[go: up one dir, main page]
More Web Proxy on the site http://driver.im/

WO2009063670A1 - レーザ加工装置およびレーザ加工方法 - Google Patents

レーザ加工装置およびレーザ加工方法 Download PDF

Info

Publication number
WO2009063670A1
WO2009063670A1 PCT/JP2008/065191 JP2008065191W WO2009063670A1 WO 2009063670 A1 WO2009063670 A1 WO 2009063670A1 JP 2008065191 W JP2008065191 W JP 2008065191W WO 2009063670 A1 WO2009063670 A1 WO 2009063670A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
laser light
laser
laser machining
phase
Prior art date
Application number
PCT/JP2008/065191
Other languages
English (en)
French (fr)
Inventor
Naoya Matsumoto
Takashi Inoue
Norihiro Fukuchi
Haruyasu Ito
Yuu Takiguchi
Original Assignee
Hamamatsu Photonics K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics K.K. filed Critical Hamamatsu Photonics K.K.
Priority to JP2009541063A priority Critical patent/JP5216019B2/ja
Priority to DE112008003101T priority patent/DE112008003101T5/de
Priority to CN2008801160640A priority patent/CN101861228B/zh
Priority to US12/742,491 priority patent/US8324529B2/en
Publication of WO2009063670A1 publication Critical patent/WO2009063670A1/ja
Priority to US13/678,006 priority patent/US8575514B2/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • B23K26/0661Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks disposed on the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067Dividing the beam into multiple beams, e.g. multifocusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/355Texturing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2294Addressing the hologram to an active spatial light modulator
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005Adaptation of holography to specific applications
    • G03H2001/0094Adaptation of holography to specific applications for patterning or machining using the holobject as input light distribution
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2225/00Active addressable light modulator
    • G03H2225/30Modulation
    • G03H2225/32Phase only

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)
  • Holo Graphy (AREA)

Abstract

 レーザ加工装置1は、レーザ光源10、空間光変調器20、制御部22、集光光学系30および遮蔽部材40を備える。位相変調型の空間光変調器20は、レーザ光源10から出力されたレーザ光を入力し、2次元配列された複数の画素それぞれにおいてレーザ光の位相を変調するホログラムを呈示して、その位相変調後のレーザ光を出力する。制御部22は、空間光変調器20に複数のホログラムを順次に呈示させ、空間光変調器20から出力されたレーザ光を、集光光学系30により一定数であるM個の集光位置に集光させ、これらM個の集光位置のうちN個の集光位置を加工領域91に選択的に配置させて、加工対象物90を加工する。
PCT/JP2008/065191 2007-11-14 2008-08-26 レーザ加工装置およびレーザ加工方法 WO2009063670A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2009541063A JP5216019B2 (ja) 2007-11-14 2008-08-26 レーザ加工装置およびレーザ加工方法
DE112008003101T DE112008003101T5 (de) 2007-11-14 2008-08-26 Laser-Bearbeitungsvorrichtung und Laser-Bearbeitungsverfahren
CN2008801160640A CN101861228B (zh) 2007-11-14 2008-08-26 激光加工装置以及激光加工方法
US12/742,491 US8324529B2 (en) 2007-11-14 2008-08-26 Laser machining device with a converged laser beam and laser machining method
US13/678,006 US8575514B2 (en) 2007-11-14 2012-11-15 Light irradiation device and light irradiation method irradiating converged light with an object

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-295931 2007-11-14
JP2007295931 2007-11-14

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12/742,491 A-371-Of-International US8324529B2 (en) 2007-11-14 2008-08-26 Laser machining device with a converged laser beam and laser machining method
US13/678,006 Continuation US8575514B2 (en) 2007-11-14 2012-11-15 Light irradiation device and light irradiation method irradiating converged light with an object

Publications (1)

Publication Number Publication Date
WO2009063670A1 true WO2009063670A1 (ja) 2009-05-22

Family

ID=40638524

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/065191 WO2009063670A1 (ja) 2007-11-14 2008-08-26 レーザ加工装置およびレーザ加工方法

Country Status (5)

Country Link
US (2) US8324529B2 (ja)
JP (2) JP5216019B2 (ja)
CN (1) CN101861228B (ja)
DE (1) DE112008003101T5 (ja)
WO (1) WO2009063670A1 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120188620A1 (en) * 2009-06-10 2012-07-26 Easy Laser, S.L. Laser image projection system applicable to the marking of objects and method for generating holograms
JP2012226268A (ja) * 2011-04-22 2012-11-15 Hamamatsu Photonics Kk 光変調制御方法、制御プログラム、制御装置、及びレーザ光照射装置
CN102896421A (zh) * 2012-07-30 2013-01-30 沈明亚 采用lcos的激光微加工系统及其加工方法
US9383597B2 (en) 2012-09-13 2016-07-05 Hamamatsu Photonics K.K. Optical modulation control method, control program, control device, and laser light irradiation device
CN107533246A (zh) * 2015-05-15 2018-01-02 浜松光子学株式会社 调制图案计算装置、光控制装置、调制图案计算方法、调制图案计算程序以及存储介质
JP2021529349A (ja) * 2018-07-02 2021-10-28 ウニベルシタ デ バルセローナ プログラム可能な多点照明器、共焦点フィルタ、共焦点顕微鏡、および共焦点顕微鏡を操作する方法
WO2023135860A1 (ja) * 2022-01-14 2023-07-20 パナソニックIpマネジメント株式会社 レーザ溶接装置及びレーザ溶接方法

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2243585B1 (de) * 2009-04-22 2018-08-08 KUKA Deutschland GmbH Verfahren und Vorrichtung zur Steuerung einer Positioniervorrichtung zum Schweißen
KR20140036593A (ko) * 2012-09-17 2014-03-26 삼성디스플레이 주식회사 레이저 가공 장치
JP5993738B2 (ja) * 2012-12-25 2016-09-14 浜松ホトニクス株式会社 パターン化干渉光生成装置
KR102215918B1 (ko) 2013-03-27 2021-02-16 하마마츠 포토닉스 가부시키가이샤 레이저 가공 장치 및 레이저 가공 방법
WO2014156689A1 (ja) 2013-03-27 2014-10-02 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
DE112014001696B4 (de) 2013-03-27 2024-06-06 Hamamatsu Photonics K.K. Laserbearbeitungsvorrichtung und Laserbearbeitungsverfahren
US9902017B2 (en) 2013-03-27 2018-02-27 Hamamatsu Photonics K.K. Laser machining device and laser machining method
DE102013205684B3 (de) * 2013-03-28 2014-09-04 BLZ Bayerisches Laserzentrum Gemeinnützige Forschungsgesellschaft mbH Vorrichtung zur lichtbogenbasierten, laserunterstützten Bearbeitung eines Werkstücks, insbesondere zu dessen Lichtbogenschweißen oder -schneiden
JP6290697B2 (ja) * 2014-04-22 2018-03-07 浜松ホトニクス株式会社 波形計測装置およびパルス光生成装置
GB2529808B (en) * 2014-08-26 2018-07-25 M Solv Ltd Apparatus and methods for performing laser ablation on a substrate
FR3026940B1 (fr) * 2014-10-08 2021-09-03 Univ Jean Monnet Dispositif et procede pour la decoupe d'une cornee ou d'un cristallin
WO2017115080A1 (en) * 2015-12-30 2017-07-06 Daqri Holographics Ltd Holographic system for controlling plasma
CN108027583B (zh) 2015-12-30 2020-10-09 杜尔利塔斯有限公司 动态全息非扫描打印装置
GB2561787B (en) * 2015-12-30 2022-01-05 Dualitas Ltd Dynamic holography printing device
DE202016008701U1 (de) 2015-12-30 2019-02-07 Dualitas Ltd. Dynamische holografieorientierte Tiefendruckvorrichtung
CN105499806B (zh) * 2016-01-28 2018-04-13 中国科学院上海光学精密机械研究所 透明材料中环状波导的飞秒激光直写装置和方法
JP6768444B2 (ja) * 2016-10-14 2020-10-14 浜松ホトニクス株式会社 レーザ加工装置、及び、動作確認方法
CN106646895B (zh) * 2017-01-13 2019-05-10 湖北工业大学 一种基于空间光调制器的激光光束整形装置及方法
CN107234343B (zh) * 2017-07-14 2018-09-14 中国科学院微电子研究所 一种激光加工晶圆的方法及装置
FR3077647B1 (fr) * 2018-02-07 2020-01-17 Idemia Identity And Security Element optique monobloc a diaphragme
JP6934083B1 (ja) * 2020-04-08 2021-09-08 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
BE1027700B1 (fr) * 2020-04-24 2021-05-18 Laser Eng Applications Dispositif pour un système optique d’usinage laser
US11803155B2 (en) 2020-08-20 2023-10-31 Samsung Electronics Co., Ltd. Method and apparatus for generating computer-generated hologram
JP2023145943A (ja) * 2022-03-29 2023-10-12 浜松ホトニクス株式会社 空間光変調装置、加工装置、及び、位置推定方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4956650A (ja) * 1972-05-19 1974-06-01
JPS54102692A (en) * 1978-01-30 1979-08-13 Toshiba Corp Method of working with laser and hologram
JPS5781986A (en) * 1980-11-12 1982-05-22 Hitachi Ltd Method and device for laser working
JPS62263862A (ja) * 1986-05-12 1987-11-16 Toshiba Corp レ−ザ加工装置
JPH07290264A (ja) * 1994-04-28 1995-11-07 Mitsubishi Electric Corp レーザ転写加工装置
JP2005246686A (ja) * 2004-03-02 2005-09-15 Dainippon Printing Co Ltd レーザ光を用いた熱転写装置、レーザ光を用いた熱転写方法、及び、これらに用いられる熱転写シート

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376303A (en) * 1980-12-19 1983-03-08 Rca Corporation Quasi-zoom lens optical focus sensor
DE3617421A1 (de) * 1986-04-30 1987-11-05 Leitz Ernst Gmbh Optisches bauelement und vorrichtung zu dessen verwendung
US5024529A (en) * 1988-01-29 1991-06-18 Synthetic Vision Systems, Inc. Method and system for high-speed, high-resolution, 3-D imaging of an object at a vision station
US6091523A (en) * 1989-02-07 2000-07-18 Northrop Grumman Corporation Multi-channel receiver
US5132811A (en) * 1989-08-10 1992-07-21 Seiko Instruments Inc. Holographic operating optical apparatus
CN1024438C (zh) 1991-08-15 1994-05-04 中国科学院上海光学精密机械研究所 多功能激光调阻机
US5212572A (en) * 1991-11-22 1993-05-18 International Business Machines Corporation Optical data storage system with compact holographic polarization-sensing or reflectivity-sensing optical storage head
DE69219101T2 (de) * 1992-02-03 1997-07-24 Matsushita Electric Ind Co Ltd Laserbearbeitungsvorrichtung und Verfahren zum Einstellen der Höhe des Kondensor
US5510912A (en) * 1993-08-09 1996-04-23 International Business Machines Corporation Method and apparatus for modulation of multi-dimensional data in holographic storage
US5523543A (en) * 1994-09-09 1996-06-04 Litel Instruments Laser ablation control system and method
JPH08215875A (ja) * 1995-02-13 1996-08-27 Nikon Corp レーザ加工装置
JP3292058B2 (ja) * 1996-10-01 2002-06-17 三菱電機株式会社 レーザ光による配線基板の加工方法及びその装置
JPH11195245A (ja) * 1997-12-26 1999-07-21 Victor Co Of Japan Ltd 光記録媒体及び光記録媒体の情報読取り装置
JP3745225B2 (ja) * 1997-12-26 2006-02-15 三菱電機株式会社 レーザ加工装置
US6687010B1 (en) * 1999-09-09 2004-02-03 Olympus Corporation Rapid depth scanning optical imaging device
AU2001222241A1 (en) * 2000-01-19 2001-07-31 Hamamatsu Photonics K.K. Laser machinning device
US20010050787A1 (en) * 2000-05-22 2001-12-13 Intelligent Pixels, Inc. Electro-optical component having a reconfigurable phase state
KR100500343B1 (ko) * 2000-08-29 2005-07-12 미쓰비시덴키 가부시키가이샤 레이저 가공 장치
JP2002123948A (ja) * 2000-10-12 2002-04-26 Optware:Kk 光情報記録装置および方法、光情報再生装置および方法、光情報記録再生装置および方法、ならびに光情報記録媒体
US6597446B2 (en) * 2001-03-22 2003-07-22 Sentec Corporation Holographic scatterometer for detection and analysis of wafer surface deposits
US6862120B2 (en) * 2001-03-22 2005-03-01 Pioneer Corporation Hologram recording medium, hologram recording method and hologram recording and reproducing apparatus
US6804269B2 (en) * 2001-06-19 2004-10-12 Hitachi Via Mechanics, Ltd. Laser beam delivery system with trepanning module
US7116626B1 (en) * 2001-11-27 2006-10-03 Inphase Technologies, Inc. Micro-positioning movement of holographic data storage system components
US7149014B2 (en) * 2003-04-18 2006-12-12 California Institute Of Technology Holographic memory using beam steering
JP3924549B2 (ja) * 2003-04-23 2007-06-06 Tdk株式会社 ホログラム記録再生方法及び装置
US7190496B2 (en) * 2003-07-24 2007-03-13 Zebra Imaging, Inc. Enhanced environment visualization using holographic stereograms
JP2005088052A (ja) 2003-09-18 2005-04-07 Disco Abrasive Syst Ltd レーザー加工装置
JP4358602B2 (ja) * 2003-10-31 2009-11-04 Tdk株式会社 多層ホログラフィック記録再生方法、多層ホログラフィックメモリ再生装置及び多層ホログラフィック記録再生装置
US7325929B2 (en) * 2003-12-31 2008-02-05 Symbol Technologies, Inc. Method and apparatus for controllably modulating a laser in a laser projection display
JP2007193852A (ja) * 2004-03-30 2007-08-02 Pioneer Electronic Corp ホログラム記録担体
KR20070030191A (ko) * 2004-04-16 2007-03-15 디시이 아프릴리스, 인코포레이티드 홀로그래픽 매체의 보정피처를 이용한 홀로그래픽데이터저장시스템의 보정
JP4527488B2 (ja) * 2004-10-07 2010-08-18 株式会社ディスコ レーザ加工装置
US20060140102A1 (en) * 2004-12-23 2006-06-29 Christophe Sigel System and method for parallel selection and retrieval of data stored in a holographic data storage medium
US7283286B2 (en) * 2004-12-27 2007-10-16 Sony Corporation Hologram recording/reproducing device and optical unit
US7532311B2 (en) * 2005-04-06 2009-05-12 Lockheed Martin Coherent Technologies, Inc. Efficient lidar with flexible target interrogation pattern
WO2007049336A1 (ja) * 2005-10-25 2007-05-03 Fujitsu Limited ホログラム記録装置
JP4426520B2 (ja) * 2005-11-15 2010-03-03 富士通株式会社 ホログラム記録再生装置およびホログラム記録再生方法
JP5166397B2 (ja) * 2006-04-04 2013-03-21 テーザ スクリボス ゲゼルシャフト ミット ベシュレンクテル ハフツング ストレージ媒体を微細構造化するためのデバイスおよび方法ならびに微細構造領域を含むストレージ媒体
US7733557B2 (en) * 2006-04-24 2010-06-08 Micron Technology, Inc. Spatial light modulators with changeable phase masks for use in holographic data storage
GB2453884A (en) * 2006-07-28 2009-04-22 Fujitsu Ltd Hologram recording device
JP2008175925A (ja) * 2007-01-17 2008-07-31 Hitachi Ltd 光情報記録再生装置および光記録媒体
WO2008090612A1 (ja) * 2007-01-25 2008-07-31 Fujitsu Limited ホログラム記録再生装置、ホログラム記録再生方法、およびホログラム記録媒体
WO2008094141A1 (en) * 2007-01-29 2008-08-07 Celloptic, Inc. System, apparatus and method for extracting image cross-sections of an object from received electromagnetic radiation
US7787164B2 (en) * 2007-02-26 2010-08-31 International Business Machines Corporation Apparatus and method to evaluate a holographic data storage medium
JP2009037685A (ja) * 2007-08-01 2009-02-19 Sony Corp ホログラム記録再生装置
JP4956650B2 (ja) 2010-07-28 2012-06-20 株式会社東芝 再生制御装置及び再生制御方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4956650A (ja) * 1972-05-19 1974-06-01
JPS54102692A (en) * 1978-01-30 1979-08-13 Toshiba Corp Method of working with laser and hologram
JPS5781986A (en) * 1980-11-12 1982-05-22 Hitachi Ltd Method and device for laser working
JPS62263862A (ja) * 1986-05-12 1987-11-16 Toshiba Corp レ−ザ加工装置
JPH07290264A (ja) * 1994-04-28 1995-11-07 Mitsubishi Electric Corp レーザ転写加工装置
JP2005246686A (ja) * 2004-03-02 2005-09-15 Dainippon Printing Co Ltd レーザ光を用いた熱転写装置、レーザ光を用いた熱転写方法、及び、これらに用いられる熱転写シート

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120188620A1 (en) * 2009-06-10 2012-07-26 Easy Laser, S.L. Laser image projection system applicable to the marking of objects and method for generating holograms
JP2012226268A (ja) * 2011-04-22 2012-11-15 Hamamatsu Photonics Kk 光変調制御方法、制御プログラム、制御装置、及びレーザ光照射装置
CN102896421A (zh) * 2012-07-30 2013-01-30 沈明亚 采用lcos的激光微加工系统及其加工方法
CN102896421B (zh) * 2012-07-30 2015-12-02 沈明亚 采用lcos的激光微加工系统及其加工方法
US9383597B2 (en) 2012-09-13 2016-07-05 Hamamatsu Photonics K.K. Optical modulation control method, control program, control device, and laser light irradiation device
CN107533246A (zh) * 2015-05-15 2018-01-02 浜松光子学株式会社 调制图案计算装置、光控制装置、调制图案计算方法、调制图案计算程序以及存储介质
US10989935B2 (en) 2015-05-15 2021-04-27 Hamamatsu Photonics K.K. Modulation pattern calculation device, light control device, modulation pattern calculation method, modulation pattern calculation program, and storage medium
JP2021529349A (ja) * 2018-07-02 2021-10-28 ウニベルシタ デ バルセローナ プログラム可能な多点照明器、共焦点フィルタ、共焦点顕微鏡、および共焦点顕微鏡を操作する方法
JP7390732B2 (ja) 2018-07-02 2023-12-04 ウニベルシタ デ バルセローナ プログラム可能な多点照明器、共焦点フィルタ、共焦点顕微鏡、および共焦点顕微鏡を操作する方法
US11860349B2 (en) 2018-07-02 2024-01-02 Universitat De Barcelona Programmable multiple-point illuminator, confocal filter, confocal microscope and method to operate said confocal microscope
WO2023135860A1 (ja) * 2022-01-14 2023-07-20 パナソニックIpマネジメント株式会社 レーザ溶接装置及びレーザ溶接方法

Also Published As

Publication number Publication date
JPWO2009063670A1 (ja) 2011-03-31
US8324529B2 (en) 2012-12-04
US8575514B2 (en) 2013-11-05
CN101861228B (zh) 2013-09-11
JP5438176B2 (ja) 2014-03-12
JP5216019B2 (ja) 2013-06-19
CN101861228A (zh) 2010-10-13
US20100270277A1 (en) 2010-10-28
JP2012238012A (ja) 2012-12-06
US20130068742A1 (en) 2013-03-21
DE112008003101T5 (de) 2010-10-14

Similar Documents

Publication Publication Date Title
WO2009063670A1 (ja) レーザ加工装置およびレーザ加工方法
TW200741385A (en) Multimode representation of image contents on a display device for video holograms.
TW201712443A (en) Illumination optical apparatus, exposure apparatus, illumination method, exposure method, and device manufacturing method
WO2009031418A1 (ja) 顕微鏡装置
JP2010539532A5 (ja)
WO2014115129A3 (en) Dynamic aperture holography
GB2438681B (en) Methods and apparatus for displaying colour images using holograms
MY148365A (en) Photonic crystal security device and method
GB201104235D0 (en) Optical beam routing apparatus and methods
DE502006001767D1 (de) Projektionsvorrichtung und verfahren zur holographischen rekonstruktion von szenen
ATE516522T1 (de) Systeme zur anzeige holographischer bilder
WO2010033723A3 (en) Photonic milling using dynamic beam arrays
ATE450816T1 (de) Verfahren und einrichtung zum rendern und generieren computer-generierter videohologramme
GB0907297D0 (en) Dynamic backlighting
GB201119015D0 (en) Optical imaging system
FR2967791B1 (fr) Procede et systeme de calibration d'un modulateur optique spatial dans un microscope optique
HU0700132D0 (en) Phase modulator system comprising a beam splitter and a linear polarisation mode phase modulator and method for separating a light beam travelling toward and reflected back from such a phase modulator
WO2011044464A8 (en) System, method and apparatus for wavelength-coded multi-focal microscopy
ATE373839T1 (de) Erzeugung eines gewünschten dreidimensionalen elektromagnetischen feldes
WO2009078223A1 (ja) 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法
WO2006135587A3 (en) Holographic combiners for illumination of spatial light modulators in projection systems
MX2009007306A (es) Sistema de almacenamiento holografico para leer un holograma almacenado en un medio de almacenamiento holografico y un procedimiento llevado a cabo con el mismo.
MD278Z (ro) Metodă de măsurare a dimensiunilor microobiectelor
WO2007141709A3 (en) Method of reducing effective pixel pitch in electroholographic display and electroholographic display including the same
WO2009057210A1 (ja) ホログラム記録装置

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880116064.0

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08792737

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2009541063

Country of ref document: JP

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 12742491

Country of ref document: US

RET De translation (de og part 6b)

Ref document number: 112008003101

Country of ref document: DE

Date of ref document: 20101014

Kind code of ref document: P

122 Ep: pct application non-entry in european phase

Ref document number: 08792737

Country of ref document: EP

Kind code of ref document: A1