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NL1036306A1 - Lithographic apparatus and in-line cleaning apparatus. - Google Patents

Lithographic apparatus and in-line cleaning apparatus. Download PDF

Info

Publication number
NL1036306A1
NL1036306A1 NL1036306A NL1036306A NL1036306A1 NL 1036306 A1 NL1036306 A1 NL 1036306A1 NL 1036306 A NL1036306 A NL 1036306A NL 1036306 A NL1036306 A NL 1036306A NL 1036306 A1 NL1036306 A1 NL 1036306A1
Authority
NL
Netherlands
Prior art keywords
line cleaning
lithographic
cleaning apparatus
lithographic apparatus
line
Prior art date
Application number
NL1036306A
Other languages
English (en)
Inventor
Roelof Frederik De Graaf
Hans Jansen
Bauke Jansen
Hubertus Leonardus Franciscus Heusschen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1036306A1 publication Critical patent/NL1036306A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL1036306A 2007-12-20 2008-12-11 Lithographic apparatus and in-line cleaning apparatus. NL1036306A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US829907P 2007-12-20 2007-12-20

Publications (1)

Publication Number Publication Date
NL1036306A1 true NL1036306A1 (nl) 2009-06-23

Family

ID=40931330

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1036306A NL1036306A1 (nl) 2007-12-20 2008-12-11 Lithographic apparatus and in-line cleaning apparatus.

Country Status (3)

Country Link
US (4) US8243255B2 (nl)
JP (1) JP5331472B2 (nl)
NL (1) NL1036306A1 (nl)

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Also Published As

Publication number Publication date
US20120281190A1 (en) 2012-11-08
US20160342098A1 (en) 2016-11-24
US20150323875A1 (en) 2015-11-12
US8243255B2 (en) 2012-08-14
US20090195761A1 (en) 2009-08-06
JP2009177143A (ja) 2009-08-06
JP5331472B2 (ja) 2013-10-30
US9785061B2 (en) 2017-10-10
US9405205B2 (en) 2016-08-02
US9036128B2 (en) 2015-05-19

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