TW201416335A - Glass substrate for solar cell and solar cell using same - Google Patents
Glass substrate for solar cell and solar cell using same Download PDFInfo
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- TW201416335A TW201416335A TW102131522A TW102131522A TW201416335A TW 201416335 A TW201416335 A TW 201416335A TW 102131522 A TW102131522 A TW 102131522A TW 102131522 A TW102131522 A TW 102131522A TW 201416335 A TW201416335 A TW 201416335A
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- 239000011521 glass Substances 0.000 title claims abstract description 298
- 239000000758 substrate Substances 0.000 title claims abstract description 210
- 239000005357 flat glass Substances 0.000 claims abstract description 32
- 238000004031 devitrification Methods 0.000 claims abstract description 29
- 230000009477 glass transition Effects 0.000 claims abstract description 24
- 229910004613 CdTe Inorganic materials 0.000 claims description 47
- 239000006059 cover glass Substances 0.000 claims description 25
- 238000006243 chemical reaction Methods 0.000 claims description 18
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 16
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- 238000010248 power generation Methods 0.000 abstract description 39
- 238000004519 manufacturing process Methods 0.000 abstract description 22
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 abstract description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 42
- 239000011734 sodium Substances 0.000 description 40
- 238000002844 melting Methods 0.000 description 26
- 230000008018 melting Effects 0.000 description 26
- 238000000034 method Methods 0.000 description 24
- 239000000203 mixture Substances 0.000 description 23
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 16
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 14
- 238000009792 diffusion process Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000006060 molten glass Substances 0.000 description 10
- 239000002994 raw material Substances 0.000 description 9
- 239000011787 zinc oxide Substances 0.000 description 9
- 238000007667 floating Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 230000001737 promoting effect Effects 0.000 description 8
- 239000003513 alkali Substances 0.000 description 7
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 6
- 229910010413 TiO 2 Inorganic materials 0.000 description 6
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 150000003609 titanium compounds Chemical class 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000005361 soda-lime glass Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 238000004151 rapid thermal annealing Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 238000007545 Vickers hardness test Methods 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000005083 Zinc sulfide Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000000224 chemical solution deposition Methods 0.000 description 2
- 238000005352 clarification Methods 0.000 description 2
- 239000008395 clarifying agent Substances 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 240000002329 Inga feuillei Species 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 description 1
- 229910000331 cadmium sulfate Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical compound [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 1
- 229910052951 chalcopyrite Inorganic materials 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- IAOQICOCWPKKMH-UHFFFAOYSA-N dithieno[3,2-a:3',2'-d]thiophene Chemical compound C1=CSC2=C1C(C=CS1)=C1S2 IAOQICOCWPKKMH-UHFFFAOYSA-N 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000012314 multivariate regression analysis Methods 0.000 description 1
- BBJSDUUHGVDNKL-UHFFFAOYSA-J oxalate;titanium(4+) Chemical compound [Ti+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O BBJSDUUHGVDNKL-UHFFFAOYSA-J 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 1
- 229910000058 selane Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- VPQBLCVGUWPDHV-UHFFFAOYSA-N sodium selenide Chemical compound [Na+].[Na+].[Se-2] VPQBLCVGUWPDHV-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
- H10F77/1694—Thin semiconductor films on metallic or insulating substrates the films including Group I-III-VI materials, e.g. CIS or CIGS
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Photovoltaic Devices (AREA)
Abstract
本發明提供一種太陽電池用玻璃基板及使用其之太陽電池,該太陽電池用玻璃基板係均衡滿足高發電效率、高玻璃轉移點溫度、預定之平均熱膨脹係數、高玻璃強度、低玻璃密度,以及,板玻璃生產時之高熔解性、良好的成形性及良好的防失透性等的特性者。一種太陽電池用玻璃基板,以下述氧化物為基準之質量百分率表示,含有:50~65%之SiO2、8~15%之Al2O3、0~1%之B2O3、0~10%之MgO、1~12%之CaO、6~12%之SrO、0~3%之BaO、1~7%之ZrO2、2~8%之Na2O、0~8%之K2O、15~30%之MgO+CaO+SrO+BaO;且SrO/Na2O為0.8~2.5。The present invention provides a glass substrate for a solar cell and a solar cell using the same, which satisfies a high power generation efficiency, a high glass transition point temperature, a predetermined average thermal expansion coefficient, a high glass strength, a low glass density, and the like. In the production of sheet glass, it has high meltability, good formability, and good resistance to devitrification. A glass substrate for a solar cell, which is represented by a mass percentage based on the following oxides, and contains: 50 to 65% of SiO2, 8 to 15% of Al2O3, 0 to 1% of B2O3, and 0 to 10% of MgO, 1~. 12% CaO, 6-12% SrO, 0~3% BaO, 1~7% ZrO2, 2~8% Na2O, 0~8% K2O, 15~30% MgO+CaO+SrO +BaO; and SrO/Na2O is 0.8~2.5.
Description
本發明係有關於一種用於玻璃基板之間形成有光電轉換層之太陽電池的玻璃基板及使用其之太陽電池。更詳而言之,本發明係有關於一種用於玻璃基板之間形成有Cu-In-Ga-Se之光電轉換層或CdTe之光電轉換層等的Cu-In-Ga-Se太陽電池或CdTe太陽電池等的玻璃基板及使用其之太陽電池。 The present invention relates to a glass substrate for a solar cell in which a photoelectric conversion layer is formed between glass substrates, and a solar cell using the same. More specifically, the present invention relates to a Cu-In-Ga-Se solar cell or CdTe for forming a photoelectric conversion layer of Cu-In-Ga-Se or a photoelectric conversion layer of CdTe between glass substrates. A glass substrate such as a solar cell or a solar cell using the same.
擁有黄銅礦結晶構造之第11-13族、第11-16族化合物半導體或立方晶系或六方晶系之第12-16族化合物半導體,其等對由可見至近紅外線之波長範圍的光具有的吸收係數大。因此,而被期待作為高效率薄膜太陽電池之材料。作為代表性的例子,可舉Cu(In,Ga)Se2(以下,記為「CIGS」或「Cu-In-Ga-Se」)及CdTe。 a compound semiconductor having a chalcopyrite crystal structure of Groups 11-13, 11-16th compound semiconductor or a cubic crystal system or a hexagonal system of Group 12-16, which has a light having a wavelength range from visible to near infrared rays The absorption coefficient is large. Therefore, it is expected to be a material for high-efficiency thin film solar cells. Typical examples include Cu(In,Ga)Se 2 (hereinafter referred to as "CIGS" or "Cu-In-Ga-Se") and CdTe.
以CIGS薄膜太陽電池(以下,亦稱「CIGS太陽電池」)及CdTe薄膜太陽電池(以下,亦稱「CdTe太陽電池」)來說,因價格便宜與其平均熱膨脹係數與CIGS化合物半導體之平均熱膨脹係數相近,故一直使用鈉鈣玻璃作為基 板,來製得太陽電池。 For CIGS thin film solar cells (hereinafter also referred to as "CIGS solar cells") and CdTe thin film solar cells (hereinafter, also referred to as "CdTe solar cells"), the average thermal expansion coefficient and the average thermal expansion coefficient of CIGS compound semiconductors are cheap. Similar, so the use of soda lime glass as a base Plate to make solar cells.
近年來,亦提案有可耐高溫之熱處理溫度的玻璃材料作為CIGS太陽電池用玻璃基板(例如參照專利文獻1~5)。 In recent years, a glass material which can withstand heat treatment at a high temperature has been proposed as a glass substrate for a CIGS solar cell (see, for example, Patent Documents 1 to 5).
專利文獻1:日本特開平11-135819號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. Hei 11-135819
專利文獻2:日本特開2010-118505號公報 Patent Document 2: Japanese Laid-Open Patent Publication No. 2010-118505
專利文獻3:日本特開平8-290938號公報 Patent Document 3: Japanese Patent Laid-Open No. Hei 8-290938
專利文獻4:日本特開2008-280189號公報 Patent Document 4: Japanese Laid-Open Patent Publication No. 2008-280189
專利文獻5:日本特開2010-267965號公報 Patent Document 5: Japanese Laid-Open Patent Publication No. 2010-267965
於CIGS太陽電池中,玻璃基板之間雖形成有CIGS光電轉換層(以下,亦稱「CIGS層」),但為製作發電效率佳之太陽電池係以於較高溫下的熱處理為佳,因而要求玻璃基板需可承受該熱處理。然而,於專利文獻1~4中雖提案有徐冷點較高的玻璃組成物,但於專利文獻1~4所記載之發明卻未必可稱具有高發電效率。 In the CIGS solar cell, a CIGS photoelectric conversion layer (hereinafter also referred to as "CIGS layer") is formed between the glass substrates, but in order to produce a solar cell system with good power generation efficiency, heat treatment at a relatively high temperature is preferable, and thus glass is required. The substrate needs to be able to withstand the heat treatment. However, in the patent documents 1 to 4, a glass composition having a high cold point is proposed, but the inventions described in Patent Documents 1 to 4 are not necessarily said to have high power generation efficiency.
更詳細地說,於專利文獻2、4所記載的發明,係提案有應變點高且滿足預定之平均熱膨脹係數之太陽電池用玻璃。但是,專利文獻2之課題係確保耐熱性與改善生產性,且專利文獻4之課題為表面質感之提升與改善耐失透性,均非解決有關發電效率之課題者。因此,專利文獻2、 4所記載之發明未必可稱具有高發電效率。 More specifically, in the inventions described in Patent Documents 2 and 4, a glass for a solar cell having a high strain point and satisfying a predetermined average thermal expansion coefficient is proposed. However, the subject of Patent Document 2 is to ensure heat resistance and improve productivity, and the subject of Patent Document 4 is to improve the surface texture and to improve the resistance to devitrification, and it is not intended to solve the problem of power generation efficiency. Therefore, Patent Document 2 The invention described in 4 may not necessarily be said to have high power generation efficiency.
又,於專利文獻3中,雖有相近於專利文獻2之高應變點玻璃基板之提案,但該提案係著重於電漿顯示器用途者而為課題不同者,故專利文獻3記載之發明未必可稱具有高發電效率。 Further, in Patent Document 3, there is a proposal for a glass substrate having a high strain point similar to that of Patent Document 2. However, this proposal is focused on the use of a plasma display device, and the invention described in Patent Document 3 may not be possible. It is said to have high power generation efficiency.
再者,於專利文獻4中,係提案有含有較多氧化硼,且應變點高並且滿足預定之平均熱膨脹係數的玻璃。然而,一旦玻璃中存在有許多硼的話,即會如專利文獻5所載,硼會擴散於為p型半導體之CIGS層中並作為予體發揮作用,而恐有使發電效率降低之虞。進而言之,因需要硼之去除設備而有容易增加成本的問題。 Further, in Patent Document 4, a glass containing a large amount of boron oxide and having a high strain point and satisfying a predetermined average thermal expansion coefficient is proposed. However, when a large amount of boron is present in the glass, as disclosed in Patent Document 5, boron diffuses into the CIGS layer which is a p-type semiconductor and acts as a host, which may cause a decrease in power generation efficiency. In other words, there is a problem that the cost of the boron is easily increased due to the need for the removal device of boron.
於專利文獻5中,雖係使玻璃中的硼減少,但若以其所具體記載之玻璃組成而言發電效率係不充分的,故在更加提升發電效率的點上是有改善的空間。 In Patent Document 5, although boron in the glass is reduced, power generation efficiency is insufficient in the glass composition specifically described. Therefore, there is room for improvement in that power generation efficiency is further improved.
另一方面,為防止玻璃基板上之光電轉換層(CIGS層)於成膜中或成膜後的剝離,玻璃基板被要求須具有預定之平均熱膨脹係數。 On the other hand, in order to prevent peeling of the photoelectric conversion layer (CIGS layer) on the glass substrate during or after film formation, the glass substrate is required to have a predetermined average thermal expansion coefficient.
再者,由CIGS太陽電池之製造及使用的觀點而言,則要求提升玻璃基板之強度及輕量化,又生產板玻璃時熔解性及成形性須良好以及不會失透等。 Furthermore, from the viewpoint of the manufacture and use of the CIGS solar cell, it is required to increase the strength and weight of the glass substrate, and to have good meltability and formability when producing sheet glass, and to prevent devitrification.
但是,於使用於CIGS太陽電池之玻璃基板中,難以均衡具有高發電效率、高鹼擴散性、高玻璃轉移點溫度、預定之平均熱膨脹係數、高玻璃強度、低玻璃密度,以及,生產板玻璃時之高熔解性、良好的成形性及良好的失透防 止性等的特性。 However, in a glass substrate used for a CIGS solar cell, it is difficult to balance high power generation efficiency, high alkali diffusibility, high glass transition point temperature, predetermined average thermal expansion coefficient, high glass strength, low glass density, and production of sheet glass. High meltability, good formability and good devitrification Characteristics such as discontinuity.
本發明之目的在於提供一種可適宜使用於CIGS太陽電池用的玻璃基板及使用其之太陽電池,該玻璃基板係均衡具有高發電效率、高鹼擴散性、高玻璃轉移點溫度、預定之平均熱膨脹係數、高玻璃強度、低玻璃密度,以及,生產板玻璃時之高熔解性、良好的成形性及良好的防失透性等的特性者。 An object of the present invention is to provide a glass substrate which can be suitably used for a CIGS solar cell and a solar cell using the same, which has a high power generation efficiency, a high alkali diffusion property, a high glass transition point temperature, and a predetermined average thermal expansion. Coefficient, high glass strength, low glass density, and high meltability in the production of sheet glass, good formability, and good resistance to devitrification.
本案發明人等為解決前述課題而致力研討,結果發現:對太陽電池用玻璃基板而言,藉由設為特定之組成範圍,即可將之製成為均衡具有高發電效率、高鹼擴散性、高玻璃轉移點溫度、預定之平均熱膨脹係數、高玻璃強度、低玻璃密度,以及,板玻璃生產時之高熔解性、良好的成形性及良好的防失透性等的特性的玻璃基板。 In order to solve the above-mentioned problems, the inventors of the present invention have found that the glass substrate for a solar cell can be made into a balanced composition with high power generation efficiency and high alkali diffusion property by setting it as a specific composition range. A glass substrate having high glass transition point temperature, predetermined average thermal expansion coefficient, high glass strength, low glass density, and high meltability in sheet glass production, good formability, and good resistance to devitrification.
即,本發明如下: That is, the present invention is as follows:
(1)一種太陽電池用玻璃基板,以下述氧化物為基準之質量百分率表示,含有:50~65%之SiO2、8~15%之Al2O3、0~1%之B2O3、0~10%之MgO、1~12%之CaO、6~12%之SrO、0~3%之BaO、 1~7%之ZrO2、2~8%之Na2O、0~8%之K2O、15~30%之MgO+CaO+SrO+BaO;且SrO/Na2O為0.8~2.5。 (1) A glass substrate for a solar cell, which comprises: 50 to 65% of SiO 2 , 8 to 15% of Al 2 O 3 , and 0 to 1% of B 2 O 3 based on the mass percentage based on the following oxides. 0 to 10% of MgO, 1 to 12% of CaO, 6 to 12% of SrO, 0 to 3% of BaO, 1 to 7% of ZrO 2 , 2 to 8% of Na 2 O, 0 to 8% K 2 O, 15~30% of MgO+CaO+SrO+BaO; and SrO/Na 2 O is 0.8~2.5.
(2)如前述第(1)項之太陽電池用玻璃基板,其玻璃轉移點溫度為640℃以上。 (2) The glass substrate for a solar cell according to the above (1), wherein the glass transition point temperature is 640 ° C or higher.
(3)如前述第(1)或(2)項之太陽電池用玻璃基板,其平均熱膨脹係數為70×10-7~90×10-7/℃。 (3) The glass substrate for a solar cell according to the above (1) or (2), which has an average thermal expansion coefficient of 70 × 10 -7 to 90 × 10 -7 / °C.
(4)如前述第(1)至(3)項中任一項之太陽電池用玻璃基板,其黏度成為104dPa.s之溫度(T4)為1230℃以下,黏度成為102dPa.s之溫度(T2)為1650℃以下,且前述T4與失透溫度(TL)之關係為T4-TL≧-30℃。 (4) The glass substrate for a solar cell according to any one of the above items (1) to (3), wherein the viscosity is 10 4 dPa. The temperature of s (T 4 ) is below 1230 ° C, and the viscosity becomes 10 2 dPa. The temperature (T 2 ) of s is 1650 ° C or less, and the relationship between the above T 4 and the devitrification temperature (T L ) is T 4 -T L ≧ -30 ° C.
(5)如前述第(1)至(4)項中任一項之太陽電池用玻璃基板,其密度為2.75g/cm3以下。 The glass substrate for a solar cell according to any one of the above items (1) to (4), which has a density of 2.75 g/cm 3 or less.
(6)如前述第(1)至(5)項中任一項之太陽電池用玻璃基板,其中Al2O3之含量為8.5~14.5%。 The glass substrate for a solar cell according to any one of the above items (1) to (5) wherein the content of Al 2 O 3 is 8.5 to 14.5%.
(7)如前述第(1)至(6)項中任一項之太陽電池用玻璃基板,其中CaO之含量為3~11%。 (7) The glass substrate for a solar cell according to any one of the above (1), wherein the content of CaO is from 3 to 11%.
(8)如前述第(1)至(6)項中任一項之太陽電池用玻璃基板,其中CaO之含量為3~10%。 The glass substrate for a solar cell according to any one of the above items (1) to (6) wherein the content of CaO is from 3 to 10%.
(9)如前述第(1)至(8)項中任一項之太陽電池用玻璃基板,其中Na2O之含量為4~7%。 The glass substrate for a solar cell according to any one of the above items (1) to (8) wherein the content of Na 2 O is 4 to 7%.
(10)如前述第(1)至(9)項中任一項之太陽電池用玻璃基 板,其中MgO+CaO+SrO+BaO之含量的和為17~23%。 (10) A glass base for a solar cell according to any one of the above items (1) to (9) The sum of the contents of MgO+CaO+SrO+BaO is 17-23%.
(11)如前述第(1)至(10)項中任一項之太陽電池用玻璃基板,其中BaO之含量為2%以下。 The glass substrate for a solar cell according to any one of the above items (1) to (10) wherein the content of BaO is 2% or less.
(12)如前述第(1)至(11)項中任一項之太陽電池用玻璃基板,其係以9SiO2+15Al2O3之式所示之值在570%~840%之範圍內含有SiO2與Al2O3。 The glass substrate for a solar cell according to any one of the above items (1) to (11), wherein the value represented by the formula 9SiO 2 +15Al 2 O 3 is in the range of 570% to 840%. Contains SiO 2 and Al 2 O 3 .
(13)如前述第(1)至(12)項中任一項之太陽電池用玻璃基板,其係以3Na2O+2K2O之式所示之值在14%~44%之範圍內含有Na2O與K2O。 The glass substrate for a solar cell according to any one of the above items (1) to (12), wherein the value represented by the formula of 3Na 2 O+2K 2 O is in the range of 14% to 44%. Contains Na 2 O and K 2 O.
(14)一種Cu-In-Ga-Se太陽電池,具備有:玻璃基板;蓋玻璃;及Cu-In-Ga-Se光電轉換層,係配置於前述玻璃基板與前述蓋玻璃之間;且前述玻璃基板與前述蓋玻璃之中,至少前述玻璃基板係如前述第(1)至(13)項中任一項之太陽電池用玻璃基板。 (14) A Cu-In-Ga-Se solar cell comprising: a glass substrate; a cover glass; and a Cu-In-Ga-Se photoelectric conversion layer disposed between the glass substrate and the cover glass; In the glass substrate and the cover glass, at least the glass substrate is a glass substrate for a solar cell according to any one of the above items (1) to (13).
(15)一種CdTe太陽電池,具備有:玻璃基板;背板玻璃;及CdTe光電轉換層,係配置於前述玻璃基板與前述背板玻璃之間;且前述玻璃基板與前述背板玻璃之中,至少前述玻璃基板係如前述第(1)至(13)項中任一項之太陽電池用玻璃基板。 (15) A CdTe solar cell comprising: a glass substrate; a back sheet glass; and a CdTe photoelectric conversion layer disposed between the glass substrate and the back sheet glass; and the glass substrate and the back sheet glass The glass substrate for a solar cell according to any one of the above items (1) to (13).
本發明之太陽電池用玻璃基板,均衡具有高發電效率、高鹼擴散性、高玻璃轉移點溫度、預定之平均熱膨脹係數、高玻璃強度、低玻璃密度,以及,生產板玻璃時之高熔解性、良好的成形性及良好的防失透性等的特性。 又,藉由使用本發明之太陽電池用玻璃基板,可提供發電效率高的太陽電池。尤其,本發明之太陽電池用玻璃基板作為Cu-In-Ga-Se太陽電池用或作為CdTe太陽電池係有用的。 The glass substrate for a solar cell of the present invention has high power generation efficiency, high alkali diffusibility, high glass transition point temperature, predetermined average thermal expansion coefficient, high glass strength, low glass density, and high meltability when producing sheet glass. Good formability and good resistance to devitrification. Moreover, by using the glass substrate for a solar cell of the present invention, it is possible to provide a solar cell having high power generation efficiency. In particular, the glass substrate for a solar cell of the present invention is useful as a Cu-In-Ga-Se solar cell or as a CdTe solar cell system.
1‧‧‧CIGS太陽電池 1‧‧‧CIGS solar cell
5、5a‧‧‧玻璃基板 5, 5a‧‧‧ glass substrate
7、7a‧‧‧正電極 7, 7a‧‧‧ positive electrode
9、9a‧‧‧CIGS層 9, 9a‧‧‧ CIGS layer
11、11a‧‧‧緩衝層 11, 11a‧‧‧ buffer layer
13、13a‧‧‧透明導電膜 13, 13a‧‧‧Transparent conductive film
15、15a‧‧‧負電極 15, 15a‧‧‧ negative electrode
16a‧‧‧負端子 16a‧‧‧negative terminal
17‧‧‧抗反射膜 17‧‧‧Anti-reflective film
19‧‧‧蓋玻璃 19‧‧‧ Cover glass
21‧‧‧CdTe太陽電池 21‧‧‧CdTe solar cell
22‧‧‧玻璃基板 22‧‧‧ glass substrate
23‧‧‧透明導電膜 23‧‧‧Transparent conductive film
24‧‧‧緩衝層 24‧‧‧buffer layer
25‧‧‧CdTe層 25‧‧‧CdTe layer
26‧‧‧背面電極 26‧‧‧Back electrode
27‧‧‧背板玻璃 27‧‧‧back glass
圖1係截面圖,示意顯示使用了本發明太陽電池用玻璃基板之太陽電池(CIGS太陽電池)之實施形態的一例。 Fig. 1 is a cross-sectional view showing an example of an embodiment of a solar cell (CIGS solar cell) using the glass substrate for a solar cell of the present invention.
圖2係顯示實施例中製作於評估用玻璃基板上之太陽電池單元(a)與其截面圖(b)。 Fig. 2 is a view showing a solar battery cell (a) and a cross-sectional view (b) thereof produced on the glass substrate for evaluation in the examples.
圖3係顯示併排了8個圖2所示之太陽電池單元之評估用玻璃基板上的評估用CIGS太陽電池。 Fig. 3 shows an evaluation CIGS solar cell on an evaluation glass substrate of eight solar cell units shown in Fig. 2 side by side.
圖4係截面圖,示意顯示使用了本發明太陽電池用玻璃基板之太陽電池(CdTe太陽電池)之實施形態的一例。 Fig. 4 is a cross-sectional view showing an example of an embodiment of a solar cell (CdTe solar cell) using the glass substrate for a solar cell of the present invention.
<本發明之太陽電池用玻璃基板> <The glass substrate for a solar cell of the present invention>
以下,將就本發明之太陽電池用玻璃基板進行說明。 Hereinafter, the glass substrate for a solar cell of the present invention will be described.
本發明之太陽電池用玻璃基板,具有下述組成:以下述氧化物為基準之質量百分率表示,含有:50~65%之SiO2、8~15%之Al2O3、0~1%之B2O3、0~10%之MgO、 1~12%之CaO、6~12%之SrO、0~3%之BaO、1~7%之ZrO2、2~8%之Na2O、0~8%之K2O、15~30%之MgO+CaO+SrO+BaO;且SrO/Na2O為0.8~2.5。 The glass substrate for a solar cell of the present invention has a composition of 50% to 65% SiO 2 , 8 to 15% Al 2 O 3 , and 0 to 1% by mass percentage based on the following oxides. B 2 O 3 , 0 to 10% of MgO, 1 to 12% of CaO, 6 to 12% of SrO, 0 to 3% of BaO, 1 to 7% of ZrO 2 , 2 to 8% of Na 2 O, 0 to 8% of K 2 O, 15 to 30% of MgO+CaO+SrO+BaO; and SrO/Na 2 O is 0.8 to 2.5.
本發明之太陽電池用玻璃基板的玻轉移點溫度(Tg)宜較鈉鈣玻璃之玻璃轉移點溫度高,具體來說則宜為640℃以上。將本發明之太陽電池用玻璃基板作為CIGS太陽電池或CdTe太陽電池之玻璃基板使用時,為擔保高溫中CIGS之光電轉換層(以下,亦將「CIGS之光電轉換層」僅稱「CIGS層」)或CdTe之光電轉換層(以下,亦將「CdTe光電轉換層」僅稱「CdTe層」)的形成,玻轉移點溫度(Tg)較佳為645℃以上,且650℃以上更佳,655℃以上尤佳。為使熔解時之黏性不致上升太高,設為750℃以下較佳。更佳為720℃以下,且690℃以下尤佳。 The glass transition point temperature (Tg) of the glass substrate for a solar cell of the present invention is preferably higher than the glass transition point temperature of the soda lime glass, and specifically, it is preferably 640 ° C or higher. When the glass substrate for a solar cell of the present invention is used as a glass substrate of a CIGS solar cell or a CdTe solar cell, the photoelectric conversion layer of CIGS at a high temperature is secured (hereinafter, "the photoelectric conversion layer of CIGS" is also referred to as a "CIGS layer". Or the formation of a photoelectric conversion layer of CdTe (hereinafter, also referred to as "CdTe photoelectric conversion layer" is simply referred to as "CdTe layer"), and the glass transition point temperature (Tg) is preferably 645 ° C or more, and more preferably 650 ° C or more, 655 Above °C is especially good. In order to make the viscosity at the time of melting not rise too high, it is preferable to set it as 750 degreeC or less. More preferably, it is 720 ° C or less, and 690 ° C or less is particularly preferable.
本發明之太陽電池用玻璃基板於50~350℃中之平均熱膨脹係數宜為70×10-7~90×10-7/℃。將本發明之太陽電池用玻璃基板作為CIGS太陽電池的玻璃基板使用時,若該係數小於70×10-7/℃或超過90×10-7/℃,則與CIGS層之熱膨脹差會變得過大,會變得容易產生剝落等的缺點。故較佳為85×10-7/℃以下。 The average thermal expansion coefficient of the glass substrate for a solar cell of the present invention at 50 to 350 ° C is preferably 70 × 10 -7 to 90 × 10 -7 / ° C. When the glass substrate for a solar cell of the present invention is used as a glass substrate of a CIGS solar cell, if the coefficient is less than 70 × 10 -7 / ° C or more than 90 × 10 -7 / ° C, the difference in thermal expansion from the CIGS layer becomes If it is too large, it will become prone to peeling off defects. Therefore, it is preferably 85 × 10 -7 / ° C or less.
本發明之太陽電池用玻璃基板,其黏度成為104dPa.s之溫度(T4)與失透溫度(TL)之關係宜為T4-TL≧-30℃。若T4-TL小於-30℃,則板玻璃成形時會容易發生失透,恐有玻璃板之成形變得困難之虞。故T4-TL較佳為-20℃以上,更佳為-10℃以上,且0℃以上尤佳,最佳則為10℃以上。此處,「失透溫度」係指於特定之溫度下將玻璃保持17小時之時,於玻璃表面及內部不生成晶體的最大溫度。 The glass substrate for a solar cell of the present invention has a viscosity of 10 4 dPa. The relationship between the temperature (t 4 ) of s and the devitrification temperature (T L ) is preferably T 4 -T L ≧ -30 °C. When T 4 -T L is less than -30 ° C, devitrification is likely to occur during the formation of the sheet glass, which may cause difficulty in forming the glass sheet. Therefore, T 4 -T L is preferably -20 ° C or higher, more preferably -10 ° C or higher, and particularly preferably 0 ° C or higher, and most preferably 10 ° C or higher. Here, the "devitrification temperature" refers to the maximum temperature at which crystals are not formed on the surface and inside of the glass when the glass is held at a specific temperature for 17 hours.
若考慮玻璃板之成形性,即,考量提升平坦性及提升生產性的話,則T4宜為1230℃以下。且T4較佳為1220℃以下,1210℃以下更佳。 When considering the formability of the glass sheet, that is, considering the improvement of flatness and productivity, T 4 is preferably 1230 ° C or less. Further, T 4 is preferably 1220 ° C or lower, more preferably 12 10 ° C or lower.
又,考慮玻璃之熔解性,即,考量提升均質性及提升生產性等,本發明之太陽電池用玻璃基板其黏度成為102dPa.s之溫度(T2)宜為1650℃以下。且T2較佳為1630℃以下,1620℃以下更佳。 Moreover, considering the melting property of the glass, that is, considering the improvement of homogeneity and improving productivity, the glass substrate for a solar cell of the present invention has a viscosity of 10 2 dPa. The temperature (T 2 ) of s is preferably 1650 ° C or less. Further, T 2 is preferably 1630 ° C or lower, and more preferably 1620 ° C or lower.
本發明之太陽電池用玻璃基板,其密度宜為2.75g/cm3以下。若密度超過2.75g/cm3,則玻璃基板之質量會變重而並不理想。密度較佳為2.73g/cm3以下,更佳為2.71g/cm3以下。又,於以浮製玻板法或熔注法等之通常之方法來製造玻璃基板時,若考量設定成可容易製造之玻璃組成範圍的話,則通常為2.4g/cm3以上。 The glass substrate for a solar cell of the present invention preferably has a density of 2.75 g/cm 3 or less. If the density exceeds 2.75 g/cm 3 , the quality of the glass substrate becomes heavy and it is not preferable. The density is preferably 2.73 g/cm 3 or less, more preferably 2.71 g/cm 3 or less. Further, when a glass substrate is produced by a usual method such as a floating glass plate method or a melt-blown method, it is usually 2.4 g/cm 3 or more in consideration of a glass composition range which can be easily produced.
本發明之太陽電池用玻璃基板,脆度指標值宜小於7000m-1/2。若脆度指標值為7000m-1/2以上的話,則於太陽電池之製造步驟中玻璃基板會變得容易龜裂而不佳。故較佳為6900m-1/2以下,6800m-1/2以下更佳,6700m-1/2以下尤 佳,更為理想的係6600m-1/2以下。又,於以浮製玻板法或熔注法等之通常之方法來製造玻璃基板時,若考量設定成可容易製造之玻璃組成範圍的話,則通常為5000m-1/2以上。 In the glass substrate for a solar cell of the present invention, the brittleness index value is preferably less than 7000 m -1/2 . When the brittleness index value is 7000 m -1/2 or more, the glass substrate may be easily cracked in the manufacturing process of the solar cell. It is preferably 6900m -1/2 or less, 6800m -1/2 or less more preferably, 6700m -1/2 or less is preferred, more preferably less based 6600m -1/2. Further, when a glass substrate is produced by a usual method such as a floating glass plate method or a melt-blown method, it is usually 5000 m -1/2 or more in consideration of a glass composition range which can be easily produced.
本發明中,太陽電池用玻璃基板之脆度指標值係由下述式(1)所定義之「B」而得者(J.Sehgal,et al.,J.Mat.Sci.Lett.,14,167(1995))。 In the present invention, the brittleness index value of the glass substrate for a solar cell is obtained by "B" defined by the following formula (1) (J. Sehgal, et al., J. Mat. Sci. Lett., 14, 167). (1995)).
c/a=0.0056B2/3P1/6...式(1) c/a=0.0056B 2/3 P 1/6 (1)
此處P係維氏(Vickers)壓頭之壓入負載,a及c係分別為維氏壓痕之對角長及自四個角落發生之裂痕的長度(包含壓頭之對稱的2裂痕之全長)。以使用打入於各種玻璃表面之維氏壓痕的尺寸及式(1)來算出脆度指標值B。 Here P is the Vickers indenter, and the a and c are the diagonal length of the Vickers indentation and the length of the crack from the four corners (including the symmetrical 2 crack of the indenter). full length). The brittleness index value B was calculated by using the size of the Vickers indentation applied to various glass surfaces and the formula (1).
以本發明之太陽電池用玻璃基板而言,限定成前述組成之理由如下: The reason why the glass substrate for a solar cell of the present invention is limited to the above composition is as follows:
SiO2: SiO 2 :
SiO2係形成玻璃之骨架的成分,若小於50質量%(以下將「質量%」僅記作為「%」。以下同)則玻璃基板之耐熱性及化學耐久性會降低,恐有平均熱膨脹係數增大之慮。故宜為52%以上,較佳為53%以上,53.5%以上尤佳,更佳則為54%以上。 SiO 2 is a component which forms a skeleton of glass, and is less than 50% by mass (hereinafter, "% by mass" is simply referred to as "%". The same applies hereinafter), the heat resistance and chemical durability of the glass substrate are lowered, and the average thermal expansion coefficient is feared. Increase the considerations. Therefore, it is preferably 52% or more, preferably 53% or more, more preferably 53.5% or more, and even more preferably 54% or more.
但是,若超過65%則玻璃之高溫黏度會上升,恐有產生熔解性惡化的問題之疑慮。故宜為63%以下,較佳為62%以下,更佳為61%以下,且59%以下尤佳,更為理想的係57.5%以下。 However, if it exceeds 65%, the high-temperature viscosity of the glass will rise, and there is a fear that the meltability is deteriorated. Therefore, it is preferably 63% or less, preferably 62% or less, more preferably 61% or less, and particularly preferably 59% or less, more preferably 57.5% or less.
Al2O3: Al 2 O 3 :
Al2O3能提高玻璃轉移點溫度,提升耐氣候性(solarization)、耐熱性及化學耐久性,並提高楊氏模數。若其含量小於8%的話,則玻璃轉移點溫度恐有降低之虞。又恐有平均熱膨脹係數增大之虞。故宜為8.5%以上,較佳為9%以上,更佳則為10%以上,且11%以上尤佳,更為理想的則係12%以上。 Al 2 O 3 can increase the temperature of the glass transition point, improve the solarization, heat resistance and chemical durability, and increase the Young's modulus. If the content is less than 8%, the glass transition point temperature may be lowered. There is also the fear that the average coefficient of thermal expansion will increase. Therefore, it is preferably 8.5% or more, preferably 9% or more, more preferably 10% or more, and more preferably 11% or more, and more preferably 12% or more.
但是,若超過15%則玻璃之高溫黏度會上升,恐有熔解性變差之虞。又,失透溫度會上升,恐有成形性變差之虞。故宜為14.5%以下,且較佳為14%以下。 However, if it exceeds 15%, the high-temperature viscosity of the glass will rise, and there is a fear that the meltability is deteriorated. Moreover, the devitrification temperature will rise, and there is a fear that the formability will deteriorate. Therefore, it is preferably 14.5% or less, and preferably 14% or less.
SiO2及Al2O3: SiO 2 and Al 2 O 3 :
SiO2及Al2O3因係使玻璃基板之耐熱性增加之成分,故宜使以9SiO2+15Al2O3(即,(SiO2之含有%×9)與(Al2O3之含有%×15)之合計)成為570%以上之範圍來含有。且較佳為600%以上,630%以上更佳,660%以上尤佳。但是,SiO2及Al2O3因有使玻璃之高溫黏度上升,且使熔解性惡化之效果,故宜使含有9SiO2+15Al2O3成為840%以下之範圍。且800%以下較佳,760%以下更佳,720%以下尤佳。 Since SiO 2 and Al 2 O 3 are components which increase the heat resistance of the glass substrate, it is preferable to use 9SiO 2 +15Al 2 O 3 (that is, (% of SiO 2 is contained in the range of 9) and (containing of Al 2 O 3 ) The total of % × 15) is contained in a range of 570% or more. It is preferably 600% or more, more preferably 630% or more, and particularly preferably 660% or more. However, since SiO 2 and Al 2 O 3 have an effect of increasing the high-temperature viscosity of the glass and deteriorating the meltability, it is preferable to contain 9SiO 2 +15Al 2 O 3 in a range of 840% or less. And 800% or less is better, 760% or less is better, and 720% or less is particularly preferable.
B2O3: B 2 O 3 :
B2O3係為使熔解性提升等而亦可含有至1%。若其含量超過1%,恐有玻璃轉移點溫度降低之虞,或恐有平均熱膨脹係數變小之虞,對形成光電轉換層之製程而言並不理想。又失透溫度會上昇而變得容易失透,使板玻璃成形變得困難。故含量宜為0.5%以下。且以實質上不含有較佳。 The B 2 O 3 system may be added to 1% in order to improve the meltability and the like. If the content exceeds 1%, there is a fear that the temperature of the glass transition point is lowered, or the average thermal expansion coefficient is small, which is not preferable for the process for forming the photoelectric conversion layer. Further, the devitrification temperature rises and becomes devitrified, making it difficult to form the sheet glass. Therefore, the content is preferably 0.5% or less. It is not particularly preferable.
另外,「實質上不含有」係指除了從原料等混入之不可 避免的雜質以外不含有,即,意指有意圖地使其不含有。以下同。 In addition, "substantially does not contain" means that it is not mixed with raw materials or the like. It is not contained other than the impurities to be avoided, that is, it means intentionally not to contain it. The same as below.
MgO: MgO:
MgO因能降低玻璃熔解時的黏性,有促進熔解的效果,故可使含有之。且宜為0.5%以上,較佳為1%以上。只要為10%以下,即可獲得所欲之平均熱膨脹係數。又亦不會有失透溫度上升的情形因而理想。宜為7%以下,且5%較佳,更佳為3%以下,2.5%以下尤佳。 Since MgO can reduce the viscosity at the time of glass melting and has an effect of promoting melting, it can be contained. It is preferably 0.5% or more, preferably 1% or more. As long as it is 10% or less, the desired average coefficient of thermal expansion can be obtained. It is also ideal that there will be no devitrification temperature rise. It is preferably 7% or less, and 5% is more preferable, more preferably 3% or less, and particularly preferably 2.5% or less.
CaO: CaO:
CaO因能降低玻璃熔解時的黏性,有促進熔解的效果,故可使含有1~12%。且宜為2%以上,較佳為3%以上,更佳為4%以上,5%以上尤佳。但是,若超過12%則恐有玻璃基板之平均熱膨脹係數增大之虞。又,鈉(Na)於玻璃基板中會變得不易移動而恐有發電效率降低之虞。故宜為11%以下,較佳為10%以下,更佳為9%以下,8.5%以下尤佳。 Since CaO can reduce the viscosity at the time of glass melting and has an effect of promoting melting, it can contain 1 to 12%. It is preferably 2% or more, preferably 3% or more, more preferably 4% or more, and more preferably 5% or more. However, if it exceeds 12%, there is a fear that the average thermal expansion coefficient of the glass substrate increases. Further, sodium (Na) is less likely to move in the glass substrate, which may cause a decrease in power generation efficiency. Therefore, it is preferably 11% or less, preferably 10% or less, more preferably 9% or less, and particularly preferably 8.5% or less.
SrO: SrO:
SrO因能降低玻璃熔解時的黏性,有促進熔解的效果,故使含有6~12%。又,因玻璃基板中含SrO,於將本發明之太陽電池用玻璃基板作為CIGS太陽電池之玻璃基板使用時,會有促進鈉(Na)往玻璃基板上之CIGS層擴散的效果。宜為6.3%以上,較佳為6.5%以上,更佳為7%以上。但是,若含有超過12%則恐有玻璃基板之密度增大,且脆度指標值增加之虞。故宜為11%以下,10%以下較佳,更佳為9% 以下,8.5%以下尤佳。 Since SrO can reduce the viscosity at the time of glass melting and has an effect of promoting melting, it contains 6 to 12%. Further, when SrO is contained in the glass substrate, when the glass substrate for a solar cell of the present invention is used as a glass substrate of a CIGS solar cell, there is an effect of promoting diffusion of sodium (Na) onto the CIGS layer on the glass substrate. It is preferably 6.3% or more, preferably 6.5% or more, more preferably 7% or more. However, if it contains more than 12%, there is a fear that the density of the glass substrate increases and the value of the brittleness index increases. Therefore, it should be 11% or less, preferably 10% or less, and more preferably 9%. Below, 8.5% or less is particularly preferable.
BaO: BaO:
BaO因能降低玻璃熔解時的黏性,有促進熔解的效果,故可使含有。但是,若含有超過3%則恐有玻璃基板之平均熱膨脹係數增大、密度增大及脆度指標值增加之虞。又,恐有楊氏模數降低之虞。故宜為2.5%以下,且2%以下較佳。 BaO can be contained because it can reduce the viscosity at the time of glass melting and has an effect of promoting melting. However, if it contains more than 3%, there is a fear that the average thermal expansion coefficient of the glass substrate increases, the density increases, and the brittleness index value increases. Also, there is a fear that the Young's modulus will decrease. Therefore, it is preferably 2.5% or less, and preferably 2% or less.
ZrO2: ZrO 2 :
ZrO2因能降低玻璃熔解時的黏性,有促進熔解之效果,故可使含有1%以上。只要為7%以下發電效率即會良好,又不會有失透溫度上昇而失透的情形,而板玻璃成形容易。故宜為6%以下,較佳為5%以下,4.5%以下更佳。又,宜為2%以上,較佳為2.5%以上,更佳為3%以上,且3.5%以上尤佳。 Since ZrO 2 can reduce the viscosity at the time of glass melting and has an effect of promoting melting, it can be contained in an amount of 1% or more. As long as the power generation efficiency is 7% or less, it will be good, and there will be no devitrification temperature rise and devitrification, and the sheet glass is easy to form. Therefore, it is preferably 6% or less, preferably 5% or less, and more preferably 4.5% or less. Further, it is preferably 2% or more, preferably 2.5% or more, more preferably 3% or more, and particularly preferably 3.5% or more.
TiO2: TiO 2 :
因若含有TiO2的話失透溫度即會上升,故宜不含TiO2。但是,本發明之太陽電池用玻璃基板相較於通常之鈉鈣玻璃,係較易於製造玻璃基板時在熔融玻璃表面生成氣泡層。一旦氣泡層生成的話,熔融玻璃之溫度就不會上升,導致不易進行澄清,而有生產性惡化的傾向。為使生成於熔融玻璃表面之氣泡層薄化甚或消失,有供給鈦化合物至生成於熔融玻璃表面之氣泡層作為消泡劑的情形。鈦化合物係被納入於熔融玻璃中並作為TiO2存在。該鈦化合物可為無機鈦化合物(例如四氯化鈦、氧化鈦等),亦可為有 機鈦化合物。作為有機鈦化合物者,可列舉鈦酸酯或其衍生物、鈦螯合物或其衍生物、醯化鈦或其衍生物及草酸鈦等。基於前述之理由,而容許玻璃基板中含有0.2%以下之TiO2作為雜質。 Since the devitrification temperature rises if TiO 2 is contained, it is preferable to contain no TiO 2 . However, the glass substrate for a solar cell of the present invention is more likely to form a bubble layer on the surface of the molten glass than the usual soda lime glass when the glass substrate is easily produced. When the bubble layer is formed, the temperature of the molten glass does not rise, resulting in difficulty in clarification and a tendency to deteriorate in productivity. In order to thin or even disappear the bubble layer formed on the surface of the molten glass, there is a case where a titanium compound is supplied to the bubble layer formed on the surface of the molten glass as an antifoaming agent. The titanium compound is incorporated into the molten glass and exists as TiO 2 . The titanium compound may be an inorganic titanium compound (for example, titanium tetrachloride or titanium oxide) or an organic titanium compound. Examples of the organic titanium compound include titanate or a derivative thereof, a titanium chelate compound or a derivative thereof, titanium telluride or a derivative thereof, and titanium oxalate. For the reasons described above, 0.2% or less of TiO 2 is allowed to be contained as an impurity in the glass substrate.
MgO、CaO、SrO及BaO: MgO, CaO, SrO and BaO:
關於MgO、CaO、SrO及BaO,由使玻璃熔解時的黏性降低並促進熔解的觀點來說,亦可含CaO及SrO,且含選自於由MgO及BaO所構成群組中之至少1種成分,並將該等之合計量(即,將該等之鹼土金屬氧化物(RO)之合計量亦記作為(MgO+CaO+SrO+BaO))設為15%以上。但是,若合計量超過30%則失透溫度會上升,恐有成形性變差之虞。故宜為16%以上,且17%以上較佳。又,宜為26%以下,且23%以下較佳,更佳為20%以下,18%以下尤佳。 The MgO, CaO, SrO, and BaO may contain CaO and SrO from the viewpoint of lowering the viscosity at the time of melting the glass and promoting melting, and may be at least 1 selected from the group consisting of MgO and BaO. The components are set to have a total amount of these (that is, the total amount of the alkaline earth metal oxides (RO) is also referred to as (MgO + CaO + SrO + BaO)) to be 15% or more. However, if the total amount exceeds 30%, the devitrification temperature will rise, which may result in deterioration of formability. Therefore, it is preferably 16% or more, and 17% or more is preferred. Further, it is preferably 26% or less, and preferably 23% or less, more preferably 20% or less, and particularly preferably 18% or less.
Na2O: Na 2 O:
於將本發明之太陽電池用玻璃基板作為CIGS太陽電池之玻璃基板使用時,Na2O係用以助於CIGS太陽電池之發電效率提升的成分,而為必要成分。又,因能降低玻璃熔解溫度中之黏性,有使熔解容易進行的效果,故使含有2~8%。鈉(Na)雖擴散至經構成於玻璃基板上之CIGS層中可提高發電效率,但若其含量小於2%則會導致Na往玻璃基板上之CIGS層的擴散不充分,而恐有發電效率亦變得不足之虞。含量為3%以上即可,含量為4%以上的話較佳。 When the glass substrate for a solar cell of the present invention is used as a glass substrate of a CIGS solar cell, the Na 2 O system is an essential component for contributing to the improvement of the power generation efficiency of the CIGS solar cell. Further, since the viscosity in the glass melting temperature can be lowered, the effect of facilitating the melting is facilitated, so that it contains 2 to 8%. Although sodium (Na) diffuses into the CIGS layer formed on the glass substrate, the power generation efficiency can be improved. However, if the content is less than 2%, the diffusion of Na into the CIGS layer on the glass substrate is insufficient, and power generation efficiency is feared. It has also become inadequate. The content may be 3% or more, and the content is preferably 4% or more.
若Na2O含量超過8%的話,則有平均熱膨脹係數變大,且玻璃轉移點溫度降低的傾向。或有化學耐久性劣化的傾 向。又,恐有楊氏模數降低之虞。故含量為7.5%以下即可,為7%以下的話較佳,為6.5%以下的話則更佳。 When the Na 2 O content exceeds 8%, the average thermal expansion coefficient increases, and the glass transition point temperature tends to decrease. Or there is a tendency to deteriorate chemical durability. Also, there is a fear that the Young's modulus will decrease. Therefore, the content is preferably 7.5% or less, more preferably 7% or less, and even more preferably 6.5% or less.
K2O: K 2 O:
K2O因有與Na2O同樣之效果,故使含有0~8%。但是,若其含量超過8%則恐有玻璃轉移點溫度降低、平均熱膨脹係數變大,且比重變大之虞。故含有的情況時宜為0.5%以上,且較佳為1%以上,更佳則為3.5%以上。又,宜為7%以下,較佳為6%以下,更佳為5%以下,且4.5%以下尤佳。 Since K 2 O has the same effect as Na 2 O, it contains 0 to 8%. However, if the content exceeds 8%, there is a fear that the glass transition point temperature is lowered, the average thermal expansion coefficient is increased, and the specific gravity is increased. Therefore, it is preferably 0.5% or more, and preferably 1% or more, and more preferably 3.5% or more. Further, it is preferably 7% or less, preferably 6% or less, more preferably 5% or less, and particularly preferably 4.5% or less.
Na2O及K2O: Na 2 O and K 2 O:
Na2O及K2O係用以幫助提升CIGS太陽電池之發電效率的成分。又,因有降低玻璃熔解溫度中之黏性,使熔解容易進行的效果,故宜使以3Na2O+2K2O(即,(Na2O之含有%×3)與(K2O之含有%×2)之合計)成為14%以上之範圍來含有。且較佳為16%以上,更佳為18%以上,且20%以上尤佳。Na2O及K2O因有增大平均熱膨脹係數,使玻璃轉移點溫度降低之傾向,故宜使以3Na2O+2K2O成為44%以下之範圍來含有。且較佳為40%以下,更佳為36%以下,且32%以下尤佳。 Na 2 O and K 2 O are components that help to increase the power generation efficiency of CIGS solar cells. Further, since the viscosity in the glass melting temperature is lowered to facilitate the melting, it is preferable to use 3Na 2 O+2K 2 O (that is, (% of Na 2 O) and (K 2 O). The total of %×2) is contained in a range of 14% or more. It is preferably 16% or more, more preferably 18% or more, and more preferably 20% or more. Since Na 2 O and K 2 O tend to lower the glass transition point temperature by increasing the average thermal expansion coefficient, it is preferable to contain 3Na 2 O+2K 2 O in a range of 44% or less. It is preferably 40% or less, more preferably 36% or less, and particularly preferably 32% or less.
SrO與Na2O的比: The ratio of SrO to Na 2 O:
SrO與Na2O的比(SrO/Na2O)係設為0.8以上。若SrO相對於Na2O量少的話,則於已製成CIGS太陽電池時促進Na往玻璃基板上之CIGS層擴散的效果會有減弱的傾向。故宜為0.9以上,較佳為1.0以上,更佳則為1.1以上。但是若為2.5以上,則恐有玻璃基板的比重變得過大之虞。故宜為2.1以 下,較佳為1.8以下,更佳為1.6以下,且1.4以下尤佳。 The ratio of SrO to Na 2 O (SrO/Na 2 O) is 0.8 or more. If the amount of SrO is small relative to the amount of Na 2 O, the effect of promoting the diffusion of Na into the CIGS layer on the glass substrate tends to be weakened when the CIGS solar cell is fabricated. Therefore, it is preferably 0.9 or more, preferably 1.0 or more, and more preferably 1.1 or more. However, if it is 2.5 or more, the specific gravity of the glass substrate may become excessive. Therefore, it is preferably 2.1 or less, preferably 1.8 or less, more preferably 1.6 or less, and particularly preferably 1.4 or less.
本發明之太陽電池用玻璃基板本質上雖由前述母組成(以前述範圍含有SiO2、Al2O3、B2O3、MgO、CaO、SrO、BaO、ZrO2、Na2O及K2O之玻璃母組成)所構成,但於無損本發明之目的的範圍內,亦可以相對於前述玻璃母組成以內比例(inner percentage)計,個別含有1%以下之下述其他成分,及合計為5%以下之前述TiO2。例如,以改善耐氣候性、熔解性、失透性、紫外線遮蔽、折射率等為目的,而有亦可含有ZnO、Li2O、WO3、Nb2O5、V2O5、Bi2O3、MoO3及P2O5等的情形。 The glass substrate for a solar cell of the present invention is substantially composed of the above-described mother material (containing SiO 2 , Al 2 O 3 , B 2 O 3 , MgO, CaO, SrO, BaO, ZrO 2 , Na 2 O, and K 2 in the above range). The glass mother composition of O is composed of, but not limited to the purpose of the present invention, the following other components may be contained in an amount of 1% or less with respect to the inner percentage of the glass mother composition, and the total amount is 5% or less of the aforementioned TiO 2 . For example, for the purpose of improving weather resistance, meltability, devitrification, ultraviolet shielding, refractive index, etc., it may contain ZnO, Li 2 O, WO 3 , Nb 2 O 5 , V 2 O 5 , Bi 2 . Cases such as O 3 , MoO 3 , and P 2 O 5 .
又,為改善玻璃之熔解性及澄清性,亦可以使玻璃中含有相對於前述玻璃母組成以外比例(outer percentage)計個別為1%以下,且以合計量計為2%以下之SO3、F、Cl及SnO2等的澄清劑,將該等原料添加於母組成原料中。 Also, to improve the meltability and fining glass, can also cause the glass contained in the ratio (outer percentage) than the mother glass composition in terms of the individual is 1% or less, and a total amount of 2% or less of SO 3, A clarifying agent such as F, Cl or SnO 2 is added to the parent constituent raw material.
又,為提升玻璃基板之化學耐久性,亦可使玻璃中含有相對於前述玻璃母組成以內比例計,合計為2%以下之Y2O3及La2O3。 Moreover, in order to improve the chemical durability of the glass substrate, the glass may contain Y 2 O 3 and La 2 O 3 in a total amount of 2% or less based on the internal ratio of the glass mother composition.
另外,本發明之太陽電池用玻璃基板,為確保穿透率並提高發電效率,相對於前述母組成(以前述範圍含有SiO2、Al2O3、B2O3、MgO、CaO、SrO、BaO、ZrO2、Na2O及K2O之玻璃母組成)為100質量份,宜含有鐵氧化物以Fe2O3換算為0.06質量份以下之含量。且較佳為0.055質量份以下,更佳為0.05質量份以下,且以0.045質量份以下尤佳。然而,於不問穿透率時(例如作為CIGS太陽電池之基板使用 的情況等),由使用鐵含量少的原料及熔解時之加熱容易度之觀點而言,相對於前述母組成為100質量份,鐵氧化物以Fe2O3換算宜為0.2質量份以下,且0.15質量份以下較佳,0.12質量份以下更佳。 Further, the glass substrate for a solar cell of the present invention contains SiO 2 , Al 2 O 3 , B 2 O 3 , MgO, CaO, SrO, and the like in order to secure the transmittance and improve the power generation efficiency. The glass mother composition of BaO, ZrO 2 , Na 2 O, and K 2 O is 100 parts by mass, and preferably contains iron oxide in an amount of 0.06 part by mass or less in terms of Fe 2 O 3 . It is preferably 0.055 parts by mass or less, more preferably 0.05 parts by mass or less, and particularly preferably 0.045 parts by mass or less. However, when the transmittance is not required (for example, when it is used as a substrate of a CIGS solar cell, etc.), it is 100 parts by mass with respect to the above-mentioned mother composition from the viewpoint of using a raw material having a small iron content and heating easiness at the time of melting. The iron oxide is preferably 0.2 parts by mass or less in terms of Fe 2 O 3 , more preferably 0.15 parts by mass or less, more preferably 0.12 parts by mass or less.
又,若鐵氧化物之含量為0.01質量份以上,因可使用鐵氧化物成分之混入為不可避免的工業原料,而使工業生產變得容易因而理想。又,若鐵氧化物之含量為0.01質量份以上,則因熔解時輻射的吸收會顯著地變大,使熔融玻璃之溫度容易上升而不會有對製造帶來障礙的情形。故較佳為0.015質量份以上,更佳則為0.02質量份以上。 In addition, when the content of the iron oxide is 0.01 parts by mass or more, it is preferable to use industrial materials which are inevitable in the incorporation of the iron oxide component, which makes industrial production easy. In addition, when the content of the iron oxide is 0.01 parts by mass or more, the absorption of radiation during melting is remarkably increased, and the temperature of the molten glass is likely to rise without causing an obstacle to production. Therefore, it is preferably 0.015 parts by mass or more, more preferably 0.02 parts by mass or more.
另外,本發明中可舉紅丹及氧化鐵粉等作為鐵氧化物。 Further, in the present invention, red dan, iron oxide powder or the like may be mentioned as the iron oxide.
又,本發明之太陽電池用玻璃基板,若考慮環境負荷的話,宜實質上不含As2O3及Sb2O3。又,若考慮能穩定進行浮式成形的話,則宜實質上不含ZnO。但是,本發明之太陽電池用玻璃基板,並不侷限於利用浮製玻板法之成形,亦可藉由利用熔注法之成形來製造。 Further, the glass substrate for a solar cell of the present invention preferably contains substantially no As 2 O 3 or Sb 2 O 3 in consideration of an environmental load. Further, in consideration of stable floating molding, it is preferable that ZnO is not substantially contained. However, the glass substrate for a solar cell of the present invention is not limited to the formation by the floating glass plate method, and may be produced by molding by a melt injection method.
<本發明之太陽電池用玻璃基板之製造方法> <Method for Producing Glass Substrate for Solar Cell of the Present Invention>
將就本發明之太陽電池用玻璃基板之製造方法進行說明。 A method of producing a glass substrate for a solar cell of the present invention will be described.
製造本發明之太陽電池用玻璃基板時,與製造習知之太陽電池用玻璃基板時同樣地實施熔解、澄清步驟及成形步驟。另外,本發明之太陽電池用玻璃基板因係含有鹼金屬氧化物(Na2O、K2O)之含鹼玻璃基板,故可有效地使用SO3作為澄清劑,而成形方法則適於浮製玻板法及熔注法(溢流 向下抽出法(downdraw))。 When the glass substrate for a solar cell of the present invention is produced, the melting, clarification step, and molding step are carried out in the same manner as in the case of producing a conventional glass substrate for a solar cell. Further, since the glass substrate for a solar cell of the present invention contains an alkali-containing glass substrate containing an alkali metal oxide (Na 2 O, K 2 O), SO 3 can be effectively used as a clarifying agent, and the forming method is suitable for floating. Glass plate method and melting method (overflow downdraw).
於太陽電池用玻璃基板之製造步驟中,隨著太陽電池之大型化,作為使玻璃成形為板狀之方法,係以使用可容易並穩定地將大面積之玻璃基板成形之浮製玻板法為佳。 In the manufacturing process of the glass substrate for a solar cell, as the method of forming the glass into a plate shape, the method of forming the glass substrate into a plate shape is a floating glass plate method which can form a large-area glass substrate easily and stably. It is better.
將就本發明之太陽電池用玻璃基板之製造方法的理想態樣進行說明。 An ideal aspect of the method for producing a glass substrate for a solar cell of the present invention will be described.
首先,將預定之玻璃原料進行熔解所獲得之熔融玻璃成形為板狀。舉例而言,將原料進行調製以使所得之玻璃基板可成為前述組成,並將前述原料連續地投入於熔解爐中,並且加熱至1550~1700℃而獲得熔融玻璃。然後,適用例如浮製玻板法將該熔融玻璃成形為帶狀的玻璃板。 First, the molten glass obtained by melting a predetermined glass raw material is formed into a plate shape. For example, the raw material is prepared so that the obtained glass substrate can have the aforementioned composition, and the above-mentioned raw materials are continuously introduced into a melting furnace, and heated to 1550 to 1700 ° C to obtain molten glass. Then, the molten glass is formed into a strip-shaped glass plate by, for example, a floating glass plate method.
其次,自浮式成形爐抽拉出帶狀的玻璃板後,利用冷卻機構將之冷卻至室溫狀態,切割後即獲得太陽電池用玻璃基板。 Next, the strip-shaped glass plate was taken out from the floating forming furnace, and then cooled to room temperature by a cooling mechanism, and a glass substrate for a solar cell was obtained after cutting.
<本發明之太陽電池用玻璃基板的用途> <Use of Glass Substrate for Solar Cell of the Present Invention>
本發明之太陽電池用玻璃基板,由於具有預定之平均熱膨脹係數、高玻璃強度、低玻璃密度,以及,板玻璃生產時之高熔解性、良好的成形性及良好的防失透性,並且玻璃轉移點溫度高且鹼擴散性亦高,因而在用於CIGS太陽電池時可有益於發電效率,故可適宜作為CIGS太陽電池用玻璃基板使用。 The glass substrate for a solar cell of the present invention has a predetermined average thermal expansion coefficient, high glass strength, low glass density, high meltability in the production of sheet glass, good formability, and good devitrification resistance, and glass. Since the transfer point temperature is high and the alkali diffusibility is also high, it is advantageous for power generation efficiency when used for a CIGS solar cell, and therefore it can be suitably used as a glass substrate for a CIGS solar cell.
將本發明之太陽電池用玻璃基板適用於CIGS太陽電池的玻璃基板時,玻璃基板的厚度宜設為3mm以下,且較佳 為2mm以下,更佳則係設為1.5mm以下。 When the glass substrate for a solar cell of the present invention is applied to a glass substrate of a CIGS solar cell, the thickness of the glass substrate is preferably set to 3 mm or less, and is preferably It is 2 mm or less, and more preferably 1.5 mm or less.
又,於玻璃基板形成CIGS層的方法雖無特別限制,但由於玻璃轉移溫度高,而可將形成CIGS層時之加熱溫度設為500~700℃,且宜設為550~700℃,較佳為580~700℃,更佳為600~700℃,且設為620~700℃尤佳。 Further, the method of forming the CIGS layer on the glass substrate is not particularly limited. However, since the glass transition temperature is high, the heating temperature at the time of forming the CIGS layer can be 500 to 700 ° C, and preferably 550 to 700 ° C. It is 580 to 700 ° C, more preferably 600 to 700 ° C, and is preferably 620 to 700 ° C.
將本發明之太陽電池用玻璃基板僅使用於CIGS太陽電池之玻璃基板時,蓋玻璃等並無特別限制。蓋玻璃之組成的其他例係可舉鈉鈣玻璃等。 When the glass substrate for a solar cell of the present invention is used only for a glass substrate of a CIGS solar cell, the cover glass or the like is not particularly limited. Other examples of the composition of the cover glass include soda lime glass and the like.
將本發明之太陽電池用玻璃基板作為CIGS太陽電池之蓋玻璃使用的情況時,蓋玻璃之厚度宜設為3mm以下,且較佳為2mm以下,更佳則係設為1.5mm以下。 When the glass substrate for a solar cell of the present invention is used as a cover glass of a CIGS solar cell, the thickness of the cover glass is preferably 3 mm or less, preferably 2 mm or less, and more preferably 1.5 mm or less.
又,於CIGS太陽電池之製造中,將蓋玻璃組裝於具有CIGS層之玻璃基板上的方法雖無特別限制,但於加熱後再予以組裝的情況時,可將其加熱溫度設為500~700℃,且宜設為600~700℃。 Further, in the manufacture of a CIGS solar cell, the method of assembling the cover glass on the glass substrate having the CIGS layer is not particularly limited, but when it is assembled after heating, the heating temperature can be set to 500 to 700. °C, and should be set to 600~700 °C.
若將本發明之太陽電池用玻璃基板兼用於CIGS太陽電池之玻璃基板及蓋玻璃的話,因平均熱膨脹係數為同等故不會發生太陽電池組裝時之熱變形等而理想。 When the glass substrate for a solar cell of the present invention is used for a glass substrate and a cover glass of a CIGS solar cell, it is preferable that the average thermal expansion coefficient is equal, and thermal deformation during assembly of the solar cell does not occur.
又,本發明之太陽電池用玻璃基板因具有預定之平均熱膨脹係數、高玻璃強度、低玻璃密度,以及,板玻璃生產時之高熔解性、良好的成形性及良好的防失透性,故適宜作為CdTe太陽電池用玻璃基板使用。 Moreover, the glass substrate for a solar cell of the present invention has a predetermined average thermal expansion coefficient, high glass strength, low glass density, high meltability in the production of sheet glass, good formability, and good devitrification resistance. It is suitably used as a glass substrate for CdTe solar cells.
在CdTe太陽電池中所採用之超基板(Superstrate)型構造中因玻璃基板露出於外側,故具有高玻璃強度之本 發明之太陽電池用玻璃基板亦適宜作為CdTe太陽電池用玻璃基板使用。 In the superstrate type structure used in the CdTe solar cell, since the glass substrate is exposed to the outside, it has a high glass strength. The glass substrate for a solar cell of the invention is also suitably used as a glass substrate for a CdTe solar cell.
又,因具有高玻璃轉移點溫度,從而於形成CdTe層時可於高溫下成膜,故可有益於CdTe太陽電池之發電效率。 Moreover, since it has a high glass transition point temperature, it can form a film at a high temperature when a CdTe layer is formed, which is beneficial to the power generation efficiency of the CdTe solar cell.
將本發明之太陽電池用玻璃基板適用於CdTe太陽電池之玻璃基板時,玻璃基板之厚度宜設為3mm以下,且較佳為2mm以下,更佳則為1.5mm以下。又於玻璃基板形成CdTe層之方法雖無特別限制,但由於其玻轉移點溫度高,故可將形成CdTe層時之加熱溫度設為500~700℃,且宜設為550~700℃,設為580~700℃較佳,設為600~700℃更佳,設為620~700℃尤佳。 When the glass substrate for a solar cell of the present invention is applied to a glass substrate of a CdTe solar cell, the thickness of the glass substrate is preferably 3 mm or less, more preferably 2 mm or less, and still more preferably 1.5 mm or less. The method of forming the CdTe layer on the glass substrate is not particularly limited, but since the glass transition point temperature is high, the heating temperature at the time of forming the CdTe layer can be set to 500 to 700 ° C, and preferably set to 550 to 700 ° C. It is preferably 580 to 700 ° C, more preferably 600 to 700 ° C, and more preferably 620 to 700 ° C.
將本發明之太陽電池用玻璃基板僅使用於CdTe太陽電池之玻璃基板的情況時,背板玻璃等並無特別限制。背板玻璃之組成之其他例,可舉鈉鈣玻璃等。 When the glass substrate for a solar cell of the present invention is used only for a glass substrate of a CdTe solar cell, the back glass or the like is not particularly limited. Other examples of the composition of the back sheet glass include soda lime glass and the like.
將本發明之太陽電池用玻璃基作為CdTe太陽電池之背板玻璃使用時,背板玻璃之厚度宜設為3mm以下,且較佳為2mm以下,更佳則為1.5mm以下。 When the glass base for a solar cell of the present invention is used as a back sheet glass of a CdTe solar cell, the thickness of the back sheet glass is preferably 3 mm or less, more preferably 2 mm or less, and still more preferably 1.5 mm or less.
又於CdTe太陽電池之製造中,將背板玻璃組裝於具有CdTe層之玻璃基板的方法雖無特別限制,但於加熱後再予以組裝的情況時,可將其加熱溫度設為500~700℃,且宜設為600~700℃。 Further, in the manufacture of a CdTe solar cell, the method of assembling the back sheet glass to the glass substrate having the CdTe layer is not particularly limited, but when it is assembled after heating, the heating temperature can be set to 500 to 700 ° C. And should be set to 600~700 °C.
若將本發明之太陽電池用玻璃基板兼用於CdTe太陽電池之玻璃基板及背板玻璃時,因平均熱膨脹係數為同等故不會發生太陽電池組裝時之熱變形等而理想。 When the glass substrate for a solar cell of the present invention is used for both the glass substrate and the back glass of the CdTe solar cell, it is preferable that the average thermal expansion coefficient is equal, and thermal deformation during assembly of the solar cell does not occur.
<本發明之CIGS太陽電池> <CIGS Solar Cell of the Invention>
其次,將就本發明之CIGS太陽電池進行說明。 Next, the CIGS solar cell of the present invention will be described.
本發明之CIGS太陽電池,具備有:玻璃基板;蓋玻璃;及Cu-In-Ga-Se光電轉換層,係配置於前述玻璃基板與前述蓋玻璃之間;且前述玻璃基板與前述蓋玻璃之中,至少前述玻璃基板係本發明之太陽電池用玻璃基板。 The CIGS solar cell of the present invention includes: a glass substrate; a cover glass; and a Cu-In-Ga-Se photoelectric conversion layer disposed between the glass substrate and the cover glass; and the glass substrate and the cover glass At least the glass substrate is a glass substrate for a solar cell of the present invention.
以下,將使用所附圖式詳細說明本發明之CIGS太陽電池。另外,本發明並不侷限於所附圖式。 Hereinafter, the CIGS solar cell of the present invention will be described in detail using the drawings. Further, the invention is not limited to the drawings.
圖1係截面圖,示意顯示本發明之CIGS太陽電池之實施形態的一例。圖1中,本發明之CIGS太陽電池1具備有:玻璃基板5;蓋玻璃19;及CIGS層9,係位在玻璃基板5與蓋玻璃19之間。且玻璃基板5宜為前述已說明之本發明之太陽電池用玻璃基板。太陽電池1係於玻璃基板5上具有為正電極7之Mo膜的背面電極層,且於其上具有CIGS層9。CIGS層之組成可舉Cu(In1-xGax)Se2為例。x係顯示In與Ga之組成比且0<x<1。 Fig. 1 is a cross-sectional view showing an example of an embodiment of a CIGS solar cell of the present invention. In Fig. 1, a CIGS solar cell 1 of the present invention is provided with a glass substrate 5, a cover glass 19, and a CIGS layer 9 which is positioned between the glass substrate 5 and the cover glass 19. Further, the glass substrate 5 is preferably the glass substrate for a solar cell of the present invention described above. The solar cell 1 is a back electrode layer having a Mo film which is a positive electrode 7 on a glass substrate 5, and has a CIGS layer 9 thereon. The composition of the CIGS layer can be exemplified by Cu(In 1-x Ga x )Se 2 . The x system shows the composition ratio of In to Ga and 0 < x < 1.
在CIGS層9上具有CdS(硫化鎘)、ZnS(硫化鋅)層、ZnO(氧化鋅)層、Zn(OH)2(氫氧化鋅)層或該等之混晶層作為緩衝層11。隔著緩衝層9具有ZnO或ITO、或是摻混了Al之ZnO(AZO)等之透明導電膜13,並且於其上具有為負電極15之Al電極(鋁電極)等之取出電極。亦可於該等層之間之必要的場所設置抗反射膜。以圖1來說,係於透明導電膜13與負電極15之間設置有抗反射膜17。 The CIGS layer 9 has a CdS (cadmium sulfide) layer, a ZnS (zinc sulfide) layer, a ZnO (zinc oxide) layer, a Zn(OH) 2 (zinc hydroxide) layer or the like mixed layer as the buffer layer 11. The transparent conductive film 13 such as ZnO or ITO or ZnO (AZO) doped with Al is interposed between the buffer layer 9 and has an extraction electrode such as an Al electrode (aluminum electrode) of the negative electrode 15 thereon. An anti-reflection film may also be provided at a necessary place between the layers. In the case of FIG. 1, an anti-reflection film 17 is provided between the transparent conductive film 13 and the negative electrode 15.
又,亦可於負電極15上設置蓋玻璃19,且於必要 時可將負電極與蓋玻璃之間進行樹脂密封,或是以黏著用的透明樹脂進行黏著。蓋玻璃亦可使用本發明之太陽電池用玻璃基板。 Moreover, a cover glass 19 may be provided on the negative electrode 15, and is necessary The resin may be sealed between the negative electrode and the cover glass, or may be adhered by a transparent resin for adhesion. The cover glass may also use the glass substrate for solar cells of this invention.
本發明中,CIGS層之端部或太陽電池之端部亦可為密封狀態。而作為用以密封之材料,可舉例如與本發明之太陽電池用玻璃基板相同的材料、其他之玻璃及樹脂等。 In the present invention, the end portion of the CIGS layer or the end portion of the solar cell may be in a sealed state. The material to be sealed is, for example, the same material as the glass substrate for a solar cell of the present invention, other glass, resin, or the like.
另外,附圖所示之太陽電池之各層的厚度並不受圖面所限制。 In addition, the thickness of each layer of the solar cell shown in the drawings is not limited by the drawings.
本發明之CIGS太陽電池係使用本發明之太陽電池用玻璃基板作為玻璃基板,且於CIGS層之成膜步驟的第二階段中,可藉由於500℃以上之加熱條件下成膜CIGS層,而獲得更高的發電效率。第二階段之加熱溫度宜為550℃以上,較佳為580℃以上,更佳為600℃以上,且以620℃以上尤佳。 The CIGS solar cell of the present invention uses the glass substrate for a solar cell of the present invention as a glass substrate, and in the second stage of the film formation step of the CIGS layer, the CIGS layer can be formed by heating under conditions of 500 ° C or higher. Get higher power generation efficiency. The heating temperature in the second stage is preferably 550 ° C or higher, preferably 580 ° C or higher, more preferably 600 ° C or higher, and particularly preferably 620 ° C or higher.
於CIGS太陽電池之製造方法中之CIGS層之成膜步驟以外的其他步驟,例如,緩衝層或透明導電膜層之成膜等,只要與一般之CIGS太陽電池之製造方法的步驟依同樣方式進行即可。 The steps other than the film formation step of the CIGS layer in the method of manufacturing the CIGS solar cell, for example, the formation of a buffer layer or a transparent conductive film layer, etc., may be carried out in the same manner as the steps of the general CIGS solar cell manufacturing method. Just fine.
<本發明之CdTe太陽電池> <CdTe Solar Cell of the Invention>
接著,將就本發明之CdTe太陽電池進行說明。 Next, the CdTe solar cell of the present invention will be described.
本發明之太陽電池具備有:玻璃基板;背板玻璃;及CdTe光電轉換層(CdTe層),係配置於前述玻璃基板與前述背板玻璃之間;且前述玻璃基板與前述背板玻璃之中,至少前述玻璃基板係本發明之太陽電池用玻璃基板。或者, 亦可為於前述太陽電池之構造中,使用了具有耐水性及耐氧穿透性之背膜(back film)來取代背板玻璃的太陽電池。 The solar cell of the present invention includes: a glass substrate; a back sheet glass; and a CdTe photoelectric conversion layer (CdTe layer) disposed between the glass substrate and the back sheet glass; and the glass substrate and the back sheet glass At least the glass substrate is a glass substrate for a solar cell of the present invention. or, In the configuration of the solar cell described above, a solar cell having a water-resistant and oxygen-resistant penetrating back film may be used instead of the back glass.
以下,將使用所附圖式詳細說明本發明中之太陽電池。另外,本發明並不受所附圖式所限制。 Hereinafter, the solar cell of the present invention will be described in detail using the drawings. In addition, the invention is not limited by the drawings.
圖4係截面圖,示意顯示本發明之CdTe太陽電池之實施形態的一例。 Fig. 4 is a cross-sectional view showing an example of an embodiment of a CdTe solar cell of the present invention.
圖4中,本發明之太陽電池(CdTe太陽電池)21具備有:厚度為1~3mm的玻璃基板22;厚度為1~3mm的背板玻璃27;及厚度為3~15μm的CdTe層25,係位在玻璃基板22與背板玻璃27之間。形成CdTe層或透明導電膜時之加熱溫度為500℃以上,且宜為550℃以上,較佳為580℃以上,更佳為600℃以上,而以620℃以上尤佳。玻璃基板22宜由前述所說明之本發明之太陽電池用玻璃基板構成。 In Fig. 4, the solar cell (CdTe solar cell) 21 of the present invention comprises: a glass substrate 22 having a thickness of 1 to 3 mm; a back sheet glass 27 having a thickness of 1 to 3 mm; and a CdTe layer having a thickness of 3 to 15 μm . 25, the tie between the glass substrate 22 and the back sheet glass 27. The heating temperature at the time of forming the CdTe layer or the transparent conductive film is 500 ° C or higher, and preferably 550 ° C or higher, preferably 580 ° C or higher, more preferably 600 ° C or higher, and particularly preferably 620 ° C or higher. The glass substrate 22 is preferably composed of the glass substrate for a solar cell of the present invention described above.
CdTe太陽電池21係於玻璃基板22上具有厚度為100~1000nm的透明導電膜23。形成CdTe層或透明導電膜時之加熱溫度為500℃以上,且宜為550℃以上,較佳為580℃以上,更佳為600℃以上,而以620℃以上尤佳。 The CdTe solar cell 21 has a transparent conductive film 23 having a thickness of 100 to 1000 nm on the glass substrate 22. The heating temperature at the time of forming the CdTe layer or the transparent conductive film is 500 ° C or higher, and preferably 550 ° C or higher, preferably 580 ° C or higher, more preferably 600 ° C or higher, and particularly preferably 620 ° C or higher.
作為透明導電膜23係可列舉例如摻雜了Sn之In2O3或摻雜了F之In2O3等。於透明導電膜23上具有厚度為50~300nm的緩衝層24(例如CdS層),並於該緩衝層24之上具有CdTe層25。更進一步於CdTe層25上具有100~1000nm的背面電極層26(例如摻雜了Cu之碳電極或Mo電極等),且於背面電極層26上具有背板玻璃27。於背面電極層26與背板玻璃27之間宜進行樹脂密封,不然則宜以黏著用的樹脂進行 黏著。背板玻璃27亦可使用本發明之太陽電池用玻璃基板。 Based transparent conductive film 23 include, for example, the Sn-doped In 2 O 3 or the doped In F 2 O 3 and the like. A buffer layer 24 (for example, a CdS layer) having a thickness of 50 to 300 nm is provided on the transparent conductive film 23, and a CdTe layer 25 is provided on the buffer layer 24. Further, the CdTe layer 25 has a back electrode layer 26 of 100 to 1000 nm (for example, a carbon electrode doped with Cu or a Mo electrode), and has a back plate glass 27 on the back electrode layer 26. It is preferable to perform resin sealing between the back electrode layer 26 and the back sheet glass 27, otherwise it is preferable to adhere with a resin for adhesion. The glass substrate for a solar cell of the present invention can also be used for the back sheet glass 27.
本發明中,CdTe層之端部或太陽電池之端部係呈密封狀態。而作為用以密封之材料,可舉例如與本發明之CdTe太陽電池用玻璃基板相同的材料、其他之玻璃材料及樹脂等。 In the present invention, the end portion of the CdTe layer or the end portion of the solar cell is in a sealed state. The material to be sealed is, for example, the same material as the glass substrate for a CdTe solar cell of the present invention, other glass materials, resins, and the like.
另外,附圖所示之太陽電池之各層的厚度並不受圖面所限制。 In addition, the thickness of each layer of the solar cell shown in the drawings is not limited by the drawings.
以下,將藉由實施例及製造例更詳細地說明本發明,但本發明並不侷限於該等實施例及製造例。 Hereinafter, the present invention will be described in more detail by way of examples and production examples, but the invention is not limited to the examples and the examples.
且將顯示本發明之太陽電池用玻璃基板之實施例(例1~13、17~31)及比較例(例14~16)。 Further, examples (Examples 1 to 13, 17 to 31) and comparative examples (Examples 14 to 16) of the glass substrate for a solar cell of the present invention are shown.
調合各成分之原料以使成為表1~4中所示之玻璃組成,並相對於該玻璃基板用成分之原料100質量份,於前述原料添加以SO3換算為0.1質量份的硫酸鹽,並使用白金坩鍋以1650℃之溫度進行3小時加熱並予以熔解。另外,表1~4中,Fe2O3之摻混量係顯示相對於母組成(以前述範圍含有SiO2、Al2O3、B2O3、MgO、CaO、SrO、BaO、ZrO2、Na2O及K2O之玻璃母組成)100質量份的質量份。 The raw materials of the respective components are blended so as to have a glass composition as shown in Tables 1 to 4, and a sulfate of 0.1 part by mass in terms of SO 3 is added to the raw material in an amount of 100 parts by mass based on the raw material of the glass substrate component. It was heated and melted at a temperature of 1650 ° C for 3 hours using a platinum crucible. Further, in Tables 1 to 4, the blending amount of Fe 2 O 3 is shown to be relative to the parent composition (containing SiO 2 , Al 2 O 3 , B 2 O 3 , MgO, CaO, SrO, BaO, ZrO 2 in the above range). And a glass mother composition of Na 2 O and K 2 O) 100 parts by mass parts by mass.
於熔解之際,插入白金攪拌器攪拌1小時進行玻璃之均質化。接著倒出熔融玻璃,並於成形為板狀後予以冷卻,即獲得玻璃板。 At the time of melting, a platinum stirrer was inserted and stirred for 1 hour to homogenize the glass. Then, the molten glass was poured out, and after being formed into a plate shape, it was cooled, and the glass plate was obtained.
測定依所述方式製得之玻璃板的平均熱膨脹係數(單位:×10-7/℃)、玻璃轉移點溫度Tg(單位:℃)、密度(單位: g/cm3)、脆度指標值(單位:m-1/2)、黏度成為102dPa.s之溫度(T2)(單位:℃)、黏度成為104dPa.s之溫度T4(單位:℃)、失透溫度(TL)(單位:℃)、Na擴散量及發電效率,並將之示於表1~4中。以下將顯示各物理特性之測定方法。 The average thermal expansion coefficient (unit: × 10 -7 / ° C), glass transition point temperature Tg (unit: ° C), density (unit: g / cm 3 ), and brittleness index value of the glass plate obtained by the above method were measured. (Unit: m -1/2 ), viscosity is 10 2 dPa. The temperature of s (T 2 ) (unit: ° C), the viscosity becomes 10 4 dPa. The temperature T s 4 (unit: deg.] C), devitrification temperature (T L) (unit: ℃), Na diffusion amount and the power generation efficiency, and it is shown in Tables 1 to 4. The measurement method of each physical property will be shown below.
另外,於實施例中,係就玻璃板進行測定,而各物理特性係玻璃板與玻璃基板為相同值。並可藉由將所得之玻璃板施行加工及研磨而製成玻璃基板。 Further, in the examples, the measurement was performed on the glass plate, and the physical properties of the glass plate and the glass substrate were the same. The glass substrate can be produced by subjecting the obtained glass plate to processing and grinding.
(1)50~350℃之平均熱膨脹係數: (1) Average thermal expansion coefficient from 50 to 350 °C:
該平均熱膨脹係數係使用示差熱膨脹計(TMA)進行測定,且依據JIS R3102(1995年度)之規格求出。 The average coefficient of thermal expansion was measured using a differential thermal dilatometer (TMA) and determined according to the specifications of JIS R3102 (1995).
(2)Tg: (2) Tg:
Tg係經使用TMA測出的值,並依據JIS R3103-3(2001年度)之規格求出。 Tg is a value measured by TMA and is obtained according to the specifications of JIS R3103-3 (2001).
(3)密度: (3) Density:
密度係將自玻璃板切出且不含氣泡之約20g的玻璃塊經利用阿基米德原理進行測定。 The density was determined by using the Archimedes principle using a glass block of about 20 g which was cut out from the glass plate and free of air bubbles.
(4)脆度指標值: (4) Brittleness index value:
脆度指標值係使用打入於前述各種玻璃板表面之維氏(Vickers)壓痕的尺寸與前述式(1)而算出脆度指標值。 The brittleness index value was calculated by using the size of the Vickers indentation on the surface of each of the above-mentioned glass sheets and the above formula (1).
(5)黏度: (5) Viscosity:
黏度係使用旋轉黏度計進行測定,且測定了黏度η成為102dPa.s時之溫度T2(熔解性之基準溫度)、與黏度η成為104dPa.s時之溫度T4(成形性之基準溫度)。 The viscosity was measured using a rotary viscometer, and the viscosity η was measured to be 10 2 dPa. The temperature T 2 (the reference temperature of the melting property) and the viscosity η become 10 4 dPa. The temperature s T 4 (moldability of the reference temperature).
(6)失透溫度(TL): (6) Devitrification temperature (T L ):
失透溫度係將自玻璃板切出之玻璃塊5g載置於白金盤上,並於電爐中保持了17小時。將經保持後之玻璃塊表面及內部未析出結晶之溫度的最低值作為失透溫度。 The devitrification temperature was carried out by placing 5 g of the glass block cut out from the glass plate on a platinum plate and holding it in an electric furnace for 17 hours. The lowest value of the temperature at which no crystals were precipitated on the surface of the glass block after the holding and the inside was taken as the devitrification temperature.
(7)發電效率: (7) Power generation efficiency:
發電效率係將所得之玻璃板用於太陽電池用基板,並如以下所示製作評估用太陽電池,且使用其就發電效率進行評估。並將結果示於表1~4。 Power generation efficiency The obtained glass plate was used for a substrate for a solar cell, and a solar cell for evaluation was produced as shown below, and used for evaluation of power generation efficiency. The results are shown in Tables 1 to 4.
關於評估用太陽電池之製作,係使用圖2、3及其符號說明於下。 The production of the solar cell for evaluation will be described below using Figs. 2 and 3 and their symbols.
另外,評估用太陽電池之層構造除了不具有圖1之太陽電池的蓋玻璃19及抗反射膜17以外,係與圖1所示之太陽電池的層構造大致相同。 In addition, the layer structure of the solar cell for evaluation is substantially the same as the layer structure of the solar cell shown in FIG. 1 except for the cover glass 19 and the anti-reflection film 17 which do not have the solar cell of FIG.
將所得之玻璃板加工成尺寸為3cm×3cm且厚度為1.1mm,而製得玻璃基板。於玻璃基板5a之上,以濺鍍裝置成膜Mo(鉬)膜作為正電極7a。成膜係於室溫下實施,且製得了厚度500nm的Mo膜。 The obtained glass plate was processed into a size of 3 cm × 3 cm and a thickness of 1.1 mm to prepare a glass substrate. On the glass substrate 5a, a Mo (molybdenum) film is formed as a positive electrode 7a by a sputtering apparatus. The film formation was carried out at room temperature, and a Mo film having a thickness of 500 nm was obtained.
於正電極7a(Mo膜)上利用濺鍍裝置,以CuGa合金靶材成膜CuGa合金層,接著使用In靶材成膜In層,藉此而成膜In-CuGa之前驅(precursor)膜。成膜係於室溫下實施。調整各層之厚度以使利用螢光X射線測出之前驅膜的組成,Cu/(Ga+In)比成為0.8,且Ga/(Ga+In)比成為0.25,而獲得厚度為650nm的前驅膜。 A CuGa alloy layer was formed on the positive electrode 7a (Mo film) by a sputtering apparatus using a CuGa alloy target, and then an In layer was formed using an In target, thereby forming an In-CuGa precursor film. The film formation is carried out at room temperature. The thickness of each layer was adjusted so that the composition of the precursor film was measured by fluorescent X-ray, the ratio of Cu/(Ga+In) was 0.8, and the ratio of Ga/(Ga+In) was 0.25, and a precursor film having a thickness of 650 nm was obtained. .
使用RTA(Rapid Thermal Annealing(快速退火))裝置,以氬及硒化氫混合氣體環境(硒化氫相對於氬為5體 積%)將前驅膜進行了加熱處理。首先,於500℃下進行保持10分鐘,使與Cu、In、Ga及Se進行反應作為第1階段,之後,更進一步藉由於580℃下保持30分鐘使CIGS晶體成長而獲得CIGS層9a作為第2階段。所得之CIGS層9a之厚度係2μm。 RTA (Rapid Thermal Annealing) device is used in a mixed gas atmosphere of argon and hydrogen selenide (sodium selenide is 5 bodies with respect to argon) The % of the precursor film was heat treated. First, the reaction was carried out at 500 ° C for 10 minutes, and the reaction with Cu, In, Ga, and Se was carried out as the first step. Thereafter, the CIGS layer was grown by holding at 580 ° C for 30 minutes to obtain the CIGS layer 9a. 2 stages. The thickness of the obtained CIGS layer 9a was 2 μm.
以CBD(Chemical Bath Deposition(化學沈浸沈積))法於CIGS層9a上成膜CdS層作為緩衝層11a。具體而言,首先,於燒杯內使濃度0.01M的硫酸鎘、濃度1.0M的硫脲、濃度15M的氨及純水進行混合。其次,將CIGS層浸於前述混合液中,且連同燒杯一起放入已預先使水溫成為70℃之恆溫浴槽中,將CdS層成膜50~80nm。 A CdS layer was formed as a buffer layer 11a on the CIGS layer 9a by a CBD (Chemical Bath Deposition) method. Specifically, first, 0.01 M cadmium sulfate, 1.0 M thiourea, 15 M ammonia, and pure water were mixed in a beaker. Next, the CIGS layer was immersed in the above-mentioned mixed solution, and placed in a thermostatic bath having a water temperature of 70 ° C in advance together with a beaker, and the CdS layer was formed into a film of 50 to 80 nm.
更進一步於CdS層上以濺鍍裝置將透明導電膜13a依以下之方法成膜。首先,使用ZnO靶材成膜ZnO層,其次,使用AZO靶材(含有1.5wt%之Al2O3的ZnO靶材)成膜AZO層。各層之成膜係於室溫下實施,而獲得了厚度為480nm之2層構造的透明導電膜13a。 Further, the transparent conductive film 13a was formed into a film by a sputtering apparatus on the CdS layer in the following manner. First, a ZnO layer was formed using a ZnO target, and second, an AZO layer (a ZnO target containing 1.5 wt% of Al 2 O 3 ) was used to form an AZO layer. The film formation of each layer was carried out at room temperature, and a transparent conductive film 13a having a two-layer structure having a thickness of 480 nm was obtained.
利用EB蒸鍍法於透明導電膜13a之AZO層上,成膜膜厚為1μm的鋁膜作為U字型之負電極15a(此處,U字電極長係縱8mm、橫4mm,且電極寬度為0.5mm)。 On the AZO layer of the transparent conductive film 13a by the EB vapor deposition method, an aluminum film having a film thickness of 1 μm was formed as the U-type negative electrode 15a (here, the U-shaped electrode length is 8 mm in length and 4 mm in width, and the electrode width is It is 0.5mm).
最後,利用機械劃線(Mechanical Scribing)自透明導電膜13a側起削磨至CIGS層9a,並進行了如圖2所示之單元化。圖2(a)係從上面看一太陽電池單元的圖;圖2(b)係圖2(a)中之A-A'截面圖。一個單元係寬為0.6cm,長為1cm,且去除了負電極15a之面積為0.5cm2,如圖3所示,於1片玻璃基板5a上可獲得合計8個單元。 Finally, it was ground to the CIGS layer 9a from the side of the transparent conductive film 13a by mechanical scribing, and unitization as shown in FIG. 2 was performed. Fig. 2(a) is a view of a solar cell unit as seen from above; Fig. 2(b) is a cross-sectional view taken along line A-A' of Fig. 2(a). One unit has a width of 0.6 cm and a length of 1 cm, and the area of the negative electrode 15a is removed by 0.5 cm 2 . As shown in Fig. 3, a total of eight units can be obtained on one glass substrate 5a.
於太陽光模擬器(Solar Simulator)(山下電裝(YAMASHITA DENSO)股份有限公司製,YSS-T80A)上設置評估用CIGS太陽電池(即,前述製作了8個單元之評估用玻璃基板5a),並將正端子(無圖示)及負端子16a分別連接於電壓產生器上,即,將該正端連接係於已預先塗布了InGa溶劑之正電極7a上,且將該負端子16a連接於負電極15a之U字的下端。太陽光模擬器內之溫度係以溫度調節機控制於固定25℃。且予以照射模擬太陽光,於60秒後,使電壓以0.015V之間隔從-1V變化至+1V進行,並測定8個單元之個別的電流值。 A CIGS solar cell for evaluation (that is, an evaluation glass substrate 5a in which eight units were produced) was provided on a Solar Simulator (YAMASHITA DENSO Co., Ltd., YSS-T80A). The positive terminal (not shown) and the negative terminal 16a are respectively connected to the voltage generator, that is, the positive terminal is connected to the positive electrode 7a to which the InGa solvent has been previously applied, and the negative terminal 16a is connected to The lower end of the U word of the negative electrode 15a. The temperature in the solar simulator is controlled at a fixed temperature of 25 °C with a thermostat. The simulated sunlight was irradiated, and after 60 seconds, the voltage was changed from -1 V to +1 V at intervals of 0.015 V, and individual current values of eight cells were measured.
自該照射時之電流與電壓特性並利用下述式(2)算出發電效率。將8個單元之中,效率最佳的單元的值當作各玻璃基板之發電效率的值示於表1~4。且用於試驗之光源的照度係0.1W/cm2。 From the current and voltage characteristics at the time of the irradiation, the power generation efficiency was calculated by the following formula (2). Among the eight units, the value of the most efficient unit is shown in Tables 1 to 4 as the value of the power generation efficiency of each glass substrate. The illuminance of the light source used for the test was 0.1 W/cm 2 .
發電效率[%]=Voc[V]×Jsc[A/cm2]×FF[無因次]×100/用於試驗之光源的照度[W/cm2]...式(2) Power generation efficiency [%]=V oc [V]×J sc [A/cm 2 ]×FF[no dimension]×100/illuminance of the light source used for the test [W/cm 2 ]...(2)
發電效率係以將開路電壓(Voc)與短路電流密度(Jsc)及填充因數(FF)相乘而求得。 The power generation efficiency is obtained by multiplying the open circuit voltage (V oc ) by the short circuit current density (J sc ) and the fill factor (FF).
另外,開路電壓(Voc)係開放端子時之輸出,而短路電流(Isc)係短路時之電流。而短路電流密度(Jsc)係將Isc以除以負電極後之單元的面積除之者。 In addition, the open circuit voltage (V oc ) is the output at the time of opening the terminal, and the short circuit current (I sc ) is the current at the time of the short circuit. The short-circuit current density (J sc ) is obtained by dividing I sc by the area of the cell divided by the negative electrode.
又,給予最大輸出的點稱最大輸出點,且該點之電壓稱為最大電壓值(Vmax),電流則稱為最大電流值(Imax)。求出將最大電壓值(Vmax)與最大電流值(Imax)相乘的值除以開路 電壓(Voc)與短路電流(Isc)相乘的值作為填充因數(FF)。並使用上述的值求出發電效率。 Further, the point at which the maximum output is given is referred to as the maximum output point, and the voltage at this point is referred to as the maximum voltage value (V max ), and the current is referred to as the maximum current value (I max ). A value obtained by multiplying the maximum voltage value (V max ) by the maximum current value (I max ) by the value of the open circuit voltage (V oc ) multiplied by the short-circuit current (I sc ) is obtained as the fill factor (FF). The power generation efficiency is obtained using the above values.
(8)Na擴散量: (8) Na diffusion amount:
Na擴散量係用以觀察玻璃基板之鹼擴散性的效果,而於前述發電效率評估中,係於製作評估用太陽電池時使用了RTA裝置之加熱處理的第2階段結束後隨即測定了Na擴散量。測定方法如下: The Na diffusion amount is an effect for observing the alkali diffusibility of the glass substrate, and in the power generation efficiency evaluation, the Na diffusion is measured immediately after the second stage of the heat treatment using the RTA apparatus in the production of the solar cell for evaluation. the amount. The measurement method is as follows:
於利用前述RTA裝置之加熱處理的第2階段結束後,將試料以二次離子質譜儀(SIMS)測定CIGS膜中23Na之積分強度。表1~4所記載的值係將於例12所用的玻璃基板當作100之時的相對量。 After the completion of the second stage of the heat treatment by the RTA apparatus, the integrated intensity of 23 Na in the CIGS film was measured by a secondary ion mass spectrometer (SIMS). The values described in Tables 1 to 4 are relative amounts when the glass substrate used in Example 12 is regarded as 100.
另外,關於本實施例中之Na擴散量的計算值,係針對本實施例中實際測定了Na擴散量者,藉由以各組成成分將Na擴散量進行多元回歸分析求出回歸係數並經計算者。 Further, regarding the calculated value of the Na diffusion amount in the present embodiment, for the case where the Na diffusion amount is actually measured in the present embodiment, the regression coefficient is obtained by performing multivariate regression analysis on the Na diffusion amount of each component and is calculated. By.
玻璃中之SO3殘存量係100~500ppm。 The residual amount of SO 3 in the glass is 100 to 500 ppm.
由表1~4可清楚明白,實施例(例1~13及例17~31)的玻璃基板,玻璃轉移點溫度Tg高且Na擴散量多。因此,而可推測可於高溫下成膜CIGS層,並藉此而使CIGS晶體的成長良好且發電效率高。進而言之,實施例(例1~9及例11~13)的玻璃基板因T4-TL為-30℃以上故於失透特性上優異,且因平均熱膨脹係數為70×10-7~90×10-7/℃、密度為2.75g/cm3以下故重量輕,又因脆度指標值小於7000m-1/2故 具有高強度,而均衡具有太陽電池用玻璃基板的特性。 As is clear from Tables 1 to 4, in the glass substrates of the examples (Examples 1 to 13 and Examples 17 to 31), the glass transition point temperature Tg was high and the Na diffusion amount was large. Therefore, it is presumed that the CIGS layer can be formed at a high temperature, whereby the growth of the CIGS crystal is good and the power generation efficiency is high. Further, the glass substrates of the examples (Examples 1 to 9 and Examples 11 to 13) are excellent in devitrification characteristics because T 4 -T L is -30 ° C or more, and the average thermal expansion coefficient is 70 × 10 -7 . ~90 × 10 -7 / ° C, the density is 2.75g / cm 3 or less, so the weight is light, and the brittleness index value is less than 7000m - 1/2, so it has high strength, and the balance has the characteristics of the glass substrate for solar cells.
故可知本發明之太陽電池用玻璃基板係滿足高發電效率、高玻璃轉移點溫度、預定之平均熱膨脹係數、高玻璃強度、低玻璃密度及板玻璃生產時之良好的防失透性之所有特性。因此,不會有CIGS層自附Mo膜之玻璃基板剝離的情形,並且於組裝太陽電池時(具體而言,係將具有CIGS層之玻璃基板與蓋玻璃進行加熱再予以貼合時),玻璃基板不易變形。進而言之,因T2為1650℃以下且T4為1230℃以下,故於板玻璃生產時之熔解性及成形性上優異。 Therefore, it is understood that the glass substrate for a solar cell of the present invention satisfies all the characteristics of high power generation efficiency, high glass transition point temperature, predetermined average thermal expansion coefficient, high glass strength, low glass density, and good devitrification resistance in sheet glass production. . Therefore, there is no case where the CIGS layer is peeled off from the glass substrate to which the Mo film is attached, and when the solar cell is assembled (specifically, when the glass substrate having the CIGS layer and the cover glass are heated and then bonded), the glass The substrate is not easily deformed. In other words, since T 2 is 1650 ° C or lower and T 4 is 1230 ° C or lower, it is excellent in meltability and formability at the time of production of sheet glass.
另一方面,比較例(例14及15)的玻璃基板,因製成CIGS太陽電池時之Na擴散量少,故並未獲得高發電效率。 On the other hand, in the glass substrates of the comparative examples (Examples 14 and 15), since the Na diffusion amount was small when the CIGS solar cell was fabricated, high power generation efficiency was not obtained.
又,比較例(例16)之玻璃基板,因玻璃轉移點溫度低,故有耐熱性方面的問題。因此,難在高溫下成膜CIGS層。又因比重大,且脆度指標值為7000m-1/2以上故於強度上會有問題。 Further, in the glass substrate of Comparative Example (Example 16), since the glass transition point temperature was low, there was a problem in heat resistance. Therefore, it is difficult to form a CIGS layer at a high temperature. Since the ratio is large and the brittleness index value is 7000 m -1/2 or more, there is a problem in strength.
故本發明之太陽電池用玻璃基板可適宜使用於CIGS太陽電池用玻璃基板。又,亦可適宜作為CdTe太陽電池用玻璃基板。 Therefore, the glass substrate for solar cells of the present invention can be suitably used for a glass substrate for CIGS solar cells. Further, it can also be suitably used as a glass substrate for a CdTe solar cell.
本發明之太陽電池用玻璃基板,不僅可使用於CIGS太陽電池及CdTe太陽電池用之玻璃基板,亦可使用於蓋玻璃及背板玻璃,且更可使用於其他之太陽電池用基板及蓋玻璃。 The glass substrate for a solar cell of the present invention can be used not only for a glass substrate for a CIGS solar cell or a CdTe solar cell, but also for a cover glass and a back glass, and can be used for other solar cell substrates and cover glasses. .
本發明之太陽電池用玻璃基板可均衡具有高發電效率、高玻璃轉移點溫度、預定之平均熱膨脹係數、高玻璃強度、低玻璃密度,以及,板玻璃生產時之高熔解性、良好的成形性及良好的防失透性等的特性,藉由使用本發明之太陽電池用玻璃基板可提供發電效率高的太陽電池。特別是,本發明之太陽電池用玻璃基板作為Cu-In-Ga-Se太陽電池用或作為CdTe太陽電池係有用的。 The glass substrate for a solar cell of the present invention can have high power generation efficiency, high glass transition point temperature, predetermined average thermal expansion coefficient, high glass strength, low glass density, and high meltability and good formability in sheet glass production. In addition to the characteristics such as good devitrification resistance, a solar cell having high power generation efficiency can be provided by using the glass substrate for a solar cell of the present invention. In particular, the glass substrate for a solar cell of the present invention is useful as a Cu-In-Ga-Se solar cell or as a CdTe solar cell system.
另外,在此援引已於2012年9月10日提出申請之日本專利申請案第2012-198334號之說明書、申請專利範圍、圖式及摘要之全部內容,並將其納入作為本發明之揭示。 In addition, the entire contents of the specification, the drawings, and the abstract of the Japanese Patent Application No. 2012-198334, filed on Sep.
1‧‧‧CIGS太陽電池 1‧‧‧CIGS solar cell
5‧‧‧玻璃基板 5‧‧‧ glass substrate
7‧‧‧正電極 7‧‧‧ positive electrode
9‧‧‧CIGS層 9‧‧‧CIGS layer
11‧‧‧緩衝層 11‧‧‧buffer layer
13‧‧‧透明導電膜 13‧‧‧Transparent conductive film
15‧‧‧負電極 15‧‧‧Negative electrode
17‧‧‧抗反射膜 17‧‧‧Anti-reflective film
19‧‧‧蓋玻璃 19‧‧‧ Cover glass
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