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AU2797371A - Improvements in and relating to light-sensitive copying compositions and etch-resistant reproduction material made therefrom - Google Patents

Improvements in and relating to light-sensitive copying compositions and etch-resistant reproduction material made therefrom

Info

Publication number
AU2797371A
AU2797371A AU27973/71A AU2797371A AU2797371A AU 2797371 A AU2797371 A AU 2797371A AU 27973/71 A AU27973/71 A AU 27973/71A AU 2797371 A AU2797371 A AU 2797371A AU 2797371 A AU2797371 A AU 2797371A
Authority
AU
Australia
Prior art keywords
etch
relating
light
material made
made therefrom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU27973/71A
Inventor
EUCKEN and HARTMUT STEPHAN HANS
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of AU2797371A publication Critical patent/AU2797371A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Printing Plates And Materials Therefor (AREA)
AU27973/71A 1970-04-22 1971-04-21 Improvements in and relating to light-sensitive copying compositions and etch-resistant reproduction material made therefrom Expired AU2797371A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEDE82019 1970-04-21
DE2019426A DE2019426C3 (en) 1970-04-22 1970-04-22 Photosensitive mixture and photosensitive copying material

Publications (1)

Publication Number Publication Date
AU2797371A true AU2797371A (en) 1972-10-26

Family

ID=5768839

Family Applications (1)

Application Number Title Priority Date Filing Date
AU27973/71A Expired AU2797371A (en) 1970-04-22 1971-04-21 Improvements in and relating to light-sensitive copying compositions and etch-resistant reproduction material made therefrom

Country Status (9)

Country Link
AU (1) AU2797371A (en)
BE (1) BE765966A (en)
BR (1) BR7102385D0 (en)
CA (1) CA979711A (en)
DE (1) DE2019426C3 (en)
FR (1) FR2090544A5 (en)
GB (1) GB1352411A (en)
NL (1) NL7104769A (en)
ZA (1) ZA712565B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2655553A1 (en) * 1976-12-08 1978-06-15 Licentia Gmbh Photosensitised aq. polymer soln. used in phosphor screen prodn. - is sensitised with diazonium cpd. and fluorescent organic cpd.
EP0058981B1 (en) * 1981-02-25 1986-01-22 Hitachi, Ltd. Colorless liquid crystalline compounds
DE3130987A1 (en) * 1981-08-05 1983-02-24 Hoechst Ag, 6000 Frankfurt METHOD FOR THE PRODUCTION OF FLAT PRINTING FORMS FROM A LIGHT-SENSITIVE MATERIAL BASED ON DIAZONIUM SALTS-POLYCONDENSATION PRODUCTS
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
DE3404366A1 (en) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE BASED ON A DIAZONIUM SALT POLYCONDENSATION PRODUCT AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
US4707437A (en) * 1985-08-02 1987-11-17 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymer composition

Also Published As

Publication number Publication date
CA979711A (en) 1975-12-16
BE765966A (en) 1971-10-19
DE2019426C3 (en) 1981-01-29
DE2019426A1 (en) 1971-11-11
NL7104769A (en) 1971-10-26
BR7102385D0 (en) 1973-04-05
FR2090544A5 (en) 1972-01-14
DE2019426B2 (en) 1980-05-14
ZA712565B (en) 1972-01-26
GB1352411A (en) 1974-05-08

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