BE516129A
(de)
*
|
1949-07-23 |
|
|
|
US3046124A
(en)
*
|
1949-07-23 |
1962-07-24 |
Azoplate Corp |
Process for the manufacture of printing plates and light-sensitive material suitablefor use therein
|
US3046119A
(en)
*
|
1950-08-01 |
1962-07-24 |
Azoplate Corp |
Light sensitive material for printing and process for making printing plates
|
NL170716B
(nl)
*
|
1951-06-30 |
|
Agfa Gevaert Nv |
Werkwijze voor de vervaardiging van polymeerfoelie door extrusie.
|
US2767092A
(en)
*
|
1951-12-06 |
1956-10-16 |
Azoplate Corp |
Light sensitive material for lithographic printing
|
NL77599C
(de)
*
|
1952-01-05 |
1954-10-15 |
|
|
NL89894C
(de)
*
|
1952-08-16 |
|
|
|
GB742557A
(en)
*
|
1952-10-01 |
1955-12-30 |
Kalle & Co Ag |
Light-sensitive material for photomechanical reproduction and process for the production of images
|
DE938233C
(de)
*
|
1953-03-11 |
1956-01-26 |
Kalle & Co Ag |
Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
|
US2907655A
(en)
*
|
1953-09-30 |
1959-10-06 |
Schmidt Maximilian Paul |
Light-sensitive material for the photo-mechanical reproduction and process for the production of images
|
NL195002A
(de)
*
|
1954-03-12 |
1900-01-01 |
|
|
NL96874C
(de)
*
|
1954-04-03 |
|
|
|
BE536993A
(de)
*
|
1954-04-03 |
|
|
|
NL199484A
(de)
*
|
1954-08-20 |
|
|
|
NL95407C
(de)
*
|
1954-08-20 |
|
|
|
DE949383C
(de)
*
|
1954-08-26 |
1956-09-20 |
Kalle & Co Ag |
Lichtempfindliche Metallfolie fuer die Druckplattenherstellung, welche mit Diazosulfonaten lichtempfindlich gemacht ist
|
US3029146A
(en)
*
|
1955-02-25 |
1962-04-10 |
Azoplate Corp |
Reproduction material
|
NL94867C
(de)
*
|
1955-02-25 |
|
|
|
US3046114A
(en)
*
|
1955-03-01 |
1962-07-24 |
Azoplate Corp |
Diazo compounds and printing plates manufactured therefrom
|
BE560264A
(de)
*
|
1956-09-25 |
|
|
|
US3019105A
(en)
*
|
1957-02-28 |
1962-01-30 |
Harris Intertype Corp |
Treatment of diazo-sensitized lithographic plates
|
NL104507C
(de)
*
|
1957-08-03 |
|
|
|
US2975053A
(en)
*
|
1958-10-06 |
1961-03-14 |
Azoplate Corp |
Reproduction material
|
NL247299A
(de)
*
|
1959-01-14 |
|
|
|
NL130027C
(de)
*
|
1959-01-15 |
|
|
|
NL247406A
(de)
*
|
1959-01-17 |
|
|
|
NL247588A
(de)
*
|
1959-01-21 |
|
|
|
NL125781C
(de)
*
|
1959-02-04 |
|
|
|
DE1114705C2
(de)
*
|
1959-04-16 |
1962-04-12 |
Kalle Ag |
Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
|
BE593836A
(de)
*
|
1959-08-05 |
|
|
|
NL131386C
(de)
*
|
1959-08-29 |
|
|
|
NL255517A
(de)
*
|
1959-09-04 |
|
|
|
US3086861A
(en)
*
|
1960-07-01 |
1963-04-23 |
Gen Aniline & Film Corp |
Printing plates comprising ink receptive azo dye surfaces
|
BE606642A
(de)
*
|
1960-07-29 |
|
|
|
NL273552A
(de)
*
|
1961-01-25 |
|
|
|
NL283850A
(de)
*
|
1961-10-13 |
|
|
|
US3260599A
(en)
*
|
1962-11-19 |
1966-07-12 |
Minnesota Mining & Mfg |
Vesicular diazo copy-sheet containing photoreducible dye
|
US3210531A
(en)
*
|
1963-03-18 |
1965-10-05 |
Samuel M Neely |
Outdoor floodlighting assembly
|
CA774047A
(en)
*
|
1963-12-09 |
1967-12-19 |
Shipley Company |
Light-sensitive material and process for the development thereof
|
US3331944A
(en)
*
|
1965-03-02 |
1967-07-18 |
Electro Therm |
Plug-in heating element assembly
|
US3387975A
(en)
*
|
1965-03-10 |
1968-06-11 |
Sony Corp |
Method of making color screen of a cathode ray tube
|
GB1116737A
(en)
*
|
1966-02-28 |
1968-06-12 |
Agfa Gevaert Nv |
Bis-(o-quinone diazide) modified bisphenols
|
NL136645C
(de)
*
|
1966-12-12 |
|
|
|
US3635709A
(en)
*
|
1966-12-15 |
1972-01-18 |
Polychrome Corp |
Light-sensitive lithographic plate
|
US3984250A
(en)
*
|
1970-02-12 |
1976-10-05 |
Eastman Kodak Company |
Light-sensitive diazoketone and azide compositions and photographic elements
|
GB1347759A
(en)
*
|
1971-06-17 |
1974-02-27 |
Howson Algraphy Ltd |
Light sensitive materials
|
JPS5539825B2
(de)
*
|
1972-05-12 |
1980-10-14 |
|
|
JPS5024641B2
(de)
*
|
1972-10-17 |
1975-08-18 |
|
|
US3950173A
(en)
*
|
1973-02-12 |
1976-04-13 |
Rca Corporation |
Electron beam recording article with o-quinone diazide compound
|
US4024122A
(en)
*
|
1973-02-12 |
1977-05-17 |
Rca Corporation |
Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone)
|
US3852771A
(en)
*
|
1973-02-12 |
1974-12-03 |
Rca Corp |
Electron beam recording process
|
DE2331377C2
(de)
*
|
1973-06-20 |
1982-10-14 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches Kopiermaterial
|
US4327022A
(en)
*
|
1973-08-16 |
1982-04-27 |
Sterling Drug Inc. |
Heterocyclic alkyl naphthols
|
US4169108A
(en)
*
|
1973-08-16 |
1979-09-25 |
Sterling Drug Inc. |
5(OR 6)-[(Substituted-amino)alkyl]-2,3-naphthalenediols
|
US4139384A
(en)
*
|
1974-02-21 |
1979-02-13 |
Fuji Photo Film Co., Ltd. |
Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
|
JPS5645127B2
(de)
*
|
1974-02-25 |
1981-10-24 |
|
|
US4007047A
(en)
*
|
1974-06-06 |
1977-02-08 |
International Business Machines Corporation |
Modified processing of positive photoresists
|
GB1513368A
(en)
*
|
1974-07-08 |
1978-06-07 |
Vickers Ltd |
Processing of radiation-sensitive members
|
DE2530502C2
(de)
*
|
1974-07-22 |
1985-07-18 |
American Hoechst Corp., Bridgewater, N.J. |
Verfahren zum gleichzeitigen Entwickeln und Konservieren von Druckplatten sowie dafür geeignete Behandlungslösung
|
DE2447225C2
(de)
*
|
1974-10-03 |
1983-12-22 |
Ibm Deutschland Gmbh, 7000 Stuttgart |
Verfahren zum Ablösen von positiven Photolack
|
US4005437A
(en)
*
|
1975-04-18 |
1977-01-25 |
Rca Corporation |
Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil
|
CA1085212A
(en)
*
|
1975-05-27 |
1980-09-09 |
Ronald H. Engebrecht |
Use of volatile carboxylic acids in improved photoresists containing quinone diazides
|
DE2529054C2
(de)
*
|
1975-06-30 |
1982-04-29 |
Ibm Deutschland Gmbh, 7000 Stuttgart |
Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
|
US4148654A
(en)
*
|
1976-07-22 |
1979-04-10 |
Oddi Michael J |
Positive acting photoresist comprising diazide ester, novolak resin and rosin
|
DE2641099A1
(de)
*
|
1976-09-13 |
1978-03-16 |
Hoechst Ag |
Lichtempfindliche kopierschicht
|
DE2641100C2
(de)
*
|
1976-09-13 |
1987-02-26 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches Gemisch
|
US4059449A
(en)
*
|
1976-09-30 |
1977-11-22 |
Rca Corporation |
Photoresist containing a thiodipropionate compound
|
GB1604652A
(en)
*
|
1977-04-12 |
1981-12-16 |
Vickers Ltd |
Radiation sensitive materials
|
US4263387A
(en)
*
|
1978-03-16 |
1981-04-21 |
Coulter Systems Corporation |
Lithographic printing plate and process for making same
|
DE2828037A1
(de)
*
|
1978-06-26 |
1980-01-10 |
Hoechst Ag |
Lichtempfindliches gemisch
|
US4207107A
(en)
*
|
1978-08-23 |
1980-06-10 |
Rca Corporation |
Novel ortho-quinone diazide photoresist sensitizers
|
DE2948324C2
(de)
*
|
1978-12-01 |
1993-01-14 |
Hitachi, Ltd., Tokio/Tokyo |
Lichtempfindliches Gemisch, enthaltend eine Bisazidverbindung, und Verfahren zur Bildung von Mustern
|
JPS561933A
(en)
*
|
1979-06-18 |
1981-01-10 |
Ibm |
Resist composition
|
US4284706A
(en)
*
|
1979-12-03 |
1981-08-18 |
International Business Machines Corporation |
Lithographic resist composition for a lift-off process
|
DE3040157A1
(de)
*
|
1980-10-24 |
1982-06-03 |
Hoechst Ag, 6000 Frankfurt |
Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
|
DE3100077A1
(de)
*
|
1981-01-03 |
1982-08-05 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
|
US4431724A
(en)
*
|
1981-01-07 |
1984-02-14 |
Ovchinnikov Jury M |
Offset printing plate and process for making same
|
DE3100856A1
(de)
*
|
1981-01-14 |
1982-08-12 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
|
JPS57163234A
(en)
*
|
1981-04-01 |
1982-10-07 |
Fuji Photo Film Co Ltd |
Photosensitive composition
|
DE3124936A1
(de)
*
|
1981-06-25 |
1983-01-20 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
|
DE3127754A1
(de)
*
|
1981-07-14 |
1983-02-03 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
|
JPS59165053A
(ja)
*
|
1983-03-11 |
1984-09-18 |
Japan Synthetic Rubber Co Ltd |
ポジ型感光性樹脂組成物
|
US4499171A
(en)
*
|
1982-04-20 |
1985-02-12 |
Japan Synthetic Rubber Co., Ltd. |
Positive type photosensitive resin composition with at least two o-quinone diazides
|
DE3220816A1
(de)
*
|
1982-06-03 |
1983-12-08 |
Merck Patent Gmbh, 6100 Darmstadt |
Lichtempfindliche komponenten fuer positiv arbeitende fotoresistmaterialien
|
GB2127175A
(en)
*
|
1982-09-07 |
1984-04-04 |
Letraset International Ltd |
Manufacture of signs
|
US4474864A
(en)
*
|
1983-07-08 |
1984-10-02 |
International Business Machines Corporation |
Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist
|
US4626491A
(en)
*
|
1983-10-07 |
1986-12-02 |
J. T. Baker Chemical Company |
Deep ultra-violet lithographic resist composition and process of using
|
JPS6088942A
(ja)
*
|
1983-10-21 |
1985-05-18 |
Fuji Photo Film Co Ltd |
感光性組成物
|
IT1169682B
(it)
*
|
1983-11-08 |
1987-06-03 |
I M G Ind Materiali Grafici Sp |
Composizione per fotoriproduzioni
|
US4535393A
(en)
*
|
1983-11-10 |
1985-08-13 |
Jahabow Industries, Inc. |
Fluorescent lamp housing
|
EP0147596A3
(de)
*
|
1983-12-30 |
1987-03-04 |
International Business Machines Corporation |
Positive lichtempfindliche lithographische Lackzusammensetzung
|
US4596763A
(en)
*
|
1984-10-01 |
1986-06-24 |
American Hoechst Corporation |
Positive photoresist processing with mid U-V range exposure
|
JPS61141441A
(ja)
*
|
1984-12-14 |
1986-06-28 |
Tokyo Ohka Kogyo Co Ltd |
ポジ型ホトレジスト組成物
|
GB8505402D0
(en)
*
|
1985-03-02 |
1985-04-03 |
Ciba Geigy Ag |
Modified phenolic resins
|
JPS6149895A
(ja)
*
|
1985-06-24 |
1986-03-11 |
Konishiroku Photo Ind Co Ltd |
印刷板の形成方法
|
US5256522A
(en)
*
|
1985-08-12 |
1993-10-26 |
Hoechst Celanese Corporation |
Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
|
US4929536A
(en)
*
|
1985-08-12 |
1990-05-29 |
Hoechst Celanese Corporation |
Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
|
US5217840A
(en)
*
|
1985-08-12 |
1993-06-08 |
Hoechst Celanese Corporation |
Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
|
US4684597A
(en)
*
|
1985-10-25 |
1987-08-04 |
Eastman Kodak Company |
Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor
|
EP0227487B1
(de)
*
|
1985-12-27 |
1992-07-15 |
Japan Synthetic Rubber Co., Ltd. |
Strahlungsempfindliche positiv arbeitende Kunststoffzusammensetzung
|
DE3603578A1
(de)
*
|
1986-02-06 |
1987-08-13 |
Hoechst Ag |
Neue bis-1,2-naphthochinon-2-diazid-sulfonsaeure- amide, ihre verwendung in einem strahlungsempfindlichen gemisch und strahlungsempfindliches kopiermaterial
|
US4737437A
(en)
*
|
1986-03-27 |
1988-04-12 |
East Shore Chemical Co. |
Light sensitive diazo compound, composition and method of making the composition
|
US5162510A
(en)
*
|
1986-05-02 |
1992-11-10 |
Hoechst Celanese Corporation |
Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
|
US4732836A
(en)
*
|
1986-05-02 |
1988-03-22 |
Hoechst Celanese Corporation |
Novel mixed ester O-quinone photosensitizers
|
US4902785A
(en)
*
|
1986-05-02 |
1990-02-20 |
Hoechst Celanese Corporation |
Phenolic photosensitizers containing quinone diazide and acidic halide substituents
|
DE3784549D1
(de)
*
|
1986-05-02 |
1993-04-15 |
Hoechst Celanese Corp |
Positiv-arbeitendes lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial.
|
US4732837A
(en)
*
|
1986-05-02 |
1988-03-22 |
Hoechst Celanese Corporation |
Novel mixed ester O-quinone photosensitizers
|
US5035976A
(en)
*
|
1986-05-02 |
1991-07-30 |
Hoechst Celanese Corporation |
Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
|
US4871644A
(en)
*
|
1986-10-01 |
1989-10-03 |
Ciba-Geigy Corporation |
Photoresist compositions with a bis-benzotriazole
|
DE3635303A1
(de)
|
1986-10-17 |
1988-04-28 |
Hoechst Ag |
Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten
|
US4835085A
(en)
*
|
1986-10-17 |
1989-05-30 |
Ciba-Geigy Corporation |
1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound
|
JP2568827B2
(ja)
*
|
1986-10-29 |
1997-01-08 |
富士写真フイルム株式会社 |
ポジ型フオトレジスト組成物
|
JPS63178228A
(ja)
*
|
1987-01-20 |
1988-07-22 |
Fuji Photo Film Co Ltd |
ポジ型フオトレジスト組成物
|
US5182183A
(en)
*
|
1987-03-12 |
1993-01-26 |
Mitsubishi Kasei Corporation |
Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
|
US4818658A
(en)
*
|
1987-04-17 |
1989-04-04 |
Shipley Company Inc. |
Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product
|
US4962171A
(en)
*
|
1987-05-22 |
1990-10-09 |
Hoechst Celanese Corporation |
Blocked monomer and polymers therefrom for use as photoresists
|
US5081001A
(en)
*
|
1987-05-22 |
1992-01-14 |
Hoechst Celanese Corporation |
Blocked monomer and polymers therefrom for use as photoresists
|
US4810613A
(en)
*
|
1987-05-22 |
1989-03-07 |
Hoechst Celanese Corporation |
Blocked monomer and polymers therefrom for use as photoresists
|
DE3718416A1
(de)
*
|
1987-06-02 |
1988-12-15 |
Hoechst Ag |
Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
|
DE3729034A1
(de)
*
|
1987-08-31 |
1989-03-09 |
Hoechst Ag |
Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial
|
JPH07119374B2
(ja)
*
|
1987-11-06 |
1995-12-20 |
関西ペイント株式会社 |
ポジ型感光性カチオン電着塗料組成物
|
US4837121A
(en)
*
|
1987-11-23 |
1989-06-06 |
Olin Hunt Specialty Products Inc. |
Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
|
US5024921A
(en)
*
|
1987-11-23 |
1991-06-18 |
Ocg Microelectronic Materials, Inc. |
Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image
|
US4970287A
(en)
*
|
1987-11-23 |
1990-11-13 |
Olin Hunt Specialty Products Inc. |
Thermally stable phenolic resin compositions with ortho, ortho methylene linkage
|
US5250669A
(en)
*
|
1987-12-04 |
1993-10-05 |
Wako Pure Chemical Industries, Ltd. |
Photosensitive compound
|
US4914000A
(en)
*
|
1988-02-03 |
1990-04-03 |
Hoechst Celanese Corporation |
Three dimensional reproduction material diazonium condensates and use in light sensitive
|
MX169700B
(es)
*
|
1988-06-13 |
1993-07-19 |
Sumitomo Chemical Co |
Composicion de capa protectora
|
DE3822522A1
(de)
*
|
1988-07-04 |
1990-03-22 |
Hoechst Ag |
1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
|
US5248582A
(en)
*
|
1988-09-07 |
1993-09-28 |
Fuji Photo Film Co., Ltd. |
Positive-type photoresist composition
|
DE3837499A1
(de)
*
|
1988-11-04 |
1990-05-23 |
Hoechst Ag |
Verfahren zur herstellung von substituierten 1,2-naphthochinon-(2)-diazid-4-sulfonsaeureestern und deren verwendung in einem strahlungsempfindlichen gemisch
|
DE3837500A1
(de)
*
|
1988-11-04 |
1990-05-23 |
Hoechst Ag |
Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
|
DE69029104T2
(de)
|
1989-07-12 |
1997-03-20 |
Fuji Photo Film Co Ltd |
Polysiloxane und positiv arbeitende Resistmasse
|
US5196517A
(en)
*
|
1989-10-30 |
1993-03-23 |
Ocg Microelectronic Materials, Inc. |
Selected trihydroxybenzophenone compounds and their use as photoactive compounds
|
US5219714A
(en)
*
|
1989-10-30 |
1993-06-15 |
Ocg Microelectronic Materials, Inc. |
Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
|
US5019478A
(en)
*
|
1989-10-30 |
1991-05-28 |
Olin Hunt Specialty Products, Inc. |
Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
|
US5075194A
(en)
*
|
1990-01-09 |
1991-12-24 |
Industrial Technology Research Institute |
Positive photoresist composition containing 4,4-diester, 4,5-diester, or 5,5-diester of spiroglycol and 1-oxo-2-diazonaphthalene-5-sulfonic acid chloride
|
US5238775A
(en)
*
|
1990-02-20 |
1993-08-24 |
Japan Synthetic Rubber Co., Ltd. |
Radiation-sensitive resin composition
|
JP2865147B2
(ja)
*
|
1990-06-20 |
1999-03-08 |
関西ペイント株式会社 |
ポジ型感光性電着塗料組成物
|
KR100209107B1
(ko)
*
|
1991-01-11 |
1999-07-15 |
고사이 아끼오 |
포지티브 레지스트 조성물
|
JP2944296B2
(ja)
|
1992-04-06 |
1999-08-30 |
富士写真フイルム株式会社 |
感光性平版印刷版の製造方法
|
US5384228A
(en)
*
|
1992-04-14 |
1995-01-24 |
Tokyo Ohka Kogyo Co., Ltd. |
Alkali-developable positive-working photosensitive resin composition
|
US5401605A
(en)
*
|
1992-08-12 |
1995-03-28 |
Tokyo Ohka Kogyo Co., Ltd. |
Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound
|
US5245518A
(en)
*
|
1992-09-04 |
1993-09-14 |
Jahabow Industries, Inc. |
Lighting system
|
JPH06342214A
(ja)
*
|
1993-04-09 |
1994-12-13 |
Mitsubishi Electric Corp |
微細レジストパターンの形成方法
|
GB9326150D0
(en)
*
|
1993-12-22 |
1994-02-23 |
Alcan Int Ltd |
Electrochemical roughening method
|
JPH0876380A
(ja)
|
1994-09-06 |
1996-03-22 |
Fuji Photo Film Co Ltd |
ポジ型印刷版組成物
|
JP3290316B2
(ja)
|
1994-11-18 |
2002-06-10 |
富士写真フイルム株式会社 |
感光性平版印刷版
|
US5467260A
(en)
*
|
1995-03-20 |
1995-11-14 |
Jahabow Industries, Inc. |
Lens retainer system for a showcase light
|
US5618932A
(en)
*
|
1995-05-24 |
1997-04-08 |
Shipley Company, L.L.C. |
Photoactive compounds and compositions
|
GB9517669D0
(en)
*
|
1995-08-30 |
1995-11-01 |
Cromax Uk Ltd |
A printing apparatus and method
|
JP3522923B2
(ja)
|
1995-10-23 |
2004-04-26 |
富士写真フイルム株式会社 |
ハロゲン化銀感光材料
|
US5645970A
(en)
*
|
1995-10-25 |
1997-07-08 |
Industrial Technology Research Institute |
Weak base developable positive photoresist composition containing quinonediazide compound
|
CA2191055A1
(en)
|
1995-12-04 |
1997-06-05 |
Major S. Dhillon |
Aqueous developable negative acting photosensitive composition having improved image contrast
|
JP3147908B2
(ja)
|
1996-04-23 |
2001-03-19 |
コダック ポリクローム グラフィックス カンパニー リミテッド |
感熱性組成物および該組成物を使用したリソグラフィックプリンティングフォームの作製方法
|
US6117610A
(en)
*
|
1997-08-08 |
2000-09-12 |
Kodak Polychrome Graphics Llc |
Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
|
GB9622657D0
(en)
|
1996-10-31 |
1997-01-08 |
Horsell Graphic Ind Ltd |
Direct positive lithographic plate
|
US6090532A
(en)
*
|
1997-03-21 |
2000-07-18 |
Kodak Polychrome Graphics Llc |
Positive-working infrared radiation sensitive composition and printing plate and imaging method
|
US6063544A
(en)
*
|
1997-03-21 |
2000-05-16 |
Kodak Polychrome Graphics Llc |
Positive-working printing plate and method of providing a positive image therefrom using laser imaging
|
EP1103373A3
(de)
|
1997-07-05 |
2001-07-18 |
Kodak Polychrome Graphics LLC |
Verfahren zur Bildung eines Musters, und Flachdruckplatten
|
US6060217A
(en)
*
|
1997-09-02 |
2000-05-09 |
Kodak Polychrome Graphics Llc |
Thermal lithographic printing plates
|
US6040107A
(en)
*
|
1998-02-06 |
2000-03-21 |
Olin Microelectronic Chemicals, Inc. |
Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures
|
US6045963A
(en)
*
|
1998-03-17 |
2000-04-04 |
Kodak Polychrome Graphics Llc |
Negative-working dry planographic printing plate
|
US6602274B1
(en)
|
1999-01-15 |
2003-08-05 |
Light Sciences Corporation |
Targeted transcutaneous cancer therapy
|
US6454789B1
(en)
*
|
1999-01-15 |
2002-09-24 |
Light Science Corporation |
Patient portable device for photodynamic therapy
|
US6296982B1
(en)
|
1999-11-19 |
2001-10-02 |
Kodak Polychrome Graphics Llc |
Imaging articles
|
US6787534B2
(en)
*
|
1999-12-28 |
2004-09-07 |
Eisai Co., Ltd. |
Sulfonamide-containing heterocyclic compounds
|
US20050037293A1
(en)
*
|
2000-05-08 |
2005-02-17 |
Deutsch Albert S. |
Ink jet imaging of a lithographic printing plate
|
US6511790B2
(en)
|
2000-08-25 |
2003-01-28 |
Fuji Photo Film Co., Ltd. |
Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
|
US20020142483A1
(en)
|
2000-10-30 |
2002-10-03 |
Sequenom, Inc. |
Method and apparatus for delivery of submicroliter volumes onto a substrate
|
EP2036721B1
(de)
|
2000-11-30 |
2011-02-09 |
FUJIFILM Corporation |
Flachdruckplattenvorläufer
|
US20040067435A1
(en)
|
2002-09-17 |
2004-04-08 |
Fuji Photo Film Co., Ltd. |
Image forming material
|
US7090958B2
(en)
*
|
2003-04-11 |
2006-08-15 |
Ppg Industries Ohio, Inc. |
Positive photoresist compositions having enhanced processing time
|
DE10345362A1
(de)
*
|
2003-09-25 |
2005-04-28 |
Kodak Polychrome Graphics Gmbh |
Verfahren zur Verhinderung von Beschichtungsdefekten
|
JP4404734B2
(ja)
|
2004-09-27 |
2010-01-27 |
富士フイルム株式会社 |
平版印刷版原版
|
JP4474296B2
(ja)
|
2005-02-09 |
2010-06-02 |
富士フイルム株式会社 |
平版印刷版原版
|
JP4404792B2
(ja)
|
2005-03-22 |
2010-01-27 |
富士フイルム株式会社 |
平版印刷版原版
|
EP2137140B1
(de)
*
|
2007-03-23 |
2010-11-10 |
Council of Scientific & Industrial Research |
Neues diazo-naphthochinon-schwefelsäure-bisphenolderivat für fotolithografische submikronstrukturierung und herstellungsverfahren dafür
|
US9130402B2
(en)
|
2007-08-28 |
2015-09-08 |
Causam Energy, Inc. |
System and method for generating and providing dispatchable operating reserve energy capacity through use of active load management
|
US20090180931A1
(en)
|
2007-09-17 |
2009-07-16 |
Sequenom, Inc. |
Integrated robotic sample transfer device
|
JP4890403B2
(ja)
|
2007-09-27 |
2012-03-07 |
富士フイルム株式会社 |
平版印刷版原版
|
JP2009085984A
(ja)
|
2007-09-27 |
2009-04-23 |
Fujifilm Corp |
平版印刷版原版
|
JP2009083106A
(ja)
|
2007-09-27 |
2009-04-23 |
Fujifilm Corp |
平版印刷版用版面保護剤及び平版印刷版の製版方法
|
JP4790682B2
(ja)
|
2007-09-28 |
2011-10-12 |
富士フイルム株式会社 |
平版印刷版原版
|
JP4994175B2
(ja)
|
2007-09-28 |
2012-08-08 |
富士フイルム株式会社 |
平版印刷版原版、及びそれに用いる共重合体の製造方法
|
EP2218519A4
(de)
|
2007-11-14 |
2012-03-21 |
Fujifilm Corp |
Verfahren zum trocknen eines beschichtungsfilms und verfahren zur herstellung eines vorläufers für eine lithographische druckplatte
|
JP2009236355A
(ja)
|
2008-03-26 |
2009-10-15 |
Fujifilm Corp |
乾燥方法及び装置
|
JP5164640B2
(ja)
|
2008-04-02 |
2013-03-21 |
富士フイルム株式会社 |
平版印刷版原版
|
JP5183380B2
(ja)
|
2008-09-09 |
2013-04-17 |
富士フイルム株式会社 |
赤外線レーザ用感光性平版印刷版原版
|
JP2010237435A
(ja)
|
2009-03-31 |
2010-10-21 |
Fujifilm Corp |
平版印刷版原版
|
EP2417123A2
(de)
|
2009-04-06 |
2012-02-15 |
Agios Pharmaceuticals, Inc. |
Therapeutische zusammensetzungen und damit in zusammenhang stehende anwendungsverfahren
|
WO2010129596A1
(en)
*
|
2009-05-04 |
2010-11-11 |
Agios Pharmaceuticals, Inc. |
Pmk2 modulators for use in the treatment of cancer
|
EP3708169A1
(de)
*
|
2009-06-29 |
2020-09-16 |
Agios Pharmaceuticals, Inc. |
2,3-dihydrobenzo[b][1,4]dioxin-6-sulfonamid-derivate mit antikrebswirkung
|
ES2618630T3
(es)
|
2009-06-29 |
2017-06-21 |
Agios Pharmaceuticals, Inc. |
Composiciones terapéuticas y métodos de uso relacionados
|
WO2011037005A1
(ja)
|
2009-09-24 |
2011-03-31 |
富士フイルム株式会社 |
平版印刷版原版
|
ES2759949T3
(es)
|
2009-10-29 |
2020-05-12 |
Bristol Myers Squibb Co |
Compuestos heterocíclicos tricíclicos
|
CA2797694A1
(en)
|
2010-04-29 |
2011-11-03 |
The United States Of America, As Represented By The Secretary, Departmen T Of Health And Human Services |
Activators of human pyruvate kinase
|
WO2012083246A1
(en)
|
2010-12-17 |
2012-06-21 |
Agios Pharmaceuticals, Inc. |
Novel n- (4- (azetidine - 1 - carbonyl) phenyl) - (hetero - ) arylsulfonamide derivatives as pyruvate kinase m2 (pmk2) modulators
|
CA2822432C
(en)
|
2010-12-21 |
2019-09-24 |
Agios Pharmaceuticals, Inc. |
Bicyclic pkm2 activators
|
TWI549947B
(zh)
|
2010-12-29 |
2016-09-21 |
阿吉歐斯製藥公司 |
治療化合物及組成物
|
US20140048741A1
(en)
|
2011-03-10 |
2014-02-20 |
3M Innovative Properties Company |
Filtration media
|
ME03074B
(de)
|
2011-05-03 |
2019-01-20 |
Agios Pharmaceuticals Inc |
Pyruvatkinaseaktivatoren zur verwendung in der therapie
|
WO2012151440A1
(en)
|
2011-05-03 |
2012-11-08 |
Agios Pharmaceuticals, Inc. |
Pyruvate kinase activators for use for increasing lifetime of the red blood cells and treating anemia
|
US8703385B2
(en)
|
2012-02-10 |
2014-04-22 |
3M Innovative Properties Company |
Photoresist composition
|
JP5490168B2
(ja)
|
2012-03-23 |
2014-05-14 |
富士フイルム株式会社 |
平版印刷版原版及び平版印刷版の作製方法
|
JP5512730B2
(ja)
|
2012-03-30 |
2014-06-04 |
富士フイルム株式会社 |
平版印刷版の作製方法
|
US8715904B2
(en)
|
2012-04-27 |
2014-05-06 |
3M Innovative Properties Company |
Photocurable composition
|
WO2014025716A1
(en)
|
2012-08-09 |
2014-02-13 |
3M Innovative Properties Company |
Photocurable compositions
|
US8883402B2
(en)
|
2012-08-09 |
2014-11-11 |
3M Innovative Properties Company |
Photocurable compositions
|
WO2014139144A1
(en)
|
2013-03-15 |
2014-09-18 |
Agios Pharmaceuticals, Inc. |
Therapeutic compounds and compositions
|
CA2989111C
(en)
|
2015-06-11 |
2023-10-03 |
Agios Pharmaceuticals, Inc. |
Methods of using pyruvate kinase activators
|
US11053836B1
(en)
|
2019-12-30 |
2021-07-06 |
Brunswick Corporation |
Marine drives having integrated exhaust and steering fluid cooling apparatus
|
CN116789562B
(zh)
*
|
2023-06-27 |
2024-06-04 |
安徽觅拓材料科技有限公司 |
一种重氮萘醌磺酸酯化合物及其制备方法和应用
|
CN117903017A
(zh)
*
|
2023-12-06 |
2024-04-19 |
湖北三峡实验室 |
一种电子级重氮萘醌类光引发剂的纯化方法
|