JPS63120694A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS63120694A JPS63120694A JP61268167A JP26816786A JPS63120694A JP S63120694 A JPS63120694 A JP S63120694A JP 61268167 A JP61268167 A JP 61268167A JP 26816786 A JP26816786 A JP 26816786A JP S63120694 A JPS63120694 A JP S63120694A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- semiconductor device
- card
- resistant resin
- resin body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 59
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229920006015 heat resistant resin Polymers 0.000 claims description 38
- 229920005989 resin Polymers 0.000 claims description 33
- 239000011347 resin Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 23
- 238000001721 transfer moulding Methods 0.000 claims description 11
- 229920001187 thermosetting polymer Polymers 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 5
- 238000007789 sealing Methods 0.000 description 15
- 239000002184 metal Substances 0.000 description 9
- 238000005452 bending Methods 0.000 description 7
- 238000000227 grinding Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920006332 epoxy adhesive Polymers 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000019589 hardness Nutrition 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
Landscapes
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Credit Cards Or The Like (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、薄型化(130規格0.76+n)を要求
されているICカードにおける半導体装置の製造方法に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a semiconductor device in an IC card, which is required to be thin (0.76+n according to the 130 standard).
本発明は、ICカード製造において、回路パターンを存
する絶縁基板上に半導体素子を接着固定し、半導体素子
と回路パターンとの対応する電橋を金属細線で結線した
絶縁基板を、絶縁基板外形と同一形状を存するカードで
ある耐熱性樹脂体穴部に挿入拘持し、熱硬化性樹脂のト
ランスファー成形法で半導体素子を封止することにより
、耐熱性樹脂体と封止された半導体装置とが一体構造と
なるようにしたものである。In IC card manufacturing, a semiconductor element is adhesively fixed onto an insulating substrate on which a circuit pattern exists, and the insulating substrate is formed by connecting electric bridges corresponding to the semiconductor element and the circuit pattern with thin metal wires, so that the outer shape of the insulating substrate is the same as that of the insulating substrate. By inserting and holding the heat-resistant resin body, which is a card that has a shape, into the hole and sealing the semiconductor element using thermosetting resin transfer molding, the heat-resistant resin body and the sealed semiconductor device are integrated. It is designed to have a structure.
従来、第3図に示すように、樹脂枠12が接着された回
路パターン2及び2“を有する絶縁基板l上の半導体素
子3が、金属細線4で回路バクーン2に接続され、ボッ
ティング樹脂13で封止され加熱硬化後、樹脂枠12と
ボッティング樹脂13とを同時に平面研削し、耐熱性樹
脂体8と同一の厚みになるようにして得られた半導体装
置15をカードである耐熱性樹脂体穴部8“に挿入し埋
込み、耐熱性樹脂体穴部8°と半導体装置15との隙間
14の一部をエポキシ系接着剤やシリコン樹脂等の緩衝
剤を充填接着し、オーバーシート用フィルムを耐熱性樹
脂体8の両面に被覆接着することにより、ICカードを
製造することが一般に知られている。Conventionally, as shown in FIG. 3, a semiconductor element 3 on an insulating substrate l having circuit patterns 2 and 2'' to which a resin frame 12 is adhered is connected to a circuit backing 2 with a thin metal wire 4, and a botting resin 13 After sealing and heat curing, the resin frame 12 and the botting resin 13 are surface ground at the same time to have the same thickness as the heat resistant resin body 8, and the obtained semiconductor device 15 is made of heat resistant resin as a card. A part of the gap 14 between the heat-resistant resin body hole 8° and the semiconductor device 15 is filled with a buffering agent such as epoxy adhesive or silicone resin and bonded, and an oversheet film is inserted into the body hole 8'' and embedded. It is generally known to manufacture an IC card by coating and adhering a heat-resistant resin material 8 on both sides of the heat-resistant resin body 8.
しかし、従来のボッティングによる封止の後、樹脂枠と
封止剤とを同時に研削して超薄型の半導体装置にし、カ
ードである耐熱性樹脂体穴部に挿入し、埋込んで製造す
るICカードにおいて、以下のような問題点があり、I
Cカードの歩留りを著しく低下させている欠点があった
。However, after sealing with conventional botting, the resin frame and sealant are simultaneously ground to create an ultra-thin semiconductor device, which is then inserted into a hole in the heat-resistant resin body of the card and embedded. There are the following problems with IC cards.
There was a drawback that the yield of C cards was significantly lowered.
(イ)硬度や組成の異なるボッティング樹脂と樹脂枠と
から成る半導体装置の封止部を薄型とするために表面を
研削すると、ポツティング樹脂と樹脂枠(一般的には、
耐熱性ガラスエポキシ基材が多く用いられている。)と
の境界部の一部やボンティング表面に凹みが発生し、オ
ーバーシート後のICカードの製品外観を損ねること。(b) When the surface of the encapsulation part of a semiconductor device, which consists of a potting resin and a resin frame with different hardnesses and compositions, is ground to make it thinner, the potting resin and the resin frame (generally,
Heat-resistant glass epoxy base materials are often used. ) or on the bonding surface, which may impair the product appearance of the IC card after oversheeting.
(ロ)封止時、ボッティング樹脂がそれ自体に含有した
気泡や樹脂枠穴部側面に巻込んだ気泡が一部残留し、封
止部の研削後、気泡が凹みとして生じ、前記(イ)と同
様に、オーバーシート後のICカードの製品外観を損ね
ること。(b) At the time of sealing, some of the air bubbles contained in the botting resin itself and air bubbles caught in the side surface of the hole in the resin frame remain, and after grinding the sealing part, the air bubbles form a dent. ), it also damages the product appearance of the IC card after oversheeting.
(ハ)半導体素子を取付ける絶縁基板と半導体素子の厚
みバラツキ及びボッティングされた金属細線のルーピン
グ高さのバラツキの組合わせが全体的に高くなって製造
された半導体装置を研削すると、金属細線の最上部を覆
うボッティング樹脂が薄くもろくなり、金属細線の露出
による外観不具合や信鯨性における気密性の劣化をもた
らすこと。(c) When grinding a semiconductor device manufactured with a combination of variations in the thickness of the insulating substrate on which the semiconductor element is attached and the semiconductor element, and variations in the looping height of the thin metal wire that has been bobbed, the overall height of the looping height of the thin metal wire increases. The botting resin covering the top part becomes thin and brittle, resulting in appearance defects due to exposure of thin metal wires and deterioration of airtightness in reliability.
(ニ)耐熱性樹脂体穴部に挿入埋込まれた半導体装置と
耐熱性樹脂体穴部との境界には隙間が生じ、ICカード
の耐曲げ応力性の維持やオーバーシート後の隙間に残る
気泡による製品外観の不具合の対策のため、この隙間に
は熱硬化性樹脂やシリコン系樹脂を充填する。しかしな
がら、これらの樹脂の充填量が多いと耐熱性樹脂体の厚
み方向に樹脂が凸状に境界部に沿って生じ、オーバーシ
ート後の製品外観を撮ねること。(d) A gap is created at the boundary between the semiconductor device inserted and embedded in the heat-resistant resin body hole and the heat-resistant resin body hole, and it remains in the gap after oversheeting to maintain the bending stress resistance of the IC card. To prevent defects in product appearance due to air bubbles, this gap is filled with thermosetting resin or silicone resin. However, if the filling amount of these resins is large, the resin will form a convex shape along the boundary in the thickness direction of the heat-resistant resin body, making it impossible to photograph the appearance of the product after oversheeting.
また、樹脂の充填量が少なければ、接着強度不足による
耐曲げ応力の低下や境界の一部に残った気泡がオーバー
シート後の製品外観を損ねること。In addition, if the amount of resin filled is small, the bending stress resistance will decrease due to insufficient adhesive strength, and air bubbles remaining in a part of the boundary will impair the appearance of the product after oversheeting.
(ホ)超薄型を実現するため、半導体装置の総厚みが0
.5〜0.6 mmに達するように、樹脂枠を含めて研
削加工するが、硬度の低いwA縁縁板板材一部が研削砥
石面に詰まり、作業性や半導体装置封止部の平滑性が得
られず、オーバーシート後の製品外観を損ねること。(e) To achieve ultra-thinness, the total thickness of the semiconductor device is 0.
.. Although the resin frame and the resin frame are ground to a thickness of 5 to 0.6 mm, some of the low-hardness wA edge plate material gets stuck on the grinding wheel surface, resulting in poor workability and the smoothness of the semiconductor device sealing part. unobtainable and spoil the appearance of the product after oversheeting.
(へ)半導体素子は樹脂枠付絶縁基板に取付けられ、ボ
ッティングにより封止される。しかし、ボッティング樹
脂と絶縁基板との熱膨張係数が異なり、また半導体素子
の絶縁基板に対する配置等により封止後の半導体装置に
絶縁基板面を凸とするソリが生じ易い。このため、研削
後の電気特性に対する品質不具合が発生し、半導体装置
の歩留りを低下させていると同時にICカード製造歩留
り低下をも生じさせていること。(f) The semiconductor element is mounted on an insulating substrate with a resin frame and sealed by botting. However, the thermal expansion coefficients of the botting resin and the insulating substrate are different, and due to the arrangement of the semiconductor element with respect to the insulating substrate, etc., warping that makes the surface of the insulating substrate convex is likely to occur in the semiconductor device after sealing. As a result, quality defects occur in electrical characteristics after grinding, which lowers the yield of semiconductor devices and at the same time lowers the yield of IC card manufacturing.
そこで、この発明は従来のような欠点を解決するため、
ワイヤーボンティングにより金属細線で結合された半導
体素子を載置した絶縁基板と、カードである耐熱性樹脂
体とを一体とした状態で、トランスファー成形法により
封止を行ない、封止部が耐熱性樹脂体との境界部を含ん
で並行平滑に達し、かつ耐熱性樹脂体と同一厚みが実現
するICカードを製造し得ることを目的としている。Therefore, in order to solve the conventional drawbacks, this invention
The insulating substrate on which the semiconductor element is mounted, bonded by thin metal wires by wire bonding, and the heat-resistant resin body that is the card are integrated, and then sealed using transfer molding, so that the sealed part is heat-resistant. The object is to manufacture an IC card that is parallel and smooth including the boundary with the resin body and has the same thickness as the heat-resistant resin body.
〔問題点を解決するための手段〕
上記問題点を解決するために、この発明は、カードであ
る耐熱性樹脂体穴部に挿入拘持された絶縁板板上の金属
細線で結合された半導体素子の封止をトランスファー成
形法により行ない、耐熱性樹脂体と半導体装置とを一体
成形とする構造とし、歩留り及び品質を向上することを
図った。[Means for Solving the Problems] In order to solve the above problems, the present invention provides a semiconductor bonded by thin metal wires on an insulating plate inserted and held in a hole in a heat-resistant resin body of a card. The device was sealed by transfer molding, and the heat-resistant resin body and the semiconductor device were integrally molded to improve yield and quality.
上記のような構造を用いて、ICカードを製造すると、
カードである耐熱性樹脂体と同一厚みの半導体装置が得
られ、従来のボッティング封止構造の半導体装置で行な
っていた研磨工程が不要となり、かつ耐熱性樹脂体と半
導体装置との境界部分や封止表面に発生していた凹みが
なくなり、半導体装置面が平滑になり、耐熱性樹脂体穴
部と半導体装置の封止用熱硬化性樹脂とが密着され、さ
らにカードの曲げ応力に対し、抜けにくいというICカ
ードを製造することができるのである。When an IC card is manufactured using the above structure,
A semiconductor device with the same thickness as the heat-resistant resin body that is the card can be obtained, and the polishing process that was required for semiconductor devices with a conventional botting-sealed structure is not necessary, and the boundary between the heat-resistant resin body and the semiconductor device can be removed. The dents that had occurred on the sealing surface are eliminated, the surface of the semiconductor device becomes smooth, the heat-resistant resin body hole and the thermosetting resin for sealing the semiconductor device are in close contact, and the bending stress of the card is reduced. This makes it possible to manufacture IC cards that are difficult to remove.
以下にこの実施例を図面に基づいて説明する。 This embodiment will be explained below based on the drawings.
第1図は本発明による耐熱性樹脂体8と半導体装置15
とが一体構造となったICカードの断面図である。第2
図においては、一体構造ICカードの製造過程を順に示
す、まず、第2図falは少なくとも両面パターン2.
2′を存する絶縁基板1上にCPUやメモリICや静電
耐圧ダイオードアレイ等のチップ、またはこれらの機能
を1チツプ化したICチップ等の半導体素子3がエポキ
シ系接着剤でsIW固定された後、半導体素子3上の電
極と回路パターン2とは金属細線4で結合されている封
止前の半導体装置の実装断面図である。ICカードにお
ける電極となる絶縁基板1の下面上にある回路パターン
2′と回路パターン2とはスルーホール5で絶縁基板1
を介して接続されているが、回路パターン2側には、ソ
ルダーレジスト6がスルーホール5を覆ってあり、トラ
ンスファー成形時に熱硬化性樹脂7がスルーホール5か
ら回路パターン2“側へ漏れ出すのを防止しているので
ある。第2図(blは、カードである耐熱性樹脂体8の
穴部8′の上端で実装された絶縁基板1が半導体素子3
を下側にして挿入拘持された耐熱性樹脂体8をトランス
ファー成形金型に!!置され、かつ下型ブロック9と上
側ブロック10とによって加圧保持されている状態の断
面図である。半導体素子3はランナー1)に導かれゲル
化した熱硬化性樹脂7がゲート1)′を通して半導体装
置15内に注入され、第1図に示すような耐熱性樹脂体
8と半導体装置15が一体構造となったICカードが製
造されるのである。第2図(C1は、トランスファー成
形金型から成形後取り出された状態の平面図を示す。す
なわち半導体装置15はランナー1)により支持されて
いるが、ゲート1)°付近を折り取ることで、ランナー
1)から切り離されICカードが得られるのである。こ
の際ゲート1)°部には若干樹脂の凹凸が残るが、これ
は刃具等で研削することにより容易に平滑にすることが
可能である。FIG. 1 shows a heat-resistant resin body 8 and a semiconductor device 15 according to the present invention.
FIG. 2 is a sectional view of an IC card having an integrated structure. Second
In the figures, the manufacturing process of the integrated structure IC card is sequentially shown. First, FIG.
After a semiconductor element 3 such as a CPU, a memory IC, an electrostatic voltage diode array, etc., or an IC chip with these functions integrated into one chip is fixed to the insulating substrate 1 with an epoxy adhesive on the insulating substrate 1 containing the 2'. , is a mounting sectional view of the semiconductor device before sealing, in which electrodes on the semiconductor element 3 and the circuit pattern 2 are connected by thin metal wires 4. The circuit pattern 2' on the bottom surface of the insulating substrate 1, which becomes the electrode in the IC card, and the circuit pattern 2 are connected to the insulating substrate 1 through the through hole 5.
However, on the circuit pattern 2 side, a solder resist 6 covers the through hole 5 to prevent thermosetting resin 7 from leaking from the through hole 5 to the circuit pattern 2'' side during transfer molding. Figure 2 (bl) shows that the insulating substrate 1 mounted at the upper end of the hole 8' of the heat-resistant resin body 8, which is a card, is connected to the semiconductor element 3.
The heat-resistant resin body 8 inserted and held with the side facing downward is placed in the transfer molding mold! ! FIG. 2 is a cross-sectional view of the mold placed in the mold and held under pressure by a lower mold block 9 and an upper block 10. The semiconductor element 3 is guided by the runner 1), and the gelled thermosetting resin 7 is injected into the semiconductor device 15 through the gate 1)', and the heat-resistant resin body 8 and the semiconductor device 15 are integrated as shown in FIG. An IC card with this structure is manufactured. FIG. 2 (C1 shows a plan view of the state taken out from the transfer molding die after molding. That is, the semiconductor device 15 is supported by the runner 1), but by breaking off the vicinity of the gate 1), The IC card is obtained by separating it from the runner 1). At this time, some resin unevenness remains on the gate 1), but this can be easily smoothed by grinding with a cutting tool or the like.
第3図は従来のICカード用半導体装置の断面構造を示
す。この構造では、耐熱性樹脂体穴部8′と半導体装置
15の樹脂枠との間には隙間14が残るため、樹脂によ
る充填接着が必要となることがわかる。FIG. 3 shows a cross-sectional structure of a conventional IC card semiconductor device. It can be seen that in this structure, a gap 14 remains between the heat-resistant resin body hole 8' and the resin frame of the semiconductor device 15, so that filling and bonding with resin is required.
第4図+a+ 、 (bl 、 (C1は、ICカード
が利用される際に発生し易い折り曲げ応力による半導体
装置15の耐熱性樹脂体8からの抜は出し防止を配慮し
、耐熱性樹脂体穴部8゛側面に段差16や面取り17を
設けたり、絶縁基板1の周縁を受ける段差16を設けた
一体構造のICカードの例を示すものである。Figure 4 +a+, (bl, (C1) is a heat-resistant resin body hole designed to prevent the semiconductor device 15 from being pulled out of the heat-resistant resin body 8 due to bending stress that is likely to occur when an IC card is used. This is an example of an integrated IC card in which a step 16 or a chamfer 17 is provided on the side surface of the portion 8' or a step 16 is provided to receive the periphery of the insulating substrate 1.
以上のような実施例において、ICカードはトランスフ
ァー成形法により耐熱性樹脂体8と半導体装置15とが
一体構造となり、折り曲げ応力に対する抜は出し防止が
可能となり、半導体装置15と耐熱性樹脂体8とが同一
の厚みとなり、封止部の平滑なICカードが得られる。In the embodiments described above, the IC card has an integrated structure in which the heat-resistant resin body 8 and the semiconductor device 15 are formed by transfer molding, and it is possible to prevent the semiconductor device 15 and the heat-resistant resin body 8 from being pulled out due to bending stress. and have the same thickness, and an IC card with a smooth sealing part can be obtained.
この発明は以上説明したように、半導体素子の封止を耐
熱性樹脂体に組込んでトランスファー成形法で行なうこ
とにより、ICカードの半導体装置に要求される超薄型
化が研削工程を必要とせずに実現できるため、製造工程
が合理化され、封止部の表面が平滑になることや耐熱性
樹脂体と半導体装置との境界部に凹凸がなくなることか
ら、オーバーシート後の製品外観が向上し、一体構造封
止のため、半導体素子に対する気密性や折り曲げ応力に
対する耐久性が向上することにより、ICカードの製造
歩留り及び品質が改善される効果がある。As explained above, the present invention incorporates the sealing of a semiconductor element into a heat-resistant resin body and performs the transfer molding process, thereby achieving the ultra-thin design required for semiconductor devices of IC cards without the need for a grinding process. This streamlines the manufacturing process and improves the appearance of the product after oversheeting, as the surface of the sealing part becomes smooth and there are no irregularities at the interface between the heat-resistant resin body and the semiconductor device. Since the integrated structure sealing improves the airtightness of the semiconductor element and the durability against bending stress, it has the effect of improving the manufacturing yield and quality of the IC card.
第1図は、この発明に係わるICカードの一体構造の断
面図、第2図falは、ICカードに組込み封止する前
の半導体装置の断面図、第2図(b)は、封止前の半導
体装置がICカードに組込まれた後にトランスファー成
形金型に収納された状態の断面図、第2図(Clは、ト
ランスファー成形金型から封止成形後に取り出されたI
Cカードの平面図、第3図は従来の半導体装置がICカ
ードに組込まれた状態の断面図、第4図ff1l 、
(bl 、 (C)は、この発明に係わるICカードの
耐折り曲げ性を考慮した一体構造の半導体装置の実施例
を示す断面図である。
l・・・絶縁基板
2・・・回路パターン
2°・・外部電極回路パターン
3・・・半導体素子
4・・・金属細線
5・・・スルーホール
6・・・ソルダーレジスト
7・・・熱硬化性樹脂
8・・・耐熱性樹脂体(カード)
8′・・耐熱性樹脂体穴部
9・・・トランスファー成形金型下型ブロック10・・
・トランスファー成形金型上型ブロック1)・・・ラン
ナー
1)1・・ゲート
12・・・樹脂枠
13・・・ボアティング樹脂
14・・・隙間
15・・・半導体装置
16・・・耐熱性樹脂体穴部側面段差
17・・・耐熱性樹脂体穴部側面面取り以上FIG. 1 is a cross-sectional view of the integral structure of an IC card according to the present invention, FIG. 2 fal is a cross-sectional view of a semiconductor device before it is assembled into an IC card and sealed, and FIG. FIG. 2 is a cross-sectional view of the semiconductor device housed in the transfer mold after being incorporated into the IC card (Cl is the I taken out from the transfer mold after sealing molding).
A plan view of the C card, FIG. 3 is a sectional view of a conventional semiconductor device incorporated into an IC card, and FIG. 4 is a sectional view of the IC card.
(bl, (C) are cross-sectional views showing an embodiment of a semiconductor device having an integrated structure in consideration of the bending resistance of an IC card according to the present invention. l...Insulating substrate 2...Circuit pattern 2° ... External electrode circuit pattern 3 ... Semiconductor element 4 ... Metal thin wire 5 ... Through hole 6 ... Solder resist 7 ... Thermosetting resin 8 ... Heat-resistant resin body (card) 8 '...Heat-resistant resin body hole part 9...Transfer molding mold lower mold block 10...
・Transfer molding mold upper mold block 1)...Runner 1) 1...Gate 12...Resin frame 13...Boating resin 14...Gap 15...Semiconductor device 16...Heat resistance Resin body hole side surface step 17...Heat-resistant resin body hole side chamfer or more
Claims (3)
た少なくとも両面に回路パターンを有する絶縁基板と、
前記絶縁基板を挿入可能な穴部を有する耐熱性樹脂体と
からなるICカード用半導体装置の実装構造において、
前記絶縁基板を、前記耐熱性樹脂体穴部の上部に配設し
た後、前記耐熱性樹脂体をトランスファー成形金型に搭
載し、前記絶縁基板を熱硬化性樹脂で覆い、前記半導体
装置と前記耐熱性樹脂体とを一体構造としたことを特徴
とする半導体装置の製造方法。(1) an insulating substrate having a circuit pattern on at least both sides on which at least one semiconductor element is mounted;
A mounting structure for a semiconductor device for an IC card comprising a heat-resistant resin body having a hole into which the insulating substrate can be inserted,
After disposing the insulating substrate in the upper part of the hole of the heat-resistant resin body, the heat-resistant resin body is mounted on a transfer molding die, the insulating substrate is covered with a thermosetting resin, and the semiconductor device and the A method for manufacturing a semiconductor device, characterized in that it has an integral structure with a heat-resistant resin body.
な穴部である特許請求の範囲第1項記載の半導体装置の
製造方法。(2) The method of manufacturing a semiconductor device according to claim 1, wherein the heat-resistant resin body hole is a hole that can hold the insulating substrate.
を設けた特許請求の範囲第1項記載の半導体装置の製造
方法。(3) The method for manufacturing a semiconductor device according to claim 1, wherein steps, surfaces, and irregularities are provided on the side surface of the heat-resistant resin body hole.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61268167A JPS63120694A (en) | 1986-11-11 | 1986-11-11 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61268167A JPS63120694A (en) | 1986-11-11 | 1986-11-11 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63120694A true JPS63120694A (en) | 1988-05-25 |
Family
ID=17454838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61268167A Pending JPS63120694A (en) | 1986-11-11 | 1986-11-11 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63120694A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002069251A1 (en) * | 2001-02-28 | 2002-09-06 | Hitachi, Ltd | Memory card and its manufacturing method |
JP2002288619A (en) * | 2001-03-26 | 2002-10-04 | Hitachi Cable Ltd | Manufacturing method for ic card |
-
1986
- 1986-11-11 JP JP61268167A patent/JPS63120694A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002069251A1 (en) * | 2001-02-28 | 2002-09-06 | Hitachi, Ltd | Memory card and its manufacturing method |
JP2009003969A (en) * | 2001-02-28 | 2009-01-08 | Elpida Memory Inc | Electronic device and its manufacturing method |
JP2002288619A (en) * | 2001-03-26 | 2002-10-04 | Hitachi Cable Ltd | Manufacturing method for ic card |
JP4706117B2 (en) * | 2001-03-26 | 2011-06-22 | 凸版印刷株式会社 | IC card manufacturing method |
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