SOLUTION FOR PRODUCING A SEMICONDUCTOR LAYER
EP2426238A4 (en) METHOD FOR PRODUCING A SIC SUBSTRATE
GB201012236D0 (en) Method of fabrication of semiconductor device
TWI373094B (en) Manufacturing method of substrate structure
TWI367706B (en) Method of fabricating package substrate
ZA201201112B (en) Photovoltaic lead manufacture

Legal Events

Date Code Title Description
B08F Application fees: application dismissed [chapter 8.6 patent gazette]

Free format text: REFERENTE A 6A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2384 DE 13-09-2016 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.