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BR9203707A - Compostos,composicao,emprego de compostos,processo para a fotopolimerizacao de compostos e emprego de uma composicao - Google Patents

Compostos,composicao,emprego de compostos,processo para a fotopolimerizacao de compostos e emprego de uma composicao

Info

Publication number
BR9203707A
BR9203707A BR929203707A BR9203707A BR9203707A BR 9203707 A BR9203707 A BR 9203707A BR 929203707 A BR929203707 A BR 929203707A BR 9203707 A BR9203707 A BR 9203707A BR 9203707 A BR9203707 A BR 9203707A
Authority
BR
Brazil
Prior art keywords
compounds
composition
photopolimerization
Prior art date
Application number
BR929203707A
Other languages
English (en)
Inventor
David G Dr Leppard
Manfred Dr Koehler
Ljubomir Dr Misev
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH3322/91A external-priority patent/CH682666A5/de
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of BR9203707A publication Critical patent/BR9203707A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BR929203707A 1991-09-23 1992-09-23 Compostos,composicao,emprego de compostos,processo para a fotopolimerizacao de compostos e emprego de uma composicao BR9203707A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH280991 1991-09-23
CH3322/91A CH682666A5 (de) 1991-11-14 1991-11-14 Alkyl-Bisacylphosphinoxide.

Publications (1)

Publication Number Publication Date
BR9203707A true BR9203707A (pt) 1993-04-20

Family

ID=25691451

Family Applications (1)

Application Number Title Priority Date Filing Date
BR929203707A BR9203707A (pt) 1991-09-23 1992-09-23 Compostos,composicao,emprego de compostos,processo para a fotopolimerizacao de compostos e emprego de uma composicao

Country Status (20)

Country Link
US (2) US5399770A (pt)
JP (1) JP3211039B2 (pt)
KR (1) KR100236584B1 (pt)
AT (1) AT401265B (pt)
AU (1) AU655675B2 (pt)
BE (1) BE1006011A4 (pt)
BR (1) BR9203707A (pt)
CA (1) CA2078722C (pt)
CZ (1) CZ292028B6 (pt)
DE (1) DE4231579C2 (pt)
ES (1) ES2050607B1 (pt)
FR (1) FR2681599B1 (pt)
GB (1) GB2259704B (pt)
HK (1) HK1000208A1 (pt)
IT (1) IT1255509B (pt)
MX (1) MX9205345A (pt)
NL (1) NL194946C (pt)
RU (1) RU2091385C1 (pt)
SE (2) SE503060C2 (pt)
SK (2) SK290592A3 (pt)

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ATA188592A (de) 1995-12-15
SK281582B6 (sk) 2001-05-10
US5472992A (en) 1995-12-05
SK137199A3 (en) 2001-05-10
IT1255509B (it) 1995-11-09
ES2050607A1 (es) 1994-05-16
ES2050607B1 (es) 1995-11-16
ITMI922173A0 (it) 1992-09-22
SE503060C2 (sv) 1996-03-18
SE9202668L (sv) 1993-03-24
DE4231579C2 (de) 2002-11-07
NL194946B (nl) 2003-04-01
SE9202668D0 (sv) 1992-09-16
RU2091385C1 (ru) 1997-09-27
CZ292028B6 (cs) 2003-07-16
GB2259704A (en) 1993-03-24
HK1000208A1 (en) 1998-02-06
DE4231579A1 (de) 1993-03-25
AT401265B (de) 1996-07-25
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JP3211039B2 (ja) 2001-09-25
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FR2681599A1 (fr) 1993-03-26
SK290592A3 (en) 2001-05-10
NL194946C (nl) 2003-08-04
BE1006011A4 (fr) 1994-04-19
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GB2259704B (en) 1995-05-17
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KR100236584B1 (ko) 2000-02-01
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US5399770A (en) 1995-03-21

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