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TW201038349A - Metal filler, low-temperature-bonding lead-free solder and bonded structure - Google Patents

Metal filler, low-temperature-bonding lead-free solder and bonded structure Download PDF

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Publication number
TW201038349A
TW201038349A TW099105474A TW99105474A TW201038349A TW 201038349 A TW201038349 A TW 201038349A TW 099105474 A TW099105474 A TW 099105474A TW 99105474 A TW99105474 A TW 99105474A TW 201038349 A TW201038349 A TW 201038349A
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Taiwan
Prior art keywords
metal
metal particles
mass
particles
flux
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TW099105474A
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Chinese (zh)
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TWI378841B (en
Inventor
Tomonori Kiyama
Norihito Tanaka
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Asahi Kasei E Materials Corp
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Publication of TW201038349A publication Critical patent/TW201038349A/en
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Publication of TWI378841B publication Critical patent/TWI378841B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/02Alloys based on copper with tin as the next major constituent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/02Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
    • B23K35/0222Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in soldering, brazing
    • B23K35/0244Powders, particles or spheres; Preforms made therefrom
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • B23K35/262Sn as the principal constituent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • B23K35/264Bi as the principal constituent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/30Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/30Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
    • B23K35/302Cu as the principal constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C12/00Alloys based on antimony or bismuth
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • H05K3/3485Applying solder paste, slurry or powder
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0263Details about a collection of particles
    • H05K2201/0272Mixed conductive particles, i.e. using different conductive particles, e.g. differing in shape

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Powder Metallurgy (AREA)

Abstract

Provided is a metal filler comprising a mixture of first metal particles with second metal particles, wherein the first metal particles are Cu-alloy particles containing Cu as the major component, which is an element being present at the highest ratio by mass, together with In and Sn; the second metal particles are Bi-alloy particles containing 40-70% by mass of Bi together with 30-60% by mass of one or more metals selected from among Ag, Cu, In and Sn; and the content of the second metal particles is 40-300 parts by mass per 100 parts by mass of the first metal particles. Also provided are a lead-free solder containing the aforesaid metal filler, a bonded structure formed by using the aforesaid lead-free solder, and a substrate to which a part provided with the aforesaid bonded structure is mounted.

Description

201038349 六、發明說明: 【發明所屬之技術領域】 本發明係關於-種可仙於各種電子零件之連接及通孔 填充等之金屬填料,以及含有該金屬填料之無錯焊劑,特 別為低溫連接用無鉛焊劑。本發明還關於—種使用該無鉛 焊劑所得之連接構造體、及具有該連接構造體與基 件搭載基板。 【先前技術】 Ο Ο 先前,作為回流熱處理中使用之焊劑,迄今一般係使用 溶點為urc之mp#晶焊劑。另,作為在要求高耐熱 性之電子零件内部等使用之高溫焊劑,廣泛使用的是固相 線270°C及液相線305t 2Sn_9〇pb高溫焊劑。 但,近年來如EU之環境規定(WEEE、R〇Hs指令)所示, pb之有害性成為問題。由此,從防止環境污染之觀點,焊 劑之無錯化急速進展^此狀況中,目前作為811_37外共 晶浑劑之代替物,熔點22(rc左右含之Sn_3 〇Ag_〇 5Cu之無 錯嬋劑較有代表性。作為該無料劑之回流熱處理條件, 峰值溫度一般在24〇t至260°C左右之溫度範圍。 上述熔點22〇t左右之含Sn_3.〇Ag_〇 5Cu之無鉛焊劑與 Sn-37Pb共晶焊劑相比,由於合金之熔點高,因此回流熱 處理條件亦變得更為高溫。近來,在擔心化石燃料枯竭、 地球暖化等問題之際’為人所盼望的是藉由使回流熱處理 溫度低溫化,而確立節能製程、及二氧化碳低排放製程。 另亦為人所期待的是該回流熱處理溫度之低溫化可抑制 146300.doc 201038349 4氣電子设備及基板材料之孰指復 , 傷,以及可使用之基板 ^ 度較為寬廣。目前,作為可以低溫熔融接合 無錯焊劑材料之代表性例子,可舉出Sn-测共晶焊 劑(熔點 138。〇、In(熔點 157YM c ns〇„ " )、811-52111合金焊劑(熔點 )寺(參照專利文獻⑴)。但,該等焊劑材料之炼點 氐焊劑接合後,當再次成為熔點以上溫度時,會 再炼融之問題。 a ^以手機為代表之電子設備之小型化、輕量化、及高 力月b化之趨勢驚人’追隨於此,高密度安裝技術亦持續急 速地進步。已開發出將零件内藏於基板中、或將複數之 LSI形成-個封裝體等之供有效利用有限容積之多種安裝 技摘1。作萁_ 士 & ^ - 方面,尚途、度化愈進展,納入基板内部或封 裝體^部之零件之焊劑連接部在後步驟中接受熱處理之次 數愈夕因此,焊劑於後步驟中再熔融,從零件與密封樹201038349 VI. Description of the Invention: [Technical Field] The present invention relates to a metal filler which can be used for connection of various electronic components, through-hole filling, etc., and a flux-free solder containing the metal filler, particularly for low temperature connection Use lead-free solder. Further, the present invention relates to a connection structure obtained by using the lead-free solder, and a substrate on which the connection structure and the substrate are mounted. [Prior Art] Ο 先前 Previously, as a flux used in reflow heat treatment, mp# crystal solder having a melting point of urc has hitherto been generally used. Further, as a high-temperature flux used in an electronic component requiring high heat resistance, a solid phase wire of 270 ° C and a liquidus 305 t 2 Sn_9 〇 pb high-temperature flux are widely used. However, in recent years, as the EU environmental regulations (WEEE, R〇Hs directive) show, the harmfulness of pb becomes a problem. Therefore, from the viewpoint of preventing environmental pollution, the error-free development of the flux is rapidly progressing. In this case, as a substitute for the 811_37 external eutectic tanning agent, the melting point of 22 (the Sn_3 〇Ag_〇5Cu contained in the rc is not wrong). The barium agent is more representative. As the reflow heat treatment condition of the materialless agent, the peak temperature is generally in the temperature range of about 24 〇t to 260 ° C. The lead-free flux containing Sn_3.〇Ag_〇5Cu having a melting point of about 22 〇t. Compared with the Sn-37Pb eutectic solder, the reflow heat treatment condition is also higher due to the higher melting point of the alloy. Recently, when it comes to problems such as depletion of fossil fuels and global warming, what is expected is to borrow The low-temperature process of reflow heat treatment is established to establish an energy-saving process and a low-carbon dioxide emission process. It is also expected that the temperature of the reflow heat treatment can be suppressed by 146300.doc 201038349 4 gas electronic equipment and substrate materials The substrate, the damage, and the substrate that can be used have a wide range. At present, as a representative example of a low-temperature fusion-bonding flux-free solder material, a Sn-measured eutectic solder (melting point 138) can be mentioned. 〇, In (melting point 157YM c ns 〇 „ " ), 811-52111 alloy flux (melting point) temple (refer to patent document (1)). However, after the welding of these flux materials, the flux is more than the melting point. At the time, there will be refining problems. a ^The trend of miniaturization, light weight, and high-powered electronic devices represented by mobile phones is amazing. Following this, high-density installation technology has continued to progress rapidly. Developed a variety of mounting techniques for the effective use of finite volume in which a part is housed in a substrate, or a plurality of LSIs are formed into a package. As a result, 尚 士 & ^ - Progress, the flux connection portion of the part incorporated into the interior of the substrate or the package portion is subjected to heat treatment in the subsequent step. Therefore, the flux is remelted in the subsequent step, from the part and the sealing tree.

月曰之間隙流出,而在零件電極間等產生短路,此一問題正 日显顯者化D 因此,納入基板内部或封裝體内部之零件之連接中,期 刀的是即使在後步驟接受複數次熱處理亦不再熔融之無鉛 焊劑材料。 ° QI 飞 j λ β 寺曰k案一種高耐熱性焊劑材料,在無錯焊劑之 回肌熱處理條件,例如峰值溫度246。(:下可熔融接合,且 接合後在相同熱處理條件下不熔融(專利文獻3)。含於該焊 劑材料之金屬粒子係第1金屬粒子與比該第1金屬粒子低熔 點之第2金屬粒子之混合體。專利文獻3之技術中,使用Sn 146300.doc 201038349 作為第2金屬粒子,將該焊劑材料以sn之炫點(23rc)以 上’例如246t進行回流熱處理時,於熔融之第2金屬粒子 與第1金屬粒子間金屬之擴散奸,而形成对熱性優良之 接合部…考慮到節能及二氧化碳低排放之需求,及對 耐熱性低之基板材料及電子設備m形,期望可以 更低/皿度接合’且接合後不會在無鉛焊劑之回流熱處理條 件下再熔融之材料。 因此,本發明者等提案一種焊劑材料,可在峰值溫度 149C以上低溫熔融接合,且接合後在26〇t之熱條件下具 有耐熱性(專利文獻4)。含於該焯劑材料之導電性填料,係 第1金屬粒子,及比該第1金屬粒子熔點高之第2金屬粒子 之混合體。 另’此外作為含複數種金屬粒子,且可以低溫接合之焊 劑膏’提案有使用Cu粉末與Sn-Bi類粉末之混合體之焊劑 膏(參照專利文獻5)。 [先前技術文獻] [專利文獻] [專利文獻1]曰本特開2001-334386號公報 [專利文獻2]曰本特開平11-239866號公報 [專利文獻3]國際公開第2006/109573號手冊 [專利文獻4]曰本特開2008-183 582號公報 [專利文獻5]曰本特開2008-200718號公報 【發明内容】 [發明所欲解決之問題] 146300.doc 201038349 但,專利文獻4所記载之技術中, 令拉人私ώ t 接σ後特別是室溫下 之接CT強度有改善之餘地。另, 寻矛J文獻4所記載之技術 中,由於對第1金屬粒子使用Ιη、 士 > 0人Λ g寻円仏金屬,原料成 本尚且&金組成複雜’因此有製造成本高之問題。另一方 面’專利文獻5所記载之技術中,&粉末易於氧化凝集, 若吸濕則更強固凝集,因此保存安定性有問題。另,專利 文獻4及5所記載之技術中,接 度有改善餘地。 接口後特别…下之接合強 本發明係鑑於上述問題而完成者,其目的係提供—種金 屬填料’可在比Sn_37Pb共晶焊劑之回流熱處理條件更低 溫之條件下⑽如峰值溫度為16()t:)㈣接合, 提供於室溫下之良好接人強声 後 民好接,強度。另,本發明之目的係亦提 供^該金屬填料之無錯焊劑、使用該無錯焊劑所得之連接 構造體、及具有該連接構造體與基板之零件搭載基板。 [解決問題之技術手段] [1]-種包含第1金屬粒子與第2金屬粒子之混合體之 屬填料, 該第1金屬粒子係含有作為主成份之以最高質量比例存 在之兀素〜,且進而含有In及Sn之Cu合金粒子, 該第2金屬粒子係包含Bi 40〜70質量%,及選自Ag、The gap between the moon and the moon is generated, and a short circuit occurs between the electrodes of the parts. This problem is marked by D. Therefore, in the connection of the parts inside the substrate or inside the package, the knife is accepted even in the subsequent steps. The secondary heat treatment is also no longer molten lead-free flux material. ° QI fly j λ β Temple 曰k is a high heat-resistant flux material, in the non-synchronized flux back muscle heat treatment conditions, such as peak temperature 246. (The following is melt-bondable, and is not melted under the same heat treatment conditions after bonding (Patent Document 3). The metal particles contained in the flux material are the first metal particles and the second metal particles having a lower melting point than the first metal particles. In the technique of Patent Document 3, Sn 146300.doc 201038349 is used as the second metal particle, and the flux material is reflowed by a resizing point (23 rc) or more of, for example, 246 t, and the second metal is melted. The metal is diffused between the particles and the first metal particles to form a joint having excellent heat resistance. In view of the need for energy saving and low carbon dioxide emission, and the m-shape of the substrate material and the electronic device having low heat resistance, it is expected to be lower/ The material of the present invention is not re-melted under the reflow heat treatment condition of the lead-free solder after bonding. Therefore, the inventors of the present invention have proposed a flux material which can be melt-bonded at a low temperature of 149 C or higher, and after bonding at 26 〇t Heat resistance under heat conditions (Patent Document 4). The conductive filler contained in the bismuth material is a first metal particle and has a higher melting point than the first metal particle A mixture of the second metal particles, and a solder paste using a mixture of Cu powder and Sn-Bi powder as a solder paste containing a plurality of metal particles and capable of low-temperature bonding (see Patent Document 5). [PRIOR ART DOCUMENT] [Patent Document 1] JP-A-2001-334386 [Patent Document 2] JP-A-H11-239866 [Patent Document 3] International Publication No. 2006/109573 [Patent Document 4] JP-A-2008-183 582 [Patent Document 5] JP-A-2008-200718 SUMMARY OF INVENTION [Problems to be Solved by the Invention] 146300.doc 201038349 However, Patent Document 4 In the technique described, there is room for improvement in the CT strength at room temperature, especially in the technique described in J. 4, because of the use of the first metal particle. Ιη,士> 0 people Λ 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏 円仏Agglutination, if it is hygroscopic, it is stronger and agglomerated, because There is a problem in the preservation stability. Further, in the techniques described in Patent Documents 4 and 5, there is room for improvement in the degree of connection. The interface is particularly strong in the present invention. The present invention has been made in view of the above problems, and its object is to provide a metal. The filler ' can be joined at a lower temperature than the reflow heat treatment condition of the Sn_37Pb eutectic solder (10), such as a peak temperature of 16 () t:) (4), providing a good connection at room temperature and good strength. Further, an object of the present invention is to provide a solder-free flux of the metal filler, a connection structure obtained by using the flux-free solder, and a component mounting substrate having the connection structure and the substrate. [Technical means for solving the problem] [1] A filler comprising a mixture of a first metal particle and a second metal particle, wherein the first metal particle contains a halogen-containing material having a highest mass ratio as a main component. Further, it further contains Cu alloy particles of In and Sn, and the second metal particles contain Bi 40 to 70% by mass, and are selected from Ag,

Cu、In及Sn群中i種以上之金屬3〇〜6〇質量%之則合金粒 子, ^ 且該第2金屬粒子之量相對該第1金屬粒子100質量份為 40〜300質量份。 … 146300.doc 201038349 [2] 如上述⑴記載之金屬填料,其中上述第2金屬粒 有Sn。 [3] 如上述⑽⑵記裁之金屬填料,其中上述第1金屬粒 .子及上述第2金屬粒子之平均粒徑均在5〜25师之範圍。 [4] 如上述⑴〜⑴中任__項記載之金屬填料,其中上述 第1金屬粒子進而含有選自Ag及則中螬以上之金屬。 黛ϋ如屋上述⑴〜附任—項記載之金屬填料,其中上述 〇弟至屬粒子包含“ 5〜15質量%、Bi 2〜8質量%、〜 49〜8 1質量%、In 2〜8質量%、及Sn ! 〇〜20質量%, 該第1金屬粒子在差示掃描熱量測定(DSC)下,呈有於 230〜3〇〇°C範圍内觀察到之至少一個發熱峰,及於 480〜530 C範圍内觀測到之至少一個吸熱峰。 间-種無料劑,其含有上述⑴ 金屬填料。 項。己載之 [7] 一種連接構造體’其具有第1電子零件、第2電子零 ❹件’以及接合該第i電子零件與第2電子零件之焊劑接人 部’該焊劑接合部係藉由將上述[6]記載之無錯焊劑進行回 流熱處理而形成。 m 一種零件搭載基板’其具有基板,及搭載於該基板 上之上述[7]記載之連接構造體。 [發明之效果] 本發明之金屬填料及含該金屬填料之無錯焊劑,可在比 例如W共晶焊劑之回流熱處理條件低溫之條 如峰值溫度⑽。C以上)炼融接合,接合後即使在後步瓣接 146300.doc 201038349 受複數次熱處理,焊劑連接部亦不會再㈣卜藉此,根據 本發明’可獲得防止因在零件電極間產生之焊劑再炼融所 造成之短路之效果。另,本發明之金屬填料及含有該金屬 填料之無錯焊劑可在接合後提供於室溫下之良好接合強 度。 【實施方式】 <金屬填料> 本發明之金屬填料係包含第1金屬粒子與第2金屬粒子之 混合體之金屬填料’該第1金屬粒子含有作為主成份之以 最高質量比例存在之元f e 1, 系匕叭銅)且進而含有In(銦)及In the Cu, In, and Sn groups, the metal particles of 3 or more metals are in the range of 3 to 6 % by mass, and the amount of the second metal particles is 40 to 300 parts by mass based on 100 parts by mass of the first metal particles. [2] The metal filler according to the above (1), wherein the second metal particles have Sn. [3] The metal filler according to the above (10) (2), wherein an average particle diameter of the first metal particles and the second metal particles is in the range of 5 to 25 divisions. [4] The metal filler according to any one of the above-mentioned, wherein the first metal particles further comprise a metal selected from the group consisting of Ag and a medium or higher. The metal filler according to the above (1) to (A), wherein the genus of the genus genus includes "5 to 15% by mass, Bi 2 to 8% by mass, ~ 49 to 8.1% by mass, and In 2 to 8 Mass %, and Sn 〇 20 20% by mass, the first metal particles exhibit at least one exothermic peak observed in the range of 230 to 3 〇〇 ° C under differential scanning calorimetry (DSC), and At least one endothermic peak observed in the range of 480 to 530 C. The interstitial material is contained in the above (1) metal filler. [7] A connection structure having a first electronic component and a second electron The zero-piece 'and the flux-joining portion for joining the i-th electronic component and the second electronic component' are formed by reflow heat treatment of the error-free solder described in the above [6]. The substrate having the substrate and the connection structure described in the above [7] mounted on the substrate. [Effect of the Invention] The metal filler of the present invention and the error-free flux containing the metal filler can be compared with, for example, W eutectic solder. The reflow heat treatment conditions are low temperature strips such as peak temperature (10). The above) the smelting joint, even after the jointing of the 146300.doc 201038349 after the bonding, the flux connecting portion will not be further (4), according to the invention, it is possible to prevent the flux generated between the electrodes of the parts. Further, the metal filler of the present invention and the flux-free solder containing the metal filler can provide good joint strength at room temperature after bonding. [Embodiment] <Metal filler> The metal filler of the present invention is a metal filler comprising a mixture of a first metal particle and a second metal particle, wherein the first metal particle contains a meta-fee having a highest mass ratio as a main component, and further Containing In (indium) and

Sn(錫)之Cu合金粒子,第2金屬粒子係包含出(鉍〜川質 量。/。’及選自心(銀)、Cu(銅)、In(銦)及^(錫)所組成的 群之1種以上之金屬30〜6〇質量%之則合金粒子,並且第2 金屬粒子之量相對第1金屬粒子100質量份為40〜300質量 份。 本發明 之組合, 尚。藉此 屬粒子溶 散而產生 定合金相 回流熱處 明之金屬 3 7Pb共晶 2,藉由上述組成之第丨金屬粒子及第2金屬粒子 第1金屬粒子之熔點設定成比第2金屬粒子之熔點 ,以回流熱處理,熔點比第1金屬粒子低之第2金 融’第1金屬粒子與熔融之第2金屬粒子間因熱擴 合金化反應,形成比第2金屬粒子之熔點高之穩 。典型實施態樣中,使用本發明之無鉛焊劑時之 理溫度下,第!金屬粒子不熔融。藉此,含本發 填料之無鉛焊劑可在低溫條件下(典型為比Sn_ 焊劑之回流熱處理條件低溫之條件)熔融接合, 146300.doc 201038349 且熔融接合後,具有在熱處理下不再熔融之效果。可低溫 熔融接合,可使在節能製程及二氧化碳低排放製程下之使 用成為可能,且在可抑制應用之電氣、電子設備及基板材 料等熱損傷之點上有利。 本發明藉由上述組成之第1金屬粒子及第2金屬粒子之組 合’可避免使用例如Cu粉末時產生之因吸濕而凝集之問 題。另,本發明中’具有第1金屬粒子以CU為主成份,且 & 第2金屬粒子含有多量趴之組成。藉此,可提供在低溫下 可溶融接合,且接合後具有室溫下之良好接合強度,並且 可降低In、Ag等高價金屬之使用量的金屬填料。 [第1金屬粒子] 第1金屬係以Cu為主成份。即,構成第丨金屬粒子之元素 中Cu之質量比例最高。第1金屬粒子除Cu之外,進而含有 In及Sri。藉此,第1金屬粒子可形成準穩定合金相。該準 穩定合金相之形成可促進第i金屬粒子與第2金屬粒子之合 〇 金化,因此低溫下之熔融接合時可賦與良好之接合強度。Cu alloy particles of Sn (tin), the second metal particles are composed of (铋 川 质量 mass / / ' and selected from the group consisting of core (silver), Cu (copper), In (indium) and ^ (tin) The alloy particles of 30 to 6 % by mass of the metal of one or more kinds of the group, and the amount of the second metal particles is 40 to 300 parts by mass based on 100 parts by mass of the first metal particles. The metal 3 7Pb eutectic 2 is obtained by dissolving the particles to form a fixed alloy phase reflow heat, and the melting point of the second metal particles of the second metal particles and the second metal particles having the above composition is set to be higher than the melting point of the second metal particles. In the reflow heat treatment, the second financial 'first metal particle having a lower melting point than the first metal particle is thermally alloyed with the molten second metal particle to form a higher stability than the melting point of the second metal particle. In the case where the lead-free solder of the present invention is used, the ?! metal particles are not melted. Thereby, the lead-free solder containing the present filler can be used under low temperature conditions (typically lower than the reflow heat treatment conditions of the Sn_ solder) Fusion bonding, 146300.doc 201038 349 and after fusion bonding, it has the effect of no longer melting under heat treatment. It can be melted at a low temperature, making it possible to use in energy-saving processes and low-carbon dioxide emission processes, and to suppress electrical, electronic equipment and substrate materials for applications. It is advantageous in the point of thermal damage. In the present invention, the combination of the first metal particles and the second metal particles of the above composition can avoid the problem of agglomeration due to moisture absorption when using, for example, Cu powder. In the present invention, The first metal particles have CU as a main component, and the second metal particles contain a large amount of ruthenium. Thereby, it is possible to provide melt-bonding at a low temperature, and has good bonding strength at room temperature after bonding, and can be A metal filler which reduces the amount of use of a high-priced metal such as In, Ag, etc. [First metal particle] The first metal is mainly composed of Cu. That is, the element constituting the second metal particle has the highest mass ratio of Cu. In addition to Cu, In and Sri are further contained, whereby the first metal particles can form a quasi-stable alloy phase. The formation of the quasi-stable alloy phase promotes the i-th metal particles and the second metal. Since the combination of the particles is ruthenium, a good joint strength can be imparted at the time of fusion bonding at a low temperature.

自Ag及Bi中之1種以上金屬較佳。One or more metals selected from the group consisting of Ag and Bi are preferred.

%。再者, 再者,此時亦可含有不可避免之雜質。 車乂佳悲樣中,第1金屬粒子包含Ag 5〜丨5質量%、則2%. Furthermore, in addition, unavoidable impurities may be contained at this time. In the ruthlessness of the car, the first metal particle contains Ag 5 to 丨 5 mass%, then 2

中,具有於230〜300。(:範圍内觀察到之 不掃描熱量測定(DSC) ;、J之至少一個發熱峰, 146300.doc 201038349 及於彻〜⑽範圍内觀測到至少一個吸教峰 WC範圍内觀察到之發熱峰,表示約金屬粒子 準穩定合金相,在480〜53代範圍内觀測到之吸熱峰,^ 示第1金屬粒子之溶點。再者,本說明書所記載之炫點又 表示以差示掃描熱量測定(DSC)解析之固相線溫度:再 者’上述差示掃描熱量測定,典型為在氮氛圍下阳 速度1(TC/分之條件,在㈣峨之測定範圍下實施。· 更佳態樣中,第i金屬粒子包含Ag 5〜15質量。Z。'出2 8 質量%、CU 49〜81質量%質量%、及Sn i 〇〜20質里 /〇且°亥第1孟屬粒子在差示掃描熱量測定(DSC)中,具右 於230〜300m圍内觀察到之至少—個發熱峰,及、於 480〜530°C範圍内觀測到之至少一個吸熱峰。 、 P金屬粒子之平均徑在2〜3〇 _範圍較佳。第i金屬粒 子之平均粒徑為2叫以上時’粒子之比表面積變小。因 此:自本發明之金屬填料,例如使用後述之助焊劑形成烊 劑膏時,第1金屬粒子與助焊劑之接觸面積變少,可獲得 焊劑膏之壽命變長之優點。再者,第1金屬粒子之平均: 徑為2 _以上時’回流熱處理中,可減少在源自助焊劑之 金屬填料之還原反應(即金屬填料粒子之氧化騎幻所產 生之出氣,可降低產生於焊劑連接内部之空隙。另,由焊 劑膏之粘著力之觀點,第丨金屬粒子之平均徑在3〇 pm以下 較佳。粒子尺寸過大時,粒子間之間隙變大,因此容易損 壞焊劑膏之枯著力,從搭載焊劑接合之零件至回流敎處理 結束之期間,該零件容易脫離。第丨金屬粒子之平均粒^ 146300.doc •10- 201038349 在5〜25 μιη範圍更佳。 再者’本說明書中之平均粒徑,係以雷射繞射式粒子徑 分佈測定裝置所測定之值。 [第2金屬粒子] 第2金屬粒子包含Bi 4〇〜7〇質量%,及選自^、“、^、 及Sn中之1種以上之金屬3〇〜6〇質量%。再者,此時亦可含 有不可避免之雜質。第2金屬粒子藉由上述組成,可在回 流熱處理中熔融,良好地實現於第i金屬粒子與溶融之第2 金屬粒子間之導因於熱擴散之合金化。 第2金屬粒子中則之含有量,從可在室溫下熔融接合, 且接合後獲得室溫下良好之接合強度之觀點觀之,係在4〇 質量%以上70質量%以下。上述含有量較佳為5〇〜6〇質量 %。 〇 第2金屬粒子中之選自Ag、Cu、In、及^中旧以上之 金屬含有量,從良好實現第丨金屬粒子與第2金屬粒子之合 金化之觀點觀之,係在30質量%以上,從別以充分量含= 第2金屬粒子中,可在低溫下熔融接合之觀點觀之,在 60%質量以下。上述含有量較佳為4〇〜5〇質量%。 特別,第2金屬粒子以含有Sn較佳。此時,可提供—種 金屬填料,該金屬填料之低溫熔融特性及接合性良好且 即使低溫下之熔融接合亦可賦與良好之接合強度。第^金 屬粒子中之Sn含有量為40〜50質量%較佳。 第2金屬粒子含有選自Ag、Cu、及ίη中之〗種以上金屬 時,可改善延展性,改良低熔點化、機械強度等。 146300.doc 11 201038349 另,由低溫熔融性及接合性之觀點觀之,第2金屬粒子 為Sn-Bi系合金粒子更佳,再佳為具有不易產生凝固缺陷 及偏析之共晶組成(典型為Sn_58Bi)2 Sn Bi系合金粒子。Medium, with 230~300. (: observed in the range of not scanning calorimetry (DSC); J at least one exothermic peak, 146300.doc 201038349 and in the range of ~ (10) observed at least one of the peaks observed in the WC range of the absorption peak, The quasi-stable alloy phase of the metal particles is shown, and the endothermic peak observed in the range of 480 to 53 generations indicates the melting point of the first metal particles. Furthermore, the bright points described in the present specification indicate the differential scanning calorimetry. (DSC) analysis of the solidus temperature: In addition, the above-mentioned differential scanning calorimetry is typically performed under a nitrogen atmosphere at a positive rate of 1 (TC/min, which is carried out under the measurement range of (4) 。. · Better aspect In the middle, the i-th metal particle contains Ag 5 to 15 mass. Z. 'out of 2 8 mass%, CU 49 to 81 mass% by mass, and Sn i 〇 〜20 质 〇 〇 ° ° ° ° ° In the differential scanning calorimetry (DSC), at least one exothermic peak observed in the right side of 230 to 300 m, and at least one endothermic peak observed in the range of 480 to 530 ° C. The average diameter is preferably in the range of 2 to 3 Å. The average particle diameter of the i-th metal particles is 2 In the case of the metal filler of the present invention, for example, when a solder paste is formed by using a flux described later, the contact area between the first metal particles and the flux is reduced, and the life of the solder paste can be changed. In addition, the average of the first metal particles: when the diameter is 2 _ or more, in the reflow heat treatment, the reduction reaction of the metal filler in the source self-flux can be reduced (that is, the gas generated by the oxidation of the metal filler particles) The gap generated in the inside of the flux connection can be reduced. Further, the average diameter of the second metal particles is preferably 3 pm or less from the viewpoint of the adhesion of the solder paste. When the particle size is too large, the gap between the particles becomes large. It is easy to damage the flux paste. The part is easily detached from the time when the solder-bonded part is placed until the end of the reflow process. The average particle size of the second metal particle 146300.doc •10- 201038349 is better in the range of 5~25 μηη Further, the average particle diameter in the present specification is a value measured by a laser diffraction type particle diameter distribution measuring device. [Second metal particles] Second metal particle package Bi 4 〇 to 7 〇 mass%, and one or more metals selected from the group consisting of ^, ", ^, and Sn, 3 〇 to 6 〇 mass%. Further, in this case, unavoidable impurities may be contained. The metal particles can be melted in a reflow heat treatment by the above-described composition, and are favorably formed by alloying between the i-th metal particles and the molten second metal particles due to thermal diffusion. The content of the second metal particles is From the viewpoint of being able to be melt-bonded at room temperature and having good bonding strength at room temperature after bonding, it is preferably 4% by mass or more and 70% by mass or less. The above content is preferably 5 〇 to 6 〇% by mass. The content of the metal selected from the group consisting of Ag, Cu, In, and ^ in the second metal particle is 30 mass from the viewpoint of good alloying of the second metal particle and the second metal particle. % or more, from the viewpoint of the sufficient amount of the second metal particles to be melt-bonded at a low temperature, it is 60% by mass or less. The above content is preferably 4 〇 to 5 〇 mass%. In particular, it is preferable that the second metal particles contain Sn. In this case, a metal filler can be provided which has good low-temperature melting characteristics and bonding properties and can impart good bonding strength even at a low temperature. The Sn content in the second metal particles is preferably 40 to 50% by mass. When the second metal particles contain a metal selected from the group consisting of Ag, Cu, and ίη, the ductility can be improved, and the low melting point, mechanical strength, and the like can be improved. 146300.doc 11 201038349 Further, from the viewpoint of low-temperature meltability and splicability, the second metal particles are more preferably Sn-Bi-based alloy particles, and further preferably have a eutectic composition which is less likely to cause solidification defects and segregation (typically Sn_58Bi)2 Sn Bi-based alloy particles.

Sn-Bi系合金粒子典型為只以%及m作為構成元素(但亦可 含有不可避免之雜質),但出自改善延展性,改良低熔點 化、機械強度之目的,可微量添加選自Ag、Cu、及匕中之 1種以上之金屬。 由與第1金屬粒子之平均粒徑相同之理由’即從與助焊 劑之反應性及焊劑膏之枯著力之觀點觀之,第2金屬粒子 之平均徑在5〜40 μηι之範圍較佳。第i金屬粒子之平均粒徑 在5〜25 μηι之範圍更佳。 [第1金屬粒子與第2金屬粒子之混合體] 本發明之金屬填料包含第丨金屬粒子與第2金屬粒子之混 合體。該混合體之金屬填料中,第2金屬粒子之量(以下亦 稱「第2金屬粒子之混合比」)相對第丨金屬粒子⑽質量份 在40〜300質量份之範圍。第2金屬粒子之混合比為4〇質: 份以上時’由於金屬填料中之回流熱處理時炫融成份之存 在比例變多,因此可良好實施低溫下之溶融接合,且例如 作為烊劑在接合後可賦與良好之物理強度。另一方面,第 2金屬粒子之混合比超過100質量份時,可得到更良好之2 理強度。另一方面’第2金屬粒子之混合比超過3〇〇質量份 時,熔融之第2金屬粒子與第丨金屬粒子反應而形成之高熔 =之穩定合金相之存在比例少,因此無法得到耐熱性了二 焊劑接合部之物理強度及耐熱性之觀點觀之,第2金屬粒 146300.doc 12 201038349 子之混合比在100〜300f量份之範圍較佳。 第1金屬粒子及第2金屬粒子之粒度分佈可根據谭劑膏之 用途而規定。例如絲網印刷用途中,在重視焊劑膏於基板 上轉印量少之問題下,以加寬粒度分佈較佳;在分配用途 及通孔填充用途中,在重視喷出流動性及孔掩埋性下,以 銳化粒度分佈較佳。 如上述’從與助焊劑之及雍丨 圩劑之夂應性及焊劑膏特性之觀點觀 Ο Ο 之’第1金屬粒子及第2金屬粒子之平均粒徑分別在2〜30 叫,及5〜40 _之範圍較佳,更佳為,第1金屬粒子及第2 金屬粒子之平均粒徑均在5〜25μη1之範圍。如後述,藉由 例如與助焊劑之組合,本發明之金屬填料可形成膏狀之益 錯㈣。使用該無錯焊劑進行零件安裝時,會有在由回流 熱處理形成之焊劍接合部之特別是焊跡部份表面,形成有 薄助糊之情形。若金屬填料之平均粒徑小,則該助焊 劍層中金屬填料之微粒子在浮游狀態下(即金屬粒子互相 :離之狀態)易於相隨’而在將焊劑接合之零件供給於後 續之助谭劑洗淨步驟時,產生洗淨液中金屬填料之粒子流 出而附著於零件之之不良情形。第i金屬粒子及第2金屬粒 子之千均粒控為5 _上時’零件安裝時在助焊劑層中, 金屬㈣W子將難以相隨’可抑制助悍劑層中浮游粒 子之產生’因此可降低洗淨液中流出之粒子數量。另一方 面广金屬粒子及第2金屬粒子之平均粒徑都在Μ㈣以 下時’嬋劑膏之枯著力不易受損,故為較佳。 第2金屬粒子之溶點以在80〜⑽。C之範圍較佳,更佳為 I46300.doc 201038349 100〜150 c之範圍。典型之實施態樣中,在使用本發明之 無釔*于劑時之回流熱處理溫度下,第2金屬粒子熔融。 再者,本說明書所規定之第1金屬粒子及第2金屬粒子之 元素組成。例如可以感應結合電漿(ICp)發光分析等進行 確扣。另,關於粒子剖面之元素組成,可藉由SE. EDX(特性X線分析裝置)解析。 山作為分別製造第1金屬粒子及第2金屬粒子之方法,作為 U私末製方法,可採用眾所周知之方法,但以驟冷凝固 法較佳。作為利用驟冷凝固法之微粉末之製造方法,可舉 出水喷霧法、氣體喷霧法、離心喷霧法等。其中由可抑制 粒子之虱含有量之方面觀之,以氣體喷霧法及離心噴霧法 更佳。 氣體喷霧法中’通常可使用氮氣、氬氣、氦氣等惰性氣 體其中,基於可提高氣體噴霧時之線速度,加快冷卻速 度之方面,使用比重較輕之氦氣較佳。冷卻速度在 5〇〇〜50〇〇。(: /秒之範圍較佳。離心喷霧法中,由在旋轉圓 盤上面形成均一熔融膜之觀點觀之,材質係以塞隆 (SlA1〇N)較佳,圓盤旋轉速度在ό萬〜12萬rpm之範圍較 佳。 &lt;無鉛焊劑&gt; 本發明亦提供一種含有上述本發明之金屬填料之無鉛焊 hl本§兒明書中,所謂「無鉛」,係按照EU環境規則,指 、口之3有里在〇.丨質量%以下者。本發明之無鉛焊劑以包含 金屬填料成份與助焊劑成份之焊劑膏較佳。本發明之無鉛 146300.doc -14· 201038349 Ο Ο 焊劑更典型為包含金屬填料成份與助焊劑成份。金屬填料 成份亦可包含上述本發明之金屬填料,但在無損本發明效 果之1&amp;圍内可含有少量其他金屬填料。作為上述焊劑膏中 金屬填料成份之含有率,從焊劑膏特性之觀點觀之,為焊 劑膏_質量%中之84〜94質量%之範圍較佳。±述含有率 更佳之範圍可因應焊劑膏用途而定。例如絲網印刷用途 中’在重視焊劑膏於基板上轉印量少時,上述含有率以在 ㈣質量%之範圍較佳,更佳為⑽,質量%之範圍。分 配用途中,重視吐出流動性時,上述含有率以Μ〜89質量 %之範圍較佳,更佳為86〜88質量%之範圍。 助焊劑成份含有松香、溶劑、活性劑、及㈣劑較佳。 如上述之助焊劑成份適於金屬填料之表面處理。即,回法 熱處理時藉由除去焊劑膏中金屬填料成份之氧化膜,^ 再氧化,可促進金屬之熔融及導因於熱擴散之合金化。作 為助焊劑之成份,可使用眾所周知之材料。 &lt;連接構造體&gt; 々本發明亦提供-種連接構造體,其具有第i電子零件、 第2電子令件’及接合該第巧子零件與該第2電子零件之 :劑接合部’藉由將前述之本發明之無鉛焊劑進行回流埶 處理’形成該焊劑接合部。作為第!電子零件及第2電子零、 件之组合,可舉出基板電極與搭载零件電極之組合等。作 ^用以形成本發明之連接構造體之第1電子零件與第2電子 ::之接口方法’可舉出對基板電極塗布焊劑膏後載置以 搭載零件電極,再以回流熱處理進行接合之方法·對搭载 146300.cJ〇c •15· 201038349 =極:基板電極塗布以焊劑膏,藉由回流熱 重登搭載冬件電極與基板電極,並 熱處理進行接合之方 回流 万忐#上述情形中,可藉由電極„ ^ 焊劑接合連接該電極間。 巧之 回流熱處理之溫度在⑽〜赠之範圍較 —c之範圍。回流熱處理温度典型4:設定= 弟1金屬粒子之熔點且在第2金屬粒子之炼點以上。使用本 發明之無鉛焊劑,遠接雷 用本 電極時^ 搭載零件電極與基板 右被賦與於第2金屬粒子'熔點以上之熱經歷時, 則苐2金屬粒子熔融’第1金屬粒子及搭載零件電極與基板 電極接合。此時,第1金屬粒子與第2金屬粒子之金屬間, 熱擴散反應加速進行,合成比該第2金屬粒子之溶點為高 溶點之新的穩定合金相’形成第1金屬粒子及連接搭载交 件電極與基板電極之連接構造體。該新的穩定合金相之溶 點比包含Sn-3.0Ag_0.5Cu之無鉛焊劑之回流熱處理溫細 如26(TC左右)高,後續步驟令即使接受複數次熱處理焊劑 亦不熔d。根據本發明’可防止由於焊劑之再炼融所造成 之零件電極間產生之短路。 &lt;零件搭載基板&gt; 本^明亦提供一種具有基板與搭載於基板上之上述本發 明之連接構造體之零件搭載基板。 [實施例] 乂下根據貫把例具體說明本發明,但本發明不受此限 制。 146300.doc -16. 201038349 [實施例1] (1)第1金屬粒子之製造 將Cu 6.5 kg(純度99%質量以上)、Sn 1.5 kg(純度99%質 量以上)、Ag 1.0 kg(純度99%質量以上)、Bi 〇·5 kg(純度 99%質量以上)及in 0.5 kg(純度99%質量以上)(即目標組成 元素,Cu : 65質量%、Sn : 15質量%、Ag : 1〇質量%、The Sn-Bi-based alloy particles are typically composed of only % and m as constituent elements (although they may contain unavoidable impurities), but are used for the purpose of improving ductility, improving low melting point and mechanical strength, and may be added in a trace amount from Ag, One or more metals of Cu and bismuth. The reason why the average particle diameter of the first metal particles is the same as that of the first metal particles is that the average diameter of the second metal particles is preferably in the range of 5 to 40 μm from the viewpoint of the reactivity with the flux and the dryness of the solder paste. The average particle diameter of the i-th metal particles is more preferably in the range of 5 to 25 μη. [Mixing of First Metal Particles and Second Metal Particles] The metal filler of the present invention contains a mixture of the second metal particles and the second metal particles. In the metal filler of the mixture, the amount of the second metal particles (hereinafter also referred to as "the mixing ratio of the second metal particles") is in the range of 40 to 300 parts by mass based on the mass fraction of the second metal particles (10). When the mixing ratio of the second metal particles is 4 enamel: When the amount is more than or equal to the above, the ratio of the presence of the fragrant component in the reflow heat treatment in the metal filler is increased, so that the fusion bonding at a low temperature can be favorably performed, and the bonding is performed, for example, as a bismuth agent. It can be given a good physical strength. On the other hand, when the mixing ratio of the second metal particles exceeds 100 parts by mass, a more favorable two-strength strength can be obtained. On the other hand, when the mixing ratio of the second metal particles exceeds 3 Å by mass, the presence ratio of the high melting = stable alloy phase formed by the reaction between the molten second metal particles and the second metal particles is small, and thus heat resistance cannot be obtained. From the viewpoint of the physical strength and heat resistance of the second flux joint portion, the mixing ratio of the second metal particles 146300.doc 12 201038349 is preferably in the range of 100 to 300 f parts. The particle size distribution of the first metal particles and the second metal particles can be defined according to the use of the tangent paste. For example, in the screen printing application, it is preferable to widen the particle size distribution under the problem that the transfer amount of the solder paste on the substrate is small, and the liquidity and the hole burying property are emphasized in the distribution use and the through-hole filling application. Next, it is preferable to sharpen the particle size distribution. As described above, the average particle diameters of the first metal particles and the second metal particles are from 2 to 30, and 5, respectively, from the viewpoints of the compatibility with the flux and the characteristics of the solder paste. The range of 〜40 _ is preferably, and more preferably, the average particle diameter of the first metal particles and the second metal particles is in the range of 5 to 25 μη. As will be described later, the metal filler of the present invention can form a paste-like benefit (for example) by, for example, a combination with a flux. When the component is mounted by using the flux-free solder, there is a case where a portion of the bead joint portion formed by the reflow heat treatment, particularly the surface of the bead portion, is formed with a thin paste. If the average particle size of the metal filler is small, the fine particles of the metal filler in the soldering sword layer are easy to follow in a floating state (ie, the metal particles are in a state of being separated from each other), and the flux-bonded parts are supplied to the subsequent help. In the tangent washing step, the particles of the metal filler in the washing liquid flow out and adhere to the parts. When the first-order metal particles and the second metal particles have a thousand-grain control of 5 _, when the parts are mounted, in the flux layer, the metal (four) W will not be able to follow the 'suppressable generation of floating particles in the auxiliary layer'. It can reduce the amount of particles flowing out of the washing liquid. On the other hand, when the average particle diameter of the wide metal particles and the second metal particles is less than or equal to Μ (4), it is preferable that the dryness of the bismuth cream is not easily impaired. The melting point of the second metal particles is 80 to 10 (10). The range of C is better, and more preferably it is the range of I46300.doc 201038349 100~150 c. In a typical embodiment, the second metal particles are melted at a reflow heat treatment temperature when the agent of the present invention is used. Further, the elements of the first metal particles and the second metal particles specified in the present specification are composed. For example, it can be inductively combined with plasma (ICp) luminescence analysis. Further, the elemental composition of the particle profile can be analyzed by SE. EDX (characteristic X-ray analysis device). As a method of producing the first metal particles and the second metal particles, respectively, a well-known method can be employed as the U private method, but a rapid solidification method is preferred. Examples of the method for producing the fine powder by the rapid solidification method include a water spray method, a gas spray method, and a centrifugal spray method. Among them, the gas spray method and the centrifugal spray method are more preferable in terms of suppressing the content of the ruthenium of the particles. In the gas spray method, an inert gas such as nitrogen, argon or helium is usually used. It is preferable to use a helium gas having a light specific gravity in order to increase the linear velocity at the time of gas spray and to accelerate the cooling rate. The cooling rate is 5〇〇~50〇〇. The range of (: / sec is preferred. In the centrifugal spray method, from the viewpoint of forming a uniform molten film on the rotating disc, the material is preferably Sylon (SlA1 〇 N), and the rotation speed of the disc is 10,000 The range of ~120,000 rpm is preferred. &lt;Lead-free solder&gt; The present invention also provides a lead-free solder hl containing the above-mentioned metal filler of the present invention, which is referred to as "lead-free" in accordance with the EU environmental regulations. The lead-free solder of the present invention is preferably a solder paste containing a metal filler component and a flux component. The lead-free 146300.doc -14· 201038349 Ο 焊 flux of the present invention is further improved. Typically, it comprises a metal filler component and a flux component. The metal filler component may also comprise the above-mentioned metal filler of the present invention, but may contain a small amount of other metal filler in the range of 1 &amp; without the effect of the present invention. The content ratio is preferably in the range of 84 to 94% by mass in the flux paste_% by mass from the viewpoint of solder paste characteristics. The range in which the content ratio is better can be determined depending on the use of the solder paste. In the printing application, when the amount of transfer of the solder paste on the substrate is small, the content ratio is preferably in the range of (4)% by mass, more preferably in the range of (10) or % by mass. The content of the above is preferably in the range of Μ to 89% by mass, more preferably in the range of 86 to 88% by mass. The flux component preferably contains rosin, a solvent, an active agent, and a (iv) agent. The surface treatment of the metal filler, that is, by removing the oxide film of the metal filler component in the solder paste during the heat treatment, the re-oxidation promotes the melting of the metal and the alloying due to thermal diffusion. As a component of the flux, A well-known material can be used. <Connection structure> The present invention also provides a connection structure having an ith electronic component, a second electronic component, and a bonding of the second component and the second electronic component The agent bonding portion 'forms the flux bonding portion by performing the reflow treatment of the lead-free solder of the present invention described above. As a combination of the second electronic component and the second electronic component, the substrate is electrically In combination with the mounting of the component electrode, etc., the interface method for forming the first electronic component and the second electron to form the connection structure of the present invention is as follows: applying a solder paste to the substrate electrode and mounting the component electrode Then, the method of joining by reflow heat treatment is performed. 146300.cJ〇c •15· 201038349 = pole: The substrate electrode is coated with a solder paste, and the winter electrode and the substrate electrode are placed by reflow heat, and heat-treated to join. In the above case, the electrode can be connected by the electrode „ ^ solder joint. The temperature of the reflow heat treatment is in the range of (10) ~ the scope of the gift - c. The reflow heat treatment temperature is typical 4: setting = brother 1 The melting point of the metal particles is equal to or higher than the melting point of the second metal particles. When the lead-free solder of the present invention is used, when the electrode for the remote electrode is used, and when the electrode for mounting the component and the right side of the substrate are given a thermal history of the melting point of the second metal particle, the metal particles of the 苐2 are melted, and the first metal particle is mounted. The part electrode is bonded to the substrate electrode. At this time, the thermal diffusion reaction proceeds between the first metal particles and the metal of the second metal particles, and a new stable alloy phase having a higher melting point than the melting point of the second metal particles is synthesized to form the first metal particles and the connection. A connection structure of the delivery electrode and the substrate electrode is mounted. The melting point of the new stable alloy phase is higher than that of the lead-free solder containing Sn-3.0Ag_0.5Cu, which is as high as 26 (TC or so), and the subsequent step does not melt even if it is subjected to a plurality of heat treatment fluxes. According to the present invention, it is possible to prevent a short circuit generated between the electrodes of the parts due to remelting of the flux. &lt;Parts-mounted substrate&gt; The present invention also provides a component mounting substrate having a substrate and the above-described connection structure of the present invention mounted on the substrate. [Examples] The present invention is specifically described by way of examples, but the invention is not limited thereto. 146300.doc -16. 201038349 [Example 1] (1) Production of first metal particles Cu 6.5 kg (purity of 99% by mass or more), Sn of 1.5 kg (purity of 99% by mass or more), Ag of 1.0 kg (purity of 99) % by mass or more), Bi 〇·5 kg (purity of 99% by mass or more) and in 0.5 kg (purity of 99% by mass or more) (ie, target constituent element, Cu: 65 mass%, Sn: 15 mass%, Ag: 1〇) quality%,

Bi : 5質量%、及In : 5質量%),置入石墨坩堝,在99體積 °/〇以上之氦氛圍中,藉由高頻感應加熱裝置加熱至14〇〇。匸Bi: 5 mass%, and In: 5 mass%), graphite crucible was placed, and heated to 14 Torr by a high frequency induction heating device in an atmosphere of 99 vol / 〇 or more.匸

D 而熔解。接著,從坩堝前端將該熔融金屬導入氦氛圍之噴 霧槽内後,從設於坩堝前端附近之氣體噴嘴噴出氦氣(純 度99體積°/〇以上,氧濃度未達〇丨體積%,壓力2 5 MPa)進 行霧化,製造第1金屬粒子。此時之冷卻速度為260〇ec / 秒。 使用氣流式分級機(日清工程:TC-15N),將該第1金屬 粒子以20 μιη設定進行分級,回收大粒子部份後,再次以 〇 30 μπι設定進行分級回收小粒子部分。以雷射繞射式粒子 徑分佈測定裝置(HELOS&amp;RODOS)測定回收之合金粒子, 付知平均粒徑為151 μιη。以示差掃描熱量計(島津製作 所:DSC-50)在氮氛圍下,以升溫速度1(Γ(:/分之條件在 40〜580 C之範圍測定該第i金屬粒子,於5〇2。匸及521。〇下 檢測到吸熱峰,可由藉此顯示之複數個熔點,確認複數之 合金相之存在。另,於258t&amp;282t檢測到發熱峰,可確 認準穩定合金相之存在。將此處所得之第i金屬粒子在以 下記為第1金屬粒子A。 146300.doc -17· 201038349 同樣,將藉由霧化所得之第1金屬粒子以1〇 定進行 分級,回收大粒子部份後,再次以2〇 定進行分級, 回收小粒子部分。將所回收之合金粒子以雷射繞射式粒子 徑分佈測定裝置(HEL〇S&amp;RODOS)測定’得知其平均粒徑 為8.1 μϊη。將所得之第丨金屬粒子在以下稱為第丨金屬粒子 B。 同樣,將藉由霧化所得之第丨金屬粒子以16 μιη設定進 行分級,回收大粒子部份後,再次以1〇 μιη設定進行分 級,回收小粒子部分。將所回收之合金粒子以雷射繞射式 粒子徑分佈測定裝置(HELOS&amp;RODOS)測定,得知平均粒 徑為2·7 μηι。將所得之第丨金屬粒子在以下記為第丨金屬粒 子C 〇 同樣,將藉由霧化所得之第1金屬粒子以3〇 μηι設定進行 分級,回收大粒子部分。將所回收之合金粒子以雷射繞射 式粒子徑分佈測定裝置(HELOS&amp;RODOS)測定,得知其平 均粒徑為30.2 μηι。將所得之第i金屬粒子在以下稱為第i 金屬粒子D。 (2)第2金屬粒子之製造 第2金屬粒子係使用山石金屬(股份有限)公司製之粒度 25 μιη〜45 μιη之焊劑粉末Bi_42Sn(元素組成,出:58質量 〇/〇, Sn: 42質量%)(以下記為第2金屬粒子A),或山石金屬 (月又如有限)公司製之粒度1〇 pm〜25 μηι之谭劑粉末 42Sn(元素組成’ Bi : 58質量%,Sn : 42質量。/〇)(以下記為 第2金屬粒子B)。藉由差示掃描熱量計(島津製作所:dsc_ 146300.doc -18- 201038349 5〇)以與前述相同之測定條件測定之熔點,第2金屬粒子a 及第2金屬粒子B均為138。〇。再者,將第2金屬粒子a及第 2金屬粒子B以雷射繞射式粒子徑分佈測定裝置 (HELOS&amp;RODOS)測定,得知其平均粒徑分別$35 _及 20.4 μπι。 (3) 無鉛焊劑膏之製作 以質量比100 : 300混合上述第!金屬粒子八與第2金屬粒 〇 以’作為金屬填料成份。接著,混合金屬填料成份89.5 質量%與助焊劑(Α)10.5質量%,依次投入焊料軟化機 (MARUKOMU : SPS-1)、及脫泡捏和機(松尾產業:SNB_ 350)製作焊劑膏。 (4) 接合強度(剪切強度)之測定 將上述焊劑膏印刷塗布於尺寸25 mmx25 mm,厚度0.25 mm之Cu基板上,搭載尺寸2 mmx2 mm,厚度〇 5 之&amp; 晶片後,在氮氛圍下以峰值溫度16〇t進行回流熱處理製 〇 作樣本。熱處理裝置係使用回流模擬器(MARUKOMU : SRS-1C)。溫度分佈係採用以15t/秒從熱處理開始(常溫) 升溫至120C ,從120°C經過10秒漸漸升溫至135。^^^,以 2-〇°c/秒升溫,並在峰值溫度}^^保持15秒之條件。印刷 圖案形成係使用絲網印刷機(Micr〇tek : MT-320TV)。印刷 罩為金屬製’並且塗刷器為胺基甲酸酯製。罩開口尺寸為 2 mmx3.5 mm,厚度為〇·ΐ mm。印刷條件為速度5〇 mm/ 秒,印壓0.1 MPA,塗刷器壓〇·2 MPa,背壓〇·ΐ Mpa ,侵 襲角度20。,間距〇 mm,印刷次數為j次。 146300.doc •19· 201038349 接著,在常溫(25t)下,將上述製作之樣本之剪切方向 :晶片:妾合強度藉由負荷測定器,以按壓速度1〇 分測 疋’換异成每單位面積之值’為15·4峨。再者,將上述 製作之樣本在加熱板上加熱至2阶,保持3分鐘後,以與 亡述相同之方法測U切方向之晶片接合強度換算成每 單位面積之值,為G 35 MPa。藉此,可確認該樣本具有即 使26(TC加熱時亦可保持接合強度之耐熱性。再者,、可保 持接合強度,係指顯示〇.2〇 MPa以上之接合強度。 ” [實施例2〜10,比較例1及2] 使用第1金屬粒子A與第2金屬粒子A之混合比改變之金 屬填料成份,以與實施例i相同之方法製作焊劑膏,盘實 施例1相同地測定晶片接合強度,將結果顯示於表!之實施 例2〜5、以及比較例!。另,分別使用與實施例卜5相同混 合比之金屬填料成份’將㈣片接合時之溫度分佈係採用 以i.5°c/秒從熱處理開始(常溫)升溫至12(rc,從12〇它經 過110秒漸漸升溫至135°c後’以2.0。(:/秒升溫,並在峰值 溫度18(TC保持15秒之條件,結果亦顯示於表〗之實施例 6〜10及比較例2中。由表〖之比較例丨及2之結果明顯可知, 不含第1金屬粒子時,若加熱於26(rc則焊劑接合部(連接 部)熔融,因此剪切強度為〇 MPa。另一方面可知,含有第 1金屬粒子之實施例1〜10中,即使a26(rc加熱時,接合強 度亦在0.2 MPa以上,焊劑不會再熔融。再者,本說明書 中’所謂焊劑不會再熔融,係指接合強度在〇 2〇 Mpa以 上。 146300.doc 20· 201038349 [比較例3] 使用先前之代表性無鉛焊劑(Sn-3.0Ag-0.5Cu)膏,以與 實施例1(4)相同之方法進行〜晶片之接合強度之測定。結 果顯示於表1。惟’使用該焊劑材料接合Cu薄片時之回流 溫度分佈’係採用以!.5口秒從熱處理開始(常溫)升溫至 140 C再從140 C經過11〇秒漸漸升溫至17(rc後,以 2.0C/私從170C升溫至250°C,並在峰值溫度25〇。(:保持15 私之條件由比較例3之結果可知,使用代表性之無錯焊 劑s Ag 〇’5€11時’ 260°C加熱時焊劑接合部、溶融,接合 強度為0 MPa。 [實施例11〜20]D is melted. Next, the molten metal is introduced into the spray chamber of the helium atmosphere from the tip end of the crucible, and then helium gas is discharged from a gas nozzle provided near the tip end of the crucible (purity of 99 volume/min or more, oxygen concentration of less than 〇丨 volume%, pressure 2 5 MPa) was atomized to produce the first metal particles. The cooling rate at this time is 260 〇ec / sec. The first metal particles were classified by a flow rate classifier (Nissin Project: TC-15N), and the large particle fraction was collected, and then the small particle fraction was fractionally collected by setting 〇 30 μm. The recovered alloy particles were measured by a laser diffraction particle diameter distribution measuring apparatus (HELOS &amp; RODOS), and the average particle diameter was 151 μηη. The i-th metal particles were measured by a differential scanning calorimeter (Shimadzu Corporation: DSC-50) under a nitrogen atmosphere at a temperature increase rate of 1 (Γ(:/min) in the range of 40 to 580 C, at 5〇2. And 521. The endothermic peak was detected under the armpit, and the plurality of melting points indicated thereby confirmed the existence of the complex alloy phase. Further, the exothermic peak was detected at 258t &amp; 282t, and the existence of the quasi-stable alloy phase was confirmed. The obtained i-th metal particles are hereinafter referred to as the first metal particles A. 146300.doc -17· 201038349 Similarly, the first metal particles obtained by atomization are classified by one measurement, and after the large particle fraction is recovered, The fraction was further classified by 2 Torr, and the small particle fraction was recovered. The recovered alloy particles were measured by a laser diffraction particle diameter distribution measuring device (HEL〇S &amp; RODOS) to obtain an average particle diameter of 8.1 μϊη. The obtained ruthenium metal particles are hereinafter referred to as ruthenium metal particles B. Similarly, the ruthenium metal particles obtained by atomization are classified by setting at 16 μm, and the large particle fraction is recovered, and then set again at 1 μm. Grading, recycling small particles The collected alloy particles were measured by a laser diffraction particle diameter distribution measuring device (HELOS &amp; RODOS), and the average particle diameter was 2·7 μηι. The obtained third metal particles were recorded as follows. In the same manner, the first metal particles obtained by atomization are classified by a setting of 3 μm to collect a large particle portion, and the collected alloy particles are subjected to a laser diffraction particle diameter distribution measuring device (HELOS &amp;; RODOS) measurement, the average particle size is 30.2 μηι. The obtained i-th metal particles are hereinafter referred to as i-th metal particles D. (2) Production of second metal particles The second metal particles are made of mountain metal ( Co., Ltd. has a particle size of 25 μιη to 45 μιη of the flux powder Bi_42Sn (element composition: 58 mass/〇, Sn: 42 mass%) (hereinafter referred to as second metal particle A), or mountain metal (month) Further, the company has a particle size of 1 〇 pm to 25 μηι of a tantalum powder 42Sn (element composition 'Bi: 58% by mass, Sn: 42 mass%./〇) (hereinafter referred to as a second metal particle B). Differential scanning calorimeter (Shimadzu Corporation) Dsc_ 146300.doc -18- 201038349 5〇) The melting point measured by the same measurement conditions as described above, the second metal particles a and the second metal particles B are both 138. Further, the second metal particles a and 2 The metal particles B were measured by a laser diffraction particle diameter distribution measuring device (HELOS &amp; RODOS), and the average particle diameter was found to be $35 _ and 20.4 μπι, respectively. (3) The production of the lead-free solder paste was mixed at a mass ratio of 100:300. Above! The metal particles VIII and the second metal particles ’ are used as a metal filler component. Next, a metal filler component of 89.5 mass% and a flux (Α) of 10.5% by mass were mixed, and a solder paste was prepared by sequentially applying a solder softening machine (MARUKOMU: SPS-1) and a defoaming kneader (Songo Industry: SNB_350). (4) Measurement of joint strength (shear strength) The above-mentioned solder paste was printed and applied on a Cu substrate having a size of 25 mm × 25 mm and a thickness of 0.25 mm, and a wafer having a size of 2 mm × 2 mm and a thickness of 〇 5 was placed in a nitrogen atmosphere. The sample was subjected to reflow heat treatment at a peak temperature of 16 〇t. The heat treatment apparatus used a reflux simulator (MARUKOMU: SRS-1C). The temperature distribution was ramped from 120 °/sec from the beginning of the heat treatment (normal temperature) to 120 C, and gradually increased from 120 ° C to 10 ° for 10 seconds. ^^^, the temperature is raised by 2-〇°c/sec, and the condition is maintained at the peak temperature}^^ for 15 seconds. The printing pattern was formed using a screen printer (Micr〇tek: MT-320TV). The printing cover is made of metal and the applicator is made of urethane. The cover opening size is 2 mm x 3.5 mm and the thickness is 〇·ΐ mm. The printing conditions were a speed of 5 〇 mm/sec, a press of 0.1 MPA, a squeegee pressure of 2 MPa, a back pressure of 〇·ΐ Mpa, and an attack angle of 20. , the spacing is 〇 mm, the number of printing is j times. 146300.doc •19· 201038349 Next, at normal temperature (25t), the shear direction of the sample prepared above: wafer: the strength of the bond is measured by the load measuring device at a pressing speed of 1 疋. The value per unit area is '1·4峨. Further, the sample prepared above was heated to a second order on a hot plate, and after holding for 3 minutes, the wafer bonding strength in the U-cut direction was measured to be a value per unit area in the same manner as described above, and was G 35 MPa. In this way, it was confirmed that the sample had a heat resistance of 26 (the TC can maintain the bonding strength while being heated. Further, the bonding strength can be maintained, which means that the bonding strength is not less than 2 MPa.) [Example 2 ~10, Comparative Examples 1 and 2] A solder paste was prepared in the same manner as in Example i using the metal filler component in which the mixing ratio of the first metal particles A and the second metal particles A was changed, and the wafer was measured in the same manner as in Example 1. The bonding strength is shown in Tables 2 to 5 and Comparative Example!. In addition, the metal filler composition of the same mixing ratio as in Example 5 is used, respectively, and the temperature distribution when the (four) sheet is joined is employed. .5 ° c / sec from the beginning of heat treatment (normal temperature) to 12 (rc, from 12 〇 after 110 seconds gradually warmed to 135 ° c after '2.0. (: / sec temperature, and at the peak temperature of 18 (TC hold The results of 15 seconds were also shown in Examples 6 to 10 and Comparative Example 2 of the Table. It is apparent from the results of Comparative Examples 2 and 2 of the table that when the first metal particles are not contained, the temperature is heated at 26 ( Rc, the flux joint (joining portion) is melted, so the shear strength is 〇MP On the other hand, in Examples 1 to 10 containing the first metal particles, even if a26 (the rc is heated, the bonding strength is 0.2 MPa or more, the flux is not remelted. Further, in the present specification, the so-called flux No further melting means that the joint strength is above 〇2〇Mpa. 146300.doc 20· 201038349 [Comparative Example 3] Using the previous representative lead-free solder (Sn-3.0Ag-0.5Cu) paste, and Example 1 (4) The same method was used to measure the bonding strength of the wafer. The results are shown in Table 1. The 'reflow temperature distribution when the Cu material was bonded using the flux material' was started from the heat treatment at room temperature of (.5 seconds) (normal temperature). The temperature is raised to 140 C and then gradually warmed from 140 C to 11 〇 to 17 (rc, then heated to 170 ° C from 170 C / privately at 170 ° C, and at a peak temperature of 25 〇. (: Maintain 15 private conditions by comparison As a result of 3, it was found that the representative flux-free solder s Ag 〇 '5 € 11 'when the solder joint was heated at 260 ° C, the joint strength was 0 MPa. [Examples 11 to 20]

使用第1金屬粒子B與第2金屬粒子B之混合比改變之金 屬填料成份’以與實施例1相同之方法製作焊劑膏,進而 以藏或⑽。C之峰值温度進行回流熱處理(與實施例 1〜1〇相同)’同樣地測定接合強度。將結果顯示於表2之實 施例U〜2〇。根據表2可知,含有第!金屬粒子B之實施例 11〜20中,顯不·。c加熱時亦為〇 2〇购以上之接合強 度,顯示保持接合狀態之耐熱性。 [實施例21] 於包含高耐熱環氧樹脂破璃布之印刷基板之〜基板上, 印刷f布㈣施例2製作之無錯焊劑,搭載_3尺寸積層 陶竞晶片電谷器(以下欢先 為0603C,或單稱搭载零件)後, 4例1㈣之條件進㈣流熱處理,製作樣本。 接著將上述衣作之#本於加熱板上以⑼t加熱,μ 146300.doc -21 - 201038349 部填充物不覆蓋搭載零件上部之方式塗布底部填充物以 電爐以165°C硬化2小時。接著,將透明模製樹脂塗布於搭 載零件之上部及周圍’以電爐1 50°C硬化4小時。 接著以60°C、60%RH吸濕40小時後,在氮氛圍下進行峰 值溫度260°C之回流熱處理。熱處理裝置係使用回流模擬 器(MARUKOMU: SRS-1C)。溫度分佈係採用以irc/秒從 熱處理開始(常溫)升溫至15(TC,從15〇。〇經過1〇〇秒漸漸升 溫至2HTC後,再以2.(TC/秒從21(rc升溫至26〇&lt;t,並在峰 值溫度260°C保持15秒之條件。接著,因回流熱處理焊劑 熔融,以目視觀察零件電極間是否短路。結果顯示於表 3。可確認的是,實施例21中,觀察不到零件電極間之短 路,顯示2 6 0 C下焊劑材亦不流動之耐熱性。 [比較例4] 以與實施例21相同之方法,進料前之代表性無錯焊劑 Sn-3.0Ag-0.5Cu之評估。惟,只有搭载〇6〇3(:時之溫度分 佈不同,而採用以1.5°C /秒從熱處理開始(常溫)升溫至 140C,從140C經過1〇〇秒漸漸升溫至17(Γ(:後再以 2.(TC/秒從2HTC升溫至25〇t,並在峰值溫度25(^保持Η 秒之條件。結果顯示於表3。 ' 由表3之結果清晰可知,比較例4中,焊劑以非常高之機 率溶融,而於零件電極間產生短路。丨_方面,實施仙 中,雖然第2金屬粒子之熔點在138t:,但亦不產生零件電 極間之短路。由以上結果可知,使用本發明之金屬填料: 無錯焊劑’可進行低溫下之零件接合,即使之後回流,焊 146300.doc 22· 201038349 劑亦不會熔融而流出,係耐熱性優良之材料。 [實施例22] 以質量比丨00·· 186混合第丨金屬粒子A與第2金屬離子 A ’作為金屬填料之成份。接㈣合金屬填料成㈣ .%、與助焊劑(聊質量%,以與實施例!相同之步驟製作 焊劑膏。對包含高耐熱環氧樹脂玻璃布之印刷基板之^電 極上印刷塗布焊劑膏,並搭載聽尺寸電阻晶片(以下稱 〇 41GG5R,或亦單稱之為搭載零件)後,於氮氛圍下以導值 溫度160°c之條件進行回流熱處理,製作樣本。將所得之 樣本以環氧樹脂包埋,進而藉由剖面研磨而觀察搭載零件 接合剖面’計算搭載零件接合部之焊劑上層所存在之助焊 劑層中以浮游狀態(即金屬粒子相互分離之狀態)存在之全 屬粒子(浮游粒子)之數量。結果顯示於表4。再者,表*所 示之浮游粒子之數量,係將計算祕尺之6處接合部之浮游 粒子之值作為平均值者。 ❹ [實施例23〜24] 取代實施例22之第1金屬粒子A,使用第!金屬粒子以 第1金屬粒子C,進行相同評估。結果顯示於表4。由圖4之 結果清晰可知,使用平均粒徑27叫之第Μ屬粒子c時, 觀察到在接合部之焊劑上層之助焊劑層中之較多浮游粒 子另方面,使用平均粒徑8. j μηι之第i金屬粒子Β,或 平均粒徑15_1㈣之第丨金屬粒子A時,可知產生於助焊劑 層中之浮游粒子較少。如此,與使用之金屬粒子之平均粒 裣](例如2.7 μιη)之情形相比,可知該平均粒徑例如為$ ^ 146300.doc -23- 201038349 叩及山μη^,能得到於助焊刺層中不易產生浮游 之優點。 [實施例25〜27] 以質量比1〇〇: 186混合第1金屬粒子Α與第2金屬粒子 B,作為金屬填料成份。接著混合金屬填料成份89 5質量 %、及助焊劑⑽0.5質量% ’以與實施例…同之步驟製作 焊劑貧。將所得之焊劑膏印刷塗布於氧化紹基板上,使用 黏著力試驗機(MARUKOMU公司製)τκ-1測定粘著力。結 果顯示於表5之實施例25。#著力測定5點,其平均值係 *於表5中。另,取代第丨金屬粒子八使用第1金屬粒子β或 第1金屬粒子D,以與實施例!相同之步驟製作焊劑膏,同 樣測疋粘著力。結果分別顯示於表5之實施例%及η。藉 此可知,所使用之金屬粒子之平均粒徑與如金屬粒子附 均粒徑:30.2 μπι)般之較大之情形相比,該平均粒徑例如 為8.1 μ1η&amp;15.1 μιη時,可獲得作為顯示高粘著力值之焊劑 膏的粘著力強之優點。 [實施例28及29] 以貝1比100 · 186混合第i金屬粒子Α與第2金屬粒子 Β,作為金屬填料成份。接著混合金屬填料成份9〇質量 %、及助焊劑(B)l〇質量%,以與實施例i相同之步驟製作 焊劑膏。使用所得之焊劑膏,與實施例1(4)相同,於氮氛 圍下,以峰值溫度16(rc進行回流熱處理,製作Cu晶片接 。基板,測定常溫及260。(:加熱時之接合強度。結果顯示 於表6之實施例28。 1463〇〇.d〇c -24- 201038349 另,以質量比100 : 186混合第1金屬粒子A與第2金屬粒 子B,作為金屬填料成份。接著混合金屬填料成份89.5質 量%、及助焊劑(B)l 0.5質量%,以與實施例1相同之步驟製 作焊劑,與實施例1(4)相同,於氮氛圍下,以峰值溫度 160°C進行回流熱處理,製作Cu晶片接合基板,測定常溫 及260°C加熱時之接合強度。結果係顯示於表6之實施例29 中。,A solder paste was prepared by the same method as in Example 1 using a metal filler component in which the mixing ratio of the first metal particles B and the second metal particles B was changed, and further, or (10). The peak temperature of C was subjected to a reflow heat treatment (same as in Examples 1 to 1). The joint strength was measured in the same manner. The results are shown in the examples U to 2 of Table 2. According to Table 2, in Examples 11 to 20 containing the ?! metal particles B, it was revealed. c When heating, it is also the joint strength of 〇 2, and the heat resistance of the bonded state is shown. [Example 21] On a substrate including a high heat-resistant epoxy ray-breaking cloth, a f-cloth (four) non-error solder prepared in the second embodiment was mounted, and a _3-sized laminated ceramic tile electric grid was mounted. After the first 0603C, or the single-loaded parts), 4 cases of 1 (four) conditions into the (four) flow heat treatment, making samples. Next, the above-mentioned clothes were applied to the hot plate to be heated by (9) t, and the μ 146300.doc -21 - 201038349 portion of the filler was applied to the upper portion of the mounting member, and the underfill was applied and hardened at 165 ° C for 2 hours in an electric furnace. Next, the transparent molding resin was applied to the upper portion and the periphery of the mounting member to be hardened at 50 ° C for 4 hours in an electric furnace. Subsequently, after absorbing at 60 ° C and 60% RH for 40 hours, a reflow heat treatment at a peak temperature of 260 ° C was carried out under a nitrogen atmosphere. The heat treatment apparatus used a reflux simulator (MARUKOMU: SRS-1C). The temperature distribution is ramped from heat treatment (normal temperature) to 15 (TC, from 15 〇 in irc / sec. 渐 gradually warms up to 2 HTC after 1 〇〇 second, then rises from 21 (rc / sec from 21 (rc / sec) 26 〇 &lt;t, and kept at a peak temperature of 260 ° C for 15 seconds. Then, the flux was melted by reflow treatment, and the short between the electrode electrodes was visually observed. The results are shown in Table 3. As a result, Example 21 was confirmed. In the middle, the short circuit between the electrode of the part was not observed, and the heat resistance of the flux material at 2 60 C was not observed. [Comparative Example 4] In the same manner as in Example 21, the representative error-free flux Sn before the feeding was performed. Evaluation of -3.0Ag-0.5Cu. However, only when 〇6〇3 is mounted (: when the temperature distribution is different, the temperature is raised from 140C/sec from the heat treatment (normal temperature) to 140C, and 140C is passed for 1 second. Gradually warm up to 17 (Γ (: after 2 TC / sec from 2HTC to 25 〇 t, and at the peak temperature of 25 (^ hold Η seconds conditions. The results are shown in Table 3. ' From the results of Table 3 It is clear that in Comparative Example 4, the flux is melted at a very high probability, and a short circuit occurs between the electrode of the part. In Shi Xianzhong, although the melting point of the second metal particles is 138t:, the short circuit between the component electrodes does not occur. From the above results, it can be seen that the metal filler of the present invention: the non-scratch flux can be used for joining parts at low temperatures, even if After that, it is reflowed, and the 146300.doc 22·201038349 agent is not melted and flows out, and is a material excellent in heat resistance. [Example 22] The second metal ion A and the second metal ion A are mixed at a mass ratio of 丨00··186. 'As a metal filler component. Connected to (4) metal filler into (4).%, with flux (% of the quality, in the same steps as the embodiment!) to make solder paste. For printed substrates containing high heat-resistant epoxy glass cloth ^The electrode paste is coated with a solder paste, and a resistive resistor chip (hereinafter referred to as 〇41GG5R, or simply a mounted component) is mounted, and then subjected to reflow heat treatment under a nitrogen atmosphere at a pilot temperature of 160 ° C to prepare a sample. The obtained sample was embedded in epoxy resin, and the cross-section polishing was performed to observe the joint part of the mounted part'. The flux layer existing in the upper layer of the solder of the joint part of the mounting part was calculated. The number of floating particles (ie, the state in which the metal particles are separated from each other) is the total number of particles (floating particles). The results are shown in Table 4. Furthermore, the number of floating particles shown in Table * is calculated as 6 points of the ruler. The value of the floating particles in the joint portion is the average value. [Examples 23 to 24] The first metal particles A of Example 22 were used instead of the first metal particles C, and the first metal particles C were used for the same evaluation. Table 4. As is clear from the results of Fig. 4, when the average particle size 27 is called the third particle c, more floating particles in the flux layer of the upper layer of the solder at the joint portion are observed, and the average particle diameter is used. 8. When the i-th metal particles j of j μηι or the second metal particles A of the average particle diameter of 15_1 (d), it is understood that the number of floating particles generated in the flux layer is small. Thus, compared with the case of the average particle size of the metal particles used (for example, 2.7 μm), it is known that the average particle diameter is, for example, $^ 146300.doc -23-201038349 叩 and mountain μη^, which can be obtained from the burr The advantage of floating in the layer is not easy to occur. [Examples 25 to 27] The first metal particles Α and the second metal particles B were mixed at a mass ratio of 1 〇〇: 186 as a metal filler component. Next, the metal filler component 89 5 mass% and the flux (10) 0.5 mass% were mixed to prepare a flux lean in the same manner as in the example. The obtained solder paste was printed and applied on a oxidized substrate, and the adhesion was measured using an adhesion tester (manufactured by MARUKOMU Co., Ltd.) τκ-1. The results are shown in Example 25 of Table 5. # efforts to measure 5 points, the average of which is * in Table 5. Further, in place of the second metal particles, the first metal particles β or the first metal particles D were used, and a solder paste was prepared in the same manner as in Example!, and the adhesion was measured in the same manner. The results are shown in Examples % and η of Table 5, respectively. From this, it can be seen that the average particle diameter of the metal particles used is as large as the case where the average particle diameter of the metal particles is 30.2 μm, and the average particle diameter is, for example, 8.1 μl η &amp; 15.1 μηη. The advantage of the adhesion of the solder paste showing a high adhesion value. [Examples 28 and 29] The i-th metal particles 第 and the second metal particles 混合 were mixed as a metal filler component in a ratio of 1 to 100 · 186. Next, a metal paste composition of 9 〇% by mass and a flux (B) 〇% by mass were mixed, and a solder paste was prepared in the same manner as in Example i. Using the obtained solder paste, in the same manner as in Example 1 (4), a reflow heat treatment was performed at a peak temperature of 16 (rc) in a nitrogen atmosphere to prepare a Cu wafer, and the substrate was measured at room temperature and 260. (: Bonding strength at the time of heating. The results are shown in Example 28 of Table 6. 1463 〇〇.d〇c -24- 201038349 Further, the first metal particles A and the second metal particles B were mixed at a mass ratio of 100:186 as a metal filler component. A flux was prepared in the same manner as in Example 1 except that the filler component was 89.5% by mass and the flux (B) was 0.5% by mass. In the same manner as in Example 1 (4), the mixture was refluxed at a peak temperature of 160 ° C under a nitrogen atmosphere. The Cu wafer bonded substrate was prepared by heat treatment, and the joint strength at room temperature and heating at 260 ° C was measured. The results are shown in Example 29 of Table 6.

[比較例5及6] 以質量比100 : 186混合Cu粉(福田金屬箔粉工業社製, Cu-HWQ平均粒徑15 μπι)與第2金屬粒子A,作為金屬填 料成份。接著混合金屬填料成份90質量%、及助焊劑(B)1〇 質量%,以與實施例1相同之步驟製作焊劑膏,與實施例 U4)相同,使用所得之膏,於氮氛圍下,以峰值溫度i6〇〇c 進行回流熱處理,製作Cu晶片接合基板,測定常溫及 260°C加熱時之接合強度。結果顯示於表6之比較例5中。 另,以質量比100 : 186混合Cu粉(福田金屬箔粉工業社 衣Cu HWQ 1 5 μηι)與第2金屬粒子B,作為金屬填料成 份。接著混合金屬填料成份89.5質量%、及助焊劑(β)ι〇 5 質量%,以與實施例i相同之步驟製作焊劑膏。與實施例 1(4)相同,使用所得之膏,於氮氛圍下,以峰值溫度16代 進行回流熱處理,製作Cu晶片接合基板,敎常溫及 260。。加熱時之接合強度。結果係顯示於表6之比較例6 比較表6之實施例28與比較例5或實施例29與比較· 146300.doc -25- 201038349 與第2金屬之Bi-42Sn及Cu粉之組合,可知使用第2金屬之 Bi-42Sn與第1金屬粒子A之組合,在常溫下之接合強度明 顯優良。 [比較例7及8] 為與本發明人等之先洳技術(日本特開2008-183 582號公 報)比較而進行以下評估。 第3金屬粒子之製造 將Ag粒子1.0kg(純度99%質量以上)、Bi粒子2 〇 kg(純度 99%質量以上)、Cu粒子1.5 kg(純度99%質量以上)、In粒子 2_0 kg(純度99%質量以上)、Sn粒子3.5 kg(純度99°/。質量以 上)(即目標組成元素,Ag : 1 〇質量%、Bi : 2〇質量%、 Cu . 15質量%、In : 20質量%、及Sn : 35質量%)置入石墨 坩堝,在99體積。/。以上之氦氛圍下,藉由高頻感應加熱裝 置加熱至MOOt而熔解。接著,從坩堝前端將該熔融金屬 導入氦氛圍之喷霧槽内後,從設於坩堝前端附近之氣體喷 嘴噴出氦氣(純度99體積%以上,氧濃度未達〇1體積%,壓 力2.5 MPa)進行霧化,製作第3金屬粒子。此時之冷卻速 度為260(TC/秒。將所得之第3金屬粒子以掃描型電子顯微 鏡(日立製作所(股份有限公司)製:s_27〇〇)觀察,發現其 為球狀。將該金屬粒子使用氣流式分級機(日清工程(股)製 TCM5N)以5 μηΐ設定進行分級,回收大粒子部份後,再次 以15 μιη設定進行分級,回收小粒子部分。以雷射繞射式 粒子徑分佈敎I置(HEL〇s&amp;R〇D〇s)測定所回收之第3 金屬粒子,得知平均徑為55 μιη。將如此得到之第3金屬 146300.doc •26· 201038349 ’確認存 之低熔點 粒子作為試料,進行差示掃描熱量測定。其結果 在66°C、87t及38(TC之吸熱峰,在“七及打七 區域具有複數個熔點。 接著,以質量比100: 186混合第丨金屬粒子A與第3金屬 粒子B,作為金屬填料成份。接著混合金屬填料成份88.4 質、及助焊劑则1.6質量%,以與實施例i相同之步驟 製作焊劑膏。與實施例i⑷相同,使用所得之膏,於氣氛[Comparative Examples 5 and 6] Cu powder (manufactured by Futian Metal Foil Powder Co., Ltd., Cu-HWQ average particle diameter: 15 μm) and second metal particles A were mixed as a metal filler component at a mass ratio of 100:186. Then, 90% by mass of the metal filler component and 1% by mass of the flux (B) were mixed, and a solder paste was prepared in the same manner as in Example 1, and the obtained paste was used under a nitrogen atmosphere in the same manner as in Example U4). The peak temperature i6〇〇c was subjected to reflow heat treatment to prepare a Cu wafer bonded substrate, and the joint strength at normal temperature and heating at 260 ° C was measured. The results are shown in Comparative Example 5 of Table 6. Further, Cu powder (Fu Hig Metal Foil Industrial Co., Ltd. Cu HWQ 1 5 μηι) and second metal particles B were mixed at a mass ratio of 100:186 to form a metal filler component. Next, a metal paste component of 89.5 mass% and a flux (β) 〇 5 mass% were mixed, and a solder paste was prepared in the same manner as in the example i. In the same manner as in Example 1 (4), the obtained paste was subjected to reflow heat treatment at a peak temperature of 16 lapses in a nitrogen atmosphere to prepare a Cu wafer bonded substrate, and the temperature was 260 at room temperature. . Bonding strength when heated. The results are shown in Comparative Example 6 of Table 6. The combination of Example 28 and Comparative Example 5 or Example 29 of Table 6 and Comparative 146300.doc -25-201038349 and Bi-42Sn and Cu powder of the second metal are known. When the combination of Bi-42Sn and the first metal particles A of the second metal is used, the joint strength at room temperature is remarkably excellent. [Comparative Examples 7 and 8] The following evaluations were carried out in comparison with the prior art of the present inventors (JP-A-2008-183 582). Production of the third metal particles: 1.0 kg of Ag particles (purity of 99% by mass or more), 2 particles of Bi particles (purity of 99% by mass or more), 1.5 kg of Cu particles (purity of 99% by mass or more), and 20.0 kg of In particles (purity) 99% by mass or more), Sn particles of 3.5 kg (purity of 99°/mass or more) (ie, target constituent elements, Ag: 1 〇 mass%, Bi: 2 〇 mass%, Cu. 15 mass%, In: 20 mass%) And Sn: 35 mass%) placed in graphite crucible at 99 volumes. /. In the above atmosphere, it is melted by heating to MOOt by a high frequency induction heating device. Next, the molten metal is introduced into the spray chamber of the helium atmosphere from the tip end of the crucible, and then helium gas is discharged from a gas nozzle provided near the tip end of the crucible (purity of 99% by volume or more, oxygen concentration of less than 1% by volume, and pressure of 2.5 MPa). The atomization is performed to produce the third metal particles. The cooling rate at this time was 260 (TC/sec.) The obtained third metal particles were observed by a scanning electron microscope (manufactured by Hitachi, Ltd.: s_27〇〇), and were found to be spherical. The airflow classifier (TCM5N manufactured by Nissin Engineering Co., Ltd.) was classified at a setting of 5 μηΐ, and the large particle fraction was recovered, and then classified again at a setting of 15 μm to recover a small particle fraction. The laser diffraction particle diameter was recovered. The third metal particles recovered were measured by the distribution of 敎I (HEL〇s &amp; R〇D〇s), and the average diameter was found to be 55 μηη. The third metal thus obtained was 146300.doc •26· 201038349 'Confirmed The low-melting-point particles were used as a sample, and differential scanning calorimetry was performed. The results were at 66 ° C, 87 t, and 38 (the endothermic peak of TC, which had a plurality of melting points in the "seven and seven regions". Next, the mass ratio was 100: 186. The second metal particles A and the third metal particles B were used as the metal filler component, and then the metal filler component 88.4 and the flux were 1.6% by mass, and a solder paste was prepared in the same manner as in Example i. The same as in the example i (4). Use the resulting cream in the atmosphere

圍下,以峰值溫度16〇t進行回流熱處理,製作Cu晶片^ 合基板,測定常溫及260t加熱時之接合強度。結果顯示 於表7之比較例7中。 ,另,以夤量比100 . 186混合cu粉(福田金屬箔粉工業社 製,CU-HWQ 15 μιη)與第3金屬粒子,作為金屬填料成 份。接著混合金屬填料成份88 7質量%及助焊劑(Β)ιι.3質 量%,以與實關1相同之㈣製作㈣^與實施例ι(4) 相同’於氮氛圍下,以峰值溫度⑽。c進行回流熱處理, 製作Cu晶片接合基板,測定常溫及26〇(&gt;c加熱時之接合強 度。結果顯示於表7之比較例8中。 根據實施例28、29及比較例7,相對第i金屬粒子,取代 第2金屬粒子使用混合有第3金屬粒子之金屬填料時,可知 ¥服下之接合強度較低之結果。另,將比較例7及比較例8 比較可知,接合強度均顯示較低之值,兩者大致在同等之 接合強度。即,使用第3金屬粒子時,確認與第丨金屬粒子 A之組合以及與Cu粉之組合均顯示低接合強度。 146300.doc •27- 201038349 [表i] 回流熱處理 峰值溫度 金屬填料組成(質量比) 接合強度(MPa) 第1金屬粒子A 第2金屬粒子A 常溫 260〇C 實施例1 160°C 100 300 15.4 0.35 實施例2 160。。 100 186 12.4 0.72 實施例3 160。。 100 122 10.2 0.97 實施例4 160°C 100 82 3.4 0.78 實施例5 160°C 100 54 2.4 0.48 實施例6 180°C 100 300 15.9 0.34 實施例7 180°C 100 186 13.2 1.1 實施例8 180°C 100 122 9.8 1.7 實施例9 180°C 100 82 7.7 1.1 實施例10 180°C 100 54 3.4 0.8 比較例1 160°C 0 100 38.2 0 比較例2 180。。 0 100 44.3 0 比較例3 250°C Sn-3.0Ag-0.5Cu 26.4 0 [表2] 回流熱處理 峰值溫度 金屬填料組成(質量比) 接合強度(MPa) 第1金屬粒子B 第2金屬粒子B 常溫 260〇C 實施例11 160°C 100 300 14 0.5 實施例12 160°C 100 186 12.4 0.9 實施例13 160°C 100 122 6.7 1.2 實施例14 160°C 100 82 3.0 0.9 實施例15 160°C 100 54 2.8 1.1 實施例16 180°C 100 300 17.1 0.7 146300.doc -28- 201038349 實施例17 180°C 100 186 14.9 1.0 實施例18 180°C 100 122 7.4 0.9 實施例19 180°C 100 82 4.8 1.0 實施例20 180°C 100 54 4.5 1.3 [表3] 零件電極間短路之發生 發生數/全數 發生率 實施例21 0/45 0% 比較例4 17/83 20.5%The reflow heat treatment was carried out at a peak temperature of 16 〇t to prepare a Cu wafer substrate, and the joint strength at normal temperature and 260 t heating was measured. The results are shown in Comparative Example 7 of Table 7. Further, a cu powder (CU-HWQ 15 μmη, manufactured by Fukuda Metal Foil Co., Ltd.) and a third metal particle were mixed as a metal filler in an amount of 100 to 186. Then, the metal filler component 88 7 mass% and the flux (Β) ιι. 3 mass% were mixed, and the same (4) was produced as in the case of the real thing (4), which was the same as the example ι (4), under a nitrogen atmosphere, at a peak temperature (10). . c, a reflow heat treatment was performed to prepare a Cu wafer bonded substrate, and the bonding strength at room temperature and 26 〇 (&gt;c heating was measured. The results are shown in Comparative Example 8 of Table 7. According to Examples 28 and 29 and Comparative Example 7, the relative When the metal filler in which the third metal particles are mixed is used in place of the second metal particles, it is found that the bonding strength under the service is low. Further, comparing Comparative Example 7 and Comparative Example 8, the bonding strength is displayed. The lower value is approximately the same joint strength. That is, when the third metal particles are used, it is confirmed that the combination with the second metal particles A and the combination with the Cu powder exhibits low joint strength. 146300.doc • 27- 201038349 [Table i] Reflow heat treatment peak temperature Metal filler composition (mass ratio) Bonding strength (MPa) First metal particle A Second metal particle A Normal temperature 260 〇 C Example 1 160 ° C 100 300 15.4 0.35 Example 2 160. 100 186 12.4 0.72 Example 3 160. 100 122 10.2 0.97 Example 4 160 ° C 100 82 3.4 0.78 Example 5 160 ° C 100 54 2.4 0.48 Example 6 180 ° C 100 300 15.9 0.34 Example 7 180 ° C 100 186 13.2 1.1 Example 8 180 ° C 100 122 9.8 1.7 Example 9 180 ° C 100 82 7.7 1.1 Example 10 180 ° C 100 54 3.4 0.8 Comparative Example 1 160 ° C 0 100 38.2 0 Comparative Example 2 180. 0 100 44.3 0 Comparative Example 3 250 ° C Sn-3.0Ag-0.5Cu 26.4 0 [Table 2] Reflow heat treatment peak temperature Metal filler composition (mass ratio) Bonding strength (MPa) First metal particle B Second metal particle B Normal temperature 260 〇 C Example 11 160 ° C 100 300 14 0.5 Example 12 160 ° C 100 186 12.4 0.9 Example 13 160 ° C 100 122 6.7 1.2 Example 14 160 ° C 100 82 3.0 0.9 Example 15 160 ° C 100 54 2.8 1.1 Example 16 180 ° C 100 300 17.1 0.7 146300.doc -28- 201038349 Example 17 180 ° C 100 186 14.9 1.0 Example 18 180 ° C 100 122 7.4 0.9 Example 19 180 ° C 100 82 4.8 1.0 Example 20 180°C 100 54 4.5 1.3 [Table 3] Number of occurrences of short circuit between parts and the total number of occurrences Example 21 0/45 0% Comparative Example 4 17/83 20.5%

[表4] 第1金屬粒子(質量比) 第2金屬粒 子(質量比) 浮游粒 子數(個) 第1金屬 粒子A 第1金屬 粒子B 第1金屬 粒子C 第2金屬 粒子A 實施例22 100 0 0 186 7 實施例23 0 100 0 34 實施例24 0 0 100 878 [表5] 第1金屬粒子(質量比) 第2金屬粒 子(質量比) 粘著力 (g.f) 第1金屬 粒子A 第1金屬 粒子B 第1金屬 粒子D 第2金屬 粒子B 實施例25 100 0 0 186 148 實施例26 0 100 0 160 實施例27 0 0 100 91 146300.doc -29- 201038349 [表6] 回流熱 處理峰 值溫度 金屬填料組成(質量比) 接合強度(MPa) 第1金屬 粒子A Cu 粉 第2金屬 粒子A 第2金屬 粒子B 常溫 260。。 實施例 28 160°C 100 0 186 0 13.5 0.86 實施例 29 160°C 100 0 0 186 26.8 0.65 比較例5 160°C 0 100 186 0 4.3 0.63 比較例6 160°C 0 100 0 186 12.4 1.3 [表7] 回流熱 處理峰 值溫度 金屬填料組成(質量比) 接合強度CMPa) 第1金屬 粒子A Cu粉 第3金屬 粒子 常溫 260〇C 比較例7 160°C 100 0 186 3.82 1.74 比較例8 160°C 0 100 186 3.48 1.51 [產業上之可利用性] 本發明之金屬填料及含有此之無鉛焊劑,可應用於後步 驟中接受複數次熱處理之用途(例如零件内藏基板及封裝 體等電子裝置中所使用之焊劑材,還有例如導電性接著 劑),且可實現低溫安裝。 146300.doc -30-[Table 4] First metal particles (mass ratio) Second metal particles (mass ratio) Number of floating particles (s) First metal particles A First metal particles B First metal particles C Second metal particles A Example 22 100 0 0 186 7 Example 23 0 100 0 34 Example 24 0 0 100 878 [Table 5] First metal particle (mass ratio) Second metal particle (mass ratio) Adhesion (gf) First metal particle A First Metal particles B First metal particles D Second metal particles B Example 25 100 0 0 186 148 Example 26 0 100 0 160 Example 27 0 0 100 91 146300.doc -29- 201038349 [Table 6] Reflow heat treatment peak temperature Metal filler composition (mass ratio) Bonding strength (MPa) First metal particle A Cu powder Second metal particle A Second metal particle B Normal temperature 260. . Example 28 160 ° C 100 0 186 0 13.5 0.86 Example 29 160 ° C 100 0 0 186 26.8 0.65 Comparative Example 5 160 ° C 0 100 186 0 4.3 0.63 Comparative Example 6 160 ° C 0 100 0 186 12.4 1.3 [Table 7] Reflow heat treatment peak temperature Metal filler composition (mass ratio) Bonding strength CMPa) First metal particle A Cu powder Third metal particle normal temperature 260 〇 C Comparative Example 7 160 ° C 100 0 186 3.82 1.74 Comparative Example 8 160 ° C 0 100 186 3.48 1.51 [Industrial Applicability] The metal filler of the present invention and the lead-free solder containing the same can be applied to applications in which a plurality of heat treatments are received in the subsequent step (for example, in an electronic device such as a component-embedded substrate or a package) The solder material used, for example, a conductive adhesive, and low temperature mounting is possible. 146300.doc -30-

Claims (1)

201038349 七、申請專利範圍: L 一種金屬填料,其包含第1金屬粒子與第2金屬粒子之混 合體, ' ⑴述第1金屬粒子係含有作為主成份之以最高質量比 例存在之凡素〜,且進而含有匕及如之Cu合金粒子; 刖述第2金屬粒子係含有出4〇〜7〇質量%、及自包含 Ag Cu、In及Sn之群組所選出的〖種以上金屬%〜的質量 %之B i合金粒子; 且别述第2金屬粒子之量相對前述第i金屬粒子丨⑼質 量份為40〜300質量份。 2.如上凊求項丨之金屬填料,其中前述第2金屬粒子含有 Sn。 3. 如請求項1或2之金屬填料,其中前述第丨金屬粒子及前 述第2金屬粒子之平均粒徑均在5〜2S μιη之範圍 4. 〇 5. 如請求項1或2之金屬填料,其中前述第丨金屬粒子進而 含有選自Ag及Bi之1種以上之金屬。 如請求項1或2之金屬填料,其中前述第丨金屬粒子包含 Ag 5〜15質量。/〇、Bi 2〜8質量%、(:u 49-81質量。/❶、In 2〜8 質量%、及Sn 10〜20質量% , 刖述第1金屬粒子在差示掃描熱量測定(Dsc)下,具有 於230〜300。(:範圍内觀察到之至少一個發熱峰值,及於 480〜530°C範圍内觀測到之至少一個吸熱峰值。 6. —種無鉛焊劑,其含有如請求項1或2之金屬填料。 7. 一種連接構造體,其具有第1電子零件、第2電子零件、 146300.doc 201038349 以及接合前述第1電子零件與第2電子零件之焊劑接合 部,前述焊劑接合部係藉由將如請求項6之無鉛焊劑進 行回流熱處理而形成。 8. 一種零件搭載基板,其具有基板、及搭載於前述基板上 之如請求項7之連接構造體。 146300.doc 201038349 四、指定代表圖: (一) 本案指定代表圖為:(無) (二) 本代表圖之元件符號簡單說明: 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式: (無) 146300.doc -2-201038349 VII. Patent application scope: L A metal filler comprising a mixture of a first metal particle and a second metal particle, '(1) The first metal particle contains the highest quality ratio of the main metal component as a main component~, Further, the ruthenium and the Cu alloy particles are further contained; and the second metal particles are contained in an amount of 4 〇 to 7 〇 mass%, and the metal selected from the group consisting of Ag Cu, In, and Sn The mass % of the B i alloy particles; and the amount of the second metal particles is 40 to 300 parts by mass relative to the ith (9) parts by mass of the i-th metal particles. 2. The metal filler according to the above aspect, wherein the second metal particles contain Sn. 3. The metal filler according to claim 1 or 2, wherein the average particle diameter of the second metal particles and the second metal particles are in the range of 5 to 2 S μη. 4. 〇 5. The metal filler according to claim 1 or 2. The second metal particles further contain one or more metals selected from the group consisting of Ag and Bi. The metal filler according to claim 1 or 2, wherein the foregoing second metal particles comprise Ag 5 to 15 mass. /〇, Bi 2 to 8 mass%, (: u 49-81 mass%, /❶, In 2 to 8 mass%, and Sn 10 to 20 mass%, and the first metal particles are described in differential scanning calorimetry (Dsc) ), having a temperature of 230 to 300. (: at least one exothermic peak observed in the range, and at least one endothermic peak observed in the range of 480 to 530 ° C. 6. A lead-free solder containing the request item A metal filler of 1 or 2. 7. A connection structure comprising a first electronic component, a second electronic component, 146300.doc 201038349, and a solder joint portion joining the first electronic component and the second electronic component, wherein the solder bonding The part is formed by subjecting the lead-free solder of claim 6 to reflow heat treatment. 8. A component mounting substrate having a substrate and a connection structure as claimed in claim 7 mounted on the substrate. 146300.doc 201038349 IV (1) The representative representative of the case is: (none) (2) The symbolic symbol of the representative figure is simple: 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: (none) 146 300.doc -2-
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