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KR960013145B1 - Removing method of photo resist - Google Patents

Removing method of photo resist Download PDF

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Publication number
KR960013145B1
KR960013145B1 KR93006660A KR930006660A KR960013145B1 KR 960013145 B1 KR960013145 B1 KR 960013145B1 KR 93006660 A KR93006660 A KR 93006660A KR 930006660 A KR930006660 A KR 930006660A KR 960013145 B1 KR960013145 B1 KR 960013145B1
Authority
KR
South Korea
Prior art keywords
photo resist
removing method
photoresist film
hardened
ozone
Prior art date
Application number
KR93006660A
Other languages
Korean (ko)
Inventor
Dae-Keun Yang
Original Assignee
Lg Semicon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Semicon Co Ltd filed Critical Lg Semicon Co Ltd
Priority to KR93006660A priority Critical patent/KR960013145B1/en
Application granted granted Critical
Publication of KR960013145B1 publication Critical patent/KR960013145B1/en

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

The method comprises the steps of; removing a hardened photoresist film(3) to a finite depth by an injection of impurity(4) by using ozone and ultraviolet rays; removing the remains of the hardened photoresist film(3) by using plasma which is made of oxygen and vapor; removing the remains of the photoresist film(2a), which is not a hardened, by using ozone, ultraviolet rays, and oxygen gas.
KR93006660A 1993-04-20 1993-04-20 Removing method of photo resist KR960013145B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR93006660A KR960013145B1 (en) 1993-04-20 1993-04-20 Removing method of photo resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR93006660A KR960013145B1 (en) 1993-04-20 1993-04-20 Removing method of photo resist

Publications (1)

Publication Number Publication Date
KR960013145B1 true KR960013145B1 (en) 1996-09-30

Family

ID=19354228

Family Applications (1)

Application Number Title Priority Date Filing Date
KR93006660A KR960013145B1 (en) 1993-04-20 1993-04-20 Removing method of photo resist

Country Status (1)

Country Link
KR (1) KR960013145B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10276373B2 (en) 2016-10-05 2019-04-30 Samsung Electronics Co., Ltd. Method of manufacturing a semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10276373B2 (en) 2016-10-05 2019-04-30 Samsung Electronics Co., Ltd. Method of manufacturing a semiconductor device

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Year of fee payment: 14

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