SG11201503660VA - Substrate supporting apparatus - Google Patents
Substrate supporting apparatusInfo
- Publication number
- SG11201503660VA SG11201503660VA SG11201503660VA SG11201503660VA SG11201503660VA SG 11201503660V A SG11201503660V A SG 11201503660VA SG 11201503660V A SG11201503660V A SG 11201503660VA SG 11201503660V A SG11201503660V A SG 11201503660VA SG 11201503660V A SG11201503660V A SG 11201503660VA
- Authority
- SG
- Singapore
- Prior art keywords
- substrate supporting
- supporting apparatus
- substrate
- supporting
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
- B23B31/02—Chucks
- B23B31/24—Chucks characterised by features relating primarily to remote control of the gripping means
- B23B31/30—Chucks characterised by features relating primarily to remote control of the gripping means using fluid-pressure means in the chuck
- B23B31/307—Vacuum chucks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/11—Vacuum
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Jigs For Machine Tools (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2012/085319 WO2014082196A1 (en) | 2012-11-27 | 2012-11-27 | Substrate supporting apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201503660VA true SG11201503660VA (en) | 2015-06-29 |
Family
ID=50827010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201503660VA SG11201503660VA (en) | 2012-11-27 | 2012-11-27 | Substrate supporting apparatus |
Country Status (6)
Country | Link |
---|---|
US (1) | US10410906B2 (en) |
JP (1) | JP6198840B2 (en) |
KR (1) | KR102124417B1 (en) |
CN (2) | CN104813460A (en) |
SG (1) | SG11201503660VA (en) |
WO (1) | WO2014082196A1 (en) |
Families Citing this family (50)
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US9911640B2 (en) * | 2015-09-01 | 2018-03-06 | Boris Kesil | Universal gripping and suction chuck |
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CN107301963A (en) * | 2016-04-15 | 2017-10-27 | 上海新昇半导体科技有限公司 | Bernoulli Jacob's base unit and depositing device |
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EP3442016B1 (en) * | 2016-05-26 | 2023-06-07 | Mimasu Semiconductor Industry Co., Ltd. | Wafer heating and holding device and method for rotary table, and wafer rotating and holding device |
CN109478524B (en) * | 2016-07-06 | 2022-01-25 | 盛美半导体设备(上海)股份有限公司 | Substrate supporting device |
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WO2018028872A1 (en) * | 2016-08-09 | 2018-02-15 | Singulus Technologies Ag | System and method for gas phase deposition |
CN107761165A (en) * | 2016-08-15 | 2018-03-06 | 上海新昇半导体科技有限公司 | A kind of base and epitaxial device based on Bernoulli effect |
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JP2018122380A (en) * | 2017-01-31 | 2018-08-09 | ブラザー工業株式会社 | Component holding device |
JP2018122381A (en) * | 2017-01-31 | 2018-08-09 | ブラザー工業株式会社 | Component holding device |
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US10147610B1 (en) * | 2017-05-30 | 2018-12-04 | Lam Research Corporation | Substrate pedestal module including metallized ceramic tubes for RF and gas delivery |
JP7374075B2 (en) * | 2017-07-21 | 2023-11-06 | エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド | Non-contact handler and workpiece handling method using it |
CN107910250A (en) * | 2017-11-16 | 2018-04-13 | 德淮半导体有限公司 | Wafer processing apparatus and method |
CN108177199A (en) * | 2018-02-11 | 2018-06-19 | 重庆双驰门窗有限公司 | Computer panel saw operation console |
WO2020023409A1 (en) * | 2018-07-24 | 2020-01-30 | Applied Materials, Inc. | Optically transparent pedestal for fluidly supporting a substrate |
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US20210114067A1 (en) * | 2019-10-18 | 2021-04-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor cleaning apparatus and method |
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-
2012
- 2012-11-27 KR KR1020157016200A patent/KR102124417B1/en active IP Right Grant
- 2012-11-27 JP JP2015543233A patent/JP6198840B2/en active Active
- 2012-11-27 CN CN201280077307.0A patent/CN104813460A/en active Pending
- 2012-11-27 WO PCT/CN2012/085319 patent/WO2014082196A1/en active Application Filing
- 2012-11-27 US US14/647,729 patent/US10410906B2/en active Active
- 2012-11-27 CN CN201911043432.XA patent/CN110610894B/en active Active
- 2012-11-27 SG SG11201503660VA patent/SG11201503660VA/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN110610894B (en) | 2023-08-04 |
KR20150088828A (en) | 2015-08-03 |
JP6198840B2 (en) | 2017-09-20 |
JP2015537385A (en) | 2015-12-24 |
US10410906B2 (en) | 2019-09-10 |
KR102124417B1 (en) | 2020-06-24 |
WO2014082196A1 (en) | 2014-06-05 |
US20150325466A1 (en) | 2015-11-12 |
CN110610894A (en) | 2019-12-24 |
CN104813460A (en) | 2015-07-29 |
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