NL1036290A1 - Lithographic apparatus. - Google Patents
Lithographic apparatus. Download PDFInfo
- Publication number
- NL1036290A1 NL1036290A1 NL1036290A NL1036290A NL1036290A1 NL 1036290 A1 NL1036290 A1 NL 1036290A1 NL 1036290 A NL1036290 A NL 1036290A NL 1036290 A NL1036290 A NL 1036290A NL 1036290 A1 NL1036290 A1 NL 1036290A1
- Authority
- NL
- Netherlands
- Prior art keywords
- lithographic apparatus
- lithographic
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G10—MUSICAL INSTRUMENTS; ACOUSTICS
- G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
- G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/175—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using interference effects; Masking sound
- G10K11/178—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using interference effects; Masking sound by electro-acoustically regenerating the original acoustic waves in anti-phase
- G10K11/1785—Methods, e.g. algorithms; Devices
- G10K11/17857—Geometric disposition, e.g. placement of microphones
-
- G—PHYSICS
- G10—MUSICAL INSTRUMENTS; ACOUSTICS
- G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
- G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/175—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using interference effects; Masking sound
- G10K11/178—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using interference effects; Masking sound by electro-acoustically regenerating the original acoustic waves in anti-phase
- G10K11/1787—General system configurations
- G10K11/17873—General system configurations using a reference signal without an error signal, e.g. pure feedforward
-
- G—PHYSICS
- G10—MUSICAL INSTRUMENTS; ACOUSTICS
- G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
- G10K2210/00—Details of active noise control [ANC] covered by G10K11/178 but not provided for in any of its subgroups
- G10K2210/10—Applications
- G10K2210/129—Vibration, e.g. instead of, or in addition to, acoustic noise
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Acoustics & Sound (AREA)
- Multimedia (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Vibration Prevention Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US814707P | 2007-12-19 | 2007-12-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL1036290A1 true NL1036290A1 (nl) | 2009-06-22 |
Family
ID=40908277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1036290A NL1036290A1 (nl) | 2007-12-19 | 2008-12-08 | Lithographic apparatus. |
Country Status (3)
Country | Link |
---|---|
US (1) | US9378722B2 (nl) |
JP (1) | JP5308801B2 (nl) |
NL (1) | NL1036290A1 (nl) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9507277B2 (en) * | 2010-07-30 | 2016-11-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
NL2008178A (nl) * | 2011-02-25 | 2012-08-28 | Asml Netherlands Bv | Lithographic apparatus and stage system. |
KR20140027298A (ko) | 2011-04-22 | 2014-03-06 | 마퍼 리쏘그라피 아이피 비.브이. | 웨이퍼와 같은 타겟의 처리를 위한 리소그래피 시스템 및 웨이퍼와 같은 타겟의 처리를 위한 리소그래피 시스템 작동 방법 |
US9395635B2 (en) | 2011-04-22 | 2016-07-19 | Mapper Lithography Ip B.V. | Position determination in a lithography system using a substrate having a partially reflective position mark |
JP5932023B2 (ja) * | 2011-05-13 | 2016-06-08 | マッパー・リソグラフィー・アイピー・ビー.ブイ. | ターゲットの少なくとも一部を処理するためのリソグラフィシステム |
NL2008704A (en) * | 2011-06-20 | 2012-12-28 | Asml Netherlands Bv | Wavefront modification apparatus, lithographic apparatus and method. |
DE102012219806A1 (de) | 2012-10-30 | 2014-04-30 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit mindestens einem Mittel zur Reduktion des Einflusses von Druckschwankungen |
CN108732871B (zh) * | 2012-11-30 | 2021-03-30 | 株式会社尼康 | 搬送系统、曝光装置、器件制造方法、搬送方法、曝光方法 |
CN104345575B (zh) * | 2013-08-02 | 2017-12-29 | 上海微电子装备(集团)股份有限公司 | 用于光刻设备的真空声噪隔离系统 |
NL2018555A (en) | 2016-04-20 | 2017-10-31 | Asml Netherlands Bv | Substrate support, lithographic apparatus and loading method |
DE102019218305B4 (de) * | 2019-11-26 | 2022-02-24 | Carl Zeiss Smt Gmbh | Verfahren zur Kompensation von Anregungen bei der Lagerung eines Bauelements einer Projektionsbelichtungsanlage |
US11422460B2 (en) | 2019-12-12 | 2022-08-23 | Canon Kabushiki Kaisha | Alignment control in nanoimprint lithography using feedback and feedforward control |
US11604408B2 (en) * | 2021-02-24 | 2023-03-14 | Canon Kabushiki Kaisha | Adaptive feedforward and feedback control for controlled viscosity alignment and field-to-field related friction variation |
CN112987508B (zh) * | 2021-03-04 | 2022-09-30 | 长鑫存储技术有限公司 | 振动衰减结构及曝光装置 |
DE102021210470B3 (de) | 2021-09-21 | 2023-01-19 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Halbleiterlithografie |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0922870A (ja) | 1995-07-07 | 1997-01-21 | Nikon Corp | 投影露光装置 |
JPH09216140A (ja) | 1996-02-06 | 1997-08-19 | Nikon Corp | 振動低減方法および装置 |
US6002987A (en) * | 1996-03-26 | 1999-12-14 | Nikon Corporation | Methods to control the environment and exposure apparatus |
JPH09260279A (ja) | 1996-03-26 | 1997-10-03 | Nikon Corp | 露光装置 |
JP3837773B2 (ja) | 1996-03-28 | 2006-10-25 | 株式会社ニコン | 露光装置の環境制御方法及び装置 |
DE10106605A1 (de) * | 2001-02-13 | 2002-08-22 | Zeiss Carl | System zur Beseitigung oder wenigstens Dämpfung von Schwingungen |
JP4265257B2 (ja) | 2003-03-28 | 2009-05-20 | 株式会社ニコン | 露光装置及び露光方法、フィルム構造体 |
US7193722B2 (en) | 2003-12-30 | 2007-03-20 | Asml Netherlands B.V. | Lithographic apparatus with disturbance correction system and device manufacturing method |
JP2006032788A (ja) | 2004-07-20 | 2006-02-02 | Canon Inc | 露光装置及び半導体デバイスの製造方法 |
JP4418724B2 (ja) | 2004-09-17 | 2010-02-24 | キヤノン株式会社 | 露光装置 |
JP2007027371A (ja) | 2005-07-15 | 2007-02-01 | Nikon Corp | 気体供給装置、露光装置及びデバイスの製造方法 |
JP4472626B2 (ja) | 2005-12-14 | 2010-06-02 | 株式会社オーク製作所 | 露光装置 |
-
2008
- 2008-12-08 NL NL1036290A patent/NL1036290A1/nl active Search and Examination
- 2008-12-10 US US12/331,870 patent/US9378722B2/en not_active Expired - Fee Related
- 2008-12-15 JP JP2008318049A patent/JP5308801B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2009152597A (ja) | 2009-07-09 |
US9378722B2 (en) | 2016-06-28 |
JP5308801B2 (ja) | 2013-10-09 |
US20090195763A1 (en) | 2009-08-06 |
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