KR20000008133A - 칼러 레지스트 수지 조성물 - Google Patents
칼러 레지스트 수지 조성물 Download PDFInfo
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- KR20000008133A KR20000008133A KR1019980027832A KR19980027832A KR20000008133A KR 20000008133 A KR20000008133 A KR 20000008133A KR 1019980027832 A KR1019980027832 A KR 1019980027832A KR 19980027832 A KR19980027832 A KR 19980027832A KR 20000008133 A KR20000008133 A KR 20000008133A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/23—Photochromic filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Optical Filters (AREA)
Abstract
Description
성분 | 종류 | 사용량(g) |
바인더 수지 | Ⅰ: 9,9'-비스(4-히드록시페닐)플루오렌Ⅱ: 에피클로로히드린Ⅲ: 아크릴산Ⅰ : Ⅱ : Ⅲ = 1 : 2 : 2의 몰비로 공중합된카도계 바인더 수지 | 10 |
광중합성 단량체 | 펜타에리트리톨트리아크릴레이트 | 10 |
광중합성 개시제 | Igacure 907(시바가이기사 제품)4,4'-디메틸벤조페논 | 10.5 |
안료 | 프탈로시안 블루 | 0.6 |
용매 | 프로필렌글리콜모노메틸에테르시클로헥사논 | 5010 |
첨가제 | 계면활성제: 로진산염산화방지제: Irganox 1010 | 0.10.1 |
실시예1 | 실시예2 | 비교실시예 | |||
1 | 2 | 3 | |||
현상성 | ○ | ○ | ○ | △ | × |
패턴표면의평활성 | ○ | ○ | △ | ○ | △ |
내열성 | ○ | ○ | △ | ○ | ○ |
내화학성 | ○ | ○ | × | △ | ○ |
패턴성 | ○ | ○ | ○ | × | ○ |
Claims (5)
- (A) 하기 구조식 Ⅰ, Ⅱ 및 Ⅲ의 단량체가 1 : 2-4 : 2-8의 몰비로 공중합되고, 중량 평균 분자량이 3,000∼6,000인 카도계 바인더 수지 1∼40 중량부;(B) 아크릴계 광중합성 단량체 1∼20 중량부;(C) 광중합 개시제 0.1∼10 중량부;(D) 안료 1∼40 중량부; 및(E) 용매 20∼80 중량부;로 이루어지는 것을 특징으로 하는 칼러 레지스트 수지 조성물:상기식에서 R은 수소원자, 탄소수 1∼10의 알킬기, 알릴기, 페닐기, 벤질기 또는 탄소수 1∼8의 에톡시기이고, X는 할로겐 원자임.
- (A) 하기 구조식 Ⅰ, Ⅱ 및 Ⅲ의 단량체가 1 : 2-4 : 2-8의 몰비로 공중합되고, 중량 평균 분자량이 3,000∼6,000인 카도계 바인더 수지 1∼40 중량부;(B) 아크릴계 광중합성 단량체 1∼20 중량부;(C) 광중합 개시제 0.1∼10 중량부; 및(D) 용매 20∼80 중량부;로 이루어지는 것을 특징으로 하는 보호막 수지 조성물:상기식에서 R은 수소원자, 탄소수 1∼10의 알킬기, 알릴기, 페닐기, 벤질기 또는 탄소수 1∼8의 에톡시기이고, X는 할로겐 원자임.
- 제1항에 있어서, 상기 바인더 수지를 알칼리 용해성 수지로 만들기 위하여 하기 구조식 Ⅳ로 표시되는 산무수물로 처리하는 것을 특징으로 하는 칼러 레지스트 수지 조성물:상기식에서 R1및 R2는 수소원자, 탄소수 1∼10의 알킬기, 알릴기, 페닐기, 벤질기 또는 탄소수 1∼8의 에톡시기임.
- 제1항의 칼러 레지스트 수지 조성물을 유리기판상에 경화시켜 제조되는 것을 특징으로 하는 칼러필터.
- 제2항의 보호막 수지 조성물로 제4항의 칼러필터 표면을 도포하여 보호막을 형성시킴으로써 제조되는 것을 특징으로 하는 칼러필터.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980027832A KR100552914B1 (ko) | 1998-07-10 | 1998-07-10 | 칼러레지스트수지조성물 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980027832A KR100552914B1 (ko) | 1998-07-10 | 1998-07-10 | 칼러레지스트수지조성물 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2003-0098862A Division KR100517884B1 (ko) | 2003-12-29 | 2003-12-29 | 칼러 필터용 보호막 수지 조성물 |
Publications (2)
Publication Number | Publication Date |
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KR20000008133A true KR20000008133A (ko) | 2000-02-07 |
KR100552914B1 KR100552914B1 (ko) | 2006-06-28 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1019980027832A KR100552914B1 (ko) | 1998-07-10 | 1998-07-10 | 칼러레지스트수지조성물 |
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KR (1) | KR100552914B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100488344B1 (ko) * | 2001-12-28 | 2005-05-10 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 |
WO2008075860A1 (en) * | 2006-12-21 | 2008-06-26 | Cheil Industries Inc. | High etch resistant hardmask composition having antireflective properties, method for forming patterned material layer using the hardmask composition and semiconductor integrated circuit device produced using the method |
US8834749B2 (en) | 2012-12-21 | 2014-09-16 | Cheil Industries Inc. | Photosensitive resin composition and light blocking layer using the same |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0748424A (ja) * | 1989-10-06 | 1995-02-21 | Nippon Steel Corp | エポキシアクリレート樹脂 |
JP3447768B2 (ja) * | 1993-06-17 | 2003-09-16 | 新日鐵化学株式会社 | 熱硬化性樹脂組成物、その硬化物及びカラーフィルター材料 |
KR100326009B1 (ko) * | 1993-07-20 | 2002-05-10 | 야마사키 노리쓰카 | 오르토스피로에스테르화합물,이를함유하는저경화수축성수지조성물및경화물 |
JPH0764281A (ja) * | 1993-08-30 | 1995-03-10 | Nippon Steel Corp | 感光性樹脂組成物及びその硬化物並びに画像形成材料 |
JP3455296B2 (ja) * | 1993-07-30 | 2003-10-14 | 新日本製鐵株式会社 | タッチパネル用スペーサー材料及びこれを用いたタッチパネル |
JPH1067970A (ja) * | 1996-08-28 | 1998-03-10 | Nippon Steel Chem Co Ltd | 光ディスク用接着剤及び光ディスク |
DK1014996T3 (da) * | 1997-08-28 | 2003-09-29 | Univ Washington | Præparater indeholdende saccharid til behandling af Alzheimers sygdom og andre amyloidoser |
-
1998
- 1998-07-10 KR KR1019980027832A patent/KR100552914B1/ko not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100488344B1 (ko) * | 2001-12-28 | 2005-05-10 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 |
WO2008075860A1 (en) * | 2006-12-21 | 2008-06-26 | Cheil Industries Inc. | High etch resistant hardmask composition having antireflective properties, method for forming patterned material layer using the hardmask composition and semiconductor integrated circuit device produced using the method |
KR100865684B1 (ko) * | 2006-12-21 | 2008-10-29 | 제일모직주식회사 | 고 내에칭성 반사방지 하드마스크 조성물, 패턴화된 재료형상의 제조방법 및 그 제조방법으로 제조되는 반도체집적회로 디바이스 |
US8834749B2 (en) | 2012-12-21 | 2014-09-16 | Cheil Industries Inc. | Photosensitive resin composition and light blocking layer using the same |
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Publication number | Publication date |
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KR100552914B1 (ko) | 2006-06-28 |
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