JPS63159443A - Laminate - Google Patents
LaminateInfo
- Publication number
- JPS63159443A JPS63159443A JP30673086A JP30673086A JPS63159443A JP S63159443 A JPS63159443 A JP S63159443A JP 30673086 A JP30673086 A JP 30673086A JP 30673086 A JP30673086 A JP 30673086A JP S63159443 A JPS63159443 A JP S63159443A
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- weight
- laminate
- resin composition
- inorganic filler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 56
- 239000002184 metal Substances 0.000 claims abstract description 56
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 33
- 229920006380 polyphenylene oxide Polymers 0.000 claims abstract description 33
- 239000011256 inorganic filler Substances 0.000 claims abstract description 25
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 25
- 239000011342 resin composition Substances 0.000 claims abstract description 25
- 239000000178 monomer Substances 0.000 claims abstract description 18
- 229920000642 polymer Polymers 0.000 claims abstract description 17
- 239000004745 nonwoven fabric Substances 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims description 36
- 239000000945 filler Substances 0.000 claims description 2
- 239000011888 foil Substances 0.000 abstract description 20
- 238000004132 cross linking Methods 0.000 abstract description 13
- 230000017525 heat dissipation Effects 0.000 abstract description 11
- 238000002156 mixing Methods 0.000 abstract description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract description 4
- 238000009413 insulation Methods 0.000 abstract description 4
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 abstract description 4
- 239000006185 dispersion Substances 0.000 abstract description 3
- 239000002245 particle Substances 0.000 abstract description 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- 150000002430 hydrocarbons Chemical group 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 16
- 239000003999 initiator Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 12
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 7
- 239000004020 conductor Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- -1 copper (1) compound Chemical class 0.000 description 5
- 239000011889 copper foil Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 239000000395 magnesium oxide Substances 0.000 description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 229920003048 styrene butadiene rubber Polymers 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 2
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000011437 continuous method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000123 paper Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- IMDHDEPPVWETOI-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2,2-trichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)(Cl)Cl)C=C1 IMDHDEPPVWETOI-UHFFFAOYSA-N 0.000 description 1
- DMWVYCCGCQPJEA-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhexane Chemical compound CC(C)(C)OOC(C)(C)CCC(C)(C)OOC(C)(C)C DMWVYCCGCQPJEA-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KRDXTHSSNCTAGY-UHFFFAOYSA-N 2-cyclohexylpyrrolidine Chemical compound C1CCNC1C1CCCCC1 KRDXTHSSNCTAGY-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- DJEQZVQFEPKLOY-UHFFFAOYSA-N N,N-dimethylbutylamine Chemical compound CCCCN(C)C DJEQZVQFEPKLOY-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- BRHJUILQKFBMTL-UHFFFAOYSA-N [4,4-bis(dimethylamino)cyclohexa-1,5-dien-1-yl]-phenylmethanone Chemical compound C1=CC(N(C)C)(N(C)C)CC=C1C(=O)C1=CC=CC=C1 BRHJUILQKFBMTL-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- REQPQFUJGGOFQL-UHFFFAOYSA-N dimethylcarbamothioyl n,n-dimethylcarbamodithioate Chemical compound CN(C)C(=S)SC(=S)N(C)C REQPQFUJGGOFQL-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical compound [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- KYZHGEFMXZOSJN-UHFFFAOYSA-N isobutyl benzoate Chemical compound CC(C)COC(=O)C1=CC=CC=C1 KYZHGEFMXZOSJN-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000002655 kraft paper Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- KGHYGBGIWLNFAV-UHFFFAOYSA-N n,n'-ditert-butylethane-1,2-diamine Chemical compound CC(C)(C)NCCNC(C)(C)C KGHYGBGIWLNFAV-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000005691 oxidative coupling reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920013637 polyphenylene oxide polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical class OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】 〔技術分野〕 この発明は、金属ベースを有する積層板に関する。[Detailed description of the invention] 〔Technical field〕 The present invention relates to a laminate having a metal base.
電子機器の小型化、薄型化に伴い、プリント基板への部
品実装は、高密度化の傾向を深めている。部品もチップ
形の比率が高まり、基板材料に要求される特性は多様化
の様相を呈している。基板材料は、従来の考え方では、
用途、密度、部品実装および信頼性の点から、樹脂材料
とセラミック材料に大きく分かれて使用され、それぞれ
の特徴を生かしつつ独自の発展を遂げてきた。しかし、
近年の基板をとりまく種々の状況は、基板材料の明確な
区分を取り除きつつあり、用途および技術の多、様化は
領域のオーバーラツプの比率を高めつつある。2. Description of the Related Art As electronic devices become smaller and thinner, there is a growing trend toward higher density mounting of components on printed circuit boards. The proportion of chip-shaped components is increasing, and the characteristics required of substrate materials are becoming more diverse. Conventionally, the substrate material is
In terms of usage, density, component mounting, and reliability, materials are broadly divided into resin materials and ceramic materials, and each material has achieved unique development while taking advantage of its characteristics. but,
Various conditions surrounding substrates in recent years are eliminating clear divisions of substrate materials, and the diversification of applications and technologies is increasing the ratio of area overlap.
金属を基板材料に応用する技術も、こうした背景から、
近年特に注目されている。Against this background, the technology to apply metals to substrate materials has also been developed.
It has received particular attention in recent years.
元来、プリント配線板の基本機能は、絶縁、導電、部品
支持という3大機能からなり、金属板の関与する余地は
なかった。しかし、金属は、固有の特性、すなわち、加
工性、強度、熱伝導性、寸法安定性、磁性、電気磁気シ
ールド性などを有するので、これを用いれば、従来の基
板材料では改良が非常に困難であった特性や実現できな
かった新しい特性を容易に達成することができる。Originally, the basic functions of printed wiring boards consisted of three major functions: insulation, conduction, and component support, and there was no room for metal plates to be involved. However, metals have unique properties, such as workability, strength, thermal conductivity, dimensional stability, magnetism, and electromagnetic shielding properties, which are extremely difficult to improve using conventional substrate materials. It is possible to easily achieve new characteristics that previously could not be achieved.
プリント配線板への部品実装が高密度化されつつあるた
め、積層板の耐熱性、寸法安定性、電気特性などの基本
特性に関して従来以上の厳しい市場ニーズが生じている
。その中でも、高密度実装の際に問題となるものの一つ
として、基板の放熱性が挙げられる。As the density of component mounting on printed wiring boards is becoming higher, market needs are becoming more stringent than before regarding basic properties of laminates, such as heat resistance, dimensional stability, and electrical properties. Among these, one of the issues that arises during high-density packaging is the heat dissipation of the board.
基板の放熱性を向上させるため、熱放散性の良い基板が
必要となり、金属ベース基板が作製された。これは、た
とえば、第1図に示すように、プリプレグ2などの絶縁
層を介して、金属箔1と金属ベース(金属板)3とを接
着したものである。In order to improve the heat dissipation of the substrate, a substrate with good heat dissipation was required, and a metal-based substrate was created. For example, as shown in FIG. 1, a metal foil 1 and a metal base (metal plate) 3 are bonded together via an insulating layer such as a prepreg 2.
ところが、物質の放熱性は主にその物質の熱伝導度によ
って決まる。第3図に、各種の物質の熱伝導率を示す。However, the heat dissipation properties of a material are mainly determined by the material's thermal conductivity. Figure 3 shows the thermal conductivity of various materials.
第3図にみるように、一般に、絶縁体である樹脂材料の
熱伝導率は1O−3(cal/口・S・℃〕以下であり
、導電体である金属材料の熱伝導率10”1.0 (c
a l /cn−s ・℃)程度に比べると非常に小
さい、したがって、樹脂材料を絶縁材として用いて金属
ベース基板を作製した場合、充分な熱放散性を与えるこ
とができないという欠点があった。As shown in Figure 3, in general, the thermal conductivity of a resin material that is an insulator is 1O-3 (cal/mouth・S・℃) or less, and the thermal conductivity of a metal material that is an electric conductor is 10"1 .0 (c
a l /cn-s ・℃) Therefore, when a metal base substrate is fabricated using a resin material as an insulating material, there is a drawback that sufficient heat dissipation cannot be provided. .
この発明は、以上の事情に鑑みてなされたものであり、
十分な放熱性を有し、しかも、プリント配線板の基本特
性である耐熱性、寸法安定性および電気特性を有する積
層板を提供することを目的とする。This invention was made in view of the above circumstances,
It is an object of the present invention to provide a laminate that has sufficient heat dissipation properties and also has heat resistance, dimensional stability, and electrical properties, which are the basic characteristics of a printed wiring board.
発明者らは、上記の目的を達成するために、樹脂中に伝
熱性の良い無機充填材を分散させ、ガラスクロスなどの
基材に含浸させることによりプリプレグを作製し、この
プリプレグを用いて絶縁層を形成すれば良いと考えた。In order to achieve the above object, the inventors created a prepreg by dispersing an inorganic filler with good heat conductivity in a resin and impregnating it into a base material such as glass cloth, and using this prepreg to create an insulating material. I thought it would be good to form a layer.
ところが、この場合、基材がクロス状物であると、クロ
スの目に無機充填材が十分大ることができないため、期
待されるほど熱伝導性の向上が得られない場合があるこ
とがわかった。そこで、さらに研究を続けた結果、基材
としてクロス状物を用いる代わりに不織布を用いれば、
無機充填材を含んだ樹脂組成物が十分に含浸されたプリ
プレグを作製することができ、そして、このようなプリ
プレグを用いて絶縁層を形成すれば、均一な品質を有す
る積層板を作製することが可能であることを見出し、こ
の発明を完成させた。However, in this case, it has been found that if the base material is a cloth-like material, the inorganic filler cannot be sufficiently enlarged in the mesh of the cloth, and therefore the thermal conductivity may not be improved as much as expected. Ta. Therefore, as a result of further research, we found that if a nonwoven fabric was used instead of a cloth-like material as the base material,
It is possible to produce a prepreg sufficiently impregnated with a resin composition containing an inorganic filler, and by forming an insulating layer using such a prepreg, a laminate with uniform quality can be produced. He discovered that this was possible and completed this invention.
したがって、この発明は、上記の目的を達成するために
、金属ベース上の絶縁層としてプリプレグが用いられて
いる積層板において、前記プリプレグは、基材として不
織布が用いられていて、ポリフェニレンオキサイド、架
橋性ポリマおよび/または架橋性モノマ、ならびに、無
機充填材を含むポリフェニレンオキサイド系樹脂組成物
が含浸されており、前記無機充填材が20℃で0.11
5〔cal/cm・S・℃〕以上の熱伝導率を持つこと
を特徴とする積層板を要旨としている。Therefore, in order to achieve the above object, the present invention provides a laminate in which prepreg is used as an insulating layer on a metal base. A polyphenylene oxide resin composition containing a polymer and/or a crosslinkable monomer and an inorganic filler is impregnated, and the inorganic filler has a temperature of 0.11 at 20°C.
The gist is a laminate characterized by having a thermal conductivity of 5 [cal/cm·S·°C] or more.
以下に、この発明の詳細な説明する。The present invention will be explained in detail below.
この発明にかかる積層板は、金属ベース上の絶縁層とし
てプリプレグが用いられている。この発明の積層板の1
実施例は、第1図にみるように、金属箔1と金属ベース
(金属板)3とが絶縁層たるプリプレグ2を介して積層
成形されてなる、いわゆる金属ベース基板である。しか
しながら、この発明にかかる積層板とは、上記金属ベー
ス基板において、金属箔をエツチングなどによって所望
の回路としたもの、すなわち、プリント回路板を含み、
さらに、プリント回路板上に電子部品などが搭載された
ものなど、種々のものをも含む。また、この発明の積層
板は、金属ベース上に、プリプレグが用いられてなる絶
縁層を介して二層以上の導体層(この導体層は、すでに
一層または二層以上の回路が形成されたプリント回路板
でもよい)が形成された多層板であうでもよい。In the laminate according to the present invention, prepreg is used as an insulating layer on a metal base. 1 of the laminate of this invention
As shown in FIG. 1, the embodiment is a so-called metal base substrate in which a metal foil 1 and a metal base (metal plate) 3 are laminated and molded with a prepreg 2 serving as an insulating layer interposed therebetween. However, the laminate according to the present invention includes a metal base substrate with a desired circuit formed by etching metal foil, that is, a printed circuit board,
Furthermore, it also includes various types of devices, such as those with electronic components mounted on printed circuit boards. In addition, the laminate of the present invention has two or more conductor layers on a metal base via an insulating layer made of prepreg (this conductor layer is a printed circuit board on which one or two or more circuits have already been formed). It may be a multilayer board on which a circuit board (or a circuit board) is formed.
金属ベース上には、プリプレグが用いられてなる絶縁層
が形成されている。すなわち、金属ベースと、金属箔、
回路などの導体層との間の絶縁を確保するために、プリ
プレグを用いて絶縁層が形成されているのである。An insulating layer made of prepreg is formed on the metal base. That is, a metal base, a metal foil,
Insulating layers are formed using prepreg to ensure insulation from conductor layers such as circuits.
このプリプレグは、ポリフェニレンオキサイド、架橋性
ポリマおよび/または架橋性モノマ、ならびに、無機充
填材を含むポリフェニレンオキサイド系樹脂組成物が含
浸されている。This prepreg is impregnated with a polyphenylene oxide resin composition containing polyphenylene oxide, a crosslinkable polymer and/or a crosslinkable monomer, and an inorganic filler.
この発明で使用されるポリフェニレンオキサイド(ポリ
フェニレンエーテルともいう。以下、「PP0Jと記す
)は、たとえば、つぎの一般式で表されるものであり、
その−例としては、ポリ(2,6−シメチルー1.4−
フェニレンオキサイド)が挙げられる。The polyphenylene oxide (also referred to as polyphenylene ether, hereinafter referred to as "PP0J") used in this invention is, for example, represented by the following general formula,
An example is poly(2,6-cymethyl-1,4-
phenylene oxide).
このようなPPOは、たとえば、U S P 4059
568号明細書に開示されている方法で合成することが
できる。たとえば、2,6−キシレノールを、触媒の存
在下で、酸素を含む気体およびメタノールと酸化カップ
リング反応させて、ポリ (2,6−シメチルー1,4
−フェニレンオキサイド)を得る方法であるが、この方
法に限らない。ここで、触媒としては、銅(1)化合物
、N、N’−ジーtert−ブチルエチレンジアミン、
ブチルジメチルアミンおよび臭化水素を含むものである
。メタノールは、これを基準にして2〜15重量%の水
を反応混合系に加え、メタノールと水の合計が5〜25
重量%の重合溶媒となるようにして用いる。特に限定す
るものではないが、たとえば、重量平均分子量(Mw)
がso、ooo、分子量分布M W / M n=4.
2(Mnは数平均分子量)のポリマが好ましく使用され
る。Such PPOs are, for example, USP 4059
It can be synthesized by the method disclosed in No. 568. For example, 2,6-xylenol is subjected to an oxidative coupling reaction with an oxygen-containing gas and methanol in the presence of a catalyst to produce poly(2,6-cymethyl-1,4
-phenylene oxide), but is not limited to this method. Here, as a catalyst, a copper (1) compound, N,N'-di-tert-butylethylenediamine,
Contains butyldimethylamine and hydrogen bromide. Based on methanol, 2 to 15% by weight of water is added to the reaction mixture system, and the total amount of methanol and water is 5 to 25% by weight.
% by weight of the polymerization solvent. Although not particularly limited, for example, weight average molecular weight (Mw)
is so, ooo, molecular weight distribution M W / M n = 4.
2 (Mn is number average molecular weight) is preferably used.
PPOは、誘電率が低く、誘電損失が少ない樹脂なので
、高周波回路の基板などに適しているが、もちろん、高
周波回路の基板以外にも用いることができる。また、P
POは安価である。Since PPO is a resin with a low dielectric constant and low dielectric loss, it is suitable for substrates of high frequency circuits, etc., but of course it can also be used for substrates other than high frequency circuits. Also, P
PO is cheap.
架橋性ポリマとしては、とくにこれらに限定される訳で
はないが、たとえば、1.2−ポリブタジェン、1,4
−ポリブタジェン、スチレンブタジェンコポリマ、変性
1.2−ポリブタジェン(マレイン変性、アクリル変性
、エポキシ変性)、ゴム類などが挙げられ、それぞれ、
単独でまたは2つ以上併せて用いられる。ポリマ状態は
、エラストマーでもラバーでもよいが、成膜性を向上さ
せるということから特に高分子量のラバー状がよい。Examples of crosslinkable polymers include, but are not limited to, 1,2-polybutadiene, 1,4
-Polybutadiene, styrene-butadiene copolymer, modified 1,2-polybutadiene (malein-modified, acrylic-modified, epoxy-modified), rubbers, etc.
Used alone or in combination of two or more. The polymer state may be an elastomer or a rubber, but a high molecular weight rubber state is particularly preferred since it improves film forming properties.
なお、架橋性ポリマではないが、成膜性を向上させるた
めに、ポリスチレンをこの発明の目的達成を妨げない範
囲で用いてもよい。なお、ポリスチレンは、高分子量の
ものが成膜性を向上させるということから望ましい。Although it is not a crosslinkable polymer, polystyrene may be used in order to improve film formability within a range that does not impede achievement of the object of the present invention. Note that polystyrene with a high molecular weight is desirable because it improves film-forming properties.
架橋性モノマとしては、たとえば、■エステルアクリレ
ート類、エポキシアクリレート類、ウレタンアクリレー
ト類、エーテルアクリレ−HQ、メラミンアクリレート
類、アルキドアクリレート類、シリコンアクリレート類
などのアクリレート類、■トリアリルシアヌレート、ト
リアリルイソシアヌレート、エチレングリコールジメタ
クリレート、ジビニルベンゼン、ジアリルフタレートな
どの多官能モノマ、■ビニルトルエン、エチルビニルベ
ンゼン、スチレン、パラメチルスチレンなどの単官能モ
ノマ、■多官能エポキシ類などが挙げられ、それぞれ、
単独であるいは2つ以上併せて用いられるが、特にこれ
らに限定される訳ではない。Examples of crosslinkable monomers include: ■Acrylates such as ester acrylates, epoxy acrylates, urethane acrylates, ether acrylate-HQ, melamine acrylates, alkyd acrylates, and silicone acrylates, ■Triaryl cyanurate, and These include polyfunctional monomers such as allyl isocyanurate, ethylene glycol dimethacrylate, divinylbenzene, and diallyl phthalate, monofunctional monomers such as vinyltoluene, ethylvinylbenzene, styrene, and paramethylstyrene, and polyfunctional epoxies. ,
They may be used alone or in combination of two or more, but are not particularly limited to these.
架橋性モノマとしては、トリアリルシアヌレートおよび
/またはトリアリルイソシアヌレートを用いるのが、P
POと相溶性が良く、成膜性、架橋性、耐熱性および誘
電特性の面で好ましいのでよい。トリアリルシアヌレー
トとトリアリルイソシアヌレートとは、化学構造的には
異性体の関係にあり、はぼ同様の成膜性、相溶性、溶解
性、反応性などを有するので、同様に、いずれか一方ず
つまたは両方ともに使用することができる。As the crosslinking monomer, triallyl cyanurate and/or triallyl isocyanurate are used.
It is good because it has good compatibility with PO and is preferable in terms of film formability, crosslinkability, heat resistance, and dielectric properties. Triallyl cyanurate and triallyl isocyanurate are chemically structurally isomers and have similar film-forming properties, compatibility, solubility, reactivity, etc. One or both can be used.
架橋性ポリマおよび/または架橋性モノマは、架橋く硬
化)させることにより、PPOの特性を損なわずに耐熱
性などを向上させるなどのために用いられる。これらは
、いずれか一方のみを用いるようにしてもよいし、併用
するようにし、でもよいが、併用するほうが、より特性
改善に効果がある。The crosslinkable polymer and/or crosslinkable monomer are used to improve heat resistance and the like without impairing the properties of PPO by crosslinking and curing. These may be used alone or in combination, but using them in combination is more effective in improving characteristics.
無機充填材としては、20℃で0.115(ca1/c
m−s・℃〕以上の熱伝導率を持つものを用いる。20
℃での熱伝導率が0.115(cat/口・S・℃〕を
下回ると、積層板の絶縁層の熱伝導率があまり向上せず
、積層板の熱放散性改善に役立たない、無機充填材とし
ては、たとえば、炭化ケイ素(S i C) 、窒化ア
ルミニウム(AjN)、酸化ベリリウム(ベリリヤとも
いう。Bo。As an inorganic filler, 0.115 (ca1/c
Use a material with a thermal conductivity of at least m-s·℃]. 20
If the thermal conductivity at ℃ is less than 0.115 (cat/mouth・S・℃), the thermal conductivity of the insulating layer of the laminate will not improve much, and the inorganic Examples of the filler include silicon carbide (S i C), aluminum nitride (AjN), and beryllium oxide (also called beryllium).
)、酸化マグネシウム(MgO)、モリブデン(M o
)等が挙げられ、それぞれ、単独でまたは2つ以上併
せて用いられるが、これらに限定されない。ここに例示
した無機充填材の熱伝導率は、第3図に示すように、2
0℃で0.115〜0.670〔Cal/aII−3・
℃〕程度と、金属とほぼ同程度である。), magnesium oxide (MgO), molybdenum (Mo
), each of which may be used alone or in combination of two or more, but is not limited thereto. The thermal conductivity of the inorganic filler exemplified here is 2, as shown in Figure 3.
0.115 to 0.670 [Cal/aII-3・
℃], which is almost the same as that of metals.
無機光”基材の形状は問わないが、サイズは微小なもの
が好ましい、たとえば、粒子状のものではご粒子サイズ
が約50μ以下であることが好ましく、あまりにも小さ
すぎると取り扱いが悪くなるなどのおそれがあるので、
1〜20.nの範囲内にあることがより好ましい。The shape of the inorganic light base material does not matter, but it is preferable that the size is minute.For example, in the case of particulate materials, the particle size is preferably about 50μ or less, and if it is too small, it will be difficult to handle. Because there is a risk of
1-20. More preferably, it is within the range of n.
無機充填材の種類および/または量を調節することによ
って、積層板の熱伝導率を任意の値に調節することがで
きる。樹脂組成物中の無機充填材の上限は、積層板が多
孔質となったり、強度を損なう等の好ましくない傾向を
呈しはじめる点である。By adjusting the type and/or amount of the inorganic filler, the thermal conductivity of the laminate can be adjusted to an arbitrary value. The upper limit of the inorganic filler in the resin composition is the point at which the laminate begins to exhibit undesirable tendencies such as becoming porous or losing strength.
前記のような原材料を配合して、ポリフェニレンオキサ
イド系樹脂組成物を得る。その配合割合は、特に限定さ
れないが、PP0IO〜95重量部(より好ましくは、
20〜90重量部)に対し、架橋性ポリマを5〜50重
量部(より好ましくは5〜45重量部)および/または
架橋性モノマ1〜50重量部(より好ましくは5〜20
重量部)、無機充填材1〜500重量部の割合とするの
が好ましい。架橋性ポリマおよび/または架橋性モノマ
の割合が前記範囲を下回ると、密着性などが不充分にな
ることがあり、前記範囲を上回ると、PPOの特性が現
れないことがある。無機充填材の割合が前記範囲を下回
ると、熱伝導率を高める効果が少なすぎるおそれがあり
、前記範囲を上回ると、上記の好ましくない傾向を呈し
はじめるおそれがある。また、特に限定されないが、架
橋性モノマ1重量部に対し、架橋性ポリマを20重量部
以下の割合で用いるのが好ましい、ただし、PPOと、
ポリスチレンおよび/またはスチレンブタジェンコポリ
マと併用する場合には、の配合重量比とするのが好まし
い。A polyphenylene oxide resin composition is obtained by blending the raw materials as described above. The blending ratio is not particularly limited, but ranges from PP0IO to 95 parts by weight (more preferably,
20 to 90 parts by weight), 5 to 50 parts by weight (more preferably 5 to 45 parts by weight) of a crosslinkable polymer and/or 1 to 50 parts by weight (more preferably 5 to 20 parts by weight) of a crosslinkable monomer.
(parts by weight) and the proportion of the inorganic filler is preferably 1 to 500 parts by weight. When the proportion of the crosslinkable polymer and/or crosslinkable monomer is below the above range, adhesion may become insufficient, and when it exceeds the above range, the characteristics of PPO may not be exhibited. If the proportion of the inorganic filler is below the above range, the effect of increasing thermal conductivity may be too small, and if it exceeds the above range, the above unfavorable tendency may begin to occur. Although not particularly limited, it is preferable to use the crosslinkable polymer in a ratio of 20 parts by weight or less per 1 part by weight of the crosslinkable monomer, provided that PPO and
When used in combination with polystyrene and/or styrene-butadiene copolymer, it is preferable to use a blending weight ratio of .
このほか、PPO系樹脂組成物には、普通、開始剤が用
いられる。開始剤としては、PPO系樹脂組成物を紫外
線硬化型または熱硬化型にするかにより以下の2通りの
ものを選ぶことができるが、これらに限定されない、紫
外線硬化型の光開始剤(すなわち、紫外線照射によりラ
ジカルを発生するもの)としては、ベンゾイン、ベンジ
ル、アリルジアゾニウムフロロはう酸塩、ベンジルメチ
ルケタール、2.2−ジェトキシアセトフェノン、ベン
ゾイルイソブチルエーテル、p−tert−プチルトリ
クロロアセトフエノン、ベンジル(0−エトキシカルボ
ニル)−α−モノオキシム、ビアセチル、アセトフェノ
ン、ベンゾフェノン、ミヒーラーケトン、テトラメチル
チウラムスルフィド、アゾビスイソブチロニトリルなど
がある。熱硬化型の開始剤(すなわち、熱によりラジカ
ルを発生するもの)としては、ジクミルパーオキサイド
、tert−ブチルクミルパーオキサイド、ベンゾイル
パーオキサイド、ジーtert−ブチルパーオキサイド
、2.5−ジメチル−2,5−ジー(tert−ブチル
パーオキシ)ヘキシン−3,2,5−ジメチル−2,5
−ジー(tert−ブチルパーオキシ)ヘキサン、α、
α′−ビス(tert−ブチルパーオキシ−m−イソプ
ロピル)ベンゼン(1,4(または113)−ビス(t
ert−ブチルパーオキシイソプロビル)ベンゼンとも
いう〕などの過酸化物、1−ヒドロキシシクロへキシル
フェニルエドン、2−ヒドロキシ−2−メチル−1−フ
ェニル−プロパン−1−オン、1−(4−イソプロピル
フェニル)−2−ヒドロキシ−2−メチルプロパン−1
−オン、2−クロロチオキサントン、メチルベンゾイル
フォーメー)、4.4−ビスジメチルアミノベンゾフェ
ノン(ミヒラーケトン)、ベンゾインメチルエーテル、
メチル−〇−ベンゾイルベンツ゛エート、α−アジロキ
シムエステル、日本油脂−のビスタミルなどがある。開
始剤は、それぞれ、単独でまたは2つ以上併せて用いて
もよい。In addition, an initiator is usually used in PPO resin compositions. As the initiator, the following two types can be selected depending on whether the PPO resin composition is an ultraviolet curing type or a thermosetting type, but the initiator is not limited to these. Those that generate radicals when irradiated with ultraviolet rays) include benzoin, benzyl, allyldiazonium fluorophosphate, benzyl methyl ketal, 2,2-jethoxyacetophenone, benzoyl isobutyl ether, p-tert-butyltrichloroacetophenone, Examples include benzyl (0-ethoxycarbonyl)-α-monoxime, biacetyl, acetophenone, benzophenone, Michler's ketone, tetramethylthiuram sulfide, and azobisisobutyronitrile. Examples of thermosetting initiators (that is, those that generate radicals by heat) include dicumyl peroxide, tert-butylcumyl peroxide, benzoyl peroxide, di-tert-butyl peroxide, and 2,5-dimethyl-2. ,5-di(tert-butylperoxy)hexyne-3,2,5-dimethyl-2,5
-di(tert-butylperoxy)hexane, α,
α′-bis(tert-butylperoxy-m-isopropyl)benzene (1,4(or 113)-bis(t
ert-butylperoxyisopropyl)benzene], 1-hydroxycyclohexylphenyledone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1-(4- isopropylphenyl)-2-hydroxy-2-methylpropane-1
-one, 2-chlorothioxanthone, methylbenzoylforme), 4,4-bisdimethylaminobenzophenone (Michler's ketone), benzoin methyl ether,
Examples include methyl-0-benzoylbenzoate, α-aziroxime ester, and Nippon Oil's bistamyl. Each of the initiators may be used alone or in combination of two or more.
紫外線による開始剤と熱による開始剤とを併用してもか
まわない。A UV initiator and a thermal initiator may be used in combination.
開始剤の配合割合は、上記の配合割合に対して、0.1
〜5重量部(より好ましくは、0.1〜3重量部)にす
るのが好ましい。開始剤の割合が前記範囲を下回ると、
PPO系樹脂組成物の硬化が不充分となることがあり、
前記範囲を上回ると、硬化後の物性に悪影響を与えるこ
とがある。The blending ratio of the initiator is 0.1 to the above blending ratio.
It is preferable to adjust the amount to 5 parts by weight (more preferably 0.1 to 3 parts by weight). If the proportion of initiator is below the above range,
Curing of the PPO resin composition may be insufficient,
Exceeding the above range may adversely affect the physical properties after curing.
上記配合による原料は、通常、溶剤(溶媒)に溶かして
分散され(無機充填材は、普通、溶けない)、混合(溶
液混合)される。この場合、PPO系樹脂組成物の5〜
50重量%溶液とするのが好ましい。前記溶剤としては
、トリクロロエチレン、トリクロロエタン、クロロホル
ム、塩化メチレン、クロロベンゼンなどのハロゲン化炭
化水素、ベンゼン、トルエン、キシレンなどの芳香族炭
化水素、アセトン、四塩化炭素などがあり、特にトリク
ロロエチレンが好ましく、これらをそれぞれ単独でまた
は2つ以上混合して用いることができるが、これらに限
定されない。なお、混合は他の方法によってもよい。The raw materials according to the above formulation are usually dissolved and dispersed in a solvent (inorganic fillers usually do not dissolve) and mixed (solution mixing). In this case, 5 to 5 of the PPO resin composition
A 50% by weight solution is preferred. Examples of the solvent include halogenated hydrocarbons such as trichloroethylene, trichloroethane, chloroform, methylene chloride, and chlorobenzene, aromatic hydrocarbons such as benzene, toluene, and xylene, acetone, and carbon tetrachloride. Trichlorethylene is particularly preferred; Each of them can be used alone or in combination of two or more, but is not limited thereto. Note that the mixing may be performed by other methods.
このようにして調製されたPPO系樹脂組成物の分散溶
液を基材に含浸させて乾燥させることにより、プリプレ
グを作製する。A prepreg is produced by impregnating a base material with the dispersion solution of the PPO resin composition prepared in this way and drying it.
前記プリプレグは、どのような方法でつくってもよいが
、一般的に以下のような方法でつくることができる。The prepreg may be produced by any method, but generally, it can be produced by the following method.
すなわちPPO系樹脂組成物またはその原料を、上記溶
剤に、たとえば、5〜50重量%の割合で完全溶解(無
機充填材は、普通、溶けない)させ、この溶液中に基材
を浸漬(ディ7ピング)するなどして、基材にこれらの
PPO系樹脂組成物を含浸させ付着させる。この場合、
乾燥などにより溶剤を除去するだけであってもよいし、
半硬化させてBステージにするなどしてもよい。こうし
てつ(るプリプレグの樹脂含有量は、特に限定しないが
、30〜50重量%とするのが好ましい。That is, the PPO resin composition or its raw material is completely dissolved in the above-mentioned solvent at a ratio of, for example, 5 to 50% by weight (inorganic fillers usually do not dissolve), and the base material is immersed (dipped) in this solution. 7) to impregnate and adhere these PPO-based resin compositions to the base material. in this case,
The solvent may be simply removed by drying, or
It may be semi-cured to B stage. The resin content of the prepreg formed in this way is not particularly limited, but is preferably 30 to 50% by weight.
上記のようにして、プリプレグを作製すれば、樹脂を溶
融させなくてもよいので、比較的低温でより容易に行え
る。If the prepreg is produced as described above, there is no need to melt the resin, so it can be done more easily at a relatively low temperature.
基材は、不織布を用いる。このため、上記PPO系樹脂
組成物を含浸させる際に、無機充填材が十分基材に入り
込み、クロス状物に含浸させるときに生じるような不都
合が生じない。不織布の素材としては、特に限定はない
が、ガラス繊維、アラミド繊維、ポリエステル繊維、お
よび、これらの2種あるいはそれ以上の混合系があるが
、このほかの合成繊維、天然繊維などを用いたものでも
よく、それぞれ、単独でまたは2つ以上併せて用いられ
る。また、この発明では、クラフト紙、リンター紙など
の紙も不織布に含める。不織布としては、金属ベース基
板とした場合の物性面からガラス不織布が好ましい。A nonwoven fabric is used as the base material. Therefore, when impregnating the PPO-based resin composition, the inorganic filler sufficiently penetrates into the base material, and the inconvenience that occurs when impregnating a cloth-like object does not occur. There are no particular limitations on the material of the nonwoven fabric, but there are glass fibers, aramid fibers, polyester fibers, and mixtures of two or more of these, and materials using other synthetic fibers, natural fibers, etc. Each may be used alone or in combination of two or more. Furthermore, in the present invention, papers such as kraft paper and linter paper are also included in the nonwoven fabric. As the nonwoven fabric, a glass nonwoven fabric is preferable from the viewpoint of physical properties when used as a metal base substrate.
プリプレグを作製するには、バッチ式の方法、連続式の
方法などいずれの方法によってもよい。The prepreg may be produced by any method such as a batch method or a continuous method.
連続式の方法は、たとえば、つぎのように行われるが、
これに限定するものではない。第2図にみるように、基
材4を連続的にPPO系樹脂組成物の分散溶液5へ供給
し、基材4にPPO系樹脂組成物を含浸させ付着させる
。この基材4をさらに連続的に送って乾燥A(必要に応
じて半硬化させる)を行い、プリプレグ2を得、ロール
などに巻き取る。For example, the continuous method is carried out as follows,
It is not limited to this. As shown in FIG. 2, the base material 4 is continuously supplied to a dispersion solution 5 of the PPO resin composition, and the base material 4 is impregnated with the PPO resin composition and adhered thereto. This base material 4 is further continuously fed and subjected to drying A (semi-curing if necessary) to obtain a prepreg 2, which is wound onto a roll or the like.
なお、樹脂成分と無機充填材、不織布の界面における密
着性を改良するために、通常の方法に従い、カップリン
グ剤を用いてもよい。In addition, in order to improve the adhesion at the interface between the resin component, the inorganic filler, and the nonwoven fabric, a coupling agent may be used according to a conventional method.
金属箔としては、銅箔、アルミニウム箔等が用いられ、
金属ベースとしては、アルミニウム板、鉄板等の金属板
が用いられる。また、特に限定されないが、金属箔の厚
みは10〜70Irm(より好ましくは15〜50−)
程度、金属ベースの厚みは0.1〜10鶴(より好まし
くは0.2〜5鶴)程度が適当である。Copper foil, aluminum foil, etc. are used as the metal foil.
As the metal base, a metal plate such as an aluminum plate or an iron plate is used. Although not particularly limited, the thickness of the metal foil is 10 to 70 Irm (more preferably 15 to 50 Irm).
The appropriate thickness of the metal base is about 0.1 to 10 mm (more preferably 0.2 to 5 mm).
絶縁層の厚みは、電気的絶縁に支障がなければ特に限定
はない。たとえば、0.05〜0.5fl程度の厚みと
される。絶縁層は、1枚のプリプレグを用いて形成され
てもよく、2枚以上のプリプレグを用いて形成されても
よい。The thickness of the insulating layer is not particularly limited as long as it does not interfere with electrical insulation. For example, the thickness is about 0.05 to 0.5 fl. The insulating layer may be formed using one prepreg or two or more prepregs.
上記のようなプリプレグおよび金属ベース、必要に応じ
て上記のような金属箔を用い、たとえば、以下のように
して積層板をつくるが、これに限定されない。または、
上記のようにして作製したプリプレグを所定の設計厚み
となるように所定枚組み合わせ、これを金属箔と金属ベ
ースとの間にはさむようにして積層し、加熱圧締する等
して樹脂を溶融させて、金属箔とプリプレグと金属ベー
スを互いに接着させて積層板を得る。この融着のみによ
り強固な接着が得られるが、このときの加熱でラジカル
開始剤による架橋反応が行われれば、いっそう強固な接
着が得られるようになる。架橋反応は紫外線照射などに
より行われてもよい。A laminate is produced, for example, in the following manner using the prepreg and metal base as described above and, if necessary, the metal foil as described above, but the method is not limited thereto. or
A predetermined number of sheets of the prepreg produced as described above are assembled to have a predetermined design thickness, and this is laminated by being sandwiched between metal foil and a metal base, and the resin is melted by heating and pressing, etc. , the metal foil, prepreg and metal base are adhered to each other to obtain a laminate. Strong adhesion can be obtained by this fusion alone, but even stronger adhesion can be obtained if a crosslinking reaction using a radical initiator is performed by heating at this time. The crosslinking reaction may be carried out by ultraviolet irradiation or the like.
熱架橋、光架橋が行われないときには、放射線照射によ
る架橋を行えばよい、また、熱架橋、光架橋が行われた
あとに放射線照射による架橋を行ってもよい、したがっ
て、プリプレグ同士、プリプレグと金属ベース、プリプ
レグと金属箔などの間で耐熱性の優れた接着が実現でき
るのである。When thermal crosslinking and photocrosslinking are not performed, crosslinking by radiation irradiation may be performed.Furthermore, crosslinking by radiation irradiation may be performed after thermal crosslinking and photocrosslinking. This makes it possible to create adhesives with excellent heat resistance between metal bases, prepregs, and metal foils.
プリプレグ同士、プリプレグと金属ベース、プリプレグ
と金属箔の接着は、それぞれ、プリプレグの熱融着性を
利用できるので、積層圧締温度はプリプレグのガラス転
移点以上で、だいたい160〜300℃ぐらいの範囲が
好ましい。ppo系樹脂組成物の固化物では硬化前に若
干樹脂が流れるので金属に対して良好な融着性を示す。For adhesion between prepregs, between prepregs and metal bases, and between prepregs and metal foils, the heat fusion properties of prepregs can be utilized, so the lamination compaction temperature is above the glass transition point of the prepregs, and is approximately in the range of 160 to 300℃. is preferred. In a solidified product of a PPO resin composition, the resin flows slightly before curing, so it exhibits good fusion properties to metals.
ただし、接着剤を併用しても構わない。However, an adhesive may be used in combination.
積層板をつくる場合、導体層としては、たとえば、金属
層があり、金属層としては、たとえば、銅箔、アルミニ
ウム箔等の金属箔が用いられる。When making a laminate, the conductor layer is, for example, a metal layer, and the metal layer is, for example, a metal foil such as copper foil or aluminum foil.
金属箔は、接着表面が平滑でかつ導電性の良いものが、
誘電性を良好にする上で好ましい。または、蒸着などに
より金属層を形成してもよく、その他、サブトラクティ
ブ法、アディティブ法(フルアディティブ法、セミアデ
ィティブ法)などにより所望の導体(回路、電極など)
として形成してもよく、特に限定はない。The metal foil has a smooth adhesive surface and good conductivity.
This is preferable in terms of improving dielectric properties. Alternatively, a metal layer may be formed by vapor deposition, or a desired conductor (circuit, electrode, etc.) may be formed by a subtractive method, an additive method (full additive method, semi-additive method), etc.
It may be formed as, and there is no particular limitation.
圧締は、プリプレグ同士、プリプレグと金属ベース、プ
リプレグと金属箔などの接着、および、積層板の厚み調
整のために行うので、圧締条件は必要に応じて選択され
る。Pressing is performed to bond the prepregs to each other, to the metal base, to the prepreg and the metal foil, and to adjust the thickness of the laminate, so the pressing conditions are selected as necessary.
また、この発明に用いるppo系樹脂組成物を加熱によ
り架橋させる場合、架橋反応は、使用する開始剤の反応
温度等に依存するので、開始剤の種類に応じて加熱温度
を選ぶとよい。加熱時間も開始剤等の種類に応じて選ぶ
とよい。たとえば、温度150〜300℃、時間10〜
60分間程度である。圧締のための圧力は、たとえば、
50kg/d程度とするのがよい。あらかじめ、前記プ
リプレグを所定枚加熱積層成形しておき、これを金属ベ
ースと金属箔の間に挟むようにして重ね合わせて、再び
加熱圧締するようであっても良い。Furthermore, when crosslinking the PPO resin composition used in the present invention by heating, the crosslinking reaction depends on the reaction temperature of the initiator used, so the heating temperature should be selected depending on the type of initiator. The heating time may also be selected depending on the type of initiator, etc. For example, temperature 150~300℃, time 10~
The duration is approximately 60 minutes. The pressure for clamping is, for example,
It is preferable to set it to about 50 kg/d. A predetermined number of sheets of the prepreg may be heated and laminated in advance, and the prepregs may be sandwiched between a metal base and a metal foil, stacked one on top of the other, and heated and pressed again.
架橋性ポリマとして放射線架橋性ポリマを用い、架橋性
モノマとして放射線架橋性モノマを用いた場合は、金属
箔および金属ベースと、プリプレグを接着した後、放射
線架橋を行うと良い。When a radiation crosslinkable polymer is used as the crosslinkable polymer and a radiation crosslinkable monomer is used as the crosslinkable monomer, radiation crosslinking is preferably performed after bonding the prepreg to the metal foil and metal base.
このようにして得られた積層板は、PPO,架橋性ポリ
マおよび/または架橋性モノマが用いられているので、
極めて耐熱性および電気特性に優れている。また、基材
として不織布を用いているので、プリプレグが熱伝導性
の良い無機充填材を十分に含んでおり、得られた積層板
は、非常に熱放散性に優れている。しかも、ppo系樹
脂組成物が無機充填材を含むので、それらの特性に加え
て、寸法安定性がいっそう向上し、耐溶剤性も向上する
といった効果が得られる。製造操作も、前記のように簡
単である。Since the thus obtained laminate uses PPO, a crosslinkable polymer and/or a crosslinkable monomer,
Excellent heat resistance and electrical properties. Furthermore, since a nonwoven fabric is used as the base material, the prepreg sufficiently contains an inorganic filler with good thermal conductivity, and the obtained laminate has excellent heat dissipation properties. Moreover, since the PPO resin composition contains an inorganic filler, in addition to these properties, dimensional stability is further improved and solvent resistance is also improved. The manufacturing operation is also simple as described above.
つぎに、実施例および比較例を説明するが、この発明は
実施例に限定されない。Next, Examples and Comparative Examples will be described, but the present invention is not limited to the Examples.
(実施例1)
PPO単体25重量部、架橋性ポリマとしてスチレンブ
タジェンコポリマ(S B S、旭化成工業側アサプレ
ン)5重量部および1.2−ポリブタジェン(1,2−
PBu、日本曹達■製)3重量部、架橋性モノマとして
トリアリルイソシアヌレ−)(TAIC1日本化成■製
)3重量部、反応開始剤として2.5−ジメチル−2,
5−ジー(tert−ブチルパーオキシ)ヘキシン−3
(日本油脂■製のパーへキシン25B)0.5重量部を
トリクロロエチレンに溶解させてほぼ20重量%濃度の
溶液とし、これに無機充填材として酸化マグネシウム(
MgO)を180重量部加えて、脱泡装置付反応器で均
質になるまで十分に攪拌した。このあと、脱泡を行い、
溶液ブレンド物となったPPO系樹脂組成物を得た。(Example 1) 25 parts by weight of PPO alone, 5 parts by weight of styrene-butadiene copolymer (SBS, Asaprene manufactured by Asahi Kasei Corporation) as a crosslinkable polymer, and 1,2-polybutadiene (1,2-
3 parts by weight of PBu (manufactured by Nippon Soda ■), 3 parts by weight of triallylisocyanuride (TAIC1 manufactured by Nippon Kasei ■) as a crosslinking monomer, 2.5-dimethyl-2, as a reaction initiator
5-di(tert-butylperoxy)hexyne-3
Dissolve 0.5 parts by weight of Perhexin 25B (manufactured by NOF ■) in trichlorethylene to make a solution with a concentration of approximately 20% by weight, and add magnesium oxide (as an inorganic filler) to this solution.
180 parts by weight of MgO) was added, and the mixture was sufficiently stirred in a reactor equipped with a defoaming device until the mixture became homogeneous. After this, defoaming is performed,
A PPO resin composition which became a solution blend was obtained.
このPPO系樹脂組成物をガラス不織布(旭シュニーベ
ル■製)に含浸させた。そのまま風乾させ、さらに乾燥
機で50℃で10分間乾燥させた後、さらに120℃で
30分間乾燥させた。このようにして得られたプリプレ
グの片面に18−厚の銅箔を、もう片面に厚み1.01
1のアルミニウム板をそれぞれ重ね合わせ、240℃、
50kg/adの条件で30分間圧締して積層板を得た
。A glass nonwoven fabric (manufactured by Asahi Schniebel ■) was impregnated with this PPO-based resin composition. It was air-dried as it was, further dried in a dryer at 50°C for 10 minutes, and then further dried at 120°C for 30 minutes. A 18-thick copper foil is placed on one side of the prepreg thus obtained, and a 1.01-thick copper foil is placed on the other side.
1 aluminum plates were stacked on top of each other and heated at 240°C.
A laminate was obtained by pressing at 50 kg/ad for 30 minutes.
(実施例2〜7)
第1表に示されている配合の原材料を用いるようにした
ほかは、実施例1と同様にして積層板を作製した。(Examples 2 to 7) Laminated plates were produced in the same manner as in Example 1, except that the raw materials having the composition shown in Table 1 were used.
(比較例1〜7)
第1表に示されている配合の原材料を用いるとともに、
基材としてガラスクロス(旭シュニーベル■製)を用い
てプリプレグを作製した。実施例1で使用したプリプレ
グの代わりに、このプリプレグを使用したほかは、実施
例1と同様にして積層板を作製した。(Comparative Examples 1 to 7) Using raw materials with the composition shown in Table 1,
A prepreg was produced using glass cloth (manufactured by Asahi Schniebel ■) as a base material. A laminate was produced in the same manner as in Example 1, except that this prepreg was used instead of the prepreg used in Example 1.
(比較例8)
エポキシ樹脂をガラスクロスに含浸させ、プリプレグを
作製した。実施例1で用いたプリプレグの代わりにこの
プリプレグを用いたほかは、実施例1と同様にして積層
板を作製した。(Comparative Example 8) A prepreg was produced by impregnating glass cloth with an epoxy resin. A laminate was produced in the same manner as in Example 1, except that this prepreg was used instead of the prepreg used in Example 1.
実施例1〜7および比較例1〜8で得られた積層板につ
き、物性を調べた結果を第1表と示した。ただし、反り
については、3001mX300wmに成形された積層
板の片面の銅箔をエツチングによって全面除去したのち
、平面上に、積層板の除去面を上方にして置いたときの
各角部と平面間の平均距離を測定することとした。Table 1 shows the results of examining the physical properties of the laminates obtained in Examples 1 to 7 and Comparative Examples 1 to 8. However, regarding warpage, after removing the entire copper foil on one side of a laminate formed to a size of 3001m x 300wm by etching, the laminate is placed on a flat surface with the removed side facing upward, and between each corner and the flat surface. We decided to measure the average distance.
第1表にみるように、実施例1〜7の各積層板の熱伝導
率は、樹脂のみを含浸させた比較例8の積層板のものよ
りも高く、熱放散性の良いことがわかる。また、実施例
1〜7の積層板と比較例1〜7の積層板とを比べると、
同じ無機充填材を同じ量だけ用いた場合、クロス状物の
基材を用いるよりも不織布を用いる方が、積層板の熱伝
導率が高く、熱放散性の良いことがわかる。しかも、実
施例1〜7の積層板は、比較例8の積層板よりも半田耐
熱性および誘電正接が良好である。反りは、実施例1〜
7の積層板と比較例1〜8のものとほぼ同等であるかそ
れ以上であり、優れている。As shown in Table 1, the thermal conductivity of each of the laminates of Examples 1 to 7 is higher than that of the laminate of Comparative Example 8 impregnated with only resin, indicating that the laminates have good heat dissipation properties. Moreover, when comparing the laminates of Examples 1 to 7 and the laminates of Comparative Examples 1 to 7,
It can be seen that when the same amount of the same inorganic filler is used, the thermal conductivity of the laminate is higher and the heat dissipation property is better when a nonwoven fabric is used than when a cloth-like base material is used. Moreover, the laminates of Examples 1 to 7 have better solder heat resistance and dielectric loss tangent than the laminate of Comparative Example 8. The warpage is from Example 1 to
The laminates of No. 7 and Comparative Examples 1 to 8 are approximately equal to or better than those of Comparative Examples 1 to 8, and are excellent.
絶縁抵抗も、実施例1〜7の積層板と比較例1〜8のも
のとほぼ同等である。The insulation resistance is also approximately the same as that of the laminates of Examples 1 to 7 and Comparative Examples 1 to 8.
この発明の積層板は、以上にみてきたように、PP01
架橋性ポリマおよび/または架橋性モノマ、ならびに、
無機充填材を含むPPO系樹脂組成物が含浸されている
プリプレグが絶縁層として用いられており、基材として
不織布が用いられていて、前記無機充填材が20℃で0
.115(ca1/3・S・℃〕以上の熱伝導率を持つ
ので、十分な熱放散性を有し、しかも、耐熱性、電気特
性および寸法安定性にも優れている。As seen above, the laminate of this invention has PP01
a crosslinkable polymer and/or a crosslinkable monomer, and
A prepreg impregnated with a PPO resin composition containing an inorganic filler is used as an insulating layer, a nonwoven fabric is used as a base material, and the inorganic filler is
.. Since it has a thermal conductivity of 115 (ca1/3·S·°C) or higher, it has sufficient heat dissipation properties and is also excellent in heat resistance, electrical properties, and dimensional stability.
第1図は金属ベース基板の層構成の1例をあられす分解
断面図、第2図はプリプレグ作製の1例をあられす模式
図、第3図は各種物質の熱伝導率をあられすグラフであ
る。
1・・・金属箔 2・・・プリプレグ 3・・・金属ベ
ース(金属板)
代理人 弁理士 松 本 武 彦
第1図
第2図
第3図Figure 1 is an exploded cross-sectional view of an example of the layer structure of a metal base substrate, Figure 2 is a schematic diagram of an example of prepreg production, and Figure 3 is a graph of the thermal conductivity of various materials. be. 1... Metal foil 2... Prepreg 3... Metal base (metal plate) Agent Patent attorney Takehiko Matsumoto Figure 1 Figure 2 Figure 3
Claims (2)
れている積層板において、前記プリプレグは、基材とし
て不織布が用いられていて、ポリフェニレンオキサイド
、架橋性ポリマおよび/または架橋性モノマ、ならびに
、無機充填材を含むポリフェニレンオキサイド系樹脂組
成物が含浸されており、前記無機充填材が20℃で0.
115〔cal/cm・s・℃〕以上の熱伝導率を持つ
ことを特徴とする積層板。(1) In a laminate in which a prepreg is used as an insulating layer on a metal base, the prepreg uses a nonwoven fabric as a base material, and contains polyphenylene oxide, a crosslinkable polymer and/or a crosslinkable monomer, and an inorganic It is impregnated with a polyphenylene oxide resin composition containing a filler, and the inorganic filler has a temperature of 0.
A laminate having a thermal conductivity of 115 [cal/cm・s・℃] or more.
フェニレンオキサイドを10〜95重量部、架橋性ポリ
マを5〜50重量部および/または架橋性モノマを1〜
50重量部、無機充填材を1〜500重量部の割合でそ
れぞれ含む特許請求の範囲第1項記載の積層板。(2) The polyphenylene oxide resin composition contains 10 to 95 parts by weight of polyphenylene oxide, 5 to 50 parts by weight of a crosslinkable polymer, and/or 1 to 10 parts by weight of a crosslinkable monomer.
50 parts by weight and an inorganic filler in a proportion of 1 to 500 parts by weight, respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30673086A JPS63159443A (en) | 1986-12-23 | 1986-12-23 | Laminate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30673086A JPS63159443A (en) | 1986-12-23 | 1986-12-23 | Laminate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63159443A true JPS63159443A (en) | 1988-07-02 |
Family
ID=17960606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30673086A Pending JPS63159443A (en) | 1986-12-23 | 1986-12-23 | Laminate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63159443A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5834565A (en) * | 1996-11-12 | 1998-11-10 | General Electric Company | Curable polyphenylene ether-thermosetting resin composition and process |
WO2007094359A1 (en) * | 2006-02-17 | 2007-08-23 | Hitachi Chemical Co., Ltd. | Thermocurable resin composition comprising semi-ipn-type complex, and varnish, prepreg and metal-clad laminate sheet using the same |
JP2007302876A (en) * | 2006-04-13 | 2007-11-22 | Hitachi Chem Co Ltd | Resin composition of semi-ipn type composite and varnish, prepreg and metal-clad laminate each using the same composition |
JP2007302877A (en) * | 2006-04-14 | 2007-11-22 | Hitachi Chem Co Ltd | Thermosetting resin composition of ipn type composite, and varnish, prepreg and metal-clad laminate using the same |
US7336795B2 (en) | 2002-02-15 | 2008-02-26 | Sharp Kabushiki Kaisha | Card sound device and electronic apparatus having same |
JP2008095061A (en) * | 2006-02-17 | 2008-04-24 | Hitachi Chem Co Ltd | Thermosetting resin composition of semi-ipn-type compound material, and varnish, prepreg and metal-clad laminate board using the same |
JP2008133414A (en) * | 2006-10-24 | 2008-06-12 | Hitachi Chem Co Ltd | New semi-ipn type composite material-containing thermosetting resin composition and varnish, prepreg and metal clad laminate using the same |
WO2008136373A1 (en) * | 2007-04-26 | 2008-11-13 | Hitachi Chemical Company, Ltd. | Process for producing resin varnish containing semi-ipn composite thermosetting resin and, provided using the same, resin varnish for printed wiring board, prepreg and metal-clad laminate |
JP2008291214A (en) * | 2007-04-25 | 2008-12-04 | Hitachi Chem Co Ltd | Method for producing resin varnish containing thermosetting resin of semi-ipn-type compound material, resin varnish for printed wiring board, prepreg, and metal-clad laminated board |
WO2010070890A1 (en) * | 2008-12-18 | 2010-06-24 | パナソニック株式会社 | Prepreg, process for production thereof, and printed wiring board using same |
US9642249B2 (en) | 2013-04-30 | 2017-05-02 | Industrial Technology Research Institute | Resin composition, prepreg, and substrate employing the same |
-
1986
- 1986-12-23 JP JP30673086A patent/JPS63159443A/en active Pending
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5834565A (en) * | 1996-11-12 | 1998-11-10 | General Electric Company | Curable polyphenylene ether-thermosetting resin composition and process |
US7336795B2 (en) | 2002-02-15 | 2008-02-26 | Sharp Kabushiki Kaisha | Card sound device and electronic apparatus having same |
US7876916B2 (en) | 2002-02-15 | 2011-01-25 | Sharp Kabushiki Kaisha | Card-type sound apparatus and electronic appliance provided therewith |
US8501870B2 (en) | 2006-02-17 | 2013-08-06 | Hitachi Chemical Co., Ltd. | Thermosetting resin composition of semi-IPN composite, and varnish, prepreg and metal clad laminated board using the same |
WO2007094359A1 (en) * | 2006-02-17 | 2007-08-23 | Hitachi Chemical Co., Ltd. | Thermocurable resin composition comprising semi-ipn-type complex, and varnish, prepreg and metal-clad laminate sheet using the same |
JP2008095061A (en) * | 2006-02-17 | 2008-04-24 | Hitachi Chem Co Ltd | Thermosetting resin composition of semi-ipn-type compound material, and varnish, prepreg and metal-clad laminate board using the same |
US8568891B2 (en) | 2006-02-17 | 2013-10-29 | Hitachi Chemical Company, Ltd. | Thermosetting resin composition of semi-IPN composite, and varnish, prepreg and metal clad laminated board using the same |
KR101321235B1 (en) * | 2006-02-17 | 2013-10-25 | 히타치가세이가부시끼가이샤 | Thermocurable resin composition comprising semi-ipn-type complex, and varnish, prepreg and metal-clad laminate sheet using the same |
US8277948B2 (en) | 2006-02-17 | 2012-10-02 | Hitachi Chemical Co., Ltd. | Thermosetting resin composition of semi-IPN composite, and varnish, prepreg and metal clad laminated board using the same |
JP2007302876A (en) * | 2006-04-13 | 2007-11-22 | Hitachi Chem Co Ltd | Resin composition of semi-ipn type composite and varnish, prepreg and metal-clad laminate each using the same composition |
JP2007302877A (en) * | 2006-04-14 | 2007-11-22 | Hitachi Chem Co Ltd | Thermosetting resin composition of ipn type composite, and varnish, prepreg and metal-clad laminate using the same |
JP2008133414A (en) * | 2006-10-24 | 2008-06-12 | Hitachi Chem Co Ltd | New semi-ipn type composite material-containing thermosetting resin composition and varnish, prepreg and metal clad laminate using the same |
JP2008291214A (en) * | 2007-04-25 | 2008-12-04 | Hitachi Chem Co Ltd | Method for producing resin varnish containing thermosetting resin of semi-ipn-type compound material, resin varnish for printed wiring board, prepreg, and metal-clad laminated board |
US8404769B2 (en) | 2007-04-26 | 2013-03-26 | Hitachi Chemical Company, Ltd. | Process for producing resin varnish containing semi-IPN composite thermosetting resin and, provided using the same, resin varnish for printed wiring board, prepreg and metal-clad laminate |
WO2008136373A1 (en) * | 2007-04-26 | 2008-11-13 | Hitachi Chemical Company, Ltd. | Process for producing resin varnish containing semi-ipn composite thermosetting resin and, provided using the same, resin varnish for printed wiring board, prepreg and metal-clad laminate |
KR101491188B1 (en) * | 2007-04-26 | 2015-02-06 | 히타치가세이가부시끼가이샤 | Process for producing resin varnish containing semi-ipn composite thermosetting resin and, resin varnish for printed wiring board, prepreg and metal-clad laminate provided using the same |
WO2010070890A1 (en) * | 2008-12-18 | 2010-06-24 | パナソニック株式会社 | Prepreg, process for production thereof, and printed wiring board using same |
US9642249B2 (en) | 2013-04-30 | 2017-05-02 | Industrial Technology Research Institute | Resin composition, prepreg, and substrate employing the same |
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