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BR7102385D0 - Material copiador a base de uma massa de copiar sensivel a luz e processo para a preparacao de uma camada resistente a corrosao - Google Patents

Material copiador a base de uma massa de copiar sensivel a luz e processo para a preparacao de uma camada resistente a corrosao

Info

Publication number
BR7102385D0
BR7102385D0 BR2385/71A BR238571A BR7102385D0 BR 7102385 D0 BR7102385 D0 BR 7102385D0 BR 2385/71 A BR2385/71 A BR 2385/71A BR 238571 A BR238571 A BR 238571A BR 7102385 D0 BR7102385 D0 BR 7102385D0
Authority
BR
Brazil
Prior art keywords
preparation
resistant layer
corrosion resistant
light sensitive
material based
Prior art date
Application number
BR2385/71A
Other languages
English (en)
Portuguese (pt)
Inventor
H Steppan
H Ruckert
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of BR7102385D0 publication Critical patent/BR7102385D0/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Printing Plates And Materials Therefor (AREA)
BR2385/71A 1970-04-22 1971-04-22 Material copiador a base de uma massa de copiar sensivel a luz e processo para a preparacao de uma camada resistente a corrosao BR7102385D0 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2019426A DE2019426C3 (de) 1970-04-22 1970-04-22 Lichtempfindliches Gemisch und lichtempfindliches Kopiermaterial

Publications (1)

Publication Number Publication Date
BR7102385D0 true BR7102385D0 (pt) 1973-04-05

Family

ID=5768839

Family Applications (1)

Application Number Title Priority Date Filing Date
BR2385/71A BR7102385D0 (pt) 1970-04-22 1971-04-22 Material copiador a base de uma massa de copiar sensivel a luz e processo para a preparacao de uma camada resistente a corrosao

Country Status (9)

Country Link
AU (1) AU2797371A (de)
BE (1) BE765966A (de)
BR (1) BR7102385D0 (de)
CA (1) CA979711A (de)
DE (1) DE2019426C3 (de)
FR (1) FR2090544A5 (de)
GB (1) GB1352411A (de)
NL (1) NL7104769A (de)
ZA (1) ZA712565B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2655553A1 (de) * 1976-12-08 1978-06-15 Licentia Gmbh Mittels einer diazoniumverbindung sensibilisierte waesserige loesung eines polymerisates sowie verwendung einer solchen loesung zur herstellung von leuchtschirmen fuer farbbildkathodenstrahlroehren
EP0058981B1 (de) * 1981-02-25 1986-01-22 Hitachi, Ltd. Farblose Flüssigkristallinverbindungen
DE3130987A1 (de) * 1981-08-05 1983-02-24 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von flachdruckformen aus einem lichtempfindlichen material auf basis von diazoniumsalz-polykondensationsprodukten
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
DE3404366A1 (de) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
US4707437A (en) * 1985-08-02 1987-11-17 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymer composition

Also Published As

Publication number Publication date
CA979711A (en) 1975-12-16
BE765966A (fr) 1971-10-19
DE2019426C3 (de) 1981-01-29
DE2019426A1 (de) 1971-11-11
NL7104769A (de) 1971-10-26
FR2090544A5 (de) 1972-01-14
DE2019426B2 (de) 1980-05-14
AU2797371A (en) 1972-10-26
ZA712565B (en) 1972-01-26
GB1352411A (en) 1974-05-08

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