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NL1036290A1 - Lithographic apparatus. - Google Patents

Lithographic apparatus. Download PDF

Info

Publication number
NL1036290A1
NL1036290A1 NL1036290A NL1036290A NL1036290A1 NL 1036290 A1 NL1036290 A1 NL 1036290A1 NL 1036290 A NL1036290 A NL 1036290A NL 1036290 A NL1036290 A NL 1036290A NL 1036290 A1 NL1036290 A1 NL 1036290A1
Authority
NL
Netherlands
Prior art keywords
lithographic apparatus
lithographic
Prior art date
Application number
NL1036290A
Other languages
English (en)
Inventor
Hans Butler
Marc Wilhelmus Maria Van Wijst
Johan Hendrik Geerke
Peter Paul Hempenius
Youssef Karel Maria De Vos
Joost De Pee
Clementius Andreas Johannes Beijers
Nicolaas Bernardus Roozen
Erwin Antonius Van De Boogaert
Marco Hendrikus Herman Nijhuis
Francois Xavier Debiesme
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1036290A1 publication Critical patent/NL1036290A1/nl

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression or isolation
    • GPHYSICS
    • G10MUSICAL INSTRUMENTS; ACOUSTICS
    • G10KSOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K11/00Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/16Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/175Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using interference effects; Masking sound
    • G10K11/178Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using interference effects; Masking sound by electro-acoustically regenerating the original acoustic waves in anti-phase
    • G10K11/1785Methods, e.g. algorithms; Devices
    • G10K11/17857Geometric disposition, e.g. placement of microphones
    • GPHYSICS
    • G10MUSICAL INSTRUMENTS; ACOUSTICS
    • G10KSOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K11/00Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/16Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
    • G10K11/175Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using interference effects; Masking sound
    • G10K11/178Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using interference effects; Masking sound by electro-acoustically regenerating the original acoustic waves in anti-phase
    • G10K11/1787General system configurations
    • G10K11/17873General system configurations using a reference signal without an error signal, e.g. pure feedforward
    • GPHYSICS
    • G10MUSICAL INSTRUMENTS; ACOUSTICS
    • G10KSOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K2210/00Details of active noise control [ANC] covered by G10K11/178 but not provided for in any of its subgroups
    • G10K2210/10Applications
    • G10K2210/129Vibration, e.g. instead of, or in addition to, acoustic noise

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Acoustics & Sound (AREA)
  • Multimedia (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL1036290A 2007-12-19 2008-12-08 Lithographic apparatus. NL1036290A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US814707P 2007-12-19 2007-12-19

Publications (1)

Publication Number Publication Date
NL1036290A1 true NL1036290A1 (nl) 2009-06-22

Family

ID=40908277

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1036290A NL1036290A1 (nl) 2007-12-19 2008-12-08 Lithographic apparatus.

Country Status (3)

Country Link
US (1) US9378722B2 (nl)
JP (1) JP5308801B2 (nl)
NL (1) NL1036290A1 (nl)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9507277B2 (en) * 2010-07-30 2016-11-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2008178A (nl) * 2011-02-25 2012-08-28 Asml Netherlands Bv Lithographic apparatus and stage system.
KR20140027298A (ko) 2011-04-22 2014-03-06 마퍼 리쏘그라피 아이피 비.브이. 웨이퍼와 같은 타겟의 처리를 위한 리소그래피 시스템 및 웨이퍼와 같은 타겟의 처리를 위한 리소그래피 시스템 작동 방법
US9395635B2 (en) 2011-04-22 2016-07-19 Mapper Lithography Ip B.V. Position determination in a lithography system using a substrate having a partially reflective position mark
JP5932023B2 (ja) * 2011-05-13 2016-06-08 マッパー・リソグラフィー・アイピー・ビー.ブイ. ターゲットの少なくとも一部を処理するためのリソグラフィシステム
NL2008704A (en) * 2011-06-20 2012-12-28 Asml Netherlands Bv Wavefront modification apparatus, lithographic apparatus and method.
DE102012219806A1 (de) 2012-10-30 2014-04-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Mittel zur Reduktion des Einflusses von Druckschwankungen
CN108732871B (zh) * 2012-11-30 2021-03-30 株式会社尼康 搬送系统、曝光装置、器件制造方法、搬送方法、曝光方法
CN104345575B (zh) * 2013-08-02 2017-12-29 上海微电子装备(集团)股份有限公司 用于光刻设备的真空声噪隔离系统
NL2018555A (en) 2016-04-20 2017-10-31 Asml Netherlands Bv Substrate support, lithographic apparatus and loading method
DE102019218305B4 (de) * 2019-11-26 2022-02-24 Carl Zeiss Smt Gmbh Verfahren zur Kompensation von Anregungen bei der Lagerung eines Bauelements einer Projektionsbelichtungsanlage
US11422460B2 (en) 2019-12-12 2022-08-23 Canon Kabushiki Kaisha Alignment control in nanoimprint lithography using feedback and feedforward control
US11604408B2 (en) * 2021-02-24 2023-03-14 Canon Kabushiki Kaisha Adaptive feedforward and feedback control for controlled viscosity alignment and field-to-field related friction variation
CN112987508B (zh) * 2021-03-04 2022-09-30 长鑫存储技术有限公司 振动衰减结构及曝光装置
DE102021210470B3 (de) 2021-09-21 2023-01-19 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithografie

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0922870A (ja) 1995-07-07 1997-01-21 Nikon Corp 投影露光装置
JPH09216140A (ja) 1996-02-06 1997-08-19 Nikon Corp 振動低減方法および装置
US6002987A (en) * 1996-03-26 1999-12-14 Nikon Corporation Methods to control the environment and exposure apparatus
JPH09260279A (ja) 1996-03-26 1997-10-03 Nikon Corp 露光装置
JP3837773B2 (ja) 1996-03-28 2006-10-25 株式会社ニコン 露光装置の環境制御方法及び装置
DE10106605A1 (de) * 2001-02-13 2002-08-22 Zeiss Carl System zur Beseitigung oder wenigstens Dämpfung von Schwingungen
JP4265257B2 (ja) 2003-03-28 2009-05-20 株式会社ニコン 露光装置及び露光方法、フィルム構造体
US7193722B2 (en) 2003-12-30 2007-03-20 Asml Netherlands B.V. Lithographic apparatus with disturbance correction system and device manufacturing method
JP2006032788A (ja) 2004-07-20 2006-02-02 Canon Inc 露光装置及び半導体デバイスの製造方法
JP4418724B2 (ja) 2004-09-17 2010-02-24 キヤノン株式会社 露光装置
JP2007027371A (ja) 2005-07-15 2007-02-01 Nikon Corp 気体供給装置、露光装置及びデバイスの製造方法
JP4472626B2 (ja) 2005-12-14 2010-06-02 株式会社オーク製作所 露光装置

Also Published As

Publication number Publication date
JP2009152597A (ja) 2009-07-09
US9378722B2 (en) 2016-06-28
JP5308801B2 (ja) 2013-10-09
US20090195763A1 (en) 2009-08-06

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