JPS6283949A - Wafer conveyer - Google Patents
Wafer conveyerInfo
- Publication number
- JPS6283949A JPS6283949A JP22506185A JP22506185A JPS6283949A JP S6283949 A JPS6283949 A JP S6283949A JP 22506185 A JP22506185 A JP 22506185A JP 22506185 A JP22506185 A JP 22506185A JP S6283949 A JPS6283949 A JP S6283949A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- suckers
- arm
- peripheral part
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、半導体製造装置におけるウェハ搬送装置に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a wafer transfer device in a semiconductor manufacturing apparatus.
第3図は従来のウェハ搬送装置の構成図である。図にお
いて、(l)はウェハ、(2)は支ニブロック、+31
i/j吸着パッド、141iエアーノズルである。FIG. 3 is a configuration diagram of a conventional wafer transfer device. In the figure, (l) is the wafer, (2) is the support block, +31
i/j suction pad, 141i air nozzle.
また、第4図は、第3図の側面からの断面図である。Moreover, FIG. 4 is a cross-sectional view from the side of FIG. 3.
次VC動作について説明する。搬送しようとするウェハ
の上方に(3)の吸着パッドを移動させ、次いで(4)
のエアーノズルよ、9、t31の吸着パッドの内側に沿
ってエアーを吹き出す。このとき生じる排圧によりIl
+のウェハが上方へ吹い上げられ、121の支エプロン
クでウェハの端を支えられて(3)の吸着パッドに吸着
固定される。この吸着固定した状態で131の吸着パッ
ドを目的の位置上方まで移鯖させ、次いで(4)のエア
ーノズルからのエアー吹き出しを停止する。排圧による
吸引力の無くなったウェハは、(3)の吸着パッドから
離れ自然落下音して目的の搬送位置へ置かれる。Next, the VC operation will be explained. Move the suction pad (3) above the wafer to be transferred, then (4)
The air nozzle blows out air along the inside of the suction pad 9, t31. Due to the exhaust pressure generated at this time, Il
The + wafer is blown upward, the end of the wafer is supported by the support apron 121, and the wafer is sucked and fixed to the suction pad (3). In this suction-fixed state, the suction pad 131 is moved above the target position, and then the air blowing from the air nozzle (4) is stopped. The wafer, which has lost the suction force due to the exhaust pressure, separates from the suction pad (3) and is placed at the desired transfer position with a natural falling sound.
従来のウェハ搬送装置は、以上のように構収されている
ので、111のウェハの吸引時及び自然落下時にil+
のウェハの位置が一定せず、ウエハ搬送位置の精度を向
上させることが困雌であったO
この発明に、かかる問題点全解決するためになされたも
ので、ウェハ搬送位置の精度を同上させることができる
とともに、吸着時にフェノ)ヘ無理な力を与えずに固定
できる装置を得ることを目的とする。Since the conventional wafer transport device is configured as described above, when the 111 wafers are sucked or dropped naturally,
The position of the wafer was not constant, and it was difficult to improve the accuracy of the wafer transfer position.This invention was made to solve all of these problems, and improves the accuracy of the wafer transfer position. The object of the present invention is to provide a device that can fix the phenol without applying excessive force during adsorption.
この発明に係るウェハ搬送装置は、ウエハ表面外周部上
の8箇所以上に独立懸下式の吸盤を配設し、この吸盤を
下降させ、全ての吸盤をウェハ表面外周部に密着させた
状態で吸着する様にしたものである。The wafer transfer device according to the present invention has independent hanging type suction cups disposed at eight or more locations on the outer circumference of the wafer surface, and lowers the suction cups so that all the suckers are in close contact with the outer circumference of the wafer surface. It is made to absorb.
この発明にお−ては、ウェハ表面外周部上に4個の独立
懸下式の吸盤を設け、ウエハ吸着時に他の吸盤のウェハ
への押付ける力が影響しないようにし、ウェハへの無理
な力を防止する。In this invention, four independent hanging type suction cups are provided on the outer periphery of the wafer surface, so that the pressing force of other suction cups against the wafer does not affect the wafer when the wafer is suctioned, and the force applied to the wafer is prevented. Prevent force.
この上で、吸盤tウェハ表面外周部に密着させた状態で
ウェハの着脱を行ない吸引時、落下時の位置の不安定さ
を無くし、ウエハ搬送位置の精度を向上させることがで
きる。In addition, the wafer can be attached and detached while the suction cup T is in close contact with the outer periphery of the wafer surface, thereby eliminating positional instability during suction and dropping, and improving the accuracy of the wafer transfer position.
〔発明の実施例〕
第1図はこの発明の一実施例によるフェノ)搬送装置の
構成図であり、田はウエハ、(2)は吸凰131ハスプ
リングで、(2]の吸盤が(6)のアームに対して垂直
方向のみに伸縮ができるように収付けられている。(4
)は、12)の吸盤に連結している真空供給口である。[Embodiment of the Invention] Fig. 1 is a block diagram of a phenol transfer device according to an embodiment of the present invention, in which ``field'' is a wafer, (2) is a suction cup 131 spring, and the suction cup (2) is a (6 ) is housed so that it can be expanded and contracted only in the vertical direction to the arm of (4).
) is a vacuum supply port connected to the suction cup of 12).
また、第8図は、第1図の側面からの断面図である。Further, FIG. 8 is a sectional view from the side of FIG. 1.
次に動作について説明する。搬送しようとするウェハの
外周部の上方に(2)の吸盤4個が位置するように(6
)のアームを移動させる。Next, the operation will be explained. (6) so that the four suction cups (2) are located above the outer periphery of the wafer to be transferred.
) move the arm.
次りで(5)のアームを下降させ、(2)の吸盤4個と
全て(21のウェハの表面外周部に密着させる。この際
、+21の吸盤は(3)のスプリングで4個独立で(2
)のウェハに押付けられる。次いで、(4)の真空供給
口より真空を供給し、吸盤に(2)のウェハを吸着させ
る。この状態で+51のアームを上昇させ、目的の位置
上方まで移動させる。目的位置上方で+[lのアームを
下降させ、目的位置r(:12+のウェハを密着させ、
次いで14+の真空供給口よシの真空供給を停止する。Next, lower the arm (5) and bring it into close contact with the four suction cups (2) and the outer circumference of the surface of the wafer (21).At this time, the four suction cups +21 are separated by the spring (3). (2
) is pressed onto the wafer. Next, vacuum is supplied from the vacuum supply port (4), and the wafer (2) is attracted to the suction cup. In this state, raise the +51 arm and move it above the target position. Lower the arm at +[l above the target position, bring the wafer at target position r(:12+) into close contact with it,
Next, the vacuum supply from the 14+ vacuum supply port is stopped.
(5)のアームを上昇させウェハ搬送を終了する。(5) Raise the arm to complete the wafer transfer.
この発明は以上説明した通り、独立懸下式の吸盤を便用
したためにウェハに無理な力を与えずに密着した状態で
吸着ができ、よってウエハの位置ズレが減少し精度の高
いウエハ搬送が可能となった。As explained above, this invention conveniently utilizes an independent hanging type suction cup, which allows it to suction the wafer in close contact without applying excessive force to the wafer, thereby reducing wafer misalignment and allowing highly accurate wafer transport. It has become possible.
it図は、この発明の一実施例によるウエハ搬送装置の
構成図、第2図は、第1図の側面からの断面図、Ha図
は従来のウエハ搬送装置の構成図、第会図は、第3図の
側面からの断面図である。図において、(11はウエハ
、+21 //i吸盤、(31はスプリング、(41は
真空供給口、(5)はアームである。The IT diagram is a configuration diagram of a wafer transfer device according to an embodiment of the present invention, FIG. 2 is a cross-sectional view from the side of FIG. 1, Ha diagram is a configuration diagram of a conventional wafer transfer device, FIG. 4 is a cross-sectional view from the side of FIG. 3; In the figure, (11 is a wafer, +21//i suction cup, (31 is a spring, (41 is a vacuum supply port, and (5) is an arm.
Claims (1)
おいて、上記ウエハの外周部表面を吸着するために、独
立懸下式の複数の吸盤を設け、上記ウエハに吸盤を接触
させる上下動機構を備えたことを特徴とするウエハ搬送
装置。A device for holding a wafer in the process of transporting the wafer, in which a plurality of independent hanging type suction cups are provided to suction the outer peripheral surface of the wafer, and a vertical movement mechanism is provided to bring the suction cups into contact with the wafer. A wafer transfer device featuring:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22506185A JPS6283949A (en) | 1985-10-07 | 1985-10-07 | Wafer conveyer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22506185A JPS6283949A (en) | 1985-10-07 | 1985-10-07 | Wafer conveyer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6283949A true JPS6283949A (en) | 1987-04-17 |
Family
ID=16823424
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22506185A Pending JPS6283949A (en) | 1985-10-07 | 1985-10-07 | Wafer conveyer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6283949A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5476414A (en) * | 1992-09-24 | 1995-12-19 | Ebara Corporation | Polishing apparatus |
USRE38878E1 (en) * | 1992-09-24 | 2005-11-15 | Ebara Corporation | Polishing apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4936671B1 (en) * | 1969-12-24 | 1974-10-02 |
-
1985
- 1985-10-07 JP JP22506185A patent/JPS6283949A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4936671B1 (en) * | 1969-12-24 | 1974-10-02 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5476414A (en) * | 1992-09-24 | 1995-12-19 | Ebara Corporation | Polishing apparatus |
USRE38878E1 (en) * | 1992-09-24 | 2005-11-15 | Ebara Corporation | Polishing apparatus |
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