TWI347245B - Method of polishing wafer and wafer polishing apparatus - Google Patents
Method of polishing wafer and wafer polishing apparatusInfo
- Publication number
- TWI347245B TWI347245B TW094109729A TW94109729A TWI347245B TW I347245 B TWI347245 B TW I347245B TW 094109729 A TW094109729 A TW 094109729A TW 94109729 A TW94109729 A TW 94109729A TW I347245 B TWI347245 B TW I347245B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- polishing
- polishing apparatus
- wafer polishing
- polishing wafer
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title 1
- 238000007517 polishing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004104535 | 2004-03-31 | ||
JP2005053148A JP4520327B2 (ja) | 2004-03-31 | 2005-02-28 | 吸水方法及び吸水装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200531789A TW200531789A (en) | 2005-10-01 |
TWI347245B true TWI347245B (en) | 2011-08-21 |
Family
ID=34889458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094109729A TWI347245B (en) | 2004-03-31 | 2005-03-29 | Method of polishing wafer and wafer polishing apparatus |
Country Status (5)
Country | Link |
---|---|
US (1) | US7201640B2 (zh) |
EP (1) | EP1582294B1 (zh) |
JP (1) | JP4520327B2 (zh) |
KR (1) | KR101114200B1 (zh) |
TW (1) | TWI347245B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108527070A (zh) * | 2018-05-25 | 2018-09-14 | 哈尔滨奥瑞德光电技术有限公司 | 一种用于陶瓷手机背板抛光加工的工装 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2001642C2 (nl) * | 2008-05-30 | 2009-12-01 | Fico Bv | Inrichting en werkwijze voor het drogen van gesepareerde elektronische componenten. |
DE102008045534B4 (de) * | 2008-09-03 | 2011-12-01 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
JP5648954B2 (ja) * | 2010-08-31 | 2015-01-07 | 不二越機械工業株式会社 | 研磨装置 |
CN106057711B (zh) * | 2016-08-04 | 2018-10-02 | 中山德华芯片技术有限公司 | 一种应用于晶圆片涂胶清洗设备的除水雾装置 |
KR102712571B1 (ko) | 2018-08-06 | 2024-10-04 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판 보유 지지 장치 및 기판 연마 장치 |
CN117140236B (zh) * | 2023-10-25 | 2024-01-26 | 苏州博宏源机械制造有限公司 | 一种晶圆厚度在线测量装置及方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4193226A (en) * | 1977-09-21 | 1980-03-18 | Kayex Corporation | Polishing apparatus |
US4521995A (en) * | 1980-05-23 | 1985-06-11 | Disco Co., Ltd. | Wafer attracting and fixing device |
JPS6022500B2 (ja) | 1980-05-23 | 1985-06-03 | 株式会社デイスコ | 位置合せ載置方法 |
JPS6114854A (ja) * | 1984-06-28 | 1986-01-23 | Toshiba Corp | 研磨治具 |
US5558111A (en) * | 1995-02-02 | 1996-09-24 | International Business Machines Corporation | Apparatus and method for carrier backing film reconditioning |
JPH09262763A (ja) * | 1996-03-28 | 1997-10-07 | Shin Etsu Handotai Co Ltd | バッキングパッドの製造方法および装置 |
JP3696690B2 (ja) * | 1996-04-23 | 2005-09-21 | 不二越機械工業株式会社 | ウェーハの研磨装置システム |
JPH11188617A (ja) * | 1997-12-26 | 1999-07-13 | Nippon Daasu Bondo Kk | 被研磨体の保持部材及びこの保持部材を用いた被研磨体の研磨方法 |
KR100286980B1 (ko) * | 1998-02-11 | 2001-04-16 | 윤종용 | 웨이퍼 연마 설비 및 웨이퍼 연마 방법 |
JP3963083B2 (ja) * | 2001-06-27 | 2007-08-22 | 信越半導体株式会社 | ワークの研磨方法及び研磨装置 |
-
2005
- 2005-02-28 JP JP2005053148A patent/JP4520327B2/ja active Active
- 2005-03-29 TW TW094109729A patent/TWI347245B/zh active
- 2005-03-30 US US11/093,426 patent/US7201640B2/en not_active Expired - Fee Related
- 2005-03-31 EP EP05252050A patent/EP1582294B1/en not_active Ceased
- 2005-03-31 KR KR1020050026948A patent/KR101114200B1/ko active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108527070A (zh) * | 2018-05-25 | 2018-09-14 | 哈尔滨奥瑞德光电技术有限公司 | 一种用于陶瓷手机背板抛光加工的工装 |
Also Published As
Publication number | Publication date |
---|---|
TW200531789A (en) | 2005-10-01 |
KR101114200B1 (ko) | 2012-02-22 |
EP1582294A2 (en) | 2005-10-05 |
EP1582294A3 (en) | 2006-04-12 |
US20050221725A1 (en) | 2005-10-06 |
US7201640B2 (en) | 2007-04-10 |
JP2005313312A (ja) | 2005-11-10 |
KR20060012246A (ko) | 2006-02-07 |
EP1582294B1 (en) | 2012-03-21 |
JP4520327B2 (ja) | 2010-08-04 |
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